Dielectric oxide, surface treatment method, human-computer interaction interface and terminal

Abstract

According to the dielectric oxide and the surface treatment method of the dielectric oxide provided by the invention, the mixed slurry is formed on the surface of the dielectric oxide, and the mixed slurry is formed by mixing the transparent silica sol and the polymer microsphere solution. Mixed slurry is introduced to the surface of the dielectric oxide, so that a lubricating layer is formed on the surface of the dielectric oxide, the geometrical shape and multi-phase regulation and control of an interface are realized, the initial friction force is reduced, the finger friction force of an electric adhesion surface is increased, namely, the electric adhesion performance is improved, and the service life of the electric adhesion surface is prolonged. And meanwhile, the antifouling capability, the environmental stability and the multi-user adaptability of the interface are improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of surface treatment, in particular to a surface treatment method of dielectric oxide and modified dielectric oxide. BACKGROUND

[0002] With the growing demand for multi-sensory, immersive human-machine interface (HMI), the haptics market is rapidly developing. Virtual reality, augmented reality, remote haptic devices, and skin-like sensory systems for virtual interaction and intelligent prosthetics have become the focus of industry and academia. As the preferred HMI for both consumer and industrial markets, the popularity of touchscreens has led to the rapid development of surface haptics in research and commercial applications.

[0003] Surface haptic devices present virtual haptic experiences on interactive touch surfaces through force modulation, vibration positioning, or active force. Among them, the friction regulation technology based on electroadhesion is the most successful in commercialization, and there are many patents and products.

[0004] Please refer to Figure 1 , the electroadhesion technology adjusts the friction force by applying an electric field between the fingertips and the screen surface. The general structure of the electroadhesion interface is shown in Figure 1 , and the dielectric layer is usually made of dielectric oxide, including aluminum oxide, etc.

[0005] According to the adhesion friction model of Bowden and Tabor, the electric field changes the actual contact area, thereby increasing the friction force: F = τA, where τ is the interfacial shear strength of the skin, and A is the actual contact area. The existing electroadhesion technology has the following problems:

[0006] Poor environmental stability: The electroadhesion technology is significantly affected by environmental temperature, relative humidity, skin characteristics, and sweat rate, etc., and lacks the ability to adapt to environmental and user changes.

[0007] Interface complexity: The finger surface is compliant and will deform during contact. Sweat and condensation water will form capillary bridges around the rough surface. The capillary bridges and external electric field used for electroadhesion interact with the finger surface organization, jointly affecting the actual contact area.

[0008] Contamination problem: The electroadhesion touch screen is more likely to attract contaminants from the finger surface, and these contaminants preferentially deposit in the haptic area, making the layout of the underlying haptic and sensing electrodes visible to the user, affecting product aesthetics and user experience. SUMMARY

[0009] Therefore, the present application provides a surface treatment method of dielectric oxide and modified dielectric oxide to increase the friction of the electroadhesion surface and enhance the user experience.

[0010] To solve the above problems, the application adopts the following technical solutions:

[0011] One of the purposes of the application is to provide a modified dielectric oxide, which comprises a dielectric oxide, a lubricating layer is formed on the surface of the dielectric oxide, the lubricating layer is formed by mixing transparent silica sol and polymer microsphere solution, and the polymer microsphere comprises at least one of polystyrene microspheres, polystyrene-acrylic microspheres or polymethacrylate microspheres.

[0012] In some embodiments, the dielectric oxide comprises one or more of aluminum oxide, silicon dioxide, titanium oxide, zirconium oxide, barium titanate or strontium titanate, and the thickness of the dielectric oxide is 5-20 μm.

[0013] In some embodiments, the transparent silica sol is obtained by stirring a silica precursor solution at room temperature for 1-3 h, the silica precursor solution comprises a mixed solution of 0.5-1 g of tetraethyl orthosilicate, 0.5-1 g of hydrochloric acid and 1-2 g of ethanol, the hydrochloric acid is 0.05-0.1 M; the concentration of the polymer microsphere solution is 0.2-2.5 wt%; and in the mixed slurry, the volume-mass ratio of the silica precursor solution to the polymer microsphere solution is 0.1-0.3 ml:20-30 g.

[0014] Another purpose of the application is to provide a surface treatment method of a dielectric oxide, which comprises the following steps:

[0015] The mixed slurry is formed on the surface of the aluminum oxide, the mixed slurry is formed by mixing transparent silica sol and polymer microsphere solution, and the polymer microsphere comprises at least one of polystyrene microspheres, polystyrene-acrylic microspheres or polymethacrylate microspheres.

[0016] In some embodiments, the dielectric oxide comprises aluminum oxide or silicon dioxide or titanium oxide or zirconium oxide or barium titanate or strontium titanate.

[0017] The dielectric oxide can be obtained by a method known in the art.

[0018] In some embodiments, the aluminum oxide is prepared by the following method:

[0019] The aluminum metal is anodized by an electrochemical reaction to form aluminum oxide on the surface.

[0020] In some embodiments, the aluminum oxide is prepared by the following method:

[0021] The aluminum metal is anodized by an electrochemical reaction to form aluminum oxide on the surface.

