Insulator accumulated charge elimination method and device, terminal equipment and storage medium

Abstract

The invention discloses an insulator accumulated charge elimination method and device, terminal equipment and a storage medium, and belongs to the field of insulators, and the method comprises the steps: collecting the charge accumulation amount of a target insulator accumulated charge region in a target high-air-pressure sealed cavity when an accumulated charge elimination instruction is received, gas combination data and air pressure data of the target high-air-pressure sealing cavity are obtained; calculating a charge accumulation influence factor according to the gas combination data and the gas pressure data; selecting a target laser light source type according to the charge accumulation influence factor; determining short-time pulse irradiation times according to the charge accumulation amount and the target laser light source type; and controlling a laser generating device to emit laser corresponding to the target laser light source type until the short-time pulse irradiation times are reached, and obtaining a target insulator after the accumulated charges are dissipated. By implementing the invention, the problem that the accumulated charges on the surface of the insulator cannot be effectively dissipated in the prior art can be solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of insulators, in particular to an insulator accumulated charge elimination method and device, a terminal equipment and a storage medium. BACKGROUND

[0002] In the high-pressure sealed cavity of the power equipment, the charge accumulation on the surface of the insulator is a key hidden danger that causes insulation failure.

[0003] The existing laser processing scheme mostly uses fixed type laser light source and pulse parameters, without considering the influence of gas combination (such as the mixing ratio of SF6 and air) and gas pressure value in the high-pressure sealed cavity on the interaction between laser and charge, so it is difficult to achieve accurate and effective dissipation of the charge, especially in a complex gas environment, which is prone to problems such as charge residue or damage to the surface of the insulator. SUMMARY

[0004] The present application provides an insulator accumulated charge elimination method and device, a terminal equipment and a storage medium, which can solve the problem that the prior art cannot effectively dissipate the accumulated charge on the surface of the insulator.

[0005] An embodiment of the present application provides an insulator accumulated charge elimination method, comprising:

[0006] Upon receiving an accumulated charge elimination instruction, the charge accumulation amount of the target insulator accumulated charge area in the target high-pressure sealed cavity is collected, and the gas combination data and the gas pressure data of the target high-pressure sealed cavity are collected;

[0007] According to the gas combination data and the gas pressure data, a charge accumulation influence factor is calculated;

[0008] According to the charge accumulation influence factor, a target laser light source type is selected;

[0009] According to the charge accumulation amount and the target laser light source type, the number of short-time pulse irradiations is determined;

[0010] The laser generating equipment is controlled to emit laser corresponding to the target laser light source type until the number of short-time pulse irradiations is reached, and the target insulator after the accumulated charge is dissipated is obtained.

[0011] Further, according to the gas combination data and the gas pressure data, the charge accumulation influence factor is calculated, comprising:

[0012] All gas components in the gas combination data are determined;

[0013] The ionization energy corresponding to each gas component is obtained;

[0014] According to the preset component weight table, the weight value corresponding to each gas component is determined;

[0015] According to the corresponding ionization energy and weight value of each gas component, a gas influence factor is calculated;

[0016] According to the gas influence factor and a preset charge accumulation correlation calculation function, a charge accumulation base factor is calculated;

[0017] According to the charge accumulation base factor and the gas pressure data, a charge accumulation influence factor is calculated.

[0018] Further, the calculation of the charge accumulation influence factor according to the charge accumulation base factor and the gas pressure data comprises:

[0019] According to the charge accumulation base factor, the gas pressure data and a preset gas pressure charge coupling function, a gas pressure correction coefficient is calculated;

[0020] According to the gas pressure correction coefficient and the charge accumulation base factor, a charge accumulation influence factor is calculated.

[0021] Further, the selection of the target laser light source type according to the charge accumulation influence factor comprises:

[0022] From a preset laser light source information table, a laser light source type whose radiant energy is greater than the charge accumulation influence factor is selected as a candidate laser light source type;

[0023] The difference between the radiant energy and the charge accumulation influence factor is calculated;

[0024] The candidate laser light source type whose difference between the radiant energy and the charge accumulation influence factor meets a preset range is selected as the target laser light source type.

