Method and system for measuring side deformation degree and girdling depth of capacitor
By using machine vision technology and image processing algorithms, the accuracy and cost issues of measuring capacitor side deformation and waist depth have been solved, achieving efficient and accurate capacitor detection.
Patent Information
- Application Number
- CN202511062644.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-31
- Publication Date
- 2025-11-07
AI Technical Summary
In current capacitor production, the measurement of the degree of side deformation and waist depth relies on manual judgment, which has large errors and high costs. In addition, the detection accuracy of AI algorithm modules is poor, making it difficult to meet the detection requirements of different models.
By combining machine vision technology with industrial cameras and image processing algorithms, the measurement results of capacitor side deformation and waist depth are obtained through image acquisition, background subtraction, binarization, slope and curvature detection.
It enables precise measurement of the degree of deformation on the side of the capacitor and the waist depth, reduces measurement costs, minimizes human error, and adapts to the testing needs of different capacitor models.
Smart Images
Figure CN120907458A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of intelligent quality inspection, in particular to a method and system for measuring the side deformation degree and waist depth of a capacitor. BACKGROUND
[0002] Whether the side bulging (side convexity), pinch (deformation of pressure concave) and waist depth of a capacitor are normal is a key defect affecting its mechanical integrity and electrical performance. Capacitor manufacturers have strict requirements on the measurement size accuracy of the side bulging, pinch and waist depth of a capacitor, because different capacitor models have different allowable sizes of side deformation degree and waist depth.
[0003] Currently, capacitor manufacturers mainly rely on molds or visual inspection to determine whether the side deformation degree and waist depth of a capacitor are qualified. However, due to large manual measurement errors and large experience differences in visual inspection by different people, the product determination results are uncontrollable. Moreover, AI algorithm modules are difficult to accurately detect to the pixel level, and data collection is required for model training when detecting new products, which has a high model training cost. SUMMARY
[0004] The present application provides a method and system for measuring the side deformation degree and waist depth of a capacitor, in order to solve the problems of high cost and poor accuracy in measuring the side deformation degree and waist depth of a capacitor.
[0005] In a first aspect, the present application provides a method for measuring the side deformation degree and waist depth of a capacitor, and the method flow is as follows:
[0006] An industrial camera is used to collect images of capacitors on the surface of a transmission mechanism to obtain capacitor side images;
[0007] The capacitor side images are subjected to background difference and image binarization to obtain capacitor binarized images;
[0008] The capacitor binarized images are subjected to segmented detection by combining the slope and curvature to obtain side deformation area and waist area wave peak information and wave valley information;
[0009] The side deformation degree is measured according to the side deformation area wave peak information and wave valley information, and the waist depth is measured according to the waist area wave peak information and wave valley information, to obtain the side deformation degree measurement result and the waist depth measurement result.
[0010] In the above embodiment, the application first acquires the capacitor side surface image by using the machine vision technology, then performs background difference and image binarization on the capacitor side surface image, and then combines the structural characteristics of the capacitor, adopts the combination of slope and curvature to perform segmented detection on the capacitor binarization image, and finally performs side surface deformation degree measurement and beam waist depth measurement according to the coordinate parameters obtained by the segmented detection, and then obtains the side surface deformation degree measurement result and the beam waist depth measurement result.
[0011] As some optional embodiments of the application, the image acquisition process of the capacitor on the surface of the transmission mechanism by using the industrial camera is as follows:
[0012] Four industrial cameras are installed on one side of the transmission mechanism, and four sets of lenses are installed on the other side of the transmission mechanism.
[0013] The four industrial cameras are used to acquire images of the capacitor at specific positions on the surface of the transmission mechanism to obtain four capacitor side surface images.
[0014] In the above embodiment, the lenses are arranged opposite the industrial cameras, which can make the capacitor imaging of the industrial camera clearer.
[0015] As some optional embodiments of the application, the lenses are integrated with polarizing plates.
[0016] In the above embodiment, the polarizing plates are integrated in the lenses and arranged perpendicularly to the polarization direction of the light source, which can effectively eliminate the reflection, highlight the capacitor profile, and effectively improve the measurement accuracy and accuracy.
[0017] As some optional embodiments of the application, the process of performing background difference and image binarization on the capacitor side surface image is as follows:
[0018] The capacitor side surface image is denoised by using Gaussian filtering or median filtering, and the capacitor side surface image after image denoising is converted to grayscale to obtain a capacitor grayscale image.