[0022] In some embodiments, the method further comprises the following steps before the step of forming a mixed slurry on the surface of the dielectric oxide:

[0023] treating the dielectric oxide by immersing it in an organic solvent of a coupling agent;

[0024] Preferably, the concentration of the coupling agent is 0.005-0.023M, and the coupling agent comprises at least one of N-[3-(trimethoxysilyl)propyl]ethylenediamine or N-[3- (triethoxysilyl)propyl]ethylenediamine or N-(2-aminoethyl)-3-aminopropyltrimethoxysilane or 3-aminopropyltrimethoxysilane;

[0025] Preferably, the immersing time is 0.3-3h;

[0026] Preferably, the dielectric oxide is taken out after the immersing and then cleaned;

[0027] Preferably, the surface of the dielectric oxide is cleaned 3-5 times by using ethanol;

[0028] Preferably, the dielectric oxide is dried at a temperature of 30-40°C after the cleaning;

[0029] Preferably, the organic solvent comprises at least one of methanol or isopropanol or dimethyl sulfoxide or N,N-dimethylformamide.

[0030] In some embodiments, the step of forming a mixed slurry on the surface of the dielectric oxide comprises the following steps:

[0031] spraying the mixed slurry onto the surface of the dielectric oxide.

[0032] In some embodiments, the step of forming a mixed slurry on the surface of the dielectric oxide comprises the following steps:

[0033] immersing the dielectric oxide in the mixed slurry and evaporating at 50-60°C for 1-2d.

[0034] In some embodiments, the step of spraying the mixed slurry onto the surface of the dielectric oxide comprises the following steps:

[0035] spraying the mixed slurry onto the surface of the dielectric oxide at a pressure of 3-4bar, repeating the spraying process 1-3 times, and drying at 30-60°C after each spraying, wherein the distance between the spraying gun and the surface of the dielectric oxide is 10-15cm.

[0036] In some embodiments,

[0037] the transparent silica sol is obtained from a silica precursor solution;

[0038] Preferably, the transparent silica sol is obtained by stirring a silica precursor solution at room temperature for 1-3 hours;

[0039] Preferably, the silica precursor solution comprises a mixed solution of 0.5-1 g of tetraethyl orthosilicate, 0.5-1 g of hydrochloric acid, and 1-2 g of ethanol;

[0040] Preferably, the hydrochloric acid is 0.05-0.1 M;

[0041] Preferably, the concentration of the polymer microsphere solution is 0.2-2.5 wt%;

[0042] Preferably, in the mixed slurry, the volume-to-mass ratio of the silica precursor solution to the polymer microsphere solution is 0.1-0.3 ml:20-30 g.

[0043] In some embodiments, the method further comprises a step of cleaning or heat treating the dielectric oxide having the mixed slurry formed on the surface.

[0044] In some embodiments, the step of cleaning the dielectric oxide having the mixed slurry formed on the surface comprises the following steps:

[0045] immersing the dielectric oxide having the mixed slurry formed on the surface in a tetrahydrofuran solution for 12-24 hours, and then removing the dielectric oxide and cleaning the surface with a tetrahydrofuran and ethanol solution for 3-5 times, respectively.

[0046] In some embodiments, the step of heat treating the dielectric oxide having the mixed slurry formed on the surface comprises the following steps:

[0047] heating the dielectric oxide having the mixed slurry formed on the surface to 400-500 °C at a heating rate of 5-10 °C / min in an inert gas atmosphere, and maintaining the temperature for 2-4 hours.

[0048] The inert gas can be selected from argon, nitrogen, and the like.

[0049] In some embodiments, the dielectric oxide after being immersed in tetrahydrofuran or heat treated is placed in a hydrophobic agent, the dielectric oxide after being immersed in the hydrophobic agent is removed, and dimethyl silicone oil is coated on the surface of the dielectric oxide.

[0050] Preferably, the hydrophobic agent comprises at least one of 1H, 1H, 2H, 2H-perfluorodecyl triethoxysilane, 1H, 1H, 2H, 2H-perfluorooctyl triethoxysilane, 1H, 1H, 2H, 2H-perfluorooctyl trimethoxysilane, or 1H, 1H, 2H, 2H-perfluorodecyl trimethoxysilane.

[0051] Preferably, the volume fraction of the hydrophobic agent is 0.5-2.0 vol%; preferably, the time placed in the hydrophobic agent is 10-48 h.

[0052] The third object of the present application provides a human-machine interface, which comprises the modified dielectric oxide.

[0053] The human-machine interface can be a touch screen. The fourth object of the present application provides a terminal, which comprises the human-machine interface.

[0054] The terminal comprises a display screen, a computer, a mobile phone, etc.

