A multi-layer ion sputtering coating device and process

Abstract

The present application relates to sputtering coating technical field, specifically to a kind of multilayer ion sputtering coating device and process, multilayer ion sputtering coating process includes using multilayer ion sputtering coating device to coat;Multilayer ion sputtering coating device includes shell, sputtering target head, installation shell, base, material return mechanism and material conveying mechanism, sputtering target head is inserted in shell, and it is directed to the piece to be coated;Installation shell is provided with material conveying channel and material return channel, material conveying channel and material return channel can be communicated with entrance and exit;Base is clamped with multiple target materials of different materials when in use;Material return mechanism is configured to be able to transport target material located at target seat back to base through material return channel;Material conveying mechanism is configured to be able to transport target material located at base to target seat through material conveying channel, so that multilayer coating of the piece to be coated can be realized, and cross contamination does not appear between different target materials, while guaranteeing coating efficiency, it is beneficial to improve coating quality.

Description

Technical Field

[0001] This invention relates to the field of sputtering coating technology, and in particular to a multilayer ion sputtering coating apparatus and process. Background Technology

[0002] Sputtering is an important physical vapor deposition (PVD) technology that is widely used in semiconductors, optics, storage devices, solar cells, architectural glass and other fields. Its basic principle is to use high-energy particles to bombard the surface of a target material under vacuum conditions, causing the target atoms or atomic groups to escape and deposit on the substrate to form a thin film. This process usually involves glow discharge or ion source generating energetic particles, such as argon ions, which are accelerated by an electric field to bombard the target surface, thereby achieving the deposition of the thin film.

[0003] As the performance of thin-film devices continues to improve and linewidths continue to shrink, the requirements for the quality and precision of magnetron sputtering films are becoming increasingly stringent. Multi-cavity clustered magnetron sputtering equipment is used in applications with extremely high film quality requirements because it can effectively avoid cross-contamination between different targets. However, this equipment is expensive, which limits its large-scale promotion. Therefore, alternative solutions that integrate multiple magnetron sputtering targets in a single process chamber are gradually being widely adopted. In this type of equipment, multiple sputtering targets are located in the same process chamber, and each sputtering target is equipped with an independent baffle. These baffles can protect the sputtering targets to a certain extent and can block some impurity particles from contaminating the sputtering targets when not in operation.

[0004] However, since all sputtering targets are at the same height, there will inevitably be gaps between the baffle and the sputtering target. When other sputtering targets are performing sputtering processes, the target particles will move irregularly in the complex plasma environment. Some particles will pass through the gap between the baffle and the sputtering target and be deposited on the surface of the non-working sputtering target. This cross-contamination will change the original composition and structure of the target material. Over time, it will eventually have a negative impact on the quality of the film layer formed by subsequent sputtering deposition on the target material. Summary of the Invention

[0005] Therefore, it is necessary to provide a multilayer ion sputtering coating apparatus and process to address the problem of poor film quality in current multilayer sputtering coatings.

[0006] The above objectives are achieved through the following technical solutions:

[0007] A multilayer ion sputtering coating apparatus, the multilayer ion sputtering coating apparatus comprising:

[0008] shell;

[0009] A sputtering target head is inserted into the housing and points towards the workpiece to be coated. The sputtering target head includes a connecting arm, a target base, and a shield. The connecting arm is disposed on the housing. The target base is disposed on the connecting arm and is used to hold the target material. The shield covers the target base and the connecting arm and is pressed against the target material during use. The shield can slide along the extension direction of the connecting arm, and an inlet / outlet is provided on the side wall of the shield.

[0010] A mounting shell is disposed on the connecting arm and can slide in a direction parallel to the extension direction of the connecting arm. The mounting shell is provided with a material conveying channel and a material return channel, both of which can communicate with the inlet and outlet.

[0011] A base is inserted into the mounting housing. The base is slidable in a direction parallel to the extension direction of the connecting arm. When in use, the base holds multiple targets made of different materials.

[0012] A return mechanism, configured to transport the target material located at the target holder back to the base through the return channel;

[0013] A feeding mechanism configured to transport the target material located at the base to the target base via the feeding channel.

[0014] Furthermore, the return material mechanism includes a guide rail and two first clamping members. The guide rail has a U-shaped structure and is inserted into the shielding cover. The opening of the guide rail faces the inlet and outlet and communicates with the inlet and outlet. The guide rail is configured to guide the target material and the target base to be aligned. The two first clamping members are both inserted into the return material channel and are symmetrically located on both sides of the return material channel. Both can slide in a direction perpendicular to the extension direction of the connecting arm. The first clamping member has a U-shaped structure and the opening of the first clamping member faces the inlet and outlet. The first clamping member has an L-shaped first sliding part and a V-shaped first clamping part. The first clamping part is elastic and configured to clamp the target material.

[0015] Further, the feeding mechanism includes a rotating rod, a wedge block, a reset member, two second clamping members, and two first adjusting members. The rotating rod is inserted into the mounting housing and extends in a direction perpendicular to the extension direction of the connecting arm. The rotating rod is rotatable about a first axis, which extends in a direction parallel to the extension direction of the connecting arm. The wedge block is disposed at the end of the rotating rod away from the first axis. The wedge block is slidable in a direction parallel to the extension direction of the connecting arm and can form a stop engagement with the target material. It is also rotatable about a second axis, which is parallel to the first axis. The reset member is configured to reset the wedge block. The two second clamping members are both inserted into the feeding channel and are symmetrically located on both sides of the feeding channel. The second clamping members have a U-shaped structure, with the opening of the second clamping member facing away from the inlet / outlet. The second clamping member has an L-shaped base and a V-shaped second clamping portion. The second clamping portion is elastic and configured to clamp the target material. The first adjusting members are configured to change the size of the opening of the second clamping member.

[0016] Furthermore, the feeding mechanism includes two third clamping members and two second adjusting members. The two third clamping members are both inserted into the feeding channel and are symmetrically located on both sides of the feeding channel. They are both capable of sliding in a direction perpendicular to the extension direction of the connecting arm. The third clamping member has a U-shaped structure, and the opening of the third clamping member faces away from the inlet and outlet. The third clamping member has an L-shaped second sliding part and a V-shaped third clamping part. The third clamping part is elastic and configured to clamp the target material. The second adjusting members are configured to change the size of the opening of the third clamping member.

