Base station antenna, beam adjustment method and base station
By setting baffles on both sides of the base station antenna subarray and adjusting their height, different waveforms are synthesized, solving the problem of the non-adjustable horizontal beam of traditional base station antennas, and realizing flexible beam adjustment and enhanced communication coverage.
Patent Information
- Application Number
- CN202511587886.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-03
- Publication Date
- 2026-02-06
- Estimated Expiration
- 2045-11-03
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Figure CN121076449B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present disclosure relates to the technical field of antennas, in particular to a base station antenna, a beam adjusting method and a base station. BACKGROUND
[0002] As a core component of wireless communication technology, the beam emitted by the base station antenna determines the coverage range and user experience of the communication network. The traditional base station antenna is a plate-shaped antenna, which has a long-range adjustment function of the vertical dimension beam downtilt angle, but only has a fixed beam width and beam pointing in the horizontal dimension, that is, it does not have the horizontal dimension beam adjustment capability. Therefore, the base station antenna cannot be freely beamformed, which limits the coverage range of the communication network. SUMMARY
[0003] The present disclosure provides a base station antenna, a beam adjusting method and a base station.
[0004] In a first aspect, the present disclosure provides a base station antenna, comprising: an antenna subarray, a baffle and an adjusting unit, the baffle is arranged on both sides of the antenna subarray for generating parasitic radiation; the adjusting unit is connected with the baffle, and the height of the baffle on both sides of the antenna subarray is adjusted by the transmission structure of the adjusting unit, so that the radiation beam of the antenna subarray and the parasitic radiation are synthesized into different waveforms to adjust the beam state of the antenna subarray in the horizontal dimension.
[0005] In a second aspect, the present disclosure provides a beam adjusting method, comprising:
[0006] By adjusting the height of the baffle on both sides of the antenna subarray in the base station antenna provided by the present disclosure, the beam state of the base station antenna in the horizontal dimension is adjusted.
[0007] In a third aspect, the present disclosure provides a base station, comprising a radio frequency processing unit and a base station antenna, the radio frequency processing unit and the base station antenna are signal connected, and the base station antenna comprises the base station antenna provided by the present disclosure.
[0008] The base station antenna provided by the present disclosure comprises an antenna subarray, a baffle arranged on both sides of the antenna subarray for generating parasitic radiation, and an adjusting unit connected with the baffle. The height of the baffle on both sides of the antenna subarray is adjusted by the transmission structure of the adjusting unit, so that the radiation beam of the antenna subarray and the parasitic radiation are synthesized into different waveforms, thereby realizing the adjustment of the beam state of the antenna array in the horizontal dimension, that is, adjusting the beam width and beam pointing in the horizontal dimension, thereby improving the flexibility of beamforming. Moreover, the original architecture of the base station antenna is slightly changed, and it is easy to implement. BRIEF DESCRIPTION OF DRAWINGS
[0009] In the drawings of the embodiments of the present disclosure:
[0010] Figure 1 A principle block diagram of a base station antenna provided by an embodiment of the present disclosure is shown;
[0011] Figure 2 A principle block diagram of another base station antenna provided by an embodiment of the present disclosure is shown;
[0012] Figure 3 A partial structure schematic diagram of a base station antenna provided by an embodiment of the present disclosure is shown;
[0013] Figure 4 A side view of a base station antenna provided by an embodiment of the present disclosure in a first direction is shown;
[0014] Figure 5 A side view of a base station antenna provided by an embodiment of the present disclosure in a first direction is shown;
[0015] Figure 6 A state diagram of a base station antenna provided by an embodiment of the present disclosure is shown;
[0016] Figure 7 A state diagram of another base station antenna provided by an embodiment of the present disclosure is shown;
[0017] Figure 8 A state diagram of another base station antenna provided by an embodiment of the present disclosure is shown;
[0018] Figure 9 A state diagram of another base station antenna provided by an embodiment of the present disclosure is shown;
[0019] Figure 10 A state diagram of another base station antenna provided by an embodiment of the present disclosure is shown;
[0020] Figure 11 A structure schematic diagram of a full-metal surface baffle provided by an embodiment of the present disclosure is shown;
[0021] Figure 12 A structure schematic diagram of a metasurface baffle provided by an embodiment of the present disclosure is shown;
[0022] Figure 13 A block diagram of a frequency selection unit provided by an embodiment of the present disclosure is shown;
[0023] Figure 14 A structure schematic diagram of a frequency selection unit provided by an embodiment of the present disclosure is shown;
[0024] Figure 15 A structure schematic diagram of an antenna array provided by an embodiment of the present disclosure is shown;
[0025] Figure 16A structural schematic diagram of an antenna subarray is shown.
[0026] Figure 17 A structural schematic diagram of another antenna subarray is shown.
