Method and system for optimizing device redundancy switching under electromagnetic interference

Abstract

The application provides a kind of equipment redundancy switching optimization method and system under electromagnetic interference, by the attribute of influence element and profile is analyzed, the initial interference area is dynamically adjusted, the actual interference range is accurately delimited, so as to accurately identify the influence equipment and determine the switching equipment;Based on the selection type of switching equipment, the standby equipment with selection type is sorted, and the switching equipment is sorted based on the number of functions, the standby equipment is matched for the switching equipment from the standby link, the replacement is efficiently completed, and when the standby resource is insufficient, the fixed equipment is called to take over the function of switching equipment, and the standby equipment is allocated to fill the vacancy of the original function of fixed equipment;In extreme cases, the functions of fixed equipment and switching equipment are realized by analyzing the limited type, which guarantees the integrity of backbone link function under electromagnetic interference and maintains stable production operation.

Description

TECHNICAL FIELD

[0001] The present application relates to data processing technology, and in particular to a device redundancy switching optimization method and system under electromagnetic interference. BACKGROUND

[0002] In the modern industrial production process, the object sorting system is deeply integrated into multiple fields such as logistics and warehousing, intelligent manufacturing, and food processing due to its high automation and precision. Through the coordinated work of devices on the pipeline or conveying link, the system can efficiently sort objects of different shapes and specifications, greatly improving production efficiency and product quality.

[0003] The industrial production environment is full of complex and diverse electromagnetic interference sources, such as high-power motor operation and high-frequency communication equipment signal transmission. These interference sources interfere with the normal operation of various industrial devices in the factory area. As an important part of the industrial production process, the devices on the object sorting system link are also inevitably affected by electromagnetic interference, which may cause some parts or motors to be affected, resulting in affected devices. The existing technology only replaces the affected devices, and the blindly switched devices may not meet the actual operation requirements, resulting in a mismatch in function, which reduces the efficiency of the sorting system after switching and makes it unstable, and cannot guarantee the efficient and continuous operation of the sorting work.

[0004] Therefore, how to efficiently and intelligently switch the affected devices under electromagnetic interference has become a problem to be solved. SUMMARY

[0005] The present application provides a device redundancy switching optimization method and system under electromagnetic interference, which can efficiently and intelligently switch the affected devices under electromagnetic interference.

[0006] In a first aspect of the present application, a device redundancy switching optimization method under electromagnetic interference is provided, comprising:

[0007] Accessing the initial interference area of the interference source, obtaining the influence profile of the influence elements in the initial interference area, adjusting the initial interference area based on the influence profile to obtain the actual interference area;

[0008] Obtaining the main chain link in the actual interference area as the influence device, obtaining the remaining main chain link as the fixed device, accessing the interference type of the interference source, determining the switching device based on the device position and interference type of the influence device, and selecting the type of the switching device;

[0009] Based on the selection type, the standby sequence of the standby device on the standby link is obtained, the external switching strategy and the standby sequence are accessed to configure the corresponding standby replacement device for the main chain link, and the switching type of the standby replacement device is accessed.

[0010] In response to the body replacement condition, a switching type of the fixed device is determined according to a fixed type of the fixed device, a selection type, and a function type of the standby device, and the standby replacement device is determined.

[0011] Optionally, in a possible implementation of the first aspect, the adjusting the initial interference region based on the influence profile to obtain an actual interference region comprises:

[0012] The interference midpoint and the interference radius of the initial interference region are obtained, the interference radius is rotated based on the interference midpoint, and the number of intersection points of the interference radius and the influence profile is obtained in real time, and the interference radius is constructed at a selection position where the number of intersection points is equal to 1 to obtain a selected radius;

[0013] An element attribute of the influence element is obtained, and the element attribute comprises a reflection attribute, an enhancement attribute, and an attenuation attribute;

[0014] When the element attribute is the reflection attribute, a corresponding influence profile is taken as a reflection profile, and the initial interference region is adjusted based on the reflection profile and the selected radius to obtain a shielded interference region;

[0015] When the element attribute is the enhancement attribute, a corresponding influence profile is taken as an enhancement profile, and the initial interference region is adjusted based on the enhancement profile and the selected radius to obtain an enhanced interference region;

[0016] When the element attribute is the attenuation attribute, a corresponding influence profile is taken as an attenuation profile, and the initial interference region is adjusted based on the attenuation profile and the selected radius to obtain an attenuated interference region.

[0017] Optionally, in a possible implementation of the first aspect, when the element attribute is the reflection attribute, a corresponding influence profile is taken as a reflection profile, and the initial interference region is adjusted based on the reflection profile and the selected radius to obtain a shielded interference region, and the adjusting the initial interference region based on the influence profile to obtain the actual interference region comprises:

[0018] When the element attribute is the reflection attribute, a corresponding influence profile is taken as a reflection profile;

[0019] The intersection point of the selected radius and the reflection profile is taken as a selected intersection point, the selected intersection point is connected with the interference midpoint to obtain a contact radius, and the reflection profile is segmented based on the selected intersection point to obtain two segmented profile lines;

[0020] The contact radius and an enclosed region surrounded by the segmented profile lines are obtained, and the smallest enclosed region is taken as a normal region;

[0021] According to the selected radius and the region profile of the initial interference region, a to-be-selected region is obtained, and a to-be-selected region where the reflection profile is located is selected as a reflection processing region;

[0022] According to a difference set of the reflection processing region and the normal region, a shielding region is obtained, and according to a difference set of the initial interference region and the shielding region, a shielding interference region is obtained.

[0023] Optionally, in a possible implementation manner of the first aspect, when the element attribute is determined to be an enhancement attribute, a corresponding influence profile is taken as an enhancement profile, and an initial interference region is regionally increased based on the enhancement profile and the selected radius to obtain an enhancement interference region, including:

[0024] When the element attribute is determined to be an enhancement attribute, a corresponding influence profile is taken as an enhancement profile, and a region corresponding to the enhancement profile is taken as an enhancement region;

[0025] According to the selected radius and the region profile of the initial interference region, a to-be-selected region is obtained, and a to-be-selected region where the enhancement profile is located is selected as an enhancement processing region;

[0026] A plurality of interference radii are constructed in the enhancement processing region as enhancement radii, an intersection of each enhancement radius and the enhancement region is obtained, and an enhancement line segment corresponding to each enhancement radius is obtained;

[0027] A number of pixel points at each enhancement line segment is counted to obtain an enhancement number corresponding to each enhancement radius, and based on the enhancement number, a corresponding enhancement radius is lengthened to obtain a lengthened point;

[0028] A profile intersection point of the selected radius and the region profile of the initial interference region is obtained, adjacent lengthened points are connected, and the profile intersection point and the nearest lengthened point are connected to obtain an enhancement interference region.

