Glass cover plate, display device and electronic equipment

Abstract

The invention discloses a glass cover plate, a display device and electronic equipment, the glass cover plate comprises a glass substrate, at least one side surface of the glass substrate is provided with an annular ink layer, an area enclosed by the ink layer comprises a light hole area, and an antireflection film is arranged in the light hole area; in the visible light wave band of 400-700 nm, the single-sided reflectivity of the light-transmitting hole area of the glass cover plate is P1%, the double-sided reflectivity of the light-transmitting hole area of the glass cover plate is Q1%, 0.5 < = P1 < = 2.5, and 1 < = Q1 < = 7; the single-face reflectivity of other areas of the glass cover plate is P2%, the double-face reflectivity is Q2%, P2 is larger than or equal to 4.2 and smaller than or equal to 5, and Q2 is larger than or equal to 8.5 and smaller than or equal to 10; in the infrared light band of 940 + / -5 nm, the average transmittance of the light hole area of the glass cover plate is M1%, and M1 is larger than or equal to 85 and smaller than or equal to 90. The glass cover plate can optimize the optical performance of visible light and infrared bands in a camera hole area, can enhance the antireflection effect of the visible light band and the anti-reflection effect of the infrared band, achieves the delicate experience of a full screen, improves the photographing definition of a front-facing camera, and improves the photographing glare phenomenon.

Description

Technical Field

[0001] This application relates to the field of glass technology, and more specifically, to glass covers, display devices, and electronic devices. Background Technology

[0002] With the development of mobile electronic device technology, such as mobile phones, screens have gradually evolved from notch displays to full-screen displays. Full-screen displays offer an exceptional aesthetic appeal when the screen is off, representing the ultimate pursuit of consumers for the display experience of mobile electronic products. One of the challenges that full-screen displays need to overcome is how to hide the camera, that is, how to conceal the area reserved for the camera on the display device. How to achieve the aesthetic effect of a full-screen display when the screen is off while ensuring photography performance and infrared sensor accuracy is a technical problem that currently needs to be solved. Summary of the Invention

[0003] This application proposes a glass cover, a display device, and an electronic device. The glass cover of this application can optimize the optical performance of the visible light and infrared bands in the camera hole area, enhance the anti-reflection effect in the visible light band and the anti-transmission effect in the infrared band, and at the same time achieve a refined full-screen experience, improve the image clarity of the front camera, and reduce glare when taking pictures.

[0004] In a first aspect, this application provides a glass cover plate, the glass cover plate including a glass substrate, at least one side surface of the glass substrate having an annular ink layer, the area enclosed by the ink layer including a light-transmitting hole area, the area of ​​the glass substrate outside the ink layer including other areas, an anti-reflective film being provided in the light-transmitting hole area; along the thickness direction of the glass cover plate, the orthographic projection edge of the anti-reflective film on the glass substrate is between the inner edge and the outer edge of the orthographic projection of the ink layer;

[0005] Within the visible light band of 400nm to 700nm, the single-sided reflectivity P1% and double-sided reflectivity Q1% of the light-transmitting area of ​​the glass cover plate are 0.5≤P1≤2.5 and 1≤Q1≤7; within the visible light band of 400nm to 700nm, the single-sided reflectivity P2% and double-sided reflectivity Q2% of other areas of the glass cover plate are 4.2≤P2≤5 and 8.5≤Q2≤10.

[0006] Within the infrared light band of 940nm±5nm, the average transmittance M1 of the light-transmitting hole area of ​​the glass cover plate is 85≤M1≤90.

[0007] In the above solution, the single-sided reflectivity of the inner surface of the glass cover within the light-transmitting aperture area in the 400nm–700nm wavelength range can reach below 2.5%, and the double-sided reflectivity can reach below 7%. When the glass cover is applied to electronic devices, it can achieve a refined full-screen experience when the screen is off. Controlling the average transmittance of the light-transmitting aperture area of ​​the glass cover can improve the clarity of front-facing camera photos, and also improve the accuracy of the infrared sensor in the display device; when the single-sided reflectivity of the light-transmitting aperture area and other areas is controlled within the above range, glare during photography can be reduced.

[0008] In some embodiments, within the infrared light band of 940nm±5nm, the average transmittance M1 of the light-transmitting aperture area of ​​the glass cover is 85≤M1≤90%, where M1% can specifically be 85%, 86%, 87%, 88%, 89%, or 90%, or other values ​​within the above range, and is not limited here. When the glass cover is applied to electronic devices, it can improve the detection accuracy and range of infrared sensing modules such as TOF.

[0009] In some embodiments, within the visible light band of 400nm to 700nm, the average transmittance M2 of the light-transmitting area of ​​the glass cover plate is 87≤M2≤99%. M2% can specifically be 87%, 90%, 93%, 94%, 95%, 96%, 97%, 98%, or 99%, or other values ​​within the above range, and is not limited here. Higher visible light transmittance reduces light reflection, resulting in higher image clarity from the front-facing camera and better improvement in glare and blurring.

[0010] In some embodiments, within the visible light band of 400nm to 700nm, the single-sided reflectivity P2% and double-sided reflectivity Q2% of other areas of the glass cover are 4.2≤P2≤5 and 8.5≤Q2≤10; the average reflectivity of the light-transmitting hole area of ​​the display device having the glass cover and the other areas is ≤7%.

[0011] In the above solution, the light-transmitting area of ​​the glass cover has optical characteristics that are close to those of other areas. The display device with the glass cover installed has a consistent black level when the screen is off, which can improve the exquisite experience of the full-screen display when the screen is off.

[0012] In some embodiments, the annular ink layer is provided on the inner surface of the glass substrate away from the light-receiving surface, and the anti-reflective film is provided in the light-transmitting hole area formed by the ink layer. The anti-reflective film includes a main body, an overlapping part, and a connecting part. The main body is located inside the ink layer, the overlapping part is stacked on the surface of the ink layer, and the connecting part connects the main body and the overlapping part along the inner sidewall of the ink layer.

[0013] In some embodiments, the thickness of the ink layer is 5μm to 100μm, and the total thickness of the antireflective film is 100nm to 1000nm. Specifically, the total thickness of the antireflective film can be 100nm, 200nm, 250nm, 300nm, 500nm, 600nm, 800nm, 850nm, 900nm, 950nm, or 1000nm, or other values ​​within the aforementioned range. Controlling the total thickness of the antireflective film within this range improves the antireflective effect in the local light-transmitting area while also helping to control the overall thickness of the glass cover and reducing overall strength loss. During subsequent assembly into an electronic device, other areas on the inner surface of the glass cover are assembled with other modules using electronic adhesive, maintaining overall consistency between the electronic adhesive and the raised antireflective film.

[0014] In some embodiments, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate. The optical layers include alternating layers of a first layer with a refractive index lower than 1.6, a second layer with a refractive index higher than 1.7, and an outermost layer of the antireflective coating; and the optical layers satisfy the following relationship:

[0015]

[0016] n L n is the refractive index of the material of the first film layer at 550 nm. H n1 is the refractive index of the material of the second film layer at 550 nm, and n2 is the refractive index of the material of the outermost film layer at 550 nm.

[0017] n ave This represents the arithmetic mean of the refractive indices of the optical stack. n i Let T be the thickness of the i-th layer, Ti be the refractive index of the i-th layer, and T be the refractive index of the i-th layer. sum denoted as the total thickness of the optical stack, and m as the total number of optical stack layers.

[0018] In the above scheme, by alternately setting the first and second film layers with different refractive indices, the operating wavelength of the antireflective film can be broadened, thereby enabling it to resist reflection of more wavelengths of light. By setting the thickness and refractive index of each film layer in the optical stack according to the above relationship, the antireflective film can meet the requirements that the single-sided reflectivity of the light-transmitting aperture area of ​​the antireflective film is in the range of 0.5% to 2.5%, and the double-sided reflectivity is in the range of 1% to 7%.

[0019] In some embodiments, the thickness of the outermost silicon dioxide layer of the antireflective coating is 80 nm to 95 nm. Its thickness can be 80 nm, 82 nm, 85 nm, 86 nm, 88 nm, 90 nm, 91 nm, 92 nm, or 95 nm, or other values ​​within the above range, and is not limited here. The refractive index of the silicon dioxide layer is less than 1.6, making it a low-refractive-index optical film layer, which can reduce light reflection. Furthermore, the silicon dioxide layer has high hardness and good wear resistance, which can improve the wear resistance of the light-transmitting area of ​​the glass cover and enhance the durability of the glass cover.