[0027] Figure 18 A partial structural schematic diagram of a base station antenna is shown.
[0028] Figure 19 A flowchart of a beam adjustment method is shown.
[0029] Figure 20 A block diagram of a base station is shown. DETAILED DESCRIPTION
[0030] For those skilled in the art to better understand the technical solutions of the present disclosure, the embodiments of the present disclosure will be described in detail below with reference to the drawings.
[0031] The present disclosure will be described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the present disclosure are shown. This disclosure may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present disclosure to those skilled in the art.
[0032] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present disclosure and constitute a part of the specification, illustrate the embodiments of the present disclosure and together with the detailed description serve to explain the present disclosure. The above and other features and advantages of the present disclosure will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings.
[0033] The embodiments of the present disclosure and the features in the embodiments can be combined if there is no conflict.
[0034] The terms used in the present disclosure are only used to describe specific embodiments and are not intended to limit the present disclosure. As used in the present disclosure, the term "and / or" includes any and all combinations of one or more of the associated listed items. As used in the present disclosure, the singular forms "a" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. As used in the present disclosure, the terms "comprises", "comprising", "consists of", "consisting of", "consists essentially of", "consisting essentially of", specify the presence of stated features, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.
[0035] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and will not be interpreted in an overly literal or overly formal sense unless expressly so defined herein.
[0036] The present disclosure is not limited to the embodiments shown in the drawings, but includes modifications of the configuration formed based on the manufacturing process. Therefore, the regions exemplified in the drawings have a schematic property, and the shape of the regions shown in the drawings exemplifies a specific shape of the region of the element, but is not intended to be restrictive.
[0037] Since the single-column antenna is not in a multiple-input multiple-output (MIMO) form in the horizontal direction, it is difficult to realize beam adjustment based on array beamforming. For this reason, in some related technologies, a parasitic wall is installed on the side of the antenna array, and the beam width of the antenna radiation signal is adjusted by adjusting the frequency band of the transmitted signal of the parasitic wall, however, the parasitic wall structure is complex, needs active devices and power supply for control, and has a high requirement for the antenna protection level. More importantly, this scheme still cannot adjust the antenna beam pointing in the horizontal dimension, that is, the horizontal dimension beam adjustment capability is limited, resulting in a limited coverage range of the communication network.
[0038] The embodiment of the present disclosure provides a base station antenna. Figure 1 A schematic diagram of a base station antenna provided by the embodiment of the present disclosure is shown. As shown in the figure, Figure 1 The base station antenna 100 includes an antenna subarray 111, a baffle 120, and an adjustment unit 200. The baffle 120 is arranged on both sides of the antenna subarray 111 and is used to generate parasitic radiation. The adjustment unit 200 is connected with the baffle 120, and the height of the baffle 120 on both sides of the antenna subarray 111 is adjusted by the transmission structure of the adjustment unit 200, so that the radiation beam of the antenna subarray 111 and the parasitic radiation generated in the baffle 120 synthesize different waveforms, to adjust the beam state of the antenna subarray 111 in the horizontal dimension.
[0039] The embodiment of the present disclosure adjusts the height of the baffle 120 on both sides of the antenna subarray 111 by the adjustment unit 200, so that the radiation beam of the antenna subarray 111 and the parasitic radiation generated in the baffle 120 synthesize different waveforms, thereby realizing the adjustment of the beam state of the antenna subarray 111 in the horizontal dimension, that is, adjusting the beam width and beam pointing in the horizontal dimension, and further improving the flexibility of beamforming.
[0040] Figure 2 A schematic diagram of another base station antenna provided by the embodiment of the present disclosure is shown. As shown in the figure, Figure 2As shown, the base station antenna includes an antenna array 110, and the antenna array 110 includes N columns of antenna subarrays.
[0041] In some embodiments, the adjusting unit 200 includes a transmission mechanism 130 and a driving module 140, wherein the driving module 140 is configured to provide a driving force for the baffle 120, and the transmission mechanism 130 is configured to transmit the driving force generated by the driving module 140 to the baffle 120.
[0042] In some embodiments, the driving module 140 can be an electric adjustment module, a thermal power module, a pneumatic power module, or the like. When the driving module 140 is an electric adjustment module, the electric adjustment module can be an electric adjustment module that is currently used in the original base station antenna, and thus it is not necessary to design a dedicated electric adjustment module, and the architecture of the original base station antenna is changed little, and thus it is easy to implement.
[0043] In some embodiments, the base station antenna further includes a phase shifter 150, a first end of a movable part of the phase shifter 150 is connected to a movable end of the transmission mechanism 130, and a second end of the movable part of the phase shifter 150 is connected to the antenna subarray 111. The transmission mechanism 130 transmits the driving force of the driving module 140 to the phase shifter 150, so as to adjust the wave state perpendicular to the antenna subarray 111, that is, to adjust the wave state in the vertical dimension of the antenna subarray 111.
