Base station, cleaning equipment and control method of cleaning equipment

Abstract

The invention discloses a base station, cleaning equipment and a control method of the cleaning equipment. The base station comprises a main body, a clear water tank and an air suction and exhaust device. The clean water tank is arranged on the main body, a pressure-resistant area is arranged in the clean water tank, and the pressure-resistant area comprises an air inlet and a water outlet; the air suction and exhaust device comprises an exhaust port, and the exhaust port is communicated with the air inlet through a pipeline so as to be at least used for applying positive pressure to the pressure-resistant area. According to the base station, the cleaning equipment and the control method of the cleaning equipment, at least the problem that in the prior art, in the process that positive pressure is adopted for supplying water to the main machine for the clean water tank on the base station, the clean water tank is prone to deformation can be solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of cleaning, in particular to a base station, a cleaning device and a control method of the cleaning device. BACKGROUND

[0002] In the prior art, the water tank on the base station is usually supplied with water by applying positive pressure to the main machine. However, in this process, the water tank on the base station is a single cavity, and when the positive pressure is applied, the water tank may have uneven pressure distribution, no pressure buffer release, and pressure imbalance with the outside atmosphere, which may cause the water tank on the base station to deform. SUMMARY

[0003] The main purpose of the present application is to provide a base station, a cleaning device and a control method of the cleaning device, which at least solves the problem that the water tank on the base station is prone to deformation in the process of supplying water to the main machine by applying positive pressure to the water tank in the prior art.

[0004] According to a first aspect of the present application, a base station is provided, comprising:

[0005] a main body;

[0006] a water tank, the water tank being arranged on the main body, the water tank being provided with a pressure-resistant area, the pressure-resistant area comprising an air inlet and a water outlet;

[0007] an air extraction device, the air extraction device comprising an air outlet, the air outlet being in communication with the air inlet through a pipeline for at least applying positive pressure to the pressure-resistant area.

[0008] Further, the water tank further comprises an atmospheric pressure area, the atmospheric pressure area being used for water replenishment to the pressure-resistant area.

[0009] Further, a flow passage is arranged between the atmospheric pressure area and the pressure-resistant area, and a first control valve is arranged in the flow passage.

[0010] Further, the first control valve comprises a one-way valve, the one-way valve being configured to be conductive in the direction from the atmospheric pressure area to the pressure-resistant area.

[0011] Further, the base station further comprises a second control valve, the second control valve being arranged between the air extraction device and the water tank, and the second control valve having a first state in which the air inlet and the air outlet are conductive, and the second control valve having a second state in which the air inlet and the outside atmosphere are conductive.

[0012] Further, the second control valve comprises a first valve port, a second valve port and a third valve port, the first valve port is communicated with the exhaust port through a pipeline, the second valve port is communicated with the air inlet through a pipeline, and the third valve port is communicated with the external atmosphere through a pipeline.

[0013] When the first valve port and the second valve port are communicated, the second control valve is in the first state, and when the second valve port and the third valve port are communicated, the second control valve is in the second state.

[0014] Further, the bottom of the clean water tank is provided with a detachable accommodating part, and the pressure-resistant area is arranged in the accommodating part.

[0015] Further, the air exhaust device further comprises an air inlet, and the base station comprises:

[0016] The sewage tank is provided with an air outlet, and the air inlet is communicated with the air outlet through a pipeline to at least exhaust negative pressure to the sewage tank.

[0017] Further, the sewage tank further comprises a sewage inlet, and the sewage tank is provided with a sewage storage cavity and a sewage guide pipe, the sewage guide pipe is located in the sewage storage cavity and extends along the height direction of the sewage tank, and one end of the sewage guide pipe is communicated with the sewage inlet.

[0018] According to a second aspect of the present application, a cleaning device is provided, which comprises a main machine and the above-mentioned base station, and the clean water tank on the base station is used to at least supply water to the water storage tank on the main machine or directly supply water to the mop on the main machine.

[0019] According to a third aspect of the present application, a control method of a cleaning device is provided, which is used to control the above-mentioned cleaning device, the cleaning device comprises a water supply and sewage extraction mode, the water supply and sewage extraction mode comprises replenishing water to the water storage tank of the main machine or directly supplying water to the mop for self-cleaning of the mop, and extracting sewage, and the control method of the cleaning device comprises:

[0020] S1: When it is needed to replenish water to the water storage tank of the main machine or directly supply water to the mop, it is detected whether there is water in the clean water tank and whether the sewage in the sewage tank on the base station reaches a predetermined water level;

[0021] If there is water in the clean water tank and the sewage in the sewage tank does not reach the predetermined water level, a water supply and sewage extraction operation is performed;

[0022] If there is no water in the clean water tank and the sewage in the sewage tank reaches the predetermined water level, water is first added to the clean water tank and the sewage in the sewage tank is first emptied, and then the water supply and sewage extraction operation is performed.

