Processing liquid supply device and processing liquid supply method

Abstract

A processing liquid supply device for supplying a processing liquid includes a processing liquid supply source, a diaphragm pump including a pump chamber, an actuation chamber, and a diaphragm, a fluid supply mechanism for supplying a fluid to the diaphragm pump to discharge the processing liquid, and a control unit, the pump chamber including: an introduction port for introducing the processing liquid; a discharge port for discharging the processing liquid; and a bubble removal port for discharging bubbles in the processing liquid stored in the pump chamber, the fluid supply mechanism having an electro-pneumatic pressure regulating valve for regulating the pressure in the operation chamber, and the control unit being configured so as to control the pressure in the operation chamber. The control unit is capable of executing control for discharging the processing liquid from the discharge port by setting the set pressure of the electro-pneumatic pressure regulating valve to a first set pressure, and control for discharging the bubbles from the bubble removal port by setting the set pressure of the electro-pneumatic pressure regulating valve to a second set pressure smaller than the first set pressure.

Description

Technical Field

[0001] This invention relates to a treatment fluid supply device and a treatment fluid supply method. Background Technology

[0002] Patent Document 1 discloses a treatment fluid supply system for supplying treatment fluid, comprising a treatment fluid supply source, an intermediate storage mechanism, and a fluid supply mechanism. The treatment fluid supply source supplies treatment fluid, the intermediate storage mechanism temporarily stores the treatment fluid supplied from the treatment fluid supply source and discharges the treatment fluid again at a predetermined pressure, and the fluid supply mechanism supplies fluid to the intermediate storage mechanism to apply pressure to the treatment fluid stored in the intermediate storage mechanism. In this treatment fluid supply system, the intermediate storage mechanism includes a container and a pressurizing body. The container has a treatment fluid inlet and an outlet, capable of storing treatment fluid introduced through the inlet and discharging it. The pressurizing body is disposed within the container, located between the fluid supplied from the fluid supply mechanism and the treatment fluid, and applies the pressure of the fluid to the treatment fluid.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2000-077324 Summary of the Invention

[0006] The technical problem that the invention aims to solve

[0007] The technology involved in this invention can reduce the amount of treatment fluid discharged during defoaming of the treatment fluid in a diaphragm pump.

[0008] Technical means to solve the problem

[0009] One aspect of the present invention is a treatment fluid supply device for supplying a treatment fluid, comprising: a treatment fluid supply source; a diaphragm pump for discharging the treatment fluid introduced from the treatment fluid supply source; a fluid supply mechanism for supplying fluid to the diaphragm pump to discharge the treatment fluid; and a control unit for controlling the operation of the diaphragm pump and the fluid supply mechanism, the diaphragm pump comprising: a pump chamber for storing the treatment fluid; an actuation chamber capable of being supplied with the fluid; and a diaphragm disposed between the pump chamber and the actuation chamber, the pump chamber comprising: a diaphragm for introducing the treatment fluid. The pump chamber includes an inlet; an outlet for discharging the treated liquid; and a defoaming port for discharging air bubbles stored in the treated liquid. The fluid supply mechanism has an electro-pneumatic pressure regulating valve for adjusting the pressure within the actuation chamber. The control unit is configured to perform control to set the set pressure of the electro-pneumatic pressure regulating valve to a first set pressure to discharge the treated liquid from the outlet, and control to set the set pressure of the electro-pneumatic pressure regulating valve to a second set pressure lower than the first set pressure to discharge the air bubbles from the defoaming port.

[0010] Invention Effects

[0011] According to the present invention, the amount of treatment liquid discharged during defoaming of the treatment liquid in the diaphragm pump can be reduced. Attached Figure Description

[0012] Figure 1 This is a longitudinal cross-sectional view showing the general structure of the resist coating apparatus according to the embodiment.

[0013] Figure 2 This is a cross-sectional view showing the outline of the structure of the resist coating apparatus according to the embodiment.

[0014] Figure 3 This is a diagram showing the piping system, used to illustrate the structure of the corrosion resist liquid supply device in the embodiment.

[0015] Figure 4 This is an explanatory diagram showing the general structure of a diaphragm pump.

[0016] Figure 5 This is an explanatory diagram used to illustrate the operation of a diaphragm pump step by step.

[0017] Figure 6 It is a timing diagram showing the opening and closing actions of each valve in the diaphragm pump and the electro-pneumatic pressure regulating valve.

[0018] Figure 7 It is a graph that schematically shows the relationship between the measured pressure and the set pressure of the electro-pneumatic pressure regulating valve over time.

[0019] Figure 8 It is a diagram used to illustrate the vibration of the diaphragm. Detailed Implementation

[0020] In the photolithography process of semiconductor device manufacturing, a resist film is formed on a wafer, which serves as a substrate, to create a specified resist pattern. This requires processing solutions such as resist solution, developer, and rinsing solution. These processing solutions are stored in a bottle of a processing solution supply device. A pump supplies the resist solution from the bottle to a nozzle, which then dispenses the resist solution onto the wafer.

[0021] As a pump used to transport processed fluids, there is, for example, a diaphragm pump. A diaphragm pump is a pump that has a diaphragm made of flexible material, and the internal space of the pump is divided into a pump chamber for introducing the processed fluid and an actuation chamber for pressurizing or depressurizing the diaphragm to expand or contract.