[0029] Optionally, in a possible implementation manner of the first aspect, when the element attribute is determined to be an attenuation attribute, a corresponding influence profile is taken as an attenuation profile, and an initial interference region is regionally attenuated based on the attenuation profile and the selected radius to obtain an attenuation interference region, including:

[0030] When the element attribute is determined to be an attenuation attribute, a corresponding influence profile is taken as an attenuation profile, and a region corresponding to the attenuation profile is taken as an attenuation region;

[0031] According to the selected radius and the region profile of the initial interference region, a to-be-selected region is obtained, and a to-be-selected region where the attenuation profile is located is selected as an attenuation processing region;

[0032] Constructing a plurality of interference radii as attenuation radii in the attenuation processing region, obtaining intersections of each attenuation radius and the attenuation region, and obtaining an attenuation line segment corresponding to each attenuation radius;

[0033] Counting the number of pixel points at each attenuation line segment, obtaining an attenuation number corresponding to each attenuation radius, taking the interference midpoint as the origin, and shortening the corresponding attenuation radius based on the attenuation number to obtain an attenuation point;

[0034] Obtaining a profile intersection of the selected radius and the region profile of the initial interference region, connecting adjacent attenuation points, and connecting the profile intersection and the nearest attenuation point to obtain an attenuation interference region.

[0035] Optionally, in a possible implementation manner of the first aspect, the determining the switching device based on the device position and the interference type of the influencing device, and the selection of the type of the switching device, comprises:

[0036] Determining the operation type of the influencing device based on the device position of the influencing device in the backbone link;

[0037] When the operation type of the influencing device is in the interference type, taking the corresponding influencing device as the switching device, and taking the operation type of the corresponding influencing device as the selected type.

[0038] Optionally, in a possible implementation manner of the first aspect, the obtaining the standby sequence based on the selected type of the standby device on the standby link, the calling of the external switching strategy and the standby sequence, and the configuration of the corresponding standby replacement device for the backbone link, and the switching type of the standby replacement device, comprises:

[0039] Obtaining a standby set of each switching device based on the standby device with the selected type on the standby link, obtaining a type number of the function type of each standby device, sorting the standby devices in the standby set in ascending order based on the type number, and obtaining a standby sequence corresponding to each switching device;

[0040] Obtaining a function number of the function type of the switching device, sorting the switching devices in ascending order based on the function number, and obtaining a switching sequence;

[0041] Selecting the first switching device in the switching sequence, and selecting the first standby device in the standby sequence corresponding to the first switching device as the standby replacement device of the switching device;

[0042] Updating the remaining standby sequence based on the standby replacement device to obtain an updated standby sequence;

[0043] The first switching device in the switching sequence is deleted to obtain an updated switching sequence, and the step of selecting the first standby device in the standby sequence as the standby replacement device of the switching device is repeated until the updated switching sequence has no switching device, a standby replacement device of the backbone link is obtained, and the switching type of the standby replacement device is determined based on the device position of the standby replacement device in the backbone link.

[0044] Optionally, in a possible implementation manner of the first aspect, in response to the body replacement condition, the switching type of the fixed device is determined according to the fixed type of the fixed device, the selection type and the function type of the standby device, and the standby replacement device of the fixed device comprises:

[0045] In response to the body replacement condition, the operation type of the fixed device is determined as the fixed type based on the device position of the fixed device in the backbone link.

[0046] When the switching device has no standby replacement device, the fixed device has the selection type of the corresponding switching device, and the standby device has the corresponding fixed type, the selection type is selected as the switching type of the fixed device, the operation type of the corresponding fixed device is switched to the switching type, and the standby device with the fixed type is selected as the standby replacement device of the fixed device.

[0047] Optionally, in a possible implementation manner of the first aspect, the method further comprises:

[0048] When the switching device has no standby replacement device, the fixed device has the selection type, the standby device has no fixed type, and the switching device has the fixed type, the restricted type of the switching device is obtained according to the intersection of the function type and the interference type of the switching device.

[0049] When the restricted type has no fixed type, the function type of the switching device is switched to the fixed type, and the function type of the corresponding fixed device is switched to the selection type.

[0050] The second aspect of the application provides an electromagnetic interference device redundancy switching optimization system, comprising:

[0051] The area adjustment module is configured to retrieve an initial interference area of the interference source, obtain an influence profile of an influence element in the initial interference area, perform area adjustment on the initial interference area based on the influence profile, and obtain an actual interference area.

[0052] The switching device module is configured to obtain a backbone device in the actual interference area in the backbone link as an influence device, obtain the remaining backbone devices in the backbone link as fixed devices, retrieve an interference type of the interference source, determine a switching device and a selection type of the switching device based on the device position of the influence device and the interference type.

[0053] The standby device module is used for obtaining a standby sequence based on the selection type of the standby device on the standby link, calling an external switching strategy and the standby sequence to configure a corresponding standby replacement device for the backbone link according to the standby sequence, and switching the type of the standby replacement device;

[0054] The fixed device module is used for determining the switching type of the fixed device according to the fixed type of the fixed device, the selection type and the function type of the standby device in response to the body replacement condition, and switching the standby replacement device.

[0055] The application has the following advantages:

[0056] 1、The application accurately determines the actual interference range by analyzing the attributes of the influence elements in the initial interference area and dynamically adjusting the initial interference area according to the influence profile. This process takes into account the effects of influence elements on electromagnetic interference propagation, such as the shielding of reflection properties, the expansion of interference distance by enhancement properties, and the weakening of interference distance by attenuation properties, so that the actual interference area determined is more in line with the actual influence range. As a result, the server can accurately identify the backbone device in the actual interference range as an influence device, avoiding misjudgment of devices not affected as affected objects, providing accurate range basis for subsequent device switching, and ensuring that only truly affected devices are taken to respond.

[0057] 2、The application selects the appropriate standby device from the standby link based on the selection type of the switching device and forms a standby sequence, and sorts the switching sequence according to the number of functions of the switching device, configures the standby replacement device for the switching device in order of priority, and dynamically updates the standby sequence and switching sequence after allocation. This scheme uses an ordered sorting mechanism to prioritize the replacement resources for switching devices with single functions and narrow selection range of standby devices, while avoiding repeated allocation of standby devices to ensure efficient replacement of switching devices and maintain normal operation of the backbone link.

[0058] 3、When the standby replacement device for the switching device cannot be found in the standby link, the server responds to the body replacement condition, calls the fixed device in the backbone link to assume the function of the switching device, and selects the standby device that matches the original function of the fixed device from the standby link as its standby replacement device. This scheme uses the fixed device to take over the function of the switching device, and uses the standby device to fill the vacancy of the original function of the fixed device, ensuring the integrity of the functions of the backbone link in the case of limited standby resources.

[0059] 4、The application, when the standby link neither has standby replacement equipment of the switching device nor has standby replacement equipment of the fixed device, determines the limited type by the server analyzing the intersection of the function type of the switching device and the interference type, and under the premise that the limited type does not contain the function type of the fixed device, makes the switching device and the fixed device replace each other to execute the function type. This scheme makes the switching device avoid the interfered function and execute the function of the fixed device, and makes the fixed device bear the function of the switching device, so that the core function of the backbone link is maintained through the function replacement between the devices. BRIEF DESCRIPTION OF DRAWINGS

[0060] Figure 1 A flowchart of the device redundancy switching optimization method under electromagnetic interference provided by the application;

[0061] Figure 2 An initial interference area schematic diagram when the element attribute affecting the contour in the application is a reflection attribute;

[0062] Figure 3 A schematic diagram of the reflection processing area in the application;

[0063] Figure 4 A schematic diagram of the enhanced processing area in the application;

[0064] Figure 5 A structural schematic diagram of the device redundancy switching optimization system under electromagnetic interference provided by the application. DETAILED DESCRIPTION

[0065] The technical solutions of the application will be described in detail below with specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described in some embodiments.

