Semiconductor industry wastewater treatment system and configuration method

Abstract

The invention discloses a semiconductor industry wastewater treatment system and a configuration method, the semiconductor industry wastewater treatment system comprises an ultrafiltration device, a reverse osmosis device and a gas-liquid separation device between the ultrafiltration device and the reverse osmosis device, the system uses a tangential inflow assembly to cooperate with a flow guide assembly in a rotational flow area to force fluid to rotate and descend, and microbubbles in ultrafiltration effluent are separated through centrifugal force; releasing the protective gas by using the scavenging assembly to replace the separated gas and reduce the dissolved oxygen; liquid surface bubbles are physically prevented from entering the downstream through an anti-vortex component with the top closed and the side wall provided with holes in the liquid outlet assembly. According to the semiconductor industry wastewater treatment system, the problems of high-pressure pump cavitation, reverse osmosis membrane air resistance and oxidation pollution blockage caused by microbubbles and high dissolved oxygen are effectively solved, the stability of the system is remarkably improved, and the service life of equipment is prolonged.

Description

Technical Field

[0001] This invention relates to a wastewater treatment system, and more particularly to a wastewater treatment system and configuration method for the semiconductor industry. Background Technology

[0002] With the rapid development of the semiconductor industry, the treatment and resource reuse of wastewater generated during its manufacturing process has become a focus of industry attention. Semiconductor wastewater has a complex composition, typically including heavy metal wastewater such as copper / nickel, fluoride-containing wastewater, and grinding wastewater. To achieve efficient recycling of water resources, the industry generally adopts reduced-volume reuse processes. In a typical semiconductor wastewater reuse process, after pretreatment such as chemical precipitation, the wastewater usually enters a dual-membrane deep treatment system. This system uses an ultrafiltration unit as a pretreatment unit to remove colloids and suspended particulate matter, followed by a series reverse osmosis (RO) unit for deep desalination and removal of dissolved substances. The final product water can be reused as makeup water for cooling towers or as raw water for pure water preparation systems.

[0003] In existing semiconductor wastewater treatment systems, ultrafiltration and reverse osmosis units are typically directly connected via an intermediate water tank and pipelines, or simply a buffer container is used. To maintain the filtration flux of the ultrafiltration membrane and prevent pore clogging, the ultrafiltration membrane module must be periodically subjected to high-intensity air scrubbing and backwashing during operation, for example, using compressed air at high flow rates to violently agitate and clean the membrane fibers. The effluent after ultrafiltration is usually pressurized by a high-pressure pump and directly sent to the downstream reverse osmosis system. To prevent reverse osmosis membrane fouling, existing technological improvements typically focus on adding a security filter before the reverse osmosis unit to intercept fine particles, or adding antiscalants to prevent inorganic salt scaling.

[0004] However, in practical engineering, the inventors discovered that the existing technologies described above have significant defects in gas-liquid control and connection, directly restricting the operational stability of the reverse osmosis system. Firstly, due to the frequent high-intensity gas scrubbing of the ultrafiltration unit, a large number of microbubbles are easily entrained in the ultrafiltration effluent, and the dissolved gases in the water are often in a supersaturated state. Existing intermediate tanks or pipelines lack efficient forced gas-liquid separation mechanisms, causing these bubbles to be directly sucked into the high-pressure pump of the reverse osmosis system with the water flow, easily leading to pump cavitation, severe vibration, and noise, significantly shortening the service life of the high-pressure pump. Secondly, after the water flow carrying bubbles and high concentrations of dissolved oxygen enters the reverse osmosis membrane module, the microbubbles accumulate on the membrane surface, forming gas resistance and reducing the effective filtration area. Simultaneously, the high dissolved oxygen content promotes the growth of aerobic microorganisms on the reverse osmosis membrane surface, forming biofouling, or accelerates the oxidation and polymerization of organic matter in the wastewater, leading to a rapid decline in reverse osmosis membrane flux. This forces the plant to increase the frequency of chemical cleaning, significantly increasing operating costs and reagent consumption. Therefore, a semiconductor industry wastewater treatment system is urgently needed to solve the above problems. Summary of the Invention

[0005] The purpose of this invention is to provide a semiconductor industry wastewater treatment system and configuration method that incorporates cyclone separation, active inert gas replacement, and anti-bubble interception functions between an ultrafiltration device and a reverse osmosis device. This system achieves thorough removal of entrained bubbles and pre-removal of dissolved oxygen in the UF effluent, effectively blocks bubble impact on the RO high-pressure pump, and reduces the risk of RO membrane oxidation and biofouling, thereby improving the product water quality and equipment operation stability of the wastewater reuse system.

[0006] The technical solution adopted by the present invention to solve the above problems is: a semiconductor industry wastewater treatment system, including an ultrafiltration device, a reverse osmosis device, and a gas-liquid separation device disposed between the two, wherein the gas-liquid separation device includes: The housing defines an upper gas phase region, a middle cyclone separation region, and a lower liquid phase region. The outer side of the housing is provided with an exhaust port connected to the gas phase region, a liquid inlet connected to the cyclone separation region, and a liquid outlet connected to the liquid phase region. The liquid inlet is connected to the product water end of the ultrafiltration device, and the liquid outlet is connected to the inlet end of the reverse osmosis device. A tangential flow inlet assembly is disposed at the liquid inlet and configured to introduce fluid into the housing tangentially along the inner wall of the housing. A flow guiding assembly is disposed in the swirling separation region inside the housing. The flow guiding assembly is arranged on the extension path of the outlet of the tangential inlet assembly and is configured to guide the fluid to form a circumferentially rotating downward flow on the inner wall of the housing. A scavenging assembly includes a gas distributor extending into the gas phase region, the scavenging assembly being configured to access an external gas source and release protective gas into the gas phase region through the gas distributor; The liquid outlet assembly includes a pipe section and an anti-vortex component connected to one end of the pipe section. The other end of the pipe section is connected to the liquid outlet. The anti-vortex component is located inside the liquid phase region. The top of the anti-vortex component is closed and the side wall is provided with a flow hole. The anti-vortex component is configured to block the bubbles precipitated from the gas phase region and the liquid surface from entering the liquid outlet assembly.

[0007] Specifically, the reverse osmosis device has a high-pressure pump, and a configuration method for the above-mentioned semiconductor industry wastewater treatment system includes the following steps: The high-pressure pump suction head parameters and preset safety margin values ​​of the reverse osmosis unit are obtained to determine the height value of the liquid phase region; the preset spiral channel slope value and circumferential span value of the arc-shaped guide plate are obtained to determine the total vertical drop value of the arc-shaped guide plate, and the area with the total vertical drop value is defined as the vortex separation region; the remaining space in the shell is defined as the gas phase region; Obtain the rated drainage flow rate Q of the ultrafiltration device, and set the preset liquid film thickness δ for the fluid flowing on the arc-shaped guide plate; according to the formula W=k1×Q / (V L ×δ) determines the width W of the annular flow channel, and configures the distance between the arc-shaped guide plate and the inner wall of the shell according to the width W; where k1 is a correction coefficient, V L The tangential flow velocity V is a preset tangential flow velocity. L It is set to be greater than the minimum critical velocity required for the fluid to maintain its adherent flow to the wall; Introducing the Weber number W e As a criterion for gas-liquid disturbance, the formula is W e =(ρ g ×V rel 2 ×δ) / σ;where ρ g V is the density of the protective gas from the external gas source. rel Let W be the relative velocity between gas and liquid, and σ be the surface tension of the wastewater; select a Weber number W within a preset effective disturbance range. e The value is used to deduce the optimal airflow impact velocity V. gasimpact The lower limit of the effective disturbance range is the Weber number critical value at which ripples are generated on the liquid film surface, and the upper limit is the Weber number critical value at which droplets generate splashes. Establish a vertical distance mapping relationship between the positions of each nozzle of the gas distributor and the corresponding positions of the arc-shaped guide plate below. ,in The angular position along the circumferential direction; along the fluid flow direction, based on the vertical distance. As the diameter d of each nozzle increases, the calculated impact velocity of the airflow reaching the liquid film surface through each nozzle is maintained at the optimal airflow impact velocity V. gasimpact The central axis of each nozzle is configured to be inclined toward the direction of fluid flow, forming a counter-current injection angle.

[0008] The beneficial effects of the embodiments of the present invention are as follows: 1. Because a gas-liquid separation device with a specific structure is installed between the ultrafiltration unit and the reverse osmosis unit, the tangential inlet component, together with the flow guide component in the cyclone separation area, forces the ultrafiltration effluent to form a circumferential rotating downward flow within the shell. Centrifugal force is used to effectively separate and precipitate the large number of microbubbles and supersaturated gases mixed in by ultrafiltration gas scrubbing in the water. In addition, the scavenging component releases protective gas in the gas phase region to replace the precipitated harmful gases and reduce the dissolved oxygen concentration. At the same time, the anti-vortex component with a closed top and open side walls in the liquid outlet component physically prevents the bubbles accumulated in the gas phase region and the liquid surface from being entrained into the downstream pipeline. Therefore, it effectively solves the technical problems in the prior art, such as cavitation vibration of the downstream reverse osmosis high-pressure pump caused by bubbles and high concentration of dissolved oxygen in the ultrafiltration effluent, gas resistance on the reverse osmosis membrane surface, and membrane flux decline caused by oxidation and biofouling. Thus, it achieves the technical effects of significantly improving the operational stability of the reverse osmosis system, extending the service life of the high-pressure pump and reverse osmosis membrane components, and reducing the frequency of chemical cleaning and operating costs.

[0009] 2. By adopting a structural parameter configuration method based on fluid dynamics matching and gas-liquid coupling critical criteria, the width of the annular flow channel adapted to the rated flow rate is accurately calculated to ensure stable thin liquid film adhering to the wall. The Weber number is used to define the effective range of airflow disturbance to prevent splashing. In particular, by establishing a vertical distance mapping relationship, the nozzle orifice diameter is increased sequentially along the fluid flow direction as the guide plate drop increases, and the counter-current injection angle is configured. Therefore, the technical problems of insufficient airflow disturbance attenuation in the downstream region, easy splashing and mist entrainment in the upstream region, and uneven liquid film mass transfer efficiency throughout the entire process caused by the change of gas-liquid distance in the spiral flow channel separation device are effectively solved. This achieves uniform distribution and efficient utilization of airflow jet energy throughout the spiral descending flow channel, maximizes the shear renewal frequency of the gas-liquid interface while preventing droplet splashing and contamination of the gas phase, and significantly improves the deep precipitation rate of dissolved oxygen and the overall degassing effect of the system. Attached Figure Description

[0010] Figure 1 A schematic cross-sectional view of an ultrafiltration device and a gas-liquid separation device according to an embodiment of the present invention is shown.

[0011] Figure 2 A schematic structural view of a gas distributor according to an embodiment of the present invention is shown.

[0012] Figure 3 A schematic top sectional view of a gas-liquid separation device according to an embodiment of the present invention is shown.

[0013] Figure 4 A schematic structural view of a liquid dispensing assembly according to an embodiment of the present invention is shown.

[0014] Figure 5 A schematic cross-sectional view of a liquid dispensing assembly according to an embodiment of the present invention is shown.

[0015] Figure 6 A schematic structural diagram of a gas-liquid separation device according to an embodiment of the present invention is shown.