[0022] When using a diaphragm pump to deliver the processing fluid, the processing fluid supplied from the bottle is first introduced into the pump chamber and stored there. Then, by pressurizing the actuation chamber, the diaphragm is pressed towards the pump chamber side, causing the processing fluid in the pump chamber to be discharged towards the discharge nozzle.

[0023] However, the processing fluid stored in the pump chamber may sometimes contain air bubbles for various reasons. For example, when the processing fluid is supplied from a bottle to a diaphragm pump via nitrogen pressurization, air bubbles may form within the processing fluid. Feeding processing fluid containing air bubbles to the wafer can lead to bubble defects, therefore, it is necessary to remove the air bubbles (so-called debubbling) before feeding the processing fluid to the wafer.

[0024] Defoaming of the treatment fluid is performed, for example, by maintaining the state of the treatment fluid stored in the pump chamber for a certain period of time, thereby causing the air bubbles to rise in the treatment fluid and expelling the air bubbles accumulated in the upper part of the pump chamber. Specifically, a defoaming port is formed in the upper part of the pump chamber. By opening the on / off valve of the discharge pipe connected to the defoaming port and pressurizing the actuation chamber, the diaphragm is pressed towards the pump chamber side, thereby causing the corrosion inhibitor liquid in the pump chamber to be discharged from the defoaming port along with the air bubbles.

[0025] The amount of processing fluid discharged during defoaming is expected to be small. However, in conventional processing fluid supply devices, the driving pressure of the diaphragm during defoaming (e.g., the air supply pressure of the actuation chamber) is the same as the driving pressure of the diaphragm when discharging processing fluid onto the wafer. Therefore, even if the opening time of the defoaming port valve is short, more processing fluid will be discharged than necessary, making it difficult to sufficiently reduce the amount of processing fluid discharged during defoaming.

[0026] Therefore, the technology of the present invention is used to reduce the amount of treatment fluid discharged during defoaming of the treatment fluid in a diaphragm pump.

[0027] Hereinafter, the processing fluid supply device of this embodiment will be described with reference to the accompanying drawings. Furthermore, in this specification, elements having substantially the same functional structure are labeled with the same reference numerals, thereby omitting repeated descriptions.

[0028] First, use Figure 1 and Figure 2 The resist coating apparatus of the liquid treatment apparatus in this embodiment will be described. Figure 1 and Figure 2 These are, respectively, a longitudinal section and a cross section view showing the general structure of the resist coating device.

[0029] like Figure 1 As shown, the resist coating apparatus 100 has an internally closable processing container 101. An inlet / outlet (not shown) for the substrate, i.e., the wafer W, is formed on the side of the processing container 101, and an opening / closing gate (not shown) is provided at the inlet / outlet.

[0030] A rotating chuck 102, serving as a substrate holder, is provided in the central part of the processing container 101 to hold and rotate the wafer W. The rotating chuck 102 has a horizontal upper surface, on which a suction port (not shown) for attracting, for example, the wafer W is provided. By the suction action from this suction port, the wafer W can be adsorbed and held on the rotating chuck 102.

[0031] The rotary chuck 102 has a chuck drive mechanism 103, including, for example, an electric motor, which enables it to rotate at a predetermined speed. Furthermore, the chuck drive mechanism 103 is equipped with a lifting drive source such as a cylinder, allowing the rotary chuck 102 to move up and down.

[0032] A cup body 104 is provided around the rotary chuck 102 to receive and recover liquids that spill or fall from the wafer W. A discharge pipe 105 for discharging the recovered liquid and an exhaust pipe 106 for venting the atmosphere inside the cup body 104 are connected to the lower surface of the cup body 104.

[0033] like Figure 2 As shown, a track 107 extending along the Y direction is formed on the negative X-direction side of the cup body 104. The track 107 extends from the outer side of the negative Y-direction side of the cup body 104 to the outer side of the positive Y-direction side. An arm 108 is mounted on the track 107.

[0034] An ejector nozzle 109 for dispensing a resist solution as a processing fluid is supported on the arm 108. The arm 108 can move on the track 107 via the nozzle drive unit 110. As a result, the ejector nozzle 109 can move from the standby section 111 located on the outer side of the Y-direction positive side of the cup body 104 to above the center of the wafer W inside the cup body 104, and then can move radially along the surface of the wafer W. In addition, the arm 108 can be raised and lowered via the nozzle drive unit 110, and the height of the ejector nozzle 109 can be adjusted.

[0035] like Figure 1 As shown, the discharge nozzle 109 is connected to a resist liquid supply device 1, which serves as a processing liquid supply device. The resist liquid, which is the processing liquid supplied to the discharge nozzle 109, is supplied from this resist liquid supply device 1. A detailed description of the resist liquid supply device 1 will follow.

[0036] like Figure 1 As shown, the resist coating apparatus 100 described above is provided with at least one control unit M. The control unit M is capable of processing computer-executable commands that cause the resist coating apparatus 100, the resist liquid supply device 1, etc., to perform the various steps described in this invention. The control unit M is capable of controlling various elements of the resist coating apparatus 100 to perform the various steps described herein. In one embodiment, part or all of the control unit M may be included in the resist coating apparatus 100. The control unit M may include a processing unit, a storage unit, and a communication interface. The control unit M is implemented, for example, by a computer. The processing unit may be configured to read a program from the storage unit that provides logic or routines capable of performing various control actions, and perform various control actions by executing the read program. The program may be stored in the storage unit in advance or retrieved via a medium when needed. The retrieved program is stored in the storage unit and read and executed by the processing unit from the storage unit. The medium may be various computer-readable storage media or a communication line connected to the communication interface. The storage medium may be temporary or non-temporary. The processing unit can be a CPU (Central Processing Unit) or one or more circuits. The storage unit can include RAM (Random Access Memory), ROM (Read Only Memory), HDD (HardDisk Drive), SSD (Solid State Drive), or a combination thereof. The communication interface can communicate with the resist coating device 100 via a communication line such as a LAN (Local Area Network).

