Graph grouping method and system, electronic equipment, computer program and storage medium
By counting the number of edges on both sides of the mask pattern in the mask, the grouping of the pattern is determined, which solves the problem of low efficiency of optical proximity correction technology and achieves more efficient pattern processing.
Patent Information
- Application Number
- CN202411060865.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-02
- Publication Date
- 2026-02-03
AI Technical Summary
Existing optical proximity correction techniques still need improvement, resulting in poor efficiency in post-lithography pattern processing.
By acquiring the mask pattern to be grouped in the mask, determining its search range along the preset search direction, and counting the number of edges of the remaining mask patterns on both sides of the pattern to be grouped, the group to which the pattern belongs is determined based on the number of edges.
It improves the efficiency of optical proximity correction processing, increases the number of graphics in the same graphics group, reduces the number of graphics groups, and simplifies the graphics processing flow.
Smart Images
Figure CN121454852A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] Embodiments of the present application relate to the field of semiconductor manufacturing, and in particular, to a pattern grouping method and system, an electronic device, a computer program and a storage medium. BACKGROUND
[0002] Photolithography is a very important technology in semiconductor manufacturing. Photolithography can transfer a pattern from a mask to a wafer surface to form a semiconductor product that meets design requirements. However, the existing photolithography technology often accompanies optical proximity effect (OPE).
[0003] In order to correct the optical proximity effect, optical proximity correction (OPC) is generated. The core idea of optical proximity correction is to establish an optical proximity correction model based on the consideration of canceling the optical proximity effect, and to design a photomask pattern according to the optical proximity correction model. Although the photolithography pattern after photolithography has optical proximity effect relative to the photomask pattern, since the photomask pattern is designed according to the optical proximity correction model, the photolithography pattern after photolithography is close to the target pattern that the user actually wants to get.
[0004] However, the current optical proximity correction technology still needs to be improved. SUMMARY
[0005] The problem solved by embodiments of the present application is to provide a pattern grouping method and system, an electronic device, a computer program and a storage medium to improve the pattern grouping method and improve the efficiency of subsequent pattern processing.
[0006] To solve the above problems, an embodiment of the present application provides a pattern grouping method, comprising: obtaining a mask pattern in a mask to be grouped as a to-be-grouped pattern; determining a search range corresponding to the to-be-grouped pattern along a preset search direction; along the preset search direction, counting the number of edges of the remaining mask patterns located on the first side of the to-be-grouped pattern and the number of edges of the remaining mask patterns located on the second side of the to-be-grouped pattern in the search range; and judging the group to which the to-be-grouped pattern belongs based on the number of edges of the remaining mask patterns on the first side and the number of edges of the remaining mask patterns on the second side.
[0007] Correspondingly, the embodiment of the present application also provides a graphic grouping system, comprising: a to-be-grouped graphic acquisition module, configured to acquire a mask graphic to be grouped in a mask plate; a search range acquisition module, configured to determine a search range along a preset search direction corresponding to the to-be-grouped graphic; an edge number acquisition module, configured to count, along the preset search direction, an edge number of the remaining mask graphics located at a first side of the to-be-grouped graphic and an edge number of the remaining mask graphics located at a second side of the to-be-grouped graphic in the search range; and a judgment module, configured to judge a group to which the to-be-grouped graphic belongs based on the edge number of the remaining mask graphics at the first side and the edge number of the remaining mask graphics at the second side.
[0008] Correspondingly, the embodiment of the present application also provides an electronic device, comprising at least one memory and at least one processor, wherein the memory stores one or more computer instructions, and the one or more computer instructions are executed by the processor to implement the graphic grouping method provided by the embodiment of the present application.
[0009] Correspondingly, the embodiment of the present application also provides a computer program product, comprising computer instructions, wherein the computer instructions are executed by a processor to implement the graphic grouping method provided by the embodiment of the present application.
[0010] Correspondingly, the embodiment of the present application also provides a storage medium, wherein the storage medium stores one or more computer instructions, and the one or more computer instructions are used to implement the graphic grouping method provided by the embodiment of the present application.
[0011] Compared with the prior art, the technical scheme of the embodiment of the present application has the following advantages:
[0012] In the graphic grouping method provided by the embodiment of the present application, the edge number of the remaining mask graphics located at the first side of the to-be-grouped graphic and the edge number of the remaining mask graphics located at the second side of the to-be-grouped graphic are counted along the preset search direction in the search range, and the group to which the to-be-grouped graphic belongs is judged based on the edge number of the remaining mask graphics at the first side and the edge number of the remaining mask graphics at the second side. Since the group to which the to-be-grouped graphic belongs is judged based on the edge number of the remaining mask graphics at the two sides of the to-be-grouped graphic, it is convenient to attribute similar graphics to the same graphic group, and compared with the scheme of attributing graphics with completely identical environments on two sides to the same graphic group, it is beneficial to increase the number of graphics in the same graphic group, and correspondingly, it is beneficial to reduce the number of graphic groups, thereby being beneficial to improve the efficiency of subsequent graphic processing (for example, optical proximity correction processing). BRIEF DESCRIPTION OF DRAWINGS
[0013] Figure 1 is a corresponding flowchart of a graphic grouping method;
[0014] Figure 2 is a schematic diagram of a to-be-grouped pattern in a pattern grouping method;
[0015] Figure 3 is a flowchart of a pattern grouping method of the present application;
[0016] Figure 4 is a schematic diagram of a to-be-grouped pattern in an embodiment of the pattern grouping method of the present application;
[0017] Figure 5 is a schematic diagram of a first side of a to-be-grouped pattern, and different cases of the number of edges of a remaining mask pattern on the first side and a second side in an embodiment of the pattern grouping method of the present application;
[0018] Figure 6 is a functional block diagram of an embodiment of the pattern grouping system of the present application;
[0019] Figure 7 is a hardware structure diagram of the equipment provided in an embodiment of the present application. DETAILED DESCRIPTION
[0020] At present, the pattern grouping method still needs to be improved. Now, a pattern grouping method is combined to analyze the reasons why it still needs to be improved. Figure 1 is a flowchart of a pattern grouping method, Figure 2 is a schematic diagram of a to-be-grouped pattern in a pattern grouping method.
[0021] Reference Figure 1 , and in combination with reference Figure 2 , a step S11 is performed: a mask pattern to be grouped in a mask plate is acquired as a to-be-grouped pattern (not indicated), the to-be-grouped pattern including a first to-be-grouped pattern A and a second to-be-grouped pattern B.
[0022] Reference Figure 1 , and in combination with reference Figure 2 , a step S12 is performed: a line width size Wa of the first to-be-grouped pattern A is determined, a line width size Wa1 of a first pattern A1 is determined, the first pattern A1 being an adjacent mask pattern located on a first side of the first to-be-grouped pattern A, a line width size Wa2 of a second pattern A2 is determined, the second pattern A2 being an adjacent mask pattern located on a second side of the first to-be-grouped pattern A, a first distance Sa1 is determined, the first distance Sa1 being a distance between the first to-be-grouped pattern A and the first pattern A1, a second distance Sa2 is determined, the second distance Sa2 being a distance between the first to-be-grouped pattern A and the second pattern A2.
