A high-power electron beam physical vapor deposition device for engine blades

Abstract

The present application relates to the technical field of electron beam physical vapor deposition, and particularly relates to a high-power electron beam physical vapor deposition device for engine blades, which comprises a deposition chamber system, wherein the vapor deposition chamber is provided with at least two electron gun connection positions and a plurality of deflection closed structures, the at least two deflection closed structures correspond to the electron gun connection positions one by one and are used to close or open the wall surface structure of the vapor deposition chamber; the electron gun comprises interchangeable hot emission electron guns and field emission electron guns; the emission power supply comprises hot emission power supply and field emission power supply; the vacuum system is used to adjust the vacuum degree of the vapor deposition chamber; and the target material deposition system is used to provide target materials. Through the synchronous setting and interchangeable utility of the hot emission electron guns and the field emission electron guns, more working conditions can be considered, various material and process requirements can be met, the vapor deposition operation process is efficient and fast, the equipment downtime and maintenance cost are reduced, and the flexibility and applicability of the equipment are improved.

Description

Technical Field

[0001] This invention relates to the field of electron beam physical vapor deposition (EB-PVD) technology, and is applied to the preparation of thermal barrier coatings for aero-engine turbine blades. Specifically, it relates to a high-power electron beam physical vapor deposition device for engine blades. Background Technology

[0002] Electron beam physical vapor deposition (EB-PVD) technology uses a high-energy-density electron beam to bombard, heat, and evaporate a target under high vacuum conditions, forming a thermal barrier coating with high bonding strength and excellent thermal shock resistance on the substrate. It is widely used in the field of protective coating preparation for aero-engine turbine blades.

[0003] Thermal barrier coatings for aero-engine turbine blades are a core technology for improving the engine's high-temperature resistance. However, my country has long relied on imports for electron beam physical vapor deposition (EB-PVD) equipment and processes, facing problems such as poor cold / hot gun compatibility, low integration of CNC systems, insufficient coating uniformity, and difficulty in controlling thermal stress. Existing equipment cannot meet the uniform deposition requirements for coatings on complex curved blade surfaces. Furthermore, domestic EB-PVD equipment suffers from insufficient electron gun system compatibility, low intelligence levels in CNC systems, and limited degrees of freedom in motion mechanisms, leading to poor coating adhesion and short service life. With the increasing demand for high-power electron beam physical vapor deposition equipment (electron gun power reaching 250kW), the requirements for various technical indicators are becoming increasingly stringent.

[0004] Existing EB-PVD equipment uses a single electron gun structure to provide the electron beam and primarily employs a hot gun. This necessitates a specific operating environment for the hot gun, resulting in poor compatibility with different products, limited vapor deposition effects, and rapid lifespan loss due to its use in all operating conditions. Cold guns, on the other hand, offer advantages such as longer lifespan, lower cost, and no need for a separate vacuum system, making them suitable for applications where hot guns are unsuitable. Specifically, cold guns are suitable for processes requiring the introduction of reactive gases or where high vacuum levels are not critical, while hot guns are ideal for applications demanding higher vacuum levels and better coating purity.

[0005] It is evident that existing EB-PVD equipment still has room for improvement and should be optimized to enhance its performance under different operating conditions. This includes enabling switching between multiple operating modes, such as hot gun mode and cold gun mode, to meet diverse operational needs and improve the equipment's overall performance and lifespan. Therefore, a more reasonable technical solution is needed to address the technical problems existing in the current technology. Summary of the Invention

[0006] To address some of the problems existing in the prior art, this invention discloses a high-power electron beam physical vapor deposition (PEVDC) device for engine blades. It adopts a design that is compatible and interchangeable with thermal emission electron guns and field emission electron guns, enabling flexible switching and efficient operation under different working conditions. Through the coordination of the electron gun and the deposition chamber system and the control system, rapid and convenient interchangeability between thermal emission electron guns and field emission electron guns is achieved, thereby meeting different process requirements.

[0007] To achieve the above objectives, the deposition apparatus disclosed in this invention can adopt the following approach:

[0008] A high-power electron beam physical vapor deposition apparatus for engine blades includes:

[0009] A deposition chamber system includes a vapor deposition chamber with an installation surface, wherein at least two electron gun connection positions are provided on the installation surface, and a number of deflection sealing structures are provided inside the vapor deposition chamber, wherein at least two deflection sealing structures correspond one-to-one with the electron gun connection positions and are used to close or open the wall structure of the vapor deposition chamber, including the electron gun connection positions.

[0010] An electron gun includes a thermal emission electron gun and / or a field emission electron gun that are fitted to an electron gun connection position. The thermal emission electron gun and the field emission electron gun are fitted to the electron gun connection position through the same fitting structure and are interchangeable.

[0011] The transmitting power supply includes a thermal emission power supply for powering the thermal emission electron gun and a field emission power supply for powering the field emission electron gun;

[0012] The vacuum system is connected to and works with the vapor deposition chamber to adjust the vacuum level of the vapor deposition chamber.

[0013] The target deposition system is used to provide a target material to the vapor deposition chamber. After being bombarded by an electron beam, the target material evaporates and forms a film on the surface of the engine blade.

[0014] The aforementioned electron beam physical vapor deposition (EBPV) equipment, by simultaneously incorporating both thermionic and field-emission electron guns within the vapor deposition chamber, can meet the diverse process requirements of various applications. Specifically, thermionic electron guns are used in scenarios demanding high vacuum and high coating purity, while field-emission electron guns are employed in scenarios requiring the introduction of reactive gases or where high vacuum is less critical. Both electron guns can be activated in their respective scenarios to achieve vapor deposition on the product surface. In many cases where adjustments to the installation of the two electron guns are necessary, either thermionic or field-emission electron gun can be installed at the electron gun connection points. Since both electron guns share the same mating structure, they can be installed at any connection point, enabling convenient interchangeability. When operating this vapor deposition equipment, selecting the appropriate electron gun based on actual process requirements not only effectively ensures the product processing results but also guarantees the effective service life of the electron gun.

