Battery production system and coding control method for a battery

Abstract

The application discloses a battery production system and a coding control method for a battery. The battery production system comprises a controller and a coding device, and the controller is connected with the coding device. The controller is used for determining a first target etching parameter based on a preset blackness model and a preset blackness, determining a second target etching parameter based on a preset topography model and preset topography parameters of a target graphic code, and the coding device is used for etching a graphic code on a target battery based on the first target etching parameter and the second target etching parameter. Since the greater the blackness is, the stronger the light trapping effect is, and the higher the recognition rate of the graphic code is, the recognition rate of the graphic code can meet the production demand based on the preset blackness for etching the graphic code. The preset topography parameters are used for etching the graphic code, the accurate control of the topography of the graphic code can be realized, the topography of the graphic code is easy to recognize, and therefore the recognition rate of the graphic code can meet the production demand.

Description

Technical Field

[0001] This application relates to the field of battery technology, specifically to a battery production system and a marking control method for batteries. Background Technology

[0002] In the field of battery manufacturing, the graphic codes on batteries can be used to record and trace battery identity, production batch and key process parameters, enabling quality tracking and data management throughout the entire life cycle.

[0003] However, during the battery production process, electrolyte can easily splash onto the battery and crystallize, causing the graphic code to be contaminated, which increases the difficulty of graphic code recognition or even makes it impossible to recognize.

[0004] Therefore, a solution is needed that enables the recognition rate of the graphic codes on the battery to meet production requirements.

[0005] The above statements are for the purpose of providing background information in relation to this application only and do not necessarily constitute prior art. Summary of the Invention

[0006] In view of the above problems, this application provides a battery production system and a marking control method for batteries, which can control the blackness and shape of the graphic code by preset blackness and preset shape parameters, so that the light trapping effect and shape of the graphic code meet the recognition requirements, thereby enabling the recognition rate of the graphic code to meet the production requirements.

[0007] In a first aspect, this application provides a battery production system, comprising: a controller and a marking device, the controller being connected to the marking device; the controller being configured to determine first target etching parameters based on a preset blackness model and a preset blackness; determine second target etching parameters based on a preset morphology model and preset morphology parameters of a target pattern code; and send the first target etching parameters and the second target etching parameters to the marking device; the marking device being configured to etch a pattern code on a target battery based on the first target etching parameters and the second target etching parameters; wherein, the preset blackness model represents the mapping relationship between blackness and the first etching parameters; and the preset morphology model represents the mapping relationship between morphology parameters and the second etching parameters.

[0008] Therefore, the controller determines the first target etching parameters based on a preset blackness model and preset blackness, and determines the second target etching parameters based on a preset morphology model and preset morphology parameters of the target pattern code. Then, the etching equipment etches the pattern code on the target battery based on the first and second target etching parameters. Since blackness is related to the light-trapping effect of the pattern code, the greater the blackness, the stronger the light-trapping effect, and the higher the recognition rate of the pattern code. Therefore, etching the pattern code based on the preset blackness can achieve precise control of the blackness of the pattern code, thereby controlling the light-trapping effect of the pattern code and ensuring that the light-trapping effect of the pattern code meets the recognition requirements. This allows the recognition rate of the pattern code to meet production needs. Similarly, etching the pattern code based on the preset morphology parameters can achieve precise control of the morphology of the pattern code, making the morphology of the pattern code easy to recognize. Therefore, it allows control of the recognition rate of the pattern code, thereby improving the recognition rate of the pattern code and ensuring that the recognition rate of the pattern code meets production needs.

[0009] In some embodiments, the preset blackness model includes a mapping relationship between blackness and a first etching parameter; the controller is used to obtain the preset blackness and a first preset range; determine multiple target etching parameters corresponding to the preset blackness based on the mapping relationship; and determine the first target etching parameter based on the first preset range and the multiple target etching parameters.

[0010] In this way, based on the mapping relationship between blackness and the first etching parameter, and with the first preset range as the constraint, the first target etching parameter corresponding to the preset blackness can be solved, thereby accurately determining the first target etching parameter so as to accurately etch out the graphic code that meets the preset blackness.

[0011] In some embodiments, the preset blackness model includes a mapping table between different blacknesses and a first etching parameter; a controller is used to obtain the preset blackness; and to look up the first target etching parameter corresponding to the preset blackness from the mapping table.

[0012] In this way, by looking up the mapping table, the first target etching parameters corresponding to the preset blackness can be quickly determined, thereby improving the efficiency of etching pattern codes.

[0013] In some embodiments, the first target etching parameters include at least one of etching power, etching rate, etching frequency, and etching spacing.

[0014] In this way, the blackness of the graphic code can be more comprehensively and accurately controlled by multiple aspects such as etching power, etching speed, etching frequency and etching spacing.

[0015] In some embodiments, the second target etching parameter includes the target etching wavelength; the preset morphology parameter includes the preset etching depth and / or the preset etching spacing; the preset morphology model includes: the mapping relationship between etching depth and etching wavelength, and / or, the mapping relationship between etching spacing and etching wavelength.

[0016] Thus, based on the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength, the target etching wavelength corresponding to the preset etching depth and / or preset etching spacing can be accurately determined, so as to accurately etch out the graphic code that meets the preset etching depth and / or preset etching spacing.

[0017] In some embodiments, the battery production system further includes: a barcode scanner connected to a controller; the barcode scanner for identifying graphic codes on a target battery; the controller for determining the identification time for the barcode scanner to identify the graphic codes; and determining a detection result based on the identification time.

[0018] In this way, after etching the graphic code, the graphic code can be detected by the recognition time, so as to promptly identify graphic codes that fail the detection and reduce the occurrence of subsequent events that affect normal production due to failed scanning.

[0019] In some embodiments, the angle between the emitted light from the scanning device and the emitted light from the marking device is less than a preset angle and / or the scanning device is equipped with a polarizer.

[0020] Thus, by ensuring that the angle between the emitted light from the barcode scanner and the emitted light from the marking device is less than a preset angle and / or by installing a polarizer on the barcode scanner, a good barcode scanning effect can be achieved, reducing barcode malfunctions caused by the barcode scanner and thereby improving the accuracy of the graphic code detection results.

[0021] In some embodiments, the battery production system further includes: an image acquisition device connected to a controller; the image acquisition device is used to acquire an image of a graphic code, determine the shape parameters of the graphic code based on the image, and send the shape parameters to the controller; the controller is used to control a barcode scanning device to recognize the graphic code when the shape parameters are within a second preset range.

[0022] In this way, before detecting the graphic code by recognition time, we can first judge whether the graphic code meets the requirements by the shape parameters of the graphic code, thus realizing a double verification of the graphic code and improving the reliability of the detection results.