[0044] In the case where the baffle 120 and the phase shifter 150 share one transmission mechanism, the transmission mechanism 130 can drive the baffle 120 and the phase shifter 150 in time division mode; or in the case where the baffle 120 and the phase shifter 150 each have a corresponding transmission mechanism 130, each transmission mechanism 130 drives the baffle 120 and the phase shifter 150 connected thereto.
[0045] In some embodiments, the base station antenna further includes a calibration network 160, and when the base station antenna includes multiple columns of antenna subarrays, the calibration network 160 is configured to calibrate the phases between different antenna subarrays.
[0046] In some embodiments, the base station antenna further includes a power divider, and each antenna element in the antenna subarray is connected to the power divider with a fixed power ratio and phase.
[0047] Figure 3 A partial structure schematic diagram of a base station antenna is shown. As shown in FIG. 1, the base station antenna includes an antenna array 110, and the antenna array 110 includes N columns of antenna subarrays 111. Figure 3 As shown, the antenna array includes N columns of antenna subarrays 111, and each column of antenna subarrays 111 includes M antenna elements 1111, wherein N and M are integers greater than or equal to 1.
[0048] In some embodiments, the M antenna elements 1111 are arranged at intervals, and the disclosure does not limit the distance between adjacent antenna elements 1111. In this embodiment, the arrangement direction of the antenna elements 1111 is the first direction X.
[0049] In some embodiments, the N column antenna subarrays 111 are arranged at intervals in the second direction Y, and the first direction X and the second direction Y are perpendicular to each other. In this embodiment, the first direction is also referred to as the horizontal dimension of the antenna array, and the second direction is also referred to as the vertical dimension of the antenna array.
[0050] The baffle 120 is arranged on both sides of the antenna subarray 111, and under the influence of the radiation generated by the antenna subarray 111, parasitic radiation will be generated in the baffle 120. The baffle 120 includes a first sub-baffle 121 and a second sub-baffle 122, and the first sub-baffle 121 and the second sub-baffle 122 are arranged on one side of the antenna subarray 111, respectively.
[0051] The adjusting unit is connected with the baffle 120, and the height of the baffle 120 on both sides of the antenna subarray is adjusted by the transmission structure of the adjusting unit, that is, Figure 3 the height of the third direction Z, so that the radiation beam of the antenna subarray and the parasitic radiation synthesize different waveforms, so as to adjust the beam state of the antenna subarray in the horizontal dimension, such as to realize the adjustment of the beam width and the beam pointing of the antenna subarray in the horizontal dimension.
[0052] The base station antenna provided by the embodiment of the disclosure includes an antenna subarray, a baffle is arranged on both sides of the antenna subarray for generating parasitic radiation, and an adjusting unit is connected with the baffle. The height of the baffle on both sides of the antenna subarray is adjusted by the transmission structure of the adjusting unit, so that the radiation beam of the antenna subarray and the parasitic radiation synthesize different waveforms, thereby realizing the adjustment of the beam state of the antenna array in the horizontal dimension, that is, adjusting the beam width and the beam pointing in the horizontal dimension, thereby improving the flexibility of beamforming, and the original architecture of the base station antenna is slightly changed and easy to implement.
[0053] Figure 4 A side view of the base station antenna provided by the embodiment of the disclosure in the first direction is shown. As Figure 4 shown, the spacing D between the baffle 120 and the antenna element 1111 is 0.02λ-0.2λ, and λ is the free space wavelength corresponding to the center operating frequency of the antenna array.
[0054] It should be noted that the spacing D between the baffle 120 and the antenna element 1111 refers to the shortest distance between the edge of the antenna element 1111 and the baffle 120.
[0055] In some embodiments, the baffle 120 includes a first sub-baffle 121 and a second sub-baffle 122, and the first sub-baffle 121 and the second sub-baffle 122 have the same or different heights in the third direction. When adjusting the heights of the first sub-baffle 121 and the second sub-baffle 122, the first sub-baffle 121 and the second sub-baffle 122 can be adjusted synchronously or asynchronously.