[0015] Furthermore, the electron gun connection position, used to connect and fix the thermal emission electron gun or the field emission electron gun, can be constructed in various forms, and its structure is not limited to a single one. Here, we optimize and propose one feasible option: the electron gun connection position includes a connection hole provided on the inclined mounting surface, and a connection flange is provided at the connection hole; the mating structure of both the thermal emission electron gun and the field emission electron gun includes a flange joint adapted to the connection flange. When the above scheme is adopted, the mounting surface is an inclined surface, and its inclination angle is set according to requirements. After the electron gun is installed, the electron beam can be emitted towards the designated target material by the set angle. When the target material is heated and evaporated, the evaporated material is deposited on the engine blades in the meteorological deposition chamber to form a film.

[0016] Furthermore, the deflection sealing structure is used to open or close structures within the vapor deposition chamber, such as mounting holes and connecting holes. When the electron gun is connected to the vapor deposition chamber, its connection position can be controlled by the deflection sealing structure to open or close, thereby opening or closing the channel for the electron beam emitted by the electron gun. Various deflection sealing structures can be used, and the structure is not limited to a single one. Here, we optimize and propose one feasible option: the deflection sealing structure includes deflection blades, which are driven and deflected by a deflection driver. When the deflection blades move to the closed position, the wall structure, including the connecting holes, is closed; when the deflection blades move to the open position, the wall structure, including the connecting holes, is opened. In this scheme, the deflection driver can be a motor, with the motor's output shaft eccentrically connected to the deflection blades, driving the blades to reciprocate, thus enabling the deflection blades to switch back and forth between the closed and open positions.

[0017] Furthermore, the vapor deposition chamber is used to achieve the surface deposition process of engine blades. During the deposition operation, the target material in the vapor deposition chamber is bombarded by an electron beam, causing it to heat up and evaporate, forming a film on the surface of the engine blades. The target material supply structure can adopt various schemes and is not limited to one. Here, we optimize and propose one feasible option: the vapor deposition chamber is provided with a target material deposition port, which is controlled to be closed or opened by a deflection sealing structure; the target material deposition system includes a target material sleeve assembly that communicates with the target material deposition port and maintains an airtight seal. The free end of the target material sleeve assembly is connected to a rotating device, which drives the target material in the target material sleeve assembly to rotate along the axis; the target deposition system also includes a feeding device that cooperates with the target material sleeve assembly, which drives the target material into or out of the vapor deposition chamber. When using the above scheme, the target sleeve assembly includes at least an inner tube for transporting the target. Driven by the feeding device, the target is transferred to the vapor deposition chamber through the inner tube and rotated by the rotating device, thereby achieving uniform heating and evaporation and maintaining the uniformity of target consumption. An outer tube is also provided outside the inner tube. The outer tube can be a telescopic corrugated pipe to achieve an airtight seal. During the lifting and lowering transfer of the target, the outer tube can ensure the airtightness of the vapor deposition chamber and maintain the vacuum level during the vapor deposition process.

[0018] Furthermore, during the deposition process of engine blades, if the parts to be processed only enter and leave the vapor deposition chamber from one loading position, there is a waiting time for part pretreatment and cooling after processing. If the parts occupy the entry and exit positions continuously, it will affect the efficiency of the entire processing technology. Therefore, optimization can be performed to reduce or avoid the waiting time and improve the utilization efficiency of the vapor deposition chamber, thereby improving the overall efficiency of vapor deposition. This can be achieved through various methods and is not limited to one. Here, optimization is proposed and one feasible option is suggested: a dual loading chamber system for loading, unloading and pretreatment of engine blades is also included. The dual loading chamber system includes two loading chambers, which are respectively set on both sides of the vapor deposition chamber. An isolation door is set at the connection between the loading chamber and the vapor deposition chamber to control the opening and closing. The loading chamber is connected to a vacuum system and an inflation assembly. The vacuum system and the inflation assembly are used to regulate the air pressure in the loading chamber. The loading chamber is also equipped with an in-situ radiant heating device for preheating the engine blades. When the above scheme is adopted, the two loading chambers are independent of each other, and the loading, pretreatment, entry and exit of the vapor deposition chamber, and unloading of the parts to be processed are carried out separately. Since there are airtight isolation doors between the two loading chambers and the vapor deposition chamber, after the vapor deposition operation in the airtight deposition chamber is completed, the parts return to the original loading chamber for subsequent processing. The pretreated parts can be sent into the vapor deposition chamber from the other loading chamber, and the required vapor deposition process can be started quickly. This avoids the waiting process when the vapor deposition chamber is occupied by parts for subsequent processing, thereby improving the continuous working efficiency of the vapor deposition chamber.

[0019] Furthermore, the in-situ radiant heating device can preheat the engine blades to be processed, making them meet the requirements of subsequent vapor deposition processing. The in-situ radiant heating device can adopt various schemes to achieve the purpose of heating the engine blades, and its structure is not limited to a single one. Here, we optimize and propose one feasible option: The in-situ radiant heating device includes two heating units arranged opposite each other, which move closer or further apart under the action of a heating actuator. Each heating unit includes a set of gate valves connected and synchronized with the heating actuator. The gate valves connect to and synchronously drive the heating housing, which is provided with an insulation layer and heating elements. When the two opposing heating units move closer, the gate valves close to form a heating chamber, and the heating elements heat the engine blades located within the heating chamber. In this scheme, the gate valves reciprocate under the action of the heating actuator, causing the heating housing to close or open. When the engine blades are in the preheating position, the heating housing closes to cover the engine blades, and the internal heating elements operate to raise the temperature, thereby heating the engine blades. The insulation layer allows more heat to remain within the in-situ radiant heating device, resulting in a better heating effect.