[0023] If there is no water in the clean water tank and the sewage in the sewage tank does not reach the predetermined water level, water is first added to the clean water tank, and then the water supply and sewage pumping operation is performed;

[0024] If there is water in the clean water tank and the sewage in the sewage tank reaches the predetermined water level, the sewage in the sewage tank is first emptied, and then the water supply and sewage pumping operation is performed.

[0025] Further, in the water supply and sewage pumping operation, the steps of:

[0026] S21: Inflating the pressure-resistant area in the clean water tank to supply water to the water storage tank of the main machine or directly to the mop for self-cleaning of the mop, and detecting in real time whether there is water in the pressure-resistant area, and when it is detected that there is no water in the pressure-resistant area, controlling the water supply and sewage pumping operation to stop;

[0027] S22: After the water supply and sewage pumping operation stops, controlling the normal pressure area in the clean water tank to supplement water to the pressure-resistant area until the water in the pressure-resistant area is full, repeating steps S21 and S22 until the water in the water storage tank of the main machine is full or the mop completes self-cleaning.

[0028] In the present application, a pressure-resistant area is provided in the clean water tank on the base station, and when the clean water tank on the base station needs to supply water to the main machine (including directly supplying water to the water storage tank of the main machine or directly supplying water to the mop for self-cleaning of the mop), the exhaust port and the air inlet of the exhaust device are connected by a pipeline to at least apply positive pressure to the pressure-resistant area. By such arrangement, the pressure-resistant area serves as an independent pressure-bearing unit, limiting all pressure-related operations within it, while the other areas of the clean water tank only bear the function of water storage and do not directly bear pressure, avoiding the risk of deformation of the clean water tank during water supply, and ensuring the structural integrity of the clean water tank. BRIEF DESCRIPTION OF DRAWINGS

[0029] The drawings described herein are used to provide further understanding of the present application, and form a part of the present application. The illustrative embodiments of the present application and their descriptions serve to explain the present application, and do not constitute an improper limitation on the present application. In the drawings:

[0030] Figure 1 The water supply and sewage pumping flowchart of the base station disclosed in the embodiments of the present application;

[0031] Figure 2 The flowchart of the control method of the cleaning device disclosed in the embodiments of the present application;

[0032] Figure 3 The control logic diagram of the cleaning device performing the water supply and sewage pumping operation disclosed in the embodiments of the present application.

[0033] wherein the above figures include the following reference signs:

[0034] 100, base station; 10, main body; 20, clean water tank; 21, pressure-resistant area; 211, air inlet; 212, water outlet; 22, normal-pressure area; 23, accommodating portion; 30, air-exhaust device; 31, air outlet; 32, air inlet; 40, first control valve; 50, second control valve; 51, first valve port; 52, second valve port; 53, third valve port; 60, sewage tank; 61, air outlet; 62, sewage inlet; 63, sewage guide pipe; 70, air guide pipe; 80, water outlet pipe; 90, air suction pipe. DETAILED DESCRIPTION

[0035] It should be noted that the embodiments and features of the embodiments in the present application can be combined with each other without conflict. The present application will be described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.

[0036] It should be noted that the terms used herein are only intended to describe specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise, and it should be further understood that the terms "comprise" and / or "include" when used in this specification, specify the presence of stated features, steps, operations, devices, components and / or combinations thereof.

[0037] The relative arrangement of the components and steps, numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present application unless otherwise specifically stated. At the same time, it should be understood that the sizes of the various parts shown in the drawings are not drawn in accordance with the actual proportional relationship for the convenience of description. The techniques, methods and devices known to those skilled in the relevant art can not be discussed in detail, but should be considered as part of the authorized specification where appropriate. In all examples shown and discussed herein, any specific value should be interpreted as merely exemplary and not as a limitation. Therefore, other examples of exemplary embodiments can have different values. It should be noted that similar reference signs and letters represent similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0038] As mentioned in the background, in the prior art, the water tank on the base station is usually supplied with water by applying positive pressure on the base station. However, in this process, the water tank on the base station is a single cavity, and when the positive pressure is applied, the water tank may have uneven pressure distribution, no pressure buffer release, and pressure imbalance with the outside atmosphere, which may cause the water tank on the base station to deform. Therefore, the present application provides a base station which can at least solve the problem that the water tank on the base station is easily deformed in the process of supplying water to the host by applying positive pressure on the water tank in the prior art. The base station of the present application will be described in detail below with reference to the accompanying drawings.

[0039] As shown in Figures 1 to 3 According to an embodiment of the present application, a base station 100 is provided, which comprises a main body 10, a water tank 20, and an air extraction device 30.

[0040] Specifically, the water tank 20 is arranged on the main body 10, and the water tank 20 is provided with a pressure-resistant area 21, which comprises an air inlet 211 and a water outlet 212; the air extraction device 30 comprises an air outlet 31, which is in communication with the air inlet 211 through a pipeline to at least apply positive pressure to the pressure-resistant area 21.