[0017] Furthermore, a plurality of spring pieces are provided between the second sliding part and the third clamping part.

[0018] Furthermore, the sputtering target head also includes a rotating arm, which is disposed on the outer shell and hinged to the connecting arm, and is capable of rotating about its own axis.

[0019] Furthermore, the multilayer ion sputtering coating apparatus also includes a first driving member configured to provide a driving force for the rotation of the rotating arm.

[0020] Furthermore, the multilayer ion sputtering coating apparatus also includes a second drive member configured to provide a driving force for the connecting arm to rotate about the hinge point.

[0021] Furthermore, there are multiple sputtering targets.

[0022] The present invention also provides a multilayer ion sputtering coating process, which employs a multilayer ion sputtering coating apparatus, and the multilayer ion sputtering coating process includes the following steps:

[0023] S1. Clamp multiple targets of different materials onto the base;

[0024] S2. Place the part to be coated inside the housing;

[0025] S3. Move the shielding cover away from the target base;

[0026] S4. Drive the mounting shell to slide until it connects with the material conveying channel and the inlet / outlet;

[0027] S5. Drive the base to slide until one of the targets and the material conveying channels correspond;

[0028] S6. The target material is conveyed to the target base through the conveying channel by the conveying mechanism;

[0029] S7. Move the shielding cover closer to the target base until it is pressed against the target material;

[0030] S8, coating;

[0031] S9. Move the shielding cover away from the target base;

[0032] S10, Drive the mounting shell to slide to connect with the return material channel and the inlet / outlet;

[0033] S11, Move the base to slide until it corresponds to the target material at the target base;

[0034] S12. The target material located at the target base is transported back to the base through the return channel by the return mechanism;

[0035] S13. Repeat steps S4 to S12 to complete the multilayer coating.

[0036] The beneficial effects of this invention are:

[0037] This invention relates to a multilayer ion sputtering coating apparatus and process. The multilayer ion sputtering coating process includes coating using a multilayer ion sputtering coating apparatus. During use, the feeding mechanism of the multilayer ion sputtering coating apparatus can accurately and stably transport targets of different materials located at the base to the target position via the feeding channel. After the target at the target position completes the sputtering coating task, the return mechanism transports the used target back to the base through the return channel. Through the coordinated operation of the feeding mechanism and the return mechanism, multilayer coating of the workpiece to be coated can be achieved, and cross-contamination between different targets will not occur, which is beneficial to improving the coating quality. Attached Figure Description

[0038] Figure 1 This is a three-dimensional cross-sectional view of the multilayer ion sputtering coating apparatus provided in an embodiment of the present invention;

[0039] Figure 2 A three-dimensional structural schematic diagram of a multilayer ion sputtering coating apparatus with the outer shell removed, provided in an embodiment of the present invention;

[0040] Figure 3 A three-dimensional cross-sectional view of the multilayer ion sputtering coating apparatus with the outer shell removed, provided in an embodiment of the present invention;

[0041] Figure 4 A three-dimensional cross-sectional view of the sputtering target head of the multilayer ion sputtering coating apparatus provided in an embodiment of the present invention, with the shielding removed.

[0042] Figure 5 A three-dimensional cross-sectional view of the shielding cover and guide rail assembly of the multilayer ion sputtering coating apparatus provided in an embodiment of the present invention.

[0043] Figure 6 A cross-sectional view of the mounting housing of the multilayer ion sputtering coating apparatus provided in an embodiment of the present invention;

[0044] Figure 7 A three-dimensional cross-sectional view of the base, second drive cylinder and target material assembly of the multilayer ion sputtering coating apparatus provided in an embodiment of the present invention;

[0045] Figure 8 A three-dimensional structural diagram of the first clamping member, the spring, and the third drive cylinder of the multilayer ion sputtering coating apparatus provided in the embodiment of the present invention during assembly.

[0046] Figure 9 A three-dimensional structural diagram of the second clamping member, the spring, and the fourth drive cylinder of the multilayer ion sputtering coating apparatus provided in an embodiment of the present invention during assembly.

[0047] Figure 10 A three-dimensional structural diagram of the rotating rod, toothed column, wedge block and reset component of the multilayer ion sputtering coating apparatus provided in the embodiment of the present invention during assembly;

[0048] Figure 11 Working principle of the multilayer ion sputtering coating apparatus provided in the embodiments of the present invention Figure 1 ;

[0049] Figure 12 Working principle of the multilayer ion sputtering coating apparatus provided in the embodiments of the present invention Figure 2 ;

[0050] Figure 13 Working principle of the multilayer ion sputtering coating apparatus provided in the embodiments of the present invention Figure 3 ;

[0051] Figure 14 Working principle of the multilayer ion sputtering coating apparatus provided in the embodiments of the present invention Figure 4 ;

[0052] Figure 15 Working principle of the multilayer ion sputtering coating apparatus provided in the embodiments of the present invention Figure 5 ;

[0053] Figure 16 Working principle of the multilayer ion sputtering coating apparatus provided in the embodiments of the present invention Figure 6 .