[0023] Reference Figure 1 , and in combination with reference Figure 2, performing step S13: determining the line width size Wb of the second grouping-to-be-performed pattern B, determining the line width size Wb1 of the third pattern B1 which is the adjacent mask pattern located at the first side of the second grouping-to-be-performed pattern B, determining the line width size Wb2 of the fourth pattern B2 which is the adjacent mask pattern located at the second side of the second grouping-to-be-performed pattern B, determining the third distance Sb1 which is the distance between the second grouping-to-be-performed pattern B and the third pattern B1, and determining the fourth distance Sb2 which is the distance between the second grouping-to-be-performed pattern B and the fourth pattern B1.
[0024] With reference to Figure 1 , and in combination with reference to Figure 2 , performing step S14: judging whether the line width size Wa of the first grouping-to-be-performed pattern A is equal to the line width size Wb of the second grouping-to-be-performed pattern B, whether the line width size Wa1 of the first pattern A1 is equal to the line width size Wb1 of the third pattern B1, whether the line width size Wa2 of the second pattern A2 is equal to the line width size Wb2 of the fourth pattern B2, whether the first distance Sa1 is equal to the third distance Sb1, and whether the second distance Sa2 is equal to the fourth distance Sb2.
[0025] If all the above are true, performing step S15: judging whether the first grouping-to-be-performed pattern A and the second grouping-to-be-performed pattern B belong to the same group of patterns.
[0026] Otherwise, performing step S16: judging that the first grouping-to-be-performed pattern A and the second grouping-to-be-performed pattern B do not belong to the same group of patterns.
[0027] It is found through research that, when the first grouping-to-be-performed pattern A and the second grouping-to-be-performed pattern B belong to the same group of patterns, the environments of the adjacent patterns on both sides of the first grouping-to-be-performed pattern A and the second grouping-to-be-performed pattern B must be completely the same, which easily leads to a small number of patterns in the same group of patterns and a large number of groups of patterns, thereby easily leading to poor efficiency of subsequent pattern processing (for example, optical proximity correction processing).
[0028] In order to solve the above technical problem, an embodiment of the present application provides a pattern grouping method, comprising: acquiring a mask pattern in a mask plate to be subjected to grouping processing as a grouping-to-be-performed pattern; determining a search range of the grouping-to-be-performed pattern along a preset search direction; along the preset search direction, counting the number of edges of the remaining mask patterns located at the first side of the grouping-to-be-performed pattern and the number of edges of the remaining mask patterns located at the second side of the grouping-to-be-performed pattern in the search range; and judging the group to which the grouping-to-be-performed pattern belongs based on the number of edges of the remaining mask patterns on the first side and the number of edges of the remaining mask patterns on the second side.
[0029] The method comprises: counting the edge number of the remaining mask patterns on the first side of the to-be-grouped pattern and the edge number of the remaining mask patterns on the second side of the to-be-grouped pattern in the search range along the preset search direction; and judging the group to which the to-be-grouped pattern belongs based on the edge number of the remaining mask patterns on the first side and the edge number of the remaining mask patterns on the second side. Since the group to which the to-be-grouped pattern belongs is judged based on the edge number of the remaining mask patterns on the two sides of the to-be-grouped pattern, it is convenient to attribute similar patterns to the same pattern group, compared with the scheme of attributing patterns with the same environment on the two sides to the same pattern group, which is beneficial to increase the number of patterns in the same pattern group and correspondingly beneficial to reduce the number of pattern groups, thereby being beneficial to improve the efficiency of subsequent pattern processing (for example, optical proximity correction processing).
[0030] In order to make the above objectives, characteristics and advantages of the embodiments of the present application more obvious and easy to understand, the specific embodiments of the present application will be described in detail below with reference to the drawings.
[0031] Figure 3 is a flowchart of the pattern grouping method of the present application, Figure 4 is a schematic diagram of a to-be-grouped pattern in an embodiment of the pattern grouping method of the present application, Figure 5 is a schematic diagram of the first side of a to-be-grouped pattern and the edge number of the remaining mask patterns on the first side and the second side in an embodiment of the pattern grouping method of the present application, wherein, Figure 5 (a) is a case where the edge number of the remaining mask patterns on the first side of a to-be-grouped pattern is 0 in an embodiment of the pattern grouping method of the present application, Figure 5 (b) is a case where the edge number of the remaining mask patterns on the first side of a to-be-grouped pattern is 1 in an embodiment of the pattern grouping method of the present application, Figure 5 (c) is a case where the edge number of the remaining mask patterns on the first side of a to-be-grouped pattern is 2 in an embodiment of the pattern grouping method of the present application, Figure 5 (d) is a case where the edge number of the remaining mask patterns on the first side of a to-be-grouped pattern is 3 in an embodiment of the pattern grouping method of the present application, Figure 5 (e) is a case where the edge number of the remaining mask patterns on the first side of a to-be-grouped pattern is 3 and the edge number of the remaining mask patterns on the second side is 2 in an embodiment of the pattern grouping method of the present application.
[0032] Reference is made to Figure 3 , and combined with reference Figure 4 , a step S101 is performed: a mask pattern to be subjected to grouping processing in a mask plate is acquired as a to-be-grouped pattern C.
[0033] The mask pattern to be grouped in the mask plate is obtained as a grouping pattern C, so that subsequent pattern processing (e.g., optical proximity correction processing) can be performed on mask patterns of different categories according to the category of the grouping pattern.
[0034] Referring to Figure 3 , and in combination with reference Figure 4 , step S102 is performed: determining a search range of the grouping pattern C along a preset search direction.
[0035] The search range of the grouping pattern C along the preset search direction is determined, so that subsequent edge number statistics of the remaining mask pattern D on the side of the grouping pattern C can be performed in the search range along the preset search direction.
[0036] In the embodiment, in the step of determining the search range of the grouping pattern C along the preset search direction, the preset search direction includes a direction perpendicular to the line width dimension Wc of the grouping pattern C, or a direction parallel to the line width dimension Wc of the grouping pattern C.
[0037] The preset search direction includes a direction perpendicular to the line width dimension Wc of the grouping pattern C, or a direction parallel to the line width dimension Wc of the grouping pattern C, so that when subsequent edge number statistics of the remaining mask pattern D on the side of the grouping pattern C is performed in the search range along the preset search direction, the edge number statistics of the remaining mask pattern D on the side of the grouping pattern C can be performed in a direction perpendicular to the line width dimension Wc of the grouping pattern C, or in a direction parallel to the line width dimension Wc of the grouping pattern C, thereby facilitating selection of a suitable search direction according to actual needs.
[0038] In the embodiment, the step of determining the search range includes determining a corresponding scaling factor on the basis of a preset reference range, the scaling factor being used to realize scaling of the preset reference range along the preset search direction; and obtaining the search range based on the scaling factor and the preset reference range.
[0039] The corresponding scaling factor is determined on the basis of the preset reference range, and the search range is obtained based on the scaling factor and the preset reference range, so that the value of the search range is within a reasonable range, thereby facilitating subsequent edge number statistics of the remaining mask pattern on the side of the grouping pattern C in the search range, and the value of the edge number is more reasonable, and thereby facilitating appropriate category number of the grouping pattern.
