SLM high-temperature alloy component and high-infrared-emissivity aging oxidation sequential preparation method thereof

Abstract

The invention discloses a high-infrared-emissivity aging oxidation sequential preparation method for an SLM high-temperature alloy component, and belongs to the technical field of additive high-temperature alloy surface treatment. In order to solve the problem that an SLM high-temperature alloy thin-wall complex component is prone to cracking in the aerobic aging process, the high-infrared-emissivity aging oxidation sequential preparation method of the SLM high-temperature alloy component is innovatively provided. According to the method, based on the SLM high-temperature alloy medium-temperature embrittlement rule, the high-infrared-emissivity aging and oxidation sequential regulation and control technology is overcome by accurately controlling the temperature, time and other key parameters of aging and oxidation, the asynchronous effect of aging phase transformation stress and grain boundary damage in time and space is achieved, and the stability of the aging phase transformation stress and the grain boundary damage is improved. And the cracking risk of the SLM high-temperature alloy component in the aerobic aging process is remarkably reduced. The room-temperature infrared emissivity of the SLM high-temperature alloy component prepared through the method is larger than or equal to 0.75, the infrared emissivity at the temperature of 1000 DEG C is larger than or equal to 0.8, and the room-temperature mechanical property is not lower than 95% in the vacuum aging state.

Description

Technical Field

[0001] This invention relates to SLM (Selective Laser Melting) high-temperature alloy components and a method for preparing high infrared emissivity aging oxidation sequence, belonging to the field of high-temperature alloy surface treatment technology. Background Technology

[0002] With the continuous increase in the flight speed of new-generation aerospace vehicles, their surface temperatures due to aerodynamic friction can reach 800-900℃, and even approach 1000℃ in some windward areas, placing higher demands on the temperature resistance and mechanical properties of structural materials. Nickel-based superalloys, due to their excellent high-temperature strength, oxidation resistance, and good machinability, have become ideal materials for key components of high-speed aircraft. Selective laser melting (SLM) technology has advantages such as high forming accuracy, good part density, and the ability to directly manufacture complex structures, and has become a key forming method for manufacturing irregularly shaped and lightweight components.

[0003] Aerospace thermal protection systems typically consist of a surface coating with high infrared emissivity and an internal low thermal conductivity insulation material. The internal low thermal conductivity insulation material prevents heat transfer into the spacecraft, while the surface coating with high infrared emissivity dissipates heat to the external environment through radiation. Spacecraft components made of high-temperature alloys are often used in high-temperature environments; therefore, their surface infrared emissivity is crucial for their high-temperature service life. Currently, high infrared emissivity composite coatings made of metal oxides or minerals are commonly used as novel thermal protection materials, applied to the surface of metal alloys to improve infrared emissivity. Oxygen aging is one of the main methods for preparing high infrared emissivity metal oxide coatings for SLM (Superconducting Laminate) high-temperature alloys, as this method can balance infrared emissivity and bulk properties. However, in actual production, the oxygen aging method still carries a risk of cracking when preparing SLM components, failing to meet production requirements. The fundamental reasons for this include the following three aspects:

[0004] (1) SLM nickel-based superalloys exhibit more severe intermediate-temperature embrittlement. Intermediate-temperature embrittlement refers to the significant embrittlement of superalloys in the temperature range of 700 to 900℃, characterized by significantly lower elongation and reduction of area compared to the low-temperature (≤700℃) and high-temperature (≥900℃) ranges. Related research findings (Reference 1: Xiao-An.Hu, et al., Microstructure and mechanical behavior of Inconel 625 alloy processed by selective laser melting at high temperature up to 1000℃, Rare Metals 39(10)(2019)1181-1189. Reference 2: Kyu-Sik Kim, et al. High-temperature tensile and high cycle fatigue properties of Inconel 625 alloy manufactured by laser powder bed fusion, Additive Manufacturing 35(2020). Reference 3: Tait D.McLouth, et al. Temperature and strain-rate dependence of the elevated temperature ductility of Inconel 718 prepared by selective laser melting, Materials Science and Engineering: A824(2021).) indicate that SLM high-temperature alloys exhibit more significant mid-temperature embrittlement and lower plasticity.