[0019] The capacitor grayscale image is subjected to background difference, and the capacitor grayscale image after background difference is subjected to image binarization to obtain a capacitor binarization image.
[0020] In the above embodiment, the capacitor side surface image is denoised by using the median filtering, which can better preserve the capacitor edge profile while removing noise, and is suitable for subsequent side surface deformation degree measurement and beam waist depth measurement tasks, and the capacitor side surface image after image denoising is converted to grayscale by using the weighted average method. The color capacitor side surface image can be converted to grayscale by grayscale conversion, which can only retain the image brightness information and reduce the calculation amount of the subsequent detection task.
[0021] As some optional embodiments of the present application, the process of segment detection of the capacitive binary image by combining the slope and curvature is as follows:
[0022] The profile of the capacitive binary image is extracted to obtain a capacitive profile image;
[0023] The slope of the lead of the capacitive profile image is detected from the reference width position of the capacitive to the left to obtain the starting coordinate and the ending coordinate of the capacitive beam waist segment, and the curvature of the coordinate points between the starting coordinate and the ending coordinate of the capacitive beam waist segment is detected to obtain the coordinate information of the adjacent wave peak and wave trough of the beam waist region;
[0024] The slope of the lead of the capacitive profile image is detected from the reference width position of the capacitive to the right to obtain the ending coordinate of the flat segment of the capacitive side surface, and the curvature of the coordinate points between the ending coordinate of the capacitive beam waist segment and the ending coordinate of the flat segment of the capacitive side surface is detected to obtain the coordinate information of the adjacent wave peak and wave trough of the side surface deformation region.
[0025] In the above embodiments, the capacitive binary image is detected by combining the slope and curvature, and the position coordinates of the beam waist region and the coordinates of the side surface deformation region are positioned.
[0026] As some optional embodiments of the present application, the process of measuring the side surface deformation degree according to the wave peak information and the wave trough information of the side surface deformation region and measuring the beam waist depth according to the wave peak information and the wave trough information of the beam waist region is as follows:
[0027] A first minimum circumscribed rectangle is constructed according to the coordinate information of the adjacent wave peak and wave trough of the side surface deformation region, and the height of the first minimum circumscribed rectangle is taken as the side surface deformation degree;
[0028] A second minimum circumscribed rectangle is constructed according to the coordinate information of the adjacent wave peak and wave trough of the beam waist region, and the height of the second minimum circumscribed rectangle is taken as the beam waist depth;
[0029] The side surface deformation degrees and the beam waist depths obtained by the four capacitive side surface images are respectively weighted to obtain the final side surface deformation degree measurement result and the beam waist depth measurement result.
[0030] In the above embodiments, the minimum circumscribed rectangles corresponding to the side surface deformation region and the beam waist region are obtained, and the side surface deformation degree and the beam waist depth can be accurately measured.
[0031] As some optional embodiments of the present application, the process of weighting is as follows:
[0032] The image weight of the four capacitive side surface images is obtained;
[0033] The four capacitors side surface images are weighted based on the image weight, and the side surface deformation degree and the beam waist depth corresponding to the four capacitors side surface images are weighted and added respectively to obtain the final side surface deformation degree measurement result and the beam waist depth measurement result.
[0034] In the above embodiment, the side surface deformation degree measurement result and the beam waist depth measurement result are weighted and added by combining the image weight of different position images, so that the influence of different machines, different models of capacitors placed on the belt at different heights, different shooting positions, different backgrounds and other factors on the extraction and measurement of the capacitors can be effectively avoided.
[0035] In a second aspect, the present application provides a capacitors side surface deformation degree and beam waist depth measurement system, the system comprising:
[0036] An image acquisition unit acquires images of the capacitors on the surface of the transmission mechanism by using an industrial camera to acquire capacitors side surface images;
[0037] An image processing unit is configured to perform background difference and image binarization on the capacitors side surface images to obtain capacitors binarized images;
[0038] A segmented detection unit is configured to perform segmented detection on the capacitors binarized images by using a combination of slope and curvature to obtain side surface deformation region and beam waist region peak information and valley information;
[0039] A result calculation unit is configured to measure the side surface deformation degree according to the side surface deformation region peak information and valley information, and measure the beam waist depth according to the beam waist region peak information and valley information to obtain the side surface deformation degree measurement result and the beam waist depth measurement result.