[0055] The present application adopts the above technical solutions, and has the following beneficial effects:

[0056] The surface treatment method of the dielectric oxide and the modified dielectric oxide provided by the present application form a mixed slurry on the surface of the dielectric oxide, and the mixed slurry is formed by mixing a transparent silica sol and a polymer microsphere solution. The present application forms a lubricating layer on the surface of the hydroxyl functionalized material to perform micro-nano scale modification, realizes geometric shape and multiphase regulation of the interface, increases the friction force of the electric adhesion surface finger, that is, improves the performance of the electric adhesion, and at the same time improves the anti-fouling ability, environmental stability and multi-user adaptability of the interface. The modified dielectric oxide can be used in a human-machine interface and a terminal comprising the human-machine interface. BRIEF DESCRIPTION OF DRAWINGS

[0057] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments of the present application or the prior art description. Obviously, the drawings described below are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0058] Figure 1 The principle diagram of the electric adhesion technology provided in the background of the present application.

[0059] Figure 2 The preparation diagram of the anodic aluminum oxide provided in the embodiments of the present application.

[0060] Figure 3 The image of the water droplet on the surface of the surface-treated aluminum oxide plate provided in the first embodiment of the present application after dropping for 3 seconds.

[0061] Figure 4 The image of the water droplet on the surface of the untreated aluminum plate provided in the comparative example of the present application after dropping for 3 seconds.

[0062] Figure 5 The surface treated alumina plate provided in Example 1 of the present application, under the condition of 250V direct current, the image of water droplets on the surface of the plate after 3 seconds.

[0063] Figure 6 The surface treated and untreated electro-adhesion generated friction force size comparison chart provided in Example 1 of the present application under the same voltage.

[0064] Figure 7 The surface treated alumina plate electro-adhesion generated friction force size chart provided in Example 1 of the present application under different humidity.

[0065] Figure 8 The surface treated alumina plate electro-adhesion generated friction force size chart provided in Example 1 of the present application under different humidity. DETAILED DESCRIPTION

[0066] The embodiments of the present application are described in detail below with reference to the accompanying drawings. The embodiments described below are examples for explaining the present application and are not to be construed as limiting the present application.

[0067] In the description of the present application, it should be understood that the terms "upper", "lower", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be construed as limiting the present application.

[0068] In addition, the terms "first", "second" are only for the purpose of description, and cannot be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise specifically limited.

[0069] In order to make the purpose, technical scheme and advantages of the present application more clear, the present application is further described in detail below with reference to the accompanying drawings and embodiments.

[0070] The modified dielectric oxide provided by the embodiments of the present application comprises a dielectric oxide, a lubricating layer is formed on the surface of the dielectric oxide, the lubricating layer is formed by mixing transparent silica sol and polymer microsphere solution, and the polymer microspheres comprise at least one of polystyrene microspheres, polystyrene-acrylic acid microspheres or polymethacrylate microspheres.

[0071] In the embodiment, the dielectric oxide includes one or more of aluminum oxide, silicon dioxide, titanium oxide, zirconium oxide, barium titanate, and strontium titanate, and the thickness of the dielectric oxide is 5-20 μm.

[0072] It can be understood that, since the hydroxyl groups exist on the surfaces of the oxides, the subsequent successful grafting of N-[3-(trimethoxysilyl)propyl]ethylenediamine, nucleation and growth of tetraethyl orthosilicate gel, and stable adsorption of polystyrene microspheres are ensured.

[0073] In the embodiment, the transparent silica sol is obtained by stirring a silica precursor solution at room temperature for 1-3 h, the silica precursor solution includes a mixed solution of 0.5-1 g of tetraethyl orthosilicate, 0.5-1 g of hydrochloric acid, and 1-2 g of ethanol, the hydrochloric acid is 0.05-0.1 M; the concentration of the polymer microsphere solution is 0.2-2.5 wt%; and in the mixed slurry, the volume-to-mass ratio of the silica precursor solution to the polymer microsphere solution is 0.1-0.3 ml:20-30 g, so that the tetraethyl orthosilicate is hydrolyzed to coat the polymer microspheres and form a continuous gel network of coated polymer microspheres.

[0074] The embodiment of the present application also provides a surface treatment method of a dielectric oxide, which includes forming a mixed slurry on the surface of the dielectric oxide, the mixed slurry being formed by mixing a transparent silica sol and a polymer microsphere solution.

[0075] In the embodiment, the dielectric oxide includes one or more of aluminum oxide, silicon dioxide, titanium oxide, zirconium oxide, barium titanate, and strontium titanate.

[0076] It can be understood that, since the hydroxyl groups exist on the surfaces of the oxides, the subsequent successful grafting of N-[3-(trimethoxysilyl)propyl]ethylenediamine, nucleation and growth of tetraethyl orthosilicate gel, and stable adsorption of polystyrene microspheres are ensured.

[0077] For the convenience of description, the following embodiment takes the dielectric oxide as aluminum oxide as a specific embodiment for detailed description, and it should be noted that the dielectric oxide is not limited to aluminum oxide, and other dielectric oxides can also be used.

[0078] It can be understood that, the aluminum oxide provided in the embodiment can be obtained by anodizing aluminum metal to form aluminum oxide on the surface through an electrochemical reaction.

[0079] Please refer to Figure 2 for a preparation schematic diagram of the anodized aluminum oxide provided in the embodiment.

