Stripping liquid composition for positive photoresist and preparation method thereof

Abstract

The invention relates to the technical field of liquid crystal panel production, in particular to a stripping liquid composition for positive photoresist and a preparation method of the stripping liquid composition. The positive photoresist stripping liquid composition comprises the following raw material components: an alcohol amine solvent, a polar solvent and a metal corrosion inhibitor, a carbon dioxide adsorbent and a deoxidant are further included, so that amine degradation caused by contact between the liquid medicine and air in the production, transportation and use processes is inhibited, and the service life of the liquid medicine, namely the number of treated substrates, is prolonged; the metal ion chelating agent is further included, through the strong combination effect of the metal ion chelating agent and metal ions, the metal ions enter the chelating agent, a stable soluble compound is formed, and the catalytic effect of the metal ions on amine oxidative degradation is prevented. According to the stripping liquid composition disclosed by the invention, the stability of the alcohol amine is better in the production, transportation and use processes, namely the decline rate of the alcohol amine is slower, so that the service life of the liquid medicine is longer, and more substrates can be treated.

Description

Technical Field

[0001] This invention relates to the field of liquid crystal panel manufacturing technology, and more specifically to a stripping solution composition for positive photoresist and its preparation method. Background Technology

[0002] After the etching process of the Array stage in TFT-LCD manufacturing is completed, the stripping and removal of photoresist is essential. The stripping solution composition of the positive photoresist commonly used contains alkanolamines, polar solvents such as amides and alcohol ethers, as well as metal corrosion inhibitors. Alkylamines are used to break the bonds between photoresist molecules, causing the photoresist film to decompose. The stripping ability of alkylamines on photoresist is related to the number of active hydrogen atoms on the nitrogen atom of the amino group. The order of stripping ability is: primary amine > secondary amine > tertiary amine. Therefore, primary and secondary amines with active hydrogen atoms on the nitrogen atom are preferred. Polar solvents are used to wet the photoresist film and dissolve the photoresist molecules stripped from the substrate surface. Metal corrosion inhibitors are used to inhibit the dissolution and corrosion of metals such as aluminum and copper films by the stripping solution. The stripping solution cleans positive photoresist by spraying. The stripping solution is heated to a certain temperature in the machine's chemical tank, then enters the pipeline under the action of a pump, and is sprayed onto the substrate surface under a certain pressure to clean the photoresist. Finally, it flows back to the machine's chemical tank, and this cycle is repeated continuously.

[0003] However, the chemical solution comes into contact with air during production and transportation, especially during use, when it circulates in the machine. The liquid surface in the tank and the liquid stream during spraying are directly exposed to air. When the chemical solution comes into contact with air, it reacts with carbon dioxide and oxygen, leading to degradation, which in turn causes amine degradation. Amine degradation reduces the amine content in the chemical solution. When the amine content drops to a certain level, under the set process conditions, the chemical solution's ability to peel off the photoresist film decreases. This reduced peeling ability leads to incomplete cleaning of the photoresist on the substrate surface, resulting in residues. Ultimately, this limits the service life of the chemical solution, i.e., the number of substrates that can be processed. Specifically: (1) The alcohol amine in the drug solution will adsorb carbon dioxide in the air, that is, the alcohol amine reacts with carbon dioxide. Primary and secondary amines react with carbon dioxide to generate carbamate. Carbamate can also react with the metal film on the substrate surface, causing the metal to be corroded. That is, carbamate forms a soluble complex with the metal, which promotes the corrosion of the metal. The reaction mechanism is: the weakly basic organic amine reacts with the weakly acidic gas CO2 to form a neutralization reaction. Specifically: ① Primary amine: 2RNH2+CO2→RNHCOO - +RNH3 + That is, primary amines react with CO2 to produce carbamate RNHCOO. - ② Secondary amine: 2R1R2NH + CO2 → R1R2NH2 - +R1R2NCOO -That is, secondary amines react with CO2 to produce carbamate ions R1R2NCOO - ; (2) The alkanolamines in the solution will react with oxygen in the air, that is, the oxidative degradation of the amines, which leads to a decrease in the amine content in the solution; it will also cause the solution to foam and increase in viscosity, thus affecting the fluidity of the solution and further affecting the cleaning ability of the solution; when the solution peels off the photoresist on the surface of the metal layer, the metal ion content in the solution will gradually increase, and metal ions such as Fe, Cu, Al, Mo, Ag will catalyze the oxidative degradation of the amines, thus accelerating the degradation rate. The reaction mechanism is: amines react with oxygen to undergo redox reactions; amine oxidative degradation generally produces carboxylic acids such as formic acid, acetic acid, methanolic acid, oxalic acid, etc., and also produces volatile substances such as ammonia, methylamine, dimethylamine, etc.; the oxidative degradation reactions of primary amines in alkanolamines are mainly dealkylation reactions, addition reactions, and piperazine formation reactions; the oxidative degradation reactions of secondary and tertiary amines in alkanolamines are mainly demethylation, methylation reactions, dealkylation reactions, addition reactions, ring-closing reactions, and methyl-substituted carboxyethyl reactions. Taking monoethanolamine (MEA) as an example, its oxidative degradation products include formic acid, formaldehyde, formamide, acetic acid, vinyl alcohol, acetaldehyde, glycine, glycolic acid, ethoxylic acid, oxalic acid, etc.