[0066] As shown in Figure 1 The application provides a device redundancy switching optimization method under electromagnetic interference, which comprises the following steps:

[0067] S1, the initial interference area of the interference source is called, the influence contour of the affecting element in the initial interference area is obtained, the initial interference area is adjusted based on the influence contour, and the actual interference area is obtained.

[0068] It should be noted that in the modern industrial production process, the object sorting system is deeply integrated into multiple fields such as logistics and warehousing due to its high automation and precision. The industrial production environment is full of complex and diverse electromagnetic interference sources, such as high-power motor operation, high-frequency communication equipment signal transmission, etc. These interference sources interfere with the normal operation of various industrial equipment in the factory area. As an important part of the industrial production process, the object sorting system realizes efficient sorting of objects of different shapes and specifications through the coordinated work of devices on the assembly line or conveying link. Due to the characteristics of the assembly line, each specific position has a specific work content. When the device is affected by electromagnetic interference, the influence on the function of the device is different due to the different characteristics of electromagnetic interference. For example, device A is at position 1 of the main link, and position 1 is designated to sort circular products. However, device A also has the function of sorting diamond products. If electromagnetic interference prevents device A from sorting diamonds, it can only sort circles. At this time, the interference type is diamond sorting, but since position 1 only requires sorting circles, device A can still sort circles if it is affected by electromagnetic interference.

[0069] In the prior art, only the affected device is replaced, but since the device function is related to the station position in the assembly line, blind switching may cause function mismatch. For example, when interference causes a device at a certain position to fail to perform the specified function, if the standby device does not have the same function type, or if the switching destroys the original function allocation logic, it will cause the sorting process to be interrupted or the efficiency to be reduced.

[0070] Therefore, the present application first determines the actual influence area of electromagnetic interference to avoid device misjudgment and unnecessary switching caused by inaccurate interference area judgment. At the same time, based on the interference type of the interference source, the device position and the standby link, the standby replacement device and its switching type are determined, which can significantly improve the matching degree of the standby device and the actual demand of the main link, ensure the stable and efficient operation of the object sorting system in the electromagnetic interference environment, and improve the overall efficiency and quality of industrial production.

[0071] Among them, the interference source represents the source of electromagnetic interference, such as a running high-power motor. The initial interference area represents the area affected by the interference source without considering the influencing elements in the workshop, which is preliminarily detected and can be circular. The influencing element refers to an object within the initial interference area that can affect the propagation and distribution of electromagnetic interference. The influence contour is the boundary contour of the influencing element. The actual interference area refers to the area obtained by adjusting the initial interference area by analyzing the shielding, enhancing and attenuating effects of the element attributes of the influencing element on electromagnetic interference.

[0072] By analyzing the influence of elements such as metal shelves and concrete walls in the industrial environment on electromagnetic wave propagation, the actual influence range of electromagnetic interference in a complex industrial environment can be more realistically reflected, and equipment misjudgment caused by incorrect interference area judgment can be avoided. This enables staff to know which devices are within the interference range, so that protective measures can be taken in advance for these devices, or maintenance or switching can be performed in a timely manner when the devices fail.

[0073] In some embodiments, the step S1 (region adjustment of the initial interference area based on the influence profile to obtain the actual interference area) comprises S11-S15:

[0074] S11, call the interference midpoint and interference radius of the initial interference area, rotate the interference radius based on the interference midpoint, and obtain the number of intersection points of the interference radius and the influence profile in real time, and construct the interference radius at the selected position where the number of intersection points is equal to 1 to obtain the selected radius.

[0075] It can be understood that in order to determine the actual interference area, the shape of the influencing factor, i.e., the influence profile, needs to be analyzed. First, the interference midpoint and the interference radius of the initial interference area are called, the interference radius is rotated based on the interference midpoint, and the rotated interference radius will intersect with the influencing element when the influencing element is in the initial interference area. The number of intersection points of the interference radius and the influence profile is obtained in real time, and the number of intersection points is greater than or equal to 1. When the number of intersection points is equal to 1, it indicates that the interference radius is tangent to the influence profile, and the interference radius at this time is taken as the selected radius.

[0076] Wherein, the interference midpoint represents the center point of the initial interference area, the interference radius represents the straight line distance radiated outward from the interference midpoint, the selected position refers to the intersection position of the interference radius and the influence profile when the number of intersection points is equal to 1, and the selected radius refers to the interference radius at the selected position. The selected radius has two.

[0077] S12, obtain the element attribute of the influencing element, the element attribute including reflection attribute, enhancement attribute and attenuation attribute.

[0078] It can be understood that different materials of the influencing element have different effects on electromagnetic interference. For example, some devices may block electromagnetic waves, concrete walls may absorb part of the energy and cause interference attenuation, and some electronic devices may enhance the local field strength due to resonance effect.

[0079] Therefore, the element attribute of the influencing element is obtained, and the element attribute includes reflection attribute, enhancement attribute and attenuation attribute.

[0080] Among them, the element attribute represents the characteristics of the influence element on the propagation of electromagnetic interference; the reflection attribute represents the shielding characteristics of the influence element on electromagnetic waves, which means that electromagnetic interference is blocked by the influence element and cannot continue to propagate; the enhancement attribute represents the characteristic of the influence element to enhance electromagnetic interference and extend the interference distance, such as the resonance of electronic equipment at a specific frequency, which extends the influence distance of electromagnetic interference; the attenuation attribute represents the characteristic of the influence element to absorb or weaken electromagnetic interference, such as the absorption of electromagnetic interference by a wall, which shortens the influence distance of electromagnetic interference.

[0081] S13, when the element attribute is determined to be a reflection attribute, the corresponding influence contour is used as the reflection contour. Based on the reflection contour and the selected radius, the initial interference area is adjusted to obtain the shielded interference area.

[0082] Understandably, when an element's property is determined to be reflective, the influencing element will block the straight-line propagation of electromagnetic waves, creating an area unaffected by electromagnetic interference behind the influencing element relative to the interference midpoint. Therefore, this area needs to be removed and shielded. Using the corresponding influence contour as the reflection contour, and based on the reflection contour and a selected radius, the initial interference area is adjusted for shielding, removing the area unaffected by electromagnetic interference to obtain the shielded interference area.

[0083] Among them, the area shielding adjustment means removing the area obscured by the reflection contour from the initial interference area, retaining the actual area affected by interference, as the shielding interference area.

[0084] In some embodiments, step S13 (when the element attribute is determined to be a reflection attribute, the corresponding influence contour is used as the reflection contour, and the initial interference area is adjusted for regional shielding based on the reflection contour and the selected radius to obtain the shielded interference area) includes S131-S135:

[0085] S131, when an element attribute is determined to be a reflection attribute, the corresponding influence contour is used as the reflection contour.

[0086] It is easy to understand that the influence contour of an influence element with reflective properties is defined as a reflection contour.

[0087] S132, take the intersection of the selected radius and the reflection profile as the selected intersection point, connect the selected intersection point with the interference midpoint to obtain the contact radius, and perform segmentation processing on the reflection profile based on the selected intersection point to obtain two segmentation profile lines.

[0088] It is understandable that, such as Figure 2 As shown, the intersection of the selected radius and the reflection profile is taken as the selected intersection point. Since there are two selected radii, there are two selected intersection points. Connecting the selected intersection point with the midpoint of the interference yields two contact radii. Based on the selected intersection point, the reflection profile is segmented to obtain two segmentation contour lines.