[0080] In this example, 99.999wt% high purity aluminum plate was used as anodizing material. The aluminum plate sample was immersed in 99.5% ethanol at room temperature and ultrasonically cleaned for 10 minutes. After cleaning, the lower half of the electrical connection handle was covered with insulating silicone resin. Then, the sample was immersed in 280K 78vol% CH3COOH or 22vol% H2O2 solution and anodized at a constant voltage of 28V for 1 minute. During the electrolytic polishing process, 99.99wt% large aluminum plate was used as the cathode and the electrolyte was slowly stirred with a magnetic stirrer. After electrolytic polishing, the sample was immediately rinsed with ultrapure water and then dried.

[0081] 70% -HClO4 solution, anodized at a constant voltage of 28V for 1 minute to electro-polish the aluminum surface. During the electrolytic polishing process, 99.99wt% large aluminum plate was used as the cathode and the electrolyte was slowly stirred with a magnetic stirrer. After electrolytic polishing, the sample was immediately rinsed with ultrapure water and then dried.

[0082] The electro-polished sample was immersed in an electrolyte solution at 283K as an aluminum anode and platinum cathode (99.95wt%) and anodized at a current of 25Am -2 for 670 minutes, the electrolyte solution was stirred at a speed of 250 revolutions per minute with a magnetic stirrer, the anodizing voltage during the constant current anodizing process was measured with a digital multimeter connected to a computer, after anodizing, the sample was immediately rinsed with ultrapure water and then dried to obtain anodized aluminum oxide, the thickness of which was controlled within 5μm, wherein the electrolyte solution was 0.3-2.0mol ammonium carbonate solution (500mL solution volume).

[0083] In this example, after the step of forming aluminum oxide on the surface of the aluminum metal and before the next step, the following steps are included:

[0084] The dielectric oxide is treated by immersing it in an organic solvent of a coupling agent;

[0085] Preferably, the concentration of the coupling agent is 0.005-0.023M, and the coupling agent includes at least one of N-[3-(trimethoxysilyl)propyl]ethylenediamine or N-[3-(triethoxysilyl)propyl]ethylenediamine or N-(2-aminoethyl)-3-aminopropyltrimethoxysilane or 3-aminopropyltrimethoxysilane;

[0086] Preferably, the stirring time is 0.3-3h;

[0087] Preferably, after immersion, the dielectric oxide is removed and cleaned;

[0088] Preferably, the dielectric oxide surface is cleaned 3-5 times with ethanol;

[0089] Preferably, after cleaning, the dielectric oxide is dried at a temperature of 30-40°C;

[0090] Preferably, the organic solvent includes at least one of methanol or isopropanol or dimethyl sulfoxide or N,N-dimethylformamide.

[0091] It can be understood that the alumina is significantly improved in adsorption, adhesion and synergistic assembly ability of polystyrene microspheres and silica network on the surface of the alumina in the subsequent spraying process by amino functionalization; then the alumina is taken out, the surface of the alumina is cleaned with ethanol for 3-5 times, and then dried at a temperature of 30-40°C.

[0092] In the embodiment, the step of forming the mixed slurry on the surface of the alumina specifically comprises the following steps: spraying the mixed slurry to the surface of the alumina.

[0093] Specifically, the mixed slurry is sprayed to the surface of the anodic alumina under a pressure of 3-4 bar, the above spraying process is repeated for 1-3 times, and the alumina is dried at 30°C after each spraying, and the spraying is repeated for multiple times to achieve the purpose of uniformly coating the mixed slurry on the surface.

[0094] Further, the distance between the spray gun and the surface of the alumina is 10-15 cm.

[0095] It can be understood that the spray gun is kept at a certain distance from the sample (alumina) to form uniform atomized particles of the slurry and achieve more uniform coverage. The slurry needs a certain distance after leaving the spray gun to complete atomization and form smaller particles. If the distance is too close, the slurry may bounce back or scatter. In the embodiment, the distance between the spray gun and the surface of the alumina is 10-15 cm, which is more conducive to forming uniform atomized particles of the slurry.

[0096] It should be noted that the mixed slurry can also be formed on the surface of the alumina by coating or dipping.

[0097] In some embodiments, the transparent silica sol is obtained by stirring a silica precursor solution at room temperature for 1-3 h, the silica precursor solution comprises a mixed solution of 0.5-1 g of tetraethyl orthosilicate, 0.5-1 g of hydrochloric acid and 1-2 g of ethanol, and the hydrochloric acid is 0.05-0.1 M; the concentration of the polymer microsphere solution is 0.2-2.5 wt%; in the mixed slurry, the volume-to-mass ratio of the silica precursor solution to the polymer microsphere solution is 0.1-0.3 ml:20-30 g, so as to hydrolyze the tetraethyl orthosilicate to coat the polymer microspheres and form a continuous gel network of coated polymer microspheres.

[0098] In the embodiment, the step of cleaning or heat treating the alumina with the mixed slurry formed on the surface is further included.

[0099] Further, in the step of cleaning the alumina with the mixed slurry on the surface, the step specifically includes the following steps: the alumina with the mixed slurry on the surface is immersed in a tetrahydrofuran solution for 24 hours, and then taken out. Under the action of the tetrahydrofuran, the polystyrene microspheres on the surface of the alumina can be effectively dissolved, and the silica with continuous nano-micron pores on the surface can be obtained. Then, the surface is cleaned with a tetrahydrofuran and ethanol solution for 3-5 times, respectively. Under the action of the tetrahydrofuran and the ethanol, the dissolved polystyrene can be cleaned completely.