[0004] Therefore, there is an urgent need to develop a positive photoresist stripping solution stabilization system that can effectively inhibit the reaction of alkanolamines with carbon dioxide and oxygen, while reducing the catalytic effect of metal ions, maintaining the stripping solution's ability to strip photoresist, preventing foaming and abnormal viscosity changes, thereby reducing photoresist residue on the substrate surface, significantly extending the service life of the stripping solution, reducing production costs in the TFT-LCD manufacturing process, and improving product yield. Summary of the Invention

[0005] To achieve one of the above objectives, this invention provides a stripping solution composition for positive photoresist and a method for preparing the same. The technical solution of this invention is achieved as follows: In a first aspect, the present invention provides a stripping solution composition for positive photoresist, wherein the raw materials of the stripping solution composition include an alkanolamine solvent, a polar solvent, a metal corrosion inhibitor, a carbon dioxide adsorbent, and an oxygen scavenger; the polar solvent includes amide solvents and alcohol ether solvents; and the carbon dioxide adsorbent includes a functionalized ionic liquid with an amino functional group.

[0006] Specifically, the alkanolamine solvent is used to initiate the stripping of the positive photoresist film, that is, alkanolamine molecules can enter the interior of the photoresist, cut the links between photoresist molecules, and cause the film to decompose. Primary and secondary amines with active hydrogen on the nitrogen atom are preferred, and primary amines are even more preferred. The polar solvent is used to further dissolve the photoresist particles obtained after the alkanolamine decomposes the photoresist film. The metal corrosion inhibitor is used to inhibit the dissolution and corrosion of metals such as aluminum, copper, and silver by alkanolamine in the solution.

[0007] Specifically, the carbon dioxide adsorbent reacts very rapidly with carbon dioxide. When the drug solution comes into contact with air, it can react with carbon dioxide in the air and also adsorb carbon dioxide dissolved in the drug solution, inhibiting the reaction between the alkanolamine and carbon dioxide and preventing the degradation of the alkanolamine. Compared with alkanolamine, the oxygen scavenger can react with oxygen more rapidly, avoiding the oxidative degradation of the alkanolamine.

[0008] Preferably, the carbon dioxide adsorbent is a functionalized ionic liquid with basic amino functional groups. This functionalized ionic liquid can not only physically adsorb carbon dioxide, but also adsorb carbon dioxide through chemical bonding. The specific adsorption mechanism is as follows: ① Physical adsorption is achieved by capturing carbon dioxide through van der Waals forces such as dispersion forces between the ionic liquid groups and carbon dioxide molecules, and electrostatic forces between the anions and cations in the ionic liquid groups and carbon dioxide molecules; ② Chemical bonding is achieved by adsorbing carbon dioxide through Lewis acid-base reactions between the basicity of the amino groups in the ionic liquid and the acidity of carbon dioxide.