[0020] Furthermore, before the vapor deposition process, the engine blades are fed into the vapor deposition chamber. To improve the utilization rate of the vapor deposition chamber and reduce its downtime, multiple coordinating structures can be used to separate the engine blades to be vapor deposited and those that have already undergone vapor deposition, allowing them to enter the vapor deposition chamber in an orderly manner. This minimizes the downtime of the vapor deposition chamber. Various solutions can be implemented, and the structure is not limited to a single one. Here, we optimize and propose one feasible option: a dual-feed system for driving the movement and adjusting the attitude of the engine blades. The dual-feed system includes two feeding devices located outside the two loading chambers respectively. Each feeding device includes a linear displacement assembly for moving a support shaft between the loading chamber and the vapor deposition chamber. The support shaft and its front end rotating frame are driven by a revolution driver to achieve coaxial rotation. The rotating frame is equipped with a rotating fixture for connecting engine blades. An inner drive shaft is installed inside the support shaft and is driven by a self-rotation driver. Several transmission shafts are installed inside the rotating frame. The rotating fixture rotates in conjunction with the transmission shafts. When the self-rotation driver is started, the rotating fixture rotates through the inner drive shaft and the transmission shafts. When the above scheme is adopted, the support shaft drives the rotating frame to move forward, backward and flip synchronously. After the revolution drive is turned on, the rotation of the entire support shaft and rotating frame is realized. The revolution drive can be a motor and cooperate with the support shaft through a transmission belt, transmission gears and other structures. At the same time, the rotation drive is connected to the inner drive shaft and drives the inner drive shaft to rotate, realizing the rotation of the inner drive shaft within the support shaft. The inner drive shaft can be driven by a transmission shaft through a bevel gear and other structures. The transmission shaft and the rotating fixture also cooperate through a bevel gear and other structures, thereby realizing the synchronous rotation of the rotating fixture. The engine blades rotate synchronously with the rotating fixture in this process.

[0021] Furthermore, during the vapor deposition process, the temperature of some parts of the equipment rises significantly, and some areas even become high-temperature zones. To avoid instability in equipment operation or damage to adjacent structures due to excessive temperature, it is necessary to control the internal temperature of the equipment, especially in high-temperature operating areas. Temperature control can be achieved through various methods; one feasible option is proposed here: a cooling system is also included. This cooling system works in conjunction with the electron gun, deposition chamber system, dual loading system, and dual feed system to provide cooling. With this approach, both the electron gun and the vapor deposition chamber are high-temperature areas. The electron gun itself generates high temperatures during operation, and the vapor deposition chamber also exhibits high temperatures. The dual loading system is adjacent to the vapor deposition chamber and requires pretreatment via in-situ radiant heating, thus also generating a temperature rise. The dual feed system is adjacent to the dual loading system and also experiences a temperature rise due to heat conduction. The cooling system effectively reduces heat accumulation and allows for effective temperature control in high-temperature areas.

[0022] Furthermore, a cooling system is used to maintain the temperature of the system equipment during operation, thereby ensuring the stable and reliable operation of the system equipment. This includes temperature control of the vapor deposition chamber. Here, optimization is proposed, and one feasible option is suggested: the cooling system includes a water-cooling system installed inside the vapor deposition chamber. The vapor deposition chamber forms a first chamber for accommodating the target material and engine blades and performing vapor deposition, and a second chamber surrounding the first chamber for cooling. The second chamber is connected to an inlet and an outlet, and the liquid cooling medium enters from the inlet and exits from the outlet to form a circulating flow. When adopting the above scheme, the second chamber can be embedded in the wall of the vapor deposition chamber, or it can be provided with a separate internal water-cooled wall for circulating the liquid cooling medium.

[0023] Furthermore, different parts have different cooling requirements, and corresponding settings can be made according to the actual working components. Adapting the structure effectively controls the overall temperature, and the structure is not uniquely limited. Here, we propose one feasible option: the cooling system includes a water-cooling component that works with the electron gun. This water-cooling component covers at least the cathode, anode, and secondary focusing areas of the thermionic electron gun; simultaneously, it covers at least the cathode, anode, gas ionization reaction area, and waveguide beam area of ​​the field emission electron gun. Using this scheme, the water-cooling component cools the electron gun, ensuring that the heat generated during operation is effectively transferred, preventing some parts from weakening due to increased temperature, affecting the electron beam emission path, and preventing parts from generating vapor from electron beam bombardment, thus affecting the stability of the internal environment. This cooling method effectively increases the electron gun's emission power, for example, allowing it to reach 250kW.

[0024] Furthermore, the entire equipment operates under automated system control, which can be achieved through various schemes. Here, we optimize and propose one feasible option: It also includes a control system. This control system monitors and automates the start-up and shutdown of the deposition chamber system, electron gun, dual loading system, dual feeding system, and cooling system. Using this scheme, corresponding monitoring elements can be set to acquire operating parameters at each location and send these parameters to the control system. When the control system receives the data from each monitoring element, it can process the data and generate corresponding control commands to achieve automated operation of the entire equipment.

[0025] Compared with the prior art, some of the beneficial effects of the technical solution disclosed in this invention include:

[0026] By synchronizing and interchangeably using thermal emission electron guns and field emission electron guns, a wider range of operating conditions can be accommodated, meeting the needs of various materials and processes, and ensuring efficient and rapid vapor deposition operations. This reduces equipment downtime and maintenance costs, and improves the flexibility and applicability of the equipment. Attached Figure Description

[0027] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a top view schematic diagram of a vapor deposition equipment.

[0029] Figure 2 for Figure 1 A magnified schematic diagram of the local structure at point A.

[0030] Figure 3 for Figure 1 A magnified view of the local structure at point B.

[0031] Figure 4 This is a schematic diagram of the structure of the vapor deposition chamber, which is equipped with an electron gun and a vacuum system.