[0020] In some embodiments, the first film layer with a refractive index lower than 1.6 is made of silicon dioxide or magnesium fluoride; the second film layer with a refractive index higher than 1.7 is made of at least one of titanium oxide, niobium oxide, silicon nitride, silicon oxynitride, aluminum silicon oxynitride, aluminum nitride, silicon carbide, and diamond-like carbon.

[0021] In some embodiments, the antireflective coating includes an optical stack sequentially stacked from the surface of the glass substrate. The optical stack includes a first SiO2 layer, a first Si3N4 layer, a second SiO2 layer, a second Si3N4 layer, a third SiO2 layer, a third Si3N4 layer, and an outermost SiO2 layer. The thickness of the first SiO2 layer is 70 nm ± 2 nm, the thickness of the first Si3N4 layer is 13 nm ± 2 nm, the thickness of the second SiO2 layer is 34 nm ± 2 nm, the thickness of the second Si3N4 layer is 133 nm ± 2 nm, the thickness of the third SiO2 layer is 15 nm ± 2 nm, the thickness of the third Si3N4 layer is 140 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 90 nm ± 2 nm.

[0022] In some embodiments, the antireflective film includes an optical stack sequentially stacked from the surface of the glass substrate. The optical stack includes a first SiO2 layer, a first Nb2O5 layer, a second SiO2 layer, a second Nb2O5 layer, and an outermost SiO2 layer. The thickness of the first SiO2 layer is 154 nm ± 2 nm, the thickness of the first Nb2O5 layer is 11 nm ± 2 nm, the thickness of the second SiO2 layer is 32 nm ± 2 nm, the thickness of the second Nb2O5 layer is 103 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 84 nm ± 2 nm.

[0023] In some embodiments, the antireflective film includes an optical stack sequentially stacked from the surface of the glass substrate. The optical stack includes a first SiO2 layer, a first AlN layer, a second SiO2 layer, a second AlN layer, a third SiO2 layer, a third AlN layer, and an outermost SiO2 layer. The thickness of the first SiO2 layer is 37 nm ± 2 nm, the thickness of the first AlN layer is 5 nm ± 2 nm, the thickness of the second SiO2 layer is 7 nm ± 2 nm, the thickness of the second AlN layer is 7 nm ± 2 nm, the thickness of the third SiO2 layer is 33 nm ± 2 nm, the thickness of the third AlN layer is 103 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 86 nm ± 2 nm.

[0024] In some embodiments, the antireflective coating includes an optical stack sequentially stacked from the surface of the glass substrate. The optical stack includes a first SiO2 layer, a first Si3N4 layer, a second SiO2 layer, a second Si3N4 layer, a third SiO2 layer, a third Si3N4 layer, and an outermost SiO2 layer. The thickness of the first SiO2 layer is 6 nm ± 2 nm, the thickness of the first Si3N4 layer is 13 nm ± 2 nm, the thickness of the second SiO2 layer is 48 nm ± 2 nm, the thickness of the second Si3N4 layer is 49 nm ± 2 nm, the thickness of the third SiO2 layer is 19 nm ± 2 nm, the thickness of the third Si3N4 layer is 46 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 82 nm ± 2 nm.

[0025] In some embodiments, the antireflective film includes an optical stack sequentially stacked from the surface of the glass substrate. The optical stack includes a first SiO2 layer, a first Si3N4 layer, a second SiO2 layer, a second Si3N4 layer, and an outermost SiO2 layer. The thickness of the first SiO2 layer is 163 nm ± 2 nm, the thickness of the first Si3N4 layer is 10 nm ± 2 nm, the thickness of the second SiO2 layer is 34 nm ± 2 nm, the thickness of the second Si3N4 layer is 101 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 81 nm ± 2 nm.

[0026] In some embodiments, the antireflective film includes an optical stack sequentially stacked from the surface of the glass substrate. The optical stack includes a first SiO2 layer, a first AlN layer, a second SiO2 layer, a second AlN layer, and an outermost SiO2 layer. The thickness of the first SiO2 layer is 70 nm ± 2 nm, the thickness of the first AlN layer is 10 nm ± 2 nm, the thickness of the second SiO2 layer is 37 nm ± 2 nm, the thickness of the second AlN layer is 110 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 88 nm ± 2 nm.

[0027] In some embodiments, the glass substrate is made of glass or microcrystalline glass, the refractive index of the glass substrate is 1.50 to 1.52, and the thickness of the glass substrate is 0.4 mm to 0.6 mm.

[0028] In some embodiments, the glass substrate is made of microcrystalline glass, which, by molar percentage, comprises 10%≤Li₂O≤25%, 58%≤SiO₂≤72%, 2%≤Al₂O₃≤8%, 3%≤Na₂O+K₂O≤7%, 2%≤P₂O₅+ZrO₂+TiO₂≤13%, 0%≤MgO+CaO+ZnO≤3%, and 0%≤B₂O₃≤5%. This application uses microcrystalline glass as the substrate, which has good mechanical strength and can reduce the strength reduction on the inner surface of the glass cover plate caused by the coating.

[0029] In some embodiments, the glass-ceramic comprises a glass phase and a crystalline phase, wherein the crystalline phase comprises ≥20% by mass in the glass-ceramic, and the crystalline phase comprises one or more combinations of quartz, spodumene, petalite, lithium silicate, lithium disilicate, and spinel.

[0030] In some embodiments, the glass substrate is made of glass, which, by molar percentage, comprises 45% ≤ SiO2 ≤ 59.5%, 9% ≤ Al2O3 ≤ 30%, 7% ≤ MgO ≤ 30%, 0% ≤ La2O3 ≤ 8%, 0% ≤ ZrO2 ≤ 10%, 0% ≤ ZnO ≤ 5%, 5.5% ≤ Li2O ≤ 15%, 1% ≤ Na2O ≤ 5%, and 2% ≤ K2O ≤ 5%.

[0031] This application also provides a surface treatment method for a glass cover plate, the surface treatment method comprising the following steps:

[0032] A partial masking process is used to form a masking layer in other areas of the glass substrate, while exposing the light-transmitting area of ​​the glass substrate;

[0033] A coating process is performed on the light-transmitting hole area of ​​the glass substrate to sequentially form at least two optical layers, wherein the optical layers include a first film layer with a refractive index lower than 1.6 and a second film layer with a refractive index higher than 1.7;

[0034] A silicon dioxide layer is formed on the surface of the second film layer, which is farthest from the glass substrate, and the shielding layer in the other areas is removed to obtain a glass cover plate, the glass cover plate including the glass cover plate described above.

[0035] In the above scheme, the partial masking process can be ink coverage, protective film coverage, umbrella coverage, etc., and is not limited here, as long as it can cover other areas around the light-transmitting hole area while exposing the light-transmitting hole area. This allows an anti-reflective film to be locally formed on the glass substrate, reducing reflectivity through the locally set anti-reflective film. The glass cover plate prepared in this application can be directly adapted for installation in the whole machine, and it has good compatibility with the camera module and display module architecture in electronic devices, with minimal changes to the manufacturing process.

[0036] This application also provides a display device, including a glass cover, a display module, and a photosensitive component. Along the thickness direction of the display module, the display module has a first surface and a second surface disposed opposite to each other. The display module is provided with at least one light-transmitting hole penetrating the first surface and the second surface. The photosensitive component is installed in the light-transmitting hole. The photosensitive component includes a front-facing camera and / or a laser rangefinder. The reflectivity of the display device is ≤6% when incident at 0° on any screen position.

[0037] The glass cover is disposed on the first surface of the display module. The glass cover includes the aforementioned glass cover, and the light-transmitting hole area of ​​the glass cover is disposed corresponding to the light-transmitting hole.

[0038] In the above solution, the photosensitive component is installed inside the light-transmitting hole of the display module. This allows light to pass through the anti-reflective film into the light-transmitting hole and be captured by the photosensitive component, forming a clear image or obtaining clear image data. This application achieves the following simultaneously by locally setting an anti-reflective film in the light-transmitting hole area of ​​the glass cover: 1) improved image clarity and reduced glare from the front-facing camera; 2) improved accuracy of the infrared sensor; and 3) minimal changes to the overall device, camera, and display module architecture and manufacturing process.

[0039] This application also provides an electronic device, which includes the aforementioned glass cover or display device. The electronic device can be a mobile phone, tablet, computer, wearable electronic device, etc. The electronic device of this application can provide a refined full-screen experience, and the overall structure and manufacturing process of the electronic device, including the camera and display modules, only require the addition of a localized coating on the glass cover, based on existing processes, thus minimizing process changes and reducing production costs. Attached Figure Description

[0040] Figure 1a This is a partial structural exploded view of the electronic device provided in the embodiments of this application.

