Dipulse confinement ion flow size screening equipment

Abstract

The invention discloses double-pulse confinement ion flow size screening equipment, which relates to the field of atomic-scale manufacturing and comprises a cathode, a filtering pipeline, a vacuum chamber, a parallel plate electrode, a coil, an electron suppression electrode, an energy adjusting electrode, a capillary tube bundle and a deposition target disc. And the parallel plate electrodes are arranged on the two sides of the electron suppression electrode and the energy regulation electrode. The coils are arranged on the two sides of the electron suppression electrode and the energy adjusting electrode. The cathode is used for generating plasma. The filtering pipeline is used for filtering plasma. The parallel plate electrode is used for generating an electric field. The coil is used for generating deflection magnetic fields. The electron suppression electrode is used for combining an electric field and a deflection magnetic field to adjust the filtered plasma to obtain single particles. The single particles are transmitted to the energy adjusting electrode through the capillary tube bundle. The energy adjusting electrode is used for adjusting the energy of the single particle by combining the electric field and the deflection magnetic field to obtain single-energy ions. The deposition target disc is used for depositing single-energy ions. According to the invention, accurate adjustment of plasma energy can be realized.

Description

Technical Field

[0001] This application relates to the field of atomic-level manufacturing, and in particular to a dual-pulse confined ion current size screening device. Background Technology

[0002] Atomic manufacturing represents the ultimate form of materials science manufacturing. However, many technical difficulties and challenges remain before the commercialization of atomic-level manufacturing can be achieved. The main challenge lies in the extreme difficulty of atomic-level manipulation. Operations at the atomic scale require extremely precise tools, but thermal vibrations, quantum effects, and environmental disturbances can easily cause atomic displacement, making it impossible to precisely control the energy of plasma.

[0003] Therefore, there is an urgent need for equipment that can solve the problem of energy control in atomic-level manufacturing technology. Summary of the Invention

[0004] The purpose of this application is to provide a dual-pulse confined ion current size screening device that can achieve precise adjustment of plasma energy.

[0005] To achieve the above objectives, this application provides the following solution: This application provides a dual-pulse confined ion current size screening device, including: a cathode, a filter channel, a vacuum chamber, a parallel plate electrode, a coil, an AC power supply, an electron suppression electrode, an energy regulation electrode, a capillary bundle, and a deposition target disk; The cathode is disposed at one end of the filter pipe; the other end of the filter pipe is connected to the vacuum chamber; the electron suppression electrode, the capillary bundle, the energy regulation electrode, and the deposition target disk are sequentially disposed within the vacuum chamber along the plasma transport direction; the parallel plate electrode and the coil are both disposed within the vacuum chamber; the parallel plate electrode is disposed on both sides of the electron suppression electrode and the energy regulation electrode; the coil is disposed on both sides of the electron suppression electrode and the energy regulation electrode; the AC power supply is connected to the coil. The cathode is used to generate plasma; the filter pipe is used to filter the plasma; the parallel plate electrode is used to generate an electric field; the AC power supply is used to provide AC current to the coil to generate a deflection magnetic field; the electron suppression electrode is used to combine the electric field and the deflection magnetic field to regulate the filtered plasma to obtain single particles; the single particles are transported to the energy regulation electrode through the capillary bundle; the energy regulation electrode is used to combine the electric field and the deflection magnetic field to regulate the energy of the single particles to obtain single-energy ions; the deposition target disk is used to deposit the single-energy ions.

[0006] In one embodiment, the dual-pulse confined ion current size screening device further includes: a suppression electrode power supply and an adjustment electrode power supply; The power supply for the suppression electrode is connected to the electronic suppression electrode; the power supply for the regulation electrode is connected to the energy regulation electrode.

[0007] In one embodiment, the dual-pulse confined ion current size screening equipment further includes: a parallel plate electrode power supply; the parallel plate electrode power supply is connected to the parallel plate electrode.

[0008] In one embodiment, the dual-pulse confined ion current size screening equipment further includes: a rotation drive shaft and a bearing; the rotation drive shaft is disposed within the vacuum chamber; The bearing is mounted on the deposition target disk; the bearing is matched with the self-rotating drive shaft to drive the deposition target disk to rotate.

[0009] In one embodiment, the power supply voltage of the suppression electrode is -200V to -500V; the power supply voltage of the adjustment electrode is -5000V to +2000V.

