Shutter device, shutter control system, and lithographic apparatus

Abstract

This application discloses a shutter device, a shutter control system, and a photolithography apparatus, belonging to the field of semiconductor equipment. The shutter device of this application includes: a driving unit comprising a stator assembly and a mover assembly; the stator assembly includes a stator yoke and a magnet array, with multiple magnets in the magnet array circumferentially distributed on the stator yoke and adjacent circumferential magnets in close contact with each other; the mover assembly includes a coil holder with a symmetrical structure and a coil group supported thereon, the included angle between the first crossbeam and the second crossbeam in the coil holder being an obtuse angle; a light-shielding unit comprising blades; and a connecting unit connecting the driving unit and the light-shielding unit; the driving unit drives the light-shielding unit to reciprocate, thereby opening and closing the light path. In this application, the stator assembly increases the output torque of the driving unit, enabling rapid opening and closing of the blades; the mover assembly provides greater mechanical clearance space for blade rotation, enabling large-angle opening and closing of the blades, increasing the light-transmitting aperture of the shutter device, reducing the time consumed per exposure, and improving photolithography yield.

Description

Technical Field

[0001] This application relates to the field of semiconductor equipment, and more particularly to a shutter device, a shutter control system, and a photolithography device. Background Technology

[0002] Photolithography machines are key pieces of equipment in semiconductor manufacturing, used to precisely transfer patterns from photomasks onto substrates such as silicon wafers through an exposure process. Photolithography systems typically use mercury lamps as the light source and employ mechanical shutters to control the exposure process, achieving precise control of the exposure dose. The accuracy of exposure dose control directly determines the etching quality of the photolithographic pattern.

[0003] Among these, the dual-blade shutter solution is limited in application due to its complex structure and high cost caused by light leakage at the seam and the need for dual drive modules. Against this backdrop, the single-blade shutter has been adopted due to its simple structure and direct control. However, this solution still faces problems in practical applications, such as long shutter opening and closing times, insufficient timing control precision, and limited aperture size. These factors directly affect the stability of the exposure dose and restrict further improvement in the precision of the photolithography pattern. Summary of the Invention

[0004] This application provides a shutter device, a shutter control system, and a lithography equipment, which can shorten the opening and closing time of the exposure shutter and improve the control accuracy of the exposure dose; at the same time, it can also increase the light-transmitting aperture, reduce the time consumed in a single exposure, and improve the lithography yield.

[0005] To achieve the above objectives, according to a first aspect of this application, a shutter device is provided, comprising:

[0006] The drive unit includes a stator assembly and a mover assembly. The stator assembly includes a stator yoke and a magnet array. Multiple magnets in the magnet array are distributed circumferentially on the stator yoke and circumferentially adjacent magnets are in close contact with each other. The mover assembly includes a coil holder with a symmetrical structure and a coil group supported thereon. The included angle between the first crossbeam and the second crossbeam in the coil holder is an obtuse angle.

[0007] The shading unit includes blades;

[0008] A connection unit connects the drive unit and the light-shielding unit;

[0009] The driving unit is used to drive the light-shielding unit to reciprocate in order to switch the light path on and off.

[0010] According to a second aspect of this application, a shutter control system is also provided, the shutter control system comprising:

[0011] The host computer is used to send commands;

[0012] The control board is used to output shutter control commands based on instructions;

[0013] A driver used to output drive commands based on shutter control commands;

[0014] As described in the above technical solution, the shutter device controls the blades in the shutter device to reciprocate according to the drive command, so as to open and close the light path.

[0015] According to a third aspect of this application, a photolithography apparatus is also provided, the photolithography apparatus comprising:

[0016] The shutter device as described in the above technical solution, or the shutter control system as described in the above technical solution.

[0017] In the shutter device of this application embodiment, the above technical solution has at least the following beneficial effects: the multiple magnets constituting the magnet array are arranged close to each other, which can increase the overall magnetic flux within a limited space; the magnetic flux generated by the magnet array is concentrated and constrained to the working air gap where the mover assembly is located by the stator yoke, so as to enhance the air gap magnetic density and increase the output torque of the drive unit, thereby realizing the rapid opening and closing of the blade. The included angle between the first crossbeam and the second crossbeam of the coil fixing frame in the mover assembly is an obtuse angle. This structure provides a larger mechanical clearance space for the rotational movement of the blade (i.e., increases the physical space between the blade and the stator assembly), so that the blade can achieve a larger maximum opening. The increase in opening directly leads to an increase in the maximum light-transmitting aperture of the shutter device, which means that under the condition of constant light source intensity, the light power (energy) reaching the silicon wafer through the shutter device per unit time is increased, shortening the time required for the photoresist to undergo chemical reaction (reaching the exposure dose), reducing the single exposure time, and improving the photolithography yield.