[0037] <Anticorrosion resist supply device>

[0038] Next, the corrosion resist liquid supply device, which is the processing liquid supply device in this embodiment, will be described. Figure 3 This is a diagram showing the piping system, used to illustrate the outline of the structure of the corrosion resist liquid supply device 1.

[0039] The resist supply device 1 includes a liquid supply line 10, which is connected to a discharge nozzle 109 and serves as a processing liquid supply line. In this embodiment, the liquid supply line 10 connects a bottle 20 to the discharge nozzle 109, the bottle 20 being a processing liquid supply source that stores resist solution internally.

[0040] Bottle 20 is replaceable. A gas supply line 11 is provided on the upper part of bottle 20, and an on / off valve V1 is provided on the gas supply line 11. The gas supply line 11 connects an inactive gas supply source 12 to bottle 20. The inactive gas supply source 12 is a supply source of inactive gases such as nitrogen.

[0041] On the liquid supply line 10, starting from the upstream side, the aforementioned bottle 20, buffer container 21, filter 22, diaphragm pump 23 and supply control valve 24 are sequentially arranged.

[0042] In addition, the liquid supply line 10 consists of a first line 10a connecting the bottle 20 and the buffer container 21, a second line 10b connecting the buffer container 21 and the diaphragm pump 23, and a third line 10c connecting the diaphragm pump 23 and the discharge nozzle 109.

[0043] An on / off valve V2 is installed in the first pipeline 10a.

[0044] A filter 22 is installed in the second pipeline 10b, and an on / off valve V3 is installed between the buffer container 21 and the filter 22. In addition, an on / off valve V4 is installed on the inlet side (primary side) of the diaphragm pump 23 that is connected to the second pipeline 10b.

[0045] A supply control valve 24, including an on / off valve and a back suction valve, is installed in the third pipeline 10c. In addition, an on / off valve V5 is installed on the outlet side (secondary side) of the diaphragm pump 23 that is connected to the third pipeline 10c.

[0046] Buffer container 21 is a primary storage unit for temporarily storing the resist solution transferred from bottle 20. A liquid level sensor (not shown) is installed in buffer container 21 to detect the remaining amount of resist solution. Based on the detection result of this liquid level sensor, valves V1 and V2 are opened and closed to start / stop the supply of resist solution from bottle 20 to buffer container 21. Additionally, a discharge pipe 13 is provided at the top of buffer container 21 to release inactive gases trapped in the upper part of buffer container 21 to the atmosphere.

[0047] Filter 22 is used to filter the resist solution to remove particles. A waste liquid line 14 is provided in filter 22 for discharging waste liquid of the resist solution discharged from filter 22. An on / off valve V6 is provided in waste liquid line 14.

[0048] The diaphragm pump 23 is a variable capacity pump that temporarily stores the resist solution introduced from the primary side inside and then delivers the resist solution to the secondary side. Figure 4 This is an explanatory diagram showing the general structure of a diaphragm pump.

[0049] like Figure 4 As shown, the diaphragm pump 23 has a diaphragm 25 and a container 26. The diaphragm 25 is made of a flexible material and is installed inside the container 26.

[0050] The space within container 26 is divided into two regions by diaphragm 25. This creates a pump chamber 27 for temporarily storing the resist solution and an actuation chamber (drive chamber) 28 for applying driving pressure to diaphragm 25 within container 26. Diaphragm 25 is positioned between pump chamber 27 and actuation chamber 28, which are adjacent to each other.

[0051] The pump chamber 27 has an inlet 29 for introducing the corrosion inhibitor liquid and an outlet 109 for dispensing the liquid. Figure 3 The nozzle 30 for discharging the resist solution and the defoaming nozzle 31 for removing air bubbles contained in the resist solution.

[0052] The inlet 29 is located on the side of the pump chamber 27, the outlet 30 is located on the bottom of the pump chamber 27, and the defoaming outlet 31 is located on the upper surface of the pump chamber 27.

[0053] An air supply or exhaust port 32 for supplying or venting air into or out of the actuation chamber 28 is formed therein. The air supply or exhaust port 32 is located on the side of the actuation chamber 28.

[0054] There are no particular restrictions on the location of the openings 29-32, as long as they can perform their intended function. For example, the inlet 29 can also be located next to the defoaming outlet 31.

[0055] A level detection sensor 33 is provided on the side of the container 26 on the pump chamber 27 side to detect the decrease in the remaining amount of resist liquid in the pump chamber 27. On the other hand, a full level detection sensor 34 is provided on the side of the container 26 on the actuation chamber 28 side to detect the fullness of the resist liquid in the pump chamber 27. The specific structure of each sensor 33 and 34 is not particularly limited, as long as it can perform the target function.

[0056] A connection is made to the inlet 29 of the aforementioned pump chamber 27. Figure 3 The second pipe 10b shown is connected to the outlet 30 with Figure 3 The third pipe 10c shown is connected to the defoaming port 31. Figure 3 The discharge pipe 15 is shown. An on / off valve V7 is installed in the discharge pipe 15.