[0041] Figure 1b This is a cross-sectional schematic diagram of the glass cover of the electronic device provided in the embodiments of this application.

[0042] Figure 1cThis is a schematic diagram of the light-receiving surface of the glass cover of the electronic device provided in the embodiments of this application.

[0043] Figure 2a This is a schematic diagram of the structure of the antireflective film of the glass cover provided in Embodiment 1 of this application.

[0044] Figure 2b This is a process flow diagram of the surface treatment method for the glass cover plate provided in Embodiment 1 of this application.

[0045] Figure 3 This is a test diagram of the optical performance of the glass cover plate prepared according to Embodiment 1 of this application.

[0046] Figure 4a This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment 2 of this application.

[0047] Figure 4b This is a process flow diagram of the surface treatment method for the glass cover plate provided in Embodiment 2 of this application.

[0048] Figure 5 This is a test diagram of the optical performance of the glass cover plate prepared in Example 2 of this application.

[0049] Figure 6a This is a schematic diagram of the structure of the antireflective film of the glass cover provided in Embodiment 3 of this application.

[0050] Figure 6b This is a schematic diagram of the fabrication process of the antireflective film for the glass cover provided in Embodiment 3 of this application.

[0051] Figure 7 This is a test diagram of the optical performance of the glass cover plate prepared in Example 3 of this application.

[0052] Figure 8 This is a schematic diagram of the structure of the antireflective film of the glass cover plate provided in Embodiment 4 of this application.

[0053] Figure 9 This is a test diagram of the optical performance of the glass cover plate prepared in Example 4 of this application.

[0054] Figure 10 This is a schematic diagram of the structure of the antireflective film of the glass cover provided in Embodiment 5 of this application.

[0055] Figure 11 This is a test diagram of the optical performance of the glass cover plate prepared in Example 5 of this application.

[0056] Figure 12 This is a schematic diagram of the structure of the antireflective film of the glass cover provided in Embodiment Six of this application.

[0057] Figure 13This is a test diagram of the optical performance of the glass cover plate prepared in Example 6 of this application.

[0058] Figure 14a This is a schematic diagram of the display device in its off-screen state when the glass cover is not fitted with an anti-reflective coating.

[0059] Figure 14b This is a schematic diagram of the display device in its off-screen state after an anti-reflective coating has been applied.

[0060] Figure label:

[0061] 10 - Display device;

[0062] 11-Light-transmitting hole; 12-Glass cover plate;

[0063] 101 - Glass substrate;

[0064] 100 - Anti-reflective coating; 10a - Main body; 10b - Overlapping part; 10c - Connecting part;

[0065] 200 - Ink layer;

[0066] 300-Electronic Adhesive Layer;

[0067] A - Light-transmitting area; B - Other areas;

[0068] 102 - The outermost SiO2 layer;

[0069] 111 - First SiO2 layer; 112 - First Si3N4 layer; 113 - Second SiO2 layer; 114 - Second Si3N4 layer; 115 - Third SiO2 layer; 116 - Third Si3N4 layer.

[0070] 121 - First SiO2 layer; 122 - First Nb2O5 layer; 123 - Second SiO2 layer; 124 - Second Nb2O5 layer.

[0071] 131 - First SiO2 layer; 132 - First AlN layer; 133 - Second SiO2 layer; 134 - Second AlN layer; 135 - Third SiO2 layer; 136 - Third AlN layer.

[0072] 141 - First SiO2 layer; 142 - First Si3N4 layer; 143 - Second SiO2 layer; 144 - Second Si3N4 layer; 145 - Third SiO2 layer; 146 - Third Si3N4 layer;

[0073] 151 - First SiO2 layer; 152 - First Si3N4 layer; 153 - Second SiO2 layer; 154 - Second Si3N4 layer.

[0074] 161 - First SiO2 layer; 162 - First AlN layer; 163 - Second SiO2 layer; 164 - Second AlN layer. Detailed Implementation

[0075] The technical solutions provided by the present invention will be further described below with reference to specific embodiments and comparative examples, but this application is not limited to the following embodiments. In the embodiments of this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with "first" and "second" may explicitly or implicitly include one or more of that feature.

[0076] In this application, directional terms such as "upper" and "lower" are defined relative to the orientation of the components shown in the accompanying drawings. It should be understood that these directional terms are relative concepts, used for relative description and clarification, and can change accordingly depending on the orientation of the components in the accompanying drawings.

[0077] To better understand the solutions of this application, the following describes the terminology used in the embodiments of this application.

[0078] Interference of light

[0079] Optical interference refers to the optical phenomenon where two light waves with the same frequency, constant phase difference, and consistent vibration direction superimpose each other when they meet during transmission, resulting in constructive (enhancing) and / or destructive (weakening) interference.

[0080] Anti-reflective coating

[0081] Anti-reflective coatings are typically used in electronic devices such as mobile phones, tablets, PCs, monitors, and large-screen terminals that require anti-reflective properties to reduce reflected light from their screens. The effectiveness of anti-reflective coatings directly impacts the user's visual experience when using electronic devices.

[0082] The light-emitting surface of the anti-reflective coating

[0083] The light-emitting surface of an anti-reflective film refers to the side of the anti-reflective film that is away from the optical device when it is stacked on the optical surface of an optical device (such as the glass cover plate in the embodiments of this application). The light-receiving surface of the anti-reflective film is opposite to the light-emitting surface of the anti-reflective film.

[0084] With the development of mobile electronic device technology, such as mobile phones, screens have gradually evolved from notch displays to full-screen displays. Full-screen displays offer an exceptional aesthetic appeal when the screen is off, representing the ultimate pursuit of consumers for the display experience of mobile electronic products. One of the challenges that full-screen displays need to overcome is how to hide the camera, while users also have increasingly higher expectations for the photo quality of the camera module. The camera module is generally located at the bottom of the display device, with a pre-reserved area for the camera hole in the glass cover of the display device. Optimizing the optical performance of the camera hole area to achieve the aesthetic effect of a full-screen display when the screen is off is a technical problem that needs to be solved.

[0085] This application provides an electronic device, which may include mobile phones, tablets, e-readers, laptops, digital cameras, in-vehicle devices, televisions, smart wearable products (e.g., smartwatches, smart bracelets), virtual reality (VR) terminal devices, augmented reality (AR) terminal devices, and other electronic products with anti-reflection requirements. This application does not impose any special limitations on the specific form of the above-mentioned electronic device. For ease of explanation, the following description uses the mobile phone shown in Figure 1 as an example.

[0086] Please see Figure 1a The electronic device may include a display device 10, i.e., a display screen. The display device 10 includes a display module and a photosensitive component. Along the thickness direction of the display device, the display device has a first surface and a second surface disposed opposite to each other. The first surface of the display device is the front surface or display surface, used for outputting display content. The display module may employ a liquid crystal display (LCD), an organic light-emitting diode (OLED), an active-matrix organic light-emitting diode (AMOLED), a flexible light-emitting diode (FLED), a MiniLED, a MicroLED, a Micro-OLED, a quantum dot light-emitting diode (QLED), etc.

[0087] To protect the display device from damage, the display device 10 also includes a glass cover plate 12. The glass cover plate 12 is disposed on the first surface of the display module to protect the display module from damage.

[0088] The display module has at least one light-transmitting hole 11 penetrating the first and second surfaces. A photosensitive component (not shown) is installed within the light-transmitting hole 11. The photosensitive component includes a front-facing camera and / or a laser rangefinder. When the front-facing camera takes a picture, the shutter is opened, and light is transmitted through the lens to the camera's photosensitive element. The light signal is converted into an electrical signal, and the camera's photosensitive element transmits the electrical signal to an image signal processor for processing, converting it into an image visible to the naked eye. The laser rangefinder is used to measure distance. In some embodiments, during a shooting scene, the electronic device can use the laser rangefinder to measure distance for fast focusing.

[0089] In some embodiments, the display module has three light-transmitting holes 11. The middle light-transmitting hole 11 is used to mount a front-facing camera, and one of the two side light-transmitting holes 11 serves as a receiver for a laser rangefinder sensor, while the other serves as a transmitter for the same sensor. Understandably, when the anti-reflective properties of the glass cover are poor, it will affect the sensitivity of these photosensitive components and the clarity of the captured image.

[0090] In some embodiments, the display module is provided with a light-transmitting hole 11, which is located in the middle of the upper part of the display module and is used to install a front-facing camera.