[0040] Specifically, the preset reference range is twice the sum of the minimum spacing between adjacent graphics and the minimum line width of the graphics in the design rules.
[0041] The preset reference range is twice the sum of the minimum spacing between adjacent graphics and the minimum line width of the graphics in the design rules. This is beneficial because when counting the number of edges of the remaining mask graphics D located on the side of the graphics C to be grouped in the search range, the number of edges of the remaining mask graphics D on the side of different graphics C to be grouped is different, thereby improving the accuracy of the group to which the graphics C to be grouped belongs.
[0042] More specifically, the expression for the search range is:
[0043] SDP=f[(Space min +Width m [in)×2×(100%+x)];
[0044] Where SDP represents the search range, and Space min Width is the minimum spacing between adjacent graphics in the layout design rules. min is the minimum line width of the graphic in the layout design rules, and x is the scaling factor.
[0045] Using the above expression for the search range helps to reduce the difficulty of determining the search range.
[0046] As an example, such as Figure 4 As shown, the search range can be the first search value S1, the second search value S2, or the third search value S3. It should be noted that when the search range is the first search value S1, the second search value S2, or the third search value S3, the number of edges of the remaining mask patterns D on the side of the pattern C to be grouped may be different.
[0047] In this embodiment, determining the corresponding scaling factor based on a preset reference range includes: determining the grid size of the photolithography process; using the value of the grid size as the initial value of the search range, and determining the scaling factor according to the preset reference range.
[0048] After determining the grid size of the photolithography process, the value of the grid size is used as the initial value of the search range, and the scaling factor is determined according to the preset reference range. This helps to ensure that the value of the scaling factor is within a reasonable range, thereby making the search range value within a reasonable range more effective.
[0049] Specifically, after the corresponding scaling factor is determined based on the preset reference range, the scaling factor obtained based on the value of the grid size is adjusted, and the preset reference range is scaled along the preset search direction based on the adjusted scaling factor to adjust the size of the preset reference range along the preset search direction.
[0050] Adjusting the scaling factor obtained based on the value of the grid size first and then scaling the preset reference range along the preset search direction based on the adjusted scaling factor is beneficial to make the size of the preset reference range along the preset search direction more ideal, thereby further ensuring that the value of the search range is within a reasonable range.
[0051] In the embodiment, the scaling factor obtained based on the value of the grid size is adjusted according to the pattern critical dimension, pattern density, and pattern type of the mask pattern in the mask plate.
[0052] Adjusting the scaling factor obtained based on the value of the grid size according to the pattern critical dimension, pattern density, and pattern type of the mask pattern in the mask plate is beneficial to associate the adjusted scaling factor with the pattern critical dimension, pattern density, and pattern type of the mask pattern, thereby facilitating the size of the preset reference range along the preset search direction to be more ideal when the preset reference range is scaled along the preset search direction based on the adjusted scaling factor to adjust the size of the preset reference range along the preset search direction.
[0053] As an example, when the pattern critical dimension of the mask pattern in the mask plate is less than 100 nanometers, the scaling factor obtained based on the value of the grid size is adjusted in a range of 300% to 500%; when the critical dimension of the pattern C to be grouped is greater than 100 nanometers, the scaling factor obtained based on the value of the grid size is adjusted in a range of 100% to 300%.
[0054] As another example, when the pattern density of the mask pattern in the mask plate is less than 15%, the scaling factor obtained based on the value of the grid size is adjusted in a range of 200% to 500%; when the pattern density of the mask pattern in the mask plate is greater than 15% and less than 30%, the scaling factor obtained based on the value of the grid size is adjusted in a range of 100% to 300%; when the pattern density of the mask pattern in the mask plate is greater than 30%, the scaling factor obtained based on the value of the grid size is adjusted in a range of 50% to 100%.
[0055] As a further example, when the pattern type of the mask pattern in the mask is a one-dimensional pattern, the scaling factor based on the value of the grid size is adjusted in a range of 100% to 300%; when the pattern type of the mask pattern in the mask is a two-dimensional pattern, the scaling factor based on the value of the grid size is adjusted in a range of 300% to 500%.
[0056] In the embodiment, the grid size is determined by a function related to the resolution of the photolithography process.
[0057] The grid size generally refers to an optimal grid size used for subdividing the mask pattern when performing photolithography simulation and design optimization. Therefore, the grid size is determined by a function related to the resolution of the photolithography process, so that the grid size can both capture the details of the mask pattern and optical effects (e.g., diffraction and scattering) and maintain the computing efficiency and reduce unnecessary consumption of computing resources.
[0058] Specifically, the function related to the resolution of the photolithography process is:
[0059] GZ = f[K1 x λ / NA x (1 + σ)];
[0060] wherein GZ is the grid size, K1 is the resolution coefficient, λ is the wavelength of the exposure light source, NA is the numerical aperture, and σ is the beam size of the light source of the exposure system.
[0061] The above function can obtain the grid size based on considering the resolution coefficient of the photolithography process, the wavelength of the exposure light source, the numerical aperture, and the light source size of the exposure system, which is beneficial to further improve the effect of the grid size capturing the details of the mask pattern and the optical effects (e.g., diffraction and scattering), and also beneficial to make the effect of maintaining the computing efficiency better.
[0062] In other embodiments, the step of determining the search range comprises: determining a grid size of the photolithography process; and determining, according to the grid size, a search range along a preset search direction corresponding to the to-be-grouped pattern.
[0063] According to the grid size, the search range along the preset search direction corresponding to the to-be-grouped pattern is determined, which is beneficial to make the value of the search range within a reasonable range, so as to make the value of the edge number more reasonable when subsequently counting the edge number of the remaining mask patterns located at the side of the to-be-grouped pattern in the search range, and further beneficial to make the number of the grouped pattern categories appropriate.
[0064] Specifically, along the preset search direction, the size of the search range is equal to the grid size, or the size of the search range is equal to the product of the grid size and the grid size scaling factor.
[0065] Along the preset search direction, the size of the search range is equal to the grid size, or the size of the search range is equal to the product of the grid size and the grid size scaling factor, which facilitates reducing the difficulty of determining the search range in the case that the value of the search range is within a reasonable range.
[0066] Since the grid size is generally related to the resolution of the photolithography process, and the grouping of the patterns is also limited by the resolution of the photolithography process, the size of the search range can also be the product of the grid size and the grid size scaling factor. When the grid size scaling factor is 1, the size of the search range is equal to the grid size.
[0067] With reference to Figure 3 , and in combination with reference to Figure 4 , step S103 is performed: counting the number of edges of the remaining mask patterns D located on the first side C1 of the pattern to be grouped C and the number of edges of the remaining mask patterns D located on the second side C2 of the pattern to be grouped C in the search range along the preset search direction.
[0068] The number of edges of the remaining mask patterns D located on the first side C1 of the pattern to be grouped C and the number of edges of the remaining mask patterns D located on the second side C2 of the pattern to be grouped C are used to determine the group to which the pattern to be grouped C belongs.
