Low-transmittance high-performance three-silver Low-E glass and preparation method thereof

Abstract

The invention relates to the field of building energy-saving glass materials, in particular to low-transmittance high-performance three-silver Low-E glass and a preparation method thereof.The Low-E glass comprises a glass substrate and a coating film, and the coating film is arranged on the surface of the glass substrate; the coating film sequentially comprises a titanium oxide layer, a first seed layer, a first silver functional layer, a first protective layer, a first dielectric layer, a second seed layer, a second silver functional layer, a copper layer, a first absorption layer, a second protective layer, a third seed layer, a third silver functional layer, a second absorption layer, a third protective layer and a second dielectric layer from the glass substrate to the outside, and the thickness of the titanium oxide layer is 10-20 nm. The Low-E glass prepared by the invention has the characteristics of low visible light transmittance, low solar heat gain coefficient, low internal and external reflectivity, neutral color and suitability for climate of high-heat and high-sunshine areas, the low solar heat gain coefficient can greatly reduce the refrigeration load of an air conditioner, the energy-saving effect is obvious, and the application prospect is wide. The invention aims to provide an extreme sunshade and heat insulation solution for doors, windows and curtain walls of high-end buildings.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of building energy-saving glass materials, in particular to a low-transmittance high-performance three-silver Low-E glass and a preparation method thereof. BACKGROUND

[0002] Low-E glass, also known as low-emissivity glass, is a product coated on a high-quality float glass substrate with a multi-layer film system containing a medium layer and other metal layers with Ag as the functional layer. The core technical challenge of low-transmittance three-silver Low-E glass is to balance multiple performances while reducing light transmittance: high reflectivity (external reflection exceeding 20%) often leads to light pollution in pursuit of low solar heat gain coefficient; color deviation such as over-yellow, over-blue, or over-gray often occurs, affecting architectural aesthetics; in extreme hot climates, the solar heat gain coefficient (SHGC) is difficult to stabilize below 0.20, and it is difficult to balance low reflectivity and color neutrality.

[0003] Chinese patent CN115650581A discloses a sun-shading low-emissivity low-transmittance coated glass, which achieves certain sun-shading and low-emissivity effect through a nano-metal oxide layer, but the solar heat gain coefficient is higher than 0.2, which is difficult to meet the low heat transfer demand. Chinese patent CN115401965A discloses a sun-shading low-emissivity low-transmittance coated glass, which coats a fourth medium layer with silicon nitride and a fifth medium layer with titanium trioxide, so that the glass has good radiation resistance compared with traditional glass, thereby achieving good sun-shading effect, very low visible light transmittance, strong ultraviolet absorption, reduced visible light transmittance, and excellent ultraviolet radiation resistance. Although the glass has certain low-emissivity effect, the emissivity is still high and the performance is not as good as high-performance.

[0004] Existing low-transmittance three-silver Low-E glass generally has the problem of difficult coordination and optimization of sun-shading coefficient and heat transfer performance, which cannot meet the actual demand for low heat transfer and high sun-shading in the building field. SUMMARY

[0005] The present application aims to overcome the problem of difficult coordination and optimization of sun-shading coefficient and heat transfer performance of existing low-transmittance three-silver Low-E glass, which cannot meet the actual demand for low heat transfer and high sun-shading in the building field, and provides a low-transmittance high-performance three-silver Low-E glass and a preparation method thereof.

[0006] In a first aspect, the present application provides a low-transmittance high-performance three-silver Low-E glass, comprising a glass substrate and a coating film, the coating film being arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in order: The titanium oxide layer, the first seed layer, the first silver functional layer, the first protective layer, the first medium layer, the second seed layer, the second silver functional layer, the copper layer, the first absorption layer, the second protective layer, the third seed layer, the third silver functional layer, the second absorption layer, the third protective layer, the second medium layer, the thickness of the titanium oxide layer is 10-20 nm.

[0007] In the technical scheme of the present application, titanium oxide is used as the bottom layer of the film layer, and its high refractive index characteristics are used to cooperate with other medium and functional materials to accurately control the interference effect of the film layer, solve the technical contradiction that the existing low-transmittance three-silver glass cannot simultaneously have extremely low solar heat gain coefficient, low internal and external reflectivity and neutral color, and achieve highly synergistic optimization in optical performance, thermal performance and visual appearance, thereby providing a low-transmittance high-performance three-silver Low-E glass which is optimized for tropical regions, can significantly reduce building cooling energy consumption and has elegant appearance.

[0008] As a preferred scheme of the present application, the first seed layer, the second seed layer and the third seed layer are zinc oxide layers.

[0009] As a preferred scheme of the present application, the thickness of the first seed layer is 10-15 nm, the thickness of the second seed layer is 10-20 nm, and the thickness of the third seed layer is 10-20 nm.

[0010] As a preferred scheme of the present application, the thickness of the first silver functional layer is 6-10 nm, the thickness of the second silver functional layer is 8-15 nm, and the thickness of the third silver functional layer is 10-20 nm.