[0032] Figure 5 This is a front view schematic diagram of a vapor deposition equipment.

[0033] Figure 6 for Figure 5 A magnified schematic diagram of the local structure at point C.

[0034] Figure 7 for Figure 5 A magnified schematic diagram of the local structure at point D.

[0035] Figure 8 for Figure 7 A partial structural diagram of the transfer frame.

[0036] Figure 9 for Figure 5 A magnified schematic diagram of the local structure at point E in the middle.

[0037] Figure 10 This is a schematic diagram of the overall vapor deposition chamber and target deposition system.

[0038] Figure 11 This is a schematic diagram of the structure of the vapor deposition chamber viewed from the side.

[0039] Figure 12This is a schematic diagram of the internal structure of a vapor deposition chamber.

[0040] Figure 13 This is a schematic diagram of the target deposition system.

[0041] Figure 14 This is a schematic diagram of a deflection-closed structure.

[0042] Figure 15 This is a schematic diagram of the heating unit structure of an in-situ radiant heating device.

[0043] In the above attached figures, the meanings of each label are as follows:

[0044] 1. Vapor deposition chamber; 101. Observation window; 102. Inspection door; 103. Mounting surface; 104. Target deposition port; 105. Vacuum connection hole; 106. Loading docking hole; 107. Deflection blade; 108. Deflection actuator; 109. First chamber; 110. Second chamber; 2. Electron gun; 201. Mating structure; 3. Vacuum system; 4. Loading chamber; 401. Heating actuator; 402. Loading port; 403. Gas interface; 404. Gate valve; 405. Heating shell; 406. Insulation layer; 407. Heating element; 5. Feeding device; 501. Displacement 502. Track; 503. Displacement base; 504. Rotation actuator; 505. Revolution actuator; 506. Support shaft; 507. Airtight pipe; 508. Airtight connection seat; 509. Internal drive shaft; 510. Rotating frame; 511. Transmission shaft; 512. Rotary clamp; 6. Transmission power supply; 7. Cooling system; 8. Transformer; 9. Control system; 10. Operating platform support; 11. Isolation hatch; 12. Main unit support; 13. Control cabinet area; 14. Operating area; 15. Target deposition system; 1501. Target sleeve assembly; 1502. Feeding device; 1503. Rotation device. Detailed Implementation

[0045] The following description, in conjunction with the accompanying drawings and specific embodiments, further illustrates this embodiment.

[0046] To address the insufficient compatibility and applicability of existing vapor deposition equipment when dealing with different operating conditions and process requirements, the following embodiments are optimized to overcome the deficiencies in the existing technology.

[0047] Example

[0048] like Figures 1-15 As shown, this embodiment provides a high-power electron beam physical vapor deposition (PEVDC) device for engine blades, which improves the processing requirements of different vapor deposition processes and enhances the convenience and flexibility of vapor deposition processing.

[0049] The electron beam physical vapor deposition (EBPD) apparatus disclosed in this embodiment simultaneously accommodates both thermionic and field-emission electron guns within the vapor deposition chamber 1, thus meeting the diverse processing requirements. Specifically, thermionic electron guns are used in scenarios demanding high vacuum and high coating purity, while field-emission electron guns are used in scenarios requiring the introduction of reactive gases or where high vacuum is less critical. Both electron guns 2 can be activated in their respective scenarios to achieve vapor deposition on the product surface. In other cases, when adjustments to the installation of the two electron guns 2 are needed, either thermionic or field-emission electron gun can be installed at the electron gun connection point. Since both electron guns 2 share the same mating structure 201, they can be installed at any connection point, enabling convenient interchangeability. When using this vapor deposition apparatus, selecting the appropriate electron gun 2 based on actual process requirements not only effectively ensures the product processing results but also guarantees the effective service life of the electron gun 2.

[0050] As one of the structures of the vapor deposition apparatus provided in this embodiment, it includes:

[0051] like Figure 4 , Figure 10 , Figure 11 , Figure 12 As shown, the deposition chamber system includes a vapor deposition chamber 1 with a mounting surface 103. At least two electron gun connection positions are provided on the mounting surface 103. Several deflection sealing structures are provided inside the vapor deposition chamber 1. At least two deflection sealing structures correspond one-to-one with the electron gun connection positions and are used to close or open the wall structure of the vapor deposition chamber 1, including the electron gun connection positions.

[0052] Preferred, such as Figure 12 As shown, in this embodiment, the deposition chamber is hollow in the middle for electron beam physical vapor deposition of the part. The lower part of the deposition chamber has a target supply port for connecting to the automatic evaporation deposition system. There are vacuum connection ports and loading interfaces on the left and right sides, with corresponding flanges installed to connect to the vacuum system 3 and the loading chamber 4, respectively.

[0053] In this embodiment, the sedimentation chamber is provided with an observation window 101 and an inspection door 102.

[0054] As shown in Figure 4, the electron gun connection position is used to connect and fix the thermal emission electron gun or the field emission electron gun. It can be constructed in various forms, and its structure is not limited to one specific type. This embodiment optimizes and adopts one feasible option: the electron gun connection position includes a connection hole provided on the inclined mounting surface 103, and a connection flange is provided at the connection hole; the mating structure 201 of the thermal emission electron gun and the field emission electron gun both include flange joints adapted to the connection flange. When the above scheme is adopted, the mounting surface 103 is an inclined surface, and its inclination angle is set according to requirements. After the electron gun 2 is installed, the electron beam can be emitted towards the designated target material by the set angle. When the target material is heated and evaporated, the evaporated material is deposited on the engine blades in the meteorological deposition chamber to form a film.