[0056] Figure 5 A side view of the base station antenna provided by the embodiments of the present disclosure in the first direction is shown. As shown in the figure, the length L of the baffle 120 is greater than the length of the antenna subarray 111, and the end of the baffle 120 extends beyond the end of the antenna subarray 111, so that the first sub-baffle and the second sub-baffle can shield the end of the antenna subarray 111 in the first direction. Figure 5
[0057] As shown in the figure, the base station antenna further includes a reflecting plate 1101, and the antenna subarray is arranged on the same side of the plane where the reflecting plate 1101 is located. The reflecting plate 1101 is used to concentrate and reflect the electromagnetic waves emitted by the antenna subarray in a specific direction as required, so as to enhance the signal transmission or reception effect. Figure 3
[0058] At least one pair of slots 1102 is arranged on the reflecting plate 1101 and penetrates the thickness of the reflecting plate 1101. Each pair of slots 1102 includes a first slot 1102a and a second slot 1102b, and the first slot 1102a and the second slot 1102b are arranged on the left and right sides of the antenna subarray 111, respectively. For example, the first slot 1102a is arranged on the left side of the antenna subarray 111, and the second slot 1102b is arranged on the right side of the antenna subarray 111. The first sub-baffle 121 and the second sub-baffle 122 are arranged in the first slot 1102a and the second slot 1102b, respectively.
[0059] As shown in the figure, the height H of the top end of the baffle 120 extending out of the reflecting plate 1101 is 0-0.5λ, that is, the distance between the top end of the first sub-baffle 121 and the second sub-baffle 122 and the surface of the reflecting plate 1101 is 0-0.5λ, and λ is the free space wavelength corresponding to the center working frequency of the antenna array. Figure 4 In the embodiments of the present disclosure, the radiation mode of the antenna element itself is a dipole mode, and the radiation direction is perpendicular to the reflecting plate. The radiation mode of the baffle 120 is similar to a monopole mode placed vertically on the reflecting plate 1101, and the radiation beam is along the reflecting plate towards the side (parallel to the ground). By adjusting the heights of the first sub-baffle 121 and the second sub-baffle 122, the beam width and the beam pointing direction of the antenna radiation pattern can be adjusted.
[0060]
[0061] When the heights of the baffles 120 are different, and the heights of the first baffle 121 and the second baffle 122 are the same, the lateral radiation intensity is different. This intensity, combined with the original radiation direction of the radiating antenna element, can produce beams of different widths. When the heights of the first baffle 121 and the second baffle 122 are not the same, the direction of the antenna beam can be adjusted.
[0062] When the height of the first baffle 121 is lower than that of the second baffle 122, the first baffle 121 acts as a guide, drawing the original radiation beam of the antenna element 1111 towards the first baffle 121. The second baffle 122 acts as a reflector, reflecting the antenna beam towards the first baffle 121. Under the combined action of the first and second baffles 121, the antenna beam deflects towards the first baffle 121. Specifically, the degree of deviation of the antenna beam towards the first baffle 121 is mainly related to the height of the second baffle 122. The higher the second baffle 122, the stronger its ability to reflect the beam towards the first baffle 121, and the greater the deviation angle of the antenna beam towards the first baffle 121. Conversely, when the height of the second baffle 122 is lower than that of the first baffle 121, the second baffle 122 acts as a guide, pulling the original radiation beam of the antenna element 1111 towards the second baffle 122. The first baffle 121 acts as a reflector, reflecting the antenna beam towards the second baffle 122. Under the combined action of the first and second baffles 121, the antenna beam deflects towards the second baffle 122. The degree of deviation of the antenna beam towards the second baffle 122 is mainly related to the height of the first baffle 121. The higher the height of the first baffle 121, the stronger the ability to reflect the beam towards the second baffle 122, and the larger the deflection angle of the antenna beam towards the second baffle 122.
[0063] Figure 6 This diagram illustrates the state of a base station antenna according to an embodiment of the present disclosure. Figure 6 As shown, the first baffle 121 and the second baffle 122 extend out of the reflector 1101 at the same height and are half of the maximum height H, i.e., 0.25λ. At this time, the width of the horizontal beam 1105 superimposed by the antenna array and the first baffle 121 and the second baffle 122 is denoted as the initial horizontal beam width, which can be 65°.
[0064] Figure 7 This diagram illustrates the state of another base station antenna according to an embodiment of this disclosure. Figure 7As shown, the first baffle 121 and the second baffle 122 extend out of the reflector 1101 at the same height and at the highest height H, i.e., 0.5λ. At this time, the first baffle 121 and the second baffle 122 have the strongest lateral radiation capability. When superimposed with the radiation pattern of the antenna array, the width of the horizontal beam 1106 generated is the widest, which can be 80°. That is, increasing the extension height of the first baffle 121 and the second baffle 122 can increase the beamwidth of the antenna.
[0065] Figure 8 This diagram illustrates the state of another base station antenna according to an embodiment of the present disclosure. Figure 8 As shown, when the first baffle 121 and the second baffle 122 are both lowered and do not extend beyond the reflector 1101, the radiation pattern of the antenna array cannot be superimposed with the lateral radiation of the first baffle 121 and the second baffle 122. The width of the horizontal beam 1107 of the antenna array is the narrowest, which can be 50°. That is, by reducing the extension height of the first baffle 121 and the second baffle 122, the beam width of the antenna array can be narrowed.