[0011] As a preferred scheme of the present application, the first protective layer, the second protective layer and the third protective layer are AZO protective layers, and the AZO (Aluminium-doped Zinc Oxide) protective layer is an aluminum-doped zinc oxide protective layer.

[0012] As a preferred scheme of the present application, the thickness of the first protective layer is 3-10 nm, the thickness of the second protective layer is 10-20 nm, and the thickness of the third protective layer is 5-10 nm.

[0013] As a preferred scheme of the present application, the first medium layer and the second medium layer are silicon nitride layers, the thickness of the first medium layer is 20-40 nm, and the thickness of the second medium layer is 20-40 nm.

[0014] As a preferred scheme of the present application, the thickness of the copper layer is 3-10 nm.

[0015] As a preferred scheme of the present application, the first absorbing layer and the second absorbing layer are nickel-chromium absorbing layers, the thickness of the first absorbing layer is 2-5 nm, and the thickness of the second absorbing layer is 1-5 nm.

[0016] As a preferred scheme of the present application, the coating further comprises a zinc tin oxide layer, the zinc tin oxide layer is arranged between the second protective layer and the third seed layer, and the thickness of the zinc tin oxide layer is 40-60 nm. The arrangement and thickness range of the zinc tin oxide layer can effectively improve the adhesion and stability of the third silver functional layer, reduce the thickness of the third seed layer, enhance the conductive performance of the film layer, and simultaneously synergistically control the optical parameters (such as reducing reflectivity and optimizing color neutrality) of the glass, so as to achieve the performance balance of ultra-low solar heat gain coefficient and low emissivity.

[0017] As a preferred scheme of the present application, the coating comprises, from the glass substrate outward, in sequence: a titanium oxide layer with a thickness of 10-20 nm; a first seed layer which is a zinc oxide layer with a thickness of 10-15 nm; a first silver functional layer with a thickness of 6-10 nm; a first protective layer which is an AZO protective layer with a thickness of 3-10 nm; a first dielectric layer which is a silicon nitride layer with a thickness of 20-40 nm; a second seed layer which is a zinc oxide layer with a thickness of 10-20 nm; a second silver functional layer with a thickness of 8-15 nm; a copper layer with a thickness of 3-10 nm; a first absorbing layer which is a nickel-chromium absorbing layer with a thickness of 2-5 nm; a second protective layer which is an AZO protective layer with a thickness of 10-20 nm; a zinc tin oxide layer with a thickness of 40-60 nm; a third seed layer which is a zinc oxide layer with a thickness of 10-20 nm; a third silver functional layer with a thickness of 10-20 nm; a second absorbing layer which is a nickel-chromium absorbing layer with a thickness of 1-5 nm; a third protective layer which is an AZO protective layer with a thickness of 5-10 nm; a second dielectric layer which is a silicon nitride layer with a thickness of 20-40 nm.

[0018] In the technical scheme, by using high refractive index material titanium oxide as the bottom layer, and matching with other medium and functional materials, the thickness ratio between the medium layer and the metal layer is adjusted through the interference effect of light, and finally the target film structure is obtained, so that the three-silver Low-E glass film system with low visible light transmittance, low solar heat gain coefficient, low internal and external reflectivity and neutral color can be realized.

[0019] As a preferred scheme of the present application, the solar heat gain coefficient of the Low-E glass is not more than 0.2. Preferably, the solar heat gain coefficient of the Low-E glass is 0.15-0.18. In the technical scheme, the solar heat gain coefficient range can effectively reduce the summer indoor solar radiation heat of the building, reduce the air conditioning energy consumption, and at the same time, good light transmittance and visual comfort are considered, and it is especially suitable for the building energy saving demand in high temperature and hot regions.

[0020] As a preferred scheme of the present application, the transmittance color of the Low-E glass is neutral gray, the transmittance T is in the range of [30, 35], the transmittance color a value is in the range of [-2, -1], and the b value is in the range of [-1, 1]; the indoor reflectance R is in the range of [3, 5], and the outdoor reflectance R is in the range of [10, 15].

[0021] In a second aspect, the present application provides a preparation method of a low-transmittance high-performance three-silver Low-E glass, comprising the following steps: S1, using a magnetron sputtering process to deposit a titanium oxide layer with a thickness of 10-20 nm on the surface of the glass substrate; S2, using a magnetron sputtering process to deposit a first seed layer with a thickness of 10-15 nm on the top surface of the titanium oxide layer; S3, using a magnetron sputtering process to deposit a first silver functional layer with a thickness of 6-10 nm on the top surface of the first seed layer; S4, using a magnetron sputtering process to deposit a first protective layer with a thickness of 3-10 nm on the top surface of the first silver functional layer; S5, using a magnetron sputtering process to deposit a first medium layer with a thickness of 20-40 nm on the top surface of the first protective layer; S6, using a magnetron sputtering process to deposit a second seed layer with a thickness of 10-20 nm on the top surface of the first medium layer; S7, using a magnetron sputtering process to deposit a second silver functional layer with a thickness of 8-15 nm on the top surface of the second seed layer; S8, using a magnetron sputtering process to deposit a copper layer with a thickness of 3-10 nm on the top surface of the second silver functional layer; S9, using a magnetron sputtering process to deposit a first absorption layer with a thickness of 2-5 nm on the top surface of the copper layer; S10, a second protective layer with a thickness of 10-20 nm is plated on the top surface of the first absorbing layer by using a magnetron sputtering process; S11, a third seed layer with a thickness of 10-20 nm is plated on the top surface of the second protective layer by using a magnetron sputtering process; S12, a third silver functional layer with a thickness of 10-20 nm is plated on the top surface of the third seed layer by using a magnetron sputtering process; S13, a second absorbing layer with a thickness of 1-5 nm is plated on the top surface of the third silver functional layer by using a magnetron sputtering process; S14, a third protective layer with a thickness of 5-10 nm is plated on the top surface of the second absorbing layer by using a magnetron sputtering process; S15, a second dielectric layer with a thickness of 20-40 nm is plated on the top surface of the third protective layer by using a magnetron sputtering process.