[0005] (2) The presence of oxygen accelerates the intermediate-temperature embrittlement of high-temperature alloys. Reference 4 (Qian Zhou, et al. The grain boundary brittleness at intermediate temperature in a precipitation strengthened Ni-based polycrystalline alloy. Acta Materialia 285 (2025).) reveals that the intermediate-temperature embrittlement of high-temperature alloys is mainly caused by oxidation-accelerated grain boundary fracture.

[0006] (3) The effect of phase transformation stress generated during the aging process of SLM high-temperature alloy components. During the aging process, due to the precipitation of γ' phase and carbides, and the constraint of the structure, significant phase transformation stress is generated inside the component, which is one of the main driving forces for oxygen-induced aging cracking of high-temperature alloys.

[0007] Oxygen-induced aging is an aging phase transformation process carried out in an oxygen-rich environment within the intermediate temperature range of embrittlement. During this process, large-sized, thin-walled superalloy components are highly susceptible to cracking. Therefore, providing a sequential aging oxidation method for SLM superalloy components with high infrared emissivity that can avoid cracking is a technical problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0008] The technical problem solved by the present invention is to overcome the shortcomings of the prior art and provide a sequential aging oxidation preparation method for SLM high-temperature alloy components with high infrared emissivity, thereby reducing the risk of cracking of SLM high-temperature alloy components during oxygen aging.

[0009] The technical solution of this invention is:

[0010] This invention discloses a method for preparing high infrared emissivity SLM high-temperature alloy components through a sequential aging oxidation process, comprising:

[0011] The SLM high-temperature alloy components were placed in a heat treatment furnace for vacuum high-temperature aging treatment.

[0012] After the vacuum high-temperature aging treatment is completed, all additive supports of the SLM high-temperature alloy component are removed, and then the SLM high-temperature alloy component with the supports removed is sandblasted.

[0013] The sandblasted SLM high-temperature alloy components are placed in a heat treatment furnace and oxygen-enriched gas is introduced for low-temperature oxidation treatment.

[0014] Furthermore, in the above method, the SLM high-temperature alloy is GH4099 high-temperature alloy or GH4251 high-temperature alloy.

[0015] Furthermore, in the above method, before the vacuum high-temperature aging treatment operation, the SLM high-temperature alloy component has undergone low-temperature stress-relieving annealing and high-temperature solution treatment.

[0016] Furthermore, in the above method, the low-temperature stress-relief annealing treatment has an annealing temperature range of 500–550°C and a holding time of 2–3 hours.

[0017] Furthermore, in the above method, the high-temperature solution treatment of the GH4099 high-temperature alloy involves a solution temperature range of 1050–1150°C and a holding time of 2–3 hours.

[0018] Furthermore, in the above method, the high-temperature solution treatment of the GH4251 high-temperature alloy involves a solution temperature range of 1100–1150°C and a holding time of 3–4 hours.

[0019] Furthermore, in the above method, the high-temperature aging process parameters for the vacuum high-temperature aging treatment of the GH4099 high-temperature alloy are: a temperature range of 750–850°C and a holding time of 5–6 hours.

[0020] Furthermore, in the above method, the high-temperature aging process parameters for the GH4251 high-temperature alloy in the vacuum high-temperature aging treatment are: a temperature range of 750–850°C and a holding time of 15–20 hours.

[0021] Furthermore, in the above method, the vacuum high-temperature aging treatment involves a furnace vacuum degree ranging from 5 to 10 × 10⁻⁶. -4 Torr, with a heating rate of 5°C / minute.

[0022] Furthermore, in the above method, the low-temperature oxidation treatment, the low-temperature oxidation process parameters for the GH4099 high-temperature alloy and the GH4251 high-temperature alloy are: a temperature range of 600-700℃ and an oxidation time of 6-8 hours.