[0057] exist Figure 4 The exhaust port 32 of the actuation chamber 28 shown is connected to... Figure 3 The exhaust / supply line 16 is shown. An electro-pneumatic pressure regulating valve 40 is provided in the exhaust / supply line 16 to regulate the pressure in the operating chamber of the diaphragm pump 23.

[0058] The electro-pneumatic pressure regulating valve 40 includes a pressure sensor 41 installed in the supply and exhaust pipe 16. The pressure information measured by the pressure sensor 41 is output to the control unit M.

[0059] In addition, the electro-pneumatic pressure regulating valve 40 includes on / off valves V8 and V9. On / off valve V8 is located on the exhaust pipe 17, which branches off from the supply and exhaust pipe 16, and on / off valve V9 is located on the supply pipe 18, which branches off from the supply and exhaust pipe 16.

[0060] Exhaust line 17 is connected to suction device 35, which is a pressure reducing source for depressurizing the actuation chamber of diaphragm pump 23. Supply line 18 is connected to compressor 36, which is a pressure increasing source for pressurizing the actuation chamber of diaphragm pump 23.

[0061] In this embodiment, the fluid supply mechanism is composed of the above-mentioned supply and exhaust pipe 16, electro-pneumatic pressure regulating valve 40, exhaust pipe 17, suction device 35, supply pipe 18, and compressor 36, which supply and exhaust the fluid, i.e., air, used to operate the diaphragm pump 23.

[0062] The valves described above installed in the resist supply device 1 can be solenoid valves or pneumatic valves that can be controlled by the control unit M. The control unit M is electrically connected to these valves, diaphragm pump 23, electro-pneumatic pressure regulating valve 40, suction device 35, compressor 36, and other components, and controls the operation of each component. Therefore, a series of processes in the resist supply device 1 can be automatically performed under the control of the control unit M.

[0063] For example, the electro-pneumatic pressure regulating valve 40 switches the opening and closing states of the on-off valves V8 and V9 based on the control signal output from the control unit M, thereby enabling [the following actions are taken]. Figure 4 The pressurization or depressurization of the actuation chamber 28 shown.

[0064] The structure of the corrosion resist liquid supply device 1 of this embodiment has been described above.

[0065] (Method for supplying corrosion resist solution)

[0066] Next, refer to Figure 3 , Figure 5 , Figure 6The method of supplying resist solution using the resist solution supply device 1 is explained. Furthermore, in this embodiment, the basic operation of supplying resist solution from bottle 20 to discharge nozzle 109 using diaphragm pump 23 is performed in the same manner as in the past, so the operation of diaphragm pump 23 will be the focus of the following explanation.

[0067] Figure 5 This is an explanatory diagram used to illustrate the operation of the diaphragm pump 23 step by step. Figure 5 The thick solid arrows in the image represent the flow of the resist solution, while the dashed arrows represent the flow of air. Figure 6 This is a timing diagram showing the opening and closing actions of each valve in the diaphragm pump 23 and the electro-pneumatic pressure regulating valve 40. Figure 6 Steps (A) to (H) in the middle Figure 5 The steps (A) to (H) shown correspond to each other. Furthermore, in Figure 6 In the following explanation, for ease of explanation, will be Figure 3 The on / off valves V4, V5, V7, V8, and V9 shown are respectively called the inlet valve V4, the outlet valve V5, the defoaming valve V7, the pressure reducing valve V8, and the pressure increasing valve V9.

[0068] First, in step (A) of dispensing the resist solution onto the wafer, the dispensing valve V5 opens, dispensing the resist solution from the dispensing port 30. During this step, as the resist solution is dispensed, the diaphragm 25 contracts towards the pump chamber 27. Consequently, the volume of the actuation chamber 28 increases, the pressure within the actuation chamber 28 decreases, and the measured pressure detected by the pressure sensor 41 also decreases.

[0069] On the other hand, the measured pressure detected by the pressure sensor 41 is output to the control unit M. Based on the fact that the measured pressure is lower than the preset pressure of the electro-pneumatic pressure regulating valve 40, the control unit M outputs a control signal to the electro-pneumatic pressure regulating valve 40 to open the pressure valve V9. Based on this control signal, the pressure valve V9 opens, supplying air into the actuation chamber 28, and the pressure inside the actuation chamber 28 increases. Thus, the discharge pressure from the discharge port 30 can be maintained at a constant level, enabling a constant pressure supply of the corrosion resist solution.

[0070] In step (A) above, the set pressure of the electro-pneumatic pressure regulating valve 40 is set to a first set pressure. The first set pressure is a pressure that satisfies the condition that the pressure difference between the pressure in the actuation chamber 28 in step (A) and the initial pressure (e.g., atmospheric pressure) in the actuation chamber 28 is, for example, 100~300 kPa. However, the specific value of the first set pressure can be appropriately changed according to the difference in installation height between the discharge nozzle 109 and the diaphragm pump 23, the required discharge pressure, etc.

[0071] Next, when the amount of resist liquid remaining in pump chamber 27 decreases due to the discharge of resist liquid, the remaining amount detection sensor 33 becomes ON (i.e., is triggered), as in step (B). Triggered by the ON of the remaining amount detection sensor 33, a control signal is output from the control unit M, closing the discharge valve V5 and the pressurization valve V9. This stops the discharge of resist liquid from the discharge port 30 and the supply of air to the actuation chamber 28.