[0018] Other features and advantages of this application will be described in detail in the following detailed description section. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] To gain a more complete understanding of this application and its beneficial effects, the following description will be provided in conjunction with the accompanying drawings, wherein the same reference numerals in the following description denote the same parts.

[0021] Figure 1 This is a schematic diagram of the overall structure of the shutter device provided in the embodiments of this disclosure;

[0022] Figure 2 This is one of the schematic diagrams of the internal structure of the shutter device provided in the embodiments of this disclosure;

[0023] Figure 3 This is the second schematic diagram of the internal structure of the shutter device provided in the embodiments of this disclosure;

[0024] Figure 4 This is a schematic diagram showing the distribution of the stator assembly of the shutter device provided in the embodiments of this disclosure;

[0025] Figure 5 yes Figure 1 A cross-sectional view obtained by cutting along the middle perpendicular to the first direction;

[0026] Figure 6 yes Figure 3 An enlarged schematic diagram of section D in the middle;

[0027] Figure 7 This is the third schematic diagram of the internal structure of the shutter device provided in the embodiments of this disclosure;

[0028] Figure 8 yes Figure 3 An enlarged schematic diagram of section E in the middle;

[0029] Figure 9 This is a structural block diagram of the shutter control system provided in the embodiments of this disclosure;

[0030] Figure 10 This is a graph showing the relationship between the control time and the exposure light intensity of the shutter control system provided in this embodiment.

[0031] Explanation of reference numerals in the attached figures:

[0032] 1-Shutter mechanism;

[0033] 2-Drive unit; 21-Stator assembly; 211-Stator yoke; 2111-First stator yoke; 2112-Second stator yoke; 212-Magnet array; 2121-First magnet array; 2122-Second magnet array; 213-Magnet; 22-Motor assembly; 221-Coil holder; 2211-First crossbeam; 2212-Second crossbeam; 2213-Third crossbeam; 2214-Fourth crossbeam; 2215-First through hole; 2216-Second through hole; 222-Coil group; 2221-First coil; 2222-Second coil;

[0034] 3-Shading unit; 31-Blade;

[0035] 4-Connecting unit; 41-Rotating shaft; 42-First connecting piece; 421-Third through hole; 422-Fourth through hole; 43-Bearing support seat;

[0036] 5 - Angle measurement unit; 51 - Angle encoder;

[0037] 6-Support unit; 61-First support frame; 62-Second support frame; 63-Cover;

[0038] 7-Light transmission hole;

[0039] 8-Air blowing unit; 81-First air blowing assembly; 811-First air inlet; 812-First air outlet; 813-First flow channel; 82-Second air blowing assembly; 821-Second air inlet;

[0040] 91-Host computer; 92-Control board; 93-Driver;

[0041] X - First direction; Y - Second direction; Z - Third direction. Detailed Implementation

[0042] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0043] In the description of this application, it should be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship according to the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0044] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0045] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection, a direct connection, or an indirect connection through an intermediate medium; or they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0046] This application provides a shutter device, a shutter control system, and a lithography apparatus, which are described in detail below. It should be noted that the order of description of the following embodiments is not intended to limit the preferred order of the embodiments of this application. Furthermore, the descriptions of each embodiment have their own emphasis; parts not described in detail in a certain embodiment can be referred to in the relevant descriptions of other embodiments.

[0047] Please see Figure 1 and Figure 2 The shutter device 1 of this application includes a drive unit 2, a light-shielding unit 3, and a connecting unit 4. The drive unit 2 includes a stator assembly 21 and a mover assembly 22. The stator assembly 21 includes a stator yoke 211 and a magnet array 212, wherein multiple magnets 213 in the magnet array 212 are distributed circumferentially along the stator yoke 211, and circumferentially adjacent magnets 213 are in close contact with each other. The mover assembly 22 includes a coil holder 221 and a coil assembly 222. The coil holder 221 has a symmetrical structure and is capable of supporting the coil assembly 222. The included angle between the first crossbeam 2211 and the second crossbeam 2212 in the coil holder 221 is an obtuse angle. The light-shielding unit 3 includes blades 31. The connecting unit 4 connects the drive unit 2 and the light-shielding unit 3. The drive unit 2 is used to drive the light-shielding unit 3 to reciprocate, thereby opening and closing the light path.