[0069] With reference to Figure 3 , and in combination with reference to Figure 4 and Figure 5 , step S104 is performed: determining the group to which the pattern to be grouped C belongs based on the number of edges of the remaining mask patterns D on the first side C1 and the number of edges of the remaining mask patterns D on the second side C2.
[0070] Since the group to which the pattern to be grouped C belongs is determined based on the number of edges of the remaining mask patterns D on both sides of the pattern to be grouped C, it is beneficial to attribute similar patterns to the same pattern group, which is advantageous to increase the number of patterns in the same pattern group and correspondingly advantageous to reduce the number of pattern groups, thereby facilitating improving the efficiency of subsequent pattern processing (e.g., optical proximity correction processing).
[0071] As an example, when the search range is the first search value S1, the second search value S2, or the third search value S3, the edge number of the remaining mask pattern D of the side of the to-be-grouped pattern C can be different. Correspondingly, the result of the grouping to which the to-be-grouped pattern C belongs can also be different.
[0072] For example, as shown in Figure 4 the edge number of the remaining mask pattern D of the first side C1 of the to-be-grouped pattern C on the right is 0, the edge number of the remaining mask pattern D of the second side C2 of the to-be-grouped pattern C on the right is 0, and the edge number of the remaining mask pattern D of the first side C1 of the to-be-grouped pattern C on the left is 0, and the edge number of the remaining mask pattern D of the second side C2 of the to-be-grouped pattern C on the left is 0. At this time, the to-be-grouped pattern C on the right and the to-be-grouped pattern C on the left belong to the same group. When the search range is the third search value S3, the edge number of the remaining mask pattern D of the first side C1 of the to-be-grouped pattern C on the right is 2, the edge number of the remaining mask pattern D of the second side C2 of the to-be-grouped pattern C on the right is 2, the edge number of the remaining mask pattern D of the first side C1 of the to-be-grouped pattern C on the left is 0, and the edge number of the remaining mask pattern D of the second side C2 of the to-be-grouped pattern C on the left is 0. At this time, the to-be-grouped pattern C on the right and the to-be-grouped pattern C on the left do not belong to the same group. As can be seen, when the search range is different, the result of the grouping to which the to-be-grouped pattern C belongs can also be different.
[0073] In this embodiment, the grouping to which the to-be-grouped pattern C belongs is determined based on the edge number of the remaining mask pattern D of the first side C1 and the edge number of the remaining mask pattern D of the second side C2, including: using the expression ES=10 N1 +10 N2 obtaining the index code of the to-be-grouped pattern C, where ES is the index code, N1 is the edge number of the remaining mask pattern D of the first side C1, and N2 is the edge number of the remaining mask pattern D of the second side C2; and determining the grouping to which the to-be-grouped pattern C belongs based on the index code, and the index codes of patterns in the same group are the same.
[0074] obtaining the index code of the to-be-grouped pattern C, where ES is the index code, N1 is the edge number of the remaining mask pattern D of the first side C1, and N2 is the edge number of the remaining mask pattern D of the second side C2; and determining the grouping to which the to-be-grouped pattern C belongs based on the index code, and the index codes of patterns in the same group are the same. N1 +10 N2 obtaining the index code of the to-be-grouped pattern C, and then determining the grouping to which the to-be-grouped pattern C belongs based on the index code, which is beneficial to simplify the process of determining the grouping to which the to-be-grouped pattern C belongs and improve the efficiency of determining the grouping to which the to-be-grouped pattern C belongs.
[0075] As shown in Figure 5 As an example, when the edge number of the remaining mask pattern D of the first side C1 of the to-be-grouped pattern is 0
【as shown inFigure 5 (a) as shown, N1=0, 10 N1 =0; when the edge number of the remaining mask pattern D on the first side C1 is 1
as shown in (b)
as shown in (c)
as shown in (d)
as shown in (e)
[0076] The pattern grouping method further comprises a second embodiment, which is the same as the foregoing embodiments and will not be described here. The second embodiment is different from the foregoing embodiments in that, before judging the group to which the to-be-grouped pattern belongs, the pattern grouping method further comprises: acquiring a reference pattern in the mask plate; determining a search range of the reference pattern along a preset search direction, the to-be-grouped pattern and the reference pattern using the same search range; along the preset search direction, counting the edge number of the remaining mask pattern located on the first side of the reference pattern in the search range, and the edge number of the remaining mask pattern located on the second side of the reference pattern; and based on the edge number of the remaining mask pattern on the first side of the to-be-grouped pattern and the reference pattern, and the edge number of the remaining mask pattern on the second side of the to-be-grouped pattern and the reference pattern, judging whether the to-be-grouped pattern and the reference pattern belong to the same group of patterns.
[0077] Before judging the group to which the to-be-grouped pattern belongs, the pattern grouping method further comprises: acquiring a reference pattern in the mask plate, which is advantageous for judging the group to which the to-be-grouped pattern belongs by using the reference pattern, and is also advantageous for using the reference pattern for pattern processing in subsequent pattern processing, thereby being advantageous for further improving the efficiency of subsequent pattern processing.
[0078] Specifically, the manner of judging whether the to-be-grouped pattern and the reference pattern belong to the same group of patterns comprises: judging whether the number of edges of the remaining mask patterns on the first side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the first side of the reference pattern, and whether the number of edges of the remaining mask patterns on the second side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the second side of the reference pattern, or judging whether the number of edges of the remaining mask patterns on the first side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the second side of the reference pattern, and whether the number of edges of the remaining mask patterns on the second side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the first side of the reference pattern; if yes, it is determined that the to-be-grouped pattern and the reference pattern belong to the same group of patterns; otherwise, it is determined that the to-be-grouped pattern and the reference pattern do not belong to the same group of patterns.
[0079] The number of edges of the remaining mask patterns on the first side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the first side of the reference pattern, and the number of edges of the remaining mask patterns on the second side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the second side of the reference pattern, or the number of edges of the remaining mask patterns on the first side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the second side of the reference pattern, and the number of edges of the remaining mask patterns on the second side of the to-be-grouped pattern is equal to the number of edges of the remaining mask patterns on the first side of the reference pattern, so that the to-be-grouped pattern similar to the reference pattern after being rotated by 180° can still belong to the same group of patterns, thereby making the effect of pattern processing using the reference pattern better.
[0080] More specifically, the manner of performing the judgment comprises: using an expression ES=10 N1 +10 N2 respectively obtaining the index code corresponding to each of the to-be-grouped pattern and the reference pattern, wherein ES is the index code, N1 is the number of edges of the remaining mask patterns on the first side, and N2 is the number of edges of the remaining mask patterns on the second side; judging whether the index code of the to-be-grouped pattern is equal to the index code of the reference pattern, if yes, it is determined that the to-be-grouped pattern and the reference pattern belong to the same group of patterns; otherwise, it is determined that the to-be-grouped pattern and the reference pattern do not belong to the same group of patterns.