[0100] Further, in the step of heat treating the alumina with the mixed slurry on the surface, the step specifically includes the following steps: the alumina with the mixed slurry on the surface is heated to 400°C at a temperature increasing rate of 10°C / min in an argon atmosphere, and kept at this temperature for 2 hours.

[0101] It can be understood that the polystyrene on the surface is removed by thermal decomposition, and the silica with nano-micron pores is left.

[0102] In the embodiment, the step of placing the dielectric oxide after being immersed in the tetrahydrofuran or heat treated in 0.5-2.0 vol% 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane for 10-48 hours, taking out the sample after being immersed in the PFDTES, and dropping dimethyl silicone oil on the surface of the sample, placing the sample horizontally and statically for 24-48 hours, then placing the sample at an angle of 45-70° for 24-48 hours, and absorbing the excess silicone oil flowing from the surface with a dust-free paper is further included.

[0103] The surface treatment method of the hydroxyl functionalized material provided in the application forms a lubricant on the surface of the alumina to perform micro-nano scale modification, realizes geometric shape and multiphase regulation of the interface, increases the finger friction of the electro-adhesion surface, i.e. improves the performance of the electro-adhesion, and at the same time improves the anti-fouling ability, environmental stability, and multi-user adaptability of the interface. The modified dielectric oxide can be used in a human-computer interaction interface and a terminal including the human-computer interaction interface.

[0104] The above technical solutions of the application are described in detail in combination with specific embodiments.

[0105] Embodiment 1

[0106] Step 1 : A 99.999wt% high purity aluminum plate of 35mm width, 10mm height and 500pm thickness was used as an anodization material. The high purity aluminum plate sample was immersed in 99.5% ethanol at room temperature and ultrasonically cleaned for 10min; after cleaning, the lower half of the handle was electrically connected to cover the high purity aluminum plate with insulating silicone resin; then, the sample was immersed in a 78vol% CH3COOH solution at 280K, and the aluminum surface was electropolished after anodic polarization at a constant voltage of 28V for 1min. During the electrolytic polishing process, a 99.99wt% aluminum plate was used as the cathode, and the CH3COOH solution was slowly stirred with a magnetic stirrer. After electropolishing, the sample was immediately rinsed with ultrapure water and then dried.

[0107] The electropolished sample was immersed in an electrolyte at 283K as an aluminum anode and a platinum cathode (99.95wt%) and anodized at a current of 25Am -2 for 670min, with a magnetic stirrer stirring the 0.3m ammonium carbonate solution at a speed of 250rpm. A digital multimeter connected to a computer was used to measure the anodization voltage during the constant current anodization process. After anodization, the sample was immediately rinsed with ultrapure water and then dried to obtain an anodized aluminum oxide.

[0108] Step 2: The anodized aluminum oxide obtained above was immersed in an ethanol solution of 0.005M N-[3-(trimethoxysilyl)propyl]ethylenediamine for 0.3h, after which the anodized aluminum oxide was removed and the surface was cleaned with ethanol for 3 times. The surface was dried at a temperature of 30°C.

[0109] Step 3: Tetraethyl orthosilicate: hydrochloric acid (0.1M): ethanol were mixed in a mass ratio of 1:1:1.5 to obtain a silica precursor solution, which was stirred at room temperature for 1h to obtain a transparent silica sol; 0.14mL of the above colloidal solution was added to a 20g solution of 0.2wt% polystyrene microspheres (microsphere diameter 50nm), and the resulting mixed solution was ultrasonically treated for 30min to obtain a mixed slurry, which was then transferred to the storage bin of a spray machine.

[0110] Step 4: The mixed slurry was sprayed onto the surface of the anodized aluminum oxide obtained in step 2 under a pressure of 3bar. After completing a uniform spraying, the sample was dried at 30°C. The above spraying process was repeated to prepare samples sprayed once, with the spray gun distance from the surface of the anodized aluminum plate being 10cm.

[0111] Step 5: The sample obtained above was immersed in a tetrahydrofuran solution for 24h, after which the sample was removed and the surface was cleaned with tetrahydrofuran and ethanol solutions for 3 times respectively.

[0112] Step 6: The dielectric oxide after tetrahydrofuran immersion or heat treatment was placed in 0.5 vol% of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFDTES) for 10 h; the sample immersed in PFDTES was taken out and dimethyl silicone oil was added dropwise on its surface, after laying flat and standing for 24 h, it was placed at an angle of 45° for 24 h, the silicone oil spreaded on the entire surface, and the excess silicone oil flowing from the surface was absorbed with a dust-free paper, the obtained sample was used to carry out the test of the electric adhesion experiment.

[0113] Step 7: The friction force generated by the electric adhesion under different voltages, humidities, temperatures, and the presence of different possible pollutants at the interface was determined.