[0023] In some embodiments, the battery production system further includes: a transfer device connected to a controller; the controller being configured to send a first control command to the transfer device and a second control command to the marking device when the detection result characterization and identification time exceeds a preset threshold, or when the morphology parameters exceed a second preset range; the transfer device being configured to transfer the target battery to the marking station based on the first control command; and the marking device being configured to control the marking device to perform etching again on the target battery when the target battery arrives at the marking station based on the second control command.

[0024] In this way, if the graphic code fails the test, it can be reworked, minimizing the battery failure rate.

[0025] Secondly, this application provides a coding control method for batteries, applied to a battery production system as shown in any embodiment of the first aspect. The method includes: determining a first target etching parameter based on a preset blackness model and a preset blackness; determining a second target etching parameter based on a preset morphology model and preset morphology parameters of the target pattern code; and etching a pattern code on a target battery based on the first target etching parameter and the second target etching parameter; wherein the preset blackness model represents the mapping relationship between blackness and the first etching parameter; and the preset morphology model represents the mapping relationship between the morphology parameter and the second etching parameter.

[0026] Therefore, since blackness is related to the light-trapping effect of graphic codes, the greater the blackness, the stronger the light-trapping effect, and the higher the recognition rate of graphic codes, etching graphic codes based on preset blackness can achieve precise control of graphic code blackness, thereby controlling the light-trapping effect of graphic codes and ensuring that the light-trapping effect of graphic codes meets recognition requirements. This allows the recognition rate of graphic codes to meet production needs. Furthermore, etching graphic codes based on preset morphology parameters can achieve precise control of graphic code morphology, making the morphology of graphic codes easy to recognize. Therefore, it is possible to control the recognition rate of graphic codes, thereby improving the recognition rate of graphic codes and ensuring that the recognition rate of graphic codes meets production requirements.

[0027] In some embodiments, the preset blackness model includes a mapping relationship between blackness and a first etching parameter; determining the first target etching parameter based on the preset blackness model and the preset blackness includes: obtaining a preset blackness and a first preset range; determining multiple target etching parameters corresponding to the preset blackness based on the mapping relationship; and determining the first target etching parameter based on the first preset range and the multiple target etching parameters.

[0028] In this way, based on the mapping relationship between blackness and the first etching parameter, and with the first preset range as the constraint, the first target etching parameter corresponding to the preset blackness can be solved, thereby accurately determining the first target etching parameter so as to accurately etch out the graphic code that meets the preset blackness.

[0029] In some embodiments, the preset blackness model includes a mapping table between different blacknesses and the first etching parameter; determining the first target etching parameter based on the preset blackness model and the preset blackness includes: obtaining the preset blackness; and searching for the first target etching parameter corresponding to the preset blackness from the mapping table.

[0030] In this way, by looking up the mapping table, the first target etching parameters corresponding to the preset blackness can be quickly determined, thereby improving the efficiency of etching pattern codes.

[0031] In some embodiments, the first target etching parameters include at least one of etching power, etching rate, etching frequency, and etching spacing.

[0032] In this way, the blackness of the graphic code can be more comprehensively and accurately controlled by multiple aspects such as etching power, etching speed, etching frequency and etching spacing.

[0033] In some embodiments, the second target etching parameter includes the target etching wavelength; the preset morphology parameter includes the preset etching depth and / or the preset etching spacing; the preset morphology model includes: the mapping relationship between etching depth and etching wavelength, and / or, the mapping relationship between etching spacing and etching wavelength.

[0034] Thus, based on the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength, the target etching wavelength corresponding to the preset etching depth and / or preset etching spacing can be accurately determined, so as to accurately etch out the graphic code that meets the preset etching depth and / or preset etching spacing.

[0035] In some embodiments, the above description is only an overview of the technical solution of this application. In order to better understand the technical means of this application and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this application more obvious and understandable, specific embodiments of this application are described below. Attached Figure Description

[0036] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiments below. The accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this application. Furthermore, the same reference numerals denote the same parts throughout the drawings. In the drawings:

[0037] Figure 1 A schematic diagram illustrating a corrupted graphic code provided for some embodiments of this application;

[0038] Figure 2a One of the schematic diagrams of a graphic code microstructure provided in some embodiments of this application;

[0039] Figure 2b A second schematic diagram of a graphic code microstructure provided for some embodiments of this application;

[0040] Figure 2c A third schematic diagram of a graphic code microstructure provided for some embodiments of this application;

[0041] Figure 3 This is one of the structural schematic diagrams of a battery production system provided in some embodiments of this application;

[0042] Figure 4 This is a second schematic diagram of the structure of a battery production system provided in some embodiments of this application;

[0043] Figure 5 One of the schematic diagrams provided for a scanning angle in some embodiments of this application;

[0044] Figure 6a This is a second schematic diagram illustrating a scanning angle for some embodiments of this application;

[0045] Figure 6b This is the third schematic diagram illustrating a scanning angle for some embodiments of this application;

[0046] Figure 7 A schematic diagram illustrating the principle of a polarizer provided for some embodiments of this application;

[0047] Figure 8 This is the third schematic diagram of a battery production system provided in some embodiments of this application;

[0048] Figure 9 A schematic diagram illustrating the principle of a super depth-of-field microscope provided for some embodiments of this application;

[0049] Figure 10 Fourth schematic diagram of a battery production system provided in some embodiments of this application;

[0050] Figure 11 One of the schematic diagrams of the workflow of a battery production system provided in some embodiments of this application;

[0051] Figure 12 This is a second schematic diagram of the workflow of a battery production system provided in some embodiments of this application;

[0052] Figure 13 This is a flowchart illustrating a marking control method for a battery, provided for some embodiments of this application.

[0053] The accompanying drawings are not necessarily drawn to scale. Detailed Implementation

[0054] The embodiments of the technical solution of this application will now be described in detail with reference to the accompanying drawings. These embodiments are only used to more clearly illustrate the technical solution of this application and are therefore merely examples, and should not be used to limit the scope of protection of this application.

[0055] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains; the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the application; the terms “comprising” and “having”, and any variations thereof, in the specification, claims, and foregoing description of the drawings are intended to cover non-exclusive inclusion.

[0056] In the description of the embodiments of this application, technical terms such as "first" and "second" are used only to distinguish different objects and should not be construed as indicating or implying relative importance or implicitly specifying the number, specific order, or primary and secondary relationship of the indicated technical features. In the description of the embodiments of this application, "multiple" means two or more, unless otherwise explicitly defined.

[0057] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0058] In the description of the embodiments in this application, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0059] In the description of the embodiments of this application, the term "multiple" refers to two or more (including two), similarly, "multiple sets" refers to two or more (including two sets), and "multiple pieces" refers to two or more (including two pieces).