[0072] In the next step (C), the pressure reducing valve V8 opens, drawing air from the actuation chamber 28 through the supply and exhaust port 32. This reduces the pressure within the actuation chamber 28, causing the diaphragm 25 to begin expanding from the pump chamber 27 side toward the actuation chamber 28 side. The pressure difference between the pressure in the actuation chamber 28 in step (C) and the initial pressure (e.g., atmospheric pressure) within the actuation chamber 28 is, for example, -100 to -40 kPa.

[0073] Next, in this state, the pressure valve V9 is opened, and as in step (D), the resist solution is introduced into the pump chamber 27 through the inlet 29. This replenishes the resist solution stored in the pump chamber 27.

[0074] Subsequently, upon completion of resist replenishment, as in step (E), the full-capacity detection sensor 34 becomes ON. Triggered by the ON of the full-capacity detection sensor 34, a control signal is output from the control unit M, closing the inlet valve V4 and the pressure reducing valve V8. This stops the introduction of resist solution from the inlet port 29 and the suction of air from the air supply and exhaust ports 32. Here, the resist solution stored in the pump chamber 27 may contain air bubbles.

[0075] In the next step (F), the inlet valve V4, outlet valve V5, defoaming valve V7, pressure reducing valve V8, and pressure increasing valve V9 are all kept closed to perform gas-liquid separation between the bubbles and the resist solution. Through this step, the bubbles rise in the resist solution and accumulate in the upper part of the pump chamber 27.

[0076] In the next step (G), the pressurization valve V9 is opened, supplying air into the actuation chamber 28 from the air supply / exhaust port 32, and the diaphragm 25 begins to contract from the actuation chamber 28 side towards the pump chamber 27 side. Additionally, as the defoaming valve V7 opens, the corrosion inhibitor liquid stored in the pump chamber 27 is forced into the diaphragm 25, thereby being discharged from the defoaming port 31 along with the air bubbles.

[0077] In this embodiment, the set pressure of the electro-pneumatic pressure regulating valve 40 in step (G) is set to a second set pressure. This second set pressure is lower than the first set pressure in step (A). Therefore, although the actuation chamber 28 is pressurized due to the opening of the pressurization valve V9, the pressure in the actuation chamber 28 is lower than the pressure in the actuation chamber 28 in step (A).

[0078] Therefore, the contraction speed of the diaphragm 25 from the actuation chamber 28 side to the pump chamber 27 side in step (G) is slower than the contraction speed in step (A). Consequently, the flow rate of the resist liquid discharged from the defoaming port 31 in step (G) is less than the flow rate of the resist liquid discharged from the discharge port 30 in step (A).

[0079] On the other hand, in the existing defoaming step of the diaphragm pump, the pressure inside the actuation chamber 28 is the same as the pressure in the step of discharging the resist solution onto the wafer. That is, in the existing defoaming step, the flow rate of the resist solution discharged from the defoaming port 31 is the same as the flow rate of the resist solution discharged from the discharge port 30. Therefore, even if the opening time of the defoaming valve V7 in the defoaming step is short, it is difficult to suppress the amount of resist solution discharged along with the bubbles.

[0080] In contrast, in the defoaming step of this embodiment, the flow rate of the resist liquid discharged from the defoaming port 31 can be made less than the flow rate of the resist liquid discharged from the discharge port 30, thereby reducing the amount of resist liquid discharged from the defoaming port 31.

[0081] The second set pressure can be appropriately changed within a pressure range smaller than the first set pressure, but the second set pressure can be a pressure that satisfies the condition that the pressure difference between the pressure in the actuation chamber 28 in step (G) and the initial pressure (e.g., atmospheric pressure) in the actuation chamber 28 is, for example, 10~30 kPa.

[0082] In the next step (H), the defoaming valve V7 and the pressurizing valve V9 are closed, stopping the discharge of resist solution from the defoaming port 31 and the supply of air to the actuation chamber 28. In this step, the inlet valve V4, the outlet valve V5, the defoaming valve V7, the pressure reducing valve V8, and the pressurizing valve V9 are all closed, thereby maintaining a constant pressure in the actuation chamber 28, and the diaphragm pump 23 is in a standby state until the next opportunity to discharge resist solution to the wafer.

[0083] The method for supplying the resist solution in this embodiment has been described above.

[0084] In this embodiment, when discharging the resist solution onto the wafer, the set pressure of the electro-pneumatic pressure regulating valve 40 is set to a first set pressure, and when defoaming the resist solution, the set pressure of the electro-pneumatic pressure regulating valve 40 is set to a second set pressure lower than the first set pressure. This reduces the amount of resist solution discharged during the defoaming step.

[0085] (Other structural examples)

[0086] In step (H) described above, the set pressure of the electro-pneumatic pressure regulating valve 40 can also be set to a third set pressure that is lower than the second set pressure. This reduces the pressure (driving pressure) applied to the surface of the diaphragm 25 on the actuation chamber 28 side, thus suppressing the permeation of air from the actuation chamber 28 through the diaphragm 25. In other words, it suppresses the generation of air bubbles in the resist solution due to air permeating the diaphragm 25.

[0087] The third set pressure can be appropriately varied within a pressure range smaller than the second set pressure, but the third set pressure can be a pressure that satisfies the condition that the pressure difference between the pressure in the actuation chamber 28 in step (H) and the initial pressure (e.g., atmospheric pressure) in the actuation chamber 28 is, for example, -5 to 5 kPa.