[0041] In actual operation, the water tank 20 on the base station 100 is provided with a pressure-resistant area 21, and when the water tank 20 on the base station 100 needs to supply water to the host (including directly supplying water to the water storage tank of the host or directly supplying water to the mop to clean the mop), the air outlet 31 of the air extraction device 30 is in communication with the air inlet 211 through a pipeline to at least apply positive pressure to the pressure-resistant area 21. In this way, the pressure-resistant area 21 serves as an independent pressure-bearing unit, limiting all pressure-related operations within it, while the other areas of the water tank 20 only bear the function of water storage and do not directly bear pressure, avoiding the risk of deformation of the water tank 20 during water supply and ensuring the structural integrity of the water tank 20.

[0042] Further, in the present application, the air extraction device 30 can be a gas pump or a vacuum pump, which is selected according to the actual production situation, and the present application does not make any limitation.

[0043] As shown in Figure 1As shown, the fresh water tank 20 further comprises a normal pressure area 22, which is used to supply water to the pressure-resistant area 21. In the present application, the fresh water tank 20 is divided into two parts, the normal pressure area 22 and the pressure-resistant area 21. The normal pressure area 22 is only used to store fresh water and is always in a normal pressure state (a gas vent can be reserved to communicate with the atmosphere to balance the air pressure fluctuation caused by the change of the water level in the storage tank, and the normal pressure area 22 does not need to bear any pressure and only needs to meet the basic functions of “water storage + leakage prevention”, so a lighter material (such as ordinary food-grade plastic) can be used to manufacture the normal pressure area 22, which greatly reduces the overall manufacturing cost of the fresh water tank 20. At the same time, the normal pressure area 22 completely avoids the problems of “bulging and cracking” caused by pressure, and only needs to ensure the structural strength of the pressure-resistant area 21, which further prolongs the service life of the fresh water tank 20. When the water in the pressure-resistant area 21 is completely emptied, the water supply channel of the normal pressure area 22 can be opened to supplement fresh water, which is simple to operate.

[0044] Further, in the present application, the pressure-resistant area 21 is arranged at the bottom of the normal pressure area 22. When the normal pressure area 22 needs to supply water to the pressure-resistant area 21, the water supply can be completed by relying on the pressure difference or gravity, which reduces the driving of the power device and reduces the production cost and operation and maintenance cost.

[0045] Further, in the present application, the normal pressure area 22 can be arranged as a large-capacity water storage area. When the host needs to supplement a large amount of water in a short period of time, the pressure-resistant area 21 can quickly supply water by pressurization, and the normal pressure area 22 can continuously supply water to the pressure-resistant area 21, so as to avoid the problem that the insufficient single water supply amount causes the interruption of other functions. If the host only needs a small amount of water, the normal pressure area 22 can store sufficient fresh water, which reduces the water supply frequency and reduces the operation and maintenance cost.

[0046] Again referring to Figure 1 As shown, a flow passage (not shown in the figure) is arranged between the normal pressure area 22 and the pressure-resistant area 21, and a first control valve 40 is arranged in the flow passage. Exemplarily, in the present application, the first control valve 40 can be an on-off valve or a one-way valve. When the water in the pressure-resistant area 21 is emptied, the first control valve 40 can be opened, and the normal pressure area 22 can supply water to the pressure-resistant area 21. When the water in the pressure-resistant area 21 is full, the first control valve 40 is closed, so as to avoid the water in the pressure-resistant area 21 returning to the normal pressure area 22 when the positive pressure is applied to the pressure-resistant area 21, which reduces the efficiency of water supply to the host.

[0047] Further, the first control valve 40 comprises a one-way valve configured to be open in the direction from the normal pressure area 22 to the pressure-resistant area 21. In the present application, the first control valve 40 is preferably a one-way valve, which is low in cost, easy to install and strong in maintenance-free property. In this way, the one-way valve prevents the high-pressure gas or water flow in the pressure-resistant area 21 from flowing reversely into the normal pressure area 22, ensuring that the normal pressure area 22 is always in a normal pressure state and avoiding deformation and cracking due to high-pressure impact. In addition, if the air exhaust device 30 accidentally outputs overpressure (for example, air pump failure), the one-way valve can also be kept closed by mechanical structure (for example, valve core weight, spring force) to form a physical barrier and prevent the destructive effect of high pressure on the normal pressure area 22. In the present application, when the water level in the pressure-resistant area 21 drops and the internal pressure decreases, or the water level in the normal pressure area 22 is higher than that in the pressure-resistant area 21 to form a liquid level difference, the one-way valve will automatically open, and the water in the normal pressure area 22 will flow into the pressure-resistant area 21 under the action of gravity / pressure difference, realizing “water supply on demand”. When the pressure-resistant area 21 is pressurized to supply water, the internal pressure increases, and the one-way valve automatically closes to prevent the water in the pressure-resistant area 21 from flowing reversely back to the normal pressure area 22, ensuring that the pressurization energy is fully used for water supply to the host machine without energy waste.