[0060] In the battery manufacturing industry, the graphic codes on batteries can be used to record and trace battery identity, production batch, and key process parameters, enabling quality tracking and data management throughout the battery's lifecycle. However, during battery production, electrolyte can easily splash onto the battery and crystallize, contaminating the graphic codes and increasing the difficulty of recognition, or even rendering them unrecognizable. Therefore, a solution is needed that ensures the graphic code recognition rate on batteries meets production requirements.

[0061] For example, such as Figure 1 As shown, during the battery production process, the graphic code on the battery is easily contaminated by the electrolyte, resulting in poor scanning. Subsequent rework can only be carried out by manually wiping or affixing silver labels, which seriously affects manpower and material resources and may even lead to the scrapping of the battery.

[0062] This application provides a battery production system and a marking control method for batteries. The battery production system includes: a controller and a marking device, the controller being connected to the marking device; the controller is used to determine a first target etching parameter based on a preset blackness model and a preset blackness; determine a second target etching parameter based on a preset morphology model and preset morphology parameters of the target pattern code; and send the first target etching parameter and the second target etching parameter to the marking device; the marking device is used to etch a pattern code on the target battery based on the first target etching parameter and the second target etching parameter; wherein, the preset blackness model represents the mapping relationship between blackness and the first etching parameter; and the preset morphology model represents the mapping relationship between the morphology parameter and the second etching parameter.

[0063] The light trapping effect refers to the phenomenon of enhancing the absorption and utilization efficiency of light through specific structural design. Its core lies in using phenomena such as light refraction, reflection, scattering and interference to change the propagation path of light on the surface and inside of a material, and increase the residence time of light on the surface and inside of the material.

[0064] like Figure 2a As shown, the first region 210 is a relatively flat area of ​​the graphic code, and the second region 220 is the grooved microstructure of the graphic code, which can produce a light-trapping effect. Figure 2b This is an image of the first region 210 magnified. Figure 2c This is a 220x magnified image of the second region. Enhancing the light trapping effect of the graphic code can improve its recognition rate.

[0065] Since the greater the blackness, the stronger the light trapping effect, and the higher the recognition rate of the graphic code, etching the graphic code based on the preset blackness can achieve precise control of the blackness of the graphic code, so that the light trapping effect of the graphic code can meet the recognition requirements, and thus the recognition rate of the graphic code can meet the production requirements.

[0066] The surface structure of the etched graphic code can include at least one of micro / nano structures, periodic structures, and plasmonic structures. Micro / nano structures can include pits, inverted pyramids, nanopillars, nanopores, etc., which can increase the number of light scattering and reflections, lengthening the light propagation path within the material. Periodic structures can include specifically designed periodic structures such as gratings; the ability of these structures to control incident light is related to the structure's period, depth, and the wavelength of the incident light. Increasing the structure depth can improve the diffraction order, utilizing the interference effect of light to lengthen the light propagation path within the material. Plasmonic structures can increase the light-trapping effect through surface plasmonic resonance. This enhances the light-trapping effect of the graphic code, thereby improving its recognition rate.

[0067] Meanwhile, etching graphic codes based on preset morphology parameters can achieve precise control over the morphology of graphic codes, making the morphology of graphic codes easy to identify, thereby controlling the recognition rate of graphic codes. Therefore, the recognition rate of graphic codes can meet production requirements.

[0068] In some embodiments of this application, the battery can be, but is not limited to, a cell, a single battery cell, a battery module, a battery pack, an energy storage cabinet, an energy storage container, etc. The battery can be of any chemical type, such as a lithium-ion battery, a nickel-based battery, a sodium-based battery, a lead-acid battery, etc. Among them, lithium-ion batteries include, but are not limited to, lithium cobalt oxide batteries, lithium manganese oxide batteries, lithium nickel oxide batteries, lithium iron phosphate batteries, etc.

[0069] In some embodiments of this application, the battery can be of any shape and structure, such as a cylindrical battery, a flat battery, a pouch battery, a prismatic battery, etc. The battery can be applied in any application scenario that requires battery use. It can be used as a consumer electronics battery, such as in mobile phones and laptops. The battery can also be used as an energy storage battery, and as a power battery, such as in electric vehicles, electric bicycles, electric aircraft, and electric ships.

[0070] The battery manufacturing system provided in some embodiments of this application can be used in any stage of battery manufacturing. The solutions disclosed in some embodiments of this application can be used to etch pattern codes in any stage of the manufacturing process of any battery.

[0071] First, combined Figure 3 The battery production system provided in the embodiments of this application will be described in detail.

[0072] Figure 3 This illustration shows one of the structural schematic diagrams of a battery production system according to an embodiment of this application. Figure 3 As shown, the battery production system 300 may include a controller 310 and a marking device 320, wherein the controller 310 may be connected to the marking device 320.

[0073] The controller 310 can be used to determine the first target etching parameters based on the preset blackness model and preset blackness; determine the second target etching parameters based on the preset morphology model and the preset morphology parameters of the target graphic code; and send the first target etching parameters and the second target etching parameters to the coding device 320.

[0074] The controller 310 may include a host computer and / or a slave computer. The slave computer may be a programmable logic controller (PLC).

[0075] Blackness can be used to quantitatively describe how close a surface is to an ideal blackbody in the visible light band, essentially reflecting its visual "blackness". Blackness is positively correlated with the light-trapping effect, and the light-trapping effect is positively correlated with the recognition rate, therefore blackness is positively correlated with the recognition rate. A preset blackness can be a pre-determined blackness of a graphic code whose recognition rate meets the requirements. A preset blackness model can represent the mapping relationship between blackness and a first etching parameter. The corresponding blackness and the first etching parameter in this mapping relationship can characterize whether the graphic code etched according to the first etching parameter meets the blackness requirement. Therefore, based on the preset blackness model, a first target etching parameter corresponding to the preset blackness can be determined, so that a graphic code that meets the preset blackness can be etched based on the first target etching parameter.

[0076] Topographic parameters can be parameters used to quantitatively describe the geometric features of an object's surface. Preset topographic parameters can be pre-determined topographic parameters for graphic codes whose recognition rate meets requirements. A preset topographic model can represent the mapping relationship between topographic parameters and second etching parameters. The corresponding topographic parameters and second etching parameters in this mapping relationship can characterize whether the graphic code etched according to the second etching parameter satisfies the topographic parameters. Therefore, a second target etching parameter corresponding to the preset topographic parameters can be determined based on the preset topographic model, so that a graphic code satisfying the preset topographic parameters can be etched based on the second target etching parameter.

[0077] Different application scenarios have different requirements for graphic code recognition rate. The preset blackness and preset shape parameters can be determined according to the specific recognition rate requirements of the current application scenario.