[0040] In a third aspect, the present application provides a computer device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, wherein the processor executes the computer program to realize the capacitors side surface deformation degree and beam waist depth measurement method.
[0041] In a fourth aspect, the present application provides a computer readable storage medium, wherein the computer readable storage medium stores a computer program, and the computer program is executed by a processor to realize the capacitors side surface deformation degree and beam waist depth measurement method.
[0042] The present application has the following advantages:
[0043] The application adopts machine vision technology to obtain the side deformation degree measurement result and the waist depth measurement result by combining the structural features of the capacitor, can effectively reduce the measurement cost of the capacitor side deformation degree and the waist depth, and combines the image weight of different positions to add the side deformation degree measurement result and the waist depth measurement result, which can effectively avoid the influence of external factors on the capacitor extraction and measurement. BRIEF DESCRIPTION OF DRAWINGS
[0044] In order to more clearly illustrate the technical solutions of the embodiments of the application, the drawings needed to be used in the embodiments will be briefly introduced as follows. It should be understood that the following drawings only show some embodiments of the application, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.
[0045] Figure 1 is a computer device structure schematic diagram of the hardware running environment described in the embodiments of the application.
[0046] Figure 2 is a flow chart of the measurement method described in the embodiments of the application.
[0047] Figure 3 is a schematic diagram of the image acquisition described in the embodiments of the application.
[0048] Figure 4 is a schematic diagram of the capacitor side image and the capacitor binary image described in the embodiments of the application.
[0049] Figure 5 is a lead schematic diagram of the capacitor contour image described in the embodiments of the application.
[0050] Figure 6 is a structural block diagram of the measurement system described in the embodiments of the application. DETAILED DESCRIPTION
[0051] It should be understood that the specific embodiments described herein are only used to explain the application and should not be used to limit the application.
[0052] In order to solve the problem of high measurement cost and poor measurement accuracy of the existing capacitor side deformation degree and waist depth, the application provides a measurement method and system for the capacitor side deformation degree and waist depth. Before introducing the specific technical solutions of the application, the hardware running environment involved in the embodiment of the application will be introduced.
[0053] Please refer to Figure 1 , Figure 1 is a computer device structure schematic diagram of the hardware running environment involved in the embodiment of the application.
[0054] AsFigure 1 As shown in the figure, the computer device can include a processor, such as a central processing unit (CPU), a communication bus, a user interface, a network interface, and a memory. The communication bus is used to realize the connection and communication between the components. The user interface can include a display, an input unit such as a keyboard, and optionally a standard wired interface and a wireless interface. The network interface can optionally include a standard wired interface and a wireless interface (such as a wireless fidelity interface). The memory can be a high-speed random access memory (RAM) or a stable non-volatile memory (NVM), such as a disk memory. The memory can also be a storage device independent of the aforementioned processor.
[0055] Those skilled in the art can understand that Figure 1 The structure shown in the figure does not constitute a limitation on the computer device, and can include more or fewer components than the figure, or combine certain components, or different component arrangements.
[0056] As Figure 1 As shown, the memory as a storage medium can include an operating system, a network communication module, a user interface module, and a data storage module.
[0057] In Figure 1 In the computer device shown in the figure, the network interface is mainly used for data communication with the network server; the user interface is mainly used for data interaction with the user; the processor and the memory in the computer device of the present application can be arranged in the computer device, and the computer device calls the software product of the data storage module in the memory through the processor, and executes the measurement method of the capacitance side surface deformation degree and the waistline depth provided by the embodiment of the present application.
[0058] Based on the hardware environment of the foregoing embodiment, the embodiment of the present application provides a measurement method of the capacitance side surface deformation degree and the waistline depth, please refer to Figure 2 , Figure 2 The flowchart of the measurement method is shown in the figure, and the method flow is as follows:
[0059] (1) An industrial camera is used to collect images of the capacitance on the surface of the transmission mechanism to obtain capacitance side surface images, and the transmission mechanism includes but is not limited to a belt and the like.
[0060] In the embodiment of the present application, please refer to Figure 3 , Figure 3For the schematic diagram of the image acquisition, four industrial cameras are installed on one side of the belt, and four sets of lenses with different angles are installed on the other side of the belt, wherein each set of lenses comprises three lenses, and a polarizer is integrated in each lens.