[0081] First, an expression ES=10 N1 +10 N2Respectively, the index code corresponding to the to-be-grouped pattern and the reference pattern is acquired, and then it is judged whether the index code of the to-be-grouped pattern is equal to the index code of the reference pattern, so as to simplify the process of judging whether the index code of the to-be-grouped pattern is equal to the index code of the reference pattern, and improve the efficiency of judging whether the to-be-grouped pattern and the reference pattern belong to the same group of patterns.
[0082] Correspondingly, the application further provides a pattern grouping system. Figure 6 is a functional block diagram of an embodiment of the pattern grouping system of the application.
[0083] Reference Figure 6 In this embodiment, the pattern grouping system 500 comprises: a to-be-grouped pattern acquisition module 501 configured to acquire a mask pattern to be grouped in a mask plate as a to-be-grouped pattern; a search range acquisition module 502 configured to determine a search range along a preset search direction corresponding to the to-be-grouped pattern; an edge number acquisition module 503 configured to count the number of edges of the remaining mask patterns located at a first side of the to-be-grouped pattern and the number of edges of the remaining mask patterns located at a second side of the to-be-grouped pattern in the search range along the preset search direction; and a judgment module 504 configured to judge the group to which the to-be-grouped pattern belongs based on the number of edges of the remaining mask patterns at the first side and the number of edges of the remaining mask patterns at the second side.
[0084] Specifically, since the group to which the to-be-grouped pattern belongs is judged based on the number of edges of the remaining mask patterns at both sides of the to-be-grouped pattern, it is convenient to attribute similar patterns to the same pattern group, and compared with the scheme of attributing patterns with completely identical environments at both sides to the same pattern group, it is advantageous to increase the number of patterns in the same pattern group, and accordingly, it is advantageous to reduce the number of pattern groups, thereby improving the efficiency of subsequent pattern processing (for example, optical proximity correction processing).
[0085] The mask pattern to be grouped in the mask plate is acquired as the to-be-grouped pattern, so as to facilitate subsequent pattern processing (for example, optical proximity correction processing) of different categories of mask patterns according to the grouping pattern category.
[0086] In this embodiment, the preset search direction comprises: a direction perpendicular to the line width dimension direction of the to-be-grouped pattern, or a direction parallel to the line width dimension direction of the to-be-grouped pattern.
[0087] The preset search direction includes a direction perpendicular to the line width dimension direction of the to-be-grouped pattern or a direction parallel to the line width dimension direction of the to-be-grouped pattern, so that when the edge number of the remaining mask pattern located at the side of the to-be-grouped pattern is counted in the search range along the preset search direction, the edge number of the remaining mask pattern located at the side of the to-be-grouped pattern can be counted in the direction perpendicular to the line width dimension direction of the to-be-grouped pattern or in the direction parallel to the line width dimension direction of the to-be-grouped pattern, thereby facilitating selection of a suitable search direction according to actual needs.
[0088] In this embodiment, the search range acquisition module 502 includes a scaling factor determination unit (not shown in the figure), which is configured to determine a corresponding scaling factor on the basis of a preset reference range, and the scaling factor is used to realize scaling of the preset reference range along the preset search direction; and the search range acquisition module 502 is configured to obtain the search range on the basis of the scaling factor and the preset reference range.
[0089] The corresponding scaling factor is determined on the basis of the preset reference range, and then the search range is obtained on the basis of the scaling factor and the preset reference range, so that the value of the search range is within a reasonable range, thereby facilitating the value of the edge number to be more reasonable when the edge number of the remaining mask pattern located at the side of the to-be-grouped pattern is counted in the search range, and further facilitating the number of categories of the grouped pattern to be appropriate.
[0090] Specifically, the preset reference range is 2 times the sum of the minimum spacing between adjacent patterns and the minimum line width dimension in the design rule.
[0091] The preset reference range is 2 times the sum of the minimum spacing between adjacent patterns and the minimum line width dimension in the design rule, which facilitates the edge number of the remaining mask pattern located at the side of different to-be-grouped patterns to be different when the edge number of the remaining mask pattern located at the side of the to-be-grouped pattern is counted in the search range, thereby improving the accuracy of the group to which the to-be-grouped pattern belongs.
[0092] More specifically, the search range is expressed as:
[0093] SDP=f[(Space min +Widthmin)×2×(100%+x)];
[0094] Wherein, SDP is the search range, Space min is the minimum spacing between adjacent patterns in the layout design rule, and Width minThe minimum line width size of a pattern in a layout design rule, x is the scaling factor.
[0095] The expression of the search range is advantageous to reduce the difficulty of determining the search range.
[0096] As an example, as shown in Figure 4 The search range can be the first search value S1, the second search value S2, or the third search value S3. It should be noted that when the search range is the first search value S1, the second search value S2, or the third search value S3, the number of edges of the remaining mask pattern D of the side of the pattern to be grouped C can be different.
[0097] In the embodiment, the scaling factor determination unit includes a grid size determination sub-unit (not shown in the figure) for determining the grid size of the photolithography process; the scaling factor determination unit is used to take the value of the grid size as the initial value of the search range, and determine the scaling factor according to the preset reference range.
[0098] After determining the grid size of the photolithography process, taking the value of the grid size as the initial value of the search range, and determining the scaling factor according to the preset reference range, it is advantageous to make the value of the scaling factor within a reasonable range, so that the value of the search range is within a reasonable range.
[0099] More specifically, the scaling factor determination unit further includes an adjustment sub-unit (not shown in the figure) for adjusting the scaling factor based on the value of the grid size after determining the corresponding scaling factor based on the preset reference range; the search range acquisition module 502 is used to scale the preset reference range along the preset search direction based on the adjusted scaling factor, to adjust the size of the preset reference range along the preset search direction.
[0100] Adjusting the scaling factor based on the value of the grid size first, and then scaling the preset reference range along the preset search direction based on the adjusted scaling factor, is advantageous to make the size of the preset reference range along the preset search direction more ideal, thereby further ensuring that the value of the search range is within a reasonable range.
[0101] In the embodiment, the adjustment sub-unit is used to adjust the scaling factor based on the value of the grid size according to the pattern critical dimension, pattern density, and pattern type of the mask pattern in the mask.
[0102] The scaling factor based on the value of the grid size is adjusted according to the pattern critical dimension, pattern density and pattern type of the mask pattern in the mask, so as to associate the adjusted scaling factor with the pattern critical dimension, pattern density and pattern type of the mask pattern, and facilitate the size of the preset reference range along the preset search direction to be more ideal when the preset reference range is scaled along the preset search direction based on the adjusted scaling factor to adjust the size of the preset reference range along the preset search direction.
[0103] As an example, when the pattern critical dimension of the mask pattern in the mask is less than 100 nanometers, the scaling factor based on the value of the grid size is adjusted in a range of 300% to 500%; when the critical dimension of the pattern C to be grouped is greater than 100 nanometers, the scaling factor based on the value of the grid size is adjusted in a range of 100% to 300%.
[0104] As another example, when the pattern density of the mask pattern in the mask is less than 15%, the scaling factor based on the value of the grid size is adjusted in a range of 200% to 500%; when the pattern density of the mask pattern in the mask is greater than 15% and less than 30%, the scaling factor based on the value of the grid size is adjusted in a range of 100% to 300%; when the pattern density of the mask pattern in the mask is greater than 30%, the scaling factor based on the value of the grid size is adjusted in a range of 50% to 100%.