[0025] Further, the determination of the short-time pulse irradiation times according to the charge accumulation amount and the target laser light source type comprises:

[0026] The charge accumulation amount is subtracted by a preset charge safety threshold to obtain a to-be-eliminated charge accumulation amount;

[0027] According to the radiant energy corresponding to the target laser light source type, a laser single-time eliminable charge amount is determined;

[0028] According to the to-be-eliminated charge accumulation amount and the laser single-time eliminable charge amount, a short-time pulse irradiation times is calculated.

[0029] Further, the side surface of the target insulator is uniformly distributed with a plurality of electrostatic probes; the electrostatic probes are used to sense the potential of the target insulator;

[0030] Before collecting the charge accumulation amount of the target insulator charge accumulation area in the target high gas pressure sealed cavity, and the gas combination data and the gas pressure data of the target high gas pressure sealed cavity, further comprising:

[0031] When the set time length arrives, the potential collected by the electrostatic probe is obtained;

[0032] According to the potential collected by the electrostatic probe and the corresponding preset normal value of the potential, the potential deviation value is calculated;

[0033] The potential deviation value is compared with the preset potential deviation range to determine whether the potential deviation value exceeds the preset potential deviation range,

[0034] If yes, the accumulated charge elimination instruction is issued,

[0035] If not, wait for the next set time length to arrive.

[0036] An embodiment of the present application also provides an insulator accumulated charge elimination device, comprising:

[0037] A data acquisition module is configured to collect the charge accumulation amount of the target insulator charge accumulation area in the target high gas pressure sealed cavity, and the gas combination data and the gas pressure data of the target high gas pressure sealed cavity when receiving the accumulated charge elimination instruction;

[0038] An influence factor calculation module is configured to calculate a charge accumulation influence factor according to the gas combination data and the gas pressure data;

[0039] A laser light source type selection module is configured to select a target laser light source type according to the charge accumulation influence factor;

[0040] An irradiation frequency calculation module is configured to determine a short-time pulse irradiation frequency according to the charge accumulation amount and the target laser light source type;

[0041] An accumulated charge elimination module is configured to control a laser generating device to emit laser corresponding to the target laser light source type until the short-time pulse irradiation frequency is reached, so as to obtain the target insulator after the accumulated charge is dissipated.

[0042] Further, the calculation of the charge accumulation influence factor according to the gas combination data and the gas pressure data comprises:

[0043] All gas components in the gas combination data are determined;

[0044] The ionization energy corresponding to each gas component is obtained;

[0045] According to a preset component weight table, the weight value corresponding to each gas component is determined;

[0046] According to the corresponding ionization energy and the weight value of each gas component, a gas influence factor is calculated;

[0047] According to the gas influence factor and a preset charge accumulation correlation calculation function, a charge accumulation base factor is calculated;

[0048] According to the charge accumulation base factor and the gas pressure data, a charge accumulation influence factor is calculated.

[0049] The application also provides a terminal device, comprising:

[0050] One or more processors;

[0051] A memory coupled to the processor, configured to store one or more programs;

[0052] When the one or more programs are executed by the one or more processors, the one or more processors implement the insulator accumulated charge elimination method as described in the above embodiments.

[0053] The application also provides a computer readable storage medium having a computer program stored thereon, the computer program being executed by a processor to implement the insulator accumulated charge elimination method as described in the above embodiments.