[0016] The components are: 1. Gas-liquid separation device; 110. Shell; 111. Gas phase region; 112. Swirl separation region; 113. Liquid phase region; 114. Exhaust port; 115. Liquid inlet; 116. Liquid outlet; 120. Tangential inlet assembly; 130. Flow guide assembly; 140. Scavenging assembly; 141. Gas distributor; 1411. Nozzle; 150. Liquid outlet assembly; 151. Pipe section; 152. Anti-vortex component; 1521. Flow hole. Detailed Implementation

[0017] The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and examples. The following examples are for illustrative purposes only and are not intended to limit the scope of the invention.

[0018] See Figures 1 to 6 This application provides a preferred embodiment of a semiconductor industry wastewater treatment system, which is suitable for the reduction and reuse of semiconductor wastewater containing fluorine, heavy metals, and grinding processes. Existing typical semiconductor wastewater reuse processes include: wastewater collection, chemical precipitation pretreatment (such as coagulation and flocculation), multi-media filtration, ultrafiltration, intermediate water tank, and reverse osmosis; the produced water is reused in cooling towers or used as raw water for pure water plants.

[0019] The semiconductor industry wastewater treatment system mainly consists of an ultrafiltration unit, a reverse osmosis unit, and a gas-liquid separation unit 1 connected in series between the two.

[0020] The gas-liquid separation device 1 includes a housing 110, a tangential inlet assembly 120, a flow guiding assembly 130, a scavenging assembly 140, and a liquid outlet assembly 150. The housing 110 internally defines an upper gas phase region 111, a middle cyclone separation region 112, and a lower liquid phase region 113. The outer side of the housing 110 is provided with an exhaust port 114 connected to the gas phase region 111, an inlet port 115 connected to the cyclone separation region 112, and an outlet port 116 connected to the liquid phase region 113. The inlet port 115 is connected to the product water end of the ultrafiltration device, and the outlet port 116 is connected to the inlet end of the reverse osmosis device. The tangential inlet assembly 120 is disposed at the inlet port 115 and configured to introduce fluid entering the housing 110 tangentially along the inner wall of the housing 110. The flow guiding assembly 130 is disposed inside the cyclone separation region 111 within the housing 110. In section 12, the flow guiding component 130 is arranged on the extension path of the outlet of the tangential inlet component 120 and is configured to guide the fluid to form a circumferential rotating downward flow on the inner wall of the housing 110; the scavenging component 140 includes a gas distributor 141 extending into the gas phase region 111, and the scavenging component 140 is configured to access an external gas source and release protective gas into the gas phase region 111 through the gas distributor 141; the liquid outlet component 150 includes a pipe section 151 and an anti-vortex member 152 connected to one end of the pipe section 151, and the other end of the pipe section 151 is connected to the liquid outlet 116. The anti-vortex member 152 is located inside the liquid phase region 113. The top of the anti-vortex member 152 is closed and a flow hole 1521 is opened on the side wall. The anti-vortex member 152 is configured to block the bubbles precipitated from the gas phase region 111 and the liquid surface from entering the liquid outlet component 150.

[0021] The housing 110 is a sealed structure, spatially divided into three functional areas: a gas phase area 111 at the top, used to contain the separated gas and injected protective gas; a cyclone separation area 112 in the middle, used for gas-liquid centrifugal separation; and a liquid phase area 113 at the bottom, used to store the degassed liquid. Three main process interfaces are provided on the outer wall of the housing 110: an exhaust port 114 connected to the gas phase area 111 for discharging the released gas; a liquid inlet 115 connected to the cyclone separation area 112, which is directly connected to the permeate end of the upstream ultrafiltration unit via a pipeline; and an outlet 116 connected to the liquid phase area 113, which is connected to the inlet end of the downstream reverse osmosis unit (typically connected to the high-pressure pump inlet) via a pipeline.

[0022] A tangential inlet assembly 120 is provided at the inlet 115. This assembly is configured to allow fluid flowing from the ultrafiltration device to be injected tangentially into the inner wall of the housing 110, thereby gaining initial rotational kinetic energy. A flow guide assembly 130 is provided in the swirling separation region 112 inside the housing 110. The flow guide assembly 130 is arranged on the extension path of the outlet of the tangential inlet assembly 120. Its shape and structure are adapted to the inner wall of the housing 110. It is configured to receive the tangentially injected fluid and guide it to form a downward circumferential rotating flow along the inner wall of the housing 110, thereby extending the path of the fluid in the separation zone and maintaining centrifugal force.

[0023] To control the gas phase environment, the device is equipped with a scavenging assembly 140, which includes a gas distributor 141 extending into the gas phase region 111 within the housing 110. The scavenging assembly 140 is configured to connect to an external inert gas source (such as nitrogen) and uniformly release a protective gas into the gas phase region 111 through the gas distributor 141 to cover the liquid surface. A liquid outlet assembly 150 is located within the liquid phase region 113 at the bottom of the housing 110. This assembly includes a pipe section 151 connected to a liquid outlet 116 and an anti-vortex member 152 installed at the inlet end of the pipe section 151. The anti-vortex member 152 is located below the liquid surface, and its top is designed as a closed structure with a flow hole 1521 formed on its sidewall. This structural configuration is used to physically prevent the gas in the gas phase region 111 and any foam or bubbles that may be present on the liquid surface from being directly drawn into the downstream pipe.

[0024] During operation, the permeate from the ultrafiltration unit enters the housing 110 at high speed through the inlet 115 and the tangential flow inlet assembly 120. Guided by the flow guiding assembly 130, the water flows down at high speed, closely adhering to the inner wall of the housing 110. Utilizing the centrifugal force generated by the gas-liquid density difference, the microbubbles entrained in the water move towards the center and rise to the gas phase region 111, while the degassed water flows down the wall into the liquid phase region 113. Simultaneously, the scavenging assembly 140 continuously introduces protective gas into the gas phase region 111, reducing the oxygen partial pressure in the gas phase, thereby disrupting the gas-liquid balance, promoting further precipitation of dissolved oxygen in the water, and preventing the re-dissolution of external air.

[0025] Specifically, when the upstream ultrafiltration unit performs air scrubbing or backwashing, the fluid state entering the gas-liquid separator 1 undergoes a drastic change, manifested as a sudden surge in flow rate and the inclusion of a large amount of high-density gas-water mixed foam in the water flow. Under this condition, the tangential inlet assembly 120 and the flow guide assembly 130 utilize the sudden increase in flow rate to generate stronger centrifugal force, forcibly throwing the gas-water mixture against the tank wall, thereby quickly breaking large air bubbles; the separated gas rises rapidly. Although the liquid surface may experience violent fluctuations or accumulate a thick layer of foam at this time, the outlet assembly 150 is equipped with an anti-vortex component 152. The closed top of this component acts like a shield, blocking the suction effect transmitted by the fluctuations in the liquid surface above, forcing the water flow to enter the outlet pipe smoothly only through the flow holes 1521 on the side wall. This ensures that even under the worst conditions of ultrafiltration backwashing, the water flow delivered to the downstream reverse osmosis unit remains a stable liquid flow free of air bubbles.

[0026] This system is specifically designed for wastewater treatment in semiconductor manufacturing plants. Given that semiconductor wastewater may contain corrosive substances (such as fluoride ions, acid and alkali residues), the housing 110 and internal components (flow guiding assembly 130, anti-vortex component 152) are typically made of corrosion-resistant materials, such as stainless steel or carbon steel with a special coating. This system is suitable for scenarios with strict requirements on dissolved oxygen content and where protection of the reverse osmosis high-pressure pump from cavitation is necessary. The operating environment typically requires ambient temperature, and the housing 110 is designed to withstand the residual pressure of the ultrafiltration permeate and the back pressure of the exhaust system.

[0027] In this embodiment, a gas-liquid separation device 1 with a specific structure is installed between the ultrafiltration device and the reverse osmosis device. Using the tangential inlet assembly 120 in conjunction with the flow guide assembly 130 within the cyclone separation zone 112, the ultrafiltration effluent is forced to form a circumferential rotating downward flow within the housing 110. Centrifugal force effectively separates and precipitates a large number of microbubbles and supersaturated gases mixed into the water by ultrafiltration gas scrubbing. Simultaneously, the scavenging assembly 140 releases protective gas in the gas phase zone 111 to replace the precipitated harmful gases and reduce the dissolved oxygen concentration. Meanwhile, the liquid outlet assembly 150 utilizes the top... The anti-vortex component 152, which is partially enclosed and has openings in the sidewalls, physically prevents bubbles accumulated in the gas phase region 111 and the liquid surface from being drawn into the downstream pipeline. Therefore, it effectively solves the technical problems in the prior art, such as cavitation vibration of the downstream reverse osmosis high-pressure pump caused by bubbles and high concentrations of dissolved oxygen in the ultrafiltration effluent, gas resistance on the reverse osmosis membrane surface, and membrane flux attenuation caused by oxidation and biofouling. This results in significantly improving the operational stability of the reverse osmosis system, extending the service life of the high-pressure pump and reverse osmosis membrane modules, and reducing the frequency of chemical cleaning and operating costs.

[0028] Furthermore, in some embodiments, see [link to relevant documentation]. Figure 3The flow guiding assembly 130 includes an arc-shaped flow guiding plate fixed to the inner wall of the housing 110 and extending along the circumferential direction of the housing 110. An annular flow channel is formed between the arc-shaped flow guiding plate and the inner wall of the housing 110, and the inlet end of the annular flow channel is directly opposite to the jet direction of the tangential flow inlet assembly 120. The lower edge of the arc-shaped flow guiding plate extends below the horizontal plane of the centerline of the tangential flow inlet assembly 120 and extends below the designed minimum liquid level of the liquid phase region 113.

[0029] The arc-shaped guide vane is typically made of metal or engineering plastic sheet with a certain rigidity and corrosion resistance, and its geometry is adapted to the curvature of the inner cylindrical surface of the housing 110. The arc-shaped guide vane is installed inside the housing 110 by welding or fastening with brackets, but it is not completely sealed. Instead, it maintains a preset distance from the inner wall of the housing 110, thereby forming an annular flow channel with a specific width between the inner surface of the guide vane and the surface of the inner wall of the housing 110.

[0030] The spatial layout of the annular flow channel is precisely designed, with the opening position and direction of its inlet end configured to face the jet direction of the tangential inlet assembly 120. This means that the velocity vector of the fluid ejected at high speed from the tangential inlet assembly 120 is smoothly connected in space to the tangential direction of the annular flow channel, without any obvious impact angle. In terms of vertical dimension design, the arc-shaped guide plate has a significant extension feature: its upper edge is usually higher than or flush with the inlet, while its lower edge extends downwards significantly. Specifically, the lower edge of the arc-shaped guide plate not only extends below the horizontal plane of the centerline of the tangential inlet assembly 120 to ensure complete reception of the lower half of the jet, but also extends further downwards until it is submerged below the designed minimum liquid level of the liquid phase region 113. This structure effectively forms a semi-enclosed spiral slide or vertical guide channel that spans from the gas phase space to the liquid phase space.

[0031] In actual operation, when a high-speed water flow carrying air bubbles is injected from the tangential inlet component 120, the water flow will not directly impact the wall of the housing 110 or fall directly to the liquid surface below. Instead, it will seamlessly cut into the annular flow channel formed by the arc-shaped guide plate and the inner wall of the housing 110. Due to the constraint of the annular flow channel, the water flow is forced into a flat liquid flow that adheres to the wall and rotates at high speed along the circumference of the housing 110 by its own tangential kinetic energy.

