Sub-resolution auxiliary pattern adding method and optical proximity correction method

Abstract

The invention provides a sub-resolution auxiliary graph adding method and an optical proximity correction method, and belongs to the technical field of semiconductors, the method comprises the following steps: adding a first layer of sub-resolution auxiliary graph on at least one side of a main graph according to an adding rule, then determining whether the first side of the first layer of sub-resolution auxiliary graph satisfies an adding condition, if not, adding a second layer of sub-resolution auxiliary graph on at least one side of the main graph; adjusting a first pattern width and / or a first pattern spacing set for the second layer of sub-resolution auxiliary pattern in the adding rule so as to enable the first side of the first layer of sub-resolution auxiliary pattern to meet the adding condition, and then adding a second layer of sub-resolution auxiliary graph on the first side of the first layer of sub-resolution auxiliary graph according to the modified addition rule. The method has the unexpected effects that the method for adding the second-layer sub-resolution auxiliary pattern is simpler, the waste of computing power is reduced, the efficiency and the photoetching process window are improved, and the condition that the second-layer sub-resolution auxiliary pattern cannot be added can be avoided.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, specifically to a method for adding sub-resolution auxiliary graphics and an optical proximity correction method. Background Technology

[0002] In the photolithography process of integrated circuits, usually only one exposure condition is used for one photolithography step. However, the patterns distributed in a layout are varied, including both sparse and dense patterns. The corresponding process window (PW) is different for dense and sparse patterns. If the same exposure condition is used, it will be difficult for the photoresist size after exposure of dense and sparse patterns to meet the expectations.

[0003] In the integrated circuit manufacturing process, engineers mainly focus on the exposure results of dense patterns. Therefore, during exposure, they mainly consider the optimal energy and optimal depth of focus of the dense pattern. In order to achieve good results for both dense and sparse patterns under the same exposure conditions, the current approach is to add some sub-resolution assist features (SRAF) around the sparse pattern to increase the lithography process window of the sparse pattern. This allows for a large overlap between the lithography process windows of the sparse and dense patterns, enabling both the sparse and dense patterns to reach the target size after exposure under the same exposure conditions.

[0004] Existing methods for adding sub-resolution auxiliary patterns are typically rule-based. These methods establish rules that define aspects such as the width of each sub-resolution auxiliary pattern layer and the spacing between each layer and the main pattern. While this approach can improve the lithography window of the main pattern to some extent, it suffers from drawbacks including the inability to add sub-resolution auxiliary patterns, long processing times, and wasted computational resources. Summary of the Invention

[0005] In view of this, the embodiments of this application aim to provide a method for adding sub-resolution auxiliary graphics and an optical proximity correction method to solve the problems of not being able to add sub-resolution auxiliary graphics, long time consumption and wasted computing power in the prior art.

[0006] This application provides a method for adding sub-resolution auxiliary graphics, including: Obtain a target layout, wherein the target layout includes at least one main graphic; A first layer of sub-resolution auxiliary graphics is added to at least one side of the main graphic according to the addition rules; and, Determine whether the first side of the first sub-resolution auxiliary graphic meets the addition conditions. If not, adjust the first graphic width and / or first graphic spacing set for the second sub-resolution auxiliary graphic in the addition rules so that the first side of the first sub-resolution auxiliary graphic meets the addition conditions, and add the second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic according to the modified addition rules.

[0007] In some embodiments, when the first side of the first layer sub-resolution auxiliary graphic does not have an interfering sub-resolution auxiliary graphic in the first direction, or when the first side of the first layer sub-resolution auxiliary graphic has the interfering sub-resolution auxiliary graphic in the first direction, and the spacing between the first layer sub-resolution auxiliary graphic and the interfering sub-resolution auxiliary graphic in the first direction is greater than a first predetermined value, it is determined that the first side of the first layer sub-resolution auxiliary graphic meets the addition condition; and, When the first side of the first layer sub-resolution auxiliary graphic has the interfering sub-resolution auxiliary graphic in the first direction, and the distance between the first layer sub-resolution auxiliary graphic and the interfering sub-resolution auxiliary graphic in the first direction is less than or equal to the first predetermined value, it is determined that the first side of the first layer sub-resolution auxiliary graphic does not meet the addition condition. The interference sub-resolution auxiliary graphic is a sub-resolution auxiliary graphic that overlaps with the first layer sub-resolution auxiliary graphic in the second direction, and the interference sub-resolution auxiliary graphic is adjacent to the first layer sub-resolution auxiliary graphic in the first direction x.

[0008] In some embodiments, the first predetermined value is greater than or equal to the sum of the width of the first graphic and twice the spacing between the first graphics.

[0009] In some embodiments, the step of adjusting the width of the first graphic and / or the spacing between the first graphics includes: Increase one of the width of the first graphic and the spacing between the first graphic, and decrease the other of the width of the first graphic and the spacing between the first graphic.

[0010] In some embodiments, the width of the first pattern and the spacing between the first patterns are adjusted until the evaluation function characterizing the lithography process window reaches its maximum. The evaluation function is the product of a first deviation value and a first ratio. The first ratio is the ratio of a second deviation value to the critical dimension of the main pattern. The first deviation value is the difference between the maximum depth of field and the minimum depth of field of the lithography process window. The second deviation value is the difference between the critical dimension of the main pattern and a third deviation value. The third deviation value is the difference between the maximum critical dimension and the minimum critical dimension within the lithography process window.

[0011] In some embodiments, the addition rule sets a second graphic width and a second graphic spacing for the first layer of sub-resolution auxiliary graphics; The first layer of sub-resolution auxiliary graphics is added based on the spacing between it and the main graphic, such that the spacing between the first layer of sub-resolution auxiliary graphics and the main graphic is the spacing of the second graphic; and... The second layer of sub-resolution auxiliary graphics is added based on the spacing between it and the first layer of sub-resolution auxiliary graphics, such that the spacing between the second layer of sub-resolution auxiliary graphics and the first layer of sub-resolution auxiliary graphics is the spacing between the first graphics.

[0012] In some embodiments, the spacing between the second graphic elements is greater than the spacing between the first graphic elements.