[0054] By implementing the application, the following beneficial effects are achieved:

[0055] The application provides an insulator accumulated charge elimination method and device, a terminal device and a storage medium, which combines gas combination data of a target high-pressure sealed cavity, gas pressure data and a charge accumulation amount of a target insulator accumulated charge area, dynamically determines a laser light source type and a short-time pulse irradiation frequency, calculates a charge accumulation influence factor and matches the target laser light source type, and adjusts the pulse irradiation frequency according to the charge accumulation amount, so as to adapt to charge dissipation requirements under different gas combinations and gas pressure conditions, improve the pertinence and efficiency of charge dissipation, avoid damage to the insulator caused by excessive irradiation, and significantly improve the operation safety and service life of the insulator in the high-pressure sealed cavity. BRIEF DESCRIPTION OF DRAWINGS

[0056] In order to more clearly illustrate the technical solutions of the application, the following will briefly introduce the drawings needed in the embodiments. Obviously, the drawings in the following description are only some embodiments of the application, and those skilled in the art can obtain other drawings according to these drawings without creative labor.

[0057] Figure 1is a flowchart of a method for eliminating accumulated charges of an insulator according to an embodiment of the present application;

[0058] Figure 2 is a structural diagram of a target high-pressure sealed cavity according to an embodiment of the present application;

[0059] Figure 3 is a structural diagram of a target insulator according to an embodiment of the present application;

[0060] Figure 4 is a structural diagram of a device for eliminating accumulated charges of an insulator according to an embodiment of the present application;

[0061] Figure 5 is a structural diagram of a terminal device according to an embodiment of the present application;

[0062] In the drawings, the reference signs in the drawings of the specification are as follows:

[0063] Target high-pressure sealed cavity 1 transparent observation window 1-1 insulating sleeve 1-2 flange 1-3 target insulator 2 electrostatic probe 2-1. DETAILED DESCRIPTION

[0064] In order to make the objectives, technical solutions and advantages of the present application clearer, the technical solutions in the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0065] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present application belongs; the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit the present application; the terms “include” and “have” and any variations thereof in the specification and claims of the present application and the above description of drawings are intended to cover non-exclusive inclusion.

[0066] In the description of the embodiments of the present application, the technical terms “first”, “second”, etc. are only used to distinguish different objects, and cannot be understood as indicating or implying relative importance or implicitly indicating the number, specific order or primary and secondary relationship of the indicated technical features. In the description of the embodiments of the present application, the meaning of “a plurality of” is two or more, unless otherwise explicitly and specifically limited.

[0067] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0068] In the description of the embodiments in this application, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0069] In the description of the embodiments of this application, the term "multiple" refers to two or more (including two), similarly, "multiple sets" refers to two or more (including two sets), and "multiple pieces" refers to two or more (including two pieces).

[0070] In the description of the embodiments of this application, unless otherwise expressly specified and limited, technical terms such as "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. For those skilled in the art, the specific meaning of the above terms in the embodiments of this application can be understood according to the specific circumstances.

[0071] See Figure 1 To address the problems in the prior art, an embodiment of the present invention provides a method for eliminating accumulated charge in an insulator, comprising:

[0072] S1. Upon receiving the charge accumulation elimination command, collect the charge accumulation amount in the charge accumulation area of ​​the target insulator 2 in the target high-pressure sealed cavity 1, as well as the gas combination data and pressure data of the target high-pressure sealed cavity 1.

[0073] Specifically, see Figure 2 , is a schematic diagram of the structure of the target high-pressure sealed cavity 1;

[0074] The target high-pressure sealed cavity 1 can withstand a certain pressure. Considering the actual operating conditions of GIS / GIL in the field, the maximum pressure that it can withstand should be no less than 0.8 MPa (applicable to SF6 mixed gas) to 1.0 MPa (applicable to C4F7N / CO2 mixed gas). Figure 2In the high-pressure sealed cavity 1, there are several transparent observation windows 1-1 that can withstand specific gas pressures, forming a 120° angle with each other. The presence of the transparent observation windows 1-1 does not affect the airtightness of the insulating pipe itself, and the material of the transparent observation windows 1-1 has good compatibility with the compressed gas filled inside the pipe and will not react. The upper part of the high-pressure sealed cavity 1 is an insulating sleeve 1-2, which serves to extend the discharge gap and increase the insulation distance. The right side of the high-pressure sealed cavity 1 is a flange 1-3, which is a structure used to adjust the internal insulators or other mechanical units during the charge accumulation and elimination process. It can be operated by opening the flange 1-3.