[0078] Etching parameters are parameters used in the etching process to control material removal behavior and processing quality. Etching parameters may include at least one of the following: etching power, etching rate, etching frequency, etching spacing, etching wavelength, defocusing amount, and pulse width. The first etching parameter and the second etching parameter can be different.

[0079] The controller 310 can communicate with the etching device 320 and send the first target etching parameters and the second target etching parameters to the etching device 320.

[0080] The marking device 320 can be used to etch pattern codes on a target battery based on a first target etching parameter and a second target etching parameter.

[0081] The marking device 320 can be a high-power laser. For example, it can be a laser with an adjustable pulse width of 2ns to 500ns, an adjustable power of 0w to 120w, an adjustable wavelength of 800nm ​​to 1mm, and an adjustable defocus amount of -1mm to +1mm.

[0082] Specifically, graphic codes can be etched at any location on the target battery; for example, graphic codes can be etched on the top cover of the cell. The graphic code can be an encoding of information using specific graphic symbols; for example, the graphic code can be a QR code or a barcode.

[0083] Since greater blackness results in a stronger light-trapping effect and a higher recognition rate for graphic codes, etching graphic codes based on preset blackness allows for precise control of blackness, ensuring that the light-trapping effect meets recognition requirements and thus enabling the recognition rate to meet production needs. Simultaneously, etching graphic codes based on preset morphology parameters allows for precise control of morphology, making the morphology easier to recognize and thus controlling the recognition rate, thereby ensuring the recognition rate meets production requirements.

[0084] In some embodiments, the preset blackness model may include a mapping relationship between blackness and a first etching parameter; the controller 310 may be used to obtain the preset blackness and a first preset range; determine multiple target etching parameters corresponding to the preset blackness based on the mapping relationship; and determine the first target etching parameter based on the first preset range and multiple target etching parameters.

[0085] The mapping relationship can be pre-constructed. Specifically, multiple blackness influencing factors can be constructed based on multiple preset etching parameters; an initial blackness formula can be constructed based on blackness and multiple blackness influencing factors; a significance test can be performed on multiple blackness influencing factors based on multiple sets of historical data, and the significance test results can be obtained. The historical data includes historical blackness and its corresponding historical etching parameters; based on the significance test results, some blackness influencing factors are removed from the initial blackness formula to obtain the above mapping relationship.

[0086] For example, multiple preset etching parameters can be etching power, etching speed, etching frequency, and etching spacing. Based on the above preset etching parameters, multiple blackness influencing factors such as "etching power", "etching speed", "etching frequency", "etching spacing", "etching power × etching speed", "etching power × etching frequency", "etching power × etching spacing", "etching speed × etching frequency", "etching speed × etching spacing", "etching frequency × etching spacing", "etching power × etching speed × etching frequency", "etching power × etching speed × etching spacing", "etching speed × etching frequency × etching spacing", "etching power × etching frequency × etching spacing", and "etching power × etching speed × etching frequency × etching spacing" can be constructed.

[0087] Based on emissivity and the aforementioned multiple emissivity influencing factors, an initial emissivity formula can be constructed:

[0088]

[0089] Among them, β0, β1, β2, β3, β4, β 12 β 13 β 14 β 23 β 24 β 34 β 123 β 124 β 234 β 134 and β 1234 All of these are coefficients that need to be determined through fitting.

[0090] Then, multiple historical blackness values ​​and their corresponding historical etching parameters such as etching power, etching rate, etching frequency, and etching spacing can be obtained to construct multiple sets of historical data. Based on these historical data sets, the initial blackness formula mentioned above is fitted. Through fitting, multiple blackness influencing factors can be screened to obtain the remaining blackness influencing factors and their corresponding coefficients. Specifically, based on historical data, response surface methodology or multivariate fitting can be used to perform significance tests on multiple blackness influencing factors. During the significance test, blackness influencing factors with high significance probabilities (i.e., P-values) are removed from the initial blackness formula, and then the fitting is repeated until a formula with a good fit is obtained, which is the mapping relationship mentioned above.

[0091] For example, the mapping relation can be:

[0092]

[0093] Among them, β0, β1, β2, β3, β4, β 12 β 13 β 14 β 23β 24 and β 34 The specific values ​​have all been determined through fitting.

[0094] The first preset range can be the range corresponding to multiple first etching parameters set empirically. For example, the first preset range of etching power can be 20W to 100W, the first preset range of etching speed can be 100mm to 500mm, the first preset range of etching frequency can be 50kHz to 150kHz, and the first preset range of etching pitch can be 0.01mm to 0.05mm (the first preset range in the above examples includes both ends).

[0095] Substituting the preset blackness into the blackness in formula (2), we can solve for etching power, etching rate, etching frequency, and etching spacing to obtain multiple sets of results, i.e., multiple target etching parameters. Each target etching parameter includes a set of solutions for etching power, etching rate, etching frequency, and etching spacing. It should be noted that the solution does not need to be equal to the preset blackness; it is acceptable to be greater than or equal to the preset blackness.

[0096] Then, a target result in which each parameter meets the first preset range can be determined from multiple sets of results. If there is only one set of target results, the target result is determined as the first target etching parameter. If there are multiple sets of target results, one set can be randomly selected as the first target etching parameter.

[0097] It should be noted that during the process of eliminating blackness influencing factors, some etching parameters may be removed from the formula. Therefore, the mapping relationship may include at least one of etching power, etching rate, etching frequency and etching spacing, but not all of them. The corresponding first target etching parameters may also include at least one of etching power, etching rate, etching frequency and etching spacing, but not all of them.

[0098] In this way, based on the mapping relationship between blackness and the first etching parameter, and with the first preset range as the constraint, the first target etching parameter corresponding to the preset blackness can be solved, thereby accurately determining the first target etching parameter so as to accurately etch out the graphic code that meets the preset blackness.

[0099] In some embodiments, the preset blackness model may include a mapping table between different blacknesses and the first etching parameter; the controller 310 may be used to obtain the preset blackness; and to find the first target etching parameter corresponding to the preset blackness from the mapping table.

[0100] This mapping table can be pre-built. Specifically, multiple sets of historical data can be obtained, each set including historical blackness and its corresponding historical etching parameters. The historical etching parameters can include at least one of etching power, etching speed, etching frequency, and etching spacing. Then, a mapping table can be built based on the multiple sets of historical data, which includes different blacknesses and their corresponding first etching parameters.

[0101] Once the controller 310 obtains the preset blackness, it can look up the first target etching parameter corresponding to the preset blackness in the mapping table.

[0102] In this way, by looking up the mapping table, the first target etching parameters corresponding to the preset blackness can be quickly determined, thereby improving the efficiency of etching pattern codes.

[0103] In some embodiments, the first target etching parameters may include at least one of etching power, etching rate, etching frequency, and etching spacing.