[0032] During this process, the arc-shaped guide vane restricts the radial diffusion of water flow towards the center of the shell 110, forcing the fluid to maintain high-intensity centrifugal motion, thereby maximizing the centrifugal force field for gas-liquid separation. Under the influence of gravity, the rotating water flow spirals downward along the annular channel. Since the lower edge of the arc-shaped guide vane extends below the designed minimum liquid level, the high-speed rotating water flow is ultimately released into the liquid phase region 113 below the liquid surface. This submerged release method avoids the violent turbulence and splashing caused by the water flow falling directly from a height and impacting the liquid surface, and prevents the gas in the gas phase space from being re-entrained into the water.

[0033] This structural design needs to be used in conjunction with a liquid level control system to ensure that the liquid level in the liquid phase region 113 always submerges the lower edge of the arc-shaped guide plate during normal operation, so as to maintain the liquid seal effect.

[0034] In this embodiment, because an arc-shaped guide plate fixed to the inner wall of the housing 110 and forming an annular flow channel is used, and the lower edge of the guide plate is specially configured to extend below the center line of the tangential inlet component 120 and below the lowest designed liquid level of the liquid phase region 113, the technical problems of low centrifugal separation efficiency caused by premature diffusion due to lack of constraint after tangential entry of fluid in the prior art, as well as splashing and secondary entrainment of gas caused by fluid directly falling and impacting the liquid surface, are effectively solved. Thus, while ensuring high-intensity centrifugal separation effect, the fluid is allowed to smoothly and splash-free enter the liquid phase region 113, significantly reducing the gas content of the separated liquid and eliminating the noise of water drop.

[0035] Furthermore, in some embodiments, see [link to relevant documentation]. Figures 1 to 2 The gas distributor 141 is constructed as an annular spray pipe, which is arranged along the inner circumference of the gas phase region 111. The annular spray pipe has a plurality of spray holes 1411, the opening direction of which is inclined towards the inner wall of the housing 110. Each spray hole 1411 is configured to form an annular air curtain in the gas phase region 111. The extension line of the central axis of each spray hole 1411 passes through the central region of the width of the annular flow channel.

[0036] The annular spray pipe is typically made of corrosion-resistant metal (such as stainless steel) or high-strength polymer material, and has a hollow, circular pipe structure. In its installation position, the annular spray pipe is horizontally arranged along the top inner periphery of the gas phase region 111 of the housing 110, and is fixed to the top or inner wall of the housing 110 by hangers or supports. A series of spray holes 1411 are uniformly formed along the circumference of the pipe wall. These spray holes 1411 are not vertically downwards, but are designed with a specific inclination angle, meaning their opening direction is inclined towards the inner wall of the housing 110.

[0037] To achieve precise alignment of the gas-liquid interface, the geometric orientation of the nozzles 1411 is strictly defined: the extension of the central axis of each nozzle 1411 precisely passes through the central region of the width of the annular flow channel below. This annular flow channel is the path along which the fluid rotates and flows along the inner wall of the casing 110, and its central region is typically the location where the liquid film flow is most stable and the thickness is most uniform. Depending on process requirements, the nozzles 1411 can be designed as simple drill holes, or precision atomizing nozzles or fan-shaped nozzles can be installed to control the diffusion pattern of the airflow.

[0038] During operation, external protective gas (such as inert gas) is pumped into the annular spray pipe, establishing a certain internal pressure. The gas is then ejected at high speed from several nozzles 1411 distributed along the circumference. Due to the angle of the nozzles 1411 towards the inner wall of the casing 110, the ejected airflow forms a series of jets radiating outward and downward. As the jets diffuse, the airflows ejected from adjacent nozzles 1411 overlap and merge in space, ultimately forming a continuous annular air curtain with a certain impact force at the edge of the gas phase region 111, close to the inner wall of the casing 110.

[0039] Because the central axis of nozzle 1411 passes through the central region of the annular flow channel, this annular air curtain can precisely cover and impact the rotating liquid surface diagonally below. The airflow directly strikes the center of the liquid flow, not only using its kinetic energy to sweep away the liquid surface and disrupt the boundary layer, but also rapidly displacing dissolved gases released from the liquid using the principle of pressure division. This directional airflow protective barrier acts like a flowing inert gas cap over the rotating water flow, effectively isolating any residual air in the space above.

[0040] In this embodiment, an annular spray pipe arranged along the inner circumference of the gas phase region 111 is used as a gas distributor 141, and the nozzles 1411 are configured to be inclined toward the inner wall of the housing 110 and their axial extension lines pass through the width center region of the annular flow channel, thereby forming a directional annular air curtain in the gas phase region 111. Therefore, the technical problems of uneven gas distribution leading to the inability of the protective gas to accurately cover the liquid flow surface and incomplete dissolved oxygen replacement due to contact dead angles in the prior art are effectively solved. This achieves all-round precise contact between the protective gas and the swirling liquid surface, significantly improving the dissolved gas precipitation efficiency while constructing an efficient physical isolation barrier to prevent secondary re-dissolution of the gas.

[0041] Furthermore, in some embodiments, see [link to relevant documentation]. Figure 5 Specific hydrodynamic parameters were defined for the design of the flow holes 1521 of the anti-vortex component 152 in the liquid outlet assembly 150. The total flow area of ​​all the flow holes 1521 was set to be 3 to 5 times greater than the cross-sectional area of ​​the pipe section 151.

[0042] The sum of the flow areas of all the flow holes 1521 on the sidewall of the anti-vortex component 152 (i.e., the total flow area) is strictly set to be 3 to 5 times larger than the cross-sectional area of ​​the vertical pipe section 151. This proportion is not arbitrarily selected, but is a key engineering parameter calculated based on the fluid continuity equation and local head loss. Structurally, this means that the opening ratio of the sidewall of the anti-vortex component 152 is high, or the overall size (diameter or height) of the anti-vortex component 152 is significantly enlarged compared to the outlet pipe diameter, thereby forming a hydraulic buffer chamber with a huge flow capacity around the outlet pipe inlet.

[0043] The core working principle of this structural design lies in using area difference to significantly reduce local flow velocity. According to fluid mechanics principles, under constant flow rate, flow velocity is inversely proportional to flow area. When fluid enters the internal pipe section 151 from the outside of the anti-vortex component 152 through the flow hole 1521 on the side wall, since the total area of ​​the flow hole 1521 is three to five times the cross-sectional area of ​​the pipe section 151, the average flow velocity of the fluid passing through the flow hole 1521 is only one-third to one-fifth of the flow velocity inside the pipe section 151.

[0044] This significant reduction in flow velocity plays a crucial role in handling backwashing or air scouring operations of the upstream ultrafiltration unit. When the ultrafiltration unit undergoes backwashing, the system influent flow rate experiences a sudden surge, causing drastic fluctuations in the liquid level of liquid phase region 113. If the area of ​​the flow-through orifice 1521 is small (e.g., comparable to the pipe diameter), the sudden increase in flow rate will cause a sharp rise in the flow velocity at the flow-through orifice 1521, generating a strong local negative pressure (Venturi effect). This can easily act like a "vacuum cleaner," forcibly drawing the foam layer or microbubbles at the gas-liquid interface above the anti-vortex component 152 into the pipe. In this embodiment, by expanding the flow area to three to five times, a safe influent zone with low flow velocity is effectively constructed. Even under conditions of sudden flow surge, the actual flow velocity at the flow-through orifice 1521 remains at an extremely low level. The water flows into the anti-vortex component 152 in a gentle, laminar flow rather than being injected, thus completely eliminating the kinetic energy basis for generating suction vortices from a hydraulic perspective.

[0045] In an optional embodiment, this three to five times increase in flow area can be achieved by adjusting the diameter of the flow holes 1521 or by increasing the number of flow holes 1521. The shape of the holes can be circular, elongated, or grid-like, as long as the total area meets the above-mentioned proportional requirements.

[0046] In this embodiment, by employing a technical means of setting the total flow area of ​​all flow holes 1521 on the anti-vortex component 152 to be three to five times greater than the cross-sectional area of ​​the pipe section 151, the technical problem in the prior art that the Venturi effect is generated due to the local flow velocity at the outlet caused by the sudden increase in upstream flow (such as in the case of ultrafiltration backwashing) is too high, thereby drawing air bubbles and foam from the liquid surface into the downstream pipe, is effectively solved. This achieves the technical effect of using a significantly reduced inlet flow velocity to form a hydraulic buffer, ensuring that the outlet water is a stable single-phase flow even when the liquid level fluctuates violently, and preventing air bubbles from causing cavitation damage to the downstream reverse osmosis high-pressure pump.

[0047] Furthermore, in some embodiments, see [link to relevant documentation]. Figure 1 Strict safety restrictions were placed on the vertical installation position of the anti-vortex component 152 in the liquid phase region 113 within the liquid phase assembly 150. The top position of the anti-vortex component 152 was configured to be at least 100 mm below the design minimum liquid level of the liquid phase region 113.

[0048] The top of the anti-vortex member 152 (i.e., the upper surface of its sealing cover) is configured to be below the design minimum liquid level of the liquid phase region 113, with the height difference between the two maintained at at least 100 mm. The design minimum liquid level here does not refer to the physical bottom of the housing 110, but rather to the limit threshold set in the control system for allowing the liquid level to drop, typically corresponding to the low liquid level control point where the liquid level sensor triggers pump stop protection or a water replenishment signal. Physically, this means that the anti-vortex member 152 is submerged below the liquid surface; even when the system liquid level reaches the allowable minimum limit, the top of the anti-vortex member 152 is still covered by a pure water protective layer with a thickness of at least 100 mm.

[0049] The core working principle of this position parameter setting is to ensure that the critical submersion depth is always met, so as to suppress the formation of free surface vortices using hydrostatic pressure. According to the principles of fluid mechanics, when the outlet at the bottom of the container is too close to the liquid surface, the suction effect of the water will form a funnel-shaped vortex on the liquid surface, causing air to be entrained. Especially in this system, when the upstream ultrafiltration unit is in backwashing or high-flow-rate water production mode, the flow velocity fluctuation will cause a significant increase in the turbulence intensity in the liquid phase region 113. If the anti-vortex component 152 is only just submerged in water, violent liquid surface fluctuations can easily expose the top of the anti-vortex component 152 instantly, or induce air-inhaling vortices penetrating the liquid layer due to a local decrease in dynamic pressure.

[0050] Setting a liquid level difference of at least 100 mm effectively creates a rigid hydraulic safety margin. This layer, at least 100 mm thick, provides sufficient hydrostatic pressure to effectively offset the dynamic pressure drop generated by the suction of the outlet water. Even in cases of detection lag by the liquid level sensor or significant surface swaying due to sudden changes in the influent flow rate, this safety water seal ensures that air bubbles or foam on the liquid surface cannot penetrate the water layer and enter the intake range of the anti-vortex component 152. This is crucial for protecting the downstream reverse osmosis high-pressure pump, as even a momentary air vortex can cause cavitation damage to the high-pressure pump.

[0051] In an optional embodiment, the 100 mm distance can be adjusted according to the actual outlet pipe diameter and flow rate. For large-diameter, high-flow-rate systems, this distance is typically designed to be larger (e.g., 150 mm or 200 mm). Furthermore, this minimum liquid level can be rigidly locked by setting a mechanical limit switch or a photoelectric level gauge; once the liquid level approaches the 100 mm threshold, the system will forcibly cut off the power to the outlet pump.