[0075] In a preferred embodiment, a plurality of electrostatic probes 2-1 are evenly distributed on the side of the target insulator 2; the electrostatic probes 2-1 are used to sense the potential of the target insulator 2;

[0076] Before collecting the charge accumulation in the charge accumulation area of ​​the target insulator 2 in the target high-pressure sealed cavity 1, as well as the gas combination data and pressure data of the target high-pressure sealed cavity 1, the following is also included:

[0077] When the set time is reached, acquire the potential collected by electrostatic probe 2-1;

[0078] The potential deviation value is calculated based on the potential collected by electrostatic probe 2-1 and the corresponding preset normal potential value.

[0079] The potential deviation value is compared with a preset potential deviation range to determine whether the potential deviation value exceeds the preset potential deviation range.

[0080] If so, issue a command to eliminate accumulated charge.

[0081] If not, wait for the next set duration to elapse;

[0082] Specifically, the duration can be set according to the actual situation, such as 1 minute, 10 minutes, etc., and there is no limit here;

[0083] Specifically, see Figure 3 The diagram shows the structure of the target insulator 2. Several electrostatic probes 2-1 are evenly distributed on the side of the target insulator 2. Since the position of each electrostatic probe 2-1 is different, this embodiment takes the setting of 6 electrostatic probes 2-1 as an example for explanation.

[0084] Since the electrostatic probes 2-1 are evenly distributed on the same circumferential surface on the side of the target insulator 2, and the central angle between any two adjacent probes is 60°, the monitoring area of ​​the electrostatic probes 2-1 can be divided into 0°-60°, 60°-120°, 120°-180°, 180°-240°, 240°-300° and 300°-360° respectively. See Table 1, which is a table showing the relationship between the potential deviation value of the accumulated charge on the insulator and the severity. In this embodiment, the potential deviation range is set to 0%-10%. By judging whether the absolute value of the potential deviation value exceeds 10%, it is determined whether to issue a charge elimination command.

[0085] Table 1

[0086]

[0087] It should be noted that the specific potential deviation range can be set according to the actual situation, and is not limited here;

[0088] Specifically, since the charge accumulation on the surface of the target insulator 2 has local diffusion, if the potential deviation value of a certain area exceeds the preset range, it may cause the charge distribution imbalance in the surrounding area, which in turn leads to a decrease in the overall insulation performance. Therefore, as long as the potential deviation value of the monitoring area of ​​an electrostatic probe 2-1 exceeds the preset potential deviation range, a charge accumulation elimination command is issued, and the charge accumulation amount of the charge accumulation area (located in the monitoring area of ​​the electrostatic probe 2-1 where the potential deviation value exceeds the preset potential deviation range, which can be accurately located by the installation coordinates and monitoring angle range of the electrostatic probe 2-1) is obtained, as well as the gas combination data and pressure data of the target high-pressure sealed cavity 1.

[0089] Specifically, taking electrostatic probe 2-1A as an example, the potential collected by electrostatic probe 2-1A is 130, while the corresponding preset normal potential value is 100. The calculated potential deviation value is 30%, which is far beyond the preset deviation range of 10%, meeting the triggering condition for issuing the charge accumulation elimination command. At this time, the system will immediately issue the charge accumulation elimination command and accurately collect the amount of charge accumulation in the angle area (such as 0°-60°) monitored by electrostatic probe 2-1A. At the same time, it will simultaneously acquire the gas combination data (such as the mixing ratio of SF6 and N2) and real-time pressure value of the target high-pressure sealed cavity 1, providing basic data support for the determination of subsequent laser processing parameters.