[0104] In this way, the blackness of the graphic code can be more comprehensively and accurately controlled by multiple aspects such as etching power, etching speed, etching frequency and etching spacing.

[0105] In some embodiments, the second target etching parameter may include the target etching wavelength; the preset morphology parameter may include the preset etching depth and / or the preset etching spacing;

[0106] The preset topography model may include: the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength.

[0107] Specifically, the mapping relationship between etching depth and etching wavelength can be represented by a table or formula.

[0108] For example, the mapping relationship between etching depth and etching wavelength can be:

[0109]

[0110] Where mean1 is the mean of the engraving depth of n graphic codes with qualified scanning rates, and sigma1 is the standard deviation of the engraving depth of n graphic codes with qualified scanning rates (n≥200).

[0111] By substituting the preset etching depth into the etching depth of formula (3), the target etching wavelength corresponding to the preset etching depth can be preset.

[0112] The mapping relationship between etching spacing and etching wavelength can be represented by a table or formula.

[0113] For example, the mapping relationship between etching spacing and etching wavelength can be:

[0114]

[0115] Where mean2 is the mean of the marking spacing of n graphic codes with qualified scanning rates, and sigma2 is the standard deviation of the marking spacing of n graphic codes with qualified scanning rates.

[0116] By substituting the preset etching spacing into the etching spacing in formula (4), the target etching wavelength corresponding to the preset etching spacing can be preset.

[0117] Furthermore, when the preset topography parameters include a preset etching depth and a preset etching spacing, the target etching wavelength can be determined comprehensively based on the etching wavelength 'a' determined according to the preset etching depth and the etching wavelength 'b' determined according to the preset etching spacing. For example, weights can be pre-set for etching wavelengths 'a' and 'b', and the target etching wavelength can be determined by weighted summation. For instance, the weight of etching wavelength 'a' can be 0.8, and the weight of etching wavelength 'b' can be 0.2.

[0118] For example, the target etching wavelength can be in the range of [800nm, 1mm].

[0119] Thus, based on the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength, the target etching wavelength corresponding to the preset etching depth and / or preset etching spacing can be accurately determined, so as to accurately etch out the graphic code that meets the preset etching depth and / or preset etching spacing.

[0120] In some instances, the second target etching parameters may include the target defocus amount; the preset topography parameters may include the preset etching depth.

[0121] The preset topography model can include the mapping relationship between defocusing amount and etching depth.

[0122] Defocusing distance refers to the distance between the focal point of the focused laser and the surface of the material being processed. Depending on the focal point's position, defocusing distance can be categorized into two cases: positive defocusing, where the focal point is below the processing plane (below the material surface); and negative defocusing, where the focal point is above the processing plane (above the material surface). Defocusing distance significantly affects the quality of laser marking. The spot size is smallest and the power density is highest at the focal point, while defocusing increases the spot size and decreases the power density. Therefore, adjusting the defocusing distance can alter the distribution of laser energy on the material surface, thus affecting the marking effect.

[0123] The mapping relationship between defocusing amount and etching depth can be expressed as a formula or a table.

[0124] Specifically, the etching depth and corresponding defocus amount of multiple qualified graphic codes can be obtained in advance. Then, based on the multiple etching depths and their corresponding defocus amounts, a formula for defocus amount and etching depth can be fitted, or a mapping table between defocus amount and etching depth can be constructed.

[0125] Then, the target defocus amount can be calculated by substituting the preset etching depth into the formula for defocus amount and etching depth; or, the target defocus amount corresponding to the preset etching depth can be found in the mapping table between defocus amount and etching depth.

[0126] For example, the target defocusing amount can range from [-1mm, +1mm], allowing the field lens plane and the upper and lower marking planes to have a certain degree of parallelism, which improves the scanning efficiency of the etched graphic codes. Theoretically, after the field lens focuses the laser beam, all focal points should fall on a single "focal plane," which is called the field lens plane. The field lens plane is not a solid glass plate, but rather an "ideal geometric plane" pursued in optical design. Regardless of the galvanometer's deflection, the laser focus always falls within this plane, ensuring that the marking pattern is clear and free of defocus distortion across the entire area. The upper and lower marking planes are the planes representing the two extreme positions of the laser focus along the workpiece thickness direction. The upper marking plane is the highest focal plane on which the laser head can move upwards and still clearly mark the code onto the workpiece. Beyond the upper marking plane, the laser begins to defocus, resulting in thicker lines or insufficient energy. The lower marking plane is the lowest focal plane on which the laser head can move downwards and still clearly mark the code onto the workpiece. Below the lower marking plane, defocusing will also cause marking failure.

[0127] In this way, the target defocus amount corresponding to the preset etching depth can be quickly and accurately determined by the mapping relationship between the defocus amount and the etching depth, which makes it easier to accurately etch out the graphic code that meets the preset etching depth.

[0128] In some embodiments, such as Figure 4 As shown, the battery production system 300 may further include a barcode scanner 330, which can be connected to the controller 310.

[0129] Among them, the barcode scanner 330 can be used to identify the graphic code on the target battery.

[0130] The barcode scanner 330 can identify codes by scanning graphic codes. The barcode scanner 330 can communicate with the controller 310. For example, the barcode scanner 330 can be a barcode scanner.

[0131] The controller 310 can be used to determine the recognition time of the graphic code by the barcode scanning device; and to determine the detection result based on the recognition time.

[0132] The detection result can indicate whether the recognition time exceeds the preset threshold. If it does, it means that the graphic code on the target battery has failed the detection. Otherwise, it means that the graphic code on the target battery has passed the detection and can proceed to the next step.

[0133] The preset threshold can be set according to actual needs. For example, the preset threshold can be 1.5s.

[0134] In this way, after etching the graphic code, the graphic code can be detected by the recognition time, so as to promptly identify graphic codes that fail the detection and reduce the occurrence of subsequent events that affect normal production due to failed scanning.

[0135] In some implementations, the detection result can also be the level of the graphic code. Graphic codes can be divided into different levels based on the range of their recognition time. For example, a graphic code with a recognition time in the range of (0s, 1s) can be classified as level A, indicating that the graphic code is completely clear and can be quickly recognized; a graphic code with a recognition time in the range of (1s, 2s) can be classified as level B, indicating that the graphic code is basically clear, but the recognition time is slightly longer; a graphic code with a recognition time in the range of (2s, 4s) can be classified as level C, indicating that the graphic code is slightly blurry but still recognizable, but the recognition time is significantly longer; and a graphic code with a recognition time exceeding 4s can be classified as level D, indicating that the graphic code cannot be recognized.

[0136] In some embodiments, the angle between the emitted light from the barcode scanning device 330 and the emitted light from the marking device 320 may be less than a preset angle and / or the barcode scanning device 330 may be equipped with a polarizer.

