A flexible electronic device manufacturing system based on nanofilm composite material

Abstract

The application discloses a flexible electronic device manufacturing system based on nanometer film composite material, which comprises a double-station alternating mechanism, a turnover bearing mechanism and an exposure light source, wherein the two stations of the double-station alternating mechanism can be alternately moved to be directly below the exposure light source; the two turnover bearing mechanisms are arranged on the two stations respectively; each turnover bearing mechanism comprises a moving plate which can slide laterally on the station, a rotating plate which is pivotally connected with the moving plate and a guide structure which is fixed on the station, wherein the guide structure is provided with a first guide part and a second guide part which have opposite guide directions, the pivot shaft of the rotating plate is connected with the first guide part or the second guide part, and when the moving plate slides, the pivot shaft and the rotating plate are driven to rotate along the guide direction of the guide structure. The application can not only improve the efficiency of double-side exposure of the flexible base material, but also occupies less space.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of flexible electronic product manufacturing, in particular to a flexible electronic device manufacturing system based on nanometer thin film composite material. BACKGROUND

[0002] Flexible electronics technology is an important development direction of current electronic industry, and its core lies in the preparation of various functional devices on flexible substrates. Nanometer thin film composite material has become a key material for constructing flexible functional devices due to its excellent electrical, optical and mechanical properties. A typical manufacturing system of such flexible electronic devices usually includes multiple precise processes, such as substrate pretreatment, functional layer coating, patterning lithography and etching / deposition, etc.

[0003] Among them, the patterning process is the core link to define the functional pattern of the device and determine the performance of the device. As a key step in the lithography process, the precision, efficiency and yield of exposure directly determine the quality of the final product. For many high-performance flexible electronic devices (such as double-sided wiring circuit), it is necessary to form accurate patterns on both sides of the flexible substrate, which requires double-sided exposure.

[0004] In the prior art, for the roll-to-roll flexible substrate, the exposure light source is arranged above and below to perform the upper exposure operation, which can realize fast and automatic operation. However, for the double-sided exposure of the sheet-shaped substrate, two exposure machines are usually arranged side by side to perform double-sided exposure, that is, the sheet-shaped flexible substrate is sent into the first exposure machine through the in-out material structure for exposure and then out of the material, the flexible substrate is grabbed by the mechanical arm with adsorption structure to the hinge type turnover structure between the two exposure machines, the flexible substrate is turned over by the turnover structure, and then the flexible substrate is grabbed by the mechanical arm with adsorption structure to the in-out material structure of the other exposure machine, and the turned-over flexible substrate is sent into the second exposure machine for exposure operation.

[0005] Therefore, the above-mentioned double-sided exposure operation mode for the sheet-shaped flexible substrate is relatively complicated, the waiting time of in-out material is relatively long, and the multiple grabbing, carrying and secondary positioning operations of the mechanical arm between different devices will cumulatively introduce a large alignment error. Although the built-in light source fine adjustment structure of the exposure machine can compensate, the accumulation of positioning error will cause the time of light source recalibration alignment to increase significantly, further prolonging the overall process time of double-sided exposure, thereby making the overall double-sided exposure efficiency low. SUMMARY

[0006] The present application aims to at least solve one of the above technical problems to some extent.

[0007] To achieve the above object, the first aspect of the present application provides a flexible electronic device manufacturing system based on nanometer thin film composite material, comprising: a double-station alternating mechanism, a turnover bearing mechanism and an exposure light source, wherein the two stations of the double-station alternating mechanism can be alternately moved to be directly below the exposure light source; two turnover bearing mechanisms are arranged on the two stations respectively; each turnover bearing mechanism comprises a moving plate which can slide laterally on the station, a rotating plate which is pivotally connected with the moving plate, and a guide structure which is fixed on the station, wherein the guide structure is provided with a first guide part and a second guide part which have opposite guide directions, the pivot shaft of the rotating plate is connected with the first guide part or the second guide part, and when the moving plate slides, the pivot shaft and the rotating plate rotate along the guide direction of the guide structure; the turnover bearing mechanism is configured to have a first state in which the moving plate is located at a first position and the rotating plate is horizontally unfolded directly below the exposure light source, a second state in which the moving plate slides to a second position and drives the pivot shaft to move along the first guide part so that the rotating plate is turned over on the moving plate, and a third state in which the moving plate moves from the second position to a third position and drives the pivot shaft to move along the second guide part so that the rotating plate is inverted to a horizontally unfolded state and the moving plate moves to be directly below the exposure light source.