[0048] In this technical solution, the drive unit 2 serves as the core power source, with the stator assembly 21 and the mover assembly 22 jointly driving the light-shielding unit 3 to reciprocate. Specifically, in the stator assembly 21, multiple magnets 213 are arranged circumferentially to form an arc-shaped magnet array 212. The polarities of adjacent magnets 213 in the arc-shaped magnet array 212 are opposite. The adjacent magnets 213 are arranged close to each other to reduce magnetic leakage and increase the overall magnetic flux within a limited space. The magnet array 212 is fixed to the stator yoke 211 by means of adhesive or other methods, and the stator yoke 211 has an arc-shaped structure corresponding to the magnet array 212. The stator yoke 211, through forming a low magnetic resistance path, concentrates and constrains the magnetic flux generated by the magnet array 212 to the working air gap where the mover assembly 22 is located, thereby enhancing the air gap magnetic density and directly increasing the output torque of the drive unit 2, thus realizing the rapid opening and closing of the blade 31 (reaching the "open state" or "closed state"). "Open state" refers to the blade 31 being in an effective working position that allows the exposure beam to pass through the light-transmitting aperture 7; "Closed state" refers to the blade 31 being in a light-blocking position that effectively prevents the exposure beam from passing through the light-transmitting aperture 7. The aforementioned "rapid opening and closing" means that the movement time for the blade 31 to complete one full opening or closing action is significantly shortened.

[0049] In the mover assembly 22, the coil holder 221 supports the coil group 222. The current-carrying coil group 222 experiences a Lorentz force in the magnetic field of the stator assembly 21. This force generates a driving torque relative to the rotation axis, thereby causing the mover assembly 22 to rotate as a whole. The coil holder 221 itself has a symmetrical structure, and it supports the coil group 222 symmetrically. This design ensures that the line of action of the resultant Lorentz force on the coil group passes through the rotation center of the mover assembly, and the center of mass of the entire mover assembly 22 is also located on its rotation axis. These two conditions work together to effectively suppress the vibration and bending moment caused by imbalance in the high-frequency reciprocating rotation of the mover assembly 22, ensuring its smooth operation. The coil holder 221 has multiple crossbeams for supporting the coil group 222, and the crossbeams are fixed to the coil group by adhesive or other means. The coil holder 221 includes a first crossbeam 2211 and a second crossbeam 2212, with an obtuse angle between them. This structure provides greater mechanical clearance for the rotational movement of the blade 31 (i.e., increases the physical space between the blade 31 and the stator assembly 21), enabling the blade 31 to achieve a larger maximum opening. This increased opening directly leads to an increase in the maximum aperture of the shutter device 1. The increased aperture means that, with a constant light source intensity, the light power (energy) reaching the silicon wafer per unit time through the shutter device 1 is increased, shortening the time required for the photoresist to undergo a chemical reaction (reaching the exposure dose), reducing the single exposure time, and improving photolithography yield. Preferably, the angle between the first crossbeam 2211 and the second crossbeam 2212 is between 156° and 165°, for example: 157°, 158°, 159°, 160°, 161°, 162°, 163°, and 164°, but is not limited thereto.

[0050] Therefore, by adopting the above design, multiple magnets 213 in the magnet array 212 are arranged close to each other to increase the overall magnetic flux. The magnetic flux generated by the magnet array 212 is concentrated and constrained as much as possible to the working air gap where the mover assembly 22 is located, thereby enhancing the air gap magnetic density and directly increasing the output torque of the drive unit 2, thus realizing the rapid opening and closing of the blade 31. The included angle between the first crossbeam 2211 and the second crossbeam 2212 of the coil fixing frame 221 in the mover assembly 22 is an obtuse angle, which provides a larger mechanical clearance space for the rotational movement of the blade 31, enabling the blade 31 to achieve a larger maximum opening, thereby increasing the maximum light-transmitting aperture of the shutter device 1, reducing the single exposure time, and improving the lithography yield.

