H-type electrolytic tank system with reaction area accurate control and shield type positioning functions

Abstract

The invention relates to the related technical field of electrochemical experiment devices, in particular to an H-type electrolytic tank system with reaction area accurate control and shield type positioning functions, which comprises an electrode pretreatment unit, a shield type positioning unit and an integrated H-type electrolytic tank, wherein the electrode pretreatment unit is used for accurately cutting an electrode plate and automatically coating electronic silica gel; the shield type positioning unit is used for realizing accurate positioning of an electrode through a double-end cooperative positioning system and a three-axis mechanical leveling mechanism; and the integrated H-type electrolytic tank is used for accommodating an electrode and carrying out electrochemical reaction. According to the H-type electrolytic tank system with the reaction area accurate control and shield type positioning functions, a shield tunneling machine two-way positioning algorithm is transplanted to an electrochemical device for the first time, a transmission marking and double-vision feedback scheme is originally created, the shielding problem of a proton membrane is solved, and a technical closed loop is formed through function integration (cutting, gluing and positioning).

Description

Technical Field

[0001] This invention relates to the technical field of electrochemical experimental devices, and in particular to an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function. Background Technology

[0002] In electrochemical experiments, the H-type electrolytic cell is a commonly used experimental apparatus. However, existing H-type electrolytic cells have the following problems: Manual operation errors: electrode cutting and waterproof silicone coating are uncontrollable; the parallelism of the anode and cathode relies on visual adjustment, leading to uneven current density distribution; positioning blind zones: the proton exchange membrane and fixing clamps obstruct the axis of the anode and cathode chambers, rendering traditional optical alignment methods ineffective. Poor data reproducibility: existing commercially available H-type electrolytic cells lack automatic electrode calibration functions, causing unnecessary errors when repeating experiments. Summary of the Invention

[0003] The purpose of this invention is to provide an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function, comprising an electrode pretreatment unit, a shield-type positioning unit, and an integrated H-type electrolytic cell, wherein:

[0005] The electrode pretreatment unit is used to precisely cut electrode sheets and automatically coat them with electronic silicone.

[0006] The shield-type positioning unit is used to achieve precise positioning of the electrodes through a dual-end cooperative positioning system and a three-axis mechanical leveling mechanism;

[0007] Integrated H-type electrolytic cells are used to house electrodes and carry out electrochemical reactions.

[0008] Preferably, the electrode pretreatment unit includes:

[0009] Laser cutting module for cutting 1x2cm electrode sheets with an accuracy of +0.05mm;

[0010] The microporous coating robotic arm automatically coats electronic silicone using a mask, ensuring that the error in the 11cm reaction zone is within ±2%.

[0011] Preferably, the electrode pretreatment unit includes:

[0012] Laser cutting module for cutting 1x2cm electrode sheets with an accuracy of +0.05mm;

[0013] The microporous coating robotic arm automatically coats electronic silicone using a mask, ensuring that the error in the 11cm reaction zone is within ±2%.

[0014] Preferably, the shield-type positioning unit includes;

[0015] The dual-end cooperative positioning system deploys a set of high-precision CMOS cameras in both the anode and cathode chambers, and performs positioning through side wall transmission observation.

[0016] The shield tunneling machine-like positioning algorithm simplifies the electrodes into a "tunneling face" and calculates the spatial deflection angle through real-time image feedback.

[0017] The three-axis mechanical leveling mechanism uses piezoelectric ceramic drive electrode clamps and has a resolution of ±0.1µm; the dynamic compensation formula is Δθ=k·∫(δA-δC)dt (δA / δC is the position deviation of the anode and cathode).

[0018] Transmissive positioning markers are used to set fluorescent markers in the non-reactive areas of the electrodes, which penetrate the proton exchange membrane to achieve visual capture.

[0019] Preferably, the CMOS camera of the dual-end cooperative positioning system has high resolution and transmission observation capability, and can penetrate the proton exchange membrane shielding area for electrode positioning.

[0020] Preferably, the simulated tunnel boring machine positioning algorithm calculates the spatial deflection angle of the electrodes through real-time image feedback to ensure the parallelism and positional accuracy of the electrodes.

[0021] Preferably, the triaxial mechanical leveling mechanism is driven by piezoelectric ceramics and has a resolution of +0.1µm, which can accurately adjust the position and angle of the electrodes.

[0022] Preferably, the dynamic compensation formula Δθ=k·∫(δA-δC)dt is used to adjust the position and angle of the electrodes in real time to ensure the parallelism and positional accuracy of the anode and cathode.

[0023] Preferably, the transmissive positioning marker includes fluorescent marker points set in the non-reactive area of ​​the electrode, which can penetrate the proton exchange membrane blocking area to achieve visual capture and ensure positioning accuracy.