[0054] in:

[0055] 1. Outer shell; 2. Sputtering target head; 201. Connecting arm; 2011. Sliding column; 2012. Ring platform; 202. Target base; 203. Shielding cover; 2031. Inlet / outlet; 2032. Crimping ring; 2033. First ring groove; 2034. Telescopic rod; 204. Rotating arm; 2041. Hinge column; 2042. Second sliding groove; 3. Mounting shell; 301. Material conveying channel; 302. Material return channel; 303. Mounting block; 304. Arc block; 305. Sliding block; 306. Support cover; 307. First sliding groove; 4. Base; 401. Clamping piece; 501. Guide rail; 5011. Clearance groove; 502. 5021, First sliding part; 5022, First clamping part; 601, Rotating rod; 6011, Mounting ring; 602, Wedge block; 6021, Inclined surface; 6022, Straight surface; 603, Reset part; 6031, Magnetic block; 604, Second clamping part; 6041, Base; 6042, Second clamping part; 605, Fourth drive cylinder; 6061, Gear column; 6062, First gear; 6063, First drive motor; 7, Spring piece; 8, First clamping ring; 9, Clamping seat; 901, Second clamping ring; 10, First drive cylinder; 11, Second drive cylinder; 12, Third drive cylinder; 14, Target material. Detailed Implementation

[0056] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below through embodiments and in conjunction with the accompanying drawings. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

[0057] The component designations used in this document, such as "first" and "second," are merely for distinguishing the described objects and do not have any sequential or technical meaning. The terms "connection" and "linkage," unless otherwise specified, include both direct and indirect connections (linkages). In the description of this invention, it should be understood that the terms "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," and "counterclockwise," indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are only for the convenience of describing the invention and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the invention.

[0058] like Figures 1 to 16 As shown, the multilayer ion sputtering coating apparatus provided in this embodiment of the invention is used to coat a workpiece, and is configured to include a housing 1, a sputtering target head 2, a mounting housing 3, a base 4, a return mechanism, and a conveying mechanism. The sputtering target head 2 is inserted into the housing 1 and points towards the workpiece to be coated. The sputtering target head 2 includes a connecting arm 201, a target holder 202, and a shielding cover 203. The connecting arm 201 is disposed on the housing 1. The target holder 202 is disposed on the connecting arm 201 and is used to place the target material 14. The shielding cover 203 covers the target holder 202 and the connecting arm 201, and is pressed against the target material 14 during use. The shielding cover 203 can slide along the extension direction of the connecting arm 201, and an inlet / outlet is provided on the side wall of the shielding cover 203. 2031; The mounting shell 3 is disposed on the connecting arm 201 and can slide in a direction parallel to the extension direction of the connecting arm 201. The mounting shell 3 is provided with a material conveying channel 301 and a material return channel 302. Both the material conveying channel 301 and the material return channel 302 can communicate with the inlet / outlet 2031; The base 4 is inserted into the mounting shell 3 and can slide in a direction parallel to the extension direction of the connecting arm 201. When in use, the base 4 holds multiple target materials 14 of different materials; The material return mechanism is configured to transport the target material 14 located at the target base 202 back to the base 4 through the material return channel 302; The material conveying mechanism is configured to transport the target material 14 located at the base 4 to the target base 202 through the material conveying channel 301.

[0059] Specifically, in this embodiment, the sputtering target head 2 is mounted on the top of the housing 1; the connecting arm 201 is a columnar structure and is vertically placed inside the housing 1; the target base 202 is located at the bottom of the connecting arm 201; the target material 14 is a disc-shaped structure and is placed at the bottom of the target base 202 during installation; the shielding cover 203 is an annular structure and is fitted around the outer periphery of the target base 202 and the connecting arm 201, ensuring that the target material 14 can be exposed and ensuring normal sputtering of the target material 14; to facilitate pressing the target material 14, a pressing ring 2032 is provided on the inner peripheral wall of the bottom of the shielding cover 203. During use, the pressing ring 2032 is pressed onto the target material 14 from bottom to top to ensure that the target can be fixed. Material 14; To facilitate the sliding of the shield 203 along the extension direction of the connecting arm 201, a first annular groove 2033 is provided on the inner peripheral wall of the shield 203. The first annular groove 2033 also penetrates the top surface of the shield 203. Multiple telescopic rods 2034 are provided on the shield 203. The multiple telescopic rods 2034 are all vertically arranged at the bottom of the first annular groove 2033 and arranged circumferentially, and are all slidably inserted into the connecting arm 201. The inlet and outlet 2031 has an arc-shaped structure and is coaxially opened on the bottom circumferential side wall of the shield 203, and contacts the crimping ring 2032 to ensure that the target material 14 can pass through the inlet and outlet 2031 normally.

[0060] Optionally, the driving force for the sliding of the telescopic rod 2034 can be provided by hydraulic, pneumatic, or electric means. When the driving force for the sliding of the telescopic rod 2034 is provided by hydraulic means, the telescopic rod 2034 and the external hydraulic source together form a hydraulic cylinder-like structure. When the driving force for the sliding of the telescopic rod 2034 is provided by pneumatic means, the telescopic rod 2034 and the external pneumatic source together form a pneumatic cylinder-like structure. When the driving force for the sliding of the telescopic rod 2034 is provided by electric means, the telescopic rod 2034 and the external electric source together form an electric cylinder-like structure.

[0061] The mounting shell 3 is a columnar shell structure and is vertically positioned during installation. A mounting block 303 is provided on the outer peripheral wall of the mounting shell 3, and an arc block 304 is provided on the mounting block 303. The arc block 304 is located on the side wall of the mounting block 303 away from the axis of the mounting shell 3, and the arc block 304 points towards the axis of the mounting shell 3. During installation, it slides and covers the outer peripheral wall of the shielding cover 203. The return channel 302 and the conveying channel 301 are both horizontally positioned, and the return channel 302 is located below the conveying channel 301. Both the return channel 302 and the conveying channel 301 are simultaneously positioned through the arc block 304, the mounting block 303 and the circumferential side wall of the mounting shell 3.

[0062] To facilitate the connection of the mounting housing 3 to the connecting arm 201, two annular platforms 2012 are fitted onto the circumferential sidewall of the connecting arm 201. The two annular platforms 2012 are arranged axially at intervals, and a second annular groove is formed between the two annular platforms 2012. The multilayer ion sputtering coating device also includes a first clamping ring 8 and a clamping seat 9. A second clamping ring 901 is provided at the end of the clamping seat 9. The first clamping ring 8 and the second clamping ring 901 can be bolted together to form a complete annular structure during use. This annular structure is frictionally fitted into the second annular groove during installation. Multiple sliding blocks 305 are vertically arranged on the top of the mounting housing 3. The moving block 305 has a fan-shaped cross-section, and multiple sliding blocks 305 are arranged at intervals along the circumference. A support cover 306 is connected to the top of the multiple sliding blocks 305. Multiple sliding holes are provided on the top of the clamp 9. The sliding holes have a fan-shaped cross-section and are arranged at intervals along the circumference. The sliding blocks 305 are slidably inserted into the sliding holes during installation. A first drive cylinder 10 is provided on the top of the clamp 9. The output shaft of the first drive cylinder 10 is vertically upward and vertically fixed to the bottom of the support cover 306, ensuring that it can both support the mounting shell 3 and drive the mounting shell 3 to slide in the vertical direction.