[0022] As a preferred scheme of the present application, the glass substrate is cleaned and dried before film plating.

[0023] As a preferred scheme of the present application, argon and oxygen mixed gas is used in step S1, the flow ratio of argon and oxygen is 1000-1500:50, and the vacuum degree is lower than 3x10 -6 mbar.

[0024] Compared with the prior art, the present application has the following beneficial effects: 1. The present application provides low-transmittance high-performance three-silver Low-E glass, which has low visible light transmittance, low solar heat gain coefficient, low internal and external reflectivity, and color neutrality, is suitable for the climate characteristics of high heat and high sunshine in the Middle East, India and other regions, and has a solar heat gain coefficient of not more than 0.2. The low solar heat gain coefficient means that the solar radiation heat entering the room is very small, which can greatly reduce the air conditioning cooling load and has a significant energy-saving effect, aiming to provide an extreme sun-shading and heat-insulating solution for high-end building doors and windows and curtain walls.

[0025] 2. The present application provides low-transmittance high-performance three-silver Low-E glass, which has very low internal and external reflectivity while providing moderate lighting, reduces glare pollution, and provides more comfortable visual experience indoors and outdoors, and excellent optical comfort.

[0026] 3. The present application provides low-transmittance high-performance three-silver Low-E glass, which successfully solves the color distortion problem commonly found in low-transmittance products, has neutral appearance color, is more easily coordinated with modern architectural style, and improves the architectural grade. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 Fig. 1 is a structural schematic diagram of low-transmittance high-performance three-silver Low-E glass in Embodiment 1 of the present application; Figure 2 Structure diagram of low-transmission high-performance three-silver Low-E glass in embodiment 2 of the present application; Markings in the figure: 1-glass substrate, 11-titanium oxide layer, 12-first seed layer, 13-first silver functional layer, 14-first protective layer, 15-first dielectric layer, 16-second seed layer, 17-second silver functional layer, 18-copper layer, 19-first absorption layer, 20-second protective layer, 21-third seed layer, 22-third silver functional layer, 23-second absorption layer, 24-third protective layer, 25-second dielectric layer, 26-zinc tin oxide layer. DETAILED DESCRIPTION

[0028] The present application will be further described in conjunction with specific embodiments. However, it should not be understood that the scope of the above-mentioned subject matter of the present application is limited to the following embodiments, and any technology implemented based on the content of the present application falls within the scope of the present application.

[0029] In the description of the specific embodiments of the present application, the orientation or positional relationship terms such as "up", "down", "left", "right", "center", "inner", "outer", etc. appearing in the description are expressed based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the product / device / apparatus of the present application is usually used. These orientation or positional relationship terms are only used to facilitate the description of the present application scheme or simplify the description in the specific embodiments, to facilitate the quick understanding of the scheme by the technicians, and are not intended to indicate or imply that a specific device / component / element must have a specific orientation, or be constructed and operated in a specific positional relationship, and therefore cannot be understood as a limitation of the present application.

[0030] In addition, if the terms "horizontal", "vertical", "overhanging", "parallel", "coaxial" and the like appear, it does not mean that the corresponding device / component / element is absolutely horizontal or vertical or overhanging or parallel or coaxial, but can be slightly inclined or deviated, as long as it does not affect the normal function of the related component. For example, "horizontal" only means that its direction is more horizontal relative to "vertical", and does not mean that the structure must be completely horizontal, but can be slightly inclined; "coaxial" means that two components are coaxially arranged as much as possible, and move in a coaxial or approximately coaxial manner when the relative position changes. Alternatively, it can be simplified to understand that the corresponding device / component / element is arranged in the "horizontal", "vertical", "overhanging", "parallel", "coaxial" and the like, and can have an error / deviation of ±10% relative to the corresponding direction, more preferably an error / deviation of ±8% or less, more preferably an error / deviation of ±6% or less, more preferably an error / deviation of ±5% or less, and more preferably an error / deviation of ±4% or less. For example, the deviation in the "coaxial" direction is controlled within 0.2-1mm, preferably within 0.2-0.5mm. As long as the corresponding device / component / element is within the error / deviation range, it can still achieve its role in the present application.