[0009] Preferably, the raw materials of the stripping liquid composition further include a metal ion chelating agent; the metal ion chelating agent includes quinoline compounds.

[0010] Specifically, quinoline is a conjugated polyaromatic heterocyclic compound containing a fused ring structure, which can react with Al 3+ Cu 2+ Ag + Zn 2+ The metal ions coordinate with each other, achieving the effect of metal ion chelation, which further prevents the catalytic effect of metal ions on the oxidative degradation of amines.

[0011] More preferably, the carbon dioxide adsorbent accounts for 3-6% of the total mass of the stripping liquid composition; and the oxygen scavenger accounts for 2-5% of the total mass of the stripping liquid composition.

[0012] More preferably, the metal ion chelating agent accounts for 0.3 to 0.9% of the total mass of the stripping liquid composition.

[0013] Preferably, the raw materials of the stripping liquid composition, calculated as 100% by mass, include 7-10% alkanolamine, 35-45% amide solvent, 35-45% alcohol ether solvent, 0.2-0.5% metal corrosion inhibitor, 3-6% carbon dioxide adsorbent, 2-5% oxygen remover, and 0.3-0.9% metal ion chelating agent.

[0014] More preferably, the functionalized ionic liquid with an amino functional group includes 1-(3-propylamino)-3-butylimidazolium tetrafluoroborate ([NH2pbim][BF4]), 1-(1-aminopropyl)-3-methylimidazolium bromide (NH2p-mim][Br]), 1-aminopropyl-3-methylimidazolium trifluoromethanesulfonylimide ([NH2p-mim][NTf2]), or 1-aminopropyl-3-methylimidazolium hexafluorophosphate ([NH2p-mim][PF6]).

[0015] Specifically, the functionalized ionic liquid is preferably an ionic liquid with an amino group on the imidazole ring, and its reaction principle with carbon dioxide is as follows:

[0016] Wherein, X includes Br - NTf2 - BF4 - PF6 - .

[0017] Specifically, the molecular structures of [NH2pbim][BF4], NH2p-mim][Br], [NH2p-mim][NTf2], and [NH2p-mim][PF6] are as follows: , , , .

[0018] Preferably, the oxygen scavenger includes carbazide (CHZ), oxime compounds, isoascorbic acid (ErA), nitrogen-tetrasubstituted phenylenediamines, or N-isopropylhydroxylamine (NIPHA); the oxime compounds include dimethyl ketoxime, acetaldehyde oxime, propionaldehyde oxime, butyraldehyde oxime, or methyl ethyl ketone oxime.

[0019] More preferably, the nitrogen-tetrasubstituted phenylenediamine class includes N,N,N',N'-1,4-tetramethyl-p-phenylenediamine (TMPD).

[0020] Specifically, the reaction principle of the carbonyl hydrazine with oxygen is as follows:

[0021] Specifically, the reaction mechanism of acetaldehyde oxime with oxygen is as follows:

[0022] Specifically, the reaction mechanism of the dimethyl ketoxime with oxygen is as follows:

[0023] Specifically, the molecular structural formula of the isoascorbic acid includes and Its simplified formula is R1COHCOHR2, and the reaction principle of R1COHCOHR2 with oxygen is as follows:

[0024] Specifically, the reaction mechanism of N-isopropylhydroxylamine with oxygen is as follows:

[0025] Furthermore, the product 2(CH3)2C=NOH from the reaction of N-isopropylhydroxylamine with oxygen will continue to react with oxygen, as shown below:

[0026] More preferably, the metal ion chelating agent includes 8-hydroxyquinoline, 2-methyl-8-hydroxyquinoline, 5-chloro-8-hydroxyquinoline, 5-chloro-7-iodo-8-hydroxyquinoline, 5,7-dibromo-8-hydroxyquinoline, or 8-amino-quinoline.