[0008] In addition, the flexible electronic device manufacturing system based on nanometer thin film composite material according to the above-mentioned application can have the following additional technical features:

[0009] As a further description of the above technical solution: the turnover bearing mechanism further comprises an adsorption structure, the adsorption structure comprises a cavity, a piston head, a bottom plate, a top rod, a spring and a sliding sleeve, wherein the rotating plate is provided with an adsorption hole, the top of the cavity is open and communicates with the adsorption hole, and the piston head is sealingly and slidingly arranged in the cavity; the bottom plate is arranged below the cavity and connected with the rod end of the piston head; the top rod is connected with the bottom plate and slidingly connected with the rotating plate; the spring is sleeved on the top rod, and the two ends of the spring are connected with the bottom plate and the rotating plate respectively; the sliding sleeve is arranged on the bottom plate and slidingly connected with the outer wall of the cavity, and the sliding sleeve and the top rod are oppositely arranged at both ends of the cavity; wherein the lower part of the cavity is provided with a pressure relief hole.

[0010] As a further description of the above technical solution: there are at least two groups of adsorption structures which are arranged at the bottom of the rotating plate along the lateral direction, wherein the length of the top rod in the adsorption structure close to the moving plate is less than the length of the top rod on the other side.

[0011] As a further description of the above technical solution: the bottom of the moving plate is provided with a transverse extension plate to support the rotating plate in a transverse state, and the bottom of the moving plate is also provided with a vertical plate and a sliding rod, and a transverse sliding groove is formed in the work station of the double-station alternating mechanism, and the vertical plate and the sliding rod are slidably connected with the sliding groove; wherein the work station of the double-station alternating mechanism is provided with an electric telescopic rod, and the telescopic end of the electric telescopic rod is connected with the vertical plate.

[0012] As a further description of the above technical solution: the guide structure further comprises a guide frame, wherein the guide frame is arranged on the work station of the double-station alternating mechanism along the transverse direction; the first guide part and the second guide part are respectively a rack arranged on the upper and lower sides of the guide frame; a gear coaxial with the pivot shaft of the rotating plate is arranged on the pivot shaft, and the gear is engaged with the first guide part and the second guide part; wherein when the gear is disengaged from the first guide part and engaged with the second guide part, the rotating plate is flipped onto the moving plate; when the gear moves to the side of the second guide part away from the first guide part, the rotating plate is inverted to be flush with the moving plate, and at this time the moving plate is pushed to be directly below the exposure light source.

[0013] As a further description of the above technical solution: the flexible electronic device manufacturing system based on nanometer thin film composite material of the application further comprises an outer shell, the outer shell is L-shaped, the exposure light source is arranged at the vertical top of the outer shell, and a track groove with two ends flush and a middle section horizontally sunken is formed in the longitudinal direction of the outer shell, wherein one work station of the double-station alternating mechanism is slidably arranged in the outer shell along the longitudinal direction, and the other work station moves up and down along the track groove to realize the alternating feeding and discharging of the two work stations, wherein the work station that moves up and down along the track groove is flush with the work station that slides in the outer shell along the longitudinal direction when reaching the two ends of the track groove flush.

[0014] As a further description of the above technical solution: the double-station alternating mechanism comprises a synchronous belt structure, a connecting rod, a lifting structure, a first work station plate and a second work station plate, wherein the connecting rod is embedded in the track groove through the track wheels at the ends; the lifting structure is connected with the connecting rod to realize lifting through the movement of the connecting rod in the track groove; wherein the first work station plate is slidably arranged in the outer shell along the longitudinal direction, and the second work station plate is arranged on the lifting end of the lifting structure; the synchronous belt structure is arranged in the outer shell, and the upper and lower sides of the belt body of the synchronous belt are connected with the first work station plate and the lifting structure respectively; wherein two flip bearing mechanisms are arranged on the first work station plate and the second work station plate respectively.

[0015] As a further description of the above technical solutions: the lifting structure comprises a stand, a connecting plate and a sliding frame, wherein the sliding frame is slidingly arranged in the shell along a longitudinal direction and is located below the first work station plate; the stand is vertically arranged and slidingly arranged on the sliding frame; the connecting plate is arranged at the bottom of the stand and is rotatably connected with the connecting rod through a bearing embedded on the connecting plate.

[0016] As a further description of the above technical solutions: the exposure light source is self-provided with a position fine adjustment function.

[0017] According to the flexible electronic device manufacturing system based on the nanometer thin film composite material, through the setting of the double-station alternating mechanism, the feeding out can be performed at one station while the feeding in is performed at the other station, the waiting time of feeding in and out is reduced, and through the integrated turnover bearing mechanism, the accurate turnover and displacement of the flexible substrate can be completed in the same station without the need for multiple grabbing and carrying, the accumulation of alignment errors is reduced, not only the high overlay accuracy of patterns on the front and back surfaces of the substrate is ensured, but also the adjustment time of the fine adjustment structure of the exposure machine is faster, the overall operation efficiency of double-sided exposure is higher, in addition, since two exposure machines are not needed to be arranged side by side and the turnover structure is integrated on the station, the overall space occupation is smaller.