[0089] wherein the contact radius refers to a straight line segment connecting the interference midpoint and the selected midpoint, and the split contour line refers to a curve segment obtained by splitting the reflection contour with the selected intersection point as the split point, and the two split contour lines form a complete reflection contour.

[0090] S133, obtaining an enclosed area surrounded by the contact radius and each split contour line, and selecting the smallest enclosed area as the normal area.

[0091] As can be easily understood, as shown in Figure 3 When the reflection contour is split into two split contour lines, the contact radius and the two split contour lines will form two enclosed areas of different sizes, and the smaller enclosed area is selected as the normal area, because the larger area contains the self part of the affected element, and the smaller area is the unblocked space between the interference source and the affected element.

[0092] wherein the enclosed area refers to a closed space surrounded by two contact radii and a single split contour line, and the normal area refers to the smaller enclosed area selected from the two enclosed areas.

[0093] S134, selecting the to-be-selected area formed by the selected radius and the area contour of the initial interference area as the reflection processing area.

[0094] As can be easily understood, the two selected radii and the area contour of the initial interference area will form two different to-be-selected areas, and the to-be-selected area where the reflection contour is located is selected as the reflection processing area.

[0095] wherein the to-be-selected area refers to an area surrounded by two selected radii and the area contour of the initial interference area.

[0096] S135, obtaining a shielding area according to the difference set of the reflection processing area and the normal area, and obtaining a shielding interference area based on the difference set of the initial interference area and the shielding area.

[0097] As can be understood, after the reflection processing area and the normal area are defined, the area actually blocked by the reflection contour needs to be calculated. The reflection processing area contains both the normal area that is not blocked and the part blocked by the reflection contour, so the shielding area is obtained according to the difference set of the reflection processing area and the normal area, and then the shielding area is removed from the initial interference area to obtain the shielding interference area that is actually subjected to electromagnetic interference. This shielding interference area represents the actual interference area when the affected element is of the reflection property.

[0098] S14, when the element attribute is determined to be an enhancement attribute, taking the corresponding influence contour as an enhancement contour, performing area increase adjustment on the initial interference region based on the enhancement contour and the selected radius, and obtaining an enhanced interference region.

[0099] It can be understood that when the element attribute is determined to be an enhancement attribute, the influence element enhances the electromagnetic interference and expands the interference distance, resulting in that the actual influence range exceeds the initial interference region. The corresponding influence contour is taken as an enhancement contour, and the initial interference region is adjusted based on the enhancement contour and the selected radius to obtain an enhanced interference region.

[0100] The area increase adjustment means expanding the initial interference region and superimposing the area expanded due to the enhancement attribute on the initial interference region. The enhanced interference region refers to the region obtained after the initial interference region is adjusted by the area increase adjustment.

[0101] In some embodiments, the step S14 (when the element attribute is determined to be an enhancement attribute, taking the corresponding influence contour as an enhancement contour, performing area increase adjustment on the initial interference region based on the enhancement contour and the selected radius, and obtaining an enhanced interference region) includes S141-S145:

[0102] S141, when the element attribute is determined to be an enhancement attribute, taking the corresponding influence contour as an enhancement contour, and taking the area corresponding to the enhancement contour as an enhancement region.

[0103] It can be understood that the influence contour of the influence element with the enhancement attribute is defined as the enhancement contour, and the area surrounded by the enhancement contour is taken as the enhancement region.

[0104] S142, according to the selected radius and the region contour of the initial interference region, selecting the to-be-selected region where the enhancement contour is located as an enhancement processing region.

[0105] It can be understood that, as shown in Figure 4 , two selected radii and the region contour of the initial interference region will enclose two different to-be-selected regions, and the to-be-selected region where the enhancement contour is located is selected as the enhancement processing region.

[0106] The to-be-selected region refers to the region enclosed by the two selected radii and the region contour of the initial interference region.

[0107] S143, constructing a plurality of interference radii as enhancement radii in the enhancement processing region, obtaining the intersection of each enhancement radius and the enhancement region, and obtaining an enhancement line segment corresponding to each enhancement radius.

[0108] It can be understood that a plurality of interference radii passing through the enhanced region are constructed with the interference center as the origin, and the interference radius is taken as the enhanced radius. The intersection of each enhanced radius and the enhanced region is calculated to obtain an enhanced line segment corresponding to each enhanced radius. The enhanced line segment quantifies the enhanced range in different directions. The longer the enhanced line segment, the stronger the enhancement effect in the direction.

[0109] The enhanced line segment refers to the intersection line segment of the enhanced radius and the enhanced region.

[0110] S144, the number of pixel points at each enhanced line segment is counted to obtain an enhanced number corresponding to each enhanced radius. Based on the enhanced number, the corresponding enhanced radius is extended with the interference midpoint as the origin to obtain an extension point.

[0111] It can be understood that after the enhanced line segment is determined, the length of the enhanced line segment needs to be converted into a quantifiable index, and the extension distance of the interference radius is determined accordingly. Image processing is performed on each enhanced line segment, and the number of pixel points on each enhanced line segment is counted. The enhanced number of each enhanced line segment is obtained according to the number of pixel points.

[0112] It should be noted that the enhanced number here is not necessarily equal to the number of pixel points on the enhanced line segment. When the material or structure of the influence element is different, the gain coefficient is different, and the gain effect of electromagnetic interference is significantly different (for example, the gain of a metal resonant cavity is higher than that of a plastic shell for different influence elements; for a single influence element, the gain of a hollow structure is lower than that of a closed structure). If the number of pixel points of the enhanced line segment is directly equated to the enhanced number, the influence of the material or structure on the gain will be ignored, resulting in a disconnection between the extension distance and the actual enhancement effect. The enhanced number is obtained by multiplying the number of pixel points on each enhanced line segment by the corresponding enhanced radius gain coefficient. The determination of the specific gain coefficient can be determined in combination with the prior art, which will not be described here.

[0113] Further, see Figure 4 After the enhanced number corresponding to each enhanced radius is determined, the extension distance is calculated based on the enhanced number, that is, the extension distance is calculated by the increased pixel points. Specifically, the extension distance is the product of the number of increased pixel points (enhanced number) and the unit length of pixel points. With the interference midpoint as the origin, the corresponding enhanced radius is extended by the extension distance to obtain an extension point.

[0114] The enhanced number refers to the number of pixel points corresponding to the distance of the extension of the enhanced radius out of the initial interference region. The specific value is calculated by the number of pixel points of the enhanced line segment and the gain coefficient determined by the material or structure of the influence element. The extension point refers to the end point of the extended line after the extension of the enhanced radius.

[0115] S145, obtaining the profile intersection of the selected radius and the region profile of the initial interference region, connecting the adjacent extension points, and connecting the profile intersection and the nearest extension point to obtain the enhanced interference region.

[0116] It can be understood that after obtaining the extension points of each enhanced radius through the step S144, it is necessary to connect these discrete extension points into a continuous boundary to form a complete enhanced interference region.