[0023] Furthermore, in the above method, the SLM high-temperature alloy components after low-temperature oxidation treatment are subjected to defect detection, infrared radiation performance testing, and mechanical property testing. The specific testing items are as follows:

[0024] Defect detection, including: detection of cracks, spots, and oxide layer peeling;

[0025] Infrared radiation performance testing includes: infrared emissivity, oxide layer thickness, oxide layer morphology, oxide phase analysis, and detection of weight gain after oxidation;

[0026] Mechanical property testing involves testing the tensile properties of SLM high-temperature alloy components after oxidation, including tensile strength, yield strength, and elongation after fracture.

[0027] This invention discloses an SLM high-temperature alloy component, which is prepared by a high infrared emissivity aging oxidation sequential preparation method for SLM high-temperature alloy components.

[0028] Furthermore, in the above-mentioned SLM high-temperature alloy components, the surface of the component has an oxide film, which is a metal mineral or oxide; the thickness of the oxide film is 15μm to 50μm.

[0029] The infrared radiation performance of the component is: infrared emissivity ≥ 0.75;

[0030] The room temperature mechanical properties of the oxidized component are not less than 95% of those of the vacuum-aged component.

[0031] The advantages of this invention over the prior art are as follows:

[0032] (1) This invention addresses the problem of cracking in thin-walled complex SLM high-temperature alloy components during oxygen aging by proposing a high-infrared emissivity aging oxidation sequence preparation method for SLM high-temperature alloy components. Based on the mid-temperature embrittlement law of SLM high-temperature alloys, this method overcomes the high-infrared emissivity aging oxidation sequence control technology by precisely controlling key parameters such as the temperature and time of aging and oxidation. This achieves spatiotemporal asynchrony between aging phase transformation stress and grain boundary damage, effectively reducing the risk of cracking in SLM high-temperature alloy components during the oxidation process.

[0033] (2) This invention proposes a high-infrared emissivity aging oxidation sequential process for SLM high-temperature alloy components, achieving successful fabrication of components with a diameter of ≥1000mm; it also develops a high-infrared emissivity aging oxidation sequential control technology for SLM high-temperature alloy components, realizing precise spatiotemporal control of aging stress and interface (such as grain boundaries) damage; and effectively solves the cracking problem of ultra-thin-walled SLM components during oxygen aging, achieving a pass rate of over 90%. This process is simple to operate and suitable for engineering applications of high-performance complex components in aerospace and other fields.

[0034] (3) This invention reveals the influence of heat treatment temperature on the plasticity of SLM-formed high-temperature alloys: in the medium temperature range (700-900℃), the plasticity of SLM-formed high-temperature alloys is significantly lower than that in the low temperature range (≤700℃) and the high temperature range (900℃). Based on the optimization of aging heat treatment, an optimal oxidation temperature window of 600-700℃ is innovatively proposed: this temperature range can avoid excessive damage to the aging strengthening effect and prevent cracking during the oxidation process, forming an optimal combination with solution treatment and aging treatment, achieving a good balance between strength, plasticity and infrared emissivity.

[0035] (4) The process proposed in this invention achieves spatiotemporal asynchrony between aging phase transformation stress and grain boundary damage, significantly improving the cracking tendency of SLM high-temperature alloy components and increasing the component qualification rate. In addition, the process is simple, easy to operate, and easy to realize large-scale production.

[0036] (5) The SLM high-temperature alloy components prepared by this invention have an infrared emissivity of ≥0.75 at room temperature, an infrared emissivity of ≥0.8 at 1000℃, and mechanical properties at room temperature not lower than 95% of those in the vacuum-aged state. Attached Figure Description

[0037] Figure 1 This is a flowchart of the high infrared emissivity aging oxidation process for SLM high-temperature alloy components according to the present invention.