[0031] In addition, the terms "first", "second", "third" and the like in the terms are only used to distinguish the same or similar components for description, and should not be understood as emphasizing or implying the relative importance of the specific components.

[0032] In addition, in the description of the embodiments of the present application, "several", "a plurality of", "several" represent at least 2. It can be 2, 3, 4, 5, 6, 7, 8, 9, etc. in any case, and even more than 9.

[0033] In addition, in the description of the technical solutions of the present application, unless otherwise specified / limited / limited, the terms "arrangement", "installation", "connection", "connection", "provided with", "laid", "arrangement" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected, which can be welding, riveting, bolting, screwing and other commonly used connection means in the art. The connection can be mechanical connection, electrical connection or communication connection; it can be directly connected or indirectly connected through an intermediate medium; it can be the communication between two elements.

[0034] Example 1 The present embodiment provides a low-transmission high-performance three-silver Low-E glass suitable for tropical regions, such as Figure 1 As shown, it comprises a glass substrate 1 and a coating film, which is arranged on the surface of the glass substrate 1; the coating film comprises, from the glass substrate 1 outward, in order: a titanium oxide layer 11 with a thickness of 10-20nm; The first seed layer 12 is a zinc oxide layer with a thickness of 10-15 nm. The first silver functional layer 13 has a thickness of 6-10 nm. The first protective layer 14 is an AZO protective layer with a thickness of 3-10 nm. The first dielectric layer 15 is a silicon nitride SiNx layer with a thickness of 20-40 nm. The second seed layer 16 is a zinc oxide layer with a thickness of 10-20 nm. The second silver functional layer 17 has a thickness of 8-15 nm. The copper layer 18 has a thickness of 3-10 nm. The first absorption layer 19 is a nickel-chromium absorption layer with a thickness of 2-5 nm. The second protective layer 20 is an AZO protective layer with a thickness of 10-20 nm. The third seed layer 21 is a zinc oxide layer with a thickness of 10-20 nm. The third silver functional layer 22 has a thickness of 10-20 nm. The second absorption layer 23 is a nickel-chromium absorption layer with a thickness of 1-5 nm. The third protective layer 24 is an AZO protective layer with a thickness of 5-10 nm. The second dielectric layer 25 is a silicon nitride SiNx layer with a thickness of 20-40 nm.

[0035] The glass substrate is a 6 mm ordinary float glass, and the preparation method comprises the following steps: S1. A titanium oxide layer is plated on the surface of the glass substrate by a magnetron sputtering process. S2. The first seed layer is plated on the top surface of the titanium oxide layer by a magnetron sputtering process. S3. The first silver functional layer is plated on the top surface of the first seed layer by a magnetron sputtering process. S4. The first protective layer is plated on the top surface of the first silver functional layer by a magnetron sputtering process. S5. The first dielectric layer is plated on the top surface of the first protective layer by a magnetron sputtering process. S6. The second seed layer is plated on the top surface of the first dielectric layer by a magnetron sputtering process. S7. The second silver functional layer is plated on the top surface of the second seed layer by a magnetron sputtering process. S8. The copper layer is plated on the top surface of the second silver functional layer by a magnetron sputtering process. S9. The first absorption layer is plated on the top surface of the copper layer by a magnetron sputtering process. S10. The second protective layer is plated on the top surface of the first absorption layer by a magnetron sputtering process. S11. A third seed layer is deposited on the top surface of the second protective layer using magnetron sputtering. S12. A third silver functional layer is deposited on the top surface of the third seed layer using magnetron sputtering. S13. A second absorption layer is deposited on the top surface of the third silver functional layer using a magnetron sputtering process. S14. A third protective layer is deposited on the top surface of the second absorption layer using a magnetron sputtering process. S15. A second dielectric layer is deposited on the top surface of the third protective layer using a magnetron sputtering process.

[0036] Before coating, the glass substrate is cleaned and dried. The detailed cleaning steps are as follows: After entering the coating cleaning machine, the glass substrate is pre-cleaned, specifically by high-pressure pure water spraying and brush roller washing to remove large particulate contaminants such as floating dust and oil stains from the surface of the glass substrate. Next, it is rinsed with pure water (conductivity ≤10μS / cm) to further remove residual impurities. Finally, the surface moisture is quickly blown away by a high-pressure hot air knife (temperature 60-80℃) to avoid water stains. Then, it enters the coating area to prepare for coating. In step S1, a mixture of argon and oxygen gas is used, with an argon-oxygen flow ratio of 1200:50 and a vacuum degree below 3×10⁻⁶. -6 mbar.