[0063] Optionally, the number of sliding blocks 305 can be set to three, and they are evenly arranged in the circumferential direction; correspondingly, the number of sliding holes can be set to three, and they are evenly arranged in the circumferential direction.

[0064] Optionally, the first drive cylinder 10 can be configured as any one of a hydraulic cylinder, a pneumatic cylinder, or an electric cylinder.

[0065] The base 4 is configured as a strip structure and is vertically positioned during installation. To facilitate clamping the target material 14, several pairs of clamping pieces 401 are provided on the inner sidewall of the base 4. The pairs of clamping pieces 401 are arranged at intervals along the extension direction of the base 4, and the clamping pieces 401 of the same pair are arranged at intervals along the extension direction of the base 4, forming a clamping area for clamping the target material 14 between the clamping pieces 401 of the same pair. To facilitate the installation of the base 4, a first sliding groove 307 is provided on the inner peripheral wall of the mounting shell 3. The first sliding groove 307 is arranged along the inner peripheral wall of the mounting shell 3. Extending along the axial direction and positioned opposite to the mounting block 303, the base 4 is slidably inserted into the first sliding groove 307 during installation. To facilitate the provision of driving force for the sliding of the base 4, the multilayer ion sputtering coating device is configured to also include a second driving cylinder 11. The second driving cylinder 11 is inserted into the first sliding groove 307 and fixed on the inner top wall of the mounting shell 3. The output shaft of the second driving cylinder 11 is vertically downward and fixed on the top of the base 4, ensuring that it can both support the base 4 and drive the base 4 to slide in the vertical direction.

[0066] Optionally, the number of clips 401 can be set to four pairs, with the four pairs of clips 401 arranged at equal intervals along the extension direction of the base 4.

[0067] Optionally, the second drive cylinder 11 can be configured as any one of a hydraulic cylinder, a pneumatic cylinder, or an electric cylinder.

[0068] During use, firstly, multiple targets 14 of different materials are clamped onto the base 4 using clamping plates 401; then, the part to be coated is placed inside the housing 1; then, the telescopic rod 2034 is activated, which moves the shielding cover 203 away from the target base 202 to make way for the insertion of the target 14; then, the first drive cylinder 10 is activated, which simultaneously moves the mounting housing 3 and the base 4 to connect with the material conveying channel 301 and the inlet / outlet 2031; then, the second drive cylinder 11 is activated, which simultaneously moves the base 4 to one of the targets 14 corresponding to the material conveying channel 301; then, the target 14 is conveyed to the target base 202 through the material conveying channel 301 by the material conveying mechanism; then, the telescopic rod 2034 is activated, which moves the shielding cover 203 closer to the target base 202 until the pressing ring 2032 presses it onto the target 14; then, the part to be coated is coated.

[0069] After the coating is completed, the telescopic rod 2034 is activated, which moves the shielding cover 203 away from the target base 202 to make way for the removal and insertion of the target material 14. Then, the first drive cylinder 10 is activated, which simultaneously moves the mounting shell 3 and the base 4 to the point where the return channel 302 and the inlet / outlet 2031 are connected. Then, the second drive cylinder 11 is activated, which simultaneously moves the base 4 to the point where the clamping piece 401 that is not holding the target material 14 corresponds to the return channel 302. Then, the target material 14 located at the target base 202 is transported back to the base 4 through the return channel 302 by the return mechanism and clamped by the clamping piece 401 that is not holding the target material 14.

[0070] Then, the first drive cylinder 10 is activated, which simultaneously moves the mounting shell 3 and the base 4 to the material conveying channel 301 and the inlet / outlet 2031. Then, the second drive cylinder 11 is activated, which simultaneously moves the base 4 to the other target material 14 and the material conveying channel 301. Then, the target material 14 is conveyed to the target base 202 through the material conveying channel 301 by the material conveying mechanism. Then, the telescopic rod 2034 is activated, which moves the shielding cover 203 close to the target base 202 until the pressing ring 2032 presses onto the target material 14. Then, the part to be coated is coated.

[0071] Repeating the above process, through the continuous and orderly operation of the feeding mechanism and the return mechanism, when the part to be coated is subjected to multi-layer coating, the target materials 14 of different materials are always in an independent conveying and working path. Since the target materials 14 are isolated from each other during the conveying, sputtering and recycling process, cross-contamination between different target materials 14 is effectively avoided. This is of key significance for improving the coating quality, ensuring the purity and stability of each coating layer, and meeting the stringent standards of fields with extremely high coating quality requirements such as semiconductors and optics.

[0072] Optionally, to facilitate the replacement of the target 14, the bottom of the mounting shell 3 is designed to be open. The multilayer ion sputtering coating apparatus also includes a sealing ring. During installation, the sealing ring can be either interference-fitted to the bottom opening of the mounting shell 3 or threaded onto the bottom opening of the mounting shell 3. Thus, when the target 14 needs to be replaced, the sealing ring is first disengaged from the mounting shell 3. Then, the second drive cylinder 11 is activated, causing the base 4 to extend through the bottom opening of the mounting shell 3 to the outside of the mounting shell 3, allowing for the replacement of the target 14. After replacement, the second drive cylinder 11 is activated again, causing the base 4 to retract back into the mounting shell 3. The bottom opening of the mounting shell 3 is then sealed by the sealing ring, ensuring that during the sputtering coating of the target 14, some particles cannot enter the mounting shell 3 through the bottom opening, thus preventing contamination of the target 14 held on the base 4.