[0061] Specifically, when the capacitance on the belt is transmitted to a fixed position, the lenses are imaged by the four industrial cameras, and four capacitance side images are obtained. The capacitance imaging reflected by the lenses with different angles is clearer; if the industrial camera directly photographs the capacitance, it cannot stably photograph the slight lines and the like. The polarizer integrated in the lens is arranged vertically to the polarization direction of the light source, which can effectively eliminate the reflection, highlight the capacitance profile, and effectively improve the measurement precision and accuracy.
[0062] (2) The capacitance side image is subjected to background difference and image binarization to obtain a capacitance binarization image, please refer to Figure 4 , Figure 4 For the schematic diagram of the capacitance side image and the capacitance binarization image.
[0063] In the embodiment of the present application, the process of background difference and image binarization of the capacitance side image is as follows:
[0064] (2.1) The capacitance side image is subjected to image denoising by using Gaussian filtering or median filtering, and the capacitance side image after image denoising is subjected to gray scale conversion to obtain a capacitance gray scale image.
[0065] Preferably, the embodiment of the present application uses median filtering to perform image denoising on the capacitance side image. The median filtering replaces the center pixel value with the median value of the neighborhood pixels, which has a significant inhibitory effect on pulse noise, and can better preserve the capacitance edge profile while removing noise, which is suitable for subsequent side deformation degree measurement and waist depth measurement tasks.
[0066] Specifically, the embodiment of the present application uses a weighted average method to perform gray scale conversion on the capacitance side image after image denoising. The gray scale conversion can convert the colored capacitance side image into a gray scale capacitance side image, which can only retain the image brightness information and reduce the calculation amount of the subsequent detection task.
[0067] (2.2) The capacitance gray scale image is subjected to background difference, and the capacitance gray scale image after background difference is subjected to image binarization to obtain a capacitance binarization image.
[0068] Specifically, first, a background model representing a static background is constructed, and a difference between a current frame and the background model is calculated to obtain a difference image; then a fixed threshold method or an adaptive threshold method is used to convert the difference image into a binary image, so as to distinguish the foreground (capacitor) and the background; finally, noise removal, hole filling and broken region connection are performed on the binary image, so as to obtain a final capacitive binary image.
[0069] (3) The capacitive binary image is detected in sections by using a combination of a slope and a curvature, so as to obtain side surface deformation region information, beam waist region wave peak information and wave valley information.
[0070] In the embodiment of the present application, the process of detecting the capacitive binary image in sections by using a combination of a slope and a curvature is as follows:
[0071] (3.1) Contour extraction is performed on the capacitive binary image, so as to obtain a capacitive contour image, please refer to Figure 5 , Figure 5 which is a lead schematic diagram of the capacitive contour image.
[0072] In the embodiment of the present application, the gradient amplitude and direction of the capacitive binary image are calculated by using a Canny operator, then the local maximum value of the gradient direction is retained, the edge is thinned, finally the strong edge and the weak edge are distinguished by using a high threshold and a low threshold, and the broken edge is connected, so as to obtain the capacitive contour image.
[0073] (3.2) Slope detection is performed on the lead of the capacitive contour image from the left of the reference width position of the capacitor, so as to obtain the starting coordinate and the ending coordinate of the capacitor beam waist section, and curvature detection is performed on the coordinate points between the starting coordinate and the ending coordinate of the capacitor beam waist section, so as to obtain the coordinate information of adjacent wave peaks and wave valleys in the side surface deformation region and the coordinate information of adjacent wave peaks and wave valleys in the beam waist region.
[0074] In the embodiment of the present application, the reference width position of the capacitor can be set according to the actual situation, generally, 0.4 times the width of the capacitive contour image is taken as the reference width position of the capacitor, that is, the capacitor beam waist section can be divided to the left side, and most of the capacitor side flat section can be divided to the right side, so as to realize the detection in sections.
[0075] Specifically, slope detection is performed on the upper and lower leads of the capacitive contour image from the left of the reference width position of the capacitor, the slope change is compared, when the slope change exceeds a set threshold, the position coordinate at this time is the ending coordinate of the right side of the capacitor beam waist section, and is also the starting coordinate of the capacitor side flat section; then slope detection is continuously performed on the upper and lower leads of the capacitive contour image from the left, the slope change is compared, when the slope change exceeds the set threshold again, the position coordinate at this time is the starting coordinate of the left side of the capacitor beam waist section.