[0038] Figure 2 Here is a SEM image of the oxide of the SLM-GH4099 high-temperature alloy sample prepared in Example 1 of this invention;

[0039] Figure 3 The image shows the XRD pattern of the SLM-GH4099 high-temperature alloy oxide prepared in Example 1 of this invention.

[0040] Figure 4 The image shows the thickness analysis of the SLM-GH4099 high-temperature alloy oxide prepared in Example 1 of this invention. Detailed Implementation

[0041] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0042] like Figure 1 As shown, a method for preparing high infrared emissivity SLM high-temperature alloy components by aging oxidation sequence is characterized by comprising the following steps:

[0043] S1. High-temperature aging treatment: The SLM high-temperature alloy component is placed in a heat treatment furnace for vacuum high-temperature aging treatment.

[0044] S2. Post-aging treatment: After aging, remove all additive supports from the SLM high-temperature alloy components. Then, sandblast the unsupported components.

[0045] S3. Low-temperature oxidation treatment: Place the sandblasted SLM high-temperature alloy component in a heat treatment furnace, introduce air or oxygen-enriched gas, and perform low-temperature oxidation treatment.

[0046] S4. Quality Inspection: The components after oxidation treatment are inspected for defects, infrared emissivity, and mechanical properties.

[0047] Furthermore, the SLM high-temperature alloy mentioned in step S1 is GH4099 or GH4251 alloy.

[0048] Furthermore, the SLM high-temperature alloy component described in S1 has undergone low-temperature stress-relief annealing and high-temperature solution treatment.

[0049] The low-temperature stress-relief annealing temperature is 500-550℃, and the holding time is 2-3 hours.

[0050] The high-temperature solution treatment temperature of the GH4099 high-temperature alloy is 1050-1150℃, and the holding time is 2-3 hours.

[0051] The high-temperature solution treatment temperature of the GH4251 high-temperature alloy is 1100-1150℃, and the holding time is 3-4 hours.

[0052] The aging process parameters for the GH4099 high-temperature alloy in step S2 are: temperature 750~850℃, holding time 5~6 hours.

[0053] The aging process parameters for the GH4251 high-temperature alloy in step S2 are: temperature 750~850℃, holding time 15~20 hours.

[0054] The low-temperature oxidation process parameters for the GH4099 high-temperature alloy in step S3 are: temperature 600~700℃, oxidation time 6~8 hours.

[0055] The low-temperature oxidation process parameters for the GH4251 high-temperature alloy in step S3 are: temperature 600~700℃, holding time 6~8 hours.

[0056] In step S4, the defect detection includes cracks, spots, and oxide layer peeling; the infrared radiation performance detection includes infrared emissivity, oxide layer thickness, oxide layer morphology, oxide phase analysis, and weight gain after oxidation; the mechanical property detection includes the tensile properties of the component after oxidation; the tensile properties include tensile strength, yield strength, and elongation after fracture.

[0057] The present invention also provides an SLM high-temperature alloy component prepared by the above preparation method, the surface of which has an oxide film formed by the high-temperature alloy itself, the oxide film being a metal mineral or oxide; the infrared emissivity of the high-temperature alloy is not less than 0.75, and the room temperature mechanical properties in the oxidized state are not less than 95% of those in the vacuum-aged state.

[0058] The thickness of the oxide film is 15 μm to 50 μm.

[0059] Example 1: A sequential aging oxidation method for preparing SLM-GH4099 high-temperature alloy components with high infrared emissivity (low-temperature oxidation)

[0060] GH4099 is an age-hardening nickel-based superalloy, with the γ′ phase (γ′-Ni3(Al,Ti)) as its main strengthening phase. Through the coupled effect of precipitation strengthening of the high-density γ′ phase and solid solution strengthening by elements such as W, Mo, and Co, GH4099 can be stably used at 800–900℃, with a maximum operating temperature exceeding 1000℃. The main heat treatment process for GH4099 is solution treatment followed by aging, typically carried out under vacuum.