[0013] In some embodiments, after adjusting the first pattern spacing, the first pattern spacing is greater than or equal to the difference between a second ratio and a predetermined distance, where the second ratio is the ratio of the lithography wavelength to the numerical aperture of the lithography machine, and the predetermined distance is the sum of the second pattern width and the second pattern spacing.

[0014] In some embodiments, after adding the second sub-resolution auxiliary graphic, it is determined whether the first sub-resolution auxiliary graphic and the second sub-resolution auxiliary graphic conflict. If so, the first sub-resolution auxiliary graphic and / or the second sub-resolution auxiliary graphic in the conflict area are cleared or optimized.

[0015] An embodiment of this application also provides an optical proximity correction method, including a method for adding the sub-resolution auxiliary graphics.

[0016] An embodiment of this application also provides a sub-resolution auxiliary graphics adding system, comprising: A map acquisition module is used to acquire a target map, wherein the target map includes at least one main graphic. A first graphics adding module is configured to add a first layer of sub-resolution auxiliary graphics to at least one side of the main graphics according to adding rules; and, The second graphic addition module is used to determine whether the first side of the first sub-resolution auxiliary graphic meets the addition conditions. If not, it adjusts the first graphic width and / or the first graphic spacing set for the second sub-resolution auxiliary graphic in the addition rules so that the first side of the first sub-resolution auxiliary graphic meets the addition conditions, and adds the second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic according to the modified addition rules.

[0017] One embodiment of this application also provides an electronic device, including: One or more actuators; Memory, used to store one or more programs; and, When the one or more programs are executed by the one or more executors, the one or more executors implement the method for adding sub-resolution auxiliary graphics.

[0018] This application provides a method for adding sub-resolution auxiliary graphics and an optical proximity correction method. First, a first layer of sub-resolution auxiliary graphics is added to at least one side of the main graphic according to an addition rule. Then, it is determined whether the first side of the first layer of sub-resolution auxiliary graphics meets the addition conditions. If not, the first graphic width and / or first graphic spacing set for the second layer of sub-resolution auxiliary graphics in the addition rule are adjusted so that the first side of the first layer of sub-resolution auxiliary graphics meets the addition conditions. Then, the second layer of sub-resolution auxiliary graphics is added to the first side of the first layer of sub-resolution auxiliary graphics according to the modified addition rule. An unexpected effect of this application is that the method for adding the second layer of sub-resolution auxiliary graphics is simpler, reduces wasted computing power, improves efficiency and the lithography process window, avoids situations where the second layer of sub-resolution auxiliary graphics cannot be added, and reduces conflicts between the first layer of sub-resolution auxiliary graphics and the second layer of sub-resolution auxiliary graphics. Attached Figure Description

[0019] Figure 1 A schematic diagram of adding a first layer of sub-resolution auxiliary graphics to at least one side of the main graphic.

[0020] Figure 2 A schematic diagram of adding a second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic.

[0021] Figure 3 A schematic diagram illustrating the addition of a first layer of sub-resolution auxiliary graphics to the uneven side of the main graphic.

[0022] Figure 4 This is a schematic diagram of aligning and merging the first and second parts.

[0023] Figure 5 A schematic diagram for adding a second sub-resolution auxiliary graphic to the first side of the merged first-layer sub-resolution auxiliary graphic.

[0024] Figure 6 A flowchart illustrating a method for adding sub-resolution auxiliary graphics according to an embodiment of this application.

[0025] Figure 7 This is a schematic diagram of the main graphic provided in an embodiment of this application.

[0026] Figure 8This is a schematic diagram illustrating the addition of a first layer of sub-resolution auxiliary graphics to the first side of the main graphic, as provided in an embodiment of this application.

[0027] Figure 9 This is a schematic diagram showing the alignment and merging of the third and fourth parts, as provided in an embodiment of this application.

[0028] Figure 10 This is a schematic diagram showing that there is an interfering sub-resolution auxiliary graphic on the first side of the first layer of sub-resolution auxiliary graphic provided in an embodiment of this application.

[0029] Figure 11 This is a schematic diagram of adding a second sub-resolution auxiliary graphic to the first side of a first-layer sub-resolution auxiliary graphic, as provided in an embodiment of this application.

[0030] Figure 12 This is a schematic diagram of the second sub-resolution auxiliary graphic added after adjusting and adding rules, as provided in an embodiment of this application.

[0031] Figure 13 A schematic diagram of the second sub-resolution auxiliary graphics added after adjusting and adding rules, provided in another embodiment of this application.

[0032] Figure 14 This is a schematic diagram of the second sub-resolution auxiliary graphic added after adjusting and adding rules, as provided in another embodiment of this application.

[0033] Figure 15 This is a simulation diagram of the photolithography process window without adding a second layer of sub-resolution auxiliary graphics, provided as an embodiment of this application.

[0034] Figure 16 This is a simulation diagram of the photolithography process window when adding a second layer of sub-resolution auxiliary graphics, as provided in an embodiment of this application.

[0035] Figure 17 This is a structural block diagram of a sub-resolution auxiliary graphics addition system provided in an embodiment of this application.

[0036] Figure 18 This is a structural block diagram of an electronic device provided in an embodiment of this application.

[0037] The attached figures are labeled as follows: 100 - Main graphic; 201 - First-layer sub-resolution auxiliary graphic; 202 - Second-layer sub-resolution auxiliary graphic; 203 - Interference sub-resolution auxiliary graphic; 10 - Layout acquisition module; 20 - First graphic addition module; 30 - Second graphic addition module; 301 - Processor; 302 - Memory; 303 - Communication interface. Detailed Implementation

[0038] Figures 1-5 This is a structural diagram showing the corresponding steps of a method for adding sub-resolution auxiliary graphics.

[0039] like Figure 1 As shown, the target map is first obtained, which includes at least one main graphic ( Figure 1 Only one main graphic is shown as an example. First, a first layer of sub-resolution auxiliary graphics is added to at least one side of the main graphic according to the preset addition rules. Figure 1 The example shown here is simply adding a first sub-resolution auxiliary graphic to one side of the main graphic. The rule for adding the first sub-resolution auxiliary graphic is set to a width of W1 and a spacing of S1 between it and the main graphic. When adding the first sub-resolution auxiliary graphic, a first sub-resolution auxiliary graphic with a width of W1 is added at a predetermined position on one side of the main graphic, and the spacing between the first sub-resolution auxiliary graphic and the main graphic is S1.