[0055] like Figure 12 , Figure 14 As shown, the deflection sealing structure is used to open or close structures within the vapor deposition chamber 1, such as mounting holes and connecting holes. When the electron gun 2 is connected to the vapor deposition chamber 1, its connection position can be controlled by the deflection sealing structure to open or close, thereby opening or closing the channel for the electron beam emitted by the electron gun 2. Various deflection sealing structures can be used, and the structure is not limited to a single one. This embodiment optimizes and adopts one feasible option: the deflection sealing structure includes a deflection blade 107, which is driven and deflected by a deflection driver 108. When the deflection blade 107 moves to the closed position, it closes the wall structure including the connecting hole; when the deflection blade 107 moves to the open position, it opens the wall structure including the connecting hole. In this scheme, the deflection driver 108 can be a motor. The motor's output shaft is eccentrically connected to the deflection blade 107, driving the deflection blade 107 to reciprocate, thereby enabling the deflection blade 107 to switch back and forth between the closed and open positions.

[0056] like Figure 10 , Figure 11 As shown, in this embodiment, the vapor deposition chamber 1 is provided with multiple perforated structures, including mounting holes for mounting monitoring components, vacuum connection holes 105 for docking with the vacuum system 3, and loading docking holes 106 for docking with the dual loading system. At some perforated structures where opening and closing need to be controlled, deflection sealing structures are used to control opening or closing.

[0057] like Figure 4 As shown, the second structure of the vapor deposition apparatus provided in this embodiment includes:

[0058] The electron gun 2 includes a thermal emission electron gun and / or a field emission electron gun that are fitted to the electron gun connection position. The thermal emission electron gun and the field emission electron gun are fitted to the electron gun connection position through the same fitting structure 201 and are interchangeable.

[0059] Preferably, the mounting surface 103 of the deposition chamber forms a 140° angle with the vertical plane. When the thermal emission electron gun and the field emission electron gun are fitted to the mounting surface 103, the electron gun 2 is connected and fixed and can be interchanged.

[0060] Preferably, in this embodiment, two electron gun connection positions are provided on the mounting surface 103, one for connecting a thermionic electron gun and the other for connecting a field electron gun.

[0061] In this embodiment, the electron gun 2 is a high-power electron gun 2 with a power of 250kW, which realizes single-gun multi-beam and high deposition rate.

[0062] like Figure 1 As shown, the third structure of the vapor deposition apparatus provided in this embodiment includes:

[0063] The transmitting power supply 6 includes a thermal emission power supply for powering the thermal emission electron gun and a field emission power supply for powering the field emission electron gun.

[0064] Preferably, the transmitting power supply 6 includes a transformer 8 to achieve efficient power conversion and isolation, support high-frequency response (such as filament heating), and improve the power stability and energy utilization of the electron beam system.

[0065] As the vapor deposition apparatus provided in this embodiment, its fourth structure includes:

[0066] Vacuum system 3 is connected to and cooperates with vapor deposition chamber 1 to adjust the vacuum level of vapor deposition chamber 1.

[0067] Preferably, in this embodiment, the vacuum system 3 consists of pipes, valves, a vacuum pump, and a vacuum gauge.

[0068] As the vapor deposition apparatus provided in this embodiment, its fifth structure includes:

[0069] like Figure 10 , Figure 13 As shown, the target deposition system 15 is used to provide a target to the vapor deposition chamber 1. The target is bombarded by an electron beam and evaporates to form a film on the surface of the engine blade.

[0070] The vapor deposition chamber 1 is used to perform the surface deposition process on engine blades. During the deposition operation, the target material in the vapor deposition chamber 1 is bombarded by an electron beam, causing it to heat up and evaporate, forming a film on the surface of the engine blades. The target material supply structure can adopt various schemes and is not limited to one. This embodiment optimizes and adopts one feasible option: the vapor deposition chamber 1 is provided with a target material deposition port 104, which is closed or opened by a deflection sealing structure. The target material deposition system 15 includes a target material sleeve assembly 1501 that communicates with the target material deposition port 104 and maintains an airtight seal. The free end of the target material sleeve assembly 1501 is connected to a rotating device 1503, which drives the target material in the target material sleeve assembly 1501 to rotate along the axis. The target material deposition system 15 also includes a feeding device 1502 that cooperates with the target material sleeve assembly 1501, which drives the target material into or out of the vapor deposition chamber 1. When the above scheme is adopted, the target sleeve assembly 1501 includes at least an inner tube for transporting the target. Driven by the feeding device 1502, the target is transferred to the vapor deposition chamber 1 through the inner tube and rotated under the drive of the rotating device 1503, thereby achieving uniform heating and evaporation and maintaining the uniformity of target consumption. An outer tube is also provided outside the inner tube. The outer tube can be a telescopic corrugated pipe to achieve an airtight seal. When the target is transferred by lifting and lowering, the outer tube can ensure the airtightness of the vapor deposition chamber 1 and maintain the vacuum degree during the vapor deposition process.

[0071] To better solve the above-mentioned technical problems and achieve the above objectives, the vapor deposition equipment solution in this embodiment also includes the following structural improvements:

[0072] like Figure 1 , Figure 3 , Figures 5-9As shown, during the deposition process of engine blades, if the parts to be processed only enter and leave the vapor deposition chamber 1 from one loading position, there is a waiting time for part pretreatment and cooling after processing. If the parts always occupy the entry and exit positions, it will affect the efficiency of the entire processing process. Therefore, optimization can be performed to reduce or avoid the waiting time and improve the utilization efficiency of the vapor deposition chamber 1, thereby improving the overall efficiency of vapor deposition. This can be achieved through various methods and is not limited to one. This embodiment optimizes and adopts one feasible option: it also includes a dual loading chamber system for loading, unloading and pretreatment of engine blades. The dual loading chamber system includes two loading chambers 4, which are respectively set on both sides of the vapor deposition chamber 1. An isolation door 11 is set at the connection between the loading chamber 4 and the vapor deposition chamber 1 to control the opening and closing. The loading chamber 4 is connected to the vacuum system 3 and the gas filling component. The vacuum system 3 and the gas filling component are used to adjust the gas pressure in the loading chamber 4. The loading chamber 4 is also equipped with an in-situ radiant heating device for preheating the engine blades. When the above scheme is adopted, the two loading chambers 4 are independent of each other, and the loading, pretreatment, entry and exit of the vapor deposition chamber 1, and unloading of the parts to be processed are carried out separately. Since there are airtight isolation doors 11 between the two loading chambers 4 and the vapor deposition chamber 1, after the vapor deposition operation in the airtight deposition chamber is completed, the parts return to the original loading chamber for subsequent processing. The pretreated parts can be sent into the vapor deposition chamber 1 from the other loading chamber 4, and the required vapor deposition process can be started quickly. This avoids the waiting process when the vapor deposition chamber 1 is occupied by parts for subsequent processing, thereby improving the continuous working efficiency of the vapor deposition chamber 1.