[0018] Additional aspects and advantages of the present application will be in part apparent and in part pointed out hereinafter. BRIEF DESCRIPTION OF DRAWINGS

[0019] The above and / or additional aspects and advantages of the present application will become apparent and be readily appreciated from the following description, including the appended drawings.

[0020] Figure 1 is a structural schematic diagram of a flexible electronic device manufacturing system based on a nanometer thin film composite material according to an embodiment of the present application;

[0021] Figure 2 is a structural schematic diagram of a turnover bearing mechanism according to an embodiment of the present application;

[0022] Figure 3 is an exploded structural schematic diagram of a turnover bearing mechanism according to an embodiment of the present application;

[0023] Figure 4 is an internal structural schematic diagram of a turnover bearing mechanism according to an embodiment of the present application;

[0024] Figure 5 is a structural schematic diagram of an adsorption structure according to an embodiment of the present application;

[0025] Figure 6is a schematic diagram of the internal structure of an adsorption structure according to an embodiment of the present application;

[0026] Figure 7 is a schematic diagram of the use state of a turnover bearing mechanism according to an embodiment of the present application;

[0027] Figure 8 is a schematic diagram of the structure of a double-station alternating mechanism according to an embodiment of the present application;

[0028] Figure 9 is a schematic diagram of the sectional structure of a double-station alternating mechanism according to an embodiment of the present application;

[0029] Figure 10 is a schematic diagram of the internal structure of a double-station alternating mechanism according to an embodiment of the present application;

[0030] Figure 11 is a schematic diagram of the structure of a flexible electronic device manufacturing system based on a nanometer thin film composite material according to another embodiment of the present application;

[0031] As shown in the figure:

[0032] 100, outer housing; 101, track groove; 200, double-station alternating mechanism; 201, drive motor; 210, synchronous belt structure; 220, connecting rod; 221, track wheel; 230, lifting structure; 231, stand column; 232, connecting plate; 233, sliding frame; 240, first station plate; 250, second station plate; 300, turnover bearing mechanism; 310, rotating plate; 311, gear; 312, support rod; 320, moving plate; 321, extension plate; 322, vertical plate; 323, sliding rod; 324, electric telescopic rod; 330, guide structure; 333, guide frame; 331, first guide part; 332, second guide part; 340, adsorption structure; 341, cavity; 3411, pressure relief hole; 342, piston head; 343, bottom plate; 344, jacking rod; 345, spring; 346, sliding sleeve; 400, exposure light source; 500, flexible base material. DETAILED DESCRIPTION

[0033] Embodiments of the present application are described in detail below with reference to examples shown in the accompanying drawings, in which the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by reference to the accompanying drawings are exemplary and are intended to explain the present application, and cannot be understood as limiting the present application.

[0034] A flexible electronic device manufacturing system based on a nanometer thin film composite material according to an embodiment of the present application is described below in conjunction with the accompanying drawings.

[0035] As Figure 1As shown, the flexible electronic device manufacturing system based on nanometer thin film composite material of the embodiment of the present application can include a double-station alternating mechanism 200, a turnover bearing mechanism 300 and an exposure light source 400.

[0036] The two stations of the double-station alternating mechanism 200 can be alternately moved directly below the exposure light source 400, and the exposure light source 400 is provided with a position fine adjustment function and can be fine adjusted by visually identifying the position of the flexible substrate 500.

[0037] Two turnover bearing mechanisms 300 are respectively arranged on the two stations, each turnover bearing mechanism 300 includes a moving plate 320 (which can be pushed by an electric telescopic rod 324 or other driving units) that can slide laterally on the station, a rotating plate 310 pivotally connected to the moving plate 320, and a guide structure 330 fixed on the station.

[0038] As shown in the figure, Figure 3 The guide structure 330 is provided with a first guide part 331 and a second guide part 332 with opposite guide directions, the pivot shaft of the rotating plate 310 is connected to the first guide part 331 or the second guide part 332, and when the moving plate 320 slides, it drives the pivot shaft and the rotating plate 310 to rotate along the guide direction of the guide structure 330.

[0039] As a possible case, as shown in the figure, Figures 2 to 5 The guide structure 330 further includes a guide frame 333, wherein the guide frame 333 is arranged laterally on the station of the double-station alternating mechanism 200, the first guide part 331 and the second guide part 332 are respectively a rack arranged on the upper and lower sides of the guide frame 333 in opposite and staggered positions, and a gear 311 is coaxially arranged on the pivot shaft of the rotating plate 310, and the gear 311 is engaged with the first guide part 331 and the second guide part 332.