[0137] For example, such as Figure 5 As shown, the angle between the emitted light 510 of the scanning device 330 and the emitted light 520 of the marking device 320 is angle α.

[0138] The preset angle can be set according to actual needs. The value range of the preset angle can be [0°, 30°]. For example, the preset angle can be 20°.

[0139] The best scanning effect is achieved when the angle between the emitted light rays from the scanning device 330 and the emitted light rays from the marking device 320 is 0°, meaning they are parallel. A larger angle between the emitted light rays from the scanning device 330 and the marking device 320 may cause scanning errors due to image distortion.

[0140] For example, when the emitted light from the barcode scanning device 330 is parallel to the emitted light from the marking device 320, the emitted light from the barcode scanning device 330 is as follows: Figure 6aAs shown, the emitted light 610 from the scanning device 330 all enters the recess, resulting in a strong light trapping effect and thus excellent scanning performance. However, when the angle between the emitted light from the scanning device 330 and the emitted light from the marking device 320 is large, the emitted light from the scanning device 330... Figure 6b As shown, a small portion of the emitted light 620 from the scanning device 330 enters the pit, resulting in a very weak light trapping effect and thus a poor scanning effect.

[0141] Therefore, before scanning the graphic code on the target battery using the barcode scanner 330, the scanning angle of the barcode scanner 330 needs to be adjusted. That is, the angle between the emitted light from the barcode scanner 330 and the emitted light from the marking device 320 needs to be adjusted to be smaller than the preset angle. This will result in a better scanning effect, reduce the possibility of poor scanning due to an excessively large scanning angle, and thus improve the accuracy of the graphic code detection results.

[0142] In addition, by installing a polarizer on the barcode scanner 330, only light in a specific vibration direction can pass through, while blocking light in other vibration directions.

[0143] Specifically, if due to equipment or space limitations, it is impossible to adjust the angle between the emitted light from the barcode scanner 330 and the emitted light from the marking device 320 to be less than a preset angle, or if the ambient light is complex and chaotic, a polarizer can be installed on the barcode scanner 330 to filter out some of the chaotic light, allowing only light from a specific direction to pass through, thereby enhancing the contrast of the graphic code. At the same time, the polarizer's filtering of light reduces light intensity, thus providing better scanning performance for surfaces with strong reflectivity.

[0144] The principle of a polarizer is based on the asymmetry of the vibration direction with respect to the light propagation direction (transverse wave characteristics), as follows: Figure 7 As shown, light waves 710 and 720 propagate from left to right along the Z-axis. Light wave 710 is located in the XZ plane (vertical plane) and is perpendicular to the Y-axis, while light wave 720 is located in the YZ plane (horizontal plane) and is perpendicular to the X-axis. The "fence" of the polarizer is arranged parallel to the X-axis (i.e., vertically). Thus, light wave 710 can pass through the filter, while light wave 720 is blocked, achieving the effect of filtering out light wave 720.

[0145] Thus, by making the angle between the emitted light from the barcode scanning device 330 and the emitted light from the marking device 320 smaller than a preset angle and / or by installing a polarizer on the barcode scanning device 330, a good barcode scanning effect can be achieved, reducing barcode malfunctions caused by the barcode scanning device 330, thereby improving the accuracy of the graphic code detection results.

[0146] In some embodiments, such as Figure 8As shown, the battery production system 300 may further include an image acquisition device 340, which may be connected to the controller 310.

[0147] The image acquisition device 340 can be used to acquire images of graphic codes, determine the shape parameters of graphic codes based on the images, and send the shape parameters to the controller 310.

[0148] Topographic parameters may include the etching depth and / or etching spacing of the pattern code.

[0149] For example, the image acquisition device 340 can be a super depth-of-field microscope, which can be used to measure etching depth and etching spacing. Specifically, the target battery with laser-etched markings can be transferred to the sample stage of the super depth-of-field microscope. Multi-scan technology is used to acquire images of the markings at different focal planes layer by layer. Each image is focused on a specific depth of the marking, thus obtaining a series of images at different focal planes. An image fusion algorithm is then used to synthesize these images into a single full depth-of-field image, thereby achieving comprehensive observation of the etching depth information of the markings. Combining focal scanning and edge detection algorithms, depth information is extracted from the image sequence using the super depth-of-field microscope to construct a three-dimensional morphological model of the markings. In this way, morphological parameters such as etching depth and etching spacing of the markings can be accurately measured. A schematic diagram of the principle is shown below. Figure 9 As shown, focal point 904 is the intersection of focal plane 902 and the optical axis, representing the position of the object point in "perfect focus". Object points on focal plane 902 can be perfectly converged to the same point on image plane 903 by lens 901. Foreground 907, located in front of focal plane 902, forms a circle of confusion 906 on image plane 903, and background 908, located behind focal plane 902, forms a circle of confusion 905 on image plane 903. Focal plane 902 can be the object plane selected by lens 901 for focusing, with the object distance denoted as L. The distance from focal plane 902 to the nearest object plane that still makes circle of confusion 906 less than or equal to the allowable value is the foreground depth of field ΔL1. The distance from focal plane 902 to the farthest object plane that still makes circle of confusion 905 less than or equal to the allowable value is the background depth of field ΔL2. After one focus, the axial range that can be judged as "sharp" without readjusting the lens 901 is the total depth of field ΔL, where ΔL = ΔL1 + ΔL2.

[0150] The image acquisition device 340 can communicate with the controller 310 and send the shape parameters of the graphic code to the controller 310.

[0151] The controller 310 can be used to control the barcode scanning device 330 to recognize graphic codes when the shape parameters are within a second preset range.

[0152] The second preset range can be set according to actual needs. For example, the second value range of the etching depth can be [etching wavelength, mean1±3sigma1], and the second value range of the etching spacing can be [mean2±3sigma2, etching wavelength]. In order to achieve a better light trapping effect, the etching depth should generally be greater than or equal to the wavelength of light, and the etching spacing should be less than or equal to the wavelength of light, so as to enhance light scattering and coupling.

[0153] Specifically, before the scanning device 330 identifies the graphic code on the target battery and determines the detection result based on the identification time, it can first determine whether the morphological parameters of the graphic code are within the second preset range. If so, it indicates that the morphological parameters of the graphic code are qualified and subsequent detection can continue. Therefore, the scanning device 330 can be controlled to identify the graphic code. If not, it indicates that the morphological parameters of the graphic code are unqualified and no further detection is required.

[0154] In this way, before detecting the graphic code by recognition time, we can first judge whether the graphic code meets the requirements by the shape parameters of the graphic code, thus realizing a double verification of the graphic code and improving the reliability of the detection results.

[0155] In some embodiments, such as Figure 10 As shown, the battery production system 300 may further include a transfer device 350, which may be connected to the controller 310.