[0073] Preferably, the loading chamber 4 is provided with a loading port 402 for opening and closing the loading chamber 4 to realize the loading and unloading of the parts to be processed. The loading chamber 4 is also provided with a gas interface 403 for connecting the vacuum system 3 and the gas filling assembly.

[0074] In-situ radiant heating devices can preheat engine blade products to be processed, making them meet the requirements of subsequent vapor deposition processing. Various schemes can be adopted for in-situ radiant heating devices to achieve the purpose of heating engine blades; their structure is not limited to a single one. This embodiment optimizes and adopts one feasible option: such as... Figure 15As shown, the in-situ radiant heating device includes two heating units arranged opposite each other. These units move closer or further apart under the action of a heating actuator 401. Each heating unit includes a set of gate valves 404 connected to and synchronously operating with the heating actuator 401. The gate valves 404 connect to and synchronously drive the heating housing 405. The heating housing 405 is provided with an insulation layer 406 and heating elements 407. When the two heating units move closer together, the gate valves 404 close to form a heating chamber, and the heating elements 407 heat the engine blades located within the heating chamber. In this configuration, the gate valves 404 reciprocate under the action of the heating actuator 401, causing the heating housing 405 to close or open. When the engine blades are in the preheating position, the heating housing 405 closes to cover the engine blades, and the internal heating elements 407 operate to raise the temperature, thus heating the engine blades. The insulation layer 406 allows more heat to remain within the in-situ radiant heating device, resulting in a better heating effect.

[0075] Before vapor deposition (VDP) treatment, engine blades are fed into the VDP chamber 1. To improve the utilization rate of the VDP chamber 1 and reduce its downtime, multiple mating structures 201 can be used to separate engine blades undergoing VDP treatment from those that have already completed VDP treatment, allowing them to enter the VDP chamber 1 in an orderly manner. This minimizes the downtime of the VDP chamber 1. Various solutions can be implemented, and the structure is not uniquely limited. This embodiment optimizes and adopts one feasible option: such as... Figure 1 , Figure 5As shown, it also includes a dual-feed system for driving the movement and attitude adjustment of the engine blades. The dual-feed system includes two feeding devices 5 located outside the two loading chambers 4 respectively. The feeding device 5 includes a linear displacement assembly, which drives the support shaft 505 to move between the loading chamber 4 and the vapor deposition chamber 1. The support shaft 505 and its front end rotating frame 509 are driven by a revolution driver 504 to achieve coaxial rotation. The rotating frame 509 is provided with a rotating clamp 511 for connecting the engine blades. The support shaft 505 is provided with an inner drive shaft 508 and is driven by a rotation driver 503. The rotating frame 509 is provided with several transmission shafts 510. The rotating clamp 511 is rotatably engaged with the transmission shafts 510. When the rotation driver 503 is started, the rotating clamp 511 is driven to rotate by the inner drive shaft 508 and the transmission shafts 510. When the above scheme is adopted, the support shaft 505 drives the rotating frame 509 to move forward, backward and flip synchronously. After the revolution drive 504 is turned on, the rotation of the entire support shaft 505 and the rotating frame 509 is realized. The revolution drive 504 can be a motor and cooperate with the support shaft 505 through a transmission belt, transmission gear and other structures. At the same time, the rotation drive 503 is connected to the inner drive shaft 508 and drives the inner drive shaft 508 to rotate, realizing the rotation of the inner drive shaft 508 within the support shaft 505. The inner drive shaft 508 can cooperate with the transmission shaft 510 through a bevel gear and other structures. The transmission shaft 510 and the rotating clamp 511 also cooperate through a bevel gear and other structures, thereby realizing the synchronous rotation of the rotating clamp 511. During this process, the engine blades rotate synchronously with the rotating clamp 511.

[0076] Preferably, in this embodiment, the portion of the support shaft 505 located outside the loading chamber is fitted with an airtight pipe 506. The airtight pipe 506 can be a corrugated pipe, which is connected and cooperates with the loading chamber. It can be compressed as the support shaft 505 enters the loading chamber, or extended as the support shaft 505 exits the loading chamber. Through the cooperation of the airtight pipe 506, the airtightness of the loading chamber can be maintained. An airtight connecting seat 507 is provided on the loading chamber 4, and the airtight pipe 506 is connected to the airtight connecting seat 507.

[0077] Preferably, the linear displacement assembly includes a displacement track 501 and a displacement base 502 disposed on the track, and the support shaft 505 is connected to the displacement base 502 and moves synchronously back and forth.