[0040] It can be understood that when the gear 311 disengages from the first guide part 331 and engages with the second guide part 332, the rotating plate 310 is turned over to the moving plate 320; when the gear 311 moves to the side away from the first guide part 331 of the second guide part 332, the rotating plate 310 is inverted to be flush with the moving plate 320, and at this time the moving plate 320 is pushed to be directly below the exposure light source 400.

[0041] Specifically, the turnover bearing mechanism 300 is configured to have a first state: the moving plate 320 is located at a first position, and the rotating plate 310 is horizontally expanded directly below the exposure light source 400.

[0042] A second state: the moving plate 320 slides to a second position, drives the pivot shaft to move along the first guide part 331, and turns over the rotating plate 310 to the moving plate 320.

[0043] The third state: the moving plate 320 moves from the second position to the third position, drives the pivot shaft to move along the second guide part 332, reverses the rotating plate 310 to the horizontal unfolded state, and the moving plate 320 moves to the position directly below the exposure light source 400.

[0044] Specifically, when the double-sided exposure operation is performed on the flexible substrate 500, first, the relevant staff can control the external mechanical arm to adsorb and place the flexible substrate 500 on the rotating plate 310 on the corresponding work station, and start the double-station alternating mechanism 200, so that the flexible substrate 500 is moved to the position directly below the exposure light source 400. The exposure light source 400 identifies the edge or positioning mark of the flexible substrate 500 by vision, starts the position fine adjustment function, accurately calibrates the alignment of the exposure area and the first side pattern of the flexible substrate 500, and completes the fine positioning. At this time, the rotating plate 310 is located directly below the exposure light source 400, and the rotating plate 310 is in the horizontal unfolded state, and the gear 311 is engaged with the side of the first guide part 331 close to the moving plate 320, that is, at this time, it is the first state, and the position of the moving plate 320 is the first position.

[0045] After the single-sided exposure of the flexible substrate 500 by the exposure light source 400 is completed, the relevant staff can control the electric telescopic rod 324 to extend to push the moving plate 320 to move. At this time, the gear 311 on the pivot shaft is engaged with the first guide part 331, and the gear 311 drives the entire rotating plate 310 to flip around the pivot shaft, so that the flexible substrate 500 on the rotating plate 310 is stably buckled on the table top of the moving plate 320. Thus, the second state is achieved, and the material is successfully transferred from the rotating plate 310 to the moving plate 320. At this time, the position of the moving plate 320 is the second position.

[0046] With the continuous extension of the electric telescopic rod 324, the gear 311 is disengaged from the first guide part 331 and engaged with the second guide part 332, so that the gear 311 drives the rotating plate 310 to reverse. With the continuous movement of the moving plate 320, the rotating plate 310 reverses to the horizontal initial state. At this time, the moving plate 320 moves to the position directly below the exposure light source 400, and the flexible substrate 500 is located on the moving plate 320. This state is the third state, and the position of the moving plate 320 is the third position.

[0047] In addition, after the double-sided exposure of the flexible substrate 500 is completed, the reset of the electric telescopic rod 324 can reset the flip bearing mechanism 300 from the third state to the first state, but the flexible substrate 500 after the double-sided exposure is still on the moving plate 320.

[0048] It should be noted that when the previous flexible substrate 500 is exposed, the next flexible substrate 500 to be exposed can be fed. After the double-sided exposure of the previous flexible substrate 500 by the exposure light source 400, the two stations are alternately fed and discharged by the double-station alternating mechanism 200. At this time, the flexible substrate 500 that has been double-sidedly exposed is discharged, and the flexible substrate 500 to be exposed is simultaneously fed, thereby maximizing the waiting time for feeding and discharging.

[0049] As shown in Figure 5 and Figure 6 To further ensure the stability of the flexible substrate 500 when it is flipped from the rotating plate 310 to the moving plate 320, and to avoid the position deviation caused by the sliding of the flexible substrate 500 due to the inclination of the rotating plate 310, the flipping bearing mechanism 300 further comprises an adsorption structure 340. The adsorption structure 340 comprises a cavity 341, a piston head 342, a bottom plate 343, a top rod 344, a spring 345, and a sliding sleeve 346.

[0050] The rotating plate 310 is provided with an adsorption hole. The cavity 341 is arranged below the rotating plate 310 and communicates with the adsorption hole. The piston head 342 is sealingly and slidingly arranged in the cavity 341. The bottom plate 343 is arranged below the cavity 341 and connected with the rod end of the piston head 342. The top rod 344 is connected with the bottom plate 343 and slidingly connected with the rotating plate 310. The spring 345 is sleeved on the top rod 344, and the two ends of the spring 345 are connected with the bottom plate 343 and the rotating plate 310, respectively. The sliding sleeve 346 is arranged on the bottom plate 343 and slidingly connected with the outer wall of the cavity 341. The sliding sleeve 346 and the top rod 344 are oppositely arranged at the two ends of the cavity 341. The lower part of the cavity 341 is provided with a pressure relief hole 3411.