[0073] In some embodiments, the return mechanism is configured to include a guide rail 501 and two first clamping members 502. The guide rail 501 has a U-shaped structure and is inserted into the shield 203. The opening of the guide rail 501 faces the inlet / outlet 2031 and is connected to the inlet / outlet 2031. The guide rail 501 is configured to guide the target material 14 and the target base 202 to be aligned. The two first clamping members 502 are both inserted into the return channel 302 and are symmetrically located on both sides of the return channel 302. They are both able to slide in a direction perpendicular to the extension direction of the connecting arm 201. The first clamping member 502 has a U-shaped structure and the opening of the first clamping member 502 faces the inlet / outlet 2031. The first clamping member 502 has an L-shaped first sliding portion 5021 and a V-shaped first clamping portion 5022. The first clamping portion 5022 is elastic and is configured to clamp the target material 14.

[0074] Specifically, in this embodiment, such as Figure 5As shown, the guide rail 501 is disposed on the top surface of the crimping ring 2032, and the arc segment of the guide rail 501 and the crimping ring 2032 are coaxially disposed. The two ends of the guide rail 501 are respectively disposed corresponding to the two ends of the inlet and outlet 2031. To avoid interference, clearance grooves 5011 are provided parallel to each other on the inner sidewall of the guide rail 501 at the two straight segments. The first clamping member 502 is horizontally inserted into the return channel 302, and the first sliding part 5021 is located on the outer side. In order to facilitate the provision of driving force for the sliding of the first clamping member 502, the multilayer ion sputtering coating device is configured to also include two third driving cylinders 12. The third driving cylinders 12 are horizontally inserted into the mounting shell 3 and located below the first clamping member 502. The output shaft of the third driving cylinder 12 extends along the guide direction parallel to the return channel 302, and the output shaft of the third driving cylinder 12 is disposed on the short section of the first sliding part 5021.

[0075] During use, when the second drive cylinder 11 synchronously moves the base 4 to correspond with the clamping plate 401 that is not holding the target material 14 and the return channel 302, the third drive cylinder 12 is activated. The output shaft of the third drive cylinder 12 retracts, synchronously driving the first clamping member 502 to approach the target material 14 located at the target base 202 along the return channel 302. When the first clamping member 502 moves to the bend of the first clamping part 5022 and abuts against the target material 14, as the first clamping member 502 continues to move, under the push of the target material 14, the first clamping part 5022 moves towards the first sliding part 5021. The first clamping part 5022 swings and undergoes elastic deformation. According to the principle of action and reaction, after the first clamping part 5022 undergoes elastic deformation, it will generate a reverse pushing force on the target 14. This pushing force has the effect of moving the target 14 away from the mounting shell 3. At this time, the target 14 can maintain its original position under the limit of the guide rail 501. When the bend of the first clamping part 5022 passes the outermost edge of the target 14, the first clamping part 5022 will generate a force that pushes the target 14 towards the mounting shell 3. When the resultant force of the two first clamping parts 5022 on the target 14 is equal to the frictional force of the target 14, such as Figure 11 As shown, target 14 remains stationary.

[0076] As the first clamping member 502 continues to move, the first clamping part 5022 continues to swing under the pushing force of the target material 14, causing the resultant force of the two first clamping parts 5022 on the target material 14 to be greater than the frictional force of the target material 14. Under the action of the resultant force, the target material 14 will accelerate towards the mounting shell 3, and then stop moving due to the frictional force and the clamping resistance of the first clamping parts 5022 due to elastic reset. Figure 12 As shown.

[0077] Then the third drive cylinder 12 is activated, and the output shaft of the third drive cylinder 12 extends, synchronously driving the first clamping member 502 to move closer to the base 4 along the return channel 302. When the first clamping member 502 moves, it clamps the target material 14 together through the two first clamping parts 5022, so that the target material 14 can move to re-engage with the clamping piece 401, such as... Figure 13 As shown.

[0078] In other embodiments, the feeding mechanism may include a rotating rod 601, a wedge block 602, a reset member 603, two second clamping members 604, and two first adjusting members. The rotating rod 601 is inserted into the mounting housing 3 and extends in a direction perpendicular to the extension direction of the connecting arm 201. The rotating rod 601 can rotate about a first axis, which extends in a direction parallel to the extension direction of the connecting arm 201. The wedge block 602 is disposed at the end of the rotating rod 601 away from the first axis. The wedge block 602 can slide in a direction parallel to the extension direction of the connecting arm 201 and can form a stop with the target material 14. It can rotate around a second axis, which is parallel to the first axis; the reset member 603 is configured to reset the wedge block 602; two second clamping members 604 are inserted into the conveying channel 301 and are symmetrically located on both sides of the conveying channel 301. The second clamping member 604 has a U-shaped structure, and the opening of the second clamping member 604 faces away from the inlet / outlet 2031. The second clamping member 604 has an L-shaped base 6041 and a V-shaped second clamping part 6042. The second clamping part 6042 is elastic and is configured to clamp the target material 14; the first adjusting member is configured to change the size of the opening of the second clamping member 604.

[0079] Specifically, in this embodiment, the rotating rod 601 is horizontally inserted into the mounting block 303 and located above the material conveying channel 301. The rotating rod 601 can rotate around its inner end, and the first axis coincides with the inner end of the rotating rod 601. The outer end of the rotating rod 601 is provided with a mounting ring 6011, the axis of which extends vertically. The wedge block 602 is slidably inserted into the mounting ring 6011 during installation, and the second axis coincides with the axis of the mounting ring 6011. The wedge block 602 has an inclined surface 6021 and a straight surface 6022 arranged opposite to each other. The inclined surface 6021 can guide the wedge block 602 to move upward when the target 14 moves away from the mounting shell 3, avoiding interference. The straight surface 6022 can abut against the circumferential side wall of the target 14 after the target 14 moves away from the mounting shell 3. Subsequently, when the rotating rod 601 rotates, it can form a stop with the target 14 to push the target 14 away from the mounting shell 3. When the housing 3 moves in the direction of movement, initially, the inclined surface 6021 is positioned closer to the mounting housing 3 than the straight surface 6022. To facilitate the provision of driving force for the rotation of the rotating rod 601, the material conveying mechanism is configured to also include a drive assembly. The drive assembly includes a gear 6061, a first gear 6062, and a first drive motor 6063. The gear 6061 is vertically positioned at the inner end of the rotating rod 601, the first gear 6062 is horizontally positioned at the top of the mounting block 303 and meshes with the gear 6061, and the first drive motor 6063 is fixedly positioned at the top of the mounting block 303 with its motor shaft facing downwards in the vertical direction and coaxially fixedly inserted into the first gear 6062. This ensures that the first gear 6062 can be supported and that the rotating rod 601 can be rotated through the meshing between the first gear 6062 and the gear 6061. The second clamping member 604 is horizontally inserted into the material conveying channel 301, with its base 6041 located on the outer side.