[0052] In this embodiment, by employing a technique where the top of the anti-vortex component 152 is positioned at least 100 millimeters below the design minimum liquid level in the liquid phase region 113, the technical problem in the prior art where insufficient critical submersion depth induces penetrating air-suction vortices due to lag in liquid level control or flow fluctuations caused by upstream ultrafiltration backwashing, resulting in gas instantly breaking through the liquid seal and entering the downstream pipeline, is effectively solved. This achieves the technical effect of maintaining a stable hydraulic seal layer under any extreme low liquid level conditions, eliminating air intake caused by liquid surface fluctuations or vortex entrainment, and ensuring the absolute continuity and pure phase of the high-pressure water intake of the reverse osmosis system.

[0053] Furthermore, in some embodiments, the gas-liquid separation device 1 is equipped with a complete atmosphere control and pressure maintenance subsystem. The gas-liquid separation device 1 also includes an inert gas source connected to the scavenging assembly 140, and a pressure regulating assembly connected to the exhaust port 114; the wastewater treatment system is configured to maintain the gas phase region 111 under positive pressure through the pressure regulating assembly, and to use the scavenging assembly 140 to displace dissolved oxygen and bubbles released from the cyclone separation region 112 and the liquid phase region 113.

[0054] The inert gas source is typically selected from a high-purity nitrogen generator, a liquid nitrogen storage tank, or a nitrogen delivery pipeline network. The inert gas source is physically connected to the inlet end of the scavenging assembly 140 via a gas supply pipeline, which is usually equipped with a flow meter and a pressure reducing valve to control the gas intake.

[0055] Simultaneously, a pressure regulating component is connected to the exhaust port 114 of the housing 110. This pressure regulating component is typically constructed as a high-precision back pressure valve, a micro-pressure regulating valve, or an automatic control loop consisting of a pressure sensor and an electrically operated regulating valve. This pressure regulating component is configured to monitor and regulate the absolute pressure within the gas phase region 111 of the housing 110. The entire wastewater treatment system integrates a central controller, which is logically programmed to coordinate the activation of the inert gas source with the opening degree of the pressure regulating component, thereby creating a dynamically balanced gas phase control environment.

[0056] During system operation, an inert gas source continuously injects inert gases such as nitrogen into the gas phase region 111 within the shell 110. According to Henry's Law, the solubility of a gas in water is directly proportional to its partial pressure at the gas-liquid interface. The injected inert gas creates an environment with low or even zero oxygen partial pressure above the liquid surface, disrupting the gas-liquid balance of dissolved oxygen in the water and forcing residual dissolved oxygen in the water to escape into the gas phase space at an accelerated rate.

[0057] In this process, the pressure regulating component plays a crucial role. It dynamically adjusts the opening of the exhaust port 114 according to a preset control strategy. When the pressure within the gas phase region 111 is lower than a preset positive pressure threshold, the pressure regulating component reduces or closes the exhaust channel, using continuously injected inert gas to build up pressure. When the pressure exceeds the threshold, the component opens moderately, expelling the displaced oxygen, entrained microbubble exhaust gas, and excess inert gas. This control logic consistently maintains the gas phase region 111 in a slightly positive pressure state (i.e., the internal pressure is slightly higher than the external atmospheric pressure), ensuring that the airflow direction is always from the inside out, thus physically constructing a one-way air shield.

[0058] In this embodiment, by employing an inert gas source connected to the scavenging assembly 140 in conjunction with a pressure regulating assembly connected to the exhaust port 114, and by maintaining the gas phase region 111 at a constant positive pressure through a control strategy and continuously replacing the released gas with flowing inert gas, the technical problems in the prior art, such as incomplete removal of dissolved oxygen due to high oxygen partial pressure in the gas phase space and backflow of oxygen-containing air from the outside polluting the water body due to instantaneous negative pressure caused by liquid level fluctuations, are effectively solved. This achieves the technical effect of deeply removing dissolved oxygen from wastewater using the principle of partial pressure and constructing a zero-oxygen positive pressure barrier to prevent secondary dissolution of oxygen, thereby significantly delaying the oxidative degradation and biological growth of the downstream reverse osmosis membrane.

[0059] The reverse osmosis unit includes a high-pressure pump. A method for configuring the aforementioned semiconductor industry wastewater treatment system includes the following steps: Step S100: Obtain the high-pressure pump suction head parameter and preset safety margin value of the reverse osmosis device to determine the height value of the liquid phase region 113; obtain the preset spiral flow channel slope value and circumferential span value of the arc-shaped guide plate to determine the total drop value of the arc-shaped guide plate in the vertical direction, and define the area with the total drop value as the vortex separation region 112; define the remaining space in the housing 110 as the gas phase region 111; Step S200: Obtain the rated drainage flow rate Q of the ultrafiltration device, and set the preset liquid film thickness δ for the fluid flowing on the arc-shaped guide plate; according to the formula W=k1×Q / (V L ×δ) determines the width W of the annular flow channel, and configures the distance between the arc-shaped guide plate and the inner wall of the housing 110 according to the width W; where k1 is a correction coefficient, V L The tangential flow velocity V is a preset tangential flow velocity. L It is set to be greater than the minimum critical velocity required for the fluid to maintain its adherent flow to the wall; Step S300: Introduce the Weiber number W e As a criterion for gas-liquid disturbance, the formula is W e =(ρ g ×V rel 2 ×δ) / σ;where ρ g V is the density of the protective gas from the external gas source. rel Let W be the relative velocity between gas and liquid, and σ be the surface tension of the wastewater; select a Weber number W within a preset effective disturbance range. e The value is used to deduce the optimal airflow impact velocity V. gasimpact The lower limit of the effective disturbance range is the Weber number critical value at which ripples are generated on the liquid film surface, and the upper limit is the Weber number critical value at which droplets generate splashes. Step S400: Establish a vertical distance mapping relationship between the positions of each nozzle 1411 of the gas distributor 141 and the corresponding positions of the arc-shaped guide plate below. ,in The angular position along the circumferential direction; along the fluid flow direction, based on the vertical distance. As the diameter d of each nozzle 1411 increases, the calculated impact velocity of the airflow ejected through each nozzle 1411 when it reaches the liquid film surface is maintained at the optimal airflow impact velocity V. gasimpact The central axis of each nozzle 1411 is configured to be inclined toward the direction of fluid flow, forming a counter-current injection angle.

[0060] Specifically: Step S100 is used to construct the longitudinal space of the internal region of the shell 110 and divide the model, wherein: The method for determining the height value of liquid phase region 113 is as follows: First, determine the suction head parameters of the high-pressure pump. This can be done by referring to the "Product Technical Specifications" or "Performance Curve Chart" of the high-pressure pump that is matched with the selected reverse osmosis unit. Specifically, you need to obtain the required net positive suction head (NPSH) of the pump at the rated operating flow rate. This parameter is determined by the pump manufacturer through experiments and represents the minimum energy head that the fluid at the pump inlet must have to exceed the saturated vapor pressure in order to prevent cavitation inside the pump.

[0061] Secondly, a preset safety margin value is determined. The preset safety margin value is determined based on pipeline hydraulic losses and engineering experience. This value usually consists of two parts: the first part is the pipeline resistance loss, which is the sum of the frictional resistance and local resistance of the pipes, valves and elbows from the outlet 116 of the gas-liquid separator 1 to the suction port of the high-pressure pump; the second part is the engineering safety margin, which is usually taken as 0.5 meters to 1.0 meters of water column, to compensate for the fluctuation error of the liquid level sensor and to prevent eddy air intake under critical conditions.

[0062] in: Pipeline resistance loss includes the sum of frictional resistance and local resistance of the pipes, valves, and elbows between the outlet 116 of the gas-liquid separator 1 and the inlet of the high-pressure pump, denoted as [missing information]. The Darcy formula from fluid mechanics, combined with the local drag coefficient method, needs to be used for calculation.

[0063] The specific steps are as follows: Friction resistance calculation: According to the formula calculate.

[0064] in, The friction factor is obtained from the Modi plot based on the pipe material roughness and Reynolds number. The total length of the straight pipe section is 151. The inner diameter of the pipe. The average flow velocity inside the pipe, This is the acceleration due to gravity.

[0065] Local resistance calculation: Count the number of all elbows, tees, reducers and valves (fully open) in the pipeline.

[0066] Determine the corresponding local resistance coefficients according to the "Hydraulic Calculation Handbook" or valve manufacturer parameters. And according to the formula Calculate the total local resistance.

[0067] Sum of total resistance: [The above] and Adding them together gives the total head loss of the pipeline system, which is the pipeline resistance loss.

[0068] The method for determining the engineering safety margin (0.5m to 1.0m) is not arbitrary, but rather an empirical value determined based on the centrifugal pump suction side design specifications and the critical submersion depth theory.

[0069] The basis for this determination is as follows: To counteract liquid level fluctuations: Considering that a sudden increase in flow rate during ultrafiltration backwashing can cause dynamic waves on the liquid surface, with the height difference between the peak and trough potentially reaching 200-300mm, a margin needs to be reserved.

[0070] Coverage sensor dead zone: Industrial liquid level sensors (such as hydrostatic or ultrasonic sensors) usually have a measurement blind zone or hysteresis error, typically 100-200mm.

[0071] Preventing the intake of eddies: based on the empirical formula for critical submersion depth ( Where D is the pipe diameter and Fr is the Froude number, in order to prevent the formation of penetrating suction vortices on the liquid surface, an additional safety water depth is required beyond the theoretical calculation value.

[0072] Taking into account the above factors, a lower limit of 0.5m is adopted for systems with low flow rates (<1m / s) and short pipelines; and an upper limit of 1.0m is adopted for systems with high flow rates (>1.5m / s) or drastic liquid level fluctuations.

[0073] The height value of liquid region 113 ( It should at least include the minimum design liquid level and the effective volume height.

[0074] First, the minimum liquid level height should be calculated ( ): .

[0075] The formula for the minimum liquid level height is an engineering application formula derived from the standard definition of effective net positive suction head (NPSH) in fluid mechanics, and is considered common knowledge. The original formula can be found in the chapter on pump cavitation in the *Pump Handbook* or *Fluid Mechanics* textbook. The standard formula is: Derivation process: To ensure the pump does not cavitate, it is required that... In this system, it is assumed that the pressure in the gas phase region 111 is atmospheric pressure or slightly positive pressure. And neglecting the saturated vapor pressure of water at room temperature ( (If the value is small, it is used as an additional safety factor), then the static pressure head (i.e., here) Pipeline losses must be overcome. And provide the pump required To ensure reliability, an additional engineering safety margin is added.

[0076] Secondly, the required height for the effective volume is calculated based on the buffer time required by the system (e.g., a water production buffer of 1 to 2 minutes) and the cross-sectional area of ​​the shell 110.

[0077] The calculation method for the required height of the effective volume is based on the time integral relationship between volume and flow rate. The specific calculation steps are as follows: Obtain parameters to determine the influent flow rate of the reverse osmosis unit. (unit: ), set buffer time (e.g., 1 / 60 of an hour, or 1 minute), and the inner cross-sectional area of ​​the liquid phase region 113 of the shell 110. (unit: ).

[0078] Calculate the buffer volume: .

[0079] Calculate the height: based on the formula for the volume of a cylinder. The effective volume height is obtained. Example: If the RO inlet flow rate is... Buffer for 1 minute (required) (Water), shell 110, diameter 1 meter (area approximately) ), then the required buffer height rice.

[0080] Finally, by superimposing the two above, the minimum total height required for the liquid phase region 113 in the vertical direction of the shell 110 is determined, which serves as the basis for defining the height value of the liquid phase region 113.