[0156] The controller 310 can send a first control command to the transfer device 350 and a second control command to the marking device 320 when the detection result characterization and recognition time exceeds a preset threshold, or when the morphology parameters exceed a second preset range.

[0157] The detection results indicate that if the recognition time exceeds the preset threshold and the morphological parameters exceed the second preset range, the graphic code is unqualified and fails the detection. Therefore, the graphic code can be reworked.

[0158] The first control command can be used to control the transfer device 350 to transfer the target battery to the marking station, and the second control command can be used to control the marking device 320 to perform etching on the target battery again when the target battery arrives at the marking station.

[0159] The transfer device 350 can be used to transfer a target battery to a coding station based on a first control command. The transfer device 350 may include a robotic arm and a first conveyor belt. The first conveyor belt transports batteries from the inspection station to the coding station. The coding station may be a station for etching graphic codes on the target battery. The inspection station may be a station for detecting graphic codes whose recognition time exceeds a preset threshold and whose morphological parameters exceed a second preset range.

[0160] After the target battery has its graphic code etched at the marking station, it can be transferred to the inspection station via the second conveyor belt. The second conveyor belt moves from the marking station to the inspection station. If the target battery fails the inspection at the inspection station, the robot arm can transfer it from the second conveyor belt to the first conveyor belt, which then transports the target battery back to the marking station.

[0161] The marking device 320 can be used to control the marking device 320 to perform etching on the target battery again when the target battery arrives at the marking station, based on a second control command.

[0162] Then, the recognition time and morphological parameters of the re-etched graphic code can be detected. If it still fails the detection, the target battery can be scrapped.

[0163] In this way, if the graphic code fails the test, it can be reworked, minimizing the battery failure rate.

[0164] In some embodiments, the color difference between the graphic code and the surface on the target battery used for etching the graphic code may be greater than a preset color difference threshold, and / or the color difference between the graphic code and the interfering object may be greater than a preset color difference threshold.

[0165] The preset color difference threshold can be set according to actual needs. For example, the recognition rate of graphic codes under different color differences can be tested, and the color difference corresponding to the required recognition rate can be used as the preset color difference threshold.

[0166] For example, the surface on the target battery used for etching the pattern code can be the cell top cover, which can be made of aluminum and is silver-white in color. The interfering agent can be electrolyte crystals; after the electrolyte droplets splash onto the pattern code and crystallize, the crystals are white. In traditional methods, the pattern code on the cell top cover is white, and the color difference between the white pattern code and the silver-white cell top cover and the white electrolyte crystals is relatively small, making the pattern code difficult to identify. However, in this embodiment, a high-power laser can be used to etch the pattern code on the surface of the aluminum cell top cover, thereby generating aluminum oxide on the surface of the cell top cover. Aluminum oxide is black, thus obtaining a black pattern code. The color difference between the black pattern code and the silver-white cell top cover and the white electrolyte crystals is relatively large, making the pattern code easier to identify.

[0167] The battery production system provided in this application includes a marking mechanism (i.e., marking equipment and controller), an inspection mechanism (i.e., scanning equipment, image acquisition device and controller), and a rework mechanism (i.e., transfer device, marking equipment and controller), realizing a closed-loop process of marking, inspection and rework.

[0168] For example, such as Figure 11As shown, the workflow of this battery production system may include: S1101, etching a pattern code on the top cover of the battery cell using an etching mechanism; S1102, inspecting the pattern code using an inspection mechanism; S1103, if the inspection is passed, the battery cell is processed normally; S1104, if the inspection is failed, the pattern code is re-etched using a rework mechanism; S1105, inspecting the re-etched pattern code using an inspection mechanism; S1106, if the inspection is passed, the battery cell is processed normally; S1107, if the inspection is failed, the battery cell is scrapped.

[0169] To better describe the overall solution, based on the above embodiments, a specific example is given, such as... Figure 12 As shown, the workflow of this battery production system may include S1201-S1211. Wherein:

[0170] S1201, Determine the etching parameters for the first target and the etching parameters for the second target;

[0171] S1202, etching pattern codes on the target battery based on the first target etching parameters and the second target etching parameters;

[0172] S1203, determine whether the shape parameters of the graphic code are within the second preset range; if yes, execute S1204; if no, execute S1208.

[0173] S1204, Determine whether the scanning angle is less than the preset angle; if yes, proceed to S1206; otherwise, proceed to S1205.

[0174] S1205, adjust the scanning angle to be less than the preset angle or add a polarizing filter;

[0175] S1206, determine whether the graphic code passes the detection based on the recognition time of the graphic code; if yes, proceed to S1207; if no, proceed to S1208.

[0176] S1207, pulls the target battery current;

[0177] S1208, re-etch the pattern code on the target battery;

[0178] S1209, determine whether the shape parameters of the re-etched graphic code are within the second preset range; if yes, execute S1210; if no, execute S1211.

[0179] S1210, determine whether the re-etched graphic code has passed the detection based on the recognition time of the re-etched graphic code; if yes, execute S1207; if no, execute S1211.

[0180] S1211, scrap the target battery.

[0181] The specific processes of S1201-S1211 can be found in the above embodiments, and will not be repeated here.

[0182] In this embodiment, optical principles including ultra-depth-of-field microscope, polarized light, and light trapping effect are used to constrain parameters such as etching depth, etching spacing, etching direction, defocusing amount, and scanning angle, thereby reducing the impact of factors such as electrolyte contamination, etching depth difference, light intensity, scanning angle, graphic code oxidation, and environment on graphic code recognition and improving the graphic code recognition rate.

[0183] Below, in conjunction with Figure 13 The marking control method for batteries provided in the embodiments of this application will be described in detail.

[0184] Figure 13 This illustration shows one of the flowcharts of a marking control method for batteries according to an embodiment of this application. It should be noted that the marking control method for batteries can be applied to the battery production equipment shown in any of the above embodiments.

[0185] like Figure 13 As shown, the marking control method for batteries may include the following steps:

[0186] S1310, based on the preset blackness model and preset blackness, determine the etching parameters of the first target;

[0187] S1320, Based on the preset topography parameters of the preset topography model and the target graphic code, determine the etching parameters of the second target;

[0188] S1330 etches pattern codes on the target battery based on the first target etching parameters and the second target etching parameters.

[0189] Among them, the preset blackness model can represent the mapping relationship between blackness and the first etching parameter; the preset morphology model can represent the mapping relationship between morphology parameter and the second etching parameter.

[0190] For details on the specific process, please refer to the above embodiments, which will not be repeated here.