[0090] S2. Calculate the charge accumulation influence factor based on the gas combination data and the gas pressure data;

[0091] In a preferred embodiment, calculating the charge accumulation influence factor based on the gas combination data and the gas pressure data includes:

[0092] Identify all gas components in the gas combination data;

[0093] Obtain the ionization energy corresponding to each gas component;

[0094] According to the preset component weight table, determine the weight value corresponding to each gas component;

[0095] The gas influence factor is calculated based on the corresponding ionization energy and weight value of each gas component.

[0096] Based on the gas influence factor and the preset charge accumulation correlation calculation function, the charge accumulation basic factor is calculated.

[0097] Based on the charge accumulation fundamental factor and the air pressure data, the charge accumulation influence factor is calculated.

[0098] Specifically, the gas components include one or more of SF6, C4F7N, N2, CO2, and O2. For ease of understanding, this embodiment sets the gas components in the gas combination data to include SF6, C4F7N, and N2. The ionization energy corresponding to gas component SF6 is 15.6 eV, the ionization energy corresponding to gas component C4F7N is 11.5 eV, and the ionization energy corresponding to gas component N2 is 15.6 eV. According to the preset component weight table, the weight value of gas component SF6 is determined to be 0.6, the weight value of gas component C4F7N is 0.3, and the weight value of gas component N2 is 0.1 (the total weight is 1, which can be adjusted as needed).

[0099] Therefore, based on the ionization energies and weight values ​​corresponding to the gas components SF6, C4F7N, and N2, the gas influence factor E is calculated. A The specific calculation formula is as follows:

[0100] E A =α1E1+α2E2+α3E3+...+α n E n ;

[0101] = 0.6 × 15.6 + 0.3 × 11.5 + 0.1 × 15.6

[0102] =14.37

[0103] Then, based on the calculated gas influence factor E A And based on the preset charge accumulation correlation calculation function, the charge accumulation basic factor A is calculated. The charge accumulation basic factor is used as the core indicator for quantifying charge accumulation trends and assessing insulation risk. Specifically, the specific calculation formula of the charge accumulation correlation calculation function is as follows:

[0104]

[0105] In the formula, A represents the basic factor of charge accumulation; β, c, d, and f are the fitting curve parameters of the charge accumulation correlation calculation function, which are determined in advance through repeated simulation experiments on different gases.

[0106] In a preferred embodiment, the step of calculating the charge accumulation influence factor based on the charge accumulation fundamental factor and the air pressure data includes:

[0107] Based on the charge accumulation fundamental factor, the air pressure data, and the preset air pressure charge coupling function, the air pressure correction coefficient is calculated.

[0108] The charge accumulation influence factor is calculated based on the pressure correction coefficient and the charge accumulation basic factor.

[0109] Specifically, considering that the influence factor H of the pressure data on the ease of dissipating accumulated charge is the pressure data P, it can be seen that the charge accumulation influence factor H is affected by the pressure data P. At the same time, the change in pressure data will cause a nonlinear change in ionization energy, and it is obvious that the higher the pressure data, the greater the energy required for ionization. That is, increasing the pressure will undoubtedly increase the difficulty of ionization. Therefore, the specific calculation formula of the pressure-charge coupling function is as follows:

[0110] H=γP+kA λ +p;

[0111] In the formula, P represents the air pressure data; γ, k, λ and p are the parameters of the air pressure charge coupling function fitting curve, which are determined in advance through repeated simulation experiments on different gases;

[0112] Finally, based on the pressure correction coefficient and the charge accumulation fundamental factor, the charge accumulation influence factor D is calculated, and the specific calculation expression is as follows:

[0113] D = A·H.

[0114] S3. Select the target laser source type based on the charge accumulation influence factor;

[0115] In a preferred embodiment, selecting the target laser source type based on the charge accumulation influence factor includes:

[0116] From the preset laser source information table, laser source types with radiation energy greater than the charge accumulation influence factor are selected as candidate laser source types;

[0117] Calculate the difference between the radiated energy and the charge accumulation influence factor;

[0118] Candidate laser source types whose difference between radiation energy and charge accumulation influence factor meets a preset range are selected as target laser source types.