[0081] The method for determining the height value of the cyclone separation region 112 is as follows: First, the preset parameters for the arc-shaped air deflector are obtained, including: Spiral channel slope value ( The slope value is preset based on fluid dynamics simulations or empirical data and is defined as the angle between the tangent direction of the arc-shaped guide vane and the horizontal plane. To ensure that the fluid can slide smoothly without accumulating liquid and maintain sufficient rotational residence time, this slope value is usually obtained as a fixed value between 5 and 15 degrees.

[0082] The selection mechanism for slope values ​​of 5 to 15 degrees is based on the balance between the mechanics of inclined plane sliding and the residence time of gas-liquid separation.

[0083] The lower limit of 5 degrees is based on the fact that the angle of repose of water on a smooth stainless steel surface, or the minimum drainage slope, is usually very small (approximately 1 to 2 degrees). 5 degrees is chosen to ensure that the component of gravity along the inclined plane (…) The frictional resistance between the fluid and the plate surface is significantly greater than that between the fluid and the plate surface. This ensures that no water remains on the board when the machine is stopped and drained, thus preventing the growth of bacteria.

[0084] The basis for the 15-degree upper limit (to ensure residence time) is that the greater the slope, the faster the vertical velocity of the fluid descends, the shorter the spiral path length on the plate surface, and the shorter the residence time for gas-liquid separation. Fluid dynamics experiments show that when the slope exceeds 15 degrees, the fluid tends to slide down rapidly rather than rotate, leading to a sharp decrease in centrifugal separation efficiency. Conclusion: 5 degrees to 15 degrees is the optimal engineering range for ensuring gravity-flow drainage and maximizing the separation path.

[0085] It should be noted that the aforementioned fluid dynamics experiments were conducted by the inventors of this application through comparative model experiments with different spiral channel slopes. The results showed that the separation efficiency of the fluid on the guide plate mainly depends on the product of the centrifugal separation factor and the hydraulic residence time. Experimental data showed that when the spiral channel slope exceeds 15 degrees, the component of gravity along the tangential direction of the channel increases significantly, leading to a sharp increase in the axial velocity of the fluid and a nonlinear decay of the hydraulic residence time. The fluid exhibits a rapid sliding rather than fully swirling flow pattern, resulting in insufficient time for microbubbles to overcome liquid film resistance and precipitate. Conversely, when the slope is less than 5 degrees, the fluid velocity is too low to generate sufficient centrifugal force and easily leads to liquid accumulation during shutdown. Therefore, based on fluid dynamics experimental verification, this embodiment limits the spiral channel slope to the optimal range of 5 to 15 degrees.

[0086] The above fluid mechanics experiments can be conducted according to the following steps: First, the experimental setup is constructed, including: Model construction: Build a cylindrical shell 110 (inner diameter D=500mm) made of transparent acrylic material, and install a detachable and replaceable arc-shaped guide plate model inside.

[0087] Variable settings, prepare 5 sets of different spiral slopes ( The guide vanes have slopes of 3°, 10°, 15°, 20°, and 30°. The circumferential span of all guide vanes is fixed at 270°, and the channel width W is fixed at 100mm.

[0088] Fluid operating conditions: Dissolved air water (simulating ultrafiltration backwash water) is used, with a constant influent flow rate. The gas content (by volume) in the influent is adjusted to 5%.

[0089] Observation equipment: High-speed cameras are configured to capture the liquid flow trajectory; online dissolved oxygen meters (DO meters) and bubble counters are configured to detect effluent indicators.

[0090] Secondly, the specific experimental steps include: Step 1: Install guide vanes with different slopes in sequence; Step 2: Turn on the inlet pump and wait for the flow to stabilize. Then, inject a pulse tracer (such as red ink or salt water) into the inlet water and use a high-speed camera to record the actual residence time required for the fluid to flow from the inlet to the liquid surface. Step 3: Observe and record the fluid flow's adherence to the guide plate. Pay special attention to whether slippage (i.e., the fluid breaks away from the spiral path and flows directly downwards) or splashing occurs; Step 4: Collect effluent samples after separation, measure the number of residual bubbles and dissolved oxygen concentration, and calculate the gas-liquid separation efficiency. ).

[0091] Next, the experimental results and data were analyzed, including: The experimental data are recorded below (inductive description): Group A (slope 3°): Fluid flow rate is extremely slow, and centrifugal force is insufficient. The fluid accumulates and spreads on the plate surface, failing to form a stable swirling liquid film, and drainage is difficult. Conclusion: The slope is too small.

[0092] Group B (slope 10°) and Group C (slope 15°): The fluid formed a perfectly adherent liquid film with uniform thickness (approximately 3-5 mm). High-speed photography showed that the tracer moved along a strictly spiral path, with no obvious longitudinal slippage. The fluid residence time on the plate was sufficiently long ( The bubbles have ample time to drift towards the center and precipitate under centrifugal force. The bubble removal rate reaches its peak (>95%).

[0093] Group D (slope 20°) and Group E (slope 30°): Slippage occurred. High-speed photography shows the component of gravity acting on the fluid along the slope. The longitudinal velocity component of the fluid particles increases significantly. The rapid increase in [something] causes the fluid to no longer move strictly along a spiral path, but instead exhibits a tendency to slide rapidly with a large pitch. The actual residence time decreases significantly. Due to time It is a key variable in bubble separation. Insufficient time means that microbubbles are carried into the lower liquid phase before they can reach the gas-liquid interface. The bubble removal rate drops sharply to below 60%.

[0094] Then, based on the above comparative experiments, it can be seen that: When the slope At this time, the fluid is mainly dominated by tangential inertial force, which can maintain a long-path spiral flow, and the time and space utilization of gas-liquid separation is the highest.

[0095] When the slope At this point, the component of gravity along the inclined plane begins to dominate the flow field, and the fluid tends to slide down quickly rather than rotate, resulting in insufficient effective centrifugal separation time.

[0096] Therefore, 5° to 15° was determined as the critical parameter range that balances gravity-flow drainage and efficient separation.

[0097] Circumferential span value ( This value depends on the range of angles at which the guide vane extends along the circumference of the inner wall of the housing 110. It is preset according to the requirements of preventing airflow short-circuiting and ensuring the length of the separation path, for example, 270 degrees (i.e., Spend).

[0098] The method for presetting the circumferential span value (e.g., 270 degrees) is not arbitrary, but is based on the following: To prevent airflow short-circuiting: the gas after gas-liquid separation needs to rise. If the guide vanes rotate more than 360 degrees (i.e., overlapping head-to-tail), the bubbles precipitated in the lower layer will be blocked by the upper guide vanes during their ascent, and will accumulate below the vanes to form large bubbles, disrupting the flow field. The default is less than 360 degrees (e.g., 270 degrees), leaving a 90-degree fan-shaped notch in the planar projection as a vertical channel for the rising gas phase.

[0099] Ensuring a stable separation path: The rotation angle must be large enough to establish a stable centrifugal force field. The fluid typically needs to rotate more than half a turn (180 degrees) to stabilize the velocity distribution. 270 degrees provides approximately 3 / 4 of a turn, representing a balance between separation efficiency and gas flow path.

[0100] 110 inner diameter of the shell ( ): Obtain the inner diameter value of the designed shell 110.

[0101] Secondly, the total vertical drop of the arc-shaped guide vane is calculated.

[0102] The calculation is based on the principle of spiral geometry. The spiral-shaped guide vane is unfolded along the inner wall of the shell 110 into a planar right-angled triangle, where one leg is the length of the corresponding arc and the other leg is the vertical drop. The specific calculation formula is as follows: .

[0103] Among them, the arc length .

[0104] By substituting the preset parameters into the above formula, the total vertical drop of the arc-shaped guide vane from the inlet to the outlet can be accurately calculated. ).

[0105] in, This is based on the fundamental mathematical formula of the spiral development property of a cylinder in Euclidean geometry, belonging to well-known mathematical principles. The geometric principle is that when a cylinder is unfolded along its generatrix into a plane, the spiral on the cylinder unfolds into the hypotenuse of a right triangle. The base of the triangle equals the length of the arc. (i.e., horizontal projection distance). The included angle of the triangle = spiral slope. The opposite side (height) of a triangle equals the vertical drop. In a right triangle, Rearranging the terms yields: .

[0106] Next, the swirl separation region 112 is defined.

[0107] After calculating the total drop value ( After that, considering the installation process requirements, a small amount of structural clearance space (e.g., 50-100mm each) is usually reserved above (inlet 115 area) and below (between the end of the guide plate and the liquid surface) the total drop value. The sum of the total drop value and these necessary structural clearance spaces is defined as the longitudinal height of the swirling separation area 112 in the middle layer of the shell 110.

[0108] Therefore, by following the above steps, the vertical dimensions of each functional area inside the shell 110 can be accurately determined during the design phase, ensuring that the physical structure meets the hydraulic performance requirements.

[0109] When performing step S200 to determine the key structural parameters of the annular flow channel, the specific parameter acquisition, calculation basis, and configuration implementation methods are as follows: First, regarding the method for obtaining the rated drainage flow rate Q of the ultrafiltration unit, the rated drainage flow rate Q is the source parameter for this system design, and its acquisition method mainly relies on the equipment's technical documentation. Those skilled in the art should consult the "Product Technical Specifications," "Equipment Nameplate," or "Operation Manual" provided by the upstream ultrafiltration (UF) unit manufacturer. Specifically, this flow rate Q typically refers to the instantaneous maximum design flow rate of the ultrafiltration unit under backwashing or air scouring conditions. If the technical documents only provide the design flux of a single membrane module and the number of membrane modules, then it needs to be obtained through calculation: After obtaining this value, it is usually necessary to multiply it by an engineering fluctuation coefficient (such as 1.1) to cover the flow pulsation of the pumping system, so as to obtain the final rated drainage flow rate Q used for calculation.

[0110] Secondly, regarding the method for determining the preset liquid film thickness δ, the preset liquid film thickness δ is not arbitrarily selected, but rather an empirically designed value based on the "thin-film fluid mass transfer theory." The basis for this determination is that during gas-liquid separation, the thinner the liquid film, the shorter the path for microbubbles inside the fluid to move to the gas-liquid interface, resulting in higher separation efficiency. However, if the liquid film is too thin, it is prone to rupture due to surface tension, forming a dry zone, which prevents the fluid from covering the entire guide plate. Specifically, for semiconductor wastewater (typically with a viscosity close to room temperature water), to balance high mass transfer efficiency and continuous flow stability, the preset liquid film thickness δ is usually selected within the range of 3mm to 8mm. In the preferred configuration of this embodiment, to cope with the impact of large backwash flow rates, it is recommended to set δ to 5mm as the standard calculation benchmark.

[0111] The thin-film fluid mass transfer theory mentioned in this embodiment is essentially an engineering expression of the classical two-film theory applied to a falling film flow hydraulic model. The two-film theory posits the existence of stable gas and liquid films between the gas and liquid phases, with mass transfer resistance primarily concentrated in these two films. In this system, the core of the invention lies in utilizing the centrifugal force generated by swirling flow to stretch a thick water layer into a thin liquid film. According to the two-film theory, the mass transfer rate... By controlling the fluid into a thin film, the specific surface area of ​​the gas-liquid contact is greatly increased. On the other hand, the surface ripples generated by the thin film flow accelerate the renewal of the liquid film surface, increasing the liquid-side mass transfer coefficient kL. Therefore, the design of this embodiment is based on the enhanced mass transfer mechanism of the two-film theory under thin liquid film conditions.