[0078] During the vapor deposition process, the temperature of some parts of the equipment rises significantly, and some areas even become high-temperature zones. To avoid instability in equipment operation or damage to adjacent structures due to excessive temperature, it is necessary to control the internal temperature of the equipment, especially in high-temperature operating areas. Temperature control can be achieved through various methods. This embodiment optimizes and adopts one feasible option: it also includes a cooling system 7. The cooling system 7 works in conjunction with at least the electron gun 2, the deposition chamber system, the dual loading system, and the dual feed system to provide cooling. With the above solution, both the electron gun 2 and the vapor deposition chamber 1 are high-temperature areas. The electron gun 2 itself generates high temperatures during operation, and the vapor deposition chamber 1 also exhibits high temperatures. The dual loading system is adjacent to the vapor deposition chamber 1 and requires pretreatment via an in-situ radiant heating device, thus also generating a temperature rise. The dual feed system is adjacent to the dual loading system and also experiences a temperature rise due to heat conduction. The arrangement of the cooling system 7 effectively reduces heat accumulation and allows for effective temperature control in the high-temperature areas.

[0079] In this embodiment, a water-cooled jacket is installed on the sedimentation chamber, which works in conjunction with a water-cooling system to achieve cooling and temperature reduction, thereby controlling the temperature of the sedimentation chamber.

[0080] A cooling system is used to maintain the temperature of the system equipment during operation, thereby ensuring the stable and reliable operation of the system equipment. In this embodiment, it includes temperature control of the vapor deposition chamber. This embodiment optimizes and adopts one feasible option: the cooling system includes a water-cooling system disposed within the vapor deposition chamber. The vapor deposition chamber forms a first chamber 109 for accommodating the target material and engine blades and performing vapor deposition, and a second chamber 110 surrounding the first chamber 109 for cooling. The second chamber 110 is connected to an inlet and an outlet. The liquid cooling medium enters from the inlet and exits from the outlet to form a circulating flow. When adopting the above scheme, the second chamber 110 can be embedded in the wall of the vapor deposition chamber, or a separate internal water-cooled wall can be provided for introducing the liquid cooling medium.

[0081] Different parts have different cooling requirements, and corresponding settings can be made according to the actual working components. Adapting the structure to the desired fit can effectively control the overall temperature. The structure is not uniquely limited; this embodiment optimizes and adopts one feasible option: the cooling system 7 includes a water-cooling component that works with the electron gun 2. The water-cooling component covers at least the cathode area, anode area, and secondary focusing area of ​​the thermionic electron gun; simultaneously, it covers at least the cathode area, anode area, gas ionization reaction area, and optical waveguide beam area of ​​the field emission electron gun. Using this scheme, the water-cooling component cools the electron gun 2, ensuring that the heat generated during operation is effectively transferred, preventing some parts from weakening due to increased temperature, affecting the electron beam emission path, and preventing some parts from generating vapor from electron beam bombardment, thus affecting the stability of the internal environment. This cooling method can effectively increase the emission power of the electron gun 2, for example, reaching 250kW.

[0082] Preferably, when using a thermionic electron gun, water-cooling temperature control of the cathode emission area can precisely ensure the temperature stability of the cathode, thereby forming a stable electron emission source. This greatly reduces the probability of sudden temperature changes during long-term power output, which could lead to beam instability, arcing, and other phenomena. Water-cooling the anode ensures that its temperature remains low over a long period, preventing it from melting due to electron bombardment and generating large amounts of metal vapor, thus protecting the cleanliness of the electron gun 2 internally, significantly extending its maintenance cycle, and reducing maintenance costs. Similarly, water-cooling temperature control and monitoring of the beam guide channel in the secondary focusing area ensures that the beam guide channel will not melt due to electron bombardment and generate large amounts of metal vapor, protecting the cleanliness of the electron gun 2 internally. Furthermore, real-time temperature monitoring provides direct feedback on the beam waist position and beam focusing status.

[0083] Preferably, when using a field emission electron gun, water-cooling temperature control of the cathode emission region can precisely ensure the temperature stability of the cathode, thereby forming a stable electron emission source. This greatly reduces the probability of sudden temperature changes during long-term power output, which could lead to beam instability, arcing, and other phenomena. Water-cooling temperature control of the hydrogen-oxygen gas ionization region ensures that the temperature of the ionization reaction region is controllable, preventing significant temperature runaway and ensuring the continuous and stable progress of the ionization reaction.

[0084] By implementing a water-cooling design for the anode, the anode temperature is kept at a low level for an extended period, ensuring that it will not melt under electron bombardment and generate a large amount of metal vapor. This protects the cleanliness of the electron gun 2, greatly extends the maintenance cycle of the electron gun 2, and reduces maintenance costs.

[0085] By controlling and monitoring the water-cooled temperature of the optical waveguide beam region, it is ensured that the beam channel will not be melted by electron bombardment under any circumstances, thus preventing the excitation of a large amount of metal vapor and protecting the cleanliness of the electron gun 2.

[0086] The entire device operates under the control of an automated system, which can be implemented using various methods. This embodiment optimizes and adopts one of the feasible options: such as... Figure 1 , Figure 5 As shown, it also includes a control system 9, which is used to monitor and automatically control the start-up and shutdown of the deposition chamber system, electron gun 2, dual loading system, dual feeding system, and cooling system 7. When the above scheme is adopted, corresponding monitoring elements can be set to acquire the operating parameters of each location and send the operating parameters to the control system 9. When the control system acquires the data from each monitoring element, it can process the data and generate corresponding control commands to achieve automated operation of the entire equipment.

[0087] Preferably, the control system 9 includes a main control cabinet. The main control cabinet integrates a CNC platform to centrally control the parameters of the vacuum system 3, the feeding system, and the electron gun 2, thereby achieving intelligent operation.

[0088] In this embodiment, a main support frame 12 is also included. The main support frame 12 is used to support core components such as the deposition chamber and vacuum system 3. The rigid frame design ensures the overall stability of the equipment, and the vibration resistance is optimized through dynamic simulation.

[0089] This embodiment also includes an operating platform bracket 10, which includes a control cabinet area 13 and an operating area 14. The operating platform bracket 10 provides a modular support structure, facilitating the deployment of the operating interface, sensor interface, and maintenance channel, and ensuring convenient human-machine interaction. In this embodiment, the operating platform bracket 10 is equipped with guardrails.