[0040] like Figure 2 As shown, according to the preset addition rules, a second sub-resolution auxiliary graphic is added to the first side (the side furthest from the main graphic) of the first sub-resolution auxiliary graphic. The addition rules set the width of the first sub-resolution auxiliary graphic to W2 (W1 and W2 can be equal), and the spacing between it and the main graphic to S2. When adding the second sub-resolution auxiliary graphic, a second sub-resolution auxiliary graphic with a width of W2 is added at a predetermined position on the side furthest from the main graphic, ensuring that the spacing between the second sub-resolution auxiliary graphic and the main graphic is S2. Figure 2 As can be seen, the spacing between the first sub-resolution auxiliary graphic and the second sub-resolution auxiliary graphic is S3, where S3 = S2 - S1 - W1.

[0041] Next, an inspection can be performed to determine whether there is a conflict between the first-layer sub-resolution auxiliary graphics and the second-layer sub-resolution auxiliary graphics. If so, the first-layer sub-resolution auxiliary graphics and the second-layer sub-resolution auxiliary graphics in the conflict area need to be cleared or optimized.

[0042] For main graphics with relatively regular shapes, there are not many problems with this method of adding sub-resolution auxiliary graphics. However, as technology advances step by step, graphics become more and more complex, and as the sizing rules of layout design increase, the sides of the main graphics become uneven. Figures 3-5 The steps for adding sub-resolution auxiliary graphics are shown when the sides of the main graphic are uneven.

[0043] like Figure 3As shown, a first layer of sub-resolution auxiliary graphics is first added to at least one side of the main graphic according to the preset addition rules. Because the side of the main graphic is uneven (there is a step), the added first layer of sub-resolution auxiliary graphics consists of two parts: a first part and a second part (multiple steps will result in multiple parts). The width of both the first and second parts is W1, and the spacing between the first and second parts and the main graphic is S1.

[0044] like Figure 4 As shown, the first and second parts are aligned and merged to avoid the discontinuous first-layer sub-resolution auxiliary pattern affecting the photolithography process window. To ensure that the spacing between the first-layer sub-resolution auxiliary pattern and the main pattern is not less than S1, the second part is moved away from the main pattern when merging the first and second parts. Figure 4 As can be seen, after aligning and merging the first and second parts, the distance between a portion of the first sub-resolution auxiliary graphic and the main graphic remains S1, while the distance between another portion of the graphic and the main graphic will be greater than S1.

[0045] like Figure 5 As shown, a second sub-resolution auxiliary graphic is added to the first side (the side furthest from the main graphic) of the first sub-resolution auxiliary graphic according to the preset addition rules. When adding the second sub-resolution auxiliary graphic, it is also necessary to ensure that the width of the second sub-resolution auxiliary graphic is W2 and the spacing between the second sub-resolution auxiliary graphic and the main graphic is S2.

[0046] from Figure 5 As can be seen, after adding the second layer of sub-resolution auxiliary graphics, the spacing between the second layer of sub-resolution auxiliary graphics and the first layer of sub-resolution auxiliary graphics will be less than S3. Therefore, it may cause a conflict between the second layer of sub-resolution auxiliary graphics and the first layer of sub-resolution auxiliary graphics, requiring further processing of the conflict area, resulting in a waste of computing power, a sharp increase in time consumption, and an easy risk of unnecessary removal of the sub-resolution auxiliary graphics within the conflict area.

[0047] Based on this, this application provides a method for adding sub-resolution auxiliary graphics and an optical proximity correction method. First, a first layer of sub-resolution auxiliary graphics is added to at least one side of the main graphic according to the addition rules. Then, it is determined whether the first side of the first layer of sub-resolution auxiliary graphics meets the addition conditions. If not, the first graphic width and / or first graphic spacing set for the second layer of sub-resolution auxiliary graphics in the addition rules are adjusted so that the first side of the first layer of sub-resolution auxiliary graphics meets the addition conditions. Then, a second layer of sub-resolution auxiliary graphics is added to the first side of the first layer of sub-resolution auxiliary graphics according to the modified addition rules. An unexpected effect of this application is that the method for adding the second layer of sub-resolution auxiliary graphics is simpler, reduces wasted computing power, improves efficiency and the lithography process window, avoids situations where the second layer of sub-resolution auxiliary graphics cannot be added, and reduces conflicts between the first and second layers of sub-resolution auxiliary graphics.

[0048] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0049] One embodiment of this application provides a method for adding sub-resolution auxiliary graphics. Figure 6 This is a flowchart illustrating a method for adding sub-resolution auxiliary graphics according to an embodiment of this application. Figure 6 As shown, the methods for adding sub-resolution auxiliary graphics include: Step S100: Obtain the target layout, which includes at least one main graphic; Step S200: Add a first-layer sub-resolution auxiliary graphic to at least one side of the main graphic according to the addition rules; and, Step S300: Determine whether the first side of the first sub-resolution auxiliary graphic meets the addition conditions. If not, adjust the first graphic width and / or first graphic spacing set for the second sub-resolution auxiliary graphic in the addition rules so that the first side of the first sub-resolution auxiliary graphic meets the addition conditions, and add the second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic according to the modified addition rules.

[0050] Specifically, step S100 is executed first to obtain the target layout. Figure 7 A schematic diagram of the main graphic 100 provided in an embodiment of this application, as shown below. Figure 7 As shown, the target layout includes at least one main graphic 100. Figure 7The diagram schematically shows one main graphic 100, but it should be understood that the target layout is not limited to having only one main graphic 100, and the shape of the main graphic is not limited to a rectangle. For Figure 7 For the main graphic 100 in the middle, it extends along the second direction y, and the length of the main graphic 100 in the second direction y is much greater than the width in the first direction x. Usually, it is only necessary to add sub-resolution auxiliary graphics on the side extending along the second direction y, and there is no need to add sub-resolution auxiliary graphics on the side extending along the first direction x.

[0051] For ease of description, the side of the main graphic 100 extending along the second direction y is referred to as the first side and the second side. The first side of the main graphic 100 is uneven, having a step, while the second side of the main graphic 100 is relatively flat. Next, taking the addition of a sub-resolution auxiliary graphic to the first side of the main graphic 100 as an example, the other specific steps of the method for adding the sub-resolution auxiliary graphic will be explained in detail.