[0051] It should be noted that, in the initial state, the base plate 343 abuts against the workstation, the piston head 342 pushes up to the upper part of the cavity 341, the push rod 344 pushes up, and the spring 345 is in a compressed state. When the flexible substrate 500 is placed on the rotating plate 310, the flexible substrate 500 spreads on the top channel of the cavity 341. When the rotating plate 310 rotates, the base plate 343 disengages from the workstation, and the spring 345 resets, causing the base plate 343 and the push rod 344 to move away from the rotating plate 310. At this time, the piston head 342 draws into the cavity 341, creating a negative pressure inside the cavity 341, which adsorbs the flexible substrate 500 onto the rotating plate 310. When the piston 344 moves closer to the moving plate 320, the push rod 344 contacts the moving plate 320, causing the spring 345 to continue to stretch. At this time, the bottom plate 343 continues to move away from the rotating plate 310, causing the piston head 342 to pass through the pressure relief hole 3411. At this time, the negative pressure in the cavity 341 disappears, and the flexible substrate 500 falls from the rotating plate 310 onto the moving plate 320. After the rotating plate 310 is completely flipped, the gear 311 loses its meshing with the first guide part 331 and meshes with the second guide part 332. As a result, the rotating plate 310 rotates in the opposite direction, and the adsorption structure 340 follows the rotating plate 310 to rotate in the opposite direction until the bottom plate 343 abuts against the work station again.

[0052] Specifically, such as Figures 1 to 7 As shown, in the first state, the rotating plate 310 is horizontally unfolded, and the flexible substrate 500 is placed on the rotating plate 310. When the flipping support mechanism 300 is in the first state, the moving plate 320 is in the first position, and the rotating plate 310 is horizontally unfolded directly below the exposure light source 400. At this time, the adsorption structure 340 is in the initial state, the bottom plate 343 is supported by the station surface, the spring 345 is in a compressed state, the top rod 344 is compressed to the shortest stroke, and the piston head 342 is pushed by the bottom plate 343 to the upper part of the cavity 341. The flexible substrate 500 covers the adsorption hole at the top of the cavity 341. After visually recognizing the position of the substrate and making fine adjustments, the exposure light source 400 exposes the first surface of the substrate.

[0053] When the turnover bearing mechanism 300 switches from the first state to the second state, the moving plate 320 slides to the second position, driving the pivot shaft of the rotating plate 310 to move along the first guide part 331, and the rotating plate 310 starts to turn over in the direction of the moving plate 320. As the rotating plate 310 turns over, the bottom plate 343 gradually separates from the support of the worktable surface, the spring 345 in the compressed state releases the elastic potential energy, and pushes the bottom plate 343 and the top rod 344 to move away from the rotating plate 310. The bottom plate 343 drives the piston head 342 to slide downward in the cavity 341, and the space above the cavity 341 expands. Since the flexible base material 500 covers the adsorption hole to form a seal, a negative pressure is formed inside the cavity 341, and the base material is firmly adsorbed through the adsorption hole, preventing the base material from sliding due to gravity or inertia during the turning over of the rotating plate 310. At this time, the pressure relief hole 3411 is still below the piston head 342, but due to the sealing effect of the flexible base material 500 on the adsorption hole, the negative pressure remains stable, and the base material closely adheres to the surface of the rotating plate 310 and turns over synchronously with the rotating plate 310.

[0054] During the approach of the rotating plate 310 to the moving plate 320, the top rod 344 first contacts the surface of the moving plate 320, and as the moving plate 320 continues to slide, the top rod 344 is squeezed to stretch the spring 345 to the longest stroke. The top rod 344 drives the bottom plate 343 and the piston head 342 to continue to slide downward in the cavity 341. When the piston head 342 slides to the lower part of the cavity 341, its edge passes through the pressure relief hole 3411, and the pressure relief hole 3411 is connected to the outside world, and the negative pressure in the cavity 341 disappears instantaneously, and the adsorption effect is released. At this time, the rotating plate 310 is close to the moving plate 320, and the flexible base material 500 is smoothly transferred from the rotating plate 310 to the surface of the moving plate 320, completing the turnover of the flexible base material 500.

[0055] When the moving plate 320 reaches the second state and switches to the third state, the rotating plate 310 reversely turns over to the horizontal unfolded state, and the rotating plate 310 drives the adsorption structure 340 to reset synchronously: the bottom plate 343 re-contacts the worktable surface, the spring 345 is compressed, the piston head 342 slides to the upper part of the cavity 341, the pressure relief hole 3411 is opened, and the adsorption structure 340 returns to the initial state.