[0066] Depend on Figure 6 to Figure 8 It can be seen that by adjusting the height of the first baffle 121 and the second baffle 122 so that the first baffle 121 and the second baffle 122 are at different heights but the same height, the horizontal beamwidth of the antenna can be adjusted between 65° and 80°.
[0067] When the heights of the first baffle 121 and the second baffle 122 are not the same, the beam pointing of the antenna array will be biased to one side, and the beam pointing of the antenna array will be biased to the side with the lower height. Figure 9 This diagram illustrates the state of another base station antenna according to an embodiment of the present disclosure. Figure 9 As shown, when the first baffle 121 is not extended beyond the reflector 1101, and the second baffle 122 is in its highest position, the beam direction of the horizontal beam 1108 of the antenna array is deflected to the first baffle 121 to the maximum extent.
[0068] Figure 10 This diagram illustrates the state of another base station antenna according to an embodiment of the present disclosure. Figure 10 As shown, when the second baffle 122 is completely not extended from the reflector 1101, and the first baffle 121 is in its highest position, the beam pointing of the horizontal beam 1109 of the antenna array is deflected to the second baffle 122 to the maximum extent.
[0069] Depend on Figure 9 to Figure 10 It can be seen that by adjusting the height of the first baffle 121 and the second baffle 122 so that the heights of the first baffle 121 and the second baffle 122 are not the same, the beam pointing of the horizontal beam of the antenna array can be deviated in the second direction (left and right).
[0070] In some embodiments, the baffle 120 includes an all-metal surface baffle or a metasurface baffle.
[0071] Figure 11 This diagram illustrates the structure of an all-metal surface baffle provided in an embodiment of this disclosure. Figure 11 As shown, the baffle 120 is an all-metal surface baffle, meaning that at least its surface is a conductive metal layer. For example, the entire baffle 120 may be a conductive metal layer, such as a copper or aluminum plate. Alternatively, the baffle 120 may include a baffle body and a conductive metal layer, with the conductive metal layer covering the surface of the baffle body. The baffle body can be made of a non-metallic material, while the conductive metal layer may be made of a conductive metal. For example, the baffle body may be a PCB board, and the conductive metal layer may be a copper or aluminum layer. The all-metal baffle 120, or the baffle 120 with a conductive metal layer on its surface, can excite an equivalent vertical dipole mode, generating lateral radiation. This radiation is superimposed on the radiation pattern of the antenna element to adjust the shape of the synthesized beam.
[0072] Figure 12 A schematic diagram of a metasurface baffle provided in an embodiment of this disclosure is shown. Figure 12 As shown, the metasurface baffle includes a baffle body 123 and a frequency selection layer 125, with the frequency selection layer 125 disposed on the surface of the baffle body 123. The baffle body 123 can be a PCB board, and the frequency selection layer 125 can be a copper plate or an aluminum plate.
[0073] In some embodiments, the frequency selection layer 125 comprises a plurality of frequency selection units arranged periodically in a two-dimensional space, wherein the frequency selection units are ±45° or horizontally and vertically bipolarized.
[0074] Figure 13 This diagram illustrates a frequency selection unit according to an embodiment of the present disclosure. Figure 14 This diagram illustrates the structure of a frequency selection unit according to an embodiment of the present disclosure. (In conjunction with...) Figure 12 to Figure 14The frequency selection unit 124 includes two pairs of orthogonal frequency selection modules, i.e., the first frequency selection module 1201 and the third frequency selection module 1203 form a pair of frequency selection modules, constituting a group of polarization characteristics; the second frequency selection module 1202 and the fourth frequency selection module 1204 form another pair of frequency selection modules, constituting another group of polarization characteristics, and the two pairs of frequency selection modules are symmetrically arranged at the center of the frequency selection unit. When the electromagnetic wave of the L (low frequency) band is incident on the frequency selection unit 124, the first frequency selection module 1201, the second frequency selection module 1202, the third frequency selection module 1203 and the fourth frequency selection module 1204 generate parallel LC resonance, which is equivalent to an open circuit, at this time, the electromagnetic wave can pass through the frequency selection layer, forming transmission. When the electromagnetic wave of the H (high frequency) band is incident on the frequency selection layer, the first frequency selection module 1201, the second frequency selection module 1202, the third frequency selection module 1203 and the fourth frequency selection module 1204 generate series LC resonance, which is equivalent to a short circuit, at this time, the electromagnetic wave cannot pass through the frequency selection layer, forming reflection.