[0076] Further, after the start coordinate and the end coordinate of the capacitor beam waist section are acquired, curvature detection is performed on the coordinate points between the start coordinate and the end coordinate of the capacitor beam waist section, the curvature of adjacent points is calculated, and the coordinate information of adjacent peaks and valleys of the beam waist region can be acquired according to the curvature.
[0077] (3.3) The slope of the lead of the capacitor profile image is detected from the reference width position of the capacitor to the right, so as to acquire the end coordinate of the capacitor side flat section, and the curvature detection is performed on the coordinate points between the end coordinate of the capacitor beam waist section and the end coordinate of the capacitor side flat section, so as to acquire the coordinate information of adjacent peaks and valleys of the side deformation region.
[0078] Specifically, the slopes of the upper and lower leads of the capacitor profile image are detected from the reference position of the capacitor to the right, respectively, the slope change is compared, when the slopes of the upper and lower leads are continuously changed, and the change rules are basically opposite, the coordinate of the start position of the continuously changed slopes is the end coordinate of the capacitor side flat section.
[0079] Further, after the start coordinate and the end coordinate of the capacitor side flat section are acquired, curvature detection is performed on the coordinate points between the start coordinate and the end coordinate of the capacitor side flat section, the curvature of adjacent points is calculated, and the coordinate information of adjacent peaks and valleys of the side deformation region can be acquired according to the curvature.
[0080] (4) The side deformation degree measurement is performed according to the peak information and the valley information of the side deformation region, and the beam waist depth measurement is performed according to the peak information and the valley information of the beam waist region, so as to acquire the side deformation degree measurement result and the beam waist depth measurement result.
[0081] In the embodiments of the present application, the side deformation degree measurement is performed according to the coordinate information of adjacent peaks and valleys of the side deformation region, and the beam waist depth measurement is performed according to the coordinate information of adjacent peaks and valleys of the beam waist region, and the flow is as follows:
[0082] (4.1) A first minimum circumscribed rectangle is constructed according to the coordinate information of adjacent peaks and valleys of the side deformation region, and the height of the first minimum circumscribed rectangle is taken as the side deformation degree. Wherein, there can be one or more of the first minimum circumscribed rectangle, and the types of side deformation include convex hull and concave, etc.
[0083] (4.2) A second minimum circumscribed rectangle is constructed according to the coordinate information of adjacent peaks and valleys of the beam waist region, and the height of the second minimum circumscribed rectangle is taken as the beam waist depth. Wherein, the second minimum circumscribed rectangle is generally one.
[0084] (4.3) The side deformation degree and the beam waist depth corresponding to the four capacitive side images are respectively weighted to obtain the final side deformation degree measurement result and the beam waist depth measurement result.
[0085] In the embodiment of the present application, the weighting process is as follows:
[0086] (4.31) Image weights of the four capacitive side images are obtained; wherein the image weights can be set according to the image acquisition positions; for example, the image weight of the capacitive side image acquired by the industrial camera at the middle position is larger, and the image weight of the capacitive side image acquired by the industrial camera at the remaining position is smaller.
[0087] (4.32) The side deformation degree and the beam waist depth corresponding to the four capacitive side images are respectively weighted and added based on the image weights of the four capacitive side images to obtain the final side deformation degree measurement result and the beam waist depth measurement result. Specifically, by respectively weighting and adding the side deformation degree and the beam waist depth corresponding to the four capacitive side images, the influence of image acquisition position and background difference on image extraction and measurement can be effectively avoided.
[0088] In summary, the present application uses machine vision technology to obtain the side deformation degree measurement result and the beam waist depth measurement result combined with the structural characteristics of the capacitor, which can effectively reduce the measurement cost of the side deformation degree and the beam waist depth of the capacitor, and the image weights of the images at different positions are combined to weight and add the side deformation degree measurement result and the beam waist depth measurement result, which can effectively avoid the influence of external factors on the extraction and measurement of the capacitor.
[0089] In addition, in one embodiment, based on the same inventive idea as the foregoing embodiments, the present embodiment provides a measurement system for the side deformation degree and the beam waist depth of a capacitor, which corresponds to the method one by one, please refer to Figure 6 , Figure 6 The structural diagram of the measurement system is shown in the figure, and the system comprises:
[0090] An image acquisition unit acquires images of the capacitors on the surface of the transmission mechanism by using an industrial camera to obtain capacitive side images.