[0056] In order to clearly illustrate the above embodiment, in an embodiment of the present application, the adsorption structure 340 has at least two groups, and is arranged on the bottom of the rotating plate 310 in the transverse direction. Among them, the length of the top rod 344 in the adsorption structure 340 close to the moving plate 320 side is less than the length of the top rod 344 on the other side.

[0057] It can be understood that the adsorption effect on the flexible substrate 500 can be improved by arranging at least two groups of adsorption structures 340, and if the lengths of the top rods 344 on both sides are consistent, the top rod 344 on the side close to the moving plate 320 will be in contact with and pressed by the moving plate 320 first, thereby triggering the adsorption structure 340 on this side to release pressure first; and the top rod 344 on the side far from the moving plate 320 will be delayed in contacting the moving plate 320, and this asynchronous release will cause the flexible substrate 500 to be raised or tilted upward, and finally, when the flexible substrate 500 falls on the moving plate 320, the position will be offset, affecting the precision.

[0058] In addition, as the number of adsorption structures 340 increases, the number of top rods 344 also increases, and because when the flexible substrate 500 is adsorbed and placed on the rotating plate 310 by the mechanical arm or mechanical claw, the gaps or peripheral contours between the multiple groups of top rods 344 can form clear physical positioning areas, and the mechanical arm can capture the protruding position of the top rod 344 through a visual recognition system, so as to accurately place the flexible substrate 500 in the area enclosed by the top rod 344, avoiding problems such as edge offset and skew when the substrate is placed. For example, the two groups of top rods 344 distributed transversely can form “left and right boundaries”, and the mechanical arm can align the edge of the substrate based on the top rod 344, so as to ensure that the initial placement position of the substrate coincides with the center of the exposure area of the rotating plate 310, thereby reducing the calibration amount for subsequent fine adjustment of the exposure light source 400 and improving the exposure efficiency.

[0059] In an embodiment of the present application, as shown in Figure 3 and Figure 4 the bottom of the moving plate 320 is provided with a transverse extension plate 321 to support the rotating plate 310 in the transverse state, and the bottom of the moving plate 320 is also provided with a vertical plate 322 and a slide rod 323, and the workstations of the double-station alternating mechanism 200 are provided with transverse sliding grooves, and the vertical plate 322 and the slide rod 323 are slidably connected with the sliding grooves; wherein the workstations of the double-station alternating mechanism 200 are provided with an electric telescopic rod 324, and the telescopic end of the electric telescopic rod 324 is connected with the vertical plate 322.

[0060] It should be noted that the transverse extension plate 321 provided at the bottom of the moving plate 320 plays a supporting role when the turnover carrying mechanism 300 is in the first state (the rotating plate 310 is horizontally unfolded) and the third state (the rotating plate 310 is reversely turned over and reset to be horizontal), and when the rotating plate 310 is unfolded horizontally, the extension plate 321 is attached to the bottom surface of the rotating plate 310 to provide uniform bottom support for the rotating plate 310, avoiding deflection deformation caused by the self-weight of the rotating plate 310 or the placement of the substrate, and ensuring the horizontal precision of the rotating plate 310 during exposure.

[0061] To further ensure the stability of the rotating plate 310, the bottom of the rotating plate 310 is provided with a support rod 312, which abuts against the workstation in the first state and the third state.

[0062] In one embodiment of the present application, as shown in Figures 8 to 10 The housing 100 is L-shaped, the exposure light source 400 is arranged at the vertical top of the housing 100, and a track groove 101 is arranged in the longitudinal direction of the housing 100, with both ends flush and the middle section horizontally sunken. One work position of the double-position alternating mechanism 200 is arranged in the housing 100 in the longitudinal direction, and the other work position moves up and down along the track groove 101 to realize the alternating feeding of the two work positions. When the work position moving up and down along the track groove 101 reaches the ends of the track groove 101, it is flush with the work position arranged in the housing 100 in the longitudinal direction.

[0063] To clearly illustrate the above embodiment, in one embodiment of the present application, the double-position alternating mechanism 200 includes a synchronous belt structure 210, a connecting rod 220, a lifting structure 230, a first work position plate 240, and a second work position plate 250.

[0064] The connecting rod 220 is embedded in the track groove 101 through the track wheels 221 at the ends, and the lifting structure 230 is connected to the connecting rod 220 to realize lifting through the movement of the connecting rod 220 in the track groove 101.

[0065] The first work position plate 240 is arranged in the housing 100 in the longitudinal direction, the second work position plate 250 is arranged at the lifting end of the lifting structure 230, the synchronous belt structure 210 is arranged in the housing 100, and the upper and lower sides of the belt body of the synchronous belt are connected to the first work position plate 240 and the lifting structure 230, respectively. The synchronous belt structure 210 is driven by the driving motor 201 mounted on the housing 100.