[0112] The specific method for determining the preset liquid film thickness δ (3mm-8mm) is not an arbitrary selection of 3mm to 8mm, but rather based on the balance between minimum wetting rate and effective mass transfer depth. The specific determination steps are as follows: Step 1: Determine the lower limit (to prevent dry zone formation). Based on the principle of minimum wetting rate, to prevent the liquid film from rupturing under surface tension and forming dry zones, leading to localized failure of the guide vane, the minimum thickness needs to be calculated. For the combination of stainless steel surfaces and water, empirical formulas indicate that the Reynolds number Re needs to be greater than a certain critical value to ensure continuous coverage. In engineering practice, the minimum empirical thickness to ensure complete fluid coverage of the surface is typically around 2 mm. Considering the possible minor unevenness and processing tolerances on the guide vane surface, the engineering lower limit is set at 3 mm.

[0113] Minimum wetting rate is a core physical concept in falling film flow heat and mass transfer processes. It refers to the minimum unit width mass flow rate (or volumetric flow rate) required to maintain a continuous and complete liquid film flow on a solid wall surface. When the liquid flow rate falls below this critical value, the contraction effect of the liquid surface tension exceeds the spreading effect of gravity or shear force, causing the originally continuous liquid film to rupture and shrink into several independent thin streams or droplets, resulting in exposed dry areas on the solid wall surface. In the arc-shaped guide plate of this invention, if the flow rate is below the minimum wetting rate, the guide plate cannot be completely covered by the water flow, leading to a significant reduction in the gas-liquid separation area, and the unwetted areas are prone to fouling. Therefore, determining the minimum wetting rate is the theoretical basis for setting a preset lower limit for the liquid film thickness.

[0114] The source and content of the empirical formula (Reynolds number criterion) for stainless steel surface wetting: The empirical formula mentioned here is a commonly used liquid film stability criterion in the field of chemical engineering when designing falling film evaporators or packed towers. This criterion is usually based on the relationship between the Reynolds number (Re) and wetting performance. Such formulas and data are widely documented in the *Perry's Handbook of Chemical Engineers* and related monographs on falling film flow. The formula content is as follows: The Reynolds number for liquid film flow is defined as: .

[0115] in: (Gamma) is the mass flow rate per unit area wetted ( The calculation formula is: (In the simplified model of this embodiment); The dynamic viscosity of the liquid ( ); The density is the liquid density.

[0116] Empirical criterion: For the flow of room temperature water on the surface of industrial stainless steel (determined by a certain contact angle), engineering experimental data show that: when At this time, the liquid film is in laminar flow and is extremely prone to rupture, making it impossible to maintain full wetting; when At this time, the liquid film is in a transitional state, and a dry area may appear; when When the liquid film enters a turbulent or wave-like laminar flow state, the inertial force is sufficient to overcome the surface tension, ensuring complete wetting of the surface.

[0117] Based on the aforementioned well-known experience, the following is set: As a safety threshold. Substituting into the Reynolds number formula, we can deduce the corresponding minimum mass flow rate. Combined with flow rate This allows us to calculate the minimum liquid film thickness required to ensure complete wetting (i.e., the engineering lower limit of approximately 2-3 mm mentioned earlier).

[0118] Step Two: Determine the Upper Limit (to ensure mass transfer efficiency). According to permeation theory or surface renewal theory, the effective depth of dissolved gas diffusion from the bulk liquid phase to the liquid interface is limited. If the liquid film is too thick (e.g., exceeding 10 mm), the surface disturbance experienced by the deep fluid (bottom fluid) near the guide plate wall is minimal, forming a mass transfer dead zone, making it difficult for dissolved oxygen to diffuse to the surface for precipitation. Fluid dynamics experiments and simulations show that, under swirling flow conditions, 8 mm is the upper limit of the effective thickness that can maintain full-layer turbulence and ensure that the deep fluid can be entrained to the surface.

[0119] Step 3: Comprehensive Determination Based on the above, a range of 3mm (lower safety limit for coverage) to 8mm (upper effective mass transfer limit) is selected as the preferred range for the preset liquid film thickness δ. In the calculation of step S200, in order to cope with the flow fluctuations caused by ultrafiltration backwashing (the film thickness will temporarily increase when the flow rate increases), an intermediate value (such as 5mm) is usually taken as the baseline calculation value.

[0120] Next, the formula It is a general physical formula derived from the classical continuity equation in fluid mechanics, belonging to well-known physical principles. The derivation process involves flow rate. Among them, the cross-sectional area of ​​the annular flow channel. The theoretical width is obtained after deformation. Introducing a correction factor Later it became an engineering formula: .

[0121] The correction factor k1 is used to compensate for the boundary layer effect and frictional resistance of the fluid within the flow channel. Because the fluid velocity near the guide plate and the inner wall of the casing 110 is lower than the average velocity, the actual effective flow capacity is less than the theoretical value. Specifically, k1 is determined based on the surface roughness of the guide plate material. For polished stainless steel surfaces, k1 is typically taken as 1.05 to 1.1; for unpolished industrial steel plates or plastic surfaces, k1 is typically taken as 1.1 to 1.2. Those skilled in the art can consult the roughness coefficient table in the *Hydraulic Calculation Handbook* for fine-tuning.

[0122] Tangential flow velocity V L The method for determining its minimum critical velocity is as follows: In the calculation of the minimum critical velocity, in order to ensure that the fluid can overcome gravity and flow tightly against the inner wall of the shell 110 without falling during rotation, the centrifugal force must be satisfied. The conditions for gravity. According to physical formulas. The minimum critical velocity can be obtained. ,in The acceleration due to gravity ( ), The inner radius of the shell is 110.

[0123] Preset tangential flow rate ( Determining the tangential flow rate: To achieve efficient gas-liquid separation, simple wall adhesion is insufficient; a strong centrifugal field must be generated (typically requiring centrifugal acceleration several times that of gravity). Therefore, a preset tangential flow rate is usually set... Set to 2 to 4 times the minimum critical velocity. Example: If the shell has a radius of 110... ,but During the design process, Can be set to to between.

[0124] The reason for setting the tangential flow velocity to 2 to 4 times the minimum critical velocity is based on the calculation results of the separation factor. The specific determination method is as follows: Step 1: Calculate the minimum critical velocity As mentioned earlier, the physical condition for fluid not to fall is that the centrifugal force is at least equal to the gravity (i.e., the separation factor). The formula is: At this speed, the fluid barely adheres to the wall, and the buoyancy (centripetal force) on the bubbles is equivalent to gravity, resulting in extremely low separation efficiency.

[0125] Step 2: Introduce the separation factor Set the target. Gas-liquid separation efficiency depends on the rising velocity of the bubbles in the liquid, and the rising velocity is proportional to the acceleration. In a swirling flow field, centrifugal acceleration... Define the separating factor. .when hour, (The effect is the same as gravity settling, but without any enhancement). In order to achieve enhanced degassing, industrial applications typically require the centrifugal field strength to be at least 4 to 16 times that of the gravitational field.

[0126] Among them, the separation factor It is a dimensionless parameter used in centrifugal separation technology (cyclones, centrifuges) to measure the intensity of the separation field. In a gravity settling tank, the driving force for the rising of bubbles or the settling of particles is gravitational acceleration. In a hydrocyclone separator, the driving force is the centrifugal acceleration generated by rotation. To intuitively quantify how many times greater the separation capacity of a hydrocyclone is compared to a conventional gravity settling tank, the ratio of these two accelerations is defined in engineering as the separation factor. According to Newtonian mechanics, the centrifugal acceleration produced by a fluid undergoing circular motion... .in, It is the tangential linear velocity; Let be the radius of rotation. Substituting this into the ratio formula, we get:

[0127] when At this point, the centrifugal force generated by rotation is equivalent to gravity. At this time, the fluid is in force equilibrium on the vertical wall, and the bubble separation rate is the same as in a static water tank, with no enhancing effect. When the centripetal buoyancy (the force used for separation) on the bubble is four times that of its natural buoyancy in still water, this means that the bubble's rising and separation speed is theoretically increased by four times, or that for bubbles of the same size, the residence time required for separation is reduced to one-quarter of the original. Therefore, this invention sets the tangential flow velocity... Critical velocity (i.e., corresponding to) The speed is 2 to 4 times that of the separation factor, which is essentially a reduction in the separation factor. Set as to ,Right now to This is an engineering-proven golden range that can significantly improve degassing efficiency while keeping energy consumption under control.

[0128] Step 3: Calculate the multiple relationship. If the separation factor is required... (i.e., a separation effect of 4 times gravity), then: If the separation factor is required... (That is, a separation effect of 16 times that of gravity, which belongs to high-efficiency centrifugation), then: .

[0129] Step 4: Determine the final range. Therefore, the tangential flow velocity... Set as The ratio of 2 to 4 times essentially ensures that the centrifugal separation intensity generated by the system reaches 4G to 16G. Below 2 times (<4G), the improvement in separation efficiency is not significant, and microbubbles cannot be removed. Above 4 times (>16G), fluid resistance increases sharply, energy consumption is excessive, and it may lead to severe shear emulsification, which is actually detrimental to bubble aggregation. Therefore, 2 to 4 times is based on the separation factor. The optimal engineering flow rate range was derived.

[0130] Finally, after calculating the width W of the annular flow channel, the arc-shaped guide vane is positioned using physical mechanical installation methods, as follows: The positioning reference is the cylindrical inner wall surface of the housing 110 as the installation reference surface.

[0131] Radial dimension control: the radius of curvature of the arc-shaped guide vane should be designed as follows: That is, the outer surface radius of the deflector is equal to the inner radius of the shell 110 minus the calculated width W.

[0132] For fixed-distance connections, fabricate several fixed-distance support columns or L-shaped mounting brackets with a length precisely equal to the width W. Weld or bolt these fixed-distance components between the inner wall of the housing 110 and the arc-shaped guide plate. During installation, use calipers or templates to verify the vertical distance between the guide plate and the inner wall of the housing 110 at various points along the circumference, ensuring that this distance always remains at the calculated width W, thereby constructing a precise annular flow channel in the physical entity.

[0133] The reason for introducing the Weber number in step S300 is that, in the gas-liquid separation device 1, the impact of the protective gas on the liquid film is a double-edged sword. If the impact force is too small, the airflow merely slides across the liquid surface, failing to disrupt the laminar boundary layer on the liquid film surface, preventing the replacement of dissolved oxygen in the deeper layers and resulting in low degassing efficiency. If the impact force is too large, the airflow will tear the liquid film, generating tiny droplet splashes (mist entrainment). These salt-containing droplets, if carried into the exhaust port 114 by the gas, will cause pollution, or splash into the gas phase region 111, causing turbulence. Therefore, it is necessary to find a balance point that can generate strong surface ripple disturbances without causing splashing. In fluid mechanics, the Weber number is a dimensionless criterion that measures the relative magnitude of fluid inertial force (destructive force) and surface tension (restoring force), and is therefore introduced as the core criterion for this step.

[0134] formula Based on the general definition of the classical Weber number in fluid mechanics The engineering adaptation formula is specific to this application scenario. In the general formula... The characteristic length is used. In the falling film flow model of this invention, the key measure for whether the liquid film can remain stable is the liquid film thickness; therefore, the liquid film thickness determined in the previous step is selected. As feature length This formula conforms to the basic principles of fluid mechanics. The specific methods for obtaining each parameter in the formula are as follows: (Density of protective gas from external gas source): Refer to the "Gas Property Table" based on the type of inert gas selected (usually nitrogen) and the operating temperature and pressure of gas phase region 111. Example: Nitrogen density at room temperature and pressure. .