[0117] The profile intersection of the selected radius and the region profile of the initial interference region is obtained. Since there are two selected radii, there are two profile intersections. The adjacent extension points are connected, and the profile intersection and the nearest extension point are connected, for example, the left profile intersection is connected with the leftmost extension point, and the right profile intersection is connected with the rightmost extension point. The new enclosed region obtained by connecting the adjacent extension points and connecting the profile intersection and the nearest extension point is the enhanced interference region, which includes the initial interference region and the newly added interference range due to the enhanced attribute.

[0118] The enhanced interference region means the actual interference region under the condition that the influence element is the enhanced attribute.

[0119] The profile intersection refers to the intersection of the selected radius and the region profile of the initial interference region.

[0120] S15, when the element attribute is determined to be the attenuation attribute, the corresponding influence profile is taken as the attenuation profile, and the initial interference region is adjusted based on the attenuation profile and the selected radius to obtain the attenuation interference region.

[0121] It can be understood that when the element attribute is determined to be the attenuation attribute, the influence element will attenuate the electromagnetic interference and reduce the interference distance, resulting in that the actual influence range is smaller than the initial interference region. The corresponding influence profile is taken as the attenuation profile, and the initial interference region is adjusted based on the attenuation profile and the selected radius to remove the reduced range caused by the attenuation attribute to obtain the attenuation interference region.

[0122] The region attenuation adjustment means reducing the initial interference region, and removing the reduced range caused by the attenuation attribute on the initial interference region. The attenuation interference region refers to the region obtained after the initial interference region is adjusted by the region attenuation adjustment.

[0123] In some embodiments, the step S15 (when the element attribute is determined to be the attenuation attribute, the corresponding influence profile is taken as the attenuation profile, and the initial interference region is adjusted based on the attenuation profile and the selected radius to obtain the attenuation interference region) includes S151-S155:

[0124] S151, when the element attribute is determined to be the attenuation attribute, taking the corresponding influence contour as an attenuation contour, and taking the region corresponding to the attenuation contour as an attenuation region.

[0125] It can be understood that the influence contour of the influence element with the attenuation attribute is defined as the attenuation contour, and the region surrounded by the attenuation contour is taken as the attenuation region.

[0126] S152, according to the selected radius and the region contour of the initial interference region, selecting the to-be-selected region where the attenuation contour is located as an attenuation processing region.

[0127] It can be understood that the two selected radii and the region contour of the initial interference region will enclose two different to-be-selected regions, and the to-be-selected region where the attenuation contour is located is selected as the attenuation processing region.

[0128] The to-be-selected region refers to the region enclosed by the two selected radii and the region contour of the initial interference region.

[0129] S153, constructing a plurality of interference radii as attenuation radii in the attenuation processing region, obtaining the intersection of each attenuation radius and the attenuation region, and obtaining the attenuation line segment corresponding to each attenuation radius.

[0130] It can be understood that a plurality of interference radii passing through the attenuation region are constructed with the interference center as the origin, and this interference radius is taken as the attenuation radius. The intersection of each attenuation radius and the attenuation region is calculated to obtain the attenuation line segment corresponding to each attenuation radius. The attenuation line segment quantifies the attenuation range in different directions. The shorter the attenuation line segment, the stronger the attenuation effect in that direction.

[0131] The attenuation line segment refers to the intersection line segment of the attenuation radius and the attenuation region.

[0132] S154, counting the number of pixel points at each attenuation line segment to obtain the attenuation number corresponding to each attenuation radius, and shortening the corresponding attenuation radius based on the attenuation number with the interference midpoint as the origin to obtain an attenuation point.

[0133] It can be understood that after the attenuation line segment is determined, the length of the attenuation line segment needs to be converted into a quantifiable index, and the shortening distance of the interference radius is determined accordingly. Image processing is performed on each attenuation line segment, and the number of pixel points on each attenuation line segment is counted. The attenuation number of each attenuation line segment is obtained according to the number of pixel points.

[0134] It should be noted that the number of attenuations here is not necessarily equal to the number of pixel points on the attenuation line segment. When the material or structure of the influencing element is different, the attenuation coefficient is different, and the attenuation effect on electromagnetic interference is significantly different. For example, the attenuation effect of the front of the metal shielding cover is usually stronger than the side. If the number of pixel points of the attenuation line segment is directly equated to the number of attenuations, the influence of the material or structure on the attenuation will be ignored, resulting in a disconnection between the actual attenuation effect and the shortened distance. The number of attenuations is obtained by multiplying the number of pixel points on each attenuation line segment by the corresponding attenuation radius attenuation coefficient. The specific attenuation coefficient can be determined in combination with the existing technology, and will not be described here.

[0135] Further, after determining the number of attenuations corresponding to each attenuation radius, the shortened distance is calculated based on the number of attenuations, that is, the shortened distance is calculated by reducing the number of pixel points. Specifically, the shortened distance is the product of the number of reduced pixel points (the number of attenuations) and the unit length of the pixel points. Taking the midpoint of the interference as the origin, the corresponding attenuation radius is shortened by the shortened distance to obtain the attenuation point.

[0136] Wherein, the number of attenuations refers to the number of pixel points corresponding to the distance of the attenuation radius shrinking into the initial interference region. The number is calculated by the number of pixel points of the attenuation line segment and the attenuation coefficient determined by the material or structure of the influencing element. The attenuation point refers to the endpoint after the attenuation radius is shortened.

[0137] S155, obtain the profile intersection of the selected radius and the region profile of the initial interference region, connect the adjacent attenuation points, and connect the profile intersection and the nearest attenuation point to obtain the attenuation interference region.

[0138] It can be understood that after obtaining the attenuation points of each attenuation radius through the S154 step, the discrete attenuation points need to be connected into a continuous boundary to form a complete attenuation interference region.

[0139] The profile intersection of the selected radius and the region profile of the initial interference region is obtained. Because there are two selected radii, there are two profile intersections. The adjacent attenuation points are connected, and the profile intersection and the nearest attenuation point are connected, for example, the left profile intersection is connected with the leftmost attenuation point, and the right profile intersection is connected with the rightmost attenuation point. The new enclosed area obtained by connecting the adjacent attenuation points and connecting the profile intersection and the nearest attenuation point is the attenuation interference region, which is the region of the initial interference region after attenuation adjustment.

[0140] The attenuation interference region represents the actual interference region when the influencing element has attenuation properties.

[0141] Wherein, the profile intersection refers to the intersection of the selected radius and the region profile of the initial interference region.

[0142] S2, obtaining the backbone devices in the actual interference area as the affected devices, obtaining the remaining backbone devices in the backbone link as the fixed devices, obtaining the interference type of the interference source, determining the switching device based on the device position of the affected device and the interference type, and selecting the type of the switching device.

[0143] It can be understood that after the actual interference area (such as the shielding interference area, the enhanced interference area, and the attenuated interference area) is determined, the specific influence of the actual interference area on the backbone devices in the backbone link needs to be further determined. If there is no backbone device in the actual interference area, the entire product line or device can be normally used. If there is a backbone device in the actual interference area, the backbone devices in the actual interference area in the backbone link are taken as the affected devices, and the remaining backbone devices in the backbone link are taken as the fixed devices.

[0144] It should be noted that the electromagnetic interference affects the implementation of the functions of the device, so the interference type means that the interference source has affected the implementation of some function types of the device. Obtaining the interference type of the interference source actually means obtaining the function type affected by the interference source. For example, the device A mentioned in the step S1 can sort the circular products at the No. 1 position in the backbone link. However, the device A also has a function of sorting the diamond products. If the electromagnetic interference makes the device A unable to sort the diamond products, but only can sort the circular products, the interference type is diamond sorting.