[0051] In some embodiments, the orthographic projection of the magnet array 212 in a first direction (the X direction is defined as the first direction in this application) lies within the orthographic projection of the stator yoke 211 in the first direction. The arcuate profile of the magnet array 212 is concentric with the arcuate profile of the stator yoke 211.

[0052] In this design, in the first direction, the magnet array 212 is completely contained within the contour of the stator yoke 211. This ensures that the stator yoke 211 forms a low-resistivity closed magnetic circuit for the magnet array 212, thereby greatly reducing magnetic flux leakage in the air. This allows magnetic energy to be concentrated in the working air gap where the coil assembly 222 is located, ultimately achieving a greater output force under the same input current. The arcuate contour of the magnet array 212 is concentric with the arcuate contour of the stator yoke 211, ensuring the formation of a magnetic field with a uniform and periodically distributed magnetic flux density within the movement stroke of the mover assembly 22. This magnetic field characteristic ensures that the energized coil assembly 222 experiences a uniform Lorentz force throughout its entire effective stroke, thus providing a smooth driving force for the drive unit 2.

[0053] In some embodiments, please refer to Figures 2 to 4 The stator yoke 211 includes a first stator yoke 2111 and a second stator yoke 2112. The magnet array 212 includes a first magnet array 2121 and a second magnet array 2122 arranged parallel to each other and facing each other. The first magnet array 212 is fixed to the first stator yoke 2111, and the second magnet array 2122 is fixed to the second stator yoke 2112. The orthographic projection of the first magnet array 2121 in a first direction completely coincides with the orthographic projection of the second magnet array 2122 in the first direction. The mover assembly 22 is located between the first magnet array 2121 and the second magnet array 2122.

[0054] In this technical solution, the number of magnets in the first magnet array 2121 and the second magnet array 2122 is the same. Within each array, the polarities of adjacent magnets 213 are opposite; between the two arrays, the polarities of magnets 213 facing each other along the X direction are also opposite. This polarity arrangement allows magnetic field lines to originate from, for example, the N pole of one side of the magnet 213, pass through the working air gap and the mover assembly 22, be received by the S pole of the opposite magnet 213 on the other side, and form a complete closed loop through the first stator yoke 2111 and the second stator yoke 2112, thereby constituting a highly efficient axial magnetic circuit that creates and strengthens the working magnetic field for the mover assembly 22. Compared to traditional rotary magnetic circuit motors that require an additional intermediate yoke, this type of axial magnetic circuit rotary motor is advantageous for reducing axial dimensions. Furthermore, since the magnetic circuit closure depends only on the stator yokes on both sides, its external mechanical support structure can be manufactured using lightweight non-magnetic materials such as aluminum alloy, thus significantly reducing the weight of the device. As an example, to further improve the air gap magnetic flux density, the first stator yoke 2111 and the second stator yoke 2112 can be made of materials with high saturation magnetization, such as electrical pure iron, martensitic stainless steel, etc.

[0055] As an example, in this application, both the first magnet array 2121 and the second magnet array 2122 include four magnets 213, which can be understood as having four sets of magnet pairs, but is not limited to this. If the coil group 222 in the mover assembly 22 is considered as a whole, its wound conductors will sequentially pass through the magnetic field formed by these four sets of magnet pairs. If the length of the coil conductor distributed in the air gap of a single set of magnet pairs is taken as a reference, this structure increases the total effective conductor length in the strong working magnetic field to about four times. The increase in the total effective conductor length directly improves the torque coefficient of the drive unit 2. When the input current remains constant, the output torque of the drive unit 2 will be significantly improved. This ultimately translates into a larger driving torque acting on the blade 31, thus providing the core power guarantee for achieving its rapid opening and closing motion.

[0056] The direction of the magnetic field formed by the stator assembly 21 in this application will be described below. A first magnet array 2121 is fixed on the first stator yoke 2111, and the magnets 213 in this array have their polarities distributed in the order NSNS along the circumferential direction. A second magnet array 2122 is fixed on the second stator yoke 2112, and the magnets 213 in this array have their polarities distributed in the order SNSN along the circumferential direction. At the same time, the polarities of two magnets 213 that are directly opposite each other along the first direction are also opposite. This polarity correspondence between the inner and outer arrays together establishes an axial magnetic field with high magnetic flux density and periodically alternating directions in the air gap between the first magnet array 2121 and the second magnet array 2122.