[0066] Two turnover bearing mechanisms 300 are arranged on the first work position plate 240 and the second work position plate 250, respectively.

[0067] To clearly illustrate the above embodiment, in one embodiment of the present application, the lifting structure 230 includes a vertical column 231, a connecting plate 232, and a sliding frame 233.

[0068] The sliding frame 233 is arranged in the housing 100 in the longitudinal direction and below the first work position plate 240, the vertical column 231 is arranged vertically and slidably on the sliding frame 233, and the connecting plate 232 is arranged at the bottom of the vertical column 231 and rotatably connected to the connecting rod 220 through the bearing embedded on the connecting plate 232.

[0069] Specifically, as shown in Figures 1 to 11As shown, when the first workbench 240 is exposed to the exposure light source 400, the second workbench 250 is located at the longitudinal end of the outer shell 100, so that when the flexible substrate 500 on the first workbench 240 is exposed, the subsequent flexible substrate 500 to be exposed can be placed on the turnover bearing mechanism 300 on the second workbench 250 by the mechanical arm.

[0070] After the double-sided exposure of the flexible substrate 500 on the first workbench 240 is completed, the synchronous belt structure 210 is driven by the driving motor 201 to move, so that the upper side of the belt body of the synchronous belt structure 210 drives the first workbench 240 to move outward (i.e. away from the exposure light source) to discharge, and the lower side of the belt body of the synchronous belt structure 210 simultaneously drives the sliding frame 233 of the lifting structure 230 to move inward (towards the exposure light source) to prepare for feeding.

[0071] When the lifting structure 230 lifts the second workbench 250 for feeding, the track wheel 221 moves along the track groove 101, and when reaching the sinking section, the connecting rod 220 pulls the connecting plate 232 downward, the connecting plate 232 drives the column 231 to slide downward on the sliding frame 233, and the second workbench 250 installed at the top end of the column 231 is lowered, at this time, the first workbench 240 continues to move horizontally, and the second workbench 250 is lowered to avoid the first workbench 240, and the two are staggered in space height to avoid collision during movement.

[0072] With the continuous movement of the synchronous belt structure 210, the track wheel 221 moves from the sinking section of the track groove 101 to the horizontal section at the other end, the track wheel 221 is guided upward by the rising section of the track groove 101, the connecting rod 220 pushes the connecting plate 232 and the column 231 to slide upward, the second workbench 250 is raised, and finally reaches the same horizontal height as the first workbench 240 and is accurately stopped directly below the exposure light source 400, ready for exposure.

[0073] At the same time, the first workbench 240 moves to the feeding and discharging workbench at the other end of the outer shell 100, which can be discharged and recharged by the mechanical arm.

[0074] When the flexible substrate 500 on the second workbench 250 is exposed, the first workbench 240 has completed feeding and discharging, and after the double-sided exposure of the flexible substrate 500 on the second workbench 250 is completed, the synchronous belt motor is reversed to repeat the above process.

[0075] In summary, according to the flexible electronic device manufacturing system based on nanometer film composite material provided by the embodiment of the present application, through the setting of the double-station alternating mechanism 200, the feeding of one station can be performed at the same time as the feeding of the other station, thereby reducing the waiting time for feeding and discharging. Through the integrated turnover bearing mechanism 300, the accurate turnover and displacement of the flexible substrate 500 can be completed in the same station without the need for multiple grabbing and handling, thereby reducing the accumulation of alignment errors. Not only is the overlaying accuracy of the patterns on the front and back surfaces of the flexible substrate 500 ensured to be extremely high, but also the fine adjustment structure adjustment time of the exposure machine is faster, the overall operation efficiency of the double-surface exposure is higher, and in addition, since two exposure machines do not need to be arranged side by side and the turnover bearing mechanism 300 is integrated on the station of the double-station alternating mechanism 200, the overall space occupation is smaller.

[0076] In the description of the present specification, the terms "first", "second", "third" and the like are used only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0077] In the description of the present specification, the description referring to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples. In addition, different embodiments or examples described in the present specification and the features of different embodiments or examples can be combined and combined by those skilled in the art without contradiction.

[0078] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limiting the present application, and those skilled in the art can make changes, modifications, replacements and variations to the above embodiments within the scope of the present application.