[0024] Preferably, the integrated H-type electrolytic cell adopts an integrated design, with the positioning system integrated with the electrolytic cell, avoiding compatibility issues with external systems and ensuring positioning accuracy at the ±0.1mm level.

[0025] Preferably, the integrated H-type electrolytic cell includes an electrolytic cell support with guide rails, which is compatible with standard H-type cells and facilitates electrode installation and positioning. The integrated H-type electrolytic cell also includes a detachable positioning module, which reduces user costs and facilitates system maintenance and upgrades.

[0026] Compared with the prior art, the beneficial effects of the present invention are:

[0027] 1. For the first time, the bidirectional positioning algorithm of tunnel boring machines was ported to an electrochemical device.

[0028] 2. A unique transmission marking + dual visual feedback scheme overcomes the problem of proton membrane occlusion.

[0029] 3. Functional integration (cutting + gluing + positioning) forms a closed-loop technology. Attached Figure Description

[0030] Figure 1 This is an overall architecture diagram of an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to the present invention;

[0031] Figure 2 This is a diagram of the electrode pretreatment unit of an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to the present invention.

[0032] Figure 3 This is a diagram of the shield positioning unit of an H-type electrolytic cell system with precise control of reaction area and shield positioning function according to the present invention.

[0033] Figure 4 This is a schematic diagram of the overall structure of an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to the present invention.

[0034] Figure 5 This is a schematic diagram of the laser cutting module structure in the electrode pretreatment unit of the present invention;

[0035] Figure 6 This is a schematic diagram of the microporous coating device in the electrode pretreatment unit of the present invention;

[0036] Figure 7 This is a schematic diagram of the dual-camera positioning structure of the present invention;

[0037] Figure 8 This is a schematic diagram of the H-type electrolytic cell structure of the present invention.

[0038] In the diagram: 1. Laser cutting device; 2. Microporous coating device; 3. Scanning and positioning device; 31. Electrolytic cell guide rail support; 32. CMOS camera; 33. H-type electrolytic cell; 34. Piezoelectric ceramic actuator; 35. Electrode clamp. Detailed Implementation

[0039] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0040] Please see Figure 1-8 This invention provides a technical solution: an H-type electrolytic cell system with precise control of reaction area and shield-type positioning function, comprising an electrode pretreatment unit, a shield-type positioning unit, and an integrated H-type electrolytic cell, wherein:

[0041] The electrode pretreatment unit is used to precisely cut electrode sheets and automatically coat them with electronic silicone.

[0042] The shield-type positioning unit is used to achieve precise positioning of the electrodes through a dual-end cooperative positioning system and a three-axis mechanical leveling mechanism;

[0043] Integrated H-type electrolytic cells are used to house electrodes and carry out electrochemical reactions.

[0044] Furthermore, the electrode pretreatment unit includes:

[0045] The laser cutting module is used to cut 1x2cm electrode sheets with an accuracy of +0.05mm. Through the settings of the laser cutting module, a fiber laser with a wavelength of 1064nm is used, along with a high-precision galvanometer system (repeat positioning accuracy ±0.02mm). The cutting trajectory is controlled by a preset path program. After cutting, the edge flatness is inspected by an optical microscope (magnification x100) to ensure that there are no burrs (burr height <0.01mm).

[0046] A microporous coating robot arm automatically coats electronic silicone using a mask, ensuring the error in the 11cm reaction zone is within ±2%. The robot arm is designed with a stainless steel mask whose aperture size matches the reaction zone (11cm x 1cm, tolerance ±0.1mm), and is fixed to the electrode surface via vacuum adsorption. The coating path is achieved by a 0.1mm diameter dispensing needle mounted at the end of the robot arm, moving at a uniform speed of 0.05mm / s, with the coating amount controlled at 0.02mL / cm² (adjusted in real-time via a flow meter). After coating, the silicone is cured by irradiation with a UV lamp (wavelength 365nm, power 5W / cm²) for 30 seconds, resulting in a uniform coating thickness of ±5µm after curing.

[0047] Furthermore, the shield-type positioning unit includes;

[0048] The dual-end collaborative positioning system deploys a set of high-precision CMOS cameras in both the anode and cathode chambers. Positioning is achieved through sidewall transmission observation. A set of high-precision CMOS cameras (resolution 2592x1944, frame rate 60fps) with a lens angle of 120° and a transmission observation wavelength range of 400-700nm (compatible with fluorescent markers) are installed on the sidewalls of the anode and cathode chambers (5mm from the electrode surface). The cameras then capture fluorescent markers in the non-reactive areas of the electrodes (see below) through the transmitted light from the proton exchange membrane (such as Nafion117, 50um thickness). The spatial deflection angle of the electrodes is calculated using a binocular vision algorithm.