[0105] As yet another example, when the pattern type of the mask pattern in the mask is one-dimensional pattern, the scaling factor based on the value of the grid size is adjusted in a range of 100% to 300%; when the pattern type of the mask pattern in the mask is two-dimensional pattern, the scaling factor based on the value of the grid size is adjusted in a range of 300% to 500%.
[0106] In the embodiment, the grid size is determined by a function related to the resolution of the photolithography process.
[0107] The grid size generally refers to the optimal grid size for subdividing the mask pattern when performing photolithography simulation and design optimization. Therefore, the grid size is determined by a function related to the resolution of the photolithography process, so that the grid size can capture the details of the mask pattern and optical effects (e.g., diffraction and scattering), and maintain the calculation efficiency and reduce unnecessary consumption of computing resources.
[0108] Specifically, the function related to the resolution of the photolithography process is:
[0109] GZ = f[K1x l / NAx (1+ s)];
[0110] Wherein, GZ is the grid size, K1 is the resolution coefficient of the lithography process, l is the wavelength of the exposure light source, NA is the numerical aperture, and s is the light source size of the exposure system.
[0111] The above function can obtain the grid size based on the resolution coefficient of the lithography process, the wavelength of the exposure light source, the numerical aperture, and the light source size of the exposure system, which is conducive to further improving the effect of capturing the details of the mask pattern and the optical effects (e.g., diffraction and scattering) by the grid size, and also conducive to making the effect of keeping the calculation efficiency better.
[0112] In other embodiments, the search range acquisition module includes: a grid size determination unit configured to determine the grid size of the lithography process; and the search range acquisition module configured to determine the search range along the preset search direction corresponding to the to-be-grouped pattern according to the grid size.
[0113] Determining the search range along the preset search direction corresponding to the to-be-grouped pattern according to the grid size facilitates making the value of the search range within a reasonable range, thereby facilitating making the value of the edge number more reasonable when subsequently counting the edge number of the remaining mask pattern located at the side of the to-be-grouped pattern in the search range, and further facilitating making the number of the grouped pattern categories appropriate.
[0114] As an example, the size of the search range along the preset search direction is equal to the grid size, or the size of the search range is equal to the product of the grid size and the grid size scaling factor.
[0115] The size of the search range along the preset search direction is equal to the grid size, or the size of the search range is equal to the product of the grid size and the grid size scaling factor, which facilitates reducing the difficulty of determining the search range in the case that the value of the search range is within a reasonable range.
[0116] Since the grid size is usually related to the resolution of the lithography process, and the grouping of the pattern is also limited by the resolution of the lithography process, the size of the search range can also be the product of the grid size and the grid size scaling factor. When the grid size scaling factor is 1, the size of the search range is equal to the grid size.
[0117] As an example, when the search range is the first search value S1, the second search value S2, or the third search value S3, the edge number of the remaining mask pattern D at the side of the to-be-grouped pattern C can be different. Correspondingly, the result of the grouping to which the to-be-grouped pattern C belongs can also be different.
[0118] For example, such as Figure 4 As shown, when the search range is either the first search value S1 or the second search value S2, in the right-hand grouped graphic C, the number of edges of the remaining mask graphics D on its first side C1 is 0, and the number of edges of the remaining mask graphics D on its second side C2 is 0. Similarly, in the left-hand grouped graphic C, the number of edges of the remaining mask graphics D on its first side C1 is 0, and the number of edges of the remaining mask graphics D on its second side C2 is 0. At this time, the right-hand grouped graphic C and the left-hand grouped graphic C belong to the same group. However, when the search range is the third search value S3, in the right-hand grouped graphic C, the number of edges of the remaining mask graphics D on its first side C1 is 2, and the number of edges of the remaining mask graphics D on its second side C2 is 2. But in the left-hand grouped graphic C, the number of edges of the remaining mask graphics D on its first side C1 is 0, and the number of edges of the remaining mask graphics D on its second side C2 is 0. At this time, the right-hand grouped graphic C and the left-hand grouped graphic C belong to different groups. Therefore, it can be seen that when the search range is different, the group to which the graphic C to be grouped belongs may also be different.
[0119] In this embodiment, the judgment module 504 further includes: an index code acquisition unit (not shown), used to obtain the index code using the expression ES = 10. N1 +10 N2 Obtain the index code of the graphic to be grouped, where ES is the index code, N1 is the number of edges of the remaining mask graphics on the first side, and N2 is the number of edges of the remaining mask graphics on the second side; a grouping unit (not shown) is used to determine the group to which the graphic to be grouped belongs based on the index code, and the index codes of the same group are the same.
[0120] First, use the expression ES = 10 N1 +10 N2 Obtaining the index code of the graphic to be grouped, and then determining the group to which the graphic belongs based on the index code, helps to simplify the process of determining the group to which the graphic belongs and improves the efficiency of determining the group to which the graphic belongs.
[0121] The graphic grouping system further comprises a second embodiment which is the same as the foregoing embodiments and will not be described herein again. The second embodiment is different from the foregoing embodiments in that the graphic grouping system further comprises: a reference graphic acquisition module configured to acquire a reference graphic in the mask; a search range acquisition module configured to determine a search range along a preset search direction corresponding to the reference graphic, the search range being the same for the to-be-grouped graphic and the reference graphic; an edge number acquisition module configured to count the number of edges of the remaining mask graphics on a first side of the reference graphic and the number of edges of the remaining mask graphics on a second side of the reference graphic in the search range along the preset search direction; and the judging module configured to judge whether the to-be-grouped graphic and the reference graphic belong to the same group of graphics based on the number of edges of the remaining mask graphics on the first side of the to-be-grouped graphic and the reference graphic and the number of edges of the remaining mask graphics on the second side of the to-be-grouped graphic and the reference graphic.
[0122] Acquiring the reference graphic in the mask is advantageous for judging the group to which the to-be-grouped graphic belongs by using the reference graphic, and is correspondingly advantageous for performing graphic processing by using the reference graphic in subsequent graphic processing, thereby being advantageous for further improving the efficiency of subsequent graphic processing.
[0123] Specifically, the judging module is configured to judge whether the number of edges of the remaining mask graphics on the first side of the to-be-grouped graphic is equal to the number of edges of the remaining mask graphics on the first side of the reference graphic and whether the number of edges of the remaining mask graphics on the second side of the to-be-grouped graphic is equal to the number of edges of the remaining mask graphics on the second side of the reference graphic, or whether the number of edges of the remaining mask graphics on the first side of the to-be-grouped graphic is equal to the number of edges of the remaining mask graphics on the second side of the reference graphic and whether the number of edges of the remaining mask graphics on the second side of the to-be-grouped graphic is equal to the number of edges of the remaining mask graphics on the first side of the reference graphic; if yes, it is determined that the to-be-grouped graphic and the reference graphic belong to the same group of graphics; otherwise, it is determined that the to-be-grouped graphic and the reference graphic do not belong to the same group of graphics.