[0027] Preferably, the amine solvent includes monoethanolamine, monoisopropanolamine, 2-amino-2-methyl-1-propanol, or 3-aminopropanol; the amide solvent includes acetamide, formamide, N-methylformamide, N-methylacetamide, N-methylpropionamide, N,N-dimethylacetamide, N,N-diethylacetamide, N-ethylformamide, N-methylpyrrolidone, or N-ethyl-2-pyrrolidone; and the alcohol ether solvent includes diethylene glycol monoisopropanol. The metal corrosion inhibitors include methyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol ether, ethylene glycol butyl ether, dipropylene glycol monomethyl ether, or ethylene glycol monomethyl ether; the metal corrosion inhibitors include benzotriazole, 5-aminotetrazolium, 5-methyltetrazolium, imidazole, pyrazole, methylbenzotriazole, 4-methyldiphenylimidazolium, 3-amino-1,2,4-triazole, 5-phenyltetrazolium, 2-methylbenzimidazole, or 3,5-diamino-1,2,4-triazole.

[0028] Specifically, the metal corrosion inhibitor is an organic corrosion inhibitor containing a nitrogen heterocycle. The lone pairs of electrons in the nitrogen atoms on the heterocycle coordinate with the metal and adsorb onto the surface of the metal layer, forming a strong chemical adsorption layer that prevents the solution from contacting the metal and thus inhibits corrosion.

[0029] In a second aspect, the present invention provides a method for preparing the stripping solution composition for positive photoresist as described in the first aspect, comprising the following steps: adding a polar solvent to a container, sequentially adding a metal corrosion inhibitor, a carbon dioxide adsorbent and an oxygen remover while stirring, stirring evenly and then adding an alkanolamine solvent, and finally adding a metal ion chelating agent, stirring evenly to obtain the stripping solution composition.

[0030] Compared with the prior art, the advantages of the present invention are as follows: (1) The stripping liquid composition of the present invention includes a carbon dioxide adsorbent and an oxygen scavenger to inhibit amine degradation caused by contact with air during production, transportation and use, thereby increasing the lifespan of the liquid, i.e. the number of substrates that can be treated.

[0031] (2) The stripping liquid composition of the present invention also includes a metal ion chelating agent. Through the strong binding effect between the metal ion chelating agent and the metal ion, the metal ion enters into the interior of the chelating agent to form a stable soluble compound, thereby preventing the catalytic effect of the metal ion on the oxidative degradation of amine.

[0032] (3) The stripping liquid composition of the present invention has better stability of alkanolamine during production, transportation and use, that is, the alkanolamine decreases at a slower rate, so as to make the liquid have a longer life and can process more substrates. Attached Figure Description

[0033] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0034] Figure 1 This is a SEM image of the initial thickness of the AlMo film layer on the glass substrate of the present invention. Figure 2 SEM images of the AlMo film layer immersion in the glass substrate of the present invention after 200s in the stripping solution prepared in the examples and comparative examples of the present invention. Figure 3 This is a SEM image of the initial thickness of the Cu film layer on the glass substrate of the present invention. Figure 4 SEM images of the Cu film layer immersion in the glass substrate of the present invention after 200 s in the stripping solution prepared in the examples and comparative examples of the present invention. Figure 5 This is a comparison chart showing the stripping performance of the stripping solutions prepared in the examples and comparative examples on photoresist. Figure 6 This is a comparison chart showing the stripping performance of the stripping solutions prepared in the examples and comparative examples on photoresist. Detailed Implementation

[0035] Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0036] It should be noted that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. Furthermore, in the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0037] In this document, the terms “containing,” “comprising,” or “including” are open-ended expressions, meaning they include the contents specified in this invention but do not exclude other aspects.

[0038] In this document, the terms “optional,” “optionally,” or “optional” generally refer to an event or condition that may, but may not, occur, and the description includes both cases in which the event or condition occurs and cases in which the event or condition does not occur.

[0039] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present invention.