[0057] In some embodiments, please refer to Figure 3 and Figure 5 The angle between the central axis A of the blade 31 extending along the third direction (the Z direction is defined as the third direction in this application) and the extension line B of the first crossbeam 2211 is smaller than the angle between the central axis A and the extension line C of the second crossbeam 2212.

[0058] In this technical solution, the blade 31 is located between the first crossbeam 2211 and the second crossbeam 2212. The central axis A of the blade 31 forms an angle α with the extension line B of the first crossbeam 2211 and an angle β with the extension line of the second crossbeam 2212, with β > α. This asymmetrical angle design causes the second crossbeam 2212 supporting the coil assembly 222 and its associated mover assembly to be spatially offset outwards, thus providing more oscillation space for the rotation of the blade 31. This layout is particularly suitable for the opening and closing motion of a single blade, enabling it to achieve large-angle opening and closing (approximately 40 degrees) while ensuring that the blade 31 maintains a sufficient safety clearance with key static components such as the stator assembly 21 throughout its entire motion trajectory, fundamentally eliminating motion interference and ensuring long-term operational reliability.

[0059] In some embodiments, the coil holder 221 further includes a third crossbeam 2213 and a fourth crossbeam 2214, with an acute angle θ between the third crossbeam 2213 and the fourth crossbeam 2214. The coil assembly 222 includes a first coil 2221 and a second coil 2222, with the first crossbeam 2211 and the fourth crossbeam 2214 supporting the first coil 2221, and the second crossbeam 2212 and the third crossbeam 2213 supporting the second coil 2222.

[0060] In this technical solution, the included angle θ between the third crossbeam 2213 and the fourth crossbeam 2214 is an acute angle, which satisfies the geometric constraints of the coil fixing frame 221 and ensures the overall stability of the coil fixing frame 221. Preferably, the acute angle θ is in the range of 60° to 65°, such as 61°, 62°, 63° and 64°, but is not limited thereto.

[0061] In some embodiments, please refer to Figure 5 The coil holder 221 also has a first through hole 2215 and a second through hole 2216. The first through hole 2215 is located at the center of the coil holder 221, and the second through hole 2216 is closer to the second crossbeam 2212 than the first through hole 2215.

[0062] In this technical solution, the shape, size, and position of the first through hole 2215 and the second through hole 2216 can be specifically designed according to actual needs. As an example, the first through hole 2215 can be designed as a circle, and the second through hole 2216 can be designed as a long groove, the extension direction of which is adapted to the rotation direction of the coil fixing bracket 221.

[0063] In some embodiments, please refer to 5 and Figure 6 The connecting unit 4 includes a rotating shaft 41 and a first connecting member 42. The first connecting member 42 is fixed to the coil fixing frame 221. The first connecting member 42 is provided with a third through hole 421 and a fourth through hole 422. The third through hole 421 is corresponding to the first through hole 2215, and the fourth through hole 422 is corresponding to the second through hole 2216. The blade 31 is installed on the free end of the first connecting member 42. The rotation center of the rotating shaft 41 is concentric with the center of the arc-shaped contour of the magnet array 212. The rotating shaft 41 passes through the third through hole 421 and the first through hole 2215 and moves synchronously with the mover assembly 22 to drive the blade 31 to move.

[0064] In this technical solution, the connecting unit 4 is used to connect the mover assembly 22 and the blade 31 in the drive unit 2. Specifically, the first connecting member 42 is installed on the side of the coil fixing frame 221 near the second magnet array 2122. Its third through hole 421 corresponds to the position and size of the first through hole 2215 of the coil fixing frame 221, so that the rotating shaft 41 can pass through in sequence, and is fixed by a bearing (not shown in the figure) and a bearing support 43. The free end of the first connecting member 42 is elongated and fixedly connected to the blade 31. At the same time, the rotation center of the rotating shaft 41 is concentric with the center of the arc-shaped magnet array 212, ensuring that the distribution of the air gap magnetic field of the mover assembly 22 is axisymmetric and uniform within its working stroke. Therefore, the driving torque generated by the Lorentz force on the coil group 222 has a stable linear relationship with the input current, thereby ensuring the stability of the output torque and reducing the control difficulty. As an alternative, the first connector 42 can also be installed on the side of the coil holder 221 near the first magnet array 2121, and the shape of its free end can be specifically designed based on factors such as connection stiffness and space avoidance.