[0061] In this embodiment, the part requiring aging oxidation is a GH4099 high-temperature alloy component manufactured by SLM, with a large area wall thickness of only 1 mm. The performance characteristics of the part to be considered are mainly divided into mechanical properties after oxidation and infrared radiation properties. The mechanical properties after oxidation include room temperature (approximately 25°C) and high-temperature tensile properties (yield strength, tensile strength, elongation) at 900°C, requiring its mechanical properties to be no less than 95% of those of the vacuum solution-aged state. Specific product requirements are shown in Tables 1 and 2.

[0062] Table 1 Mechanical property requirements of GH4099 high-temperature alloy in the aging oxidation sequence state.

[0063]

[0064] Table 2 Infrared emissivity requirements for GH4099 high-temperature alloy in the aging oxidation sequence state.

[0065]

[0066] According to the technical solution provided by the present invention, the specific steps in this embodiment are as follows:

[0067] (1) Place the solution-treated SLM-GH4099 high-temperature alloy component in a heat treatment furnace and evacuate the furnace until the vacuum level reaches 5 to 10 × 10⁻⁶. ～4 Torr. Then, the furnace temperature is raised to 750-850℃ at a heating rate of 5℃ / min, held for 5-6 hours, and subjected to aging treatment;

[0068] (2) After vacuum aging is completed, remove all supports required for the SLM-GH4099 high-temperature alloy component in the SLM additive manufacturing stage, and sandblast the unsupported component.

[0069] (3) Place the sandblasted SLM-GH4099 high-temperature alloy component in a heat treatment furnace, introduce air or oxygen-enriched gas, and then raise the furnace temperature to 600-700℃ at a heating rate of 5℃ / min, hold for 6-8 hours, and carry out low-temperature oxidation treatment.

[0070] (4) The SLM-GH4099 high-temperature alloy components after oxidation treatment were tested for X-ray, fluorescence, infrared emissivity, mechanical properties and other items.

[0071] The results are as follows Figure 2 , Figure 3 and Figure 4 As shown.

[0072] Comparative Example 1: A sequential aging oxidation method for preparing SLM-GH4099 high-temperature alloy components with high infrared emissivity (high-temperature oxidation)

[0073] The material properties, product mechanical properties, and infrared emissivity requirements are the same as in Example 1.

[0074] The specific steps in this comparative example are as follows:

[0075] (1) Place the solution-treated SLM-GH4099 high-temperature alloy component in a heat treatment furnace and evacuate the furnace until the vacuum level reaches 5~10×10 -4 Torr. Then, the furnace temperature is raised to 750-850℃ at a heating rate of 5℃ / min, and held for 5-6 hours for aging treatment;

[0076] (2) After vacuum aging is completed, remove all supports required for the SLM-GH4099 high-temperature alloy component in the SLM additive manufacturing stage, and sandblast the component after support removal.

[0077] (3) Place the sandblasted SLM-GH4099 high-temperature alloy component in a heat treatment furnace, introduce air or oxygen-enriched gas, and then raise the furnace temperature to 850-950℃ at a heating rate of 5℃ / min, hold for 6-8 hours, and carry out high-temperature oxidation treatment.

[0078] (4) The SLM-GH4099 high-temperature alloy components after oxidation treatment were tested for X-ray, fluorescence, infrared emissivity, mechanical properties and other items.

[0079] Table 3. Comparison of application effects of SLM-GH4099 high-temperature alloy in Example 1 and Comparative Example 1

[0080]

[0081]

[0082] Example 2: A method for preparing high-infrared emissivity SLM-GH4251 high-temperature alloy components through a sequential aging oxidation process (low-temperature oxidation)

[0083] GH4251 high-temperature alloy is one of the most widely used high-temperature alloy materials in the aerospace field. It is a highly alloyed nickel-based aging alloy, and its high Al and Ti content is conducive to the formation of high-density age-hardening phases. At the same time, the added Co, W, and Mo elements provide solid solution strengthening. The maximum service temperature of GH4251 high-temperature alloy can reach 1000℃, and its main heat treatment regime is solution treatment followed by aging treatment, usually carried out in a vacuum environment.