[0091] Based on this, this application provides a glass cover plate. Figure 1b This is a cross-sectional schematic diagram of the glass cover plate provided in the embodiments of this application, as shown below. Figure 1b As shown, the glass cover plate 12 includes a glass substrate 101. At least one side surface of the glass substrate 101 is provided with an annular ink layer 200. The area enclosed by the ink layer 200 includes a light-transmitting hole area A. The area on the glass substrate 101 other than the ink layer 200 includes other areas B. An anti-reflective film 100 is provided in the light-transmitting hole area A. Along the thickness direction of the glass cover plate, the edge of the orthographic projection of the anti-reflective film 100 on the glass substrate 101 is between the inner edge and the outer edge of the orthographic projection of the ink layer.

[0092] Within the visible light band of 400nm to 700nm, the single-sided reflectivity P1% and double-sided reflectivity Q1% of the light-transmitting area of ​​the glass cover plate are 0.5≤P1≤2.5 and 1≤Q1≤7; within the visible light band of 400nm to 700nm, the single-sided reflectivity P2% and double-sided reflectivity Q2% of other areas of the glass cover plate are 4.2≤P2≤5 and 8.5≤Q2≤10.

[0093] Within the infrared light band of 940nm±5nm, the average transmittance M1 of the light-transmitting hole area of ​​the glass cover plate is 85≤M1≤90.

[0094] In the above solution, the anti-reflective film is partially applied to the glass cover plate. The one-sided reflectivity of the light-transmitting area of ​​the glass cover plate can reach below 2.5%, which can improve the anti-reflective effect of the local light-transmitting area of ​​the glass cover plate. When the glass cover plate is applied to electronic devices, it can improve the image clarity of the front-facing camera and significantly reduce glare. The anti-reflective effect of the anti-reflective film in this application is improved. The one-sided reflectivity of the inner surface of the glass cover plate in the light-transmitting area can reach below 2.5% in the 400nm-700nm wavelength band, and the double-sided reflectivity can reach below 7%. In particular, the average reflectivity in the visible light band of 500nm-600nm is reduced to below 1%, or even 0.5%, which greatly improves the anti-reflective ability of the light-transmitting area of ​​the glass cover plate. Not only is the anti-reflective ability against perpendicular light improved, but the anti-reflective ability against oblique light is also effectively improved. When users operate electronic devices, the reflection phenomenon in the light-transmitting area of ​​the display screen is significantly reduced, almost eliminating reflection. This results in a noticeable improvement in the shooting performance of the front-facing camera, especially in backlit scenes, where images captured by the front-facing camera are clearer and glare is significantly reduced, greatly enhancing the user experience. The average transmittance of the 940nm wavelength in the light-transmitting area of ​​the glass cover is ≥85%. When the glass cover is used in electronic devices, it can improve the detection accuracy and range of infrared sensing modules such as TOF. When the display is off, the reflectivity of the light-transmitting area is extremely low, while the light transmittance is high, creating a seamless black effect and enhancing the aesthetics of the full-screen display when the screen is off.

[0095] Compared to the solution of partially applying an anti-reflective film to the entire display screen, the solution provided in this application can effectively control costs.

[0096] Specifically, the anti-reflective film is disposed on the inner surface of the glass substrate, away from the light-emitting surface, in the light-transmitting area of ​​the glass substrate, i.e., on the light-emitting surface of the glass substrate. Along the thickness direction of the glass substrate, the orthographic projection of the anti-reflective film lies within the orthographic projection of the light-transmitting area. When light passes through the anti-reflective film, it undergoes multiple reflections and refractions at the interface. Utilizing the light interference principle of the anti-reflective film, the reflectivity of incident light on the glass substrate is reduced, thereby increasing the transmittance of incident light. This, in turn, increases the light intake of the photosensitive component (e.g., a front-facing camera). Light passes through the light-transmitting area into the camera for imaging.

[0097] In other embodiments, the anti-reflection film can also be disposed on both sides of the light-transmitting hole area of ​​the glass substrate, that is, the anti-reflection film is disposed on both the light-viewing surface and the light-emitting surface, which can further improve the anti-reflection effect.

[0098] Please continue reading. Figure 1b and Figure 1cThe inner surface of the glass substrate 101 away from the light-receiving surface is provided with the annular ink layer 200. The light-transmitting hole area A formed by the ink layer 200 is provided with the anti-reflection film 100. The anti-reflection film 100 includes a main body 10a, an overlapping part 10b, and a connecting part 10c. The main body 10a is located inside the ink layer 200. The overlapping part 10b is stacked on the upper surface of the ink layer 200. The connecting part 10c connects the main body 10a and the overlapping part 10b along the inner sidewall of the ink layer 200.

[0099] In the above solution, an anti-reflective film is provided in the light-transmitting hole area A formed by the ink layer 200, which can ensure that the overall optical performance of the anti-reflective film remains consistent. When the display device with the glass cover is off, the light-transmitting hole area has a consistent appearance blackness effect under the enclosure of the ink layer, which can improve the exquisite experience of the full screen when the screen is off.

[0100] To facilitate the assembly of the glass cover with other modules, such as camera modules, an electronic adhesive layer 300 is provided on the inner surface of the glass cover. At least a portion of the electronic adhesive layer 300 contacts the edge of the ink layer 200. Due to the presence of the electronic adhesive layer 300, the raised ink layer 200 and the anti-reflective film 100 can maintain an overall height consistency along the thickness direction of the glass cover. In some embodiments, the thickness of the ink layer 200 is 5μm to 100μm, and the total thickness of the anti-reflective film 100 is 100nm to 1000nm. Specifically, the total thickness of the anti-reflective film 100 can be 100nm, 200nm, 250nm, 300nm, 500nm, 600nm, 800nm, 850nm, 900nm, 950nm, or 1000nm, or other values ​​within the aforementioned range. By controlling the total thickness of the antireflective coating within the aforementioned range, the antireflective effect in the local light-transmitting area can be improved, while also helping to control the overall thickness of the glass cover and reducing the overall strength loss of the glass cover.

[0101] In some embodiments, within the infrared light band of 940nm±5nm, the average transmittance M1 of the light-transmitting aperture area of ​​the glass cover plate, 85≤M1≤90, can specifically be 85%, 86%, 87%, 88%, 89%, or 90%, or other values ​​within the above range, which are not limited here. When the glass cover plate is applied to electronic devices, it can improve the detection accuracy and range of infrared sensing modules such as TOF.

[0102] In some embodiments, within the visible light band of 400nm to 700nm, the single-sided reflectance P1% and double-sided reflectance Q1% of the light-transmitting aperture area of ​​the glass cover plate are 0.5≤P1≤2.5, 1≤Q1≤7; the single-sided reflectance P2% and double-sided reflectance Q2% of other areas of the glass cover plate are 4.2≤P2≤5, 8.5≤Q2≤10. The single-sided reflectance P1% of the light-transmitting aperture area can be 0.5%, 0.8%, 1.0%, 1.2%, 1.5%, 1.8%, 2.0%, or 2.5%, and the double-sided reflectance Q1% of the light-transmitting aperture area can be 1%, 2%, 3%, 4.5%, 5%, 6.5%, or 7%, etc., or other values ​​within the above range, which are not limited here. When anti-reflection films are provided on both sides of the light-transmitting aperture area, the double-sided reflectance of the light-transmitting aperture area can be controlled to be even lower. This helps reduce glare from the front-facing camera and improves the clarity of front-facing camera photos.

[0103] The single-sided reflectance P2% of other areas of the glass cover can be 4.2%, 4.3%, 4.5%, 4.6%, 4.7%, 4.8%, 4.9%, or 5%, and the double-sided reflectance of other areas can be 8.5%, 8.8%, 8.9%, 9.0%, 9.2%, 9.5%, or 10%, etc., or other values ​​within the above range, which are not limited here. The average reflectance of the light-transmitting area of ​​the display device with the glass cover and the other areas is ≤7%. In the above scheme, the optical characteristics of the light-transmitting area of ​​the glass cover are nearly consistent with those of the other areas. The display device with this glass cover has a consistent black level effect when the screen is off, which can improve the exquisite experience of the full-screen display when the screen is off.

[0104] In some embodiments, within the visible light band of 400nm to 700nm, the average transmittance M2 of the light-transmitting area of ​​the glass cover plate is 87≤M2≤99, specifically 87%, 89%, 90%, 93%, 94%, 95%, 96%, 97%, 98%, or 99%, or other values ​​within the above range, which are not limited here. Higher visible light transmittance reduces light reflection, resulting in higher image clarity from the front-facing camera and better improvement in glare and blurring; the detection accuracy of the infrared sensor installed in the light-transmitting area can also be improved.