[0124] The algorithm determines whether the number of edges of the remaining mask patterns on the first side of the image to be grouped is equal to the number of edges of the remaining mask patterns on the first side of the reference image, and whether the number of edges of the remaining mask patterns on the second side of the image to be grouped is equal to the number of edges of the remaining mask patterns on the second side of the reference image. Alternatively, it determines whether the number of edges of the remaining mask patterns on the first side of the image to be grouped is equal to the number of edges of the remaining mask patterns on the second side of the reference image, and whether the number of edges of the remaining mask patterns on the second side of the image to be grouped is equal to the number of edges of the remaining mask patterns on the first side of the reference image. This ensures that images to be grouped that are similar to the reference image after being rotated 180° can still belong to the same group of images as the image to be grouped, thereby improving the effect of image processing using the reference image.
[0125] More specifically, the judgment module includes an index code acquisition unit, used to obtain the index code using the expression ES = 10. N1 +10 N2 The index codes corresponding to the graphics to be grouped and the reference graphics are obtained respectively, where ES is the index code, N1 is the number of edges of the remaining mask graphics on the first side, and N2 is the number of edges of the remaining mask graphics on the second side; the grouping unit is used to determine whether the index code of the graphics to be grouped is equal to the index code of the reference graphics. If so, it is determined that the graphics to be grouped and the reference graphics belong to the same group of graphics; otherwise, it is determined that the graphics to be grouped and the reference graphics do not belong to the same group of graphics.
[0126] First, use the expression ES = 10 N1 +10 N2 Obtaining the index codes corresponding to the graphics to be grouped and the reference graphics respectively, and then determining whether the index code of the graphics to be grouped is equal to the index code of the reference graphics, simplifies the process of determining whether the index code of the graphics to be grouped is equal to the index code of the reference graphics, and improves the efficiency of determining whether the graphics to be grouped and the reference graphics belong to the same group of graphics.
[0127] like Figure 5 As shown, as an example, when the number of edges of the remaining mask pattern D on the first side C1 of the pattern to be grouped is 0 [e.g.] Figure 5 When shown in (a), N1 = 0, 10 N1 =0; when the number of edges of the remaining mask pattern D on the first side C1 is 1 [e.g.] Figure 5 (b) As shown, N1 = 1, 10 N1 =10; when the number of edges of the remaining mask pattern D on the first side C1 is 2 [e.g.] Figure 5 (c) As shown, N1 = 2, 10 N1 =100; when the number of edges of the remaining mask pattern D on the first side C1 is 3 [e.g.]Figure 5 (d) as shown, N1=3, 10 N1 =1000; when the edge number of the remaining mask pattern D of the first side C1 is 3, and the edge number of the remaining mask pattern D of the second side C2 is 2 【as shown in Figure 5 (e) as shown, ES=10 3 +10 2 =1100.
[0128] It should be noted that, Figure 5 (a) is the case when the edge number of the remaining mask pattern of the first side of the pattern to be grouped in an embodiment of the pattern grouping method of the present application is 0; Figure 5 (b) is the case when the edge number of the remaining mask pattern of the first side of the pattern to be grouped in an embodiment of the pattern grouping method of the present application is 1; Figure 5 (c) is the case when the edge number of the remaining mask pattern of the first side of the pattern to be grouped in an embodiment of the pattern grouping method of the present application is 2; Figure 5 (d) is the case when the edge number of the remaining mask pattern of the first side of the pattern to be grouped in an embodiment of the pattern grouping method of the present application is 3; Figure 7 (e) is the case when the edge number of the remaining mask pattern of the first side of the pattern to be grouped in an embodiment of the pattern grouping method of the present application is 3, and the edge number of the remaining mask pattern of the second side is 2.
[0129] Correspondingly, the embodiment of the present application also provides an electronic device. Figure 7 The hardware structure diagram of the device provided by an embodiment of the present application.
[0130] With reference to In the embodiment, the electronic device includes at least one memory 03 and at least one processor 01, the memory 03 stores one or more computer instructions, wherein the one or more computer instructions are executed by the processor 01 to implement the pattern grouping method described in the embodiment of the present application.
[0131] As an example, the processor 01 can be a central processing unit (CPU), a field programmable gate array (FPGA), a programmable logic controller (PLC), or an application specific integrated circuit (ASIC), or one or more integrated circuits configured to implement the pattern grouping method described in the embodiment of the present application.
[0132] The memory 03 can include a high-speed RAM memory and can also include a non-volatile memory, such as at least one disk memory. The memory stores one or more computer instructions, which are executed by the processor 01, for implementing the graphic grouping method according to the embodiments of the present application.
[0133] In the embodiment, the electronic device can further include at least one communication interface 02 and at least one communication bus 04.
[0134] The communication interface 02 can be an interface of a communication module for network communication, such as an interface of a GSM module.
[0135] It should be noted that the electronic device can further include other devices (not shown) which can not be necessary for the disclosure of the embodiments of the present application; since these other devices can not be necessary for understanding the disclosure of the embodiments of the present application, the embodiments of the present application do not introduce them one by one.
[0136] Correspondingly, the embodiments of the present application further provide a computer program product, which includes computer instructions, the computer instructions being executed by a processor to implement the graphic grouping method according to the embodiments of the present application.
[0137] Correspondingly, the embodiments of the present application further provide a storage medium, which stores one or more computer instructions, the one or more computer instructions being used to implement the graphic grouping method according to the embodiments of the present application.
[0138] The above-described embodiments of the present application are combinations of elements and features of the present application. The elements or features can be considered selective unless otherwise mentioned. Each of the elements or features can be practiced without being combined with the other elements or features. Also, some constructions of the embodiments of the present application can be constructed by combining some of the elements and / or features. The order of the operations described in the embodiments of the present application can be changed. Some constructions of any of the embodiments can be included in another embodiment and can be substituted for the corresponding construction of another embodiment. It is obvious that the claims that are not explicitly cited in each other in the appended claims can be combined in the embodiments of the present application, or can be included in new claims after amendment of the present application.
[0139] Embodiments of the present application can be implemented by various means, for example, hardware, firmware, software, or a combination thereof. In a hardware configuration, the method according to an exemplary embodiment of the present application can be implemented by one or more Application Specific Integrated Circuits (ASICs), Digital Signal Processors (DSPs), Digital Signal Processing Devices (DSPDs), Programmable Logic Devices (PLDs), Field Programmable Gate Arrays (FPGAs), processors, controllers, micro-controllers, microprocessors, etc.
[0140] In a firmware or software configuration, the embodiments of the present application can be implemented in the form of modules, procedures, functions, and so on. Software code can be stored in a memory unit and executed by a processor. The memory unit is located at the interior or exterior of the processor and can deliver data to and receive data from the processor via various known means.
[0141] While the present application has been disclosed with reference to the above embodiments, the present application is not limited to the above embodiments. It will be apparent to those skilled in the art that various modifications and changes can be made thereto without departing from the spirit and scope of the present application. Therefore, the scope of the present application should be determined by the scope of the appended claims.