[0048] Referring again to Figure 1 As shown, the base station 100 further comprises a second control valve 50 arranged between the air exhaust device 30 and the clean water tank 20, and the second control valve 50 has a first state in which the air inlet 211 and the air outlet 31 are in communication, and the second control valve 50 also has a second state in which the air inlet 211 and the atmosphere are in communication.

[0049] Specifically, the arrangement of the second control valve 50 makes the working mode of the base station 100 more flexible. When the second control valve 50 is in the first state, the air outlet 31 and the air inlet 211 are in communication, and the air exhaust device 30 can apply positive pressure to the pressure-resistant area 21, and the clean water in the pressure-resistant area 21 can flow out through the water outlet 212 and be used to supply water to the host machine. At this time, when the second control valve 50 is in the first state, stable positive pressure output can be ensured, and water supply reliability can be ensured. When the air outlet 31 and the air inlet 211 are in communication through the channel without additional shunt, air pressure loss (such as no leakage path to the atmosphere) is avoided, the output pressure of the air exhaust device 30 is maximized, and energy waste is reduced.

[0050] Further, when the water in the pressure-resistant area 21 is completely emptied, the second control valve 50 is switched from the first state to the second state, and the air inlet 211 is communicated with the external atmosphere. At this time, the residual high pressure in the pressure-resistant area 21 can be quickly released through the atmospheric channel, so that the internal air pressure is reduced to normal pressure, and the water in the normal-pressure area 22 can flow into the pressure-resistant area 21 under the action of gravity / liquid level difference through the first control valve 40 (one-way valve), to complete water replenishment (if not depressurized, the residual pressure in the pressure-resistant area 21 will hinder water replenishment, resulting in slow or incomplete water replenishment). In addition, switching the second control valve 50 from the first state to the second state can avoid the pressure-resistant area 21 being in a high-pressure state for a long time, which will accelerate the aging of the sealing element (not shown in the figure) (such as the air inlet 211 sealing ring). Depressurization can prolong the service life of the components and reduce the risk of leakage.

[0051] As shown in Figure 1 The second control valve 50 includes a first valve port 51, a second valve port 52, and a third valve port 53. The first valve port 51 is communicated with the air outlet 31 through a pipeline, the second valve port 52 is communicated with the air inlet 211 through a pipeline, and the third valve port 53 is communicated with the external atmosphere through a pipeline.

[0052] When the first valve port 51 and the second valve port 52 are communicated, the second control valve 50 is in the first state, and when the second valve port 52 and the third valve port 53 are communicated, the second control valve 50 is in the second state. In this application, the second control valve 50 can be a two-position three-way electromagnetic valve.

[0053] It can be understood that in this application, the second control valve 50 adopts a three-valve port design, which reduces the number of components. The second control valve 50 integrates the first state and the second state, without the need to set additional valves and pipelines, simplifying the system structure and reducing the installation space occupation, and also reducing the risk of pipeline leakage. In this application, the three valve ports of the second control valve 50 are switched by the valve core linkage, which can directly switch between the pressurization and depressurization states without an intermediate buffer state, improving the response efficiency. Moreover, the first state and the second state are mutually exclusive, avoiding state conflicts and ensuring the safety and reliability of air pressure regulation.

[0054] That is to say, in this application, by setting the second control valve 50, the dual-function mutual exclusion switching is realized by a single valve body, which not only simplifies the system structure and reduces the risk of leakage, but also ensures the accuracy of air pressure regulation through mechanical interlocking, while strengthening the emergency response and maintenance convenience, perfectly adapting to the core needs of high reliability, low maintenance, and fast response of the water supply system of the base station 100.

[0055] Again referring to Figure 1As shown, the bottom of the clean water tank 20 is provided with a detachable accommodating portion 23, and the pressure-resistant area 21 is arranged in the accommodating portion 23. In the present application, the accommodating portion 23 can be arranged at the bottom of the clean water tank 20 through buckle connection, bolt or screw connection, nested structure, etc. In this way, the maintenance and cleaning of the accommodating portion 23 are facilitated. The detachable structure makes the clean water tank 20 more convenient and fast to install, and in the transportation process, the accommodating portion 23 and other components can also be disassembled for transportation. In addition, the arrangement of the accommodating portion 23 and the pressure-resistant area 21 inside the accommodating portion 23 can enhance the pressure resistance of the specific area at the bottom of the clean water tank 20, prevent the clean water tank 20 from being damaged or deformed under certain pressure, and ensure the sealing performance and safety of the clean water tank 20. In the present application, the accommodating portion 23 can be designed in different shapes and sizes according to actual needs.