[0105] In some embodiments, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate. The optical layers include alternating layers of a first layer with a refractive index lower than 1.6, a second layer with a refractive index higher than 1.7, and an outermost layer of the antireflective coating; and the optical layers satisfy the following relationship:

[0106]

[0107] n L n is the refractive index of the material of the first film layer at 550 nm. H n1 is the refractive index of the material of the second film layer at 550 nm, and n2 is the refractive index of the material of the outermost film layer at 550 nm.

[0108] n ave This represents the arithmetic mean of the refractive indices of the optical stack. n i Let T be the thickness of the i-th layer, Ti be the refractive index of the i-th layer, and T be the refractive index of the i-th layer. sum denoted as the total thickness of the optical stack, and m as the total number of optical stack layers.

[0109] In the above scheme, by alternately setting a first film layer and a second film layer with different refractive indices, the light interference effect generated by light passing through the optical stack can be used to reduce the light reflection in the light-transmitting hole area and reduce the reflectivity.

[0110] In some embodiments, the thickness of the outermost silicon dioxide layer of the antireflective coating is 80nm to 95nm. Its thickness can be 80nm, 82nm, 85nm, 86nm, 88nm, 90nm, 91nm, 92nm, or 95nm, or other values ​​within the aforementioned range, and is not limited here. The refractive index of the silicon dioxide layer is less than 1.6, making it a low-refractive-index optical film layer, which can reduce light reflection. Furthermore, the silicon dioxide layer has high hardness and good wear resistance, which can improve the wear resistance of the light-transmitting area of ​​the glass cover, helping the optical stack achieve better optical performance and simultaneously improving the durability of the glass cover.

[0111] In some embodiments, the material of the first film layer with a refractive index lower than 1.6 includes at least one of silicon dioxide (refractive index 1.46), nitrogen-doped silicon dioxide (refractive index 1.65), aluminum oxide (refractive index 1.65), aluminum fluoride (refractive index 1.35), and magnesium fluoride (refractive index 1.38). The first film layer includes a low refractive index film layer.

[0112] In some embodiments, the material of the second film layer with a refractive index higher than 1.7 includes at least one of titanium oxide (refractive index 2.35), niobium oxide (refractive index 2.30), silicon nitride (refractive index 2.1), silicon oxynitride (refractive index 2.05), aluminum silicon oxynitride (refractive index 1.9), aluminum nitride (refractive index 2.0), silicon carbide (refractive index 2.6), and diamond-like carbon (refractive index 2.0). The second film layer comprises a high refractive index film layer.

[0113] In some embodiments, the glass substrate is made of glass or glass-ceramic, preferably glass-ceramic. Glass-ceramic comprises a glass phase and a crystalline phase. It has high internal crystallinity and its grain size can be controlled within a small range. During crystallization, the crystalline phase and the residual glass phase have similar chemical compositions, small refractive index differences, and continuous compositional changes, resulting in high transmittance in the visible light region. Simultaneously, the crystalline phase also ensures the mechanical strength of the glass-ceramic.

[0114] In some embodiments, the refractive index of the glass substrate is 1.50 to 1.52.

[0115] In some embodiments, the thickness of the glass substrate is 0.4 mm to 0.6 mm. Specifically, the thickness of the glass substrate can be 0.4 mm, 0.45 mm, 0.5 mm, 0.55 mm, or 0.6 mm, or other values ​​within the above range, which are not limited here.

[0116] In some embodiments, the glass substrate is made of microcrystalline glass, which is a lithium aluminum silicon system. The microcrystalline glass, by molar percentage, comprises 10% ≤ Li₂O ≤ 25%, 58% ≤ SiO₂ ≤ 72%, 2% ≤ Al₂O₃ ≤ 8%, 3% ≤ Na₂O + K₂O ≤ 7%, 2% ≤ P₂O₅ + ZrO₂ + TiO₂ ≤ 13%, 0% ≤ MgO + CaO + ZnO ≤ 3%, and 0% ≤ B₂O₃ ≤ 5%. This application uses microcrystalline glass as the substrate, which has good mechanical strength and can reduce the strength reduction on the inner surface of the glass cover caused by the coating.

[0117] In some embodiments, the glass-ceramic comprises a glass phase and a crystalline phase. The crystalline phase includes one or more of quartz, spodumene, petalite, lithium silicate, lithium disilicate, and spinel, and the mass content of the crystalline phase in the glass-ceramic is ≥20%. Controlling the mass content of the crystalline phase in the glass-ceramic can improve its mechanical strength and enhance its drop resistance and other properties.

[0118] In some embodiments, the glass substrate is made of glass, which, by molar percentage, comprises 45% ≤ SiO2 ≤ 59.5%, 9% ≤ Al2O3 ≤ 30%, 7% ≤ MgO ≤ 30%, 0% ≤ La2O3 ≤ 8%, 0% ≤ ZrO2 ≤ 10%, 0% ≤ ZnO ≤ 5%, 5.5% ≤ Li2O ≤ 15%, 1% ≤ Na2O ≤ 5%, and 2% ≤ K2O ≤ 5%.

[0119] The embodiments of this application will be further described below with reference to several examples. However, the embodiments of the present invention are not limited to the specific embodiments described below. Appropriate modifications can be made within the scope of the main claims.

[0120] Figure 2a This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment 1 of this application. In order to obtain this glass cover, Figure 2b This is a process flow diagram of the surface treatment method for the glass cover plate provided in Embodiment 1 of this application, as shown below. Figure 2a and Figure 2b As shown, the method includes:

[0121] S10, a glass substrate is provided, the glass substrate including a first plate surface and a second plate surface disposed opposite to each other;

[0122] S20, a partial masking process is used to form a masking layer in other areas of the first surface of the glass substrate, and exposes the light-transmitting hole area of ​​the glass substrate.

[0123] S30, a coating process is performed on the light-transmitting hole area of ​​the glass substrate to form an optical stack in sequence. The optical stack includes a first film layer with a refractive index lower than 1.6 and a second film layer with a refractive index higher than 1.7, which are alternately arranged.

[0124] S40, a silicon dioxide layer is formed on the surface of the second film layer away from the outermost layer of the glass substrate, and the shielding layer in the other areas is removed to obtain a glass cover plate.

[0125] In this embodiment, such as Figure 2b As shown, a protective film is used to shield other areas. The protective film shielding is achieved by using a high-precision film applicator to accurately attach the light-transmitting hole area. After the shielding layer is formed, the glass substrate is placed in a vapor deposition machine or sputtering machine for film coating. At this time, film layers with different refractive indices are alternately deposited in the light-transmitting hole area, so that an anti-reflection film is formed in the light-transmitting hole area.

[0126] The specific coating process for the anti-reflective coating includes: first, evacuating the cavity of the sputtering machine, with the evacuation process completed within 5 to 60 minutes, achieving a vacuum level of 10 within the cavity. -3 Below Pa, the light-transmitting area of ​​the glass substrate is then subjected to plasma treatment to remove contaminants from the surface of the light-transmitting area and bring the surface roughness of the light-transmitting area to a suitable range. Then, a magnetron sputtering process is used with a deposition power of 5kW-30kW, using targets including Si, Nb, and Al targets, and argon, oxygen, or nitrogen as the working gas with a flow rate of 10sccm-500sccm. The deposition temperature is 80℃-120℃, forming a film layer in the light-transmitting area. Oxidation or nitriding treatment processes are selected based on the film material. The magnetron sputtering process is repeated to alternately deposit the first and second film layers in the light-transmitting area. Throughout the process, the deposition rate is controlled at 5nm / min-10nm / min to ensure the film thickness remains within a suitable range.

[0127] like Figure 2a As shown, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate 101. The optical layers include a first SiO2 layer 111, a first Si3N4 layer 112, a second SiO2 layer 113, a second Si3N4 layer 114, a third SiO2 layer 115, and a third Si3N4 layer 116. The thickness of the first SiO2 layer 111 is 70nm ± 2nm, the thickness of the first Si3N4 layer 112 is 13nm ± 2nm, the thickness of the second SiO2 layer 113 is 34nm ± 2nm, the thickness of the second Si3N4 layer 114 is 133nm ± 2nm, the thickness of the third SiO2 layer 115 is 15nm ± 2nm, the thickness of the third Si3N4 layer 116 is 140nm ± 2nm, and the thickness of the outermost SiO2 layer 102 is 90nm ± 2nm. The above-mentioned membrane structure relationship is satisfied.

[0128] The optical stack consists of six layers of silicon nitride and silicon dioxide. Silicon nitride has a refractive index of 1.96, and silicon dioxide has a refractive index of 1.46. The antireflective coating exhibits good hardness and excellent optical properties under sputtering conditions. The glass substrate is made of microcrystalline glass, belonging to the lithium aluminum silicon system, specifically composed of lithium silicate, lithium disilicate, and lithium feldspar crystal phases. The glass substrate has a thickness of 0.55 mm and a refractive index of 1.51.