[0037] Example 2 This embodiment provides a low-transparency, high-performance triple-silver Low-E glass suitable for tropical regions, such as... Figure 2 As shown, it includes a glass substrate 1 and a coating, the coating being disposed on the surface of the glass substrate 1; the coating, from the glass substrate outwards, includes the following: Titanium oxide layer 11, with a thickness of 20 nm; The first seed layer 12 is a zinc oxide layer with a thickness of 15nm; The first silver functional layer 13 has a thickness of 7nm; The first protective layer 14 is an AZO protective layer with a thickness of 10nm; The first dielectric layer 15 is a silicon nitride (SiNx) layer with a thickness of 30 nm; The second seed layer 16 is a zinc oxide layer with a thickness of 10 nm; The second silver functional layer 17 has a thickness of 9nm; Copper layer 18, with a thickness of 8nm; The first absorption layer 19 is a nickel-chromium absorption layer with a thickness of 3.5 nm; The second protective layer 20 is an AZO protective layer with a thickness of 20nm; Zinc tin oxide layer 26, with a thickness of 50 nm; The third seed layer 21 is a zinc oxide layer with a thickness of 10 nm; The third silver functional layer 22 has a thickness of 14.5 nm. The second absorption layer 23 is a nickel-chromium absorption layer and has a thickness of 2.0 nm. The third protective layer 24 is an AZO protective layer and has a thickness of 10 nm. The second dielectric layer 25 is a silicon nitride SiNx layer and has a thickness of 35 nm.

[0038] The glass substrate is a 6 mm ordinary float glass, and the preparation method comprises the following steps: S1. A titanium oxide layer is coated on the surface of the glass substrate by using a magnetron sputtering process. S2. A first seed layer is coated on the top surface of the titanium oxide layer by using a magnetron sputtering process. S3. A first silver functional layer is coated on the top surface of the first seed layer by using a magnetron sputtering process. S4. A first protective layer is coated on the top surface of the first silver functional layer by using a magnetron sputtering process. S5. A first dielectric layer is coated on the top surface of the first protective layer by using a magnetron sputtering process. S6. A second seed layer is coated on the top surface of the first dielectric layer by using a magnetron sputtering process. S7. A second silver functional layer is coated on the top surface of the second seed layer by using a magnetron sputtering process. S8. A copper layer is coated on the top surface of the second silver functional layer by using a magnetron sputtering process. S9. A first absorption layer is coated on the top surface of the copper layer by using a magnetron sputtering process. S10. A second protective layer is coated on the top surface of the first absorption layer by using a magnetron sputtering process. S11. A zinc tin oxide layer is coated on the top surface of the second protective layer by using a magnetron sputtering process. S12. A third seed layer is coated on the top surface of the zinc tin oxide layer by using a magnetron sputtering process. S13. A third silver functional layer is coated on the top surface of the third seed layer by using a magnetron sputtering process. S14. A second absorption layer is coated on the top surface of the third silver functional layer by using a magnetron sputtering process. S15. A third protective layer is coated on the top surface of the second absorption layer by using a magnetron sputtering process. S16. A second dielectric layer is coated on the top surface of the third protective layer by using a magnetron sputtering process.

[0039] Before coating, the glass substrate is cleaned and dried. The detailed cleaning steps are as follows: after the glass substrate enters the coating cleaning machine, it is first pre-cleaned, specifically by high-pressure pure water spraying + brush roller cleaning, to remove large-particle contaminants such as dust and oil stains on the surface of the glass substrate; then it is further cleaned by pure water (electrical conductivity ≤10 μS / cm) spraying to further remove surface impurities; finally, the surface moisture is quickly blown off by a high-pressure hot air knife (temperature 60-80℃) to avoid water stains, and then it enters the coating area to prepare for coating. In step S1, the titanium oxide layer is coated by using titanium dioxide as the target material, and a mixed gas of argon and oxygen is used, with a flow ratio of argon to oxygen being 1200:50, and a vacuum degree being less than 3×10 -6 mbar.

[0040] Example 3 The present embodiment provides a low-transmittance high-performance three-silver Low-E glass suitable for tropical regions, which comprises a glass substrate and a coating film arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in order: a titanium oxide layer with a thickness of 20 nm; a first seed layer, which is a zinc oxide layer with a thickness of 15 nm; a first silver functional layer with a thickness of 8 nm; a first protective layer, which is an AZO protective layer with a thickness of 10 nm; a first dielectric layer, which is a silicon nitride SiNx layer with a thickness of 30 nm; a second seed layer, which is a zinc oxide layer with a thickness of 10 nm; a second silver functional layer with a thickness of 8.5 nm; a copper layer with a thickness of 9.0 nm; a first absorption layer, which is a nickel-chromium absorption layer with a thickness of 3.0 nm; a second protective layer, which is an AZO protective layer with a thickness of 20 nm; a zinc tin oxide layer with a thickness of 50 nm; a third seed layer, which is a zinc oxide layer with a thickness of 10 nm; a third silver functional layer with a thickness of 15.0 nm; a second absorption layer, which is a nickel-chromium absorption layer with a thickness of 2.0 nm; a third protective layer, which is an AZO protective layer with a thickness of 10 nm; a second dielectric layer, which is a silicon nitride SiNx layer with a thickness of 35 nm.

[0041] The Low-E glass of the present embodiment is obtained by using the preparation method of Example 2.