[0049] The shield tunneling machine-like positioning algorithm simplifies the electrodes to a "tunneling face" and calculates the spatial deflection angle through real-time image feedback. The algorithm process includes:

[0050] 1. Image Acquisition: The camera acquires the position coordinates (in pixels) of the fluorescent markers at a frequency of 10fps;

[0051] 2. Coordinate transformation: The pixel coordinates are converted into actual spatial coordinates (accuracy ±0.01mm) using a calibration board (chessboard calibration board, size 10x10mm);

[0052] 3. Angle Calculation: Based on the coordinate data of the dual cameras, calculate the angle Δθ = ∫(δA - δC) between the normal vectors of the anode and cathode, where δA and δC are the position deviations of the anode and cathode (unit: mm);

[0053] 4. Dynamic compensation: Adjust the electrode position according to the formula Δθ=k·∫(δA-δC)dt (δA / δC is the deviation of the anode and cathode positions) (k is the proportionality coefficient, with a value of 0.1-0.5, calibrated according to experimental requirements);

[0054] The three-axis mechanical leveling mechanism uses a piezoelectric ceramic driven electrode clamp with a resolution of ±0.1μm. The dynamic compensation formula is Δθ=k·∫(δA-δC)dt (δA / δC is the position deviation of the anode and cathode). The driving method uses a piezoelectric ceramic actuator (model PIP-611, resolution ±0.1μm) to drive the electrode clamp to move in the X / Y / Z axis directions. The leveling accuracy is monitored in real time by a closed-loop feedback control system (PID algorithm) to monitor the electrode position and adjust the resolution to ±0.1μm, ensuring that the parallelism deviation of the anode and cathode is <0.5° (corresponding to a height difference <0.01mm).

[0055] Transmissive positioning markers are placed in the non-reactive area of ​​the electrode, with fluorescent markers penetrating the proton exchange membrane to achieve visual capture. The marker design places fluorescent markers (material: CdSe quantum dots, emission wavelength 620nm, particle size 5nm) in the non-reactive area of ​​the electrode (1mm wide edge area). The marker spacing is fixed at 5mm using a screen printing process (screen aperture 100μm), and the markers are distributed in a rectangular array. The transmittance of the fluorescent markers through the proton exchange membrane is >80%@620nm. After being captured by the camera, the spatial position of the electrode is calculated.

[0056] Furthermore, the CMOS camera of the dual-end cooperative positioning system has high resolution and transmission observation capabilities, enabling it to penetrate the proton exchange membrane shielding area for electrode positioning.

[0057] Furthermore, the simulated tunnel boring machine positioning algorithm calculates the spatial deflection angle of the electrodes through real-time image feedback, ensuring the parallelism and positional accuracy of the electrodes.

[0058] Furthermore, the triaxial mechanical leveling mechanism is driven by piezoelectric ceramics and has a resolution of +0.1µm, enabling precise adjustment of the position and angle of the electrodes.

[0059] Furthermore, the dynamic compensation formula Δθ=k·∫(δA-δC)dt is used to adjust the position and angle of the electrodes in real time to ensure the parallelism and positional accuracy of the anode and cathode.

[0060] Furthermore, the transmissive positioning marker includes fluorescent marker points set in the non-reactive area of ​​the electrode, which can penetrate the proton exchange membrane blocking area to achieve visual capture and ensure positioning accuracy.

[0061] Furthermore, the integrated H-type electrolytic cell adopts an integrated design, with the positioning system integrated with the electrolytic cell, avoiding compatibility issues with external systems and ensuring positioning accuracy at the ±0.1mm level.

[0062] Furthermore, the integrated H-type electrolytic cell includes an electrolytic cell support with guide rails, compatible with standard H-type cells, facilitating electrode installation and positioning. The integrated H-type electrolytic cell also includes a detachable positioning module, reducing user costs and facilitating system maintenance and upgrades. The support structure is made of aluminum alloy profile (model 6061-T6) with guide rails, compatible with standard H-type cells (size: 10cm x 5cm x 5cm). The guide rail tolerance is ±0.05mm, ensuring smooth sliding of the electrode clamps and electrolysis. The two sides of the cell are equipped with detachable positioning modules (material: polyetheretherketone PEEK, temperature resistance 250℃C), which are connected by snap-fit ​​(locking force >5N). Users can quickly change to different sizes of electrolytic cells (such as 5cm, 10cm width). The anode and cathode chambers are sealed with silicone O-rings (inner diameter 3mm, cross-sectional diameter sealing, pressure resistance >0.5MPa; 1mm) between them. The electrode clamps adopt a spring loading design (pressure adjustable range 0.1-1N) to avoid electrode deformation caused by excessive clamping force.