[0129] Figure 3 This is a test image of the optical performance of the glass cover plate prepared according to Embodiment 1 of this application, as shown. Figure 3 As shown, the single-sided reflectance of the light-transmitting area of ​​the glass cover plate is as low as 0.8% in the visible light band of 400nm to 700nm, significantly improving the optical effect of the light-transmitting area. The single-sided reflectance of other areas of the glass cover plate in the visible light band of 400nm to 700nm is 4.2%. After being assembled into a display device, the average reflectance of the light-transmitting area and other areas in the visible light band of 400nm to 700nm is 5.2%, both ≤7%, with nearly identical optical characteristics. The display device has a consistent black level effect when the screen is off.

[0130] Furthermore, the anti-reflective coating on the glass cover effectively enhances the anti-reflective effect in local areas, improving the image clarity of the camera. Before and after coating, the average transmittance of the light-transmitting area in the 940nm infrared band increases from 87% to 89%, which can significantly improve the accuracy of the laser sensor and reduce light leakage in the imaging module.

[0131] It is evident that the anti-reflective film on the glass cover can effectively improve the anti-reflective effect in local areas of the glass cover, thereby enhancing the image clarity of the camera.

[0132] Through testing, the antireflective film prepared in Example 1 achieved a nanoindentation of 10 GPa, and the glass cover exhibited excellent scratch resistance, effectively preventing scratches and other appearance defects caused by subsequent processes.

[0133] Figure 4a This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment 2 of this application. In order to obtain this glass cover, Figure 4b This is a process flow diagram of the surface treatment method for the glass cover plate provided in Embodiment 2 of this application, as shown below. Figure 4a and Figure 4b As shown, the method includes:

[0134] S10, a glass substrate is provided, the glass substrate including a first plate surface and a second plate surface disposed opposite to each other;

[0135] S20, an ink masking layer is formed in other areas of the first surface of the glass substrate, and the light-transmitting hole area of ​​the glass substrate is exposed;

[0136] S30, a coating process is performed on the light-transmitting hole area of ​​the glass substrate to form an optical stack in sequence. The optical stack includes a first film layer with a refractive index lower than 1.6 and a second film layer with a refractive index higher than 1.7, which are alternately arranged.

[0137] S40, a silicon dioxide layer is formed on the surface of the second film layer away from the outermost layer of the glass substrate, and the ink masking layer in the other areas is removed to obtain a glass cover plate.

[0138] In this embodiment, such as Figure 4b As shown, ink is used to mask other areas. In this embodiment, the protective oil is printed by a pad printing machine or a screen printing machine onto other areas that need to be coated and protected. The light-transmitting hole area is not protected by ink. After the ink masking layer is fully dried to form, the glass substrate is placed in a vapor deposition machine or a sputtering machine for coating treatment. At this time, the light-transmitting hole area is alternately coated with film layers of different refractive indices, so that the light-transmitting hole area forms an anti-reflection film.

[0139] The specific coating process includes: first, evacuating the chamber of the sputtering machine, with the evacuation process completed within 5 to 60 minutes, achieving a vacuum level of 10 within the chamber. -3Below Pa, the light-transmitting area of ​​the glass substrate is then subjected to plasma treatment to remove contaminants from the surface of the light-transmitting area and achieve a suitable surface roughness. Next, a magnetron sputtering process is used with a deposition power of 5-30 kW, using Si or Nb targets, argon / oxygen as the working gas, a flow rate of 10 sccm to 500 sccm, and a deposition temperature of 80℃ to 120℃ to form a film layer in the light-transmitting area. An oxidation treatment process is then selected based on the film material. The magnetron sputtering process is repeated, alternating between the first and second film layers in the light-transmitting area. Throughout the entire process, the deposition rate is controlled at 5 nm / min to 10 nm / min to ensure the film thickness remains within a suitable range.

[0140] like Figure 4a As shown, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate 101. The optical layers include a first SiO2 layer 121, a first Nb2O5 layer 122, a second SiO2 layer 123, and a second Nb2O5 layer 124. The thickness of the first SiO2 layer is 154 nm ± 2 nm, the thickness of the first Nb2O5 layer is 11 nm ± 2 nm, the thickness of the second SiO2 layer is 32 nm ± 2 nm, the thickness of the second Nb2O5 layer is 103 nm ± 2 nm, and the thickness of the outermost SiO2 layer 102 is 84 nm ± 2 nm.

[0141] The above-mentioned membrane structure relationship is satisfied.

[0142] The optical stack consists of four layers of niobium oxide and silicon dioxide. Niobium oxide has a refractive index of 2.2, and silicon dioxide has a refractive index of 1.46. The high-refractive-index second layer and the low-refractive-index first layer form an optical stack with good anti-reflection properties, which helps reduce light reflectivity. The anti-reflection film exhibits good hardness and excellent optical performance under sputtering processes. The glass substrate is made of microcrystalline glass, belonging to the lithium aluminum silicon system, specifically composed of lithium silicate, lithium disilicate, and lithium feldspar crystal phases. The glass substrate has a thickness of 0.55 mm and a refractive index of 1.51.

[0143] In this embodiment, within the visible light band of 400nm to 700nm, the one-sided reflectance of the light-transmitting aperture region of the glass cover plate is close to that of the glass cover plate prepared in Example 1. In this embodiment, the double-sided reflectance of the light-transmitting aperture region can be reduced from 9% to 6% or even 4%. Within the infrared light band of 940nm ± 5nm, the average transmittance of the light-transmitting aperture region of the glass cover plate reaches over 86%.

[0144] Figure 5 This is a test image of the optical performance of the glass cover plate prepared according to Example 2 of this application, as shown. Figure 5 As shown, when the incident angle of light is 0° to 15°, the double-sided reflectivity of the light-transmitting aperture area of ​​the glass cover plate can be reduced to below 6% in the visible light band of 400nm to 700nm. When the incident angle of light is 30°, the double-sided reflectivity of the light-transmitting aperture area can be reduced to below 6.5%. It is evident that the anti-reflection film provided in Embodiment 2 of this application can maintain excellent anti-reflection performance under different light incident angles.

[0145] Through testing, the antireflective film prepared in Example 2 achieved a nanoindentation of 9 GPa, and the glass cover plate has excellent scratch resistance, which can effectively avoid appearance defects such as scratches caused in subsequent processes.

[0146] Figure 6a This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment 3 of this application. To obtain this glass cover, Embodiment 3 differs from Embodiment 1 in that, in step S20, the shielding process uses a contoured umbrella with an opening groove to assist in forming a shielding layer and expose the light-transmitting hole area of ​​the glass substrate. The opening groove of the umbrella corresponds to the light-transmitting hole area.

[0147] The specific coating process includes first evacuating the chamber of the sputtering machine, with the evacuation process completed within 5 to 60 minutes, achieving a vacuum level of 10 within the chamber. -3 Below Pa, the light-transmitting area of ​​the glass substrate is then subjected to plasma treatment to remove contaminants from the surface of the light-transmitting area and achieve a suitable surface roughness. Next, a magnetron sputtering process is used with a deposition power of 5-30 kW, using Si or Al targets, and argon / oxygen / nitrogen as the working gas at a flow rate of 10 sccm to 500 sccm. The deposition temperature is 80-120℃, forming a film layer in the light-transmitting area. Oxidation or nitriding treatment is then selected based on the film material. The magnetron sputtering process is repeated, alternating between the first and second film layers in the light-transmitting area. Throughout the process, the deposition rate is controlled at 5 nm / min to 10 nm / min to ensure the film thickness remains within a suitable range.

[0148] Figure 6b This is a schematic diagram of the fabrication process of the antireflective film on the glass cover provided in Embodiment 3 of this application, as shown below. Figure 6b As shown, in this embodiment, the umbrella shielding structure is used to shield other areas. After the coating is completed, laser lithography is required to remove part of the film layer under the umbrella shielding except for the light-transmitting hole area, so that the light-transmitting hole area forms an anti-reflection film.

[0149] like Figure 6aAs shown, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate 101. The optical layers include a first SiO2 layer 131, a first AlN layer 132, a second SiO2 layer 133, a second AlN layer 134, a third SiO2 layer 134, and a third AlN layer 136. The thickness of the first SiO2 layer is 37nm ± 2nm, the thickness of the first AlN layer is 5nm ± 2nm, the thickness of the second SiO2 layer is 7nm ± 2nm, the thickness of the second AlN layer is 7nm ± 2nm, the thickness of the third SiO2 layer is 33nm ± 2nm, the thickness of the third AlN layer is 103nm ± 2nm, and the thickness of the outermost SiO2 layer 102 is 86nm ± 2nm.