[0065] In some embodiments, please refer to Figure 6 The connecting unit 4 also includes a limiting post (not shown in the figure), which passes through the fourth through hole 422 and the second through hole 2216 to limit the rotation angle of the mover assembly 22. The limiting post is mounted on the bearing support.

[0066] In this technical solution, a limiting post (not shown in the figure) and corresponding limiting holes (i.e., the fourth through hole 422 and the second through hole 2216) are provided. The limiting post passes through the limiting hole. When the mover assembly 22 rotates, the left and right groove walls of the limiting hole alternately contact the fixed limiting post, thereby forming a mechanical limit and precisely constraining the rotation angle range of the mover assembly 22. This limiting design can effectively prevent the mover assembly 22 from overshooting during rotation and avoid the blade 31 from colliding with surrounding components, thus ensuring the accuracy of the motion trajectory and the functional reliability of the device.

[0067] In some embodiments, please refer to Figure 6 The shutter device 1 also includes an angle measurement unit 5. An angle encoder 51, constituting the angle measurement unit 5, is installed at the output end of the rotating shaft 41 and is used to directly measure the real-time rotation angle of the rotating shaft 41. This angle is equivalent to the actual angular position of the mover assembly 22 and the blade 31. Based on the real-time angle signal fed back by the angle encoder 51, the control system can construct a closed-loop servo control: comparing the detected actual angle with the preset target angle, and dynamically adjusting the input current of the drive unit 2 according to the generated position deviation signal. This closed-loop mechanism not only ensures that the blade 31 responds quickly but also enables it to accurately and stably reach the commanded position, thereby achieving high-precision control of the exposure dose.

[0068] In some embodiments, please refer to Figure 1 and Figure 2 The shutter device 1 also includes a support unit 6, which comprises a first support frame 61, a second support frame 62, and a cover 63. Both the first support frame 61 and the second support frame 62 have light-transmitting holes 7. The first support frame 61 is fixed to the side of the first stator yoke 2111 away from the first magnet array 2121, and the second support frame 62 is fixed to the side of the second stator yoke 2112 away from the second magnet array 2122. The cover 63 covers the area between the first support frame 61 and the second support frame 62.

[0069] In this technical solution, the first support frame 61 is fixedly connected to the first stator yoke 2111, and the second support frame 62 is fixedly connected to the second stator yoke 2112. The fixing methods include screw fixing, riveting fixing, and welding fixing, but are not limited to these. Thus, the weight and working load of the drive unit 2, the light-shielding unit 3, and the connecting unit 4 are jointly borne by the first support frame 61 and the second support frame 62. The first support frame 61 and the second support frame 62 are arranged parallel to each other, and their shapes and dimensions correspond. The housing 63 is installed between the first support frame 61 and the second support frame 62. Firstly, it connects and reinforces this parallel support frame, improving the rigidity of the overall structure; secondly, it covers the area between the first support frame 61 and the second support frame 62, forming a protective shell. This shell not only provides dustproof and impact-proof physical protection for the internal moving parts, but more importantly, it acts as an effective light seal, preventing any unintended light leakage caused by structural gaps when the shutter is closed.

[0070] In some embodiments, please refer to Figure 1 and Figure 7 The shutter device 1 also includes an air blowing unit 8, which includes a first air blowing assembly 81 and a second air blowing assembly 82. The first air blowing assembly 81 and the second air blowing assembly 82 are disposed on the housing 63. The first air blowing assembly 81 includes a first air inlet 811 and a first air outlet 812 for dissipating heat from the coil assembly 222. The second air blowing assembly 82 includes a second air inlet 821 and a second air outlet for dissipating heat from the blades 31.

[0071] In this technical solution, while current is supplied to the coil assembly 222, treated clean and dry compressed air or other plant gases are continuously blown onto the coil assembly 222 through the first air inlet 811 and the first air outlet 812 to dissipate heat. This heat dissipation mechanism can maintain the operating temperature of the coil assembly 222 within the thermal limit of its insulation material, thereby allowing the system to apply a larger drive current while ensuring safety. This directly increases the output torque of the drive unit 2, providing a guarantee for the rapid opening and closing of the blade 31. At the same time, to cope with the heat generated by the high-speed operation of the blade 31, the same clean gas is supplied to the second air inlet 821, and the airflow is blown onto the blade 31 from the second air outlet. This effectively suppresses the thermal deformation and thermal stress of the blade 31 caused by temperature rise, thereby ensuring its motion accuracy (operational stability) and extending its mechanical service life.