[0042] Example 4 The embodiment provides a low-transmittance high-performance three-silver Low-E glass suitable for tropical regions, which comprises a glass substrate and a coating film arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in sequence: a titanium oxide layer with a thickness of 10 nm; a first seed layer, which is a zinc oxide layer with a thickness of 12 nm; a first silver functional layer with a thickness of 7 nm; a first protective layer, which is an AZO protective layer with a thickness of 8 nm; a first medium layer, which is a silicon nitride SiNx layer with a thickness of 25 nm; a second seed layer, which is a zinc oxide layer with a thickness of 15 nm; a second silver functional layer with a thickness of 10 nm; a copper layer with a thickness of 7 nm; a first absorption layer, which is a nickel-chromium absorption layer with a thickness of 4 nm; a second protective layer, which is an AZO protective layer with a thickness of 15 nm; a zinc tin oxide layer with a thickness of 55 nm; a third seed layer, which is a zinc oxide layer with a thickness of 15 nm; a third silver functional layer with a thickness of 16 nm; a second absorption layer, which is a nickel-chromium absorption layer with a thickness of 2.0 nm; a third protective layer, which is an AZO protective layer with a thickness of 10 nm; a second medium layer, which is a silicon nitride SiNx layer with a thickness of 35 nm.

[0043] The Low-E glass of the embodiment is obtained by adopting the preparation method of the embodiment 2.

[0044] Comparative Example 1 The comparative example provides a low-transmittance high-performance three-silver Low-E glass suitable for tropical regions, which comprises a glass substrate and a coating film arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in sequence: a silicon nitride SiNx layer with a thickness of 35 nm; a first seed layer, which is a zinc oxide layer with a thickness of 10 nm; a first silver functional layer with a thickness of 7 nm; a first protective layer, which is an AZO protective layer with a thickness of 10 nm; a first medium layer, which is a silicon nitride SiNx layer with a thickness of 45 nm; a second seed layer, which is a zinc oxide layer with a thickness of 10 nm; a second silver functional layer with a thickness of 10 nm; a copper layer with a thickness of 5 nm; The first absorbing layer is a nickel-chromium absorbing layer, and the thickness is 3.3 nm; The second protective layer is an AZO protective layer, and the thickness is 20 nm; The zinc tin oxide layer has a thickness of 50 nm; The third seed layer is a zinc oxide layer, and the thickness is 10 nm; The third silver functional layer has a thickness of 14.5 nm; The second absorbing layer is a nickel-chromium absorbing layer, and the thickness is 2.0 nm; The third protective layer is an AZO protective layer, and the thickness is 10 nm; The second dielectric layer is a silicon nitride SiNx layer, and the thickness is 30 nm.

[0045] The Low-E glass of the present comparative example is obtained by using the preparation method of Example 2.

[0046] Comparative Example 2 The present comparative example provides a low-transmittance high-performance three-silver Low-E glass suitable for tropical regions, which comprises a glass substrate and a coating film arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in sequence: The titanium oxide layer has a thickness of 35 nm; The first seed layer is a zinc oxide layer, and the thickness is 10 nm; The first silver functional layer has a thickness of 7 nm; The first protective layer is an AZO protective layer, and the thickness is 10 nm; The first dielectric layer is a silicon nitride SiNx layer, and the thickness is 30 nm; The second seed layer is a zinc oxide layer, and the thickness is 10 nm; The second silver functional layer has a thickness of 10 nm; The copper layer has a thickness of 5 nm; The first absorbing layer is a nickel-chromium absorbing layer, and the thickness is 3.3 nm; The second protective layer is an AZO protective layer, and the thickness is 20 nm; The zinc tin oxide layer has a thickness of 50 nm; The third seed layer is a zinc oxide layer, and the thickness is 10 nm; The third silver functional layer has a thickness of 14.5 nm; The second absorbing layer is a nickel-chromium absorbing layer, and the thickness is 2.0 nm; The third protective layer is an AZO protective layer, and the thickness is 10 nm; The second dielectric layer is a silicon nitride SiNx layer, and the thickness is 30 nm.

[0047] The Low-E glass of the present comparative example is obtained by using the preparation method of Example 2.

[0048] Comparative Example 3 The present comparative example provides a low-transmission type high-performance three-silver Low-E glass suitable for tropical regions, comprising a glass substrate and a coating film, the coating film being arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in order: a titanium oxide layer with a thickness of 25 nm; a first seed layer, which is a zinc oxide layer with a thickness of 15 nm; a first silver functional layer with a thickness of 7 nm; a first protective layer, which is an AZO protective layer with a thickness of 10 nm; a first dielectric layer, which is a silicon nitride SiNx layer with a thickness of 30 nm; a second seed layer, which is a zinc oxide layer with a thickness of 10 nm; a second silver functional layer with a thickness of 9 nm; a copper layer with a thickness of 8 nm; a first absorption layer, which is a nickel-chromium absorption layer with a thickness of 3.5 nm; a second protective layer, which is an AZO protective layer with a thickness of 20 nm; a zinc tin oxide layer with a thickness of 50 nm; a third seed layer, which is a zinc oxide layer with a thickness of 10 nm; a third silver functional layer with a thickness of 14.5 nm; a second absorption layer, which is a nickel-chromium absorption layer with a thickness of 2.0 nm; a third protective layer, which is an AZO protective layer with a thickness of 10 nm; a second dielectric layer, which is a silicon nitride SiNx layer with a thickness of 35 nm.