[0052] Figure 8 This is a schematic diagram illustrating the addition of a first layer of sub-resolution auxiliary graphics 201 to the first side of the main graphic 100, as provided in an embodiment of this application. Figure 8 As shown, in step S200, a first-layer sub-resolution auxiliary graphic 201 is added to the first side of the main graphic 100 according to the addition rules. The first-layer sub-resolution auxiliary graphic 201 also extends along the second direction y. The addition rules set a second graphic width W3 and a second graphic spacing S4 for the first-layer sub-resolution auxiliary graphic 201. The second graphic width is the width W3 of the first-layer sub-resolution auxiliary graphic 201 in the first direction x, and the second graphic spacing is the spacing S4 between the first-layer sub-resolution auxiliary graphic 201 and the main graphic 100. When adding the first-layer sub-resolution auxiliary graphic 201 according to the addition rules, the first-layer sub-resolution auxiliary graphic 201 with the second graphic width is added at a predetermined position away from the first side of the main graphic 100, such that the spacing between the first-layer sub-resolution auxiliary graphic 201 and the main graphic 100 is the second graphic spacing. Figure 8 As can be seen, after adding the first sub-resolution auxiliary graphic 201, the width of the first sub-resolution auxiliary graphic 201 is W3, and the spacing between the first sub-resolution auxiliary graphic 201 and the main graphic 100 is S4.

[0053] Because the first side of the main graphic 100 is uneven (there is a step), the added first sub-resolution auxiliary graphic 201 has two parts, namely the third part and the fourth part (multiple steps will result in multiple parts). The width of the third part and the fourth part is W3, and the spacing between the third part and the fourth part and the main graphic 100 is S4.

[0054] Figure 9This is a schematic diagram showing the alignment and merging of the third and fourth parts, as provided in an embodiment of this application. Figure 9 As shown, the third and fourth parts are aligned and merged in the first direction x to avoid the discontinuous first-layer sub-resolution auxiliary pattern 201 affecting the photolithography process window. To ensure that the spacing between the first-layer sub-resolution auxiliary pattern 201 and the main pattern 100 is not less than the second pattern spacing, the fourth part is moved away from the main pattern 100 when merging the third and fourth parts. Figure 9 As can be seen, after aligning and merging the third and fourth parts in the first direction x, the distance between a part of the first sub-resolution auxiliary graphic 201 and the main graphic 100 is still S4, while the distance between another part of the area and the main graphic 100 will be greater than S4.

[0055] It should be understood that if the first side of the main graphic 100 is flat, then after adding the first layer of sub-resolution auxiliary graphic 201, the first layer of sub-resolution auxiliary graphic 201 will not be discontinuous, so the alignment and merging steps can be omitted.

[0056] In step S300, it is determined whether the first side of the first sub-resolution auxiliary graphic 201 meets the addition conditions. Since the first sub-resolution auxiliary graphic 201 cannot be added to the side that is close to the main graphic 100, the first side of the first sub-resolution auxiliary graphic 201 refers to the side that is far away from the main graphic 100.

[0057] Figure 10 This is a schematic diagram showing that an interfering sub-resolution auxiliary pattern 203 exists on the first side of the first layer sub-resolution auxiliary pattern 201 provided in an embodiment of this application. For example... Figure 10As shown, it can first be determined whether the first side of the first layer sub-resolution auxiliary graphic 201 has an interfering sub-resolution auxiliary graphic 203 in the first direction x. If the first side of the first layer sub-resolution auxiliary graphic 201 has an interfering sub-resolution auxiliary graphic 203 in the first direction x, the distance L between the first layer sub-resolution auxiliary graphic 201 and the interfering sub-resolution auxiliary graphic 203 can be obtained. When the first side of the first layer sub-resolution auxiliary graphic 201 does not have an interfering sub-resolution auxiliary graphic 203 in the first direction x, or when the first side of the first layer sub-resolution auxiliary graphic 201 has an interfering sub-resolution auxiliary graphic 203 in the first direction x, but the distance L between the first layer sub-resolution auxiliary graphic 201 and the interfering sub-resolution auxiliary graphic 203 in the first direction x is greater than a first predetermined value, it can be determined that the first side of the first layer sub-resolution auxiliary graphic 201 meets the addition condition. Conversely, when the first side of the first sub-resolution auxiliary graphic 201 has an interfering sub-resolution auxiliary graphic 203 in the first direction x, and the distance L between the first sub-resolution auxiliary graphic 201 and the interfering sub-resolution auxiliary graphic 203 in the first direction x is less than or equal to a first predetermined value, it can be determined that the first side of the first sub-resolution auxiliary graphic 201 does not meet the addition conditions.

[0058] In some embodiments, the first predetermined value may be greater than or equal to the sum of the first graphic width and twice the first graphic spacing. Here, the first graphic width and the first graphic spacing are the first graphic width and the first graphic spacing set for the second layer sub-resolution auxiliary graphic in the addition rule, respectively. If the spacing L between the first layer sub-resolution auxiliary graphic 201 and the interfering sub-resolution auxiliary graphic 203 in the first direction x is greater than the first predetermined value, it can be considered that after inserting the second sub-resolution auxiliary graphic between the first layer sub-resolution auxiliary graphic 201 and the interfering sub-resolution auxiliary graphic 203, the spacing between the second sub-resolution auxiliary graphic and the first layer sub-resolution auxiliary graphic 201 and the interfering sub-resolution auxiliary graphic 203 can meet the requirements.

[0059] It should be noted that the interfering sub-resolution auxiliary graphic 203 is a sub-resolution auxiliary graphic that overlaps with the first-layer sub-resolution auxiliary graphic 201 in the second direction y, and the interfering sub-resolution auxiliary graphic 203 is adjacent to the first-layer sub-resolution auxiliary graphic 201 in the first direction x. That is to say, the interfering sub-resolution auxiliary graphic 203 can be either a first-layer or second-layer sub-resolution auxiliary graphic of another main graphic. As long as a sub-resolution auxiliary graphic is adjacent to the first-layer sub-resolution auxiliary graphic 201 in the first direction x and overlaps with it in the second direction y, it can be considered an interfering sub-resolution auxiliary graphic 203 of the first-layer sub-resolution auxiliary graphic 201.