[0088] In step (H), the operation of the electro-pneumatic pressure regulating valve 40 can also be stopped. This prevents particles from mixing into the corrosion inhibitor liquid stored in the pump chamber 27. The reason for this effect is as follows.

[0089] Figure 7 This is a graph schematically showing the relationship between the measured pressure and the set pressure of the electro-pneumatic pressure regulating valve 40 over time. Figure 7 In the example where the set pressure of the electro-pneumatic pressure regulating valve 40 is set to 0 kPa, in order to maintain the set pressure, the pressure reducing valve V8 and the pressure increasing valve V9 are switched repeatedly at a high frequency in the electro-pneumatic pressure regulating valve 40. That is, the pressure increasing and depressurizing in the actuation chamber 28 are repeated repeatedly at a high frequency.

[0090] Therefore, for example Figure 8 As shown by the double-dotted line, the diaphragm 25 repeatedly expands and contracts, causing it to vibrate. This vibration causes particles adhering to the surface of the diaphragm 25 on the pump chamber 27 side to peel off, and these particles may mix into the corrosion inhibitor solution inside the pump chamber 27.

[0091] In contrast, when the operation of the electro-pneumatic pressure regulating valve 40 is stopped, pressure control within the actuation chamber 28 is not performed, thus avoiding repeated high-frequency pressurization and depressurization within the actuation chamber 28. That is, in step (H), by stopping the operation of the electro-pneumatic pressure regulating valve 40, vibration of the diaphragm 25 can be suppressed, and particle mixing into the corrosion inhibitor liquid within the pump chamber 27 can be prevented.

[0092] Furthermore, the control to stop the operation of the electro-pneumatic pressure regulating valve 40 can be achieved, for example, by not outputting a control signal from the control unit M to the electro-pneumatic pressure regulating valve 40 to switch the opening and closing states of the pressure reducing valve V8 and the pressure increasing valve V9.

[0093] Furthermore, when stopping the operation of the electro-pneumatic pressure regulating valve 40, it is preferable to set the set pressure of the electro-pneumatic pressure regulating valve 40 to the aforementioned third set pressure and stop the operation of the electro-pneumatic pressure regulating valve 40 after the pressure in the actuation chamber 28 has reached a stable state. This suppresses vibration of the diaphragm 25 and also suppresses air permeation through the diaphragm 25, thus achieving the effects of suppressing particle mixing into the resist solution and suppressing the generation of bubbles in the resist solution.

[0094] On the other hand, when cleaning the diaphragm pump 23, it is preferable to vibrate the diaphragm 25. For example, with the corrosion inhibitor liquid stored in the pump chamber 27, the diaphragm 25 can be vibrated by setting the set pressure of the electro-pneumatic pressure regulating valve 40 to a certain pressure and activating it. This makes it easier for particles adhering to the surface of the diaphragm 25 to peel off, thereby improving the cleaning ability.

[0095] After the diaphragm 25 is vibrated, the resist liquid in the pump chamber 27 is discharged, for example, from the discharge port 30. Specifically, for example, the set pressure of the electro-pneumatic pressure regulating valve 40 is set to a first set pressure, the discharge valve V5 and the pressurizing valve V9 are set to the open state, and the inlet valve V4, the defoaming valve V7, and the pressure reducing valve V8 are set to the closed state, thereby discharging the resist liquid from the discharge port 30. At this time, the resist liquid discharged from the discharge port 30 is discharged, for example, via the discharge nozzle 109 to a dummy dispense port (not shown).

[0096] Alternatively, for example, the resist solution after the diaphragm 25 is vibrated can also be discharged from the defoaming port 31. In this case, for example, the set pressure of the electro-pneumatic pressure regulating valve 40 is set to the second set pressure, the defoaming valve V7 and the pressurizing valve V9 are set to the open state, and the inlet valve V4, the outlet valve V5 and the pressure reducing valve V8 are set to the closed state, thereby discharging the resist solution from the defoaming port 31.

[0097] In the above explanation, as Figure 3 The pump on the liquid supply line 10 shown is a diaphragm pump 23, but an auxiliary pump (not shown) can also be installed between the buffer container 21 and the filter 22. In addition, if the auxiliary pump adopts the same structure as the diaphragm pump 23, the amount of resist liquid discharged can also be reduced in the defoaming step of the auxiliary pump.

[0098] In addition, in the above description, resist liquid was exemplified as the processing liquid, but the processing liquid can also be other liquids supplied to the wafer, such as developer or rinsing solution.

[0099] The above is a description of the embodiments of the present invention. It should be understood that the embodiments disclosed herein are illustrative in all respects and are not restrictive. The above embodiments can be omitted, substituted, or modified in various ways without departing from the claimed technical solution, the structural examples described below that fall within the scope of the present invention, and their spirit. For example, the constituent elements of the above embodiments can be arbitrarily combined. Based on such arbitrary combinations, the effects and functions of each constituent element involved in the combination can naturally be obtained, and other effects and functions that are obvious to those skilled in the art can be obtained based on the description in this specification.

[0100] Furthermore, the effects described in this specification are merely illustrative or exemplary and are not intended to limit the scope of the invention. That is, the technology of this invention can achieve other effects, besides those described above or in lieu of those described, that are obvious to those skilled in the art.

[0101] In addition, the following structural examples also fall within the technical scope of this invention.