[0010] In one embodiment, the parallel plate electrode power supply is an AC power supply; the voltage of the parallel plate electrode power supply is -1000V to +1000V.

[0011] In one embodiment, the dual-pulse confined ion current size screening equipment further includes: a pulse power supply; coils are disposed on both sides of the filter pipe; the coils are connected to the pulse power supply; the pulse power supply is used to provide pulse voltage to the coils to generate a pulse magnetic field in the filter pipe; the pulse magnetic field is used to filter the plasma.

[0012] In one embodiment, both the electron suppression electrode and the energy regulation electrode are disk-shaped electrodes; the electron suppression electrode and the energy regulation electrode have the same size.

[0013] In one embodiment, both the electron suppression electrode and the energy regulation electrode have circular holes.

[0014] In one embodiment, the distance between the electron suppression electrode and the energy regulation electrode is 5 mm to 20 mm.

[0015] According to the specific embodiments provided in this application, this application has the following technical effects: This application provides a dual-pulse confined ion current size screening device. The plasma energy is regulated by a combination of an electron suppression electrode and an energy regulation electrode, and extracted through a capillary bundle to achieve precise regulation of the plasma energy. At the same time, single-energy ions are obtained by combining the deflection magnetic field and the electric field provided by the parallel plate electrode, and finally deposited on the deposition target disk. The single-energy ions are stably extracted to achieve high-density deposition of atomic layers. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the structure of a dual-pulse confined ion current size screening device in one embodiment of this application.

[0018] Reference numerals: 1-Cathode, 2-Filter pipe, 3-Vacuum chamber, 4-Parallel plate electrode, 5-Electron suppression electrode, 6-Energy regulation electrode, 7-Capillary bundle, 8-Deflection magnetic field, 9-Deposition target disk, 10-Rotation drive shaft, 11-Suppression electrode power supply, 12-Regulation electrode power supply, 13-Parallel plate electrode power supply. Detailed Implementation

[0019] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0020] To make the above-mentioned objectives, features and advantages of this application more apparent and understandable, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0021] In one exemplary embodiment, such as Figure 1 As shown, a dual-pulse confined ion current size screening device is provided, including: cathode 1, filter pipe 2, vacuum chamber 3, parallel plate electrode 4, coil, AC power supply, electron suppression electrode 5, energy regulation electrode 6, capillary bundle 7, and deposition target disk 9.

[0022] Cathode 1 is located at one end of filter pipe 2. The other end of filter pipe 2 is connected to vacuum chamber 3. Electron suppression electrode 5, capillary bundle 7, energy regulation electrode 6, and deposition target disk 9 are sequentially arranged in vacuum chamber 3 along the plasma transport direction. Parallel plate electrode 4 and coil are both located in vacuum chamber 3. Parallel plate electrode 4 is located on both sides of electron suppression electrode 5 and energy regulation electrode 6. Coil is located on both sides of electron suppression electrode 5 and energy regulation electrode 6. Power supply is connected to coil.

[0023] Cathode 1 is used to generate plasma. Filter pipe 2 is used to filter plasma. Parallel plate electrode 4 is used to generate an electric field. AC power supply is used to provide AC current to the coil to generate deflection magnetic field 8. Electron suppression electrode 5 is used to combine the electric field and deflection magnetic field 8 to regulate the filtered plasma, obtaining single particles. Single particles are transported through capillary bundle 7 to energy regulation electrode 6. Energy regulation electrode 6 is used to combine the electric field and deflection magnetic field 8 to regulate the energy of the single particles, obtaining single-energy ions. Deposition target disk 9 is used to deposit single-energy ions.

[0024] Both the electron suppression electrode 5 and the energy regulation electrode 6 are disc-shaped electrodes. The electron suppression electrode 5 and the energy regulation electrode 6 have the same dimensions. Both the electron suppression electrode 5 and the energy regulation electrode 6 have circular holes. The diameter of the circular holes can be 0.2~2mm, and the distance between the centers of the holes is 1~5mm. The distance between the electron suppression electrode 5 and the energy regulation electrode 6 can be 5mm~20mm. The two ends of the capillary bundle 7 are connected to the circular holes on the electron suppression electrode 5 and the energy regulation electrode 6, respectively.

[0025] In addition, the strength of the deflecting magnetic field 8 is -50 to +50 mT. The length of the capillary bundle 7 can be 10 to 100 mm, and the diameter can be 1 to 10 μm.