[0091] An image processing unit is used to perform background difference and image binarization on the capacitive side images to obtain capacitive binarized images.
[0092] A segmented detection unit uses a combination of slope and curvature to perform segmented detection on the capacitive binarized images to obtain side deformation region and beam waist region peak information and valley information.
[0093] a result calculation unit configured to measure the side deformation degree according to the side deformation region peak information and the side deformation region valley information, and measure the beam waist depth according to the beam waist region peak information and the beam waist region valley information, to obtain the side deformation degree measurement result and the beam waist depth measurement result.
[0094] It should be noted that the units in the measurement system of the capacitance side deformation degree and the beam waist depth in the embodiment correspond to the steps in the measurement method of the capacitance side deformation degree and the beam waist depth in the foregoing embodiment one by one, and therefore, the specific implementation and the achieved technical effects of the embodiment can refer to the implementation of the measurement method of the capacitance side deformation degree and the beam waist depth, which will not be described herein again.
[0095] In addition, in an embodiment, the present application further provides a computer device, which comprises a processor, a memory, and a computer program stored in the memory, and the computer program realizes the method in the foregoing embodiment when executed by the processor.
[0096] In addition, in an embodiment, the present application further provides a computer storage medium, which stores a computer program, and the computer program realizes the method in the foregoing embodiment when executed by a processor.
[0097] In some embodiments, the computer readable storage medium can be a memory such as FRAM, ROM, PROM, EPROM, EEPROM, flash memory, magnetic surface memory, optical disc, or CD-ROM, etc.; or can be various devices comprising one or any combination of the above memories. The computer can be various computing devices including smart terminals and servers.
[0098] In some embodiments, the executable instructions can be in the form of programs, software, software modules, scripts or codes, written in any form of programming language (including compiled or interpreted languages, or declarative or procedural languages), and can be deployed in any form, including being deployed as independent programs or as modules, components, subroutines or other units suitable for use in computing environments.
[0099] As an example, the executable instructions can but not necessarily correspond to files in a file system, can be stored in a part of a file storing other programs or data, for example, stored in one or more scripts in a Hyper Text Markup Language (HTML) document, stored in a single file dedicated to the program in question, or stored in multiple cooperating files (for example, files storing one or more modules, subroutines or code portions).
[0100] As an example, the executable instructions can be deployed in one computing device or multiple computing devices located at one site or distributed across multiple sites and interconnected by a communication network.
[0101] It has to be explained that, in this text, the term "comprise", "include" or any other variant thereof is intended to encompass non-exclusive inclusion, so that processes, methods, articles or systems including a series of elements not only include those elements, but also include other elements not explicitly listed, or further include elements inherent to such processes, methods, articles or systems. Without more limitations, the element defined by the statement "comprising a" does not exclude the presence of other identical elements in the process, method, article or system including the element.
[0102] Through the above description of the embodiments, those skilled in the art can clearly understand that the above-mentioned embodiment methods can be realized by means of software and the necessary general hardware platform, of course, they can also be realized by hardware, but in many cases the former is a better embodiment. Based on such understanding, the technical solutions of the present application can be embodied in the form of a software product, which is stored in a storage medium (such as a read-only memory / random access memory, a magnetic disk, an optical disk) and includes a plurality of instructions for causing a multimedia terminal device (which can be a mobile phone, a computer, a television receiver, or a network device, etc.) to execute the methods described in the various embodiments of the present application.
[0103] The above is only the preferred embodiment of the present application, and does not limit the patent scope of the present application, and any equivalent structure or equivalent process transformation using the content of the specification and drawings, or direct or indirect application in other related technical fields, are also included in the patent protection scope of the present application.
Claims
1. A method of measuring the extent of lateral deformation of a capacitor and the depth of the beam waist, characterized by, The method flow is as follows: An industrial camera is used to collect images of the capacitors on the surface of the transmission mechanism to obtain capacitor side surface images; The capacitor side surface images are subjected to background difference and image binarization to obtain capacitor binarized images; The capacitor binarized images are subjected to segmented detection in a manner combining slope and curvature to obtain side surface deformation region and beam waist region wave crest information and wave trough information; The side surface deformation degree is measured according to the side surface deformation region wave crest information and wave trough information, and the beam waist depth is measured according to the beam waist region wave crest information and wave trough information to obtain the side surface deformation degree measurement result and the beam waist depth measurement result.