[0056] As shown in the drawings, Figure 1 In the present application, the air extraction device 30 further comprises an air extraction port 32, and the base station 100 comprises a sewage tank 60 provided with an air outlet 61, and the air extraction port 32 is communicated with the air outlet 61 through a pipeline to at least extract negative pressure from the sewage tank 60. The negative pressure environment can generate suction force, which helps to more efficiently extract sewage from other components or areas connected to the sewage tank 60 into the sewage tank 60, improve the sewage discharge speed, and ensure that the sewage can be collected and treated in time. At the same time, the negative pressure environment also helps to prevent odor emission, promote water vapor separation, prevent sewage backflow, and improve system stability.

[0057] In actual work process, the air extraction port 32 of the air extraction device 30 is communicated with the air outlet 61 on the sewage tank 60 through the air extraction pipe 90, and the air outlet 31 of the air extraction device 30 is communicated with the pressure-resistant area 21 through the first valve port 51 of the second control valve 50. When the air extraction device 30 extracts the gas in the sewage tank 60 through the air extraction port 32, the inside of the sewage tank 60 is in a negative pressure state to realize sewage extraction and storage. At the same time, the air outlet 31 of the air extraction device 30 can inject the air extracted from the sewage tank 60 into the pressure-resistant area 21 from the air inlet 211, so that the inside of the pressure-resistant area 21 is in a positive pressure state. In this process, the clean water in the pressure-resistant area 21 can be injected into the water storage tank of the main machine or directly supplied to the mop through the water outlet pipe 80 from the water outlet 212 through the action of the positive pressure, so that the mop is self-cleaning. Compared with the existing base station 100, the base station 100 of the present application has a simple structure and is easy to maintain.

[0058] Further, in the present application, the air guide pipe 70 is arranged to transport the gas extracted from the sewage tank 60 into the pressure-resistant area 21. As shown in the drawings, Figure 1As shown, the air guide pipe 70 extends along the height direction of the base station 100 and communicates with the air inlet 211 of the pressure-resistant zone 21 from the top of the fresh water tank 20 through the normal pressure zone 22. In this way, the air guide pipe 70 can accurately guide the air at the air outlet 31 of the air pumping device 30 to the inside of the pressure-resistant zone 21. This design ensures that the air can be transmitted along the predetermined path, avoiding the disorderly flow of the air in the tank, so that the process of applying positive pressure to the fresh water tank 20 is more controllable. At the same time, this design can also reduce the noise generated between the air and the water when the positive pressure is applied to the pressure-resistant zone 21. In the present application, the water outlet pipe 80 is arranged near the bottom of the pressure-resistant zone 21, so that the water in the pressure-resistant zone 21 can be basically completely drained and injected into the water storage tank of the main machine or delivered to the mop, reducing the residual fresh water in the pressure-resistant zone 21 and improving the water supply efficiency.

[0059] Further, a first control valve 40 (i.e. a one-way valve) is arranged on the water outlet pipe 80 to prevent the water delivered to the main machine from flowing back to the pressure-resistant zone 21 and reducing the water supply efficiency.

[0060] Further, in the present application, the connection between the air pumping device 30 and the second control valve 50 has the following three working modes:

[0061] The first mode: when the second control valve 50 is in the first state, the first valve port 51 and the second valve port 52 are open, at this time the air pumping device 30 works, and at the same time, the air from the air outlet 31 enters the pressure-resistant zone 21, so that the pressure-resistant zone 21 is in a positive pressure state, and the fresh water in the pressure-resistant zone 21 is pumped to the outside (into the water storage tank of the main machine or directly supplied to the mop). At this time, the base station 100 performs sewage pumping and water supply.

[0062] The second mode: when the second control valve 50 is still in the first state, after the water in the pressure-resistant zone 21 is drained, the air in the pressure-resistant zone 21 enters the water storage tank of the main machine through the water outlet pipe 80, and then enters the outside atmosphere through the air outlet of the water storage tank of the main machine. At this time, the base station 100 performs sewage pumping but does not supply water. In this way, the pressure-resistant zone 21 is prevented from being over-pressurized, and the sewage pumping power is not interrupted.

[0063] The third mode: when the second control valve 50 is in the second state, the second valve port 52 and the third valve port 53 are open. The pressure-resistant zone 21 is communicated with the outside atmosphere, at this time the air pumping device 30 does not work, and the water in the normal pressure zone 22 of the fresh water tank 20 enters the pressure-resistant zone 21 under the action of the atmospheric pressure. At this time, only water is supplied, and there is no sewage pumping and pressurizing effect.

[0064] As Figure 1As shown, the sewage tank 60 further comprises a sewage inlet 62, and the sewage tank 60 is provided with a sewage storage cavity and a sewage guide pipe 63, the sewage guide pipe 63 is located in the sewage storage cavity and extends along the height direction of the sewage tank 60, and one end of the sewage guide pipe 63 is communicated with the sewage inlet 62. Specifically, in the present application, the sewage tank 60 is provided with a sewage storage cavity (not shown in the figure) and a sewage guide pipe 63, the sewage guide pipe 63 extends along the height direction of the sewage storage cavity and one end is communicated with the sewage inlet 62, which can effectively guide the sewage and dirt from the sewage inlet 62 into the sewage tank 60.