[0075] In some embodiments, any one frequency selection module includes at least one first bent slot 1241 and at least one second bent slot 1242, the at least one first bent slot 1241 and the at least one second bent slot 1242 are connected in turn and alternately, the extension directions of the first bent slot 1241 and the second bent slot 1242 are different, forming a frequency selection module in a serpentine structure. In some embodiments, the first bent slot 1241 and the second bent slot 1242 are arranged orthogonally.
[0076] In some embodiments, the first frequency selection module 1201 includes five first bent slots 1241 and five second bent slots 1242, the five first bent slots 1241 and the five second bent slots 1242 are connected in turn and alternately orthogonally, forming a frequency selection module in a serpentine structure.
[0077] In some embodiments, the antenna array includes one or more frequency band antenna subarrays.
[0078] Figure 15 A structural schematic diagram of an antenna array provided by an embodiment of the present disclosure is shown as follows: Figure 15 As shown, the antenna array includes an L-band antenna subarray 1103 and an H-band antenna subarray 1104, and the L-band antenna subarray 1103 and the H-band antenna subarray 1104 are both in operation. When the frequency band for beam width and beam pointing adjustment is the H-band antenna subarray 1104, the baffle 120 can be a full-metal surface baffle or a metasurface baffle.
[0079] Metasurface baffles have a frequency-selective function, exhibiting a metallic boundary effect of total electromagnetic wave reflection in the H-band and an electromagnetic transparency effect of total electromagnetic wave transmission in the L-band. When using metasurface baffles, because they reflect in the H-band, the beamwidth and beam pointing of the H-band antenna subarray 1104 can be adjusted. Since the metasurface baffle transmits in the L-band, it has a minimal impact on the radiation pattern of the antenna subarray operating in the L-band. Conversely, the metasurface baffle can also transmit in the H-band and reflect in the L-band. In high- and low-frequency interleaved arrays, metasurface baffles can be used to selectively adjust the beam state of antenna elements in the target tuning frequency band, but have minimal impact on the beam state of antenna elements in non-target tuning frequency bands.
[0080] In some embodiments, multiple antenna elements in the antenna subarray are aligned or misaligned in a first direction.
[0081] Figure 16 This diagram illustrates the structure of an antenna subarray according to an embodiment of the present disclosure, as shown below. Figure 16 As shown, in the antenna subarray, the antenna elements 1111 are staggered in the first direction, that is, the antenna elements 1111 are offset to the left or right by a certain distance relative to the array centerline. The first sub-baffle 121 and the second sub-baffle 122 are located on both sides of the antenna subarray 111. The staggered arrangement of the antenna elements 1111 can narrow the original horizontal beamwidth of the antenna array, and can adjust the original horizontal beamwidth to 50°, thereby allowing the horizontal beamwidth of the antenna to be adjusted between 50° and 80°.
[0082] Figure 17 This illustration shows a schematic diagram of another antenna subarray provided in an embodiment of the present disclosure, such as... Figure 17 As shown, the antenna array includes two antenna subarrays 111, with multiple antenna elements in each subarray aligned along its centerline. Each antenna subarray 111 has a first baffle 121 and a second baffle 122 on both sides. The first baffles 121 and the second baffles 122 of the two subarrays 111 can be adjusted synchronously. Alternatively, the first baffles 121 and the second baffles 122 of the antenna subarrays 111 can be adjusted independently.
[0083] Figure 18 This diagram illustrates a partial structural schematic of a base station antenna according to an embodiment of the present disclosure, such as... Figure 18 As shown, the fixed end of the transmission mechanism 130 is connected to the output end of the drive module 140, and the movable end of the transmission mechanism 130 is connected to the baffle 120. The transmission mechanism 130 transmits the driving force of the drive module 140 to the baffle 120 to adjust the height of the baffle 120.
[0084] In the case that the first sub-baffle 121 and the second sub-baffle 122 share one transmission mechanism 130, the heights of the first sub-baffle 121 and the second sub-baffle 122 are synchronously adjusted; in the case that the first sub-baffle 121 and the second sub-baffle 122 are respectively provided with transmission mechanisms 130, the heights of the first sub-baffle 121 and the second sub-baffle 122 are synchronously or asynchronously adjusted.
[0085] It should be noted that the first sub-baffle 121 and the second sub-baffle 122 in different antenna sub-arrays can be driven by two transmission mechanisms 130, and the first sub-baffle 121 and the second sub-baffle 122 in the same antenna sub-array can also be driven by two transmission mechanisms 130, that is, each baffle corresponds to two independent transmission mechanisms 130.
[0086] The control protocol of the transmission mechanism 130 is not limited in the embodiments of the present disclosure, and the AISG protocol can be used, for example.