[0114] Example 2

[0115] Step 1: A 99.999 wt% high-purity aluminum plate with a width of 35 mm, a height of 10 mm, and a thickness of 500 μm was used as an anodization material. The high-purity aluminum plate sample was immersed in 99.5% ethanol at room temperature and ultrasonically cleaned for 10 min; after cleaning, the lower half of the handle was electrically connected to cover the high-purity aluminum plate with insulating silicone resin; then, the sample was immersed in a 22 vol% 70% HCIO4 solution at 280 K, and the aluminum surface was electrically polished under a constant voltage of 28 V for 1 min. During the electrolytic polishing process, a 99.99 wt% aluminum plate was used as the cathode, and the HCIO4 solution was slowly stirred with a magnetic stirrer. After the electro-polishing, the sample was immediately rinsed with ultrapure water and then dried.

[0116] The electro-polished sample was immersed in an electrolyte at 333 K as an aluminum anode and a platinum cathode (99.95 wt%) and anodized at a current of 400 A for 670 min. The 2 m ammonium carbonate solution was stirred at a speed of 250 revolutions per minute with a magnetic stirrer. The anodization voltage during the constant-current anodization process was measured with a digital multimeter connected to a computer. After anodization, the sample was immediately rinsed with ultrapure water and then dried to obtain an anodized aluminum oxide. -2

[0117] Step 2: The obtained anodized aluminum oxide was immersed in an ethanol solution of 0.023 M N-[3-(triethoxysilyl)propyl]ethylenediamine for 3 h, and then the anodized aluminum oxide was taken out and the surface was cleaned with ethanol for 5 times, and the surface was dried at a temperature of 40 °C.

[0118] ​Step 3: A silica precursor solution was prepared by mixing tetraethyl orthosilicate: hydrochloric acid (0.05 M): ethanol in a mass ratio of 0.5:0.5:1 and stirring at room temperature for 1 h to obtain a transparent silica sol; 0.3 mL of the above colloidal solution was added to 30 g of polystyrene-acrylic microspheres (microsphere diameter of 50 nm) with a concentration of 2.5 wt%, and the resulting mixed solution was ultrasonically treated for 30 min to obtain a mixed slurry, which was then transferred to a spray tank.

[0119] Step 4: The mixed slurry was sprayed onto the anodized aluminum surface obtained in step 2 under a pressure of 4 bar, and after completing a uniform spraying, the sample was dried at 60°C; the above spraying process was repeated to prepare samples sprayed for 3 times, and the distance between the spray gun and the surface of the anodized aluminum plate was 15 cm.

[0120] Step 5: The above obtained sample was immersed in a tetrahydrofuran solution for 24 h, and then the sample was taken out and the surface was cleaned with tetrahydrofuran and ethanol solutions for 5 times, respectively.

[0121] Step 6: The dielectric oxide after tetrahydrofuran immersion or heat treatment was placed in 1.5 vol% 1H, 1H, 2H, 2H-perfluorooctyltriethoxysilane for 24 h; the sample immersed in PFDTES was taken out, and dimethyl silicone oil was added dropwise on the surface, and then it was placed horizontally and statically for 30 h, and then it was placed at an angle of 60° for 30 h, so that the silicone oil covered the entire surface, and the excess silicone oil flowing from the surface was absorbed with a dust-free paper.

[0122] Step 7: The friction generated by the electro-adhesion was measured under different voltages, humidities, temperatures, and the presence of different possible contaminants at the interface.

[0123] Example 3

[0124] Step 1: A 99.999 wt% high-purity aluminum plate with a width of 35 mm, a height of 10 mm, and a thickness of 500 μm was used as the anodized material. The high-purity aluminum plate sample was immersed in 99.5% ethanol at room temperature and ultrasonically cleaned for 10 min; after cleaning, the lower half of the electrically connected handle was covered with insulating silicone resin; then, the sample was immersed in a 22 vol% 70% HC104 solution at 280 K, and the aluminum surface was electro-polished under a constant voltage of 28 V for 1 min. During the electrolytic polishing process, a 99.99 wt% aluminum plate was used as the cathode, and the HC104 solution was slowly stirred with a magnetic stirrer. After electro-polishing, the sample was immediately rinsed with ultrapure water and then dried.

[0125] The electro-polished sample was immersed in an electrolyte at 333 K as an aluminum anode and a platinum cathode (99.95 wt%), and an electric current of 400 A -2Anodization was carried out for 670 min at a constant current of 0.5 A, and the anodization voltage was measured using a digital multimeter connected to a computer. After anodization, the anodized aluminum was immediately rinsed with ultrapure water and then dried to obtain anodized aluminum.

[0126] Step 2: The anodized aluminum obtained in Step 1 was immersed in an ethanol solution of 0.01 M N-(2-aminoethyl)-3-aminopropyltrimethoxysilane for 2 h. After that, the anodized aluminum was taken out and the surface was cleaned with ethanol four times. The surface was dried at a temperature of 35°C.