[0145] Further, the switching device is determined based on the device position of the affected device and the interference type, and the type of the switching device is selected. According to the characteristics of most flow lines, each specific position has a specific work content, that is, the device position reflects the work content of the affected device. For example, the No. 1 position requires the device to perform the sorting of the circular products. The device A at the No. 1 position is in the actual interference area. If the interference type is diamond sorting, the device A is not affected because the execution type of the device A is circular sorting and no switching is needed. If the interference type is circular sorting, the device A is affected and needs to be switched. The device A is the switching device, and the circular sorting is the selected type.

[0146] The interference type means the influence category of the electromagnetic interference on the function of the device. The device position of the affected device means the station position of the affected device in the backbone link. Different device positions correspond to different execution functions. The switching device means the device that replaces the affected device disturbed by the interference source. The selected type means the function type that the switching device needs to meet, which is determined by the function type of the affected device disturbed by the interference source.

[0147] In some embodiments, the step S2 (determining the switching device based on the device position of the influencing device and the interference type, and the selection type of the switching device) comprises S21-S22:

[0148] S21, determining the operation type of the influencing device based on the device position of the influencing device in the backbone link.

[0149] It can be understood that in the industrial backbone link, the station of the device is related to the functional role it undertakes, so the operation type of the influencing device is determined based on the device position of the influencing device in the backbone link.

[0150] Wherein, the operation type refers to the functional type of the device operation. For example, the No. 1 position requires the device to perform circular sorting, and the device A has both circular sorting and diamond sorting functions, but can only perform circular sorting at the No. 1 position, so the operation type of the device A is circular sorting, which is determined according to the device position.

[0151] S22, determining the operation type of the influencing device in the interference type, and the corresponding influencing device as the switching device, and the operation type of the corresponding influencing device as the selection type.

[0152] It can be understood that the interference type may have one or more, and when the operation type of the influencing device in the interference type is determined, the influencing device corresponding to the operation type needs to be switched, and the corresponding influencing device is taken as the switching device, and the corresponding operation type is taken as the selection type.

[0153] S3, based on the selection type, statistics of the standby device on the standby link to obtain a standby sequence, call an external switching strategy, and configure a corresponding standby replacement device on the backbone link and the switching type of the standby replacement device according to the standby sequence.

[0154] It can be understood that after determining the switching device and the selection type (such as "circular sorting"), the standby device suitable for the selection type needs to be selected from the standby link, and the replacement is completed in combination with the external switching strategy.

[0155] In some embodiments, the step S3 (based on the selection type, statistics of the standby device on the standby link to obtain a standby sequence, call an external switching strategy, and configure a corresponding standby replacement device on the backbone link and the switching type of the standby replacement device according to the standby sequence) comprises S31-S35:

[0156] S31, statistics of the standby device with the selection type on the standby link to obtain a standby set of each switching device, obtain the type number of the functional type of each standby device, sort the standby devices in the standby set in ascending order based on the type number, and obtain a standby sequence corresponding to each switching device.

[0157] It can be understood that multiple backup devices are provided on the backup link, and each backup device can also implement one or more function types. For each switching device, all backup devices on the backup link are traversed to filter out backup devices with a selected type (such as backup devices supporting 'round sorting'), to form a backup set of each switching device. For each backup device in the backup set, the number of function types possessed by the backup device is counted as a type number, and the backup devices in the backup set are sorted in ascending order based on the type number to obtain a backup sequence corresponding to each switching device. Specifically, the backup device with a smaller type number has stronger adaptability and a generally narrower optional range, and needs to be matched first.

[0158] Among them, the backup link refers to a working link deployed in parallel with the backbone link and containing multiple backup devices, the backup device refers to a redundant device pre-deployed in the backup link to quickly replace and restore the corresponding function when the backbone link device fails, and the backup set refers to a set of backup devices with a selected type filtered from the backup link. The type number refers to the number of function types possessed by the backup device.

[0159] S32, obtaining a function number of function types of the switching device, and sorting the switching device in ascending order based on the function number to obtain a switching sequence.

[0160] It can be understood that for each switching device, the number of function types thereof is counted as a function number, and the switching devices are sorted in ascending order according to the function number to obtain a switching sequence. Specifically, the switching device with a smaller function number needs to be processed first because the optional backup device range of the switching device is narrow.

[0161] Among them, the function number refers to the number of function types possessed by the switching device.

[0162] S33, selecting a first switching device in the switching sequence, and selecting a first backup device in a backup sequence corresponding to the first switching device as a backup replacement device of the first switching device.

[0163] It can be understood that from the switching sequence generated in step S32, the first switching device is selected as the currently prioritized switching device, the backup sequence corresponding to the first switching device is called, and the first backup device in the backup sequence is selected as the backup replacement device of the first switching device.

[0164] Among them, the backup replacement device refers to a backup device selected from the backup sequence to replace a certain switching device.

[0165] S34, updating the remaining backup sequence based on the backup replacement device to obtain an updated backup sequence.

[0166] It can be understood that the standby replacement device determined in S33 is identified, which may also exist in the remaining standby sequence, and is deleted from the remaining standby sequence. After deletion, all standby sequences are updated to obtain updated standby sequences.

[0167] Wherein, the remaining standby sequence represents the standby sequence corresponding to all switching devices except the switching device of which the allocation is completed.

[0168] S35, the first switching device in the switching sequence is deleted to obtain an updated switching sequence. The step of selecting the first standby device in the standby sequence corresponding to the first switching device as the standby replacement device of the switching device is repeated until the updated switching sequence has no switching device, the standby replacement device of the backbone link is obtained, and the switching type of the standby replacement device is determined based on the device position of the standby replacement device configured in the backbone link.

[0169] It can be understood that the first switching device of which the standby device allocation is completed in S33 is deleted from the current switching sequence, and the remaining switching devices constitute an updated switching sequence. The updated switching sequence is re-input into S33-S34 steps until the updated switching sequence has no switching device, the standby replacement device of the backbone link is obtained, and the switching type of the standby replacement device is determined based on the device position (such as No. 1 position, No. 2 position, etc.) of the standby replacement device configured in the backbone link.

[0170] Wherein, the switching type refers to the switching of the device from the originally executed inherent function type to another function type. Here, the switching type of the standby replacement device is consistent with the selection type.

[0171] S4, in response to the body replacement condition, the switching type of the fixed device and the standby replacement device are determined according to the fixed type of the fixed device, the selection type and the function type of the standby device.

[0172] It should be noted that if the standby replacement device of the switching device cannot be found in the standby link, the body replacement condition is issued, the server receives and responds to the body replacement condition, calls the fixed device in the backbone link to undertake the function of the switching device, and calls the standby device in the standby link to undertake the function of the fixed device. For example, the function type of device A at position 1 includes circular sorting and diamond sorting, the interference type is circular sorting, the executed function of device A at position 1 is also circular sorting, device A cannot work, and the standby replacement device cannot be found in the standby link. According to the device B at position 2 in the backbone link, the function type of device B includes circular sorting and square sorting, and the executed function of device B at position 2 is square sorting, device B can be switched to circular sorting (circular sorting is the switching type), and a standby device capable of performing square sorting is found from the standby link and used as the standby replacement device.