[0065] Again referring to Figures 1 to 3 As shown, the present application also provides a cleaning device, which comprises a main machine and the above-mentioned base station 100, and the clean water tank 20 on the base station 100 is used at least for supplying water to the water storage tank on the main machine or directly to the mop on the main machine. Therefore, the cleaning device provided in the present embodiment comprises all the technical effects of the above-mentioned base station 100, and since the technical effects of the base station 100 have been described in detail in the foregoing, they will not be described here again.

[0066] In combination with Figures 2 to 3 As shown, the present application also provides a control method of a cleaning device, which is used for controlling the above-mentioned cleaning device. The cleaning device comprises a water supply and sewage pumping mode, the water supply and sewage pumping mode comprises replenishing water to the water storage tank of the main machine or directly supplying water to the mop for self-cleaning of the mop, and pumping sewage, and the control method of the cleaning device comprises:

[0067] S1: when it is needed to replenish water to the water storage tank of the main machine or directly supply water to the mop, detecting whether there is water in the clean water tank 20 and whether the sewage in the sewage tank 60 on the base station 100 reaches a predetermined water level;

[0068] If there is water in the clean water tank 20 and the sewage in the sewage tank 60 does not reach the predetermined water level, a water supply and sewage pumping operation is performed;

[0069] If there is no water in the clean water tank 20 and the sewage in the sewage tank 60 reaches the predetermined water level, water is first added to the clean water tank 20 and the sewage in the sewage tank 60 is first emptied, and then the water supply and sewage pumping operation is performed;

[0070] If there is no water in the clean water tank 20 and the sewage in the sewage tank 60 does not reach the predetermined water level, water is first added to the clean water tank 20, and then the water supply and sewage pumping operation is performed;

[0071] If there is water in the clean water tank 20 and the sewage in the sewage tank 60 reaches the predetermined water level, the sewage in the sewage tank 60 is first emptied, and then the water supply and sewage pumping operation is performed.

[0072] Specifically, the water supply and sewage extraction of the present application is based on the conditional operation of the water level in the clean water tank 20 and the sewage tank 60. In this way, it can effectively ensure that the operation is not interrupted and ineffective, and the reliability is improved. In the present application, by detecting the water level of the clean water tank 20 and the sewage tank 60 first, the problem of "water supply without water" is avoided: if the operation is directly performed without detecting the water level of the clean water tank 20, the problem of the mop being unable to self-clean due to the depletion of clean water and the main machine being shut down due to lack of water may occur; and "water supply before operation" ensures that the water supply link is continuous and effective. At the same time, it can also avoid "full tank sewage storage": if the sewage tank 60 has reached the predetermined water level and still forcibly extracts sewage, it will cause sewage to overflow (pollute the internal environment of the base station 100 and the ground) and the pipeline to be blocked (sewage flows back to the main machine), and "emptying before operation" provides enough space for sewage extraction, ensuring that sewage can be smoothly collected.

[0073] Further, through the above detection, the equipment can be prevented from moving in an extreme state, thereby reducing equipment wear and tear and prolonging the service life of the equipment. If the sewage tank 60 continues to extract sewage when it is full, it will cause the sewage extraction motor to have excessive load (need to overcome the resistance of sewage overflow), and long-term use may burn out the motor; emptying before extraction allows the motor to always work in a "low load and smooth extraction" state, reducing the wear and tear of the motor.

[0074] Further, in the water supply and sewage extraction operation, the steps include:

[0075] S21: inflating the pressure-resistant area 21 in the clean water tank 20 to supply water to the water storage tank of the main machine or directly to the mop for self-cleaning of the mop, and detecting in real time whether there is water in the pressure-resistant area 21, and when no water is detected in the pressure-resistant area 21, stopping the water supply and sewage extraction operation;

[0076] S22: after the water supply and sewage extraction operation is stopped, controlling the normal pressure area 22 in the clean water tank 20 to supplement water to the pressure-resistant area 21 until the water in the pressure-resistant area 21 is full, and repeating steps S21 and S22 until the water in the water storage tank of the main machine is full or the mop completes self-cleaning.

[0077] In the present application, step S21 achieves pressurized water supply by inflating the pressure-resistant area 21, which can accurately control the water supply amount and water pressure (such as adapting to the specific water demand of mop self-cleaning), and at the same time, the water level of the pressure-resistant area 21 is detected in real time, and the operation is immediately stopped once there is no water, avoiding energy consumption due to idling or misoperation. The water supplement cycle of step S22 ensures that when continuous water supply is needed (such as when the water storage tank of the main machine is not full), water is supplemented to the pressure-resistant area 21 through the normal pressure area 22, forming a "small-dose precise water supply + on-demand cycle" mode, which reduces the waste of water resources caused by excessive water supply.