[0084] In this embodiment, the part requiring aging oxidation is a GH4251 high-temperature alloy component manufactured by SLM, with a large-area wall thickness of 1.5 mm. The key performance characteristics to be considered for the part include its mechanical properties after oxidation and its infrared radiation properties. The mechanical properties after oxidation include high-temperature tensile properties (yield strength, tensile strength, and elongation) at room temperature (approximately 25°C), 900°C, and 1000°C, requiring that its mechanical properties be no less than 95% of those in the vacuum solution-aged state. Specific product requirements are shown in Tables 4 and 5.

[0085] Table 4 Mechanical property requirements for GH4251 high-temperature alloy in the aging oxidation sequence state

[0086]

[0087]

[0088] Table 5 Infrared emissivity requirements for GH4251 high-temperature alloy in the aging oxidation sequence state.

[0089]

[0090] According to the technical solution provided by the present invention, the specific steps in this embodiment are as follows:

[0091] (1) Place the solution-treated SLM-GH4251 high-temperature alloy component in a heat treatment furnace and evacuate the furnace until the vacuum level reaches 5~10×10 -4 Torr. Then, the furnace temperature is raised to 750-850℃ at a heating rate of 5℃ / min, held for 15-20 hours, and then cooled with the furnace to complete the aging treatment;

[0092] (2) After vacuum aging is completed, remove all supports required for the SLM-GH4251 high-temperature alloy component in the SLM additive manufacturing stage, and sandblast the component after support removal.

[0093] (3) Place the sandblasted SLM-GH4251 high-temperature alloy component in a heat treatment furnace, introduce air or oxygen-enriched gas, and then raise the furnace temperature to 600-700℃ at a heating rate of 5℃ / min, hold for 6-8 hours, and cool with the furnace to complete the low-temperature oxidation treatment.

[0094] (4) The SLM-GH4251 high-temperature alloy components after oxidation treatment were tested for X-ray, fluorescence, infrared emissivity, mechanical properties and other items.

[0095] Comparative Example 2: A sequential aging oxidation method for preparing SLM-GH4251 high-temperature alloy components with high infrared emissivity (high-temperature oxidation)

[0096] The material properties, product mechanical properties, and infrared emissivity requirements are the same as in Example 2.

[0097] The specific steps for this comparison are as follows:

[0098] (1) Place the solution-treated SLM-GH4251 high-temperature alloy component in a heat treatment furnace and evacuate the furnace until the vacuum level reaches 5~10×10 -4 Torr. Then, the furnace temperature is raised to 750-850℃ at a heating rate of 5℃ / min, held for 15-20 hours, and then cooled with the furnace to complete the aging treatment;

[0099] (2) After vacuum aging is completed, remove all supports required for the SLM-GH4251 high-temperature alloy component in the SLM additive manufacturing stage, and sandblast the component after support removal.

[0100] (3) Place the sandblasted SLM-GH4251 high-temperature alloy component in a heat treatment furnace, introduce air or oxygen-enriched gas, and then raise the furnace temperature to 850-950℃ at a heating rate of 5℃ / min, hold for 6-8 hours, and cool with the furnace to complete the high-temperature oxidation treatment.

[0101] (4) The SLM-GH4251 high-temperature alloy components after oxidation treatment were tested for X-ray, fluorescence, infrared emissivity, mechanical properties and other items.

[0102] Table 6 Comparison of the application effects of SLM-GH4251 high-temperature alloy in Example 2 and Comparative Example 2

[0103]

[0104]

[0105] Although the present invention has been described in detail through the preferred embodiments above, it should be understood that the above description should not be considered as a limitation of the present invention. Various modifications and substitutions to the present invention will be apparent to those skilled in the art after reading the above description. Therefore, the scope of protection of the present invention should be defined by the appended claims.

[0106] The contents not described in detail in this specification are common knowledge to those skilled in the art.