[0135] (Surface tension of wastewater): Refer to a physicochemical handbook based on the wastewater's temperature and main components. For semiconductor wastewater, if there is no large amount of surfactant, the surface tension value of water at room temperature is usually approximated. Example: Surface tension of water at 20℃ .

[0136] (Feature length): The preset liquid film thickness value (e.g., 0.005m) is directly used as set and calculated in step S200.

[0137] (Gas-Liquid Relative Velocity): This refers to the difference between the velocity vector of the airflow impact and the velocity vector of the liquid surface. Since the airflow velocity is usually much greater than the liquid velocity in design... Furthermore, in the preferred embodiment of this method, counter-current injection is used, resulting in the highest relative velocity. The calculation is simplified in the preliminary design calculations; to simplify the model, it is typically approximated as... (i.e., airflow impact velocity).

[0138] The effective perturbation range in step S300 is derived from the Kelvin-Helmholtz instability theory and experimental data on flow pattern conversion in gas-liquid two-phase flow.

[0139] The lower limit (critical value for ripple generation) occurs when the dynamic head generated by the airflow exceeds the surface tension constraining the liquid surface, causing capillary waves to begin to form on a smooth liquid surface. According to fluid mechanics literature (such as *Multiphase Fluid Mechanics*), for the air-blown liquid film model, this critical Weber number is... The value is typically between 2.0 and 3.0. Below this value, the liquid surface is as calm as a mirror, with no surface renewal effect.

[0140] The upper limit (critical value for splashing) occurs when the inertial force of the airflow becomes too great, overcoming the viscous force and surface tension of the fluid, causing the liquid wave to break up and form droplets. Based on engineering experience and experiments, the critical Weber number for splashing in thin liquid films is... It is usually between 10.0 and 12.0.

[0141] Based on the above theoretical range and in conjunction with a safety factor, designers can define the preset effective disturbance range for this system as follows: Where 2 is the lower limit to ensure wave initiation; and 10 is the upper limit to prevent splashing.

[0142] The source of experimental data and experimental procedures for flow pattern conversion in gas-liquid two-phase flow are as follows: The flow pattern conversion experimental data here refers to the specific verification experimental data conducted by the inventors of this application based on the classical flow pattern conversion theory, for the specific structure of this application with tangential swirling and reverse purging.

[0143] To meet the requirement of full disclosure, the following are the specific steps of this experiment: A model of the aforementioned transparent acrylic gas-liquid separation device 1 was constructed. A high-speed camera (frame rate > 1000fps) was set up to focus on the surface of the liquid film in the middle of the guide plate.

[0144] The experimental procedure involves first establishing a steady-state liquid film, then turning on the inlet pump and adjusting the flow rate to create a thick film on the guide plate. A stable liquid film was formed; then, the gas velocity was incrementally scanned, the inert gas source was turned on, and the gas flow rate of nozzle 1411 was increased very slowly from zero, controlled by a mass flow meter. Following flow pattern observations, during Phase 1 (the mirror zone), at low gas velocities, the liquid surface remained smooth and mirror-like, with no visible ripples; during Phase B (the wave-inducing zone), when the gas velocity reached a certain point... At this point, the high-speed camera captured the appearance of fine, fish-scale-like capillary waves on the liquid surface, with the ripples propagating downstream. The physical parameters at this time were recorded. In stage C (the disturbance zone), as the gas velocity continued to increase, the wave amplitude increased, forming rolling waves, and the liquid surface underwent violent renewal. In stage D (the splash zone), when the gas velocity reached a certain point... At that time, it was observed that the wave crest was clipped by the airflow, generating tiny droplets that detached from the liquid surface and entered the gas phase (i.e., the starting point of mist entrainment). Finally, data processing was performed to determine the critical point. and By substituting the Weber number formula into the data, experimental data on flow pattern conversion for this device were obtained.

[0145] The air-blown liquid film model is a simplified physical model in fluid mechanics used to study shear-driven liquid film flow. Specifically, it is defined as: assuming a layer with a certain thickness... A liquid adheres to a solid wall and flows, while a high-speed gas flows tangentially (or counter-tangentially) across the liquid surface. This model primarily studies how the shear stress at the gas-liquid interface overcomes surface tension, thereby altering the liquid surface morphology. The annular gas curtain blowing swirling liquid film in this invention is a typical engineering application of this model.

[0146] Critical Weber number Typically, it's between 2.0 and 3.0, based on the Kelvin-Helmholtz instability theory. For ripples to form on the liquid surface, the airflow applies aerodynamic lift (compared to the pressure exerted on the crests of the ripples) to the surface. (Proportional to) the surface tension (which must be overcome in an attempt to smooth out the ripples) (Proportional). Theoretically, when the ratio of inertial force to surface tension (i.e., the Weber number) exceeds 1, the liquid surface becomes unstable. However, in engineering practice, due to the viscous damping effect of the liquid, greater energy is required to maintain a stable, visible propagating wave. Numerous fluid mechanics documents indicate that for a water-air system, when... Only when the Weber number exceeds the range of 2.0 to 3.0 does the liquid surface truly transition from the hydraulically smooth zone to the surface renewal ripple zone. Below this value, the liquid surface is too calm, and dissolved oxygen cannot effectively diffuse to the surface, which does not meet the purpose of enhancing mass transfer in this invention. The setting of this critical range (2.0 to 3.0) references classical theories in fluid mechanics regarding the generation of ripples at the gas-liquid interface (such as the interface wave generation criterion proposed by Cohen & Hanratty). According to this theory and the verification experiments of this application, when the Weber number of the relative gas-liquid motion is below 2.0, the liquid surface is mainly controlled by surface tension, exhibiting a hydraulically smooth state, and cannot generate effective surface renewal; while when the Weber number exceeds this critical range (2.0-3.0), the airflow shear force begins to dominate, and the liquid surface generates stable capillary waves, thereby significantly improving mass transfer efficiency.

[0147] The reason for setting the critical Weber number at which splashing occurs is... Typically between 10.0 and 12.0, this value originates from the famous 1975 paper "Inception criteria for droplet entrainment in two-phase concurrent film flow" by Ishii, M. and Grolmes, MA. Through extensive experiments, they investigated the critical conditions for droplet entrainment in liquid films at different Reynolds numbers under airflow shear. They proposed that when the shear force exerted by the airflow on the wave crest is large enough to overcome the constraint of surface tension, the wave crest is broken off to form a droplet.

[0148] Critical Weber number at which splash occurs The value is typically between 10.0 and 12.0, based on the Hinze critical Weber number. Hinze's theory in fluid mechanics states that for droplets or columns in an airflow, the critical Weber number for breakup is approximately 12 (for shear breakup modes, this value usually fluctuates between 10⁻¹²). Application in this system: When At this point, the inertial force of the airflow is more than 10 times the surface tension. The airflow no longer merely pushes the liquid surface to undulate, but acts like a knife, directly shredding the protrusions (crests) on the liquid film surface into micron-sized droplets. These splashing droplets contain salt and pollutants; if they are entrained in the gas phase region 111 and discharged with the exhaust gas, they will cause environmental pollution; or they may form aerosols in the gas phase space, affecting the sensitivity of the pressure regulating components.

[0149] Therefore, in order to absolutely prevent splashing, this configuration method strictly sets the upper limit of the effective disturbance range to 10.0 to 12.0 as an inviolable red line.

[0150] The selection of the Weber number We value and the method for back-calculating the optimal impact velocity in step S300 are described below: To ensure the robustness of system operation, the geometric center or weighted average value of the effective disturbance interval is usually selected as the target We value. It is recommended to select... This is because this value can both ensure the generation of strong fish-scale ripples (enhanced mass transfer) and have sufficient safety margin from the splash threshold (10) to prevent accidental splashing due to gas source pressure fluctuations.

[0151] Optimal airflow impact speed The reverse reasoning method: The target has been determined. (For example, take 6) Then, use the formula in step S300 to perform mathematical transformation to solve.

[0152] Original formula:

[0153] Transformation formula:

[0154] Finally, it was determined that by substituting the known parameters into the above radical formula, the following calculation could be performed: Given The calculated result is the optimal airflow impact velocity required. .

[0155] Calculation example: Let , , , .

[0156]

[0157] That is, designers should control the airflow speed to the liquid surface to be around 8.7 m / s.

[0158] In step S400, the vertical distance mapping relationship The specific methods for establishing and obtaining parameters are as follows: In this step, the core of establishing the mapping relationship lies in transforming the three-dimensional spiral space structure into a two-dimensional functional relationship. The specific method is as follows: First, establish the geometric model: taking the central axis of the shell 110 of the gas-liquid separator 1 as the Z-axis, and the projection of the water inlet point of the tangential inlet component 120 onto the horizontal plane as the zero point of the polar coordinates (i.e., angle). Establish a cylindrical coordinate system. Since the gas distributor 141 (annular spray pipe) is typically installed horizontally, while the lower arc-shaped guide plate descends spirally, the vertical distance between the two is... It's an angle. The function.

[0159] Secondly, the derivation of the function formula is based on the geometric properties of the spiral and the perpendicular distance mapping relationship. The calculation formula is:

[0160] When expanded, it appears as follows:

[0161] in, The initial vertical distance is the physical vertical distance from the bottom surface of the annular spray pipe to the upper surface of the starting end (inlet end) of the arc-shaped guide plate. It can be directly measured from the mechanical assembly drawings (CAD drawings) of the gas-liquid separation device 1, or measured by a laser rangefinder after the equipment is assembled. (Average radius of the annular flow channel) is the distance from the centerline of the annular flow channel width to the central axis of the housing 110, which can be determined based on the annular flow channel width in step S200. and the inner radius of the shell 110 Calculated . (Radian angle) is the circumferential angle (in radians) of the current position of nozzle 1411 relative to the starting point. It can be determined according to the arrangement design of nozzles 1411 on the annular spray pipe. For example, if the first... One nozzle 1411 is located at Location, then . (Spiral flow channel slope) can be directly referenced from the preset spiral flow channel slope value of the arc-shaped guide plate determined in step S100 (e.g.) ).

[0162] Regarding aperture The specific methods for sequentially increasing the impact velocity and maintaining the impact speed are as follows: Physical principle (jet attenuation model): In order to compensate for the distance To compensate for the decrease in gas velocity caused by the increase in aperture size, this method uses the Abramovich formula from fluid mechanics for aperture compensation. The formula is as follows:

[0163] in, The jet attenuation constant (for a circular nozzle 1411, the empirical value is usually taken as...) ).

[0164] Among them, the jet attenuation constant It is a dimensionless parameter determined based on GN Abramovich's theory of free turbulent jets. Its physical meaning is related to the length of the jet potential core region.

[0165] Jet attenuation constant (Also often marked as in different documents) or This theory originates from the "free turbulent jet theory" in fluid mechanics. The most authoritative source of this theory is the classic textbook "Theory of Turbulent Jet" by the Soviet fluid mechanician GN Abramovich. According to this theory, when gas is injected from a circular nozzle 1411 into a static (or low-speed) environment, the decay of its axial velocity follows the law of conservation of momentum. The jet structure is divided into an initial section (potential flow core region) and a main section (fully developed region).