Claims
1. A method for grouping graphics, characterized in that, include: Obtain the mask image to be grouped from the mask, and use it as the image to be grouped; Determine the search range along the preset search direction corresponding to the graphic to be grouped; Along the preset search direction, count the number of edges of the remaining mask graphics located on the first side of the graphic to be grouped, and the number of edges of the remaining mask graphics located on the second side of the graphic to be grouped, within the search range; Based on the number of edges of the remaining mask patterns on the first side and the number of edges of the remaining mask patterns on the second side, the group to which the pattern to be grouped belongs is determined.
2. The graphic grouping method as described in claim 1, characterized in that, The steps for determining the search range include: determining the mesh size of the photolithography process; Based on the grid size, determine the search range along the preset search direction corresponding to the graphic to be grouped.
3. The graphic grouping method as described in claim 2, characterized in that, Along the preset search direction, the size of the search range is equal to the grid size, or the size of the search range is equal to the product of the grid size and the grid size scaling factor.
4. The graphic grouping method as described in claim 1, characterized in that, The step of determining the search range includes: determining a corresponding scaling factor based on a preset reference range, wherein the scaling factor is used to scale the preset reference range along the preset search direction; The search range is obtained based on the scaling factor and the preset benchmark range.
5. The graphic grouping method as described in claim 4, characterized in that, The preset reference range is twice the sum of the minimum spacing between adjacent graphics and the minimum line width of the graphics in the design rules.
6. The graphic grouping method as described in claim 5, characterized in that, The expression for the search range is: SDP=f[(Space min +Width m in)×2×(100%+x)]; Where SDP represents the search range, and Space min Width is the minimum spacing between adjacent graphics in the layout design rules. min is the minimum line width of the graphic in the layout design rules, and x is the scaling factor.
7. The graphic grouping method as described in claim 4, characterized in that, Based on the preset reference range, determine the corresponding scaling factor, including: determining the grid size of the photolithography process; The value of the grid size is used as the initial value of the search range, and the scaling factor is determined according to the preset reference range.
8. The graphic grouping method as described in claim 7, characterized in that, After determining the corresponding scaling factor based on the preset reference range, the method further includes: adjusting the scaling factor obtained based on the value of the grid size; The preset reference range is scaled along the preset search direction based on the adjusted scaling factor to adjust the size of the preset reference range along the preset search direction.
9. The graphic grouping method as described in claim 8, characterized in that, The scaling factor, obtained based on the grid size, is adjusted according to the key dimensions, density, and type of the mask graphic in the mask.
10. The graphic grouping method as described in claim 2 or 7, characterized in that, The grid size is determined by a function related to the resolution of the photolithography process.
11. The graphic grouping method as described in claim 10, characterized in that, The function related to the resolution of the photolithography process is: GZ = f[K1×λ / NA×(1+σ)]; Where GZ is the grid size, K1 is the resolution coefficient, λ is the wavelength of the exposure light source, NA is the numerical aperture, and σ is the beam size of the light source in the exposure system.
12. The graphic grouping method according to any one of claims 1 to 9, characterized in that, In the step of determining the search range along the preset search direction corresponding to the graphic to be grouped, the preset search direction includes: a direction perpendicular to the line width dimension direction of the graphic to be grouped, or a direction parallel to the line width dimension direction of the graphic to be grouped.
13. The graphic grouping method according to any one of claims 1 to 9, characterized in that, Based on the number of edges of the remaining mask patterns on the first side and the number of edges of the remaining mask patterns on the second side, the group to which the pattern to be grouped belongs is determined, including: Using the expression ES=10 N1 +10 N2 Obtain the index code of the graphic to be grouped, where ES is the index code, N1 is the number of edges of the remaining mask graphics on the first side, and N2 is the number of edges of the remaining mask graphics on the second side. The group to which the graphic to be grouped belongs is determined based on the index code, and the index codes are the same for the same group.
14. The graphic grouping method according to any one of claims 1 to 9, characterized in that, Before determining the group to which the graphics to be grouped belong, the graphics grouping method further includes: Obtain the reference image from the mask; Determine the search range along a preset search direction corresponding to the reference graphic, and the graphic to be grouped and the reference graphic use the same search range; Along the preset search direction, count the number of edges of the remaining mask patterns located on the first side of the reference pattern and the number of edges of the remaining mask patterns located on the second side of the reference pattern within the search range; Based on the number of edge references of the remaining mask graphics on the first side of the graphic to be grouped and the reference graphic, and the number of reference edges of the remaining mask graphics on the second side of the graphic to be grouped and the reference graphic, it is determined whether the graphic to be grouped and the reference graphic belong to the same group of graphics.
15. The graphic grouping method as described in claim 14, characterized in that, The methods for determining whether the graphic to be grouped and the reference graphic belong to the same group of graphics include: Determine whether the number of edges of the remaining mask patterns on the first side of the pattern to be grouped is equal to the number of edges of the remaining mask patterns on the first side of the reference pattern, and whether the number of edges of the remaining mask patterns on the second side of the pattern to be grouped is equal to the number of edges of the remaining mask patterns on the second side of the reference pattern; or, determine whether the number of edges of the remaining mask patterns on the first side of the pattern to be grouped is equal to the number of edges of the remaining mask patterns on the second side of the reference pattern, and whether the number of edges of the remaining mask patterns on the second side of the pattern to be grouped is equal to the number of edges of the remaining mask patterns on the first side of the reference pattern. If so, determine that the graphic to be grouped and the reference graphic belong to the same group of graphics; Otherwise, it is determined that the graphic to be grouped and the reference graphic do not belong to the same group of graphics.
16. The graphic grouping method as described in claim 15, characterized in that, The methods for performing the judgment include: using the expression ES = 10 N1 +10 N2 Obtain the index codes corresponding to the graphics to be grouped and the reference graphics respectively, where ES is the index code, N1 is the number of edges of the remaining mask graphics on the first side, and N2 is the number of edges of the remaining mask graphics on the second side. Determine whether the index code of the graphic to be grouped is equal to the index code of the reference graphic.
17. A graphic grouping system, characterized in that, include: The module for acquiring images to be grouped is used to acquire the mask images to be grouped in the mask, and use them as images to be grouped. The search range acquisition module is used to determine the search range along the preset search direction corresponding to the graphic to be grouped; An edge count acquisition module is used to count the number of edges of the remaining mask graphics located on the first side of the graphic to be grouped, and the number of edges of the remaining mask graphics located on the second side of the graphic to be grouped, within the search range along the preset search direction. The judgment module is used to determine the group to which the graphic to be grouped belongs based on the number of edges of the remaining mask graphics on the first side and the number of edges of the remaining mask graphics on the second side.
18. An electronic device, characterized in that, It includes at least one memory and at least one processor, the memory storing one or more computer instructions, wherein the one or more computer instructions are executed by the processor to implement the graphics grouping method as described in any one of claims 1 to 16.
19. A computer program product, characterized in that, It includes computer instructions, which, when executed by a processor, are used to implement the graphics grouping method as described in any one of claims 1 to 16.
20. A storage medium, characterized in that, The storage medium stores one or more computer instructions, which are used to implement the graphics grouping method as described in any one of claims 1 to 16.