[0102] (1) A treatment fluid supply device for supplying treatment fluid, comprising:

[0103] Treatment fluid supply source;

[0104] A diaphragm pump is capable of discharging the treatment liquid introduced from the treatment liquid supply source;

[0105] A fluid supply mechanism supplies fluid to the diaphragm pump so that it discharges the treatment liquid; and

[0106] The control unit controls the operation of the diaphragm pump and the fluid supply mechanism.

[0107] The diaphragm pump includes:

[0108] A pump chamber for storing the treatment fluid;

[0109] The actuation chamber supplied with the fluid; and

[0110] A diaphragm is disposed between the pump chamber and the actuation chamber.

[0111] The pump chamber includes:

[0112] An inlet for introducing the treatment fluid;

[0113] An outlet for discharging the treated liquid; and

[0114] A defoaming port for discharging air bubbles stored in the treatment liquid within the pump chamber.

[0115] in,

[0116] The fluid supply mechanism has an electro-pneumatic pressure regulating valve for adjusting the pressure in the actuation chamber.

[0117] The control unit is configured to perform control to set the set pressure of the electro-pneumatic pressure regulating valve to a first set pressure so that the treatment liquid is discharged from the outlet, and control to set the set pressure of the electro-pneumatic pressure regulating valve to a second set pressure lower than the first set pressure so that the bubbles are discharged from the defoaming port.

[0118] (2) According to the treatment liquid supply device of (1), the control unit performs control to change the set pressure of the electro-pneumatic pressure regulating valve to a third set pressure that is smaller than the second set pressure after the bubbles are discharged from the defoaming port and before the treatment liquid is discharged from the discharge port.

[0119] (3) The processing liquid supply device according to (1) or (2), wherein the control unit performs control to stop the operation of the electro-pneumatic pressure regulating valve after the bubbles are discharged from the defoaming port and before the processing liquid is discharged from the discharge port.

[0120] (4) The treatment liquid supply device according to any one of (1) to (3), wherein the control unit performs control when cleaning the diaphragm pump, and in the state where the treatment liquid stored in the pump chamber is not discharged from the pump chamber, the diaphragm is vibrated by maintaining the set pressure of the electro-pneumatic pressure regulating valve at a certain pressure.

[0121] (5) The processing liquid supply device according to (4), wherein after the diaphragm is vibrated, the control unit performs control to set the set pressure of the electro-pneumatic pressure regulating valve to the first set pressure to discharge the processing liquid from the outlet.

[0122] (6) The treatment liquid supply device according to (4), wherein after the diaphragm is vibrated, the control unit performs control to set the set pressure of the electro-pneumatic pressure regulating valve to the second set pressure to discharge the treatment liquid from the defoaming port.

[0123] (7) A method for supplying a treatment fluid, comprising a treatment fluid supply device for supplying treatment fluid, wherein,

[0124] The treatment fluid supply device includes:

[0125] Treatment fluid supply source; and

[0126] A diaphragm pump, capable of discharging the treatment liquid introduced from the treatment liquid supply source.

[0127] The diaphragm pump includes:

[0128] A pump chamber for storing the treatment fluid;

[0129] An actuation chamber with adjustable internal pressure; and

[0130] A diaphragm is disposed between the pump chamber and the actuation chamber.

[0131] The pump chamber includes:

[0132] An inlet for introducing the treatment fluid;

[0133] An outlet for discharging the treated liquid; and

[0134] A defoaming port for discharging air bubbles stored in the treatment liquid within the pump chamber.

[0135] The method for supplying the treatment fluid includes:

[0136] The step of setting the set pressure of the electro-pneumatic pressure regulating valve used to regulate the pressure in the actuation chamber to a first set pressure to discharge the treatment fluid from the outlet; and

[0137] The step of setting the set pressure of the electro-pneumatic pressure regulating valve to a second set pressure that is lower than the first set pressure to discharge the bubbles from the defoaming port.

[0138] (8) The treatment liquid supply method according to (7) wherein, between the step of discharging the bubbles from the defoaming port and the step of discharging the treatment liquid from the discharge port, there is a step of changing the set pressure of the electro-pneumatic pressure regulating valve to a third set pressure that is smaller than the second set pressure.

[0139] (9) The treatment liquid supply method according to (7) or (8) wherein, between the step of discharging the bubbles from the defoaming port and the step of discharging the treatment liquid from the discharge port, there is a step of stopping the operation of the electro-pneumatic pressure regulating valve.

[0140] (10) The treatment fluid supply method according to any one of (7) to (9) further includes the step of cleaning the diaphragm pump.

[0141] In the step of cleaning the diaphragm pump, while the treatment liquid stored in the pump chamber is not discharged from the pump chamber, the diaphragm is vibrated by maintaining the set pressure of the electro-pneumatic pressure regulating valve at a certain pressure.

[0142] (11) The treatment fluid supply method according to (10), wherein, in the step of cleaning the diaphragm pump,

[0143] After the diaphragm is vibrated, the set pressure of the electro-pneumatic pressure regulating valve is set to the first set pressure to discharge the treatment liquid from the outlet.

[0144] (12) The treatment fluid supply method according to (10), wherein, in the step of cleaning the diaphragm pump,

[0145] After the diaphragm is vibrated, the set pressure of the electro-pneumatic pressure regulating valve is set to the second set pressure to discharge the treatment liquid from the defoaming port.