[0060] Figure 11 This is a schematic diagram illustrating the addition of a second sub-resolution auxiliary graphic 202 to the first side of a first-layer sub-resolution auxiliary graphic 201, as provided in an embodiment of this application. Figure 11 As shown, when the first side of the first-layer sub-resolution auxiliary graphic 201 meets the addition conditions, a second-layer sub-resolution auxiliary graphic 202 can be directly added to the first side of the first-layer sub-resolution auxiliary graphic 201 according to the addition rules. The addition rules set a first graphic width and a first graphic spacing for the second-layer sub-resolution auxiliary graphic 202, where the first graphic width is W4, the first graphic spacing is S5, the first graphic width can be equal to the second graphic width, and the second graphic spacing can be greater than the first graphic spacing. When adding the second-layer sub-resolution auxiliary graphic 202, it can be added at a predetermined position away from the first side of the first-layer sub-resolution auxiliary graphic 201, with the first graphic width being equal to the first graphic spacing. Figure 11 As can be seen, assuming L > W4 + 2S5, after adding the second sub-resolution auxiliary graphic 202, the width of the second sub-resolution auxiliary graphic 202 is W4, the distance between the second sub-resolution auxiliary graphic 202 and the first sub-resolution auxiliary graphic 201 is S5, and the distance between the second sub-resolution auxiliary graphic 202 and the interfering sub-resolution auxiliary graphic 203 is greater than S5, which meets the requirements.

[0061] Furthermore, if it is determined that the first side of the first sub-resolution auxiliary graphic 201 does not meet the addition conditions, it indicates that the second sub-resolution auxiliary graphic 202 cannot be added directly according to the addition rules. Figure 12 This is a schematic diagram of the second-layer sub-resolution auxiliary graphics 202 added after adjusting and adding rules, as provided in an embodiment of this application. Figure 12 As shown, the first graphic width set for the second-layer sub-resolution auxiliary graphic 202 in the addition rules can be adjusted independently to ensure that the first side of the first-layer sub-resolution auxiliary graphic 201 meets the addition conditions. When adding the second-layer sub-resolution auxiliary graphic 202 according to the modified addition rules, the modified first graphic width of the second-layer sub-resolution auxiliary graphic 202 can be added at a predetermined position away from the first side of the first-layer sub-resolution auxiliary graphic 201, and the spacing between the second-layer sub-resolution auxiliary graphic 202 and the first-layer sub-resolution auxiliary graphic 201 remains the first graphic spacing. Figure 12As can be seen, assuming L < W4 + 2S5, reducing the width of the first graphic to W4' makes L > W4' + 2S5. After adding the second sub-resolution auxiliary graphic 202, the width of the second sub-resolution auxiliary graphic 202 is W4', the spacing between the second sub-resolution auxiliary graphic 202 and the first sub-resolution auxiliary graphic 201 is S5, and the spacing between the second sub-resolution auxiliary graphic 202 and the interfering sub-resolution auxiliary graphic 203 is S5, which meets the requirements.

[0062] In some embodiments, if it is determined that the first side of the first sub-resolution auxiliary graphic 201 does not meet the addition conditions, it indicates that the second sub-resolution auxiliary graphic 202 cannot be added directly according to the addition rules. Figure 13 This is a schematic diagram of a second-layer sub-resolution auxiliary graphic 202 added after adjusting and adding rules, as provided in another embodiment of this application. (See diagram below.) Figure 13 As shown, the first graphic spacing set for the second-layer sub-resolution auxiliary graphic 202 in the addition rules can be adjusted independently to ensure that the first side of the first-layer sub-resolution auxiliary graphic 201 meets the addition conditions. When adding the second-layer sub-resolution auxiliary graphic 202 according to the modified addition rules, the second-layer sub-resolution auxiliary graphic 202 with a first graphic width can be added at a predetermined position away from the first side of the first-layer sub-resolution auxiliary graphic 201, and the spacing between the second-layer sub-resolution auxiliary graphic 202 and the first-layer sub-resolution auxiliary graphic 201 is the modified first graphic spacing. Figure 13 As can be seen, assuming L < W4 + 2S5, reducing the spacing of the first graphic to S5' makes L > W4 + 2S5'. After adding the second sub-resolution auxiliary graphic 202, the width of the second sub-resolution auxiliary graphic 202 is W4, the spacing between the second sub-resolution auxiliary graphic 202 and the first sub-resolution auxiliary graphic 201 is S5', and the spacing between the second sub-resolution auxiliary graphic 202 and the interfering sub-resolution auxiliary graphic 203 is S5', which meets the requirements.

[0063] In some embodiments, if it is determined that the first side of the first sub-resolution auxiliary graphic 201 does not meet the addition conditions, it indicates that the second sub-resolution auxiliary graphic 202 cannot be added directly according to the addition rules. Figure 14 This is a schematic diagram of the second sub-resolution auxiliary graphic 202 added after adjusting the rules, as provided in another embodiment of this application. (See diagram below.) Figure 14As shown, the first graphic width and first graphic spacing set for the second-layer sub-resolution auxiliary graphic 202 in the addition rules can be adjusted simultaneously to ensure that the first side of the first-layer sub-resolution auxiliary graphic 201 meets the addition conditions. When adding the second-layer sub-resolution auxiliary graphic 202 according to the modified addition rules, the modified first graphic width of the second-layer sub-resolution auxiliary graphic 202 can be added at a predetermined position away from the first side of the first-layer sub-resolution auxiliary graphic 201, and the spacing between the second-layer sub-resolution auxiliary graphic 202 and the first-layer sub-resolution auxiliary graphic 201 is also the modified first graphic spacing. Figure 14 As can be seen, assuming L < W4 + 2S5, increasing the width of the first graphic by W" and decreasing the spacing of the first graphic to S5" makes L > W4" + 2S5". After adding the second sub-resolution auxiliary graphic 202, the width of the second sub-resolution auxiliary graphic 202 is W4", the spacing between the second sub-resolution auxiliary graphic 202 and the first sub-resolution auxiliary graphic 201 is S5", and the spacing between the second sub-resolution auxiliary graphic 202 and the interfering sub-resolution auxiliary graphic 203 is S5", which meets the requirements.