[0127] Step 3: Tetraethyl orthosilicate, hydrochloric acid (0.1 M), and ethanol were mixed at a mass ratio of 0.8:0.8:1.5 to obtain a silica precursor solution, which was stirred at room temperature for 2 h to obtain a transparent silica sol. 0.2 mL of the above colloidal solution was added to 25 g of polymethacrylate microspheres (microsphere diameter of 50 nm) with a concentration of 2 wt%. The resulting mixed solution was ultrasonically treated for 30 min to obtain a mixed slurry, which was then transferred to the storage tank of a spray machine.

[0128] Step 4: The mixed slurry was sprayed onto the surface of the anodized aluminum obtained in Step 2 at a pressure of 4 bar. After completing a uniform spraying, the sample was dried at 40°C. The above spraying process was repeated to prepare samples sprayed twice, and the distance between the spray gun and the surface of the anodized aluminum plate was 12 cm.

[0129] Step 5: The dielectric oxide with the mixed slurry formed on the surface was heated to 400°C at a rate of 5°C / min in an argon atmosphere and kept at this temperature for 4 h.

[0130] Step 6: The dielectric oxide after being immersed in tetrahydrofuran or heat-treated was placed in 2 vol% 1H,1H,2H,2H-perfluorooctyltrimethoxysilane for 48 h. The sample immersed in 1H,1H,2H,2H-perfluorooctyltrimethoxysilane was taken out and dimethyl silicone oil was added dropwise on its surface. After being placed horizontally and stationary for 48 h, it was placed at an angle of 70° for 48 h. The silicone oil covered the entire surface, and the excess silicone oil flowing from the surface was absorbed with a dust-free paper.

[0131] Step 7: The friction force generated by the electroviscous adhesion under different voltages, humidity, temperature, and the presence of different possible contaminants at the interface was measured.

[0132] Please refer to Figure 3 and Figure 4 , respectively, the surface-treated aluminum oxide plate provided in Example 1, the image of a water droplet on its surface after 3 seconds, and the untreated aluminum plate in the comparative example, the image of a water droplet on its surface after 3 seconds. ByFigure 3 and Figure 4 As can be seen, the water droplets on the surface of the surface-treated aluminum plate can slide smoothly and leave no trace. The water droplets on the surface of the untreated aluminum plate cannot slide, which shows that the surface-treated aluminum plate has a lower contact angle hysteresis and better anti-pollution ability.

[0133] Referring to Figure 5 , the surface-treated aluminum plate provided in Example 1, under the condition of passing 250V direct current, the image after the water droplets on the surface of the plate drop for 3 seconds is shown in Figure 4 As can be seen, after the current is passed, the water droplets on the surface of the surface-treated aluminum plate can still slide smoothly and leave no trace, showing good anti-pollution ability.

[0134] Referring to Figure 6 , the friction force generated by the electro-adhesion of the surface-treated (Example 1) and untreated aluminum plates is measured under the same voltage, from Figure 5 As can be seen, under the same voltage, the friction force generated by the electro-adhesion of the surface-treated aluminum plate is about 7 times that of the untreated aluminum plate, and the surface-treated sample shows good anti-pollution ability.

[0135] Referring to Figure 7 and Figure 8 , the friction force generated by the electro-adhesion of the surface-treated (Example 1) and untreated aluminum plates is measured under different humidity, from Figure 6 and 7 As can be seen, under the same humidity, the friction force generated by the electro-adhesion of the surface-treated aluminum plate is much better than that of the untreated aluminum plate, and the surface-treated sample shows good anti-pollution ability.

[0136] The above is only a preferred embodiment of the present application, and only the technical principle of the present application is specifically described, which is only for explaining the principle of the present application and cannot be explained as a limitation on the protection scope of the present application in any way. Based on the explanation here, any modification, equivalent replacement and improvement made within the spirit and principle of the present application, and other specific embodiments of the present application that can be conceived by those skilled in the art without creative labor, should be included in the protection scope of the present application.

Claims

1. A modified dielectric oxide characterized in that, The dielectric oxide is provided with a lubricating layer formed on the surface of the dielectric oxide, the lubricating layer being formed by mixing a transparent silica sol with a polymer microsphere solution.

2. The modified dielectric oxide of claim 1, wherein, The polymer microspheres include at least one of polystyrene microspheres or polystyrene-acrylic microspheres or polymethacrylate microspheres.

3. The modified dielectric oxide of claim 1, wherein, The dielectric oxide includes one or more of alumina, silica, titania, zirconia, barium titanate, strontium titanate, and / or the thickness of the dielectric oxide is 5-20 μm.

4. The modified dielectric oxide of claim 1, wherein, The transparent silica sol is obtained from a silica precursor solution; Preferably, the transparent silica sol is obtained by stirring the silica precursor solution at room temperature for 1-3 h; Preferably, the silica precursor solution includes a mixture solution of 0.5-1 g of tetraethyl orthosilicate, 0.5-1 g of hydrochloric acid and 1-2 g of ethanol; Preferably, the hydrochloric acid is 0.05-0.1 M; The concentration of the polymer microsphere solution is 0.2-2.5 wt.%; The volume-to-mass ratio of the silica precursor solution to the polymer microsphere solution in the mixed slurry is 0.1-0.3 ml:20-30 g.