[0191] Since blackness is related to the light-trapping effect of graphic codes, the greater the blackness, the stronger the light-trapping effect, and the higher the recognition rate of graphic codes. Therefore, etching graphic codes based on preset blackness can achieve precise control over the blackness of graphic codes, thereby controlling the light-trapping effect of graphic codes and ensuring that the light-trapping effect of graphic codes meets recognition requirements. This allows the recognition rate of graphic codes to meet production needs. Conversely, etching graphic codes based on preset morphology parameters can achieve precise control over the morphology of graphic codes, making the morphology of graphic codes easy to recognize. Therefore, it is possible to control the recognition rate of graphic codes, thereby improving the recognition rate and ensuring that the recognition rate of graphic codes meets production requirements.

[0192] In some embodiments, the preset blackness model may include a mapping relationship between blackness and the first etching parameter; S1310 may include:

[0193] Get the preset blackness and the first preset range;

[0194] Based on the mapping relationship, determine the etching parameters of multiple targets corresponding to the preset blackness;

[0195] The first target etching parameter is determined based on the first preset range and multiple target etching parameters.

[0196] For details on the specific process and effects, please refer to the above embodiments, which will not be repeated here.

[0197] In some embodiments, the preset blackness model may include a mapping table between different blacknesses and the first etching parameter; S1310 may include:

[0198] Get the preset black level;

[0199] Find the first target etching parameter corresponding to the preset blackness from the mapping table.

[0200] For details on the specific process and effects, please refer to the above embodiments, which will not be repeated here.

[0201] In some embodiments, the first target etching parameters may include at least one of etching power, etching rate, etching frequency, and etching spacing.

[0202] For details on the specific process and effects, please refer to the above embodiments, which will not be repeated here.

[0203] In some embodiments, the second target etching parameter may include the target etching wavelength; the preset morphology parameter may include the preset etching depth and / or the preset etching spacing;

[0204] The preset topography model may include: the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength.

[0205] For details on the specific process and effects, please refer to the above embodiments, which will not be repeated here.

[0206] Other embodiments of this application will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this application are indicated by the claims.

[0207] It should also be noted that the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0208] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and not to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. These modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application, and they should all be covered within the scope of the claims and specification of this application. In particular, as long as there is no structural conflict, the various technical features mentioned in the embodiments can be combined in any way. This application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A battery production system, characterized in that, The battery production system includes: a controller and a marking device, wherein the controller is connected to the marking device; The controller is configured to determine first target etching parameters based on a preset blackness model and a preset blackness; determine second target etching parameters based on a preset morphology model and preset morphology parameters of the target graphic code; and send the first target etching parameters and the second target etching parameters to the etching device. The etching device is used to etch a graphic code on the target battery based on the first target etching parameters and the second target etching parameters; The preset blackness model represents the mapping relationship between blackness and the first etching parameter; the preset morphology model represents the mapping relationship between morphology parameter and the second etching parameter; and the blackness is positively correlated with the light trapping effect.

2. The battery production system according to claim 1, characterized in that, The preset blackness model includes a mapping relationship between blackness and the first etching parameter; The controller is used to acquire a preset blackness and a first preset range; and to determine multiple target etching parameters corresponding to the preset blackness based on the mapping relationship. The first target etching parameter is determined based on the first preset range and the plurality of target etching parameters.

3. The battery production system according to claim 1, characterized in that, The preset blackness model includes a mapping table between different blacknesses and the first etching parameters; The controller is used to obtain a preset blackness and to look up the first target etching parameter corresponding to the preset blackness from the mapping table.

4. The battery production system according to claim 2 or 3, characterized in that, The first target etching parameters include at least one of etching power, etching speed, etching frequency, and etching spacing.

5. The battery production system according to claim 1, characterized in that, The second target etching parameters include the target etching wavelength; The preset morphology parameters include preset etching depth and / or preset etching spacing; The preset morphology model includes: the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength.

6. The battery production system according to claim 1, characterized in that, The battery production system further includes a barcode scanning device, which is connected to the controller. The scanning device is used to identify the graphic code on the target battery; The controller is used to determine the recognition time for the scanning device to recognize the graphic code; and to determine the detection result based on the recognition time.

7. The battery production system according to claim 6, characterized in that, The angle between the emitted light from the scanning device and the emitted light from the marking device is less than a preset angle and / or the scanning device is equipped with a polarizer.

8. The battery production system according to claim 6 or 7, characterized in that, The battery production system further includes: an image acquisition device, which is connected to the controller; The image acquisition device is used to acquire an image of the graphic code, determine the shape parameters of the graphic code based on the image, and send the shape parameters to the controller. The controller is used to control the scanning device to recognize the graphic code when the shape parameters are within a second preset range.

9. The battery production system according to claim 8, characterized in that, The battery production system further includes: a transfer device, which is connected to the controller; The controller is configured to send a first control command to the transfer device and a second control command to the marking device when the detection result indicates that the recognition time exceeds a preset threshold, or when the morphology parameter exceeds the second preset range. The transfer device is used to transfer the target battery to the marking station based on the first control command; The marking device is configured to, based on the second control command, control the marking device to perform etching on the target battery again when the target battery arrives at the marking station.

10. A marking control method for batteries, characterized in that, The method is applied to the battery production system as described in any one of claims 1-9, and the method includes: Based on the preset blackness model and preset blackness, the etching parameters of the first target are determined; Based on the preset morphology model and the preset morphology parameters of the target graphic code, the etching parameters of the second target are determined; Based on the first target etching parameters and the second target etching parameters, a pattern code is etched on the target battery; The preset blackness model represents the mapping relationship between blackness and the first etching parameter; the preset morphology model represents the mapping relationship between morphology parameter and the second etching parameter; and the blackness is positively correlated with the light trapping effect.

11. The marking control method for a battery according to claim 10, characterized in that, The preset blackness model includes a mapping relationship between blackness and the first etching parameter; The determination of the first target etching parameters based on the preset blackness model and preset blackness includes: Get the preset blackness and the first preset range; Based on the mapping relationship, determine multiple target etching parameters corresponding to the preset blackness; The first target etching parameter is determined based on the first preset range and the plurality of target etching parameters.

12. The marking control method for a battery according to claim 10, characterized in that, The preset blackness model includes a mapping table between different blackness levels and the first etching parameters; the determination of the first target etching parameters based on the preset blackness model and the preset blackness includes: Get the preset black level; Find the first target etching parameter corresponding to the preset blackness from the mapping table.

13. The marking control method for a battery according to claim 11 or 12, characterized in that, The first target etching parameters include at least one of etching power, etching speed, etching frequency, and etching spacing.

14. The marking control method for a battery according to claim 13, characterized in that, The second target etching parameters include the target etching wavelength; The preset morphology parameters include preset etching depth and / or preset etching spacing; The preset morphology model includes: the mapping relationship between etching depth and etching wavelength, and / or the mapping relationship between etching spacing and etching wavelength.

Images