[0173] In some embodiments, the step S4 (determining the switching type of the fixed device and the standby replacement device in response to the body replacement condition, according to the fixed type, the selection type of the fixed device and the function type of the standby device) includes S41-S42:

[0174] S41, in response to the body replacement condition, determining the running type of the fixed device as the fixed type based on the device position of the fixed device in the backbone link.

[0175] It can be understood that when the standby replacement device of the switching device cannot be found in the standby link, the body replacement condition is triggered, the server responds and starts the S4 process, and the actual running function of the fixed device at the position is extracted as the fixed type based on the device position of the fixed device in the backbone link (such as device A at position 1). For example, the executed function of device A at position 1 is circular sorting, and the fixed type is circular sorting.

[0176] Among them, the running type of the fixed device refers to the function type of the fixed device running in the backbone link.

[0177] S42, when the switching device does not have a standby replacement device, the fixed device has a selection type corresponding to the switching device, and the standby device has a fixed type corresponding to the fixed device, the selection type is used as the switching type of the fixed device, the running type of the corresponding fixed device is switched to the switching type, and the standby device with the fixed type is selected as the standby replacement device of the fixed device.

[0178] It can be understood that the S42 step has three necessary conditions: there is no standby device in the standby link that matches the selection type of the switching device, the fixed device has the selection type of the switching device, and the functional type of the standby device in the standby link has the corresponding fixed type. When the three conditions are met, the selection type is selected as the switching type of the fixed device, and the operation type of the corresponding fixed device is switched to the switching type (for example, device B is switched from square sorting to circular sorting), thereby filling the functional vacancy of the switching device, and finally screening the standby device in the standby link that matches the fixed type (such as square sorting) of the fixed device as the standby replacement device of the fixed device, to ensure the overall function of the link.

[0179] It should be noted that when the standby link has neither a standby replacement device of the switching device nor a standby replacement device of the fixed device, the overall function of the link can be realized by functional interconversion between the fixed device and the influencing device. In some embodiments, A1-A2 are further included:

[0180] A1, when it is determined that the switching device does not have a standby replacement device, the fixed device has a selection type, the standby device does not have a fixed type, and the switching device has a fixed type, obtaining a limited type of the switching device according to the intersection of the functional type and the interference type of the switching device.

[0181] It can be understood that the A1 step has four necessary conditions: there is no standby device in the standby link that matches the selection type of the switching device, the fixed device has the selection type of the switching device, there is no standby device in the standby link that matches the fixed type of the fixed device, and the switching device has the fixed type of the fixed device. All functional types of the switching device are extracted, and the limited type of the switching device is obtained according to the intersection of the functional type and the interference type of the switching device.

[0182] The limited type refers to the intersection of the functional type and the interference type of the switching device.

[0183] It should be noted that the number of interference types can be 1 or more than 1, so the number of limited types is also more than or equal to 1.

[0184] A2, when it is determined that the limited type does not have a fixed type, the functional type of the switching device is switched to the fixed type, and the functional type of the corresponding fixed device is switched to the selection type.

[0185] It can be understood that if the limited type of the switching device does not contain the fixed type of the fixed device, that is, there is no overlap between the two, the switching device will not be disturbed when performing the fixed type function, so the functional type of the switching device is switched to the fixed type, and the functional type of the corresponding fixed device is switched to the selection type.

[0186] Specifically, the function type of the switching device is switched from the original selection type to the fixed type of the fixed device, so that the switching device assumes the original function of the fixed device. Then the function type of the fixed device is switched from the original fixed type to the selection type of the switching device, so that the fixed device fills the functional vacancy of the switching device. After switching, the switching device performs the fixed type function (not disturbed), the fixed device performs the selection type function (not disturbed itself), both core functions of the backbone link are preserved, and no device is disturbed.

[0187] Referring to Figure 5 It is a structural schematic diagram of a device redundancy switching optimization system under electromagnetic interference provided by an embodiment of the application, comprising:

[0188] The area adjustment module is configured to retrieve an initial interference area of the interference source, obtain an influence profile of an influence element in the initial interference area, and perform area adjustment on the initial interference area based on the influence profile to obtain an actual interference area.

[0189] The switching device module is configured to obtain a backbone device in the actual interference area in the backbone link as an influence device, obtain the remaining backbone devices in the backbone link as fixed devices, retrieve an interference type of the interference source, determine a switching device based on the device position of the influence device and the interference type, and determine a selection type of the switching device.

[0190] The standby device module is configured to obtain a standby sequence based on the selection type by counting standby devices on a standby link, retrieve an external switching strategy and the standby sequence to configure a corresponding standby replacement device for the backbone link, and determine a switching type of the standby replacement device.

[0191] The fixed device module is configured to determine a switching type of the fixed device and the standby replacement device in response to a body replacement condition based on the fixed type of the fixed device, the selection type, and the function type of the standby device.

[0192] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the application, and not to limit them; although the application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement for part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the application.

Claims

1. A method for optimizing equipment redundancy switching under electromagnetic interference, characterized in that, include: The initial interference region of the interference source is retrieved, the influence contour of the influencing elements within the initial interference region is obtained, and the initial interference region is adjusted based on the influence contour to obtain the actual interference region. Retrieve the midpoint and radius of the initial interference region, rotate the interference radius based on the midpoint, and obtain the number of intersections between the interference radius and the affected contour in real time. Construct the interference radius at the selected position where the number of intersections equals 1 to obtain the selected radius. Obtain the element properties that affect the element, including reflection properties, enhancement properties, and decay properties; When the element attribute is determined to be a reflection attribute, the corresponding influence contour is used as the reflection contour. Based on the reflection contour and the selected radius, the initial interference area is adjusted to perform regional masking to obtain the masked interference area. When an element attribute is determined to be an enhanced attribute, the corresponding influence contour is used as the enhanced contour. Based on the enhanced contour and the selected radius, the initial interference region is adjusted to increase the region, thus obtaining the enhanced interference region. When the element attribute is determined to be a decay attribute, the corresponding influence contour is used as the decay contour. Based on the decay contour and the selected radius, the initial interference area is adjusted for regional decay to obtain the decayed interference area. The backbone devices located within the actual interference area in the backbone link are identified as influencing devices, and the remaining backbone devices in the backbone link are identified as fixed devices. The interference type of the interference source is retrieved, and the switching device and the selection type of the switching device are determined based on the device location and interference type of the influencing device. Based on the selection of backup devices on the backup links, a backup sequence is obtained. The external switching strategy and the backup sequence are retrieved to configure the corresponding backup replacement devices on the backbone links, as well as the switching type of the backup replacement devices. In response to the replacement condition, the switching type of the fixed equipment and the backup replacement equipment are determined based on the fixed type, selection type of the fixed equipment and the functional type of the backup equipment.

2. The method according to claim 1, characterized in that, When the determined element attribute is a reflection attribute, the corresponding influence contour is used as the reflection contour. Based on the reflection contour and the selected radius, the initial interference area is adjusted for regional masking to obtain the masked interference area, including: When an element's property is determined to be a reflection property, the corresponding influence contour is used as the reflection contour. The intersection of the selected radius and the reflection profile is taken as the selected intersection point, and the selected intersection point is connected to the midpoint of the interference to obtain the contact radius. Based on the selected intersection point, the reflection profile is segmented to obtain two segmented profile lines. Obtain the bounding area enclosed by the contact radius and each of the segmentation contour lines, and select the smallest bounding area as the normal area; Based on the region outline of the selected radius and the initial interference region, the region where the reflection profile is located is selected as the reflection processing region. The shielding region is obtained based on the difference between the reflection processing region and the normal region, and the shielded interference region is obtained based on the difference between the initial interference region and the shielding region.