[0026] As an optional implementation, the dual-pulse confined ion current size screening device further includes: a suppression electrode power supply 11 and a regulating electrode power supply 12. The suppression electrode power supply 11 is connected to the electron suppression electrode 5. The regulating electrode power supply 12 is connected to the energy regulating electrode 6.

[0027] The voltage of the suppression electrode power supply 11 is -200V to -500V. The voltage of the regulating electrode power supply 12 is -5000V to +2000V.

[0028] The dual-pulse confined ion current size screening equipment also includes a parallel plate electrode power supply 13. The parallel plate electrode power supply 13 is connected to the parallel plate electrode 4. The parallel plate electrode power supply 13 is an AC power supply with a voltage of -1000V to +1000V. The parallel plate electrode 4 includes a positive electrode and a negative electrode. The electric field strength generated by the parallel plate electrode 4 is 0 to ±50V / cm.

[0029] The dual-pulse confined ion current size screening equipment also includes a rotation drive shaft 10 and bearings. The rotation drive shaft 10 is disposed within the vacuum chamber 3. The bearings are disposed on the deposition target disk 9. The bearings are matched with the rotation drive shaft 10 to drive the deposition target disk 9 to rotate. The rotation speed of the rotation drive shaft 10 can be 1~5 R / min.

[0030] The dual-pulse confined ion current size screening equipment also includes a pulse power supply. Coils are arranged on both sides of the filter pipe 2. The coils are connected to the pulse power supply. The pulse power supply provides pulse voltage to the coils to generate a pulsed magnetic field in the filter pipe 2. The pulsed magnetic field is used to filter the plasma. The direction of the pulsed magnetic field is perpendicular to the direction of plasma propagation in the filter pipe 2.

[0031] In one exemplary embodiment, the processing procedure in a dual-pulse confined ion current size screening device is described.

[0032] First, cathode 1 generates plasma through DC triggering and arc discharge. The plasma includes metal ions, electrons, neutral atoms, cluster atoms, and particles. The generated plasma enters filter pipe 2, where it is filtered by a pulsed magnetic field distributed throughout the pipe. Under the influence of the Lorentz force in the deflection magnetic field 8, the plasma is deflected towards the other end of filter pipe 2. During this deflection, neutral atoms, cluster atoms, and particles remain on the wall of filter pipe 2. Finally, the filtered plasma (including metal ions and electrons) enters vacuum chamber 3.

[0033] Inside the vacuum chamber 3, the filtered plasma is passed through an electron suppression electrode 5 located in the electric field and deflection magnetic field 8. This process regulates the filtered plasma, further homogenizes and filters the output of ion clusters, and selects low magnetic stiffness ions (i.e., single particles). The single particles are transported to the energy regulation electrode 6 through the capillary bundle 7. The energy regulation electrode 6 is also located in the cross field formed by the electric field and deflection magnetic field 8. By adjusting the energy of the single particles in combination with the electric field and deflection magnetic field 8, single-energy ions are finally obtained and extracted, and deposited on the deposition target disk 9.

[0034] By adjusting the voltage of the parallel plate electrode power supply 13, the intensity and direction of the electric field generated by the parallel plate electrode 4 can be precisely controlled, thereby achieving precise control of the plasma. Furthermore, the electric field and the deflection magnetic field 8 form a cross field, enabling more precise energy regulation. The deflection magnetic field 8 can achieve longitudinal scanning and uniform variation of the plasma, improving plasma quality. The capillary bundle 7 transports particles between the electron suppression electrode 5 and the energy regulation electrode 6, achieving more precise extraction and deposition of single-energy ions, improving the quality of ions deposited on the deposition target disk 9, and reducing the risk of sample damage from single-energy ion deposition. By setting a rotation drive shaft 10 to drive the deposition target disk 9 to rotate, uniform deposition of single-energy ions is achieved, improving sample quality.

[0035] The cross-field formed by the electric field and the deflecting magnetic field 8 can regulate the plasma velocity. , . For electric field strength, denoted as , where is the magnetic field strength.

[0036] Furthermore, the dual-pulse confined ion current size screening equipment can be connected to a host computer to control the voltage of each power supply and the rotation speed of the self-rotating drive shaft 10. The host computer can also control the plasma generation time of the cathode 1 to achieve the deposition of a single atomic layer (i.e., a single-layer single-energy ion) or multiple atomic layers (i.e., multiple-layer single-energy ion) on the deposition target disk 9. The energy of the extracted single-energy ions is ultimately 30~400 eV, and the single energy is continuously adjustable.