[0146] Explanation of reference numerals in the attached figures

[0147] 1. Corrosion resist solution supply device

[0148] 16. Supply and exhaust piping

[0149] 17. Exhaust pipe

[0150] 18 Gas supply lines

[0151] 20 bottles

[0152] 23 Diaphragm pump

[0153] 25 Diaphragm

[0154] 27 Pump Room

[0155] 28 Actuation Room

[0156] 29. Inlet Port

[0157] 30 spit out

[0158] 31. Remove the foaming mouth

[0159] 35 Suction Device

[0160] 36 Compressor

[0161] 40 Electro-pneumatic pressure regulating valve

[0162] M Control Department

[0163] V8 On / Off Valve

[0164] V9 On / Off Valve

Claims

1. A treatment fluid supply device for supplying treatment fluid, comprising: Treatment fluid supply source; A diaphragm pump is capable of discharging the treatment liquid introduced from the treatment liquid supply source; A fluid supply mechanism supplies fluid to the diaphragm pump so that it discharges the treatment liquid; and The control unit controls the operation of the diaphragm pump and the fluid supply mechanism. The diaphragm pump includes: A pump chamber for storing the treatment fluid; An actuating chamber capable of being supplied with the fluid; and A diaphragm is disposed between the pump chamber and the actuation chamber. The pump chamber includes: An inlet for introducing the treatment fluid; An outlet for discharging the treated liquid; and A defoaming port for discharging air bubbles stored in the treatment liquid within the pump chamber. The fluid supply mechanism includes an electro-pneumatic pressure regulating valve for adjusting the pressure within the actuation chamber. The control unit is configured to perform control to set the set pressure of the electro-pneumatic pressure regulating valve to a first set pressure so that the treatment liquid is discharged from the outlet, and control to set the set pressure of the electro-pneumatic pressure regulating valve to a second set pressure lower than the first set pressure so that the bubbles are discharged from the defoaming port.

2. The treatment fluid supply device according to claim 1, wherein, After the bubbles are discharged from the defoaming port and before the treatment liquid is discharged from the discharge port, the control unit performs control to change the set pressure of the electro-pneumatic pressure regulating valve to a third set pressure that is lower than the second set pressure.

3. The treatment fluid supply device according to claim 1, wherein, After the bubbles are discharged from the defoaming port and before the treatment liquid is discharged from the discharge port, the control unit performs a control to stop the operation of the electro-pneumatic pressure regulating valve.

4. The treatment fluid supply device according to any one of claims 1 to 3, wherein, The control unit performs the following controls when cleaning the diaphragm pump: When the treatment fluid stored in the pump chamber is not discharged from the pump chamber, the diaphragm is vibrated by maintaining the set pressure of the electro-pneumatic pressure regulating valve at a certain pressure.

5. The treatment fluid supply device according to claim 4, wherein, After the diaphragm vibrates, the control unit performs control to set the set pressure of the electro-pneumatic pressure regulating valve to the first set pressure so as to discharge the treatment liquid from the outlet.

6. The processing liquid supply device according to claim 4, wherein, After the diaphragm vibrates, the control unit performs control to set the set pressure of the electro-pneumatic pressure regulating valve to the second set pressure so as to discharge the treatment liquid from the defoaming port.

7. A method for supplying a processing fluid, comprising a processing fluid supply device for supplying processing fluid, wherein, The treatment fluid supply device includes: Treatment fluid supply source; and A diaphragm pump, capable of discharging the treatment liquid introduced from the treatment liquid supply source. The diaphragm pump includes: A pump chamber for storing the treatment fluid; An actuation chamber with adjustable internal pressure; and A diaphragm is disposed between the pump chamber and the actuation chamber. The pump chamber includes: An inlet for introducing the treatment fluid; An outlet for discharging the treated liquid; and A defoaming port for discharging air bubbles stored in the treatment liquid within the pump chamber. The method for supplying the treatment fluid includes: The step of setting the set pressure of the electro-pneumatic pressure regulating valve used to regulate the pressure in the actuation chamber to a first set pressure to discharge the treatment fluid from the outlet; and The step of setting the set pressure of the electro-pneumatic pressure regulating valve to a second set pressure that is lower than the first set pressure to discharge the bubbles from the defoaming port.

8. The treatment fluid supply method according to claim 7, wherein, Between the step of discharging the bubbles from the defoaming port and the step of discharging the treatment liquid from the discharge port, there is a step of changing the set pressure of the electro-pneumatic pressure regulating valve to a third set pressure that is lower than the second set pressure.

9. The treatment fluid supply method according to claim 7, wherein, Between the step of discharging the bubbles from the defoaming port and the step of discharging the treatment liquid from the discharge port, there is a step of stopping the operation of the electro-pneumatic pressure regulating valve.

10. The method for supplying the treatment fluid according to any one of claims 7 to 9, wherein, It also includes the step of cleaning the diaphragm pump. In the step of cleaning the diaphragm pump, while the treatment liquid stored in the pump chamber is not discharged from the pump chamber, the diaphragm is vibrated by maintaining the set pressure of the electro-pneumatic pressure regulating valve at a certain pressure.

11. The treatment fluid supply method according to claim 10, wherein, In the step of cleaning the diaphragm pump After the diaphragm is vibrated, the set pressure of the electro-pneumatic pressure regulating valve is set to the first set pressure to discharge the treatment liquid from the outlet.

12. The treatment fluid supply method according to claim 10, wherein, In the step of cleaning the diaphragm pump After the diaphragm is vibrated, the set pressure of the electro-pneumatic pressure regulating valve is set to the second set pressure to discharge the treatment liquid from the defoaming port.

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