Claims

1. A method for the high temperature alloy component high infrared emissivity aging oxidation sequence preparation of SLM, characterized in that, The method comprises the steps of: placing the SLM superalloy component in a heat treatment furnace for vacuum high-temperature aging treatment; after the vacuum high-temperature aging treatment is completed, removing all additive supports of the SLM superalloy component, and then performing sand blasting treatment on the SLM superalloy component after the supports are removed; placing the SLM superalloy component after the sand blasting in a heat treatment furnace, introducing oxygen-rich gas, and performing low-temperature oxidation treatment.

2. The method for preparing high infrared emissivity SLM high-temperature alloy components by aging oxidation sequence according to claim 1, characterized in that: The SLM superalloy is GH4099 superalloy or GH4251 superalloy.

3. The method of claim 2, wherein the method further comprises: Before the vacuum high-temperature aging treatment operation, low-temperature stress relief annealing treatment and high-temperature solid solution treatment of the SLM superalloy component have been completed.

4. The method of claim 3, wherein the SLM high temperature alloy component is aged at a temperature of 900-1200°C for 1-100 hours. The low-temperature stress relief annealing treatment has an annealing temperature range of 500-550 DEG C and a holding time of 2-3 hours.

5. The method of claim 3, wherein the method further comprises the step of: The high-temperature solid solution treatment has a solid solution temperature range of 1050-1150 DEG C for the GH4099 superalloy and a holding time of 2-3 hours. ​ 6. The method of claim 3, wherein the method further comprises: The high-temperature solid solution treatment has a solid solution temperature range of 1100-1150 DEG C for the GH4251 superalloy and a holding time of 3-4 hours.

7. The method of claim 2, wherein the method further comprises the step of: The vacuum high-temperature aging treatment has a high-temperature aging process parameter of a temperature range of 750-850 DEG C and a holding time of 5-6 hours for the GH4099 superalloy. ​ 8. The method of claim 2, wherein the method further comprises the step of: The vacuum high-temperature aging treatment has a high-temperature aging process parameter of a temperature range of 750-850 DEG C and a holding time of 15-20 hours for the GH4251 superalloy. ​ 9. The method of claim 1, wherein the method is a time-oxidation-aging sequence for producing a SLM superalloy component with a high infrared emissivity, and wherein the method further comprises: The vacuum high-temperature aging treatment is carried out in a heat treatment furnace with a vacuum degree of 5-10x10 -4 Torr and a temperature rising rate of 5°C / min. ​ 10. The method of claim 2, wherein the method is a time-oxidation-aging sequence for producing a SLM superalloy component having a high infrared emissivity, and wherein the method further comprises: The low-temperature oxidation treatment has a low-temperature oxidation process parameter of a temperature range of 600-700 DEG C and an oxidation time of 6-8 hours for the GH4099 superalloy and the GH4251 superalloy. ​ 11. The method according to any one of claims 1 to 10, wherein the method is a high-temperature alloy component high-infrared emissivity aging oxidation process method, characterized in that, The SLM superalloy component after the low-temperature oxidation treatment is subjected to defect detection, infrared radiation performance detection, and mechanical property detection, and the detection items are specifically: The defect detection includes detection of cracks, spots, and oxidation layer shedding. The infrared radiation performance detection includes detection of infrared emissivity, oxidation layer thickness, oxidation layer morphology, oxidation phase analysis, and weight gain after oxidation. The mechanical property detection is tensile property detection of the SLM superalloy component after oxidation, including detection of tensile strength, yield strength, and elongation after fracture.

12. An SLM superalloy component, characterized in that, A SLM superalloy component is prepared by the method of any one of claims 1-10.

13. The SLM superalloy component according to claim 12, characterized in that: the component surface has an oxidation film which is a metallic mineral or an oxide, and the thickness of the oxidation film is 15-50 μm; the infrared radiation performance of the component is that the infrared emissivity is greater than or equal to 0.75; and the mechanical property of the component in the oxidized state at room temperature is not less than 95% of that in the vacuum aged state.

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