[0072] In some embodiments, please refer to Figure 1 , Figure 7 and Figure 8 The number of first air blowing components 81 is multiple. Each first air blowing component 81 also includes a first flow channel 813, the cross-section of which is an isosceles trapezoid. The first air outlet 812 is configured as a point array air outlet.

[0073] In this technical solution, as an example, two first air-blowing components 81 with identical internal structures are provided to independently dissipate heat from the first coil 2221 and the second coil 2222, respectively. The first flow channel 813 adopts an isosceles trapezoidal cross-section with a narrow inlet and a wide outlet. This gradually expanding flow channel, combined with a gentle inner wall transition, can effectively guide the airflow to diffuse smoothly and suppress the generation of vortices within the flow channel to the greatest extent, thereby providing a stable and uniform flow field for the first air outlet 812. In addition, the first air outlet 812 is set as two rows of completely symmetrical discrete small holes, so that the airflow range can effectively cover the thickness of the coil group 222, ensuring heat dissipation efficiency. At the same time, this dot matrix distribution method can make the airflow blow out evenly from multiple points, and the airflow velocity of each small air outlet is gentler, which can both remove heat and reduce the physical impact of the airflow on the coil group 222, thus taking into account both heat dissipation and protection.

[0074] Please see Figure 9 and Figure 10 In the embodiments of this application, this application also provides a shutter control system, including: a host computer 91 for sending instructions; a control board 92 for outputting shutter control instructions based on the instructions; a driver 93 for outputting drive instructions based on the shutter control instructions; and a shutter device 1 as described in any of the above technical solutions, which controls the movement of the blades 31 in the shutter device 1 according to the drive instructions to open and close the light path.

[0075] In this technical solution, T0 to T1 represent the time when the control board 92 sends the blade 31 opening command to the driver 93, T1 to T2 represent the time when the driver 93 receives the command and controls the blade 31 from the closed state to the open state, T2 to T3 represent the steady state time when the blade 31 remains in the fully open state, T3 to T4 represent the time when the control board 92 sends the blade 31 closing command to the driver 93, and T4 to T5 represent the time when the driver 93 receives the command and controls the blade 31 from the open state to the closed state.

[0076] In some embodiments, the control board 92 and the driver 93 in the shutter control system use I / O communication, and the position loop sampling frequency of the driver 93 is ≥10KHz.

[0077] In this technical solution, the time required for the blades 31 to open and close, and their repeatability (stability), are two core indicators for evaluating the performance of the shutter device. Specifically, the time from T0 to T2 (total opening time) and from T3 to T5 (total closing time) are required to be as short as possible, with minimal period jitter. The control board 92 uses I / O communication to send commands to the control driver 93. This communication process has extremely low latency, with a time consumption (T0 to T1) of only about 0.5ms. Simultaneously, a driver 93 with a servo update frequency greater than 10kHz (period <0.1ms) is used to improve the response speed and stability of the control loop. The core movement time of the blades 31 (T1 to T2) is determined by the output performance of the drive unit 2 and the aperture. In one embodiment of this application, this time is optimized to approximately 9.5ms. Therefore, the total time for a single opening (or closing) of the blades 31 is approximately 10ms, meaning the total time of a complete opening and closing cycle is strictly controlled within 20ms, achieving precise control of the exposure dose. Simultaneously, a large aperture of 55mm can be achieved.

[0078] In some embodiments of this application, a lithography apparatus is also provided, which includes a shutter device as described in any of the above technical solutions, or a shutter control system as described in any of the above technical solutions. Since the shutter device or shutter control system in this lithography apparatus has the same technical features as the aforementioned shutter device or shutter control system, both can solve the same technical problem and achieve the same technical effect.

[0079] In the description of this specification, specific features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments or examples.

[0080] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of protection of the claims. Furthermore, specific examples have been used in the specification to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this application, and the content of this specification should not be construed as a limitation of this application.