[0087] When the base station antenna is provided with N column antenna sub-arrays 111, the number of baffles 120 is 2xN. If the base station antenna includes Q (Q is a positive integer greater than or equal to 0) phase shifters, the first baffles 121 of each column antenna sub-array 111 can be synchronously adjusted, and the second baffles 122 of each column antenna sub-array can be synchronously adjusted, in which case 2+Q transmission mechanisms 130 are required; if the first baffles 121 and the second baffles 122 corresponding to each column antenna sub-array 111 can be independently adjusted, 2xN+Q transmission mechanisms 130 are provided in total.
[0088] In some embodiments, the base station antenna can also be provided with two transmission mechanisms 130, one transmission mechanism 130 is used to select a driving channel, that is, to select a baffle 120 or a phase shifter 150, and the other transmission mechanism 130 is used for driving, when the baffle 120 is selected, the transmission mechanism 130 drives the baffle 120; when the phase shifter 150 is selected, the transmission mechanism 130 drives the phase shifter 150.
[0089] The embodiments of the present disclosure also provide a beam adjustment method. Figure 19 A flow chart of a beam adjustment method provided by the embodiments of the present disclosure is shown. As shown in Figure 19 The beam adjustment method provided by the embodiments of the present disclosure includes:
[0090] In step S1901, the height of the baffle in the base station antenna on both sides of the antenna sub-array is adjusted to adjust the beam state of the base station antenna in the horizontal dimension.
[0091] The base station antenna used herein is the base station antenna provided by the embodiments of the present disclosure, and will not be described again here for the sake of brevity.
[0092] In some embodiments, the beam state includes beam width and beam pointing.
[0093] The height of the first sub-baffle and the second sub-baffle in the corresponding baffle of the antenna subarray is adjusted by the adjusting unit, and the height of the first sub-baffle and the second sub-baffle is the same, so as to adjust the beam width of the base station antenna in the horizontal dimension.
[0094] And / or, the height of the first sub-baffle and the second sub-baffle in the corresponding baffle of the antenna subarray is adjusted by the adjusting unit, and the height of the first sub-baffle and the second sub-baffle is different, so as to adjust the beam pointing of the base station antenna in the horizontal dimension.
[0095] The specific adjustment mode of the adjusting unit for the antenna subarray can be combined with Figure 6 to Figure 10 and the corresponding text part, which will not be repeated here.
[0096] The beam adjustment method provided by the embodiment of the present disclosure, the base station antenna used in the method includes an antenna subarray, a baffle is arranged on both sides of the antenna subarray, and an adjusting unit is connected with the baffle. The height of the baffle on both sides of the antenna subarray is adjusted by the transmission structure of the adjusting unit, so that the radiation beam of the antenna subarray and the parasitic radiation are synthesized into different waveforms, thereby realizing the adjustment of the beam state of the antenna array in the horizontal dimension, that is, adjusting the beam width and the beam pointing in the horizontal dimension, thereby improving the flexibility of beamforming, and the original architecture of the base station antenna is slightly changed and easy to implement.
[0097] The embodiment of the present disclosure also provides a base station. Figure 20 The composition block diagram of a base station provided by the embodiment of the present disclosure is shown. As shown in the figure, Figure 20 The base station provided by the embodiment of the present disclosure includes a radio frequency processing unit 1901 and a base station antenna 1902, and the radio frequency processing unit 1901 and the base station antenna 1902 are signal connected. The base station antenna includes the base station antenna provided by the embodiment of the present disclosure.
[0098] The base station provided by the embodiment of the present disclosure adopts the base station antenna provided by the embodiment of the present disclosure. The base station antenna includes an antenna subarray, a baffle is arranged on both sides of the antenna subarray, and an adjusting unit is connected with the baffle. The height of the top end of the baffle from the plane where the antenna subarray is located is adjusted. The height change of the baffle relative to the antenna oscillator can change the synthesized waveform of the parasitic radiation of the baffle and the self-radiation of the antenna oscillator, thereby realizing the adjustment of the beam state of the antenna array in the horizontal dimension, that is, adjusting the beam width and the beam pointing in the horizontal dimension, thereby improving the flexibility of beamforming, and the original architecture of the base station antenna is slightly changed and easy to implement.
[0099] The present disclosure has disclosed example embodiments, and while specific terminology has been employed, it is merely in the service of a general descriptive purpose and should not be construed as limiting. In some instances, it will be apparent to those skilled in the art that features, characteristics, and / or elements described in connection with a particular embodiment can be used in conjunction with other embodiments unless otherwise explicitly stated. As such, those skilled in the art will appreciate that various changes can be made in form and detail without departing from the scope of the disclosure as set forth in the appended claims.