2. The method of claim 1, wherein, The flow of collecting images of the capacitors on the surface of the transmission mechanism by using the industrial camera is as follows: Four industrial cameras are installed on one side of the transmission mechanism, and four sets of lenses are installed on the other side of the transmission mechanism; The four industrial cameras are used to collect images of the capacitors at specific positions on the surface of the transmission mechanism to obtain four capacitor side surface images.
3. The method of claim 2, wherein the capacitance side deformation degree and the beam waist depth are measured by using a capacitance sensor. The lenses are integrated with polarizing plates.
4. The method of claim 1, wherein, The flow of subjecting the capacitor side surface images to background difference and image binarization is as follows: The capacitor side surface images are subjected to image denoising by using Gaussian filtering or median filtering, and the capacitor side surface images after image denoising are subjected to grayscale conversion to obtain capacitor grayscale images; The capacitor grayscale images are subjected to background difference, and the capacitor grayscale images after background difference are subjected to image binarization to obtain capacitor binarized images.
5. The method of claim 1, wherein, The flow of subjecting the capacitor binarized images to segmented detection in a manner combining slope and curvature is as follows: The capacitor binarized images are subjected to contour extraction to obtain capacitor contour images; The lead of the capacitor contour image is subjected to slope detection from the left of the reference width position of the capacitor to obtain the starting coordinate and the ending coordinate of the capacitor beam waist section, and the coordinate points between the starting coordinate and the ending coordinate of the capacitor beam waist section are subjected to curvature detection to obtain the coordinate information of adjacent wave crests and wave troughs in the beam waist region; The lead of the capacitor contour image is subjected to slope detection from the right of the reference width position of the capacitor to obtain the ending coordinate of the capacitor side surface flat section, and the coordinate points between the ending coordinate of the capacitor beam waist section and the ending coordinate of the capacitor side surface flat section are subjected to curvature detection to obtain the coordinate information of adjacent wave crests and wave troughs in the side surface deformation region.
6. The method of claim 5, wherein the capacitance side deformation degree and the beam waist depth are measured by using a capacitance sensor. The flow of measuring the side surface deformation degree according to the side surface deformation region wave crest information and wave trough information, and measuring the beam waist depth according to the beam waist region wave crest information and wave trough information is as follows: A first minimum circumscribed rectangle is constructed according to the coordinate information of the adjacent wave crests and wave troughs in the side surface deformation region, and the height of the first minimum circumscribed rectangle is taken as the side surface deformation degree; A second minimum circumscribed rectangle is constructed according to the coordinate information of the adjacent wave crests and wave troughs in the beam waist region, and the height of the second minimum circumscribed rectangle is taken as the beam waist depth; The side surface deformation degrees and the beam waist depths obtained from the four capacitor side surface images are subjected to weighted processing respectively to obtain the final side surface deformation degree measurement result and the beam waist depth measurement result.
7. The method of claim 6, wherein the capacitance side deformation degree and the beam waist depth are measured by using a capacitance sensor. The flow of the weighted processing is as follows: The image weights of the four capacitor side surface images are obtained; The four capacitance side images are weighted based on four image weights, and the side deformation degrees and the waist depth corresponding to the four capacitance side images are respectively weighted and added to obtain final side deformation degree measurement results and waist depth measurement results.
8. A system for measuring the extent of lateral deformation of a capacitor and the depth of a beam waist, characterized by, The system comprises: An image acquisition unit acquires capacitance images of a transmission mechanism surface by using an industrial camera to acquire capacitance side images. An image processing unit performs background difference and image binarization on the capacitance side images to acquire capacitance binarization images. A segmented detection unit performs segmented detection on the capacitance binarization images by using a combination of slope and curvature to acquire side deformation region, and waist region peak and valley information. A result calculation unit measures side deformation degrees according to the side deformation region peak and valley information, and measures waist depths according to the waist region peak and valley information to acquire side deformation degree measurement results and waist depth measurement results.
9. A computer device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that: The processor implements the measurement method of the capacitance side deformation degree and the waist depth according to any one of claims 1-7 when executing the computer program.
10. A computer-readable storage medium, characterized in that, The computer readable storage medium stores a computer program, and the computer program implements the measurement method of the capacitance side deformation degree and the waist depth according to any one of claims 1-7 when executed by the processor.