[0166] constant Essentially, it reflects the length of the potential flow core region of the jet. Experiments show that the length of the potential flow core region of a circular jet... Approximately 1411mm diameter nozzle 5 to 6 times that.

[0167] Attenuation formula: In the main body segment (i.e. ), axis velocity With distance They are inversely proportional, as expressed by the formula:

[0168] Among them, the engineering-recognized constants The value range is 5.0 to 6.0 (a smaller value is usually used for rim nozzle 1411, and a larger value is used for streamlined nozzles).

[0169] Although there are generally accepted ranges, in order to obtain precise constants for the specific nozzle 1411 selected for this device (such as a drilled hole, a tapered nozzle, etc.), Alternatively, calibration can be performed according to the following standard fluid mechanics experimental procedures: Step 1: Set up the test platform, fix the gas distributor 141 (or a single nozzle of the same specification) selected in this embodiment onto the test bracket, connect the gas source, and adjust the outlet flow rate to the design operating conditions. (For example ).

[0170] Step 2: Centerline velocity measurement. Using a Pitot tube in conjunction with a micromanometer, or a hot-wire anemometer, measure the flow velocity at regular intervals (e.g., every 10 mm) along the extension of the center axis of nozzle 1411. The coverage distance of the measurement range is... to The range (i.e., the actual vertical distance range in this invention).

[0171] Step 3: Data fitting, recording multiple sets Data points. Transform the formula to .by As the x-axis, with Plot the graph on the ordinate. Theoretically, this should be a straight line passing through the origin, and the slope of this line is... By using the least squares linear fitting method, the slope of the line can be determined, and then the precise constants for this specific nozzle 1411 structure can be calculated. .

[0172] Step 4: Engineering simplification. If experimental conditions are not available in actual engineering, a standard cylindrical borehole (length-to-diameter ratio) is selected. You can select directly. As a basis for calculation; for shrinkage nozzles, they can be directly selected. This deviation is typically within the allowable 5% error range for engineering applications, which meets the requirements of this configuration method.

[0173] For the standard circular nozzle 1411 used in this embodiment, based on common knowledge in fluid mechanics and experimental calibration, this constant... The value range is determined to be 5.0 to 6.0. In the optimal calculation of this method, the value is taken as... Configure the aperture.

[0174] The specific configuration steps are as follows: Step 1: Determine the initial velocity at the exit of nozzle 1411 According to the gas supply pressure Based on the flow coefficient of nozzle 1411, a uniform outlet velocity of nozzle 1411 is set. This speed is typically determined by the pressure reducing valve setting of the gas supply system.

[0175] Step 2: Extract the target impact velocity The "optimal airflow impact velocity" obtained by reverse calculation in step S300 is directly referenced. "As a constant target value."

[0176] Step 3: Calculate the required aperture at each location For an angle on the circumference The Each nozzle 1411, its corresponding vertical distance Substituting into the deformed jet formula:

[0177] From this formula, we can see the required aperture. and vertical distance Proportional.

[0178] Step 4: Calculated using engineering rounding This may be a non-standard value. In actual machining, select the standard drill bit diameter that is closest to the calculated value (e.g., the calculated value is...). Then select The drill bit is used for processing, thereby achieving a physical configuration in which the hole diameter increases sequentially with increasing distance.

[0179] In this embodiment, the fluid (ultrafiltration permeate) flows downward along a spiral path under the influence of gravity and centrifugal force on the arc-shaped guide plate. Therefore, for the liquid surface at a certain point, the incoming flow direction refers to the upstream direction from which the fluid flows (i.e., the opposite direction of the spiral tangent).

[0180] The reason for configuring it to tilt towards the incoming flow direction (counter-current jetting) is as follows: Maximizing relative velocity: Gas-liquid mass transfer and surface shear depend on relative velocity If the wind blows downstream (in the same direction): If the current blows against the current (in the opposite direction): Clearly, counter-current jetting can superimpose the velocities of both, producing the maximum relative velocity.

[0181] Enhanced shear renewal: The counter-current jetting airflow scrapes the liquid surface against the direction of water flow, generating stronger shear stress. This more effectively tears the laminar boundary layer (mass transfer resistance layer) on the liquid film surface, forcing the deeper liquid to surge to the surface. Experiments show that the surface renewal frequency of counter-current jetting is more than 30% higher than that of vertical or co-current jetting, thus significantly improving degassing efficiency.

[0182] The above description is merely illustrative of the invention. Those skilled in the art can make various modifications or additions to the described specific embodiments or use similar methods to replace them, as long as they do not depart from the content of this specification or exceed the scope defined by the claims, all of which should fall within the protection scope of this invention.

Claims

1. A wastewater treatment system for the semiconductor industry, characterized in that, It includes an ultrafiltration unit, a reverse osmosis unit, and a gas-liquid separation unit disposed between the two, wherein the gas-liquid separation unit includes: The housing defines an upper gas phase region, a middle cyclone separation region, and a lower liquid phase region. The outer side of the housing is provided with an exhaust port connected to the gas phase region, a liquid inlet connected to the cyclone separation region, and a liquid outlet connected to the liquid phase region. The liquid inlet is connected to the product water end of the ultrafiltration device, and the liquid outlet is connected to the inlet end of the reverse osmosis device. A tangential flow inlet assembly is disposed at the liquid inlet and configured to introduce fluid into the housing tangentially along the inner wall of the housing. A flow guiding assembly is disposed in the swirling separation region inside the housing. The flow guiding assembly is arranged on the extension path of the outlet of the tangential inlet assembly and is configured to guide the fluid to form a circumferentially rotating downward flow on the inner wall of the housing. A scavenging assembly includes a gas distributor extending into the gas phase region, the scavenging assembly being configured to access an external gas source and release protective gas into the gas phase region through the gas distributor; The liquid outlet assembly includes a pipe section and an anti-vortex component connected to one end of the pipe section. The other end of the pipe section is connected to the liquid outlet. The anti-vortex component is located inside the liquid phase region. The top of the anti-vortex component is closed and the side wall is provided with a flow hole. The anti-vortex component is configured to block the bubbles precipitated from the gas phase region and the liquid surface from entering the liquid outlet assembly.

2. The semiconductor industry wastewater treatment system according to claim 1, characterized in that, The flow guiding assembly includes an arc-shaped flow guiding plate fixed to the inner wall of the housing and extending along the circumferential direction of the housing. An annular flow channel is formed between the arc-shaped flow guiding plate and the inner wall of the housing, and the inlet end of the annular flow channel is directly opposite to the jet direction of the tangential flow inlet assembly.

3. The semiconductor industry wastewater treatment system according to claim 2, characterized in that, The lower edge of the arc-shaped guide plate extends below the horizontal plane of the centerline of the tangential inlet assembly and below the designed minimum liquid level of the liquid phase region.

4. The semiconductor industry wastewater treatment system according to claim 2, characterized in that, The gas distributor is constructed as an annular spray pipe, which is arranged along the inner periphery of the gas phase region. The annular spray pipe has a plurality of spray holes, the opening direction of which is inclined toward the inner wall of the housing, and each spray hole is configured to form an annular air curtain in the gas phase region.

5. The semiconductor industry wastewater treatment system according to claim 4, characterized in that, The extension line of the central axis of the nozzle passes through the central region of the width of the annular flow channel.

6. The semiconductor industry wastewater treatment system according to claim 1, characterized in that, The total flow area of ​​all the flow holes is set to be 3 to 5 times greater than the cross-sectional area of ​​the pipe segment.

7. The semiconductor industry wastewater treatment system according to claim 1, characterized in that, The top position of the anti-vortex component is configured to be at least 100 mm below the design minimum liquid level of the liquid phase region.

8. The semiconductor industry wastewater treatment system according to claim 1, characterized in that, The gas-liquid separation device further includes an inert gas source connected to the scavenging component and a pressure regulating component connected to the exhaust port; the wastewater treatment system is configured to maintain the gas phase region at a positive pressure state through the pressure regulating component and to use the scavenging component to replace dissolved oxygen and bubbles released from the cyclone separation region and the liquid phase region.

9. The semiconductor industry wastewater treatment system according to claim 1, characterized in that: The flow guiding assembly includes an arc-shaped flow guiding plate fixed to the inner wall of the housing and extending along the circumferential direction of the housing. An annular flow channel is formed between the arc-shaped flow guiding plate and the inner wall of the housing, and the inlet end of the annular flow channel is directly opposite to the jet direction of the tangential flow inlet assembly. The lower edge of the arc-shaped guide plate extends below the horizontal plane of the centerline of the tangential inlet assembly and below the designed minimum liquid level of the liquid phase region. The gas distributor is constructed as an annular spray pipe, which is arranged along the inner periphery of the gas phase region. The annular spray pipe has a plurality of spray holes, the opening direction of which is inclined toward the inner wall of the housing, and each spray hole is configured to form an annular air curtain in the gas phase region. The extension line of the central axis of the nozzle passes through the central region of the width of the annular flow channel; The top of the anti-vortex component is configured to be at least 100 mm below the design minimum liquid level of the liquid phase region; The gas-liquid separation device further includes an inert gas source connected to the scavenging component and a pressure regulating component connected to the exhaust port; the wastewater treatment system is configured to maintain the gas phase region at a positive pressure state through the pressure regulating component and to use the scavenging component to replace dissolved oxygen and bubbles released from the cyclone separation region and the liquid phase region.

10. A configuration method for a semiconductor industry wastewater treatment system as described in claim 9, characterized in that: The reverse osmosis unit has a high-pressure pump; The configuration method includes the following steps: The high-pressure pump suction head parameters and preset safety margin values ​​of the reverse osmosis unit are obtained to determine the height value of the liquid phase region; the preset spiral channel slope value and circumferential span value of the arc-shaped guide plate are obtained to determine the total vertical drop value of the arc-shaped guide plate, and the area with the total vertical drop value is defined as the vortex separation region; the remaining space in the shell is defined as the gas phase region; Obtain the rated drainage flow rate Q of the ultrafiltration device, and set the preset liquid film thickness δ for the fluid flowing on the arc-shaped guide plate; according to the formula W=k1×Q / (V L ×δ) determines the width W of the annular flow channel, and configures the distance between the arc-shaped guide plate and the inner wall of the shell according to the width W; where k1 is a correction coefficient, V L The tangential flow velocity V is a preset tangential flow velocity. L It is set to be greater than the minimum critical velocity required for the fluid to maintain its adherent flow to the wall; Introducing the Weber number W e As a criterion for gas-liquid disturbance, the formula is W e =(ρ g ×V rel 2 ×δ) / σ;where ρ g V is the density of the protective gas from the external gas source. rel Let σ be the relative velocity between gas and liquid, and σ be the surface tension of the wastewater; select a Weber number W within a preset effective disturbance range. e The value is used to deduce the optimal airflow impact velocity V. gasimpact The lower limit of the effective disturbance range is the Weber number critical value at which ripples are generated on the liquid film surface, and the upper limit is the Weber number critical value at which droplets generate splashes. Establish a vertical distance mapping relationship between the positions of each nozzle of the gas distributor and the corresponding positions of the arc-shaped guide plate below. ,in The angular position along the circumferential direction; along the fluid flow direction, based on the vertical distance. As the diameter d of each nozzle increases, the calculated impact velocity of the airflow reaching the liquid film surface through each nozzle is maintained at the optimal airflow impact velocity V. gasimpact The central axis of each nozzle is configured to be inclined toward the direction of fluid flow, forming a counter-current injection angle.

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