[0090] The above are the embodiments listed in this example; however, this example is not limited to the optional embodiments described above; those skilled in the art can arbitrarily combine the above methods to obtain other various embodiments; anyone can derive other various forms of embodiments under the guidance of this example. The above specific embodiments should not be construed as limiting the scope of protection of this example; the scope of protection of this example should be determined by the claims.

Claims

1. A high-power electron beam physical vapor deposition apparatus for engine blades, characterized in that, include: The deposition chamber system includes a vapor deposition chamber (1) with a mounting surface (103), wherein at least two electron gun connection positions are provided on the mounting surface (103), and a number of deflection sealing structures are provided in the vapor deposition chamber (1). At least two deflection sealing structures correspond one-to-one with the electron gun connection positions and are used to close or open the wall structure of the vapor deposition chamber (1), including the electron gun connection positions. The electron gun (2) includes a thermal emission electron gun and / or a field emission electron gun that are fitted to the electron gun connection position. The thermal emission electron gun and the field emission electron gun are fitted to the electron gun connection position through the same fitting structure (201) and are interchangeable. The transmitting power supply (6) includes a thermal emission power supply for powering the thermal emission electron gun and a field emission power supply for powering the field emission electron gun; The vacuum system (3) is connected to and cooperates with the vapor deposition chamber (1) to adjust the vacuum level of the vapor deposition chamber (1); The target deposition system (15) is used to provide a target to the vapor deposition chamber (1), which is then evaporated after being bombarded by an electron beam and forms a film on the surface of the engine blade. It also includes a dual loading chamber system for loading, unloading and pre-treating engine blades. The dual loading chamber system includes two loading chambers (4) respectively located on both sides of the vapor deposition chamber (1). An isolation door (11) is provided at the connection between the loading chamber (4) and the vapor deposition chamber (1) to control the opening and closing. The loading chamber (4) is connected to a vacuum system (3) and an inflation assembly. The vacuum system (3) and the inflation assembly are used to regulate the air pressure in the loading chamber (4). An in-situ radiant heating device for preheating the engine blades is also provided in the loading chamber (4). The in-situ radiant heating device includes two heating units arranged opposite each other. The heating units move closer or further apart under the drive of the heating driver (401). Each heating unit includes a set of gate valves (404) that are connected to and cooperate with the heating driver (401) and operate synchronously. The gate valves (404) are connected to and synchronously drive the heating housing (405) to operate. The heating housing (405) is provided with a heat insulation layer (406) and a heating element (407). When the two heating units move closer together, the gate valves (404) close to form a heating chamber. The heating element (407) heats the engine blades located in the heating chamber. It also includes a dual-feed system for driving the movement and attitude adjustment of the engine blades. The dual-feed system includes two feeding devices (5) located outside the two loading chambers (4), respectively. The feeding device (5) includes a linear displacement assembly for driving the support shaft (505) to move between the loading chamber (4) and the vapor deposition chamber (1). The support shaft (505) and its front end rotating frame (509) are driven by a revolution drive (504) to achieve coaxial rotation. The frame (509) is equipped with a rotary clamp (511) for connecting engine blades. The support shaft (505) is equipped with an inner drive shaft (508) and is driven by a self-rotating driver (503). The rotating frame (509) is equipped with several transmission shafts (510). The rotary clamp (511) and the transmission shaft (510) are rotatably engaged. When the self-rotating driver (503) is started, the rotary clamp (511) is driven to rotate by the inner drive shaft (508) and the transmission shaft (510).

2. The high-power electron beam physical vapor deposition equipment for engine blades according to claim 1, characterized in that: The electron gun connection position includes a connection hole provided on the mounting surface (103), and a connection flange is provided at the connection hole; the mating structure (201) of the thermal emission electron gun and the field emission electron gun both include a flange joint adapted to the connection flange.

3. The high-power electron beam physical vapor deposition equipment for engine blades according to claim 2, characterized in that: The deflection closure structure includes a deflection blade (107), which is driven and deflected by a deflection driver (108). When the deflection blade (107) moves to the closed position, it closes the wall structure including the connection hole. When the deflection blade (107) moves to the open position, it opens the wall structure including the connection hole.

4. The high-power electron beam physical vapor deposition equipment for engine blades according to claim 1, characterized in that: The vapor deposition chamber (1) is provided with a target deposition port (104), which is closed or opened by a deflection sealing structure. The target deposition system (15) includes a target sleeve assembly (1501) that communicates with the target deposition port (104) and maintains an airtight seal. The free end of the target sleeve assembly (1501) is connected to a rotating device (1503), which is used to drive the target material in the target sleeve assembly (1501) to rotate along the axis. The target deposition system (15) also includes a feeding device (1502) that cooperates with the target sleeve assembly (1501), which is used to drive the target material into or out of the vapor deposition chamber (1).

5. The high-power electron beam physical vapor deposition apparatus for engine blades according to claim 1, characterized in that: It also includes a cooling system (7), which is used in conjunction with at least the electron gun (2), the deposition chamber system, the dual loading system and the dual feed system to provide cooling.

6. The high-power electron beam physical vapor deposition apparatus for engine blades according to claim 5, characterized in that: The cooling system includes a water cooling system disposed in a vapor deposition chamber (1), wherein a first chamber (109) is formed inside the vapor deposition chamber to accommodate the target material and engine blades and to perform vapor deposition, and a second chamber (110) surrounds the first chamber (109) and is used for cooling. The second chamber (110) is connected to an inlet and an outlet, and the liquid cooling medium enters from the inlet and exits from the outlet to form a circulating flow.

7. The high-power electron beam physical vapor deposition apparatus for engine blades according to claim 1, characterized in that: It also includes a control system (9) for monitoring and automating the start-up and shutdown of the deposition chamber system, electron gun (2), dual loading system, dual feeding system and cooling system (7).

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