Claims

1. A flexible electronic device manufacturing system based on nanofilm composite materials, characterized in that, include: The components include a dual-station alternating mechanism, a flipping support mechanism, and an exposure light source. The two stations of the dual-station alternating mechanism can be alternately moved to be directly below the exposure light source; The two aforementioned flipping and bearing mechanisms are respectively installed at two workstations; each of the flipping and bearing mechanisms includes a movable plate that can slide laterally on the workstation, a rotating plate pivotally connected to the movable plate, and a guide structure fixed on the workstation, wherein, The guide structure is provided with a first guide section and a second guide section with opposite guiding directions. The pivot axis of the rotating plate is connected to the first guide part or the second guide part. When the moving plate slides, it drives the pivot axis and the rotating plate to rotate along the guide direction of the guide structure. The flipping load mechanism is configured to have: First state: The movable plate is located in the first position, and the rotating plate is horizontally extended directly below the exposure light source; Second state: The movable plate slides to the second position, causing the pivot shaft to move along the first guide portion, so that the rotating plate flips onto the movable plate; Third state: The moving plate moves from the second position to the third position, driving the pivot shaft to move along the second guide, causing the rotating plate to reverse to a horizontally unfolded state, and the moving plate moves directly below the exposure light source.

2. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 1, characterized in that, The flipping and bearing mechanism further includes an adsorption structure, which comprises a cavity, a piston head, a base plate, a push rod, a spring, and a sliding sleeve. The rotating plate is provided with adsorption holes, and the top of the cavity is open and communicates with the adsorption holes. The piston head is slidably and sealed within the cavity. The base plate is located below the cavity and is connected to the rod end of the piston head; The top rod is connected to the bottom plate and is slidably connected to the rotating plate; The spring is sleeved on the top rod, and the two ends of the spring are respectively connected to the base plate and the rotating plate; The sliding sleeve is disposed on the base plate and is slidably connected to the outer wall of the cavity, and the sliding sleeve and the top rod are disposed opposite to each other at both ends of the cavity; The cavity has a pressure relief hole at its lower part.

3. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 2, characterized in that, The adsorption structure has at least two sets and is arranged in the lateral direction at the bottom of the rotating plate, wherein the length of the top rod in the adsorption structure closer to the moving plate is smaller than the length of the top rod on the other side.

4. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 1, characterized in that, The bottom of the movable plate is provided with a horizontal extension plate to support the rotating plate in the horizontal state. The bottom of the movable plate is also provided with a vertical plate and a sliding rod. The station of the dual-station alternation mechanism is provided with a horizontal sliding groove. The vertical plate and the sliding rod are slidably connected to the sliding groove. The dual-station alternating mechanism is equipped with an electric telescopic rod at each station, and the telescopic end of the electric telescopic rod is connected to the vertical plate.

5. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 1, characterized in that, The guidance structure also includes a guidance frame, wherein... The guide frame is arranged laterally on the workstation of the dual-station alternating mechanism; The first guide portion and the second guide portion are respectively racks that are opposite to and offset from each other on the upper and lower sides of the guide frame; A gear is coaxially mounted on the pivot shaft of the rotating plate, and the gear meshes with the first guide portion and the second guide portion; When the gear disengages from the first guide portion and engages with the second guide portion, the rotating plate flips onto the moving plate; when the gear moves to the side of the second guide portion away from the first guide portion, the rotating plate reverses to be flush with the moving plate, and at this time the moving plate is pushed directly below the exposure light source.

6. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 1, characterized in that, It also includes an outer shell, which is L-shaped. The exposure light source is located at the top vertical of the outer shell. The outer shell has a track groove with both ends flush and the middle section horizontally recessed in the longitudinal direction. One station of the dual-station alternating mechanism is slidably disposed in the outer shell along the longitudinal direction, and the other station moves up and down along the track groove to realize the alternating feeding and discharging of the two stations. When the station moving up and down along the track groove reaches the two ends flush with the track groove, it is flush with the station sliding in the outer shell along the longitudinal direction.

7. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 6, characterized in that, The dual-station alternating mechanism includes a synchronous belt structure, a connecting rod, a lifting structure, a first station plate, and a second station plate. The connecting rod is fitted into the track groove via a track wheel at its end; The lifting structure is connected to the connecting rod so that lifting can be achieved by the movement of the connecting rod in the track groove; The first workstation plate is slidably disposed within the outer shell along the longitudinal direction, and the second workstation plate is disposed on the lifting end of the lifting structure; The synchronous belt structure is disposed within the outer casing, and the upper and lower sides of the synchronous belt are respectively connected to the first workstation plate and the lifting structure. The two flipping bearing mechanisms are respectively installed on the first workstation plate and the second workstation plate.

8. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 7, characterized in that, The lifting structure includes a column, a connecting plate, and a sliding frame, wherein... The sliding frame is slidably disposed within the outer casing in the longitudinal direction and is located below the first workstation plate; The column is vertically arranged and slidably mounted on the sliding frame; The connecting plate is located at the bottom of the column and is rotatably connected to the connecting rod via a bearing embedded in the connecting plate.

9. The flexible electronic device manufacturing system based on nanofilm composite materials according to claim 1, characterized in that, The exposure light source has a built-in position fine-tuning function.

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