[0150] The above-mentioned membrane structure relationship is satisfied.

[0151] The optical stack consists of six layers of aluminum nitride and silicon dioxide. Aluminum nitride has a refractive index of 2.15, and silicon dioxide has a refractive index of 1.46. The high-refractive-index second layer and the low-refractive-index first layer form an optical stack with good anti-reflection properties, effectively reducing light reflectivity. The anti-reflection film exhibits good hardness and excellent optical performance under sputtering conditions. The glass substrate is made of microcrystalline glass, belonging to the lithium aluminum silicon system, specifically composed of lithium silicate, lithium disilicate, and lithium feldspar crystal phases. The glass substrate has a thickness of 0.5 mm and a refractive index of 1.51.

[0152] Figure 7 This is a test image of the optical performance of the glass cover plate prepared according to Example 3 of this application, as shown. Figure 7 As shown, by setting the aforementioned stacked antireflective film in the light-transmitting area of ​​the glass cover, when the incident angle of light is 0°, the single-sided reflectivity in the visible light band of 400nm to 680nm can be reduced to below 2%. The double-sided reflectivity can be reduced to below 6.5%, and the average transmittance in the 940nm infrared band can reach more than 89%.

[0153] Through testing, the antireflective film prepared in Example 3 achieved a nanoindentation of 12 GPa, and the glass cover exhibited excellent scratch resistance, effectively preventing scratches and other appearance defects during subsequent processes.

[0154] Figure 8 This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment 4 of this application. In order to obtain the glass cover, the preparation method of Embodiment 4 is the same as that of Embodiment 1, and will not be repeated here.

[0155] like Figure 8As shown, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate 101. The optical layers include a first SiO2 layer 141, a first Si3N4 layer 142, a second SiO2 layer 143, a second Si3N4 layer 144, a third SiO2 layer 145, and a third Si3N4 layer 146. The thickness of the first SiO2 layer is 6nm ± 2nm, the thickness of the first Si3N4 layer is 13nm ± 2nm, the thickness of the second SiO2 layer is 48nm ± 2nm, the thickness of the second Si3N4 layer is 49nm ± 2nm, the thickness of the third SiO2 layer is 19nm ± 2nm, the thickness of the third Si3N4 layer is 46nm ± 2nm, and the thickness of the outermost SiO2 layer 102 is 82nm ± 2nm.

[0156] The above-mentioned membrane structure relationship is satisfied.

[0157] The optical stack consists of six layers of silicon nitride and silicon dioxide. Silicon nitride has a refractive index of 1.96, and silicon dioxide has a refractive index of 1.46. The high-refractive-index second layer and the low-refractive-index first layer form an optical stack with good anti-reflection properties, which helps reduce light reflectivity. The anti-reflection film exhibits good hardness and excellent optical performance under sputtering processes. The glass substrate is made of microcrystalline glass, a lithium-aluminum-silicon system, specifically composed of lithium silicate, lithium disilicate, and lithium feldspar crystal phases. The glass substrate has a thickness of 0.55 mm and a refractive index of 1.51.

[0158] Figure 9 This is a test image of the optical performance of the glass cover plate prepared according to Example 4 of this application, as shown. Figure 9 As shown, by setting the aforementioned stacked antireflective film in the light-transmitting area of ​​the glass cover plate, when the incident angle of light is 0°, the single-sided reflectivity in the visible light band of 400nm to 700nm can be reduced to below 2%, and particularly in the visible light band of 450nm to 650nm, the single-sided reflectivity is as low as below 1.5%. The double-sided reflectivity in the light-transmitting area in the visible light band of 400nm to 700nm can be reduced to below 6%, and the average transmittance of the light-transmitting area in the 940nm infrared band can reach over 90%.

[0159] Through testing, the antireflective film prepared in Example 4 achieved a nanoindentation of 10 GPa, and the glass cover plate has excellent scratch resistance, which can effectively avoid appearance defects such as scratches caused in subsequent processes.

[0160] Figure 10 This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment 5 of this application. In order to obtain the glass cover, the preparation method of Embodiment 5 is the same as that of Embodiment 1, and will not be repeated here.

[0161] like Figure 10 As shown, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate 101. The optical layers include a first SiO2 layer 151, a first Si3N4 layer 152, a second SiO2 layer 153, and a second Si3N4 layer 154. The thickness of the first SiO2 layer is 163nm ± 2nm, the thickness of the first Si3N4 layer is 10nm ± 2nm, the thickness of the second SiO2 layer is 34nm ± 2nm, the thickness of the second Si3N4 layer is 101nm ± 2nm, and the thickness of the outermost SiO2 layer 102 is 81nm ± 2nm.

[0162] The above-mentioned membrane structure relationship is satisfied.

[0163] The optical stack consists of four layers of silicon nitride and silicon dioxide. Silicon nitride has a refractive index of 1.96, and silicon dioxide has a refractive index of 1.46. The high-refractive-index second layer and the low-refractive-index first layer form an optical stack with good anti-reflection properties, which helps reduce light reflectivity. The anti-reflection film exhibits good hardness and excellent optical performance under sputtering conditions. The glass substrate is made of microcrystalline glass, belonging to the lithium aluminum silicon system, specifically composed of lithium silicate, lithium disilicate, and lithium feldspar crystal phases. The glass substrate has a thickness of 0.5 mm and a refractive index of 1.51.

[0164] Figure 11 This is a test image of the optical performance of the glass cover plate prepared according to Example 5 of this application, as shown. Figure 11 As shown, by setting the aforementioned stacked antireflective film in the light-transmitting area of ​​the glass cover plate, when the incident angle of light is 0°, the single-sided reflectivity in the visible light band of 400nm to 700nm can be reduced to below 2.5%, and particularly in the visible light band of 450nm to 650nm, the single-sided reflectivity is as low as below 1.5%. In the visible light band of 400nm to 700nm, the double-sided reflectivity in the light-transmitting area of ​​the glass cover plate can be reduced to below 6%, and the average transmittance in the 940nm infrared band can reach above 86%.

[0165] Through testing, the antireflective film prepared in Example 5 achieved a nanoindentation of 11 GPa, and the glass cover exhibited excellent scratch resistance, effectively preventing scratches and other appearance defects during subsequent processes.

[0166] Figure 12 This is a schematic diagram of the antireflective film of the glass cover provided in Embodiment Six of this application. In order to obtain the glass cover, the preparation method of Embodiment Five is the same as that of Embodiment Three, and will not be repeated here.

[0167] like Figure 12 As shown, the antireflective coating includes optical layers sequentially stacked from the surface of the glass substrate 101. The optical layers include a first SiO2 layer 161, a first AlN layer 162, a second SiO2 layer 163, and a second AlN layer 164. The thickness of the first SiO2 layer is 70nm ± 2nm, the thickness of the first AlN layer is 10nm ± 2nm, the thickness of the second SiO2 layer is 37nm ± 2nm, the thickness of the second AlN layer is 110nm ± 2nm, and the thickness of the outermost SiO2 layer 102 is 88nm ± 2nm.

[0168] The above-mentioned membrane structure relationship is satisfied.

[0169] The optical stack consists of four layers of aluminum nitride and silicon dioxide. Aluminum nitride has a refractive index of 2.15, and silicon dioxide has a refractive index of 1.46. The high-refractive-index second layer and the low-refractive-index first layer form an optical stack with good anti-reflection properties, which helps reduce light reflectivity. The anti-reflection film exhibits good hardness and excellent optical performance under sputtering processes. The glass substrate is made of microcrystalline glass, belonging to the lithium aluminum silicon system, specifically composed of lithium silicate, lithium disilicate, and lithium feldspar crystal phases. The glass substrate has a thickness of 0.5 mm and a refractive index of 1.51.

[0170] Figure 13 This is a test image of the optical performance of the glass cover plate prepared according to Example 6 of this application, as shown. Figure 13 As shown, by setting the aforementioned stacked antireflective film in the light-transmitting area of ​​the glass cover plate, when the incident angle of light is 0°, the single-sided reflectivity in the visible light band of 400nm to 700nm can be reduced to below 1.5%, and particularly in the visible light band of 450nm to 680nm, the single-sided reflectivity is as low as below 1%. In the visible light band of 400nm to 700nm, the double-sided reflectivity in the light-transmitting area of ​​the glass cover plate can be reduced to below 5.5%, and the average transmittance in the 940nm infrared band can reach above 87%.