[0078] At the same time, the pressurized water supply of the pressure-resistant area 21 is suitable for scenarios that require directional and efficient water supply (such as directly spraying water to clean the mop), and the water supplement function of the normal-pressure area 22 serves as a "reserve source" to ensure that the pressure-resistant area 21 will not be interrupted due to insufficient water supply for a single time. This design can meet the demand for instantaneous high-pressure water supply and maintain the stability of long-term water supply through a circulation mechanism. Moreover, by using the structure of "small-capacity pressure-resistant area 21 water supply + large-capacity normal-pressure area 22 reserve", compared with directly pressurizing the water supply of a large-capacity area, the continuous load of the pressurizing device can be reduced (only the small-capacity pressure-resistant area 21 needs to be inflated and pressurized), and the deformation of the clean water tank 20 due to processing can be avoided.

[0079] Further, the water supply and sewage pumping control logic of the cleaning device of the present application is as follows:

[0080] Firstly, it is detected whether there is water in the clean water tank 20. If it is sewage, water needs to be added to the clean water tank 20 first. At the same time, it is also detected whether the sewage in the sewage tank 60 has reached the predetermined water level. If so, the sewage in the sewage tank 60 is first emptied, which is beneficial to the subsequent water supply and sewage pumping operation.

[0081] Secondly, the first valve port 51 and the second valve port 52 of the second control valve 50 are connected to realize the connection between the air pumping and exhausting device 30 and the pressure-resistant area 21, which is beneficial to the air supply of the pressure-resistant area 21 to make the inside of the pressure-resistant area 21 in a positive pressure state and then to the water storage tank of the main machine or directly to the water supply of the mop, so that the mop can be self-cleaned.

[0082] Thirdly, the air pumping and exhausting device 30 is started to begin the water supply and sewage pumping, the inside of the pressure-resistant area 21 is filled with gas, the one-way valve is closed, and the pressure-resistant area 21 begins to supply water.

[0083] Since the capacity of the pressure-resistant area 21 is limited, the water storage tank of the main machine may be started multiple times. The control logic of multiple water supply is as follows: the air pumping and exhausting device 30 is started, and the water in the pressure-resistant area 21 is completely emptied. The air pumping and exhausting device 30 is controlled to stop working, and the second control valve 50 is controlled to be in the second state, the second valve port 52 and the third valve port 53 are connected, the normal-pressure area 22 in the clean water tank 20 supplements water to the pressure-resistant area 21 until the water in the pressure-resistant area 21 is full. Then the second control valve 50 is controlled to be in the first working state, and the air pumping and exhausting device 30 is started again to begin to supply clean water. The above steps are repeated to realize multiple water supply.

[0084] Fourthly, if the main machine is provided with a water storage tank, the water storage tank supplies water to the mop to make the mop self-cleaned. After the mop self-cleaning is completed, the air pumping and exhausting device 30 is closed after a predetermined time is prolonged, and the sewage pumping operation is completed. If the main machine is not provided with a water storage tank, the pressure-resistant area 21 directly supplies water to the base of the base station 100 to start the mop self-cleaning. After the mop self-cleaning is completed, the air pumping and exhausting device 30 is closed after a predetermined time is prolonged, and the sewage pumping operation is completed.

[0085] It can be known from the above embodiments that the base station, the cleaning device and the control method of the cleaning device provided by the application at least have the following technical effects:

[0086] The application sets the pressure-resistant area 21 in the fresh water tank 20, when water is needed to be supplied to the host, the pressure only acts on the pressure-resistant area 21, avoiding the deformation of the whole fresh water tank 20 in the process of applying positive pressure, thereby affecting the overall structural completeness of the fresh water tank 20, and prolonging the service life of the fresh water tank 20.

[0087] For the convenience of description, spatial relative terms such as "above", "upper", "on", "upper surface", "upper", etc. can be used herein to describe the spatial positional relationship of one device or feature with other devices or features as shown in the drawings. It should be understood that the spatial relative terms are intended to include different orientations in use or operation in addition to the orientation of the device described in the drawings. For example, if the device in the drawing is inverted, the device described as "above" or "above" the other device or structure will be positioned "below" or "below" the other device or structure. Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein are interpreted accordingly.

[0088] In addition, it should be noted that the use of "first", "second", and the like to define parts is only for the convenience of distinguishing the corresponding parts, and the above words have no special meaning unless otherwise stated, and therefore cannot be understood as limiting the protection scope of the application.

[0089] The above is only the preferred embodiment of the application and is not intended to limit the application. For those skilled in the art, the application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the application shall be included in the protection scope of the application.