[0037] After energy confinement in the dual-pulse confined ion current size screening equipment, the energy dispersion of the final extracted single-energy ions does not exceed 10%, the directional dispersion does not exceed 10%, and the energy range is 30~400eV.

[0038] Compared to the packing density of films deposited on bulk materials, the dual-pulse confined ion current size screening equipment provided in this application has a single-atom layer deposition density greater than 0.99, enabling high-density deposition.

[0039] Furthermore, the dual-pulse confined ion current size screening equipment provided in this application can extract metal ion beams such as Fe, Zn, Al, and Cu, confining the energy, direction, dose, and size of the metal ion beams. The energy deviation of the extracted single-energy metal ions is <2%, the intensity is no higher than 10 nA, and the dosage is <10. 12 / cm 3 The diameter of the ions is 0.5~100mm.

[0040] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0041] This document uses specific examples to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the equipment and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. In summary, the content of this specification should not be construed as a limitation of this application.

Claims

1. A dual-pulse confined ion current size screening device, characterized in that, include: Cathode, filter pipe, vacuum chamber, parallel plate electrode, coil, AC power supply, electron suppression electrode, energy regulation electrode, capillary bundle and deposition target disk; The cathode is disposed at one end of the filter pipe; the other end of the filter pipe is connected to the vacuum chamber; the electron suppression electrode, the capillary bundle, the energy regulation electrode, and the deposition target disk are sequentially disposed within the vacuum chamber along the plasma transport direction; the parallel plate electrode and the coil are both disposed within the vacuum chamber; the parallel plate electrode is disposed on both sides of the electron suppression electrode and the energy regulation electrode; the coil is disposed on both sides of the electron suppression electrode and the energy regulation electrode; the AC power supply is connected to the coil. The cathode is used to generate plasma; the filter pipe is used to filter the plasma; the parallel plate electrode is used to generate an electric field; the AC power supply is used to provide AC current to the coil to generate a deflection magnetic field; the electron suppression electrode is used to combine the electric field and the deflection magnetic field to adjust the filtered plasma to obtain single particles. The single particle is transported to the energy regulating electrode via the capillary bundle; the energy regulating electrode is used to regulate the energy of the single particle by combining the electric field and the deflecting magnetic field to obtain a single-energy ion. The deposition target disk is used to deposit the single-energy ions.

2. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, The dual-pulse confined ion current size screening equipment also includes: a suppression electrode power supply and an adjustment electrode power supply; The power supply for the suppression electrode is connected to the electronic suppression electrode; the power supply for the regulation electrode is connected to the energy regulation electrode.

3. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, The dual-pulse confined ion current size screening equipment further includes: a parallel plate electrode power supply; the parallel plate electrode power supply is connected to the parallel plate electrode.

4. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, The dual-pulse confined ion current size screening equipment further includes: a rotation drive shaft and a bearing; the rotation drive shaft is disposed within the vacuum chamber. The bearing is mounted on the deposition target disk; the bearing is matched with the self-rotating drive shaft to drive the deposition target disk to rotate.

5. The dual-pulse confined ion current size screening equipment according to claim 2, characterized in that, The power supply voltage for the suppression electrode is -200V to -500V; the power supply voltage for the adjustment electrode is -5000V to +2000V.

6. The dual-pulse confined ion current size screening equipment according to claim 3, characterized in that, The parallel plate electrode power supply is an AC power supply; the voltage of the parallel plate electrode power supply is -1000V to +1000V.

7. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, The dual-pulse confined ion current size screening equipment further includes: a pulse power supply; coils are arranged on both sides of the filter pipe; the coils are connected to the pulse power supply; the pulse power supply is used to provide pulse voltage to the coils to generate a pulse magnetic field in the filter pipe; the pulse magnetic field is used to filter the plasma.

8. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, Both the electron suppression electrode and the energy regulation electrode are disk-shaped electrodes; the electron suppression electrode and the energy regulation electrode have the same size.

9. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, Both the electron suppression electrode and the energy regulation electrode have circular holes.

10. The dual-pulse confined ion current size screening equipment according to claim 1, characterized in that, The distance between the electron suppression electrode and the energy regulation electrode is 5mm to 20mm.

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