[0040] All materials used in this invention were purchased from the market. Among them, [NH2pbim][BF4] and [NH2p-mim][NTf2] were prepared according to the experimental section of the literature "Performance of Amino Functional Ionic Liquids in CO2 Absorption"; carbazide, dimethyl ketoxime, and N-isopropylhydroxylamine were purchased from Shanghai Titan Technology Co., Ltd.; 8-hydroxyquinoline, 5-chloro-8-hydroxyquinoline, and 8-amino-quinoline were purchased from Shanghai Maclean Biochemical Technology Co., Ltd.

[0041] Table 1. Raw materials and proportions of the embodiments and comparative examples of the present invention.

[0042]

[0043] According to the formulations of the embodiments and comparative examples in Table 1 above, 2 kg of stripping solution was prepared. The specific preparation steps of Examples 1-7 and Comparative Examples 1-7 of this invention are as follows: Polar solvents, namely amides and alcohol ethers, are added to an open glass beaker with a capacity of 5 L. Under stirring, metal corrosion inhibitors, carbon dioxide adsorbents, and oxygen scavengers are added sequentially. After stirring evenly, an alcohol amine solvent is added, and finally a metal ion chelating agent is added and stirred evenly. To simulate the metal ion contamination caused by the metal film layer on the substrate surface during actual production, resulting in a certain amount of metal ions in the stripping solution, which catalyzes the decomposition of alcohol amines, 0.5 g of copper powder is added to the above stripping solution and stirred until completely dissolved to obtain the stripping solution.

[0044] Among them, comparative examples 1, 3, 5, and 6 skipped the addition of carbon dioxide adsorbent, comparative examples 2, 3, 5, and 7 skipped the addition of oxygen remover, and comparative examples 1, 2, 4, and 5 skipped the addition of metal ion chelating agent.

[0045] To verify the corrosion effect of the stripping solutions prepared in the above examples and comparative examples on metals, glass substrates with aluminum-molybdenum (AlMo) and copper (Cu) films, respectively, were immersed in the above solutions and maintained at 60°C for 200 seconds. After removal, they were washed with water for 30 seconds and dried. The changes in the thickness of the metal films were confirmed using scanning electron microscopy. The results are shown in Table 2 below. Figures 1-4 .

[0046] Table 2. Corrosion of metals by the stripping solutions prepared in the examples and comparative examples.

[0047] As shown in Table 2, the theoretical thickness of the AlMo film is 470 nm, and the theoretical thickness of the Cu film is 360 nm. Scanning electron microscopy showed that the thickness of both the AlMo and Cu films did not decrease before and after immersion. Therefore, the stripping solutions in the above examples and comparative examples did not corrode the aluminum-molybdenum and copper films.

[0048] Further verification was conducted on the peeling ability of the peeling solution and the changes in the amine content of the examples and comparative examples.

[0049] The specific steps are as follows: The solutions of the examples and comparative examples are heated continuously at 60°C in an open glass beaker, and stirred continuously at 300 rpm using magnetic stirring to ensure continuous contact between the solution and air; the peeling ability of the solution on positive photoresist is verified every 4 hours, and the change in the content of alkanolamine in the solution is detected by gas chromatography.

[0050] The method for verifying the peeling ability of the chemical solution was as follows: A 1μm thick positive photoresist was spin-coated onto the surface of a 5cm×5cm glass substrate, and the film was cured in an oven at 200℃ for 5 minutes to obtain a substrate sample with a photoresist film layer. Initially (0h), a substrate sample with photoresist was immersed in the above continuously stirred chemical solution. After 200s, the substrate was removed, washed with water for 30s, and the surface was dried. The photoresist film layer on the substrate surface was observed to see if it was completely peeled off. This operation was repeated every 4 hours thereafter until the chemical solution was stirred for 24 hours. The results are shown in Table 3 and below. Figures 5-6 As shown.

[0051] The method for detecting changes in the content of alcoholic amines in the drug solution was as follows: at the initial stage (0h), 1g of the drug solution sample was taken and the alcoholic amines in the sample were quantified using a gas chromatograph; similarly, this operation was repeated every 4h thereafter until the drug solution was stirred for 24h; the results are shown in Table 4.