[0080] Optionally, the reset element 603 can be configured as two magnetic blocks 6031, one of which is disposed on the inner peripheral wall of the mounting ring 6011, and the other is disposed on the wedge block 602. Initially, the magnetic poles of the two magnetic blocks 6031 are opposite on the side closest to each other. Thus, after the wedge block 602 rotates around the second axis, the two magnetic blocks 6031 are misaligned but still have a magnetic connection. Subsequently, after the face 6022 and the target material 14 disengage, the wedge block 602 can be reset under magnetic action to avoid affecting the next delivery.

[0081] Optionally, the reset element 603 can also be configured as a tension spring, compression spring, or torsion spring. In this way, after the wedge block 602 rotates around the second axis, the tension spring, compression spring, or torsion spring can undergo elastic deformation and store force. Subsequently, after the face 6022 and the target material 14 disengage, the tension spring, compression spring, or torsion spring can release and drive the wedge block 602 to reset, thus avoiding affecting the next delivery.

[0082] Optionally, the first adjusting member can be configured as a fourth driving cylinder 605. The output shaft of the fourth driving cylinder 605 is parallel to the short section of the base 6041 and is fixedly mounted on the short section of the second clamping part 6042. Thus, before the third driving cylinder 12 is activated, the fourth driving cylinder 605 can drive the second clamping part 6042 to swing towards the base 6041, causing the second clamping part 6042 to undergo elastic deformation, thus avoiding affecting the normal movement of the base 4. After the base 4 slides to the point where one of the target materials 14 corresponds to the material conveying channel 301, the fourth driving cylinder 605 is turned off, and the second clamping part 6042 resets under elastic action, pushing the target material 14 to move away from the mounting shell 3 until it forms a stop engagement with the straight surface 6022.

[0083] Optionally, the first adjusting element can also be a permanent magnet and an electromagnet, wherein the permanent magnet is disposed in the short section of the second clamping part 6042, and the electromagnet is disposed on the mounting shell 3. In this way, before the third drive cylinder 12 is started, the electromagnet can be activated to generate magnetic force and establish a magnetic connection with the permanent magnet. Under the action of magnetic force, the permanent magnet synchronously drives the second clamping part 6042 to swing towards the base 6041. The second clamping part 6042 undergoes elastic deformation to avoid affecting the normal movement of the base 4. After the base 4 slides to the point where one of the target materials 14 corresponds to the feeding channel 301, the electromagnet is turned off. The second clamping part 6042 resets under the action of elasticity and pushes the target material 14 to move away from the mounting shell 3 until it forms a stop with the straight surface 6022.

[0084] Taking the reset component 603 as two magnetic blocks 6031 and the first adjusting component as the fourth drive cylinder 605 as an example, initially, if Figure 14 As shown, the fourth drive cylinder 605 is in the open state, and the fourth drive cylinder 605 drives the second clamping part 6042 to swing towards the base 6041, and the second clamping part 6042 undergoes elastic deformation.

[0085] During use, when the base 4 slides until one of the target materials 14 aligns with the feeding channel 301, the fourth drive cylinder 605 is closed, the second clamping part 6042 resets under elastic action, and pushes the target material 14 to move away from the mounting shell 3; during the movement of the target material 14, the target material 14 first guides the wedge block 602 to move upward through the guide engagement with the inclined surface 6021 to avoid interference, such as Figure 15 As shown, it then abuts against the surface 6022 and forms a stop engagement; then the first drive motor 6063 is started. The first drive motor 6063 drives the rotating rod 601 to rotate through the meshing between the first gear 6062 and the gear column 6061. The rotating rod 601 synchronously drives the wedge block 602 to revolve around the second axis while rotating around the second axis. The wedge block 602 pushes the target material 14 away from the mounting shell 3 through the stop engagement with the target material 14. Figure 16 As shown, this allows the target 14 to move to the guide rail 501 and achieve automatic centering, while also causing the two magnetic blocks 6031 to be misaligned.

[0086] As the rotating rod 601 rotates, when the straight surface 6022 and the target material 14 disengage, the magnetic block 6031 drives the wedge block 602 to reset under the action of magnetism, so as to avoid affecting the next conveying.

[0087] In other embodiments, the feeding mechanism may also be configured to include two third clamping members and two second adjusting members. The two third clamping members are inserted into the feeding channel 301 and are symmetrically located on both sides of the feeding channel 301. They are both able to slide in a direction perpendicular to the extension direction of the connecting arm 201. The third clamping member has a U-shaped structure and the opening of the third clamping member faces away from the inlet / outlet 2031. The third clamping member has an L-shaped second sliding part and a V-shaped third clamping part. The third clamping part is elastic and configured to clamp the target material 14. The second adjusting members are configured to change the size of the opening of the third clamping member.

[0088] Specifically, in this embodiment, the third clamping member is horizontally inserted into the material conveying channel 301, and the second sliding part is located on the outside. In order to facilitate the provision of driving force for the sliding of the third clamping member, the multilayer ion sputtering coating device is configured to further include two fifth driving cylinders. The fifth driving cylinders are horizontally inserted into the mounting shell 3 and located above the third clamping member. The output shaft of the fifth driving cylinder extends along the guide direction parallel to the material conveying channel 301, and the output shaft of the fifth driving cylinder is disposed on the short section of the second sliding part.