[0049] The Low-E glass of the present comparative example is obtained by using the preparation method of Example 2.

[0050] Comparative Example 4 The present comparative example provides a low-transmission type high-performance three-silver Low-E glass suitable for tropical regions, comprising a glass substrate and a coating film, the coating film being arranged on the surface of the glass substrate; the coating film comprises, from the glass substrate outward, in order: a titanium oxide layer with a thickness of 5 nm; a first seed layer, which is a zinc oxide layer with a thickness of 35 nm; a first silver functional layer with a thickness of 7 nm; a first protective layer, which is an AZO protective layer with a thickness of 10 nm; a first dielectric layer, which is a silicon nitride SiNx layer with a thickness of 30 nm; a second seed layer, which is a zinc oxide layer with a thickness of 10 nm; a second silver functional layer with a thickness of 8 nm; copper layer, 9 nm in thickness; a first absorbing layer, a nickel-chromium absorbing layer, 3 nm in thickness; a second protective layer, an AZO protective layer, 20 nm in thickness; a zinc tin oxide layer, 50 nm in thickness; a third seed layer, a zinc oxide layer, 10 nm in thickness; a third silver functional layer, 15 nm in thickness; a second absorbing layer, a nickel-chromium absorbing layer, 2 nm in thickness; a third protective layer, an AZO protective layer, 10 nm in thickness; a second dielectric layer, a silicon nitride SiNx layer, 35 nm in thickness.

[0051] The Low-E glass of the present comparative example was obtained by using the preparation method of Example 2.

[0052] The Low-E glasses of Examples 1-4 and Comparative Examples 1-4 above were subjected to performance testing, in which the solar heat gain coefficient was obtained by testing with a GlasSmart1000 portable energy-saving glass comprehensive testing system (referred to as the Huiyan1000 tester), the solar heat gain coefficient being the ratio of the total energy of solar radiation that passes through the glass to the incident solar radiation energy, also referred to as the solar heat gain factor, and the lower the value, the stronger the ability to block solar heat from entering. The test results are shown in Table 1 below.

[0053] Table 1 Performance test results of the Low-E glasses of the examples and comparative examples

[0054] In order to quantitatively illustrate and measure color, the CIE1976L a b color space is generally used to measure color in the international community: L or R is generally used to represent brightness, and the two have a certain conversion relationship, the value being in the range of 0-100, and the larger the value, the higher the brightness; a represents red-greenness, a negative value indicates green, a positive value indicates red, and the larger the absolute value, the greater the degree of green or red; b represents yellow-blue, b negative value indicates blue, b positive value indicates yellow, and the larger the absolute value, the greater the degree of yellow or blue; a and b closer to zero indicates that the transmitted color is more neutral.

[0055] From the above data, it can be seen that by using high refractive index material titanium oxide at the bottom, matched with other media and functional materials, through the interference effect of light, the thickness ratio between the medium layer and the metal layer is continuously adjusted, and finally the target film layer structure is obtained, which can realize the three-silver Low-E glass film system with low visible light transmittance, extremely low total solar transmittance (solar heat coefficient), low internal and external reflectivity and color neutrality, so that the user experience is more comfortable, and the extremely low solar heat coefficient can block most of the solar radiation energy, which is especially suitable for the climate characteristics of high heat and high sunshine in the Middle East, India and other regions, and provides an extreme sun-shading and heat-insulating solution for high-end building doors and windows and curtain walls, and the performance parameters accurately meet the market demand of overseas high-heat regions. At present, the Low-E glass has become the high-performance three-silver product of the famous large real estate developer SOBHA in India and the Middle East, and the specific optical parameters are shown in Table 2: Table 2 Product optical parameters

[0056] The above only describes the preferred embodiments of the present application and is not intended to limit the present application. Any modification, equivalent replacement and improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A low-e glass with high performance and low transmittance, comprising a glass substrate and a coating, the coating being arranged on the surface of the glass substrate; characterized in that, The coating film comprises, from the glass substrate outward, in order: a titanium oxide layer, a first seed layer, a first silver functional layer, a first protective layer, a first dielectric layer, a second seed layer, a second silver functional layer, a copper layer, a first absorption layer, a second protective layer, a third seed layer, a third silver functional layer, a second absorption layer, a third protective layer, and a second dielectric layer, wherein the thickness of the titanium oxide layer is 10-20 nm.

2. The low-e high performance triple silver Low-E glass according to claim 1, characterized in that, The first seed layer, the second seed layer, and the third seed layer are zinc oxide layers. The thickness of the first seed layer is 10-15 nm, the thickness of the second seed layer is 10-20 nm, and the thickness of the third seed layer is 10-20 nm.

3. The low-e high performance triple silver Low-E glass according to claim 1, characterized in that, The thickness of the first silver functional layer is 6-10 nm, the thickness of the second silver functional layer is 8-15 nm, and the thickness of the third silver functional layer is 10-20 nm. The first protective layer, the second protective layer, and the third protective layer are AZO protective layers. The thickness of the first protective layer is 3-10 nm, the thickness of the second protective layer is 10-20 nm, and the thickness of the third protective layer is 5-10 nm. The first dielectric layer and the second dielectric layer are silicon nitride layers, the thickness of the first dielectric layer is 20-40 nm, and the thickness of the second dielectric layer is 20-40 nm. The thickness of the copper layer is 3-10 nm.