3. The method according to claim 1, characterized in that, When the determined element attribute is an enhancement attribute, the corresponding influence contour is used as the enhancement contour. Based on the enhancement contour and the selected radius, the initial interference region is adjusted to increase the region size, resulting in an enhanced interference region, including: When an element attribute is determined to be an enhanced attribute, the corresponding affected contour is taken as the enhanced contour, and the region corresponding to the enhanced contour is taken as the enhanced region. Based on the region outline of the selected radius and the initial interference region, the region where the enhancement outline is located is selected as the enhancement processing region. Multiple interference radii are constructed as enhancement radii within the enhancement processing area, and the intersection of each enhancement radius and the enhancement area is obtained to obtain the enhancement line segment corresponding to each enhancement radius; The number of pixels at each of the enhanced line segments is counted to obtain the enhancement quantity corresponding to each enhancement radius. Taking the midpoint of the interference as the origin, the corresponding enhancement radius is extended based on the enhancement quantity to obtain the extension point. Obtain the intersection point of the region contours of the selected radius and the initial interference region, connect adjacent extension points, and connect the contour intersection point with the nearest extension point to obtain the enhanced interference region.

4. The method according to claim 1, characterized in that, When the determined element attribute is an attenuation attribute, the corresponding influence contour is used as the attenuation contour. Based on the attenuation contour and the selected radius, the initial interference region is adjusted for regional attenuation to obtain the attenuated interference region, including: When an element attribute is determined to be a decay attribute, the corresponding influence contour is taken as the decay contour, and the area corresponding to the decay contour is taken as the decay area. Based on the region outline of the selected radius and the initial interference region, the region where the attenuation outline is located is selected as the attenuation processing region. Multiple interference radii are constructed as attenuation radii within the attenuation processing area. The intersection of each attenuation radius and the attenuation area is obtained to obtain the attenuation line segment corresponding to each attenuation radius. The number of pixels at each of the attenuation segments is counted to obtain the attenuation amount corresponding to each attenuation radius. Taking the midpoint of the interference as the origin, the corresponding attenuation radius is shortened based on the attenuation amount to obtain the attenuation point. Obtain the intersection point of the region contour of the selected radius and the initial interference region, connect adjacent attenuation points, and connect the contour intersection point with the nearest attenuation point to obtain the attenuated interference region.

5. The method according to claim 1, characterized in that, The determination of the switching device based on the location of the device affecting the device and the type of interference, and the selection type of the switching device, include: The operational type of the influencing device is determined based on its location in the backbone link. When an interference type is identified that affects the operation type of the equipment, the corresponding affected equipment is used as the switching device, and the operation type of the corresponding affected equipment is used as the selection type.

6. The method according to claim 1, characterized in that, The process of obtaining a backup sequence based on the backup devices on the backup links selected by type, retrieving the external handover policy and the backup sequence to configure corresponding backup replacement devices on the backbone links, and specifying the handover type of the backup replacement devices, includes: The backup set of each switching device is obtained by counting the backup devices with selection types on the backup link, obtaining the type number of each backup device's functional type, and sorting the backup devices in the backup set in ascending order based on the type number to obtain the backup sequence corresponding to each switching device. Obtain the number of functions of the function types of the switching devices, and sort the switching devices in ascending order based on the number of functions to obtain the switching sequence; Select the first switching device in the switching sequence, and select the first backup device in the backup sequence corresponding to the first switching device as the backup replacement device for the switching device; Based on the backup replacement device, the remaining backup sequences are deleted and updated to obtain the updated backup sequences; Delete the first switching device in the switching sequence to obtain an updated switching sequence. Repeat the steps of configuring the backup replacement device until the updated switching sequence has no switching device. Then, obtain the backup replacement device for the backbone link and determine the switching type of the backup replacement device based on the device location configured on the backbone link.

7. The method according to claim 5, characterized in that, The response body replacement condition determines the switching type of the fixed equipment and the backup replacement equipment based on the fixed type, selection type of the fixed equipment, and the functional type of the backup equipment, including: In response to the body replacement condition, the operation type of the fixed equipment is determined as the fixed type based on the equipment location of the fixed equipment in the backbone link. If it is determined that the switching equipment does not have a backup replacement equipment, the fixed equipment has a corresponding selection type for the switching equipment, and the backup equipment has a corresponding fixed type, then the selection type is used as the switching type for the fixed equipment, and the operation type of the corresponding fixed equipment is switched to the switching type. The backup equipment with the fixed type is then selected as the backup replacement equipment for the fixed equipment.

8. The method according to claim 7, characterized in that, Also includes: When it is determined that the switching device does not have a backup replacement device, the fixed device has a selection type, the backup device does not have a fixed type, and the switching device has a fixed type, the restricted type of the switching device is obtained based on the intersection of the functional type and the interference type of the switching device. When it is determined that the restricted type does not have a fixed type, the function type of the switching device is switched to the fixed type, and the function type of the corresponding fixed device is switched to the selection type.

9. A system for optimizing equipment redundancy switching under electromagnetic interference, characterized in that, include: The region adjustment module is used to retrieve the initial interference region of the interference source, obtain the influence contour of the influencing elements within the initial interference region, and perform region adjustment on the initial interference region based on the influence contour to obtain the actual interference region. Retrieve the midpoint and radius of the initial interference region, rotate the interference radius based on the midpoint, and obtain the number of intersections between the interference radius and the affected contour in real time. Construct the interference radius at the selected position where the number of intersections equals 1 to obtain the selected radius. Obtain the element properties that affect the element, including reflection properties, enhancement properties, and decay properties; When the element attribute is determined to be a reflection attribute, the corresponding influence contour is used as the reflection contour. Based on the reflection contour and the selected radius, the initial interference area is adjusted to perform regional masking to obtain the masked interference area. When an element attribute is determined to be an enhanced attribute, the corresponding influence contour is used as the enhanced contour. Based on the enhanced contour and the selected radius, the initial interference region is adjusted to increase the region, thus obtaining the enhanced interference region. When the element attribute is determined to be a decay attribute, the corresponding influence contour is used as the decay contour. Based on the decay contour and the selected radius, the initial interference area is adjusted for regional decay to obtain the decayed interference area. The switching device module is used to acquire the backbone devices located in the actual interference area of ​​the backbone link as the influencing devices, and the remaining backbone devices in the backbone link as fixed devices. It retrieves the interference type of the interference source, determines the switching device based on the device location and interference type of the influencing device, and selects the switching device type. The backup equipment module is used to obtain a backup sequence based on the backup equipment on the backup link according to the selection type statistics, retrieve the external switching strategy and the backup sequence to configure the corresponding backup replacement equipment on the backbone link, and the switching type of the backup replacement equipment; The fixed equipment module responds to the replacement conditions of the main body, and determines the switching type of the fixed equipment and the backup replacement equipment based on the fixed type, selection type and functional type of the backup equipment.

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