5. A method of surface treatment of dielectric oxides, characterized in that, The method includes the following steps: The mixed slurry is formed on the surface of the dielectric oxide, the mixed slurry being formed by mixing a transparent silica sol with a polymer microsphere solution, the polymer microspheres including at least one of polystyrene microspheres or polystyrene-acrylic microspheres or polymethacrylate microspheres.

6. The dielectric oxide surface treatment method of claim 5, wherein, The dielectric oxide includes one or more of alumina, silica, titania, zirconia, barium titanate, strontium titanate, and the thickness of the dielectric oxide is 5-20 μm.

7. The dielectric oxide surface treatment method of claim 5, wherein, The method further includes the following steps before the step of forming the mixed slurry on the surface of the dielectric oxide: The dielectric oxide is treated by immersing the dielectric oxide in an organic solvent of a coupling agent; Preferably, the concentration of the coupling agent is 0.005-0.023 M, and the coupling agent includes at least one of N-[3-(trimethoxysilyl)propyl]ethylenediamine or N-[3-(triethoxysilyl)propyl]ethylenediamine or N-(2-aminoethyl)-3-aminopropyltrimethoxysilane or 3-aminopropyltrimethoxysilane; Preferably, the immersion time is 0.3-3 h; Preferably, the dielectric oxide is taken out after the immersion and then cleaned; Preferably, the surface of the dielectric oxide is cleaned 3-5 times using ethanol; Preferably, the dielectric oxide is dried at a temperature of 30-40 °C after the cleaning; Preferably, the organic solvent includes at least one of methanol or isopropanol or dimethyl sulfoxide or N,N-dimethylformamide.

8. The dielectric oxide surface treatment method of claim 5, wherein, The step of forming the mixed slurry on the surface of the dielectric oxide specifically includes the following steps: The mixed slurry is sprayed onto the surface of the dielectric oxide.

9. The dielectric oxide surface treatment method of claim 5, wherein, The step of forming the mixed slurry on the surface of the dielectric oxide specifically includes the following steps: The dielectric oxide is immersed in the mixed slurry and evaporated at a temperature of 50-60 °C for 1-2 d.

10. The dielectric oxide surface treatment method of claim 9, wherein, The step of spraying the mixed slurry onto the surface of the dielectric oxide specifically includes the following steps: The mixed slurry is sprayed to the surface of the dielectric oxide under the pressure of 3-4 bar, preferably, the spraying process is repeated 1-3 times; preferably, the dielectric oxide is dried at 30-60℃ after each spraying; preferably, the distance between the spraying gun and the surface of the dielectric oxide is 10-15 cm.

11. The dielectric oxide surface treatment process of claim 5, wherein, The transparent silica sol is obtained by stirring a silica precursor solution at room temperature; Preferably, the stirring time is 1-3 h; Preferably, the silica precursor solution comprises a mixed solution of 0.5-1 g of tetraethyl orthosilicate, 0.5-1 g of hydrochloric acid and 1-2 g of ethanol; Preferably, the hydrochloric acid is 0.05-0.1 M; Preferably, the concentration of the polymer microsphere solution is 0.2-2.5 wt%; Preferably, in the mixed slurry, the volume / mass ratio of the silica precursor solution to the polymer microsphere solution is 0.1-0.3 ml:20-30 g.

12. The dielectric oxide surface treatment process of claim 5, wherein, The step of cleaning or heat treating the dielectric oxide with the surface formed with the mixed slurry is further included.

13. The dielectric oxide surface treatment process of claim 12, wherein, In the step of cleaning the dielectric oxide with the surface formed with the mixed slurry, the following steps are included: The dielectric oxide with the surface formed with the mixed slurry is immersed in a tetrahydrofuran solution for 12-24 h, then taken out, and the surface is cleaned with a tetrahydrofuran and ethanol solution for 3-5 times, respectively.

14. The dielectric oxide surface treatment process of claim 13, wherein, In the step of heat treating the dielectric oxide with the surface formed with the mixed slurry, the following steps are included: The dielectric oxide with the surface formed with the mixed slurry is heated to 400-500℃ at a heating rate of 5-10℃ / min in an inert gas atmosphere, and kept at the temperature for 2-4 h.

15. The dielectric oxide surface treatment process of claim 14, wherein, The following steps are further included: The dielectric oxide after being immersed in tetrahydrofuran or heat treated is placed in a hydrophobic agent, the dielectric oxide immersed in the hydrophobic agent is taken out, and dimethyl silicone oil is coated on the surface of the dielectric oxide; Preferably, the hydrophobic agent comprises at least one of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane, 1H, 1H, 2H, 2H-perfluorooctyltriethoxysilane, 1H, 1H, 2H, 2H-perfluorooctyltrimethoxysilane and 1H, 1H, 2H, 2H-perfluorodecyltrimethoxysilane; Preferably, the volume fraction of the hydrophobic agent is 0.5-2.0 vol%; preferably, the time for being placed in the hydrophobic agent is 10-48 h.

16. A human-machine interface, characterized in that The human-machine interface comprises the modified dielectric oxide of claim 1.

17. A terminal, characterized by The terminal comprises the human-machine interface of claim 16.

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