[0089] Optionally, the second adjusting member can be configured as a sixth driving cylinder, which is disposed on the long section of the second sliding part and near the end. The output shaft of the sixth driving cylinder is parallel to the short section of the second sliding part and is fixedly disposed on the short section of the third clamping part.

[0090] Optionally, the second adjusting member can also be a permanent magnet and an electromagnet, wherein the permanent magnet is disposed on the short section of the third clamping part, and the electromagnet is disposed on the long section of the second sliding part, and is disposed near the end.

[0091] Taking the second adjusting member as the sixth driving cylinder as an example, initially, the sixth driving cylinder is in the open state. The sixth driving cylinder drives the third clamping part to swing towards the second sliding part, and the third clamping part undergoes elastic deformation.

[0092] During use, when the base 4 slides to correspond with one of the targets 14 and the feeding channel 301, the sixth drive cylinder is closed, the third clamping part is reset under elastic action, and pushes the target 14 to move away from the mounting shell 3; then the fifth drive cylinder is started, the output shaft of the fifth drive cylinder extends, and synchronously drives the third clamping part to move away from the mounting shell 3 along the feeding channel 301. When the third clamping part moves, it clamps the target 14 together through the two third clamping parts, so that the target 14 can move to the guide rail 501 and achieve automatic centering.

[0093] In other embodiments, a plurality of spring pieces 7 are provided between the first sliding portion 5021 and the first clamping portion 5022, or between the base portion 6041 and the second clamping portion 6042, or between the second sliding portion and the third clamping portion.

[0094] Specifically, in this embodiment, the spring piece 7 has a Z-shaped structure and is horizontally disposed between the first sliding part 5021 and the first clamping part 5022, or between the base 6041 and the second clamping part 6042, or between the second sliding part and the third clamping part. Multiple spring pieces 7 are arranged at intervals along the guiding direction of the material conveying channel 301 or the return channel 302, with adjacent spring pieces 7 on the same side arranged symmetrically. Thus, when the first clamping part 5022, the second clamping part 6042, and the third clamping part undergo elastic deformation, the arrangement of the spring piece 7 can increase the elastic force of the first clamping part 5022, the second clamping part 6042, and the third clamping part, thereby enhancing the pushing effect of the first clamping part 5022, the second clamping part 6042, and the third clamping part on the target material 14.

[0095] In other embodiments, to enable the sputtering target 2 to be oriented adjustable, the sputtering target 2 is configured to further include a rotating arm 204, which is disposed on the housing 1 and forms a hinged engagement with the connecting arm 201, and is capable of rotating around its own axis.

[0096] Specifically, in this embodiment, the top end of the rotating arm 204 is vertically positioned and penetrates the top wall of the outer casing 1, and the bottom end of the rotating arm 204 is hinged to the connecting arm 201. To facilitate the hinged engagement between the connecting arm 201 and the rotating arm 204, a hinge hole is provided on the top right side of the connecting arm 201, a sliding column 2011 is provided on the top left side of the connecting arm 201, a hinge column 2041 is provided on the bottom right side of the rotating arm 204, and a second sliding groove 2042 is provided on the bottom left side of the rotating arm 204. The second sliding groove 2042 has an arc-shaped structure with its concave surface facing the second sliding groove 2042. During installation, the sliding column 2011 is slidably inserted into the second sliding groove 2042, and the hinge column 2041 is rotatably inserted into the hinge hole during installation. This ensures the connection strength between the connecting arm 201 and the rotating arm 204 while improving the hinged stability between them.

[0097] During use, the angle between the connecting arm 201 and the rotating arm 204 can be adjusted first, and then the rotating arm 204 can be rotated. The rotating arm 204 will synchronously drive the connecting arm 201 to rotate, thereby changing the orientation of the sputtering target head 2 and improving the applicability of the equipment.

[0098] In a further embodiment, the multilayer ion sputtering coating apparatus further includes a first drive member configured to provide a driving force for rotating the rotating arm 204.

[0099] Specifically, in this embodiment, the first driving component can be configured as a second driving motor. The motor shaft of the second driving motor can be directly mounted on the rotating arm 204 to directly drive the rotating arm 204 to rotate. Alternatively, the rotating arm 204 can be driven to rotate through a second gear and a third gear. Specifically, the second gear is fixedly sleeved on the rotating arm 204 during installation, and the third gear is fixedly sleeved on the motor shaft of the second driving motor during installation. The second gear and the third gear mesh.

[0100] In other embodiments, the multilayer ion sputtering coating apparatus further includes a second drive member configured to provide a driving force for the connecting arm 201 to rotate about the hinge point.

[0101] Specifically, in this embodiment, the hinge post 2041 is rotatably mounted on the rotating arm 204, and the connecting arm 201 is fixedly sleeved on the hinge post 2041 through the hinge hole; the second driving member can be configured as a third driving motor, which is mounted on the rotating arm 204 and the motor shaft is fixedly mounted on the hinge post 2041, thereby driving the connecting arm 201 to rotate, so as to change the included angle between the connecting arm 201 and the rotating arm 204.

[0102] In other embodiments, to improve efficiency during coating, the number of sputtering targets 2 is set to be multiple.

[0103] Specifically, in this embodiment, the number of sputtering targets 2 can be set to four, arranged in a rectangular pattern. In this way, the workpiece to be coated can be coated simultaneously by using four sputtering targets 2, thereby improving the coating efficiency.

[0104] Another embodiment of the present invention provides a multilayer ion sputtering coating process, which employs a multilayer ion sputtering coating apparatus and includes the following steps:

[0105] S1. Clamp multiple targets 14 of different materials onto the base 4;

[0106] Specifically, the target material 14 is clamped by the clamping plate 401.

[0107] S2. Place the part to be coated inside the housing 1;

[0108] S3, move the shielding cover 203 away from the target base 202;

[0109] Specifically, the shielding cover 203 is moved by the telescopic rod 2034.

[0110] S4. Drive the mounting shell 3 to slide until it connects with the material conveying channel 301 and the inlet / outlet 2031;

[0111] Specifically, the first drive cylinder 10 drives the mounting shell 3 to move.