[0119] Specifically, refer to Table 2, which is a laser source information table. Based on the calculated D, laser source types with radiation energy greater than the charge accumulation influence factor D are selected from Table 2. Assuming the current laser source types with energy greater than D are T2, T3, and T4, to ensure the laser radiation energy accurately targets charge dissipation, effectively breaking through charge binding while avoiding damage to the insulator due to excess energy, it is necessary to select candidate laser source types whose difference between radiation energy and the charge accumulation influence factor meets a preset range as the target laser source type. To avoid directly selecting the candidate laser source type with the highest radiation energy, which could cause an excessive reaction of the insulator surface material (such as thermal cracking or chemical bond breakage) due to the energy far exceeding the requirements, or directly selecting the candidate laser source type that only meets the minimum energy requirement, which could lead to incomplete dissipation due to insufficient energy redundancy (in areas with uneven charge distribution) and leave hidden dangers of local charge accumulation, if more than one target laser source type is selected, the low-energy target laser source type can be prioritized according to the actual situation, or the high-energy target laser source type can be prioritized if there are high time constraints.

[0120] Table 2 Laser Source Information Table

[0121]

[0122] S4. Determine the number of short-time pulse irradiations based on the amount of charge accumulation and the type of the target laser source;

[0123] In a preferred embodiment, determining the number of short-time pulse irradiations based on the charge accumulation amount and the target laser source type includes:

[0124] Subtract a preset charge safety threshold from the amount of charge accumulation to obtain the amount of charge accumulation to be eliminated;

[0125] The amount of charge that can be eliminated by a single laser strike is determined based on the radiation energy corresponding to the type of target laser source.

[0126] The number of short-time pulse irradiations is calculated based on the amount of charge accumulation to be eliminated and the amount of charge that can be eliminated by a single laser pulse.

[0127] Specifically, the amount of charge accumulation Q target The amount of charge accumulated is collected by the monitoring system, and the preset charge safety threshold Q is subtracted from the amount of charge accumulated. safe The amount of charge accumulation to be eliminated, Q, is obtained using the following formula:

[0128] Q = Qtarget -Q safe ;

[0129] Then, based on the radiation energy corresponding to the type of target laser source, the charge Q that can be eliminated by a single laser strike is determined. single Specifically, the amount of charge that can be eliminated by a single laser strike for the target laser source type can be obtained by looking up a table;

[0130] Then, based on the amount of charge accumulation to be eliminated Q and the amount of charge that can be eliminated in a single laser strike Q... single The number of short-time pulse irradiations is calculated using the following formula:

[0131]

[0132] S5. Control the laser generating device to emit a laser corresponding to the type of the target laser source until the number of short pulse irradiations is reached, and obtain the target insulator 2 after the accumulated charge is dissipated.

[0133] Specifically, the laser generating device is controlled to emit a laser corresponding to the type of the target laser source until the number of short pulse irradiations is reached, resulting in the target insulator 2 after the accumulated charge is dissipated. When the laser generating device emits a laser corresponding to the type of the target laser source, the laser will pass through several preset laser paths and, with the help of several focusing lenses, aim the laser at the accumulation area, thereby eliminating the accumulated charge area.

[0134] See Figure 4 This invention provides an insulator charge accumulation elimination device according to an embodiment of the present invention, comprising:

[0135] The data acquisition module is used to collect the amount of charge accumulation in the charge accumulation area of ​​the target insulator 2 in the target high-pressure sealed cavity 1, as well as the gas combination data and pressure data of the target high-pressure sealed cavity 1 when the charge accumulation elimination command is received.

[0136] The influence factor calculation module is used to calculate the charge accumulation influence factor based on the gas combination data and the gas pressure data.

[0137] The laser source type selection module is used to select the target laser source type based on the charge accumulation influence factor.

[0138] The irradiation count calculation module is used to determine the number of short-time pulse irradiations based on the charge accumulation amount and the target laser source type;

[0139] The accumulated charge elimination module is used to control the laser generating device to emit a laser corresponding to the type of the target laser source until the number of short-time pulse irradiations is reached, so as to obtain the target insulator 2 after the accumulated charge is dissipated.