Claims

1. A shutter device, characterized in that, include: A drive unit includes a stator assembly and a mover assembly. The stator assembly includes a stator yoke and a magnet array. A plurality of magnets in the magnet array are circumferentially distributed on the stator yoke and circumferentially adjacent magnets are in close contact with each other. The mover assembly includes a coil holder with a symmetrical structure and a coil group supported thereon. The included angle between a first crossbeam and a second crossbeam in the coil holder is an obtuse angle. The shading unit includes blades; A connection unit connects the driving unit and the light-shielding unit; The driving unit is used to drive the light-shielding unit to reciprocate so as to open and close the light path; The blade is located between the first crossbeam and the second crossbeam; The angle between the central axis of the blade extending in a third direction and the first crossbeam is smaller than the angle between the central axis and the second crossbeam.

2. The shutter device according to claim 1, characterized in that, The orthographic projection of the magnet array in the first direction lies within the orthographic projection of the stator yoke in the first direction; The arc-shaped profile of the magnet array is concentric with the arc-shaped profile of the stator yoke.

3. The shutter device according to claim 2, characterized in that, The stator yoke includes a first stator yoke and a second stator yoke; The magnet array includes a first magnet array and a second magnet array arranged parallel to each other and facing each other. The first magnet array is fixed to the first stator yoke, and the second magnet array is fixed to the second stator yoke. The orthographic projection of the first magnet array in the first direction completely coincides with the orthographic projection of the second magnet array in the first direction; The moving part is located between the first magnet array and the second magnet array.

4. The shutter device according to claim 1, characterized in that, The coil fixing frame also includes a third crossbeam and a fourth crossbeam, and the included angle between the third crossbeam and the fourth crossbeam is an acute angle; The coil group includes a first coil and a second coil; The first crossbeam and the fourth crossbeam support the first coil, and the second crossbeam and the third crossbeam support the second coil.

5. The shutter device according to claim 1, characterized in that, The coil fixing bracket is also provided with a first through hole and a second through hole; The first through hole is located at the center of the coil holder; The second through hole is closer to the second crossbeam than the first through hole.

6. The shutter device according to claim 5, characterized in that, The connecting unit includes a rotating shaft and a first connecting member; The first connector is fixed to the coil fixing frame. The first connector is provided with a third through hole and a fourth through hole. The third through hole is provided in correspondence with the first through hole, and the fourth through hole is provided in correspondence with the second through hole. The blade is mounted on the free end of the first connector; The rotation center of the rotating shaft is concentric with the center of the arc-shaped contour of the magnet array; The rotating shaft passes through the third through hole and the first through hole, and moves synchronously with the moving part assembly to drive the blade.

7. The shutter device according to claim 6, characterized in that, The connecting unit further includes a limiting post, which passes through the fourth through hole and the second through hole to limit the rotation angle of the moving part assembly.

8. The shutter device according to claim 1, characterized in that, The shutter device also includes an angle measuring unit, which includes an angle encoder; The angle encoder is installed at the output end of the rotating shaft and is used to detect the rotation angle of the moving part assembly.

9. The shutter device according to claim 3, characterized in that, The shutter device also includes a support unit, which includes a first support frame, a second support frame, and a cover. Both the first support frame and the second support frame are provided with light-transmitting holes; The first support frame is fixed on the side of the first stator yoke away from the first magnet array, and the second support frame is fixed on the side of the second stator yoke away from the second magnet array; The cover encloses the area between the first support frame and the second support frame.

10. The shutter device according to claim 9, characterized in that, The shutter device further includes an air blowing unit, which includes a first air blowing component and a second air blowing component; The first air blowing assembly and the second air blowing assembly are disposed on the housing; The first air blowing assembly includes a first air inlet and a first air outlet, used to dissipate heat from the coil assembly; The second air blowing assembly includes a second air inlet and a second air outlet for dissipating heat from the blades.

11. The shutter device according to claim 10, characterized in that, The number of the first air blowing components is multiple; The first air blowing assembly further includes a first flow channel, the cross-section of which is an isosceles trapezoid. The first air outlet is configured as a point array air outlet.

12. A shutter control system, characterized in that, include: The host computer is used to send commands; A control board, used to output shutter control commands based on the aforementioned instructions; A driver, used to output a drive command based on the shutter control command; The shutter device according to any one of claims 1 to 11 controls the blades in the shutter device to reciprocate according to the drive command, so as to open and close the light path.

13. The shutter control system according to claim 12, characterized in that, The control board and the driver communicate via I / O. The position loop sampling frequency of the driver is ≥10KHz.

14. A photolithography apparatus, characterized in that, include: The shutter device as described in any one of claims 1 to 11, or the shutter control system as described in any one of claims 12 to 13.

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