[0052] Table 3. Test results of the peeling ability of the peeling solutions prepared in the examples and comparative examples.

[0053] Table 4. Results of Alkylamine Content Detection in the Stripping Liquids Prepared in Examples and Comparative Examples

[0054] The results showed that the amine content of the stripping solutions prepared in Examples 1-7 decreased by 22%, 23%, 23%, 23%, 13%, 16%, and 19% respectively after stirring for 24 hours compared with the initial content. However, the stripping ability verification results showed that the solutions from the initial stage to 24 hours could completely strip the photoresist. Compared with the decrease in amine content and the presence of photoresist residue in the comparative examples, this invention proves that the present invention can improve the lifespan of the solution, i.e., the number of substrates that can be processed, by slowing down the rate of amine degradation.

[0055] Comparative Example 1 included an oxygen scavenger, but because no carbon dioxide adsorbent and metal ion chelating agent were added, the alkanolamine content decreased faster than in Example 1. The alkanolamine content decreased by 55% after 24 hours, resulting in a rapid decrease in the stripping ability of the solution. Furthermore, photoresist residue appeared on the substrate surface after stripping at 16 hours.

[0056] Comparative Example 2 included a carbon dioxide adsorbent, but due to the absence of an oxygen scavenger and a metal ion chelator, the alkanolamine content decreased at a faster rate compared to Example 2, decreasing by 51% in 24 hours. This resulted in a relatively faster decrease in the stripping ability of the solution, and photoresist residue appeared on the substrate surface after stripping at 20 hours.

[0057] Comparative Example 3 did not add carbon dioxide adsorbent and oxygen remover, but only added metal ion chelating agent. Compared with Example 1, the alkanolamine content decreased at a faster rate, decreasing by 71% in 24 hours. This resulted in a rapid decrease in the stripping ability of the solution, and photoresist residue appeared on the substrate surface after stripping at 12 hours. However, compared with Comparative Example 5, the decrease in amine content in 24 hours was relatively smaller, indicating that the addition of metal ion chelating agent could inhibit the rate of metal ion-catalyzed amine oxidation degradation in the solution.

[0058] Comparative Example 4 did not add a metal ion chelating agent, but added an oxygen scavenger and a carbon dioxide adsorbent. Compared with Example 3, the content of alkanolamine decreased at a slightly faster rate, with the content of alkanolamine decreasing by 28% in 24 hours. However, the solution from the beginning to 24 hours could completely peel off the photoresist film layer.

[0059] Comparative Example 5 did not add carbon dioxide adsorbent, oxygen remover, or metal ion chelating agent, so the amine content in the solution decreased very quickly, with a 77% decrease in 24 hours. Moreover, at 12 hours, the solution's peeling ability was too weak due to the low content of alcohol amines, resulting in residues after the substrate sample was peeled off.

[0060] Comparative Example 6 did not add carbon dioxide adsorbent but added oxygen scavenger and metal ion chelating agent. The rate of decrease of alkanolamine content was relatively fast, at 48%, resulting in stripping residue after 20 hours. In contrast to Comparative Example 1, Comparative Example 6 used metal ion chelating agent, which inhibited the catalytic effect of metal ions on the degradation of alkanolamine. Therefore, the rate of decrease of alkanolamine was relatively slower.

[0061] Comparative Example 7, which did not add an oxygen remover but added a carbon dioxide adsorbent and a metal ion chelating agent, experienced a faster rate of decrease in alkanolamine content, at 39%, with stripping residue appearing within 24 hours. In contrast to Comparative Example 2, Comparative Example 7 used a metal ion chelating agent, which inhibited the catalytic effect of metal ions on the degradation of alkanolamines, resulting in a relatively slower rate of decrease in alkanolamine content.