Claims
1. A base station antenna, characterized by, The application relates to an antenna subarray, a baffle and an adjusting unit, the baffle is arranged on both sides of the antenna subarray and used for generating parasitic radiation; the adjusting unit is connected with the baffle, the height of the baffle on both sides of the antenna subarray is adjusted by a transmission structure of the adjusting unit, the radiation beam of the antenna subarray and the parasitic radiation are combined into different waveforms, and the beam width of the antenna subarray in the horizontal dimension is adjusted. The baffle comprises a first sub-baffle and a second sub-baffle, the first sub-baffle and the second sub-baffle are arranged on both sides of the antenna subarray respectively, the top ends of the first sub-baffle and the second sub-baffle are at different heights from the plane where the antenna subarray is located, and the beam pointing direction of the antenna subarray in the horizontal dimension is adjusted. The baffle comprises a full-metal surface baffle or a metasurface baffle. The metasurface baffle comprises a baffle body and a frequency selection layer, the frequency selection layer is arranged on the surface of the baffle body, the material of the baffle body is a non-metal material, and the material of the frequency selection layer is a conductive metal material.
2. The base station antenna of Claim 1, wherein, The frequency selection layer comprises at least one pair of frequency selection units, each pair of the frequency selection units is arranged oppositely and connected. The frequency selection unit comprises at least one first bending slot and at least one second bending slot, and the at least one first bending slot and the at least one second bending slot are connected alternately.
3. The base station antenna of Claim 2, wherein, The lengths of the first sub-baffle and the second sub-baffle are greater than the length of the antenna subarray, and the end portions of the first sub-baffle and the second sub-baffle extend out of the end portions of the antenna subarray. The adjusting unit further comprises a transmission mechanism and a driving module, and the driving module is used for providing driving force for the baffle.
4. The base station antenna of Claim 1, wherein, The fixed end of the transmission mechanism is connected with the output end of the driving module, the movable end of the transmission mechanism is connected with the baffle, the transmission mechanism transmits the driving force of the driving module to the baffle, so as to adjust the height of the baffle.
5. The base station antenna of Claim 4, wherein, In the case that the first sub-baffle and the second sub-baffle share one transmission mechanism, the heights of the first sub-baffle and the second sub-baffle are adjusted synchronously; in the case that the first sub-baffle and the second sub-baffle are respectively provided with the transmission mechanisms, the heights of the first sub-baffle and the second sub-baffle are adjusted synchronously or asynchronously. The application further comprises a phase shifter, the first end of the movable part of the phase shifter is connected with the movable end of the transmission mechanism, the second end of the movable part of the phase shifter is connected with the antenna subarray, the transmission mechanism transmits the driving force of the driving module to the phase shifter, so as to adjust the wave state perpendicular to the antenna subarray. In the case that the baffle and the phase shifter share one transmission mechanism, the transmission mechanism drives the baffle and the phase shifter at different times; or in the case that the baffle and the phase shifter are respectively provided with corresponding transmission mechanisms, each transmission mechanism drives the baffle and the phase shifter connected therewith.
6. The base station antenna of Claim 5, wherein, And / or, the application further comprises a power divider, each antenna element in the antenna subarray is connected with the power divider with fixed power ratio and phase. and / or, further comprising a reflector plate, the antenna subarray is arranged on the same side of the plane where the reflector plate is located; at least one pair of slots is arranged on the reflector plate, each pair of slots comprises a first slot and a second slot, the first slot and the second slot are arranged on two sides of the antenna subarray respectively, the first sub-baffle and the second sub-baffle are arranged in the first slot and the second slot respectively.
7. The base station antenna of Claim 6, wherein, The distance between the baffle and the antenna element is 0.02λ-0.2λ, and / or the height of the top end of the baffle extending out of the reflector plate is 0-0.5λ, λ is the free space wavelength corresponding to the center operating frequency of the antenna subarray.
8. A beam adjustment method, characterized in that, comprising: Adjusting the height of the baffle on both sides of the antenna subarray in the base station antenna of any one of claims 1-7 to adjust the beam width and the beam pointing of the base station antenna in the horizontal dimension; Adjusting the height of the first sub-baffle and the second sub-baffle, and making the height of the first sub-baffle and the second sub-baffle different to adjust the beam pointing of the base station antenna in the horizontal dimension.
9. The beam adjustment method of claim 8, wherein, The baffle comprises a first sub-baffle and a second sub-baffle, the first sub-baffle and the second sub-baffle are arranged on two sides of the antenna subarray respectively; Adjusting the height of the first sub-baffle and the second sub-baffle, and making the height of the first sub-baffle and the second sub-baffle the same to adjust the beam width of the base station antenna in the horizontal dimension.
10. A base station, characterized by, comprising a radio frequency processing unit and a base station antenna, the radio frequency processing unit and the base station antenna are signal connected, the base station antenna comprises the base station antenna of any one of claims 1-7.
Citation Information
Patent Citations
Wide and narrow wave beam adjustable array antenna
CN120473750A