[0064] In some embodiments, if the first pattern spacing and the first pattern width are adjusted simultaneously, one of the first pattern width and the first pattern spacing can be increased, while the other can be decreased. That is, the first pattern spacing and the first pattern width are increased and decreased simultaneously, thereby attempting to make the first side of the first layer sub-resolution auxiliary pattern 201 meet the addition conditions. When adjusting the first pattern width and the first pattern spacing, the first pattern width and the first pattern spacing can be adjusted multiple times until the evaluation function characterizing the lithography process window reaches its maximum. The evaluation function can be the product of a first deviation value and a first ratio. The first ratio is the ratio of a second deviation value to the critical dimension of the main pattern 100. The first deviation value is the difference between the maximum and minimum depth of field of the lithography process window. The second deviation value is the difference between the critical dimension of the main pattern 100 and a third deviation value. The third deviation value is the difference between the maximum and minimum critical dimensions within the lithography process window.

[0065] In simple terms, the evaluation function ƒ((CD) can be used. nom -CD) / CD nom The lithography process window is evaluated using the following method: ƒ represents the difference between the maximum and minimum depth of field within the lithography process window, and CD represents the difference between the maximum and minimum critical dimensions within the lithography process window. nom The key dimension of the main graphic 100 has a first deviation value of ƒ and a first ratio value of (CD). nom -CD) / CD nom The second deviation value is CD nom -CD, the third deviation value is CD.

[0066] Furthermore, after adjusting the spacing of the first pattern, the spacing of the first pattern can be greater than or equal to the difference between the second ratio and the predetermined distance. The second ratio is the ratio of the lithography wavelength to the numerical aperture of the lithography machine, and the predetermined distance is the sum of the width of the second pattern and the spacing of the second pattern, thereby avoiding the development of the second sub-resolution auxiliary pattern 202. Figure 14 For example, after adjusting the spacing of the first pattern, S5"≥(λ / NA)-(S4+W3), where λ is the lithography wavelength and NA is the numerical aperture of the lithography machine.

[0067] After adding the second-layer sub-resolution auxiliary graphic 202, it can be determined whether the first-layer sub-resolution auxiliary graphic 201 and the second-layer sub-resolution auxiliary graphic 202 conflict. If so, the first-layer sub-resolution auxiliary graphic 201 and / or the second-layer sub-resolution auxiliary graphic 202 within the conflict area can be cleared or optimized. For example, either the first-layer sub-resolution auxiliary graphic 201 or the second-layer sub-resolution auxiliary graphic 202 within the conflict area can be cleared (preferably the second-layer sub-resolution auxiliary graphic 202). Alternatively, the second-layer sub-resolution auxiliary graphic 202 can be slightly moved to try to avoid the conflict. If so, the slightly moved second-layer sub-resolution auxiliary graphic 202 is retained; otherwise, the second-layer sub-resolution auxiliary graphic 202 is cleared.

[0068] by Figure 10 For example, assuming L = 184nm, and the addition rule sets the width of the second pattern to 24nm and the spacing between the second patterns to 80.5nm, then L < 80.5 × 2 + 24. The first side of the first-layer sub-resolution auxiliary pattern 201 does not meet the addition conditions, and according to the original addition rule, the second-layer sub-resolution auxiliary pattern 202 cannot be added. Figure 15 This is a simulation diagram of the photolithography process window without adding a second sub-resolution auxiliary pattern 202, provided in an embodiment of this application. Figure 15 As can be seen, the photolithography process window is 133nm at this point. When the width of the second pattern is adjusted to 22nm, L > 80.5×2+22, ensuring that the first side of the first sub-resolution auxiliary pattern 201 meets the addition conditions. Figure 16 This is a simulation diagram of the photolithography process window when adding a second layer of sub-resolution auxiliary graphics 202 according to an embodiment of this application. Figure 16 As can be seen, the photolithography process window at this point is 150nm. For Figure 15 and Figure 16 Thus, the lithography process window was improved by 16%. Theoretically, different combinations of the first pattern width and the first pattern spacing will result in slightly different degrees of improvement in the lithography process window, but if we find a way to make the evaluation function ∆ƒ ((CD) nom -CD) / CD nomThe combination of maximizing the photolithography process window can be maximized, and the optimal second-layer sub-resolution auxiliary pattern 202 can be added.

[0069] The industry typically only ensures the perfect addition of the first-layer sub-resolution auxiliary pattern 201. However, this application demonstrates that the second-layer sub-resolution auxiliary pattern 202 also affects the photolithography process window. In this application, the second-layer sub-resolution auxiliary pattern 202 is added based on the spacing between it and the first-layer sub-resolution auxiliary pattern 201 (not based on the spacing between it and the main pattern 100). Furthermore, when the first side of the first-layer sub-resolution auxiliary pattern 201 does not meet the addition conditions, the first pattern width and / or the first pattern spacing set for the second-layer sub-resolution auxiliary pattern 202 in the addition rules can be adjusted to increase the photolithography process window and reduce conflicts when adding the sub-resolution auxiliary pattern.

[0070] Table 1 compares the data of industry methods for adding sub-resolution auxiliary graphics with those in this application. As shown in Table 1, the method for adding sub-resolution auxiliary graphics in this application reduces the number of conflicts by 59% and the addition time by 56%, thus accelerating the addition efficiency. The number of missing graphics (AF) due to conflicts between graphics is reduced by 77%, and a comparison using simulated lithography process windows shows that the lithography process window can be improved by 10%. This indicates that when this application determines that the first side of the first layer sub-resolution auxiliary graphics 201 does not meet the addition conditions, it adaptively adjusts the first graphics width and / or first graphics spacing set for the second layer sub-resolution auxiliary graphics 202 in the addition rules to ensure that the first side of the first layer sub-resolution auxiliary graphics 201 meets the addition conditions. The method for adding the second layer sub-resolution auxiliary graphics 202 is simpler, the addition of sub-resolution auxiliary graphics is more complete, and the imaging quality of the layout graphics is guaranteed. At the same time, it reduces the waste of computing power, improves efficiency and the lithography process window, avoids situations where the second layer sub-resolution auxiliary graphics 202 cannot be added, and reduces conflicts between the first layer sub-resolution auxiliary graphics 201 and the second layer sub-resolution auxiliary graphics 202.