[0112] S5, drive the base 4 to slide until one of the target materials 14 and the material conveying channel 301 correspond;

[0113] Specifically, the base 4 is moved by the second drive cylinder 11.

[0114] S6. The target material 14 is conveyed to the target base 202 through the material conveying channel 301 by the material conveying mechanism;

[0115] S7. Move the shielding cover 203 close to the target base 202 until it is pressed onto the target material 14;

[0116] S8, coating;

[0117] S9. Move the shielding cover 203 away from the target base 202;

[0118] S10, drive the mounting shell 3 to slide to connect with the return channel 302 and the inlet / outlet 2031;

[0119] S11, drive the base 4 to slide until it corresponds to the target 14 at the target base 202;

[0120] S12. The target material 14 located at the target base 202 is transported back to the base 4 through the return channel 302 via the return mechanism.

[0121] S13. Repeat steps S4 to S12 to complete the multilayer coating.

[0122] The above-described embodiments are merely illustrative of several implementations of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the scope of protection of the present invention.

Claims

1. A multilayer ion sputtering coating apparatus, characterized in that, The multilayer ion sputtering coating apparatus includes: shell; A sputtering target head is inserted into the housing and points towards the workpiece to be coated. The sputtering target head includes a connecting arm, a target base, and a shield. The connecting arm is disposed on the housing. The target base is disposed on the connecting arm and is used to hold the target material. The shield covers the target base and the connecting arm and is pressed against the target material during use. The shield can slide along the extension direction of the connecting arm, and an inlet / outlet is provided on the side wall of the shield. A mounting shell is disposed on the connecting arm and can slide in a direction parallel to the extension direction of the connecting arm. The mounting shell is provided with a material conveying channel and a material return channel, both of which can communicate with the inlet and outlet. A base is inserted into the mounting housing. The base is slidable in a direction parallel to the extension direction of the connecting arm. When in use, the base holds multiple targets made of different materials. A return mechanism, configured to transport the target material located at the target holder back to the base through the return channel; The return mechanism includes a guide rail and two first clamping members. The guide rail has a U-shaped structure and is inserted into the shielding cover. The opening of the guide rail faces the inlet and outlet and communicates with the inlet and outlet. The guide rail is configured to guide the target material and the target base to be aligned. The two first clamping members are both inserted into the return channel and are symmetrically located on both sides of the return channel. They are both able to slide in a direction perpendicular to the extension direction of the connecting arm. The first clamping member has a U-shaped structure and its opening faces the inlet and outlet. The first clamping member has an L-shaped first sliding part and a V-shaped first clamping part. The first clamping part is elastic and configured to clamp the target material. A feeding mechanism configured to transport the target material located at the base to the target base through the feeding channel; The feeding mechanism includes a rotating rod, a wedge block, a reset member, two second clamping members, and two first adjusting members. The rotating rod is inserted into the mounting housing and extends in a direction perpendicular to the extension direction of the connecting arm. The rotating rod is rotatable about a first axis, which extends in a direction parallel to the extension direction of the connecting arm. The wedge block is disposed at the end of the rotating rod away from the first axis. The wedge block is slidable in a direction parallel to the extension direction of the connecting arm and can form a stop engagement with the target material. It is also rotatable about a second axis, which is parallel to the first axis. The reset member is configured to reset the wedge block. The two second clamping members are both inserted into the feeding channel and are symmetrically located on both sides of the feeding channel. The second clamping members have a U-shaped structure, with their openings facing away from the inlet / outlet. The second clamping members have an L-shaped base and a V-shaped second clamping portion. The second clamping portion is elastic and configured to clamp the target material. The first adjusting members are configured to change the size of the opening of the second clamping members. The feeding mechanism includes two third clamping members and two second adjusting members. The two third clamping members are inserted into the feeding channel and are symmetrically located on both sides of the feeding channel. They are both capable of sliding in a direction perpendicular to the extension direction of the connecting arm. The third clamping member has a U-shaped structure, and the opening of the third clamping member faces away from the inlet and outlet. The third clamping member has an L-shaped second sliding part and a V-shaped third clamping part. The third clamping part is elastic and configured to clamp the target material. The second adjusting members are configured to change the size of the opening of the third clamping member.

2. The multilayer ion sputtering coating apparatus according to claim 1, characterized in that, Multiple spring pieces are provided between the second sliding part and the third clamping part.

3. The multilayer ion sputtering coating apparatus according to claim 1, characterized in that, The sputtering target also includes a rotating arm, which is mounted on the housing and hinged to the connecting arm, and is capable of rotating around its own axis.

4. The multilayer ion sputtering coating apparatus according to claim 3, characterized in that, The multilayer ion sputtering coating apparatus further includes a first driving member configured to provide a driving force for the rotation of the rotating arm.

5. The multilayer ion sputtering coating apparatus according to claim 3, characterized in that, The multilayer ion sputtering coating apparatus further includes a second drive member configured to provide a driving force for the connecting arm to rotate about the hinge point.

6. The multilayer ion sputtering coating apparatus according to claim 1, characterized in that, There are multiple sputtering targets.

7. A multilayer ion sputtering coating process, characterized in that, Using the multilayer ion sputtering coating apparatus as described in claim 1, the multilayer ion sputtering coating process includes the following steps: S1. Clamp multiple targets of different materials onto the base; S2. Place the part to be coated inside the housing; S3. Move the shielding cover away from the target base; S4. Drive the mounting shell to slide until it connects with the material conveying channel and the inlet / outlet; S5. Drive the base to slide until one of the targets and the material conveying channels correspond; S6. The target material is conveyed to the target base through the conveying channel by the conveying mechanism; S7. Move the shielding cover closer to the target base until it is pressed against the target material; S8, coating; S9. Move the shielding cover away from the target base; S10, Drive the mounting shell to slide to connect with the return material channel and the inlet / outlet; S11, Move the base to slide until it corresponds to the target material at the target base; S12. The target material located at the target base is transported back to the base through the return channel by the return mechanism; S13. Repeat steps S4 to S12 to complete the multilayer coating.

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