Claims

1. A base station, characterized by comprising: The base station (100) comprises: a main body (10); a clean water tank (20) arranged in the main body (10), wherein a pressure-resistant area (21) is arranged in the clean water tank (20), and the pressure-resistant area (21) comprises an air inlet (211) and a water outlet (212); an air exhaust device (30) comprising an air exhaust port (31), wherein the air exhaust port (31) is communicated with the air inlet (211) through a pipeline to at least apply positive pressure to the pressure-resistant area (21).

2. The base station of claim 1, wherein, The clean water tank (20) further comprises an atmospheric pressure area (22) for supplementing water to the pressure-resistant area (21).

3. The base station of claim 2, wherein, A flow passage is arranged between the atmospheric pressure area (22) and the pressure-resistant area (21), and a first control valve (40) is arranged in the flow passage.

4. The base station of claim 3, characterized in that, The first control valve (40) comprises a one-way valve configured to be conducted in the direction from the atmospheric pressure area (22) to the pressure-resistant area (21).

5. The base station of claim 1, wherein, The base station (100) further comprises a second control valve (50) arranged between the air exhaust device (30) and the clean water tank (20), wherein the second control valve (50) has a first state in which the air inlet (211) is conducted with the air exhaust port (31), and the second control valve (50) has a second state in which the air inlet (211) is conducted with the atmosphere.

6. The base station of claim 5, characterized in that, The second control valve (50) comprises a first valve port (51), a second valve port (52) and a third valve port (53), wherein the first valve port (51) is communicated with the air exhaust port (31) through a pipeline, the second valve port (52) is communicated with the air inlet (211) through a pipeline, and the third valve port (53) is communicated with the atmosphere through a pipeline. When the first valve port (51) and the second valve port (52) are conducted, the second control valve (50) is in the first state, and when the second valve port (52) and the third valve port (53) are conducted, the second control valve (50) is in the second state.

7. The base station of claim 1, wherein, A detachable accommodating portion (23) is arranged at the bottom of the clean water tank (20), and the pressure-resistant area (21) is arranged in the accommodating portion (23).

8. The base station of any one of claims 1 to 7, characterized in that, The air exhaust device (30) further comprises an air suction port (32), and the base station (100) comprises: a sewage tank (60) comprising an air outlet (61), wherein the air suction port (32) is communicated with the air outlet (61) through a pipeline to at least apply negative pressure to the sewage tank (60).

9. The base station of claim 8, characterized in that, The sewage tank (60) further comprises a sewage inlet (62), a sewage storage cavity and a sewage guide pipe (63) arranged in the sewage tank (60), wherein the sewage guide pipe (63) is located in the sewage storage cavity and extends along the height direction of the sewage tank (60), and one end of the sewage guide pipe (63) is communicated with the sewage inlet (62).

10. A cleaning apparatus, characterized by The cleaning device comprises a main machine and the base station (100) according to any one of claims 1 to 9, and a clean water tank (20) on the base station (100) is used to supply water to a water storage tank on the main machine or directly to a mop on the main machine. 11.A control method of a cleaning device for controlling the cleaning device according to claim 10, characterized in that, The cleaning device comprises a water supply and sewage pumping mode, which comprises replenishing water to a water storage tank on the main machine or directly supplying water to a mop for self-cleaning of the mop, and pumping sewage, and the control method of the cleaning device comprises: S1: when it is necessary to replenish water to a water storage tank on the main machine or directly supply water to a mop, detecting whether there is water in the clean water tank (20) and whether sewage in the sewage tank (60) on the base station (100) reaches a predetermined water level; If there is water in the clean water tank (20) and the sewage in the sewage tank (60) does not reach the predetermined water level, a water supply and sewage pumping operation is performed; If there is no water in the clean water tank (20) and the sewage in the sewage tank (60) reaches the predetermined water level, water is first added to the clean water tank (20) and the sewage in the sewage tank (60) is first emptied, and then the water supply and sewage pumping operation is performed; If there is no water in the clean water tank (20) and the sewage in the sewage tank (60) does not reach the predetermined water level, water is first added to the clean water tank (20), and then the water supply and sewage pumping operation is performed; If there is water in the clean water tank (20) and the sewage in the sewage tank (60) reaches the predetermined water level, the sewage in the sewage tank (60) is first emptied, and then the water supply and sewage pumping operation is performed.

12. The control method of the cleaning apparatus according to claim 11, wherein In the water supply and sewage pumping operation, the steps comprise: S21: inflating a pressure-resistant area (21) in the clean water tank (20) to supply water to a water storage tank on the main machine or directly to a mop for self-cleaning of the mop, and detecting in real time whether there is water in the pressure-resistant area (21), and when it is detected that there is no water in the pressure-resistant area (21), controlling the water supply and sewage pumping operation to stop; S22: after the water supply and sewage pumping operation stops, controlling a normal-pressure area (22) in the clean water tank (20) to replenish water to the pressure-resistant area (21) until the pressure-resistant area (21) is full of water, and repeating step S21 and step S22 until the water storage tank on the main machine is full of water or the mop is self-cleaned.

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