[0071] Table 1: Data Comparison of Industry Methods and Sub-resolution Auxiliary Graphics Addition Methods in This Application Furthermore, embodiments of this application also provide an optical proximity correction method, including the above-described method for adding sub-resolution auxiliary graphics.

[0072] Corresponding to the above-described embodiments of the method for adding sub-resolution auxiliary graphics, this embodiment also provides a system for adding sub-resolution auxiliary graphics. Figure 17 This is a structural block diagram of a sub-resolution auxiliary graphics adding system provided in an embodiment of this application. For example... Figure 17 As shown, the sub-resolution auxiliary graphics addition system includes: The map acquisition module 10 is used to acquire a target map, which includes at least one main graphic. The first graphic adding module 20 is used to add a first layer of sub-resolution auxiliary graphics to at least one side of the main graphic according to the adding rules; and, The second graphic addition module 30 is used to determine whether the first side of the first sub-resolution auxiliary graphic meets the addition conditions. If not, it adjusts the first graphic width and / or first graphic spacing set for the second sub-resolution auxiliary graphic in the addition rules so that the first side of the first sub-resolution auxiliary graphic meets the addition conditions, and adds the second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic according to the modified addition rules.

[0073] Furthermore, this embodiment also provides an electronic device that can be used for adding sub-resolution auxiliary graphics. Figure 18 A structural block diagram of an electronic device provided in an embodiment of this application, such as... Figure 18 As shown, the electronic device includes: One or more processors 301; Memory 302 is used to store one or more programs; When one or more programs are executed by one or more processors 301, the one or more processors 301 implement the sub-resolution auxiliary graphics addition method as described in the above embodiments.

[0074] In this embodiment, there is one processor 301 and one memory 302. The electronic device also includes a communication interface 303. The processor 301, memory 302, and communication interface 303 communicate with each other through a communication bus 304. The communication bus 304 mentioned above can be a Peripheral Component Interconnect (PCI) bus or an Extended Industry Standard Architecture (EISA) bus, etc. This communication bus 304 can be divided into an address bus, a data bus, a control bus, etc.

[0075] The memory 302, as a computer-readable storage medium, can be used to store software programs, computer-executable programs, and modules, such as the program instructions / modules corresponding to the sub-resolution auxiliary graphics addition method in this embodiment. The processor 301 executes various functional applications and data processing of the electronic device by running the software programs, instructions, and modules stored in the memory 302, thereby implementing the aforementioned sub-resolution auxiliary graphics addition method.

[0076] The memory 302 may primarily include a program storage area and a data storage area. The program storage area may store the operating system and at least one application program required for a given function; the data storage area may store data created based on the use of the electronic device. Furthermore, the memory 302 may include high-speed random access memory and non-volatile memory, such as at least one disk storage device, flash memory device, or other non-volatile solid-state storage device. In some instances, the memory 302 may further include memory remotely located relative to the processor 301, which can be connected to the electronic device via a network. Examples of such networks include, but are not limited to, the Internet, intranets, local area networks, mobile communication networks, and combinations thereof.

[0077] The electronic device proposed in this embodiment and the sub-resolution auxiliary graphics addition method proposed in the above embodiments belong to the same inventive concept. Technical details not described in detail in this embodiment can be found in the above embodiments, and this embodiment has the same beneficial effects as the above embodiments.

[0078] This embodiment provides a computer-readable storage medium storing a computer program that, when executed by a processor 301, implements the method for adding sub-resolution auxiliary graphics as described in the above embodiment.

[0079] This embodiment also provides a computer program product, which includes instructions that, when executed by a processor, implement the above-described method for adding sub-resolution auxiliary graphics.

[0080] Based on the above description of the implementation methods, those skilled in the art can clearly understand that the present invention can be implemented using software and necessary general-purpose hardware, and of course, it can also be implemented using hardware, but in many cases the former is a better implementation method. Based on this understanding, the technical solution of the present invention, or the part that contributes to the prior art, can be embodied in the form of a software product. This computer software product can be stored in a computer-readable storage medium, such as a computer floppy disk, read-only memory (ROM), random access memory (RAM), flash memory, hard disk, or optical disk, etc., including several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute the methods of the various embodiments of the present invention.

[0081] In summary, this embodiment provides a method for adding sub-resolution auxiliary graphics and an optical proximity correction method. First, a first layer of sub-resolution auxiliary graphics is added to at least one side of the main graphic according to the addition rules. Then, it is determined whether the first side of the first layer of sub-resolution auxiliary graphics meets the addition conditions. If not, the first graphic width and / or first graphic spacing set for the second layer of sub-resolution auxiliary graphics in the addition rules are adjusted so that the first side of the first layer of sub-resolution auxiliary graphics meets the addition conditions. Then, a second layer of sub-resolution auxiliary graphics is added to the first side of the first layer of sub-resolution auxiliary graphics according to the modified addition rules. An unexpected effect of this application is that the method for adding the second layer of sub-resolution auxiliary graphics is simpler, reduces wasted computing power, improves efficiency and the lithography process window, avoids situations where the second layer of sub-resolution auxiliary graphics cannot be added, and reduces conflicts between the first and second layers of sub-resolution auxiliary graphics.

[0082] It should be noted that the various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the systems disclosed in the embodiments, since they correspond to the methods disclosed in the embodiments, the descriptions are relatively simple, and relevant parts can be referred to the method section.

[0083] It should also be noted that although the present invention has been disclosed above with reference to preferred embodiments, these embodiments are not intended to limit the present invention. For any person skilled in the art, many possible variations and modifications can be made to the technical solutions of the present invention based on the disclosed technical content, or equivalent embodiments can be modified accordingly, without departing from the scope of the present invention. Therefore, any simple modifications, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the present invention shall still fall within the scope of protection of the present invention.

[0084] It should also be understood that, unless otherwise specified or indicated, the terms “first,” “second,” “third,” etc., in the specification are used only to distinguish the various components, elements, and steps in the specification, and not to indicate the logical or sequential relationships between the various components, elements, and steps.