[0063] Example: Using a platinum-carbon electrode (Pt / C, loading 1 mg / cm³) 2 Taking the positioning in an H-type electrolytic cell as an example, the operation procedure is as follows:

[0064] 1. Electrode pretreatment

[0065] The laser cutting module cuts the platinum-carbon electrode to 1x2cm with an accuracy of ±0.05mm;

[0066] The microporous coating robot applies silicone through a mask, and the area of ​​the reaction zone after curing has an error of ±1.5% (measured value).

[0067] 2. Coarse positioning: The electrodes are placed into the mechanical fixture, placed in the electrolytic cell support, and the anode and cathode chambers are initially aligned using the guide rails.

[0068] 3. Shield positioning mode:

[0069] The system activates dual cameras to scan fluorescent markers and calculates Δθ = 0.8° (initial deviation).

[0070] The piezoelectric ceramic actuator adjusts the electrode position according to the dynamic compensation formula, reducing Δθ to 0.3° within 5 seconds;

[0071] The final electrode was locked with a parallelism deviation of 0.4° (measured value <0.5°).

[0072] 4. Electrolyte injection: Inject 0.5M H2SO4 solution (flow rate 1mL / min) through a syringe to start the electrochemical reaction.

[0073] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. An H-type electrolytic cell system with precise control of reaction area and shield-type positioning function, characterized in that, It includes an electrode pretreatment unit, a shield-type positioning unit, and an integrated H-type electrolytic cell, wherein: The electrode pretreatment unit is used to precisely cut electrode sheets and automatically coat them with electronic silicone. The shield-type positioning unit is used to achieve precise positioning of the electrodes through a dual-end cooperative positioning system and a three-axis mechanical leveling mechanism; Integrated H-type electrolytic cells are used to house electrodes and carry out electrochemical reactions.

2. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 1, characterized in that, The electrode pretreatment unit includes: Laser cutting module for cutting 1x2cm electrode sheets with an accuracy of +0.05mm; The microporous coating robotic arm automatically coats electronic silicone using a mask, ensuring that the error in the 11cm reaction zone is within ±2%.

3. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 1, characterized in that, The shield-type positioning unit includes: The dual-end cooperative positioning system deploys a set of high-precision CMOS cameras in both the anode and cathode chambers, and performs positioning through side wall transmission observation. The positioning algorithm, which mimics that of a tunnel boring machine, simplifies the electrodes into a "tunneling face" and calculates the spatial deflection angle through real-time image feedback. The three-axis mechanical leveling mechanism uses piezoelectric ceramic drive electrode clamps and has a resolution of ±0.1µm; the dynamic compensation formula is Δθ=k·∫(δA-δC)dt (δA / δC is the position deviation of the anode and cathode). Transmissive positioning markers are used to set fluorescent markers in the non-reactive areas of the electrodes, which penetrate the proton exchange membrane to achieve visual capture.

4. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 3, characterized in that, The CMOS camera of the dual-end cooperative positioning system has high resolution and transmission observation capabilities, and can penetrate the proton exchange membrane shielding area for electrode positioning.

5. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 3, characterized in that, The simulated tunnel boring machine positioning algorithm calculates the spatial deflection angle of the electrodes through real-time image feedback, ensuring the parallelism and positional accuracy of the electrodes.

6. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 3, characterized in that, The triaxial mechanical leveling mechanism is driven by piezoelectric ceramics and has a resolution of +0.1µm, enabling precise adjustment of the position and angle of the electrodes.

7. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 3, characterized in that, The dynamic compensation formula Δθ=k·∫(δA-δC)dt is used to adjust the position and angle of the electrodes in real time to ensure the parallelism and positional accuracy of the anode and cathode.

8. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 3, characterized in that, The transmissive positioning markers include fluorescent markers set in the non-reactive area of ​​the electrode, which can penetrate the proton exchange membrane's shielding area to achieve visual capture and ensure positioning accuracy.

9. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 1, characterized in that, The integrated H-type electrolytic cell adopts an integrated design, with the positioning system integrated with the electrolytic cell, avoiding compatibility issues with external systems and ensuring positioning accuracy at the ±0.1mm level.

10. The H-type electrolytic cell system with precise control of reaction area and shield-type positioning function according to claim 1, characterized in that, The integrated H-type electrolytic cell includes an electrolytic cell support with guide rails, which is compatible with standard H-type cells and facilitates electrode installation and positioning. The integrated H-type electrolytic cell also includes a detachable positioning module, which reduces user costs and facilitates system maintenance and upgrades.

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