[0171] Through testing, the antireflective film prepared in Example 6 achieved a nanoindentation of 9 GPa, and the glass cover exhibited excellent scratch resistance, effectively preventing scratches and other appearance defects during subsequent processes.

[0172] Figure 14a This is a schematic diagram of the display device in its off-screen state when the glass cover is not fitted with an anti-reflective coating. Figure 14b This is a schematic diagram of the display device in its off-screen state after an anti-reflective coating has been applied, compared to... Figure 14a , Figure 14bWhen the display device is in a screen-off state, it can present a completely black effect, achieving the aesthetic appeal of a full-screen display.

[0173] Although this application discloses preferred embodiments as described above, it is not intended to limit the claims. Any person skilled in the art can make several possible changes and modifications without departing from the concept of this application. Therefore, the scope of protection of this application should be determined by the scope defined in the claims of this application.

Claims

1. A glass cover plate, characterized in that, The glass cover includes a glass substrate, and at least one side surface of the glass substrate is provided with an annular ink layer. The area enclosed by the ink layer includes a light-transmitting hole area, and the area of ​​the glass substrate outside the ink layer includes other areas. An anti-reflective film is provided in the light-transmitting hole area. Along the thickness direction of the glass cover, the orthographic projection edge of the anti-reflective film on the glass substrate is between the inner edge and the outer edge of the orthographic projection of the ink layer. Within the visible light band of 400nm to 700nm, the single-sided reflectivity P1% and double-sided reflectivity Q1% of the light-transmitting area of ​​the glass cover plate are 0.5≤P1≤2.5, 1≤Q1≤7; within the visible light band of 400nm to 700nm, the single-sided reflectivity P2% and double-sided reflectivity Q2% of other areas of the glass cover plate are 4.2≤P2≤5, 8.5≤Q2≤10. Within the infrared light band of 940nm±5nm, the average transmittance M1 of the light-transmitting hole area of ​​the glass cover plate is 85≤M1≤90.

2. The glass cover plate according to claim 1, characterized in that, Within the visible light band of 400nm to 700nm, the average transmittance M2 of the light-transmitting aperture area of ​​the glass cover plate is 87≤M2≤99.

3. The glass cover plate according to claim 1, characterized in that, The inner surface of the glass substrate away from the light-exposed surface is provided with the annular ink layer. The light-transmitting hole area formed by the ink layer is provided with the anti-reflective film. The anti-reflective film includes a main body, an overlapping part, and a connecting part. The main body is located inside the ink layer. The overlapping part is stacked on the surface of the ink layer. The connecting part connects the main body and the overlapping part along the inner sidewall of the ink layer.

4. The glass cover plate according to any one of claims 1 to 3, characterized in that, The thickness of the ink layer is 5μm to 100μm, and the total thickness of the antireflective film is 100nm to 1000nm.

5. The glass cover plate according to any one of claims 1 to 3, characterized in that, The antireflective coating comprises optical layers sequentially stacked from the surface of the glass substrate. The optical layers include alternating layers of a first layer with a refractive index less than 1.6, a second layer with a refractive index greater than 1.7, and an outermost layer of the antireflective coating. Furthermore, the optical layers satisfy the following relationship: n L n is the refractive index of the material of the first film layer at 550 nm. H n1 is the refractive index of the material of the second film layer at 550 nm, and n2 is the refractive index of the material of the outermost film layer at 550 nm. n ave This represents the arithmetic mean of the refractive indices of the optical stack. n i Let T be the thickness of the i-th layer, Ti be the refractive index of the i-th layer, and T be the refractive index of the i-th layer. sum denoted as the total thickness of the optical stack, and m as the total number of optical stack layers.

6. The glass cover plate according to claim 5, characterized in that, The thickness of the outermost silicon dioxide layer of the antireflective coating is 80 nm to 95 nm.

7. The glass cover plate according to claim 5, characterized in that, The first film layer with a refractive index lower than 1.6 is made of silicon dioxide or magnesium fluoride; the second film layer with a refractive index higher than 1.7 is made of at least one of titanium oxide, niobium oxide, silicon nitride, silicon oxynitride, aluminum silicon oxynitride, silicon carbide, aluminum nitride, and diamond-like carbon.

8. The glass cover plate according to claim 5, characterized in that, The antireflective coating comprises an optical stack sequentially stacked from the surface of the glass substrate. The optical stack comprises a first SiO2 layer, a first Si3N4 layer, a second SiO2 layer, a second Si3N4 layer, a third SiO2 layer, and a third Si3N4 layer. The thickness of the first SiO2 layer is 6nm ± 2nm, the thickness of the first Si3N4 layer is 13nm ± 2nm, the thickness of the second SiO2 layer is 48nm ± 2nm, the thickness of the second Si3N4 layer is 49nm ± 2nm, the thickness of the third SiO2 layer is 19nm ± 2nm, the thickness of the third Si3N4 layer is 46nm ± 2nm, and the thickness of the outermost SiO2 layer is 82nm ± 2nm.

9. The glass cover plate according to claim 5, characterized in that, The antireflective coating comprises an optical stack sequentially stacked from the surface of the glass substrate. The optical stack comprises a first SiO2 layer, a first Si3N4 layer, a second SiO2 layer, a second Si3N4 layer, a third SiO2 layer, and a third Si3N4 layer. The thickness of the first SiO2 layer is 70nm ± 2nm, the thickness of the first Si3N4 layer is 13nm ± 2nm, the thickness of the second SiO2 layer is 34nm ± 2nm, the thickness of the second Si3N4 layer is 133nm ± 2nm, the thickness of the third SiO2 layer is 15nm ± 2nm, the thickness of the third Si3N4 layer is 140nm ± 2nm, and the thickness of the outermost SiO2 layer is 90nm ± 2nm.

10. The glass cover plate according to claim 5, characterized in that, The antireflective coating comprises an optical stack sequentially stacked from the surface of the glass substrate. The optical stack comprises a first SiO2 layer, a first AlN layer, a second SiO2 layer, a second AlN layer, a third SiO2 layer, and a third AlN layer. The thickness of the first SiO2 layer is 37 nm ± 2 nm, the thickness of the first AlN layer is 5 nm ± 2 nm, the thickness of the second SiO2 layer is 7 nm ± 2 nm, the thickness of the second AlN layer is 7 nm ± 2 nm, the thickness of the third SiO2 layer is 33 nm ± 2 nm, the thickness of the third AlN layer is 103 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 86 nm ± 2 nm.

11. The glass cover plate according to claim 5, characterized in that, The antireflective coating comprises an optical stack sequentially stacked from the surface of the glass substrate. The optical stack comprises a first SiO2 layer, a first Nb2O5 layer, a second SiO2 layer, and a second Nb2O5 layer. The thickness of the first SiO2 layer is 154 nm ± 2 nm, the thickness of the first Nb2O5 layer is 11 nm ± 2 nm, the thickness of the second SiO2 layer is 32 nm ± 2 nm, the thickness of the second Nb2O5 layer is 103 nm ± 2 nm, and the thickness of the outermost SiO2 layer is 84 nm ± 2 nm.

12. The glass cover plate according to any one of claims 1 to 3, characterized in that, The glass substrate is made of glass or microcrystalline glass, and the refractive index of the glass substrate is 1.50 to 1.52; the thickness of the glass substrate is 0.4 mm to 0.6 mm.

13. The glass cover plate according to claim 12, characterized in that, The glass substrate is made of microcrystalline glass, which, by molar percentage, comprises 10%≤Li2O≤25%, 58%≤SiO2≤72%, 2%≤Al2O3≤8%, 3%≤Na2O+K2O≤7%, 2%≤P2O5+ZrO2+TiO2≤13%, 0%≤MgO+CaO+ZnO≤3%, and 0%≤B2O3≤5%.

14. A display device, characterized in that, The device includes a glass cover, a display module, and a photosensitive component. Along the thickness direction of the display module, the display module has a first surface and a second surface disposed opposite to each other. The display module is provided with at least one light-transmitting hole penetrating the first surface and the second surface. The photosensitive component is installed in the light-transmitting hole and includes a front-facing camera and / or a laser rangefinder. The reflectivity of the display device is ≤6.5% when incident at 0° from any screen position. The glass cover is disposed on the first surface of the display module, and the glass cover includes the glass cover as described in any one of claims 1 to 13, wherein the light-transmitting hole area of ​​the glass cover is disposed corresponding to the light-transmitting hole.

15. An electronic device, characterized in that, The electronic device includes the glass cover plate according to any one of claims 1 to 13 or the display device according to claim 14.

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