[0085] Furthermore, it should be recognized that the terminology described herein is used only to describe particular embodiments and not to limit the scope of the invention. It must be noted that the singular forms “a” and “an” used herein and in the appended claims include plural bases unless the context clearly indicates otherwise. For example, a reference to “a step” or “an apparatus” means a reference to one or more steps or apparatuses, and may include secondary steps and secondary apparatuses. All conjunctions used should be understood in the broadest sense. Also, the word “or” should be understood to have the definition of logical “or” rather than logical “exclusive OR”, unless the context clearly indicates otherwise. Furthermore, implementation of the methods and / or devices in embodiments of the invention may include performing selected tasks manually, automatically, or in combination.

Claims

1. A method for adding sub-resolution auxiliary graphics, characterized in that, include: Obtain a target layout, wherein the target layout includes at least one main graphic; A first layer of sub-resolution auxiliary graphics is added to at least one side of the main graphic according to the addition rules; as well as, Determine whether the first side of the first sub-resolution auxiliary graphic meets the addition conditions. If not, adjust the first graphic width and / or first graphic spacing set for the second sub-resolution auxiliary graphic in the addition rules so that the first side of the first sub-resolution auxiliary graphic meets the addition conditions, and add the second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic according to the modified addition rules.

2. The method for adding sub-resolution auxiliary graphics according to claim 1, characterized in that, When the first side of the first layer sub-resolution auxiliary graphic does not have an interfering sub-resolution auxiliary graphic in the first direction, or when the first side of the first layer sub-resolution auxiliary graphic has the interfering sub-resolution auxiliary graphic in the first direction, and the distance between the first layer sub-resolution auxiliary graphic and the interfering sub-resolution auxiliary graphic in the first direction is greater than a first predetermined value, it is determined that the first side of the first layer sub-resolution auxiliary graphic meets the addition condition. as well as, When the first side of the first layer sub-resolution auxiliary graphic has the interfering sub-resolution auxiliary graphic in the first direction, and the distance between the first layer sub-resolution auxiliary graphic and the interfering sub-resolution auxiliary graphic in the first direction is less than or equal to the first predetermined value, it is determined that the first side of the first layer sub-resolution auxiliary graphic does not meet the addition condition. The interference sub-resolution auxiliary graphic is a sub-resolution auxiliary graphic that overlaps with the first layer sub-resolution auxiliary graphic in the second direction, and the interference sub-resolution auxiliary graphic is adjacent to the first layer sub-resolution auxiliary graphic in the first direction x.

3. The method for adding sub-resolution auxiliary graphics according to claim 2, characterized in that, The first predetermined value is greater than or equal to the sum of the width of the first graphic and twice the spacing between the first graphic.

4. The method for adding sub-resolution auxiliary graphics according to claim 1, characterized in that, The steps of adjusting the width of the first graphic and / or the spacing between the first graphic include: Increase one of the width of the first graphic and the spacing between the first graphic, and decrease the other of the width of the first graphic and the spacing between the first graphic.

5. The method for adding sub-resolution auxiliary graphics according to claim 4, characterized in that, The width and spacing of the first pattern are adjusted until the evaluation function characterizing the lithography process window reaches its maximum. The evaluation function is the product of a first deviation value and a first ratio. The first ratio is the ratio of a second deviation value to the critical dimension of the main pattern. The first deviation value is the difference between the maximum and minimum depth of field of the lithography process window. The second deviation value is the difference between the critical dimension of the main pattern and a third deviation value. The third deviation value is the difference between the maximum and minimum critical dimensions within the lithography process window.

6. The method for adding sub-resolution auxiliary graphics according to claim 1, characterized in that, The addition rule sets a second graphic width and a second graphic spacing for the first layer of sub-resolution auxiliary graphics; The first layer of sub-resolution auxiliary graphics is added based on the spacing between it and the main graphic, such that the spacing between the first layer of sub-resolution auxiliary graphics and the main graphic is the spacing of the second graphic. as well as, The second layer of sub-resolution auxiliary graphics is added based on the spacing between it and the first layer of sub-resolution auxiliary graphics, such that the spacing between the second layer of sub-resolution auxiliary graphics and the first layer of sub-resolution auxiliary graphics is the spacing between the first graphics.

7. The method for adding sub-resolution auxiliary graphics according to claim 6, characterized in that, The spacing between the second graphic is greater than the spacing between the first graphic.

8. The method for adding sub-resolution auxiliary graphics according to claim 6, characterized in that, After adjusting the spacing between the first patterns, the spacing between the first patterns is greater than or equal to the difference between the second ratio and the predetermined distance. The second ratio is the ratio of the lithography wavelength to the numerical aperture of the lithography machine, and the predetermined distance is the sum of the width of the second pattern and the spacing between the second patterns.

9. The method for adding sub-resolution auxiliary graphics according to claim 1, characterized in that, After adding the second sub-resolution auxiliary graphic, it is determined whether the first sub-resolution auxiliary graphic and the second sub-resolution auxiliary graphic conflict. If so, the first sub-resolution auxiliary graphic and / or the second sub-resolution auxiliary graphic in the conflict area are cleared or optimized.

10. An optical proximity correction method, characterized in that, The method for adding sub-resolution auxiliary graphics as described in any one of claims 1 to 9.

11. A system for adding sub-resolution auxiliary graphics, characterized in that, include: A map acquisition module is used to acquire a target map, wherein the target map includes at least one main graphic. The first graphics adding module is used to add a first layer of sub-resolution auxiliary graphics to at least one side of the main graphics according to the adding rules; as well as, The second graphic addition module is used to determine whether the first side of the first sub-resolution auxiliary graphic meets the addition conditions. If not, it adjusts the first graphic width and / or the first graphic spacing set for the second sub-resolution auxiliary graphic in the addition rules so that the first side of the first sub-resolution auxiliary graphic meets the addition conditions, and adds the second sub-resolution auxiliary graphic to the first side of the first sub-resolution auxiliary graphic according to the modified addition rules.

12. An electronic device, characterized in that, include: One or more actuators; Memory, used to store one or more programs; as well as, When the one or more programs are executed by the one or more executors, the one or more executors implement the method for adding sub-resolution auxiliary graphics as described in any one of claims 1 to 9.

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