4. The low-e high performance triple silver Low-E glass according to claim 1, characterized in that, The first absorption layer and the second absorption layer are nickel-chromium absorption layers, the thickness of the first absorption layer is 2-5 nm, and the thickness of the second absorption layer is 1-5 nm.

5. The low-e high performance triple silver Low-E glass according to claim 1, characterized in that, The coating film further comprises a zinc tin oxide layer, which is arranged between the second protective layer and the third seed layer, and the thickness of the zinc tin oxide layer is 40-60 nm.

6. The low-e high performance triple silver Low-E glass according to claim 1, characterized in that, The coating film comprises, from the glass substrate outward, in order: a titanium oxide layer, the thickness of which is 10-20 nm; a first seed layer, which is a zinc oxide layer, the thickness of which is 10-15 nm; a first silver functional layer, the thickness of which is 6-10 nm; a first protective layer, which is an AZO protective layer, the thickness of which is 3-10 nm; a first dielectric layer, which is a silicon nitride layer, the thickness of which is 20-40 nm; a second seed layer, which is a zinc oxide layer, the thickness of which is 10-20 nm; a second silver functional layer, the thickness of which is 8-15 nm; a copper layer, the thickness of which is 3-10 nm; a first absorption layer, which is a nickel-chromium absorption layer, the thickness of which is 2-5 nm; a second protective layer, which is an AZO protective layer, the thickness of which is 10-20 nm; a zinc tin oxide layer, the thickness of which is 40-60 nm; a third seed layer, which is a zinc oxide layer, the thickness of which is 10-20 nm; a third silver functional layer, the thickness of which is 10-20 nm; a second absorption layer, which is a nickel-chromium absorption layer, the thickness of which is 1-5 nm; a third protective layer, which is an AZO protective layer, the thickness of which is 5-10 nm; a second dielectric layer, which is a silicon nitride layer, the thickness of which is 20-40 nm.

7. The low-e high performance triple silver Low-E glass according to any one of claims 1-6, characterized in that, The solar heat gain coefficient of the Low-E glass is not more than 0.2; preferably, the solar heat gain coefficient of the Low-E glass is 0.15-0.

18.

8. The low-e high performance triple silver Low-E glass according to any one of claims 1-6, characterized in that, The Low-E glass has a transmittance color which is neutral gray, the transmittance T is in the range [30, 35], the transmittance color a is in the range [-2, -1], b is in the range [-1, 1]; the indoor reflectance R is in the range [3, 5], the outdoor reflectance R is in the range [10, 15].

9. A method for preparing the low-e high-performance three-silver Low-E glass according to any one of claims 1-8, characterized in that, The method comprises the following steps: S1, a thickness of 10-20nm of titanium oxide layer is coated on the surface of the glass substrate by magnetron sputtering process; S2, a thickness of 10-15nm of the first seed layer is coated on the top surface of the titanium oxide layer by magnetron sputtering process; S3, a thickness of 6-10nm of the first silver functional layer is coated on the top surface of the first seed layer by magnetron sputtering process; S4, a thickness of 3-10nm of the first protective layer is coated on the top surface of the first silver functional layer by magnetron sputtering process; S5, a thickness of 20-40nm of the first dielectric layer is coated on the top surface of the first protective layer by magnetron sputtering process; S6, a thickness of 10-20nm of the second seed layer is coated on the top surface of the first dielectric layer by magnetron sputtering process; S7, a thickness of 8-15nm of the second silver functional layer is coated on the top surface of the second seed layer by magnetron sputtering process; S8, a thickness of 3-10nm of the copper layer is coated on the top surface of the second silver functional layer by magnetron sputtering process; S9, a thickness of 2-5nm of the first absorption layer is coated on the top surface of the copper layer by magnetron sputtering process; S10, a thickness of 10-20nm of the second protective layer is coated on the top surface of the first absorption layer by magnetron sputtering process; S11, a thickness of 10-20nm of the third seed layer is coated on the top surface of the second protective layer by magnetron sputtering process; S12, a thickness of 10-20nm of the third silver functional layer is coated on the top surface of the third seed layer by magnetron sputtering process; S13, a thickness of 1-5nm of the second absorption layer is coated on the top surface of the third silver functional layer by magnetron sputtering process; S14, a thickness of 5-10nm of the third protective layer is coated on the top surface of the second absorption layer by magnetron sputtering process; S15, a thickness of 20-40nm of the second dielectric layer is coated on the top surface of the third protective layer by magnetron sputtering process.

10. The method for preparing low-transmission high-performance three-silver Low-E glass according to claim 9, characterized in that, Step S1 uses argon and oxygen mixed gas, the flow ratio of argon and oxygen is 1000-1500:50, the vacuum degree is lower than 3x10 - 6 mbar.

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