[0140] In a preferred embodiment, calculating the charge accumulation influence factor based on the gas combination data and the gas pressure data includes:

[0141] Identify all gas components in the gas combination data;

[0142] Obtain the ionization energy corresponding to each gas component;

[0143] According to the preset component weight table, determine the weight value corresponding to each gas component;

[0144] The gas influence factor is calculated based on the corresponding ionization energy and weight value of each gas component.

[0145] Based on the gas influence factor and the preset charge accumulation correlation calculation function, the charge accumulation basic factor is calculated.

[0146] Based on the charge accumulation fundamental factor and the air pressure data, the charge accumulation influence factor is calculated.

[0147] See Figure 5 One embodiment of this application also provides a terminal device, including:

[0148] One or more processors;

[0149] A memory, coupled to the processor, for storing one or more programs;

[0150] When the one or more programs are executed by the one or more processors, the one or more processors implement the insulator charge accumulation elimination method as described above.

[0151] The processor controls the overall operation of the terminal device to complete all or part of the steps of the aforementioned insulator charge accumulation elimination method. The memory stores various types of data to support the operation of the terminal device; this data may include, for example, instructions for any application or method operating on the terminal device, as well as application-related data. The memory can be implemented using any type of volatile or non-volatile storage device or a combination thereof, such as Static Random Access Memory (SRAM), Electrically Erasable Programmable Read-Only Memory (EEPROM), Erasable Programmable Read-Only Memory (EPROM), Programmable Read-Only Memory (PROM), Read-Only Memory (ROM), magnetic storage, flash memory, magnetic disk, or optical disk.

[0152] In an exemplary embodiment, the terminal device may be implemented by one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), controllers, microcontrollers, microprocessors, or other electronic components to perform the insulator charge accumulation elimination method as described in any of the foregoing embodiments and achieve the same technical effect as the foregoing method.

[0153] In another exemplary embodiment, a computer-readable storage medium including a computer program is also provided. When executed by a processor, the computer program implements the steps of the insulator charge elimination method as described in any of the above embodiments. For example, the computer-readable storage medium may be the aforementioned memory including the computer program, which may be executed by a processor of a terminal device to perform the insulator charge elimination method as described in any of the above embodiments and achieve the same technical effects as the described method.

[0154] The above description represents the preferred embodiments of the present invention. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of the present invention, and these improvements and modifications are also considered to be within the scope of protection of the present invention.

Claims

1. A method for eliminating accumulated charge in an insulator, characterized in that, include: Upon receiving the charge accumulation elimination command, the charge accumulation amount in the charge accumulation area of ​​the target insulator in the target high-pressure sealed cavity, as well as the gas combination data and pressure data of the target high-pressure sealed cavity are collected. Based on the gas combination data and the gas pressure data, the charge accumulation influence factor is calculated; Based on the charge accumulation influence factor, the target laser source type is selected; The number of short-time pulse irradiations is determined based on the amount of charge accumulation and the type of the target laser source. The laser generating device is controlled to emit a laser corresponding to the type of the target laser source until the number of short pulse irradiations is reached, resulting in a target insulator after the accumulated charge has dissipated.

2. The method for eliminating accumulated charge in insulators as described in claim 1, characterized in that, The step of calculating the charge accumulation influence factor based on the gas combination data and the gas pressure data includes: Identify all gas components in the gas combination data; Obtain the ionization energy corresponding to each gas component; According to the preset component weight table, determine the weight value corresponding to each gas component; The gas influence factor is calculated based on the corresponding ionization energy and weight value of each gas component. Based on the gas influence factor and the preset charge accumulation correlation calculation function, the charge accumulation basic factor is calculated. Based on the charge accumulation fundamental factor and the air pressure data, the charge accumulation influence factor is calculated.