[0062] The embodiments described above are some, but not all, of the embodiments of the present invention. The detailed description of the embodiments of the present invention is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

Claims

1. A stripper composition for a positive photoresist, characterized by comprising: The raw materials of the stripping liquid composition include alcohol amine solvent, polar solvent, metal corrosion inhibitor, carbon dioxide adsorbent and oxygen scavenger; the polar solvent includes amide solvent and alcohol ether solvent; the carbon dioxide adsorbent includes functionalized ionic liquid with amino functional group.

2. The stripper composition for a positive photoresist according to claim 1, wherein The raw materials of the stripping liquid composition further include metal ion chelating agent; the metal ion chelating agent includes quinoline compound.

3. The stripper composition for a positive photoresist according to claim 1, wherein The carbon dioxide adsorbent accounts for 3-6% of the total mass of the stripping liquid composition; the oxygen scavenger accounts for 2-5% of the total mass of the stripping liquid composition.

4. The stripper composition for a positive photoresist according to claim 2, wherein The metal ion chelating agent accounts for 0.3-0.9% of the total mass of the stripping liquid composition.

5. The stripper composition for a positive photoresist according to claim 1, wherein The raw materials of the stripping liquid composition include alcohol amine 7-10%, amide solvent 35-45%, alcohol ether solvent 35-45%, metal corrosion inhibitor 0.2-0.5%, carbon dioxide adsorbent 3-6%, oxygen scavenger 2-5% and metal ion chelating agent 0.3-0.9%, calculated as 100% of mass percentage.

6. The stripper composition for a positive photoresist according to claim 1, wherein The functionalized ionic liquid with amino functional group includes 1-(3-propylamino)-3-butyl imidazole tetrafluoroborate, 1-(1-aminopropyl)-3-methyl imidazole bromide, 1-aminopropyl-3-methyl imidazole trifluoromethanesulfonimide or 1-aminopropyl-3-methyl imidazole hexafluorophosphate.

7. The stripper composition for a positive photoresist according to claim 1, wherein The oxygen scavenger includes carbohydrazide, oxime compound, erythorbic acid, nitrogen tetra-substituted phenylenediamine or N-isopropyl hydroxylamine; the oxime compound includes dimethyl ketone oxime, acetaldoxime, propionaldoxime, butyrodoxime or methyl ethyl ketone oxime.

8. The stripper composition for a positive photoresist according to claim 2, wherein The metal ion chelating agent includes 8-hydroxyquinoline, 2-methyl-8-hydroxyquinoline, 5-chloro-8-hydroxyquinoline, 5-chloro-7-iodo-8-hydroxyquinoline, 5,7-dibromo-8-hydroxyquinoline or 8-amino-quinoline.

9. The stripper composition for a positive photoresist according to claim 1, wherein The alcohol amine solvent includes monoethanolamine, monoisopropanolamine, 2-amino-2-methyl-1-propanol or 3-aminopropanol; the amide solvent includes acetamide, formamide, N-methyl formamide, N-methyl acetamide, N-methyl propionamide, N,N-dimethyl acetamide, N,N-diethyl acetamide, N-ethyl formamide, N-methyl pyrrolidone or N-ethyl-2-pyrrolidone; the alcohol ether solvent includes diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol ether, ethylene glycol butyl ether, dipropylene glycol monomethyl ether or ethylene glycol monomethyl ether; the metal corrosion inhibitor includes benzotriazole, 5-amino tetrazole, 5-methyl tetrazole, imidazole, pyrazole, methyl benzotriazole, 4-methyl diphenyl imidazole, 3-amino-1,2,4-triazole, 5-phenyl tetrazole, 2-methyl benzimidazole or 3,5-diamino-1,2,4-triazole.

10. A method for producing the stripper solution composition for a positive photoresist according to any one of claims 1 to 9, characterized by, The method includes the following steps: putting polar solvent into a container, putting metal corrosion inhibitor, carbon dioxide adsorbent and oxygen scavenger into the container in sequence under stirring, putting alcohol amine solvent into the container after stirring uniformly, finally putting metal ion chelating agent into the container, stirring uniformly to obtain the stripping liquid composition.

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