3. The method for eliminating accumulated charge in insulators as described in claim 2, characterized in that, The calculation of the charge accumulation influence factor based on the charge accumulation fundamental factor and the air pressure data includes: Based on the charge accumulation fundamental factor, the air pressure data, and the preset air pressure charge coupling function, the air pressure correction coefficient is calculated. The charge accumulation influence factor is calculated based on the pressure correction coefficient and the charge accumulation fundamental factor.

4. The method for eliminating accumulated charge in insulators as described in claim 1, characterized in that, The step of selecting the target laser source type based on the charge accumulation influence factor includes: From the preset laser source information table, laser source types with radiation energy greater than the charge accumulation influence factor are selected as candidate laser source types; Calculate the difference between the radiated energy and the charge accumulation influence factor; Candidate laser source types whose difference between radiant energy and the charge accumulation influence factor meets a preset range are selected as target laser source types.

5. The method for eliminating accumulated charge in insulators as described in claim 4, characterized in that, The step of determining the number of short-time pulse irradiations based on the amount of charge accumulation and the type of the target laser source includes: Subtract a preset charge safety threshold from the amount of charge accumulation to obtain the amount of charge accumulation to be eliminated; The amount of charge that can be eliminated by a single laser strike is determined based on the radiation energy corresponding to the type of target laser source. The number of short-time pulse irradiations is calculated based on the amount of charge accumulation to be eliminated and the amount of charge that can be eliminated by a single laser pulse.

6. The method for eliminating accumulated charge in insulators as described in claim 1, characterized in that, Several electrostatic probes are evenly distributed on the side of the target insulator; the electrostatic probes are used to sense the potential of the target insulator. Before collecting the charge accumulation in the target insulator charge accumulation area within the target high-pressure sealed cavity, as well as the gas combination data and pressure data of the target high-pressure sealed cavity, the following steps are also included: When the set time is reached, the potential collected by the electrostatic probe is acquired; The potential deviation value is calculated based on the potential collected by the electrostatic probe and the corresponding preset normal potential value. The potential deviation value is compared with a preset potential deviation range to determine whether the potential deviation value exceeds the preset potential deviation range. If so, issue a command to eliminate accumulated charge. If not, wait for the next set duration to elapse.

7. A device for eliminating accumulated charge on an insulator, characterized in that, include: The data acquisition module is used to collect the amount of charge accumulation in the charge accumulation area of ​​the target insulator in the target high-pressure sealed cavity, as well as the gas combination data and pressure data of the target high-pressure sealed cavity, when a charge accumulation elimination command is received. The influence factor calculation module is used to calculate the charge accumulation influence factor based on the gas combination data and the gas pressure data. The laser source type selection module is used to select the target laser source type based on the charge accumulation influence factor. The irradiation count calculation module is used to determine the number of short-time pulse irradiations based on the charge accumulation amount and the target laser source type; The accumulated charge elimination module is used to control the laser generating device to emit a laser corresponding to the type of the target laser source until the number of short-time pulse irradiations is reached, so as to obtain the target insulator after the accumulated charge is dissipated.

8. The insulator charge accumulation elimination device as described in claim 7, characterized in that, The step of calculating the charge accumulation influence factor based on the gas combination data and the gas pressure data includes: Identify all gas components in the gas combination data; Obtain the ionization energy corresponding to each gas component; According to the preset component weight table, determine the weight value corresponding to each gas component; The gas influence factor is calculated based on the corresponding ionization energy and weight value of each gas component. Based on the gas influence factor and the preset charge accumulation correlation calculation function, the charge accumulation basic factor is calculated. Based on the charge accumulation fundamental factor and the air pressure data, the charge accumulation influence factor is calculated.

9. A terminal device, characterized in that, include: One or more processors; A memory, coupled to the processor, for storing one or more programs; When the one or more programs are executed by the one or more processors, the one or more processors implement the insulator charge accumulation elimination method as described in any one of claims 1-6.

10. A storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements the insulator charge accumulation elimination method as described in any one of claims 1-6.

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