Gas treatment device and hydrogen production system

Abstract

The embodiment of the invention discloses a gas treatment device and a hydrogen production system, and relates to the technical field of gas preparation.The gas treatment device comprises a shell, a cooling mechanism and a washing mechanism, a treatment cavity is formed in the shell, a partition plate is arranged in the treatment cavity, and the treatment cavity is divided into a first chamber and a second chamber by the partition plate; the partition plate is provided with a communicating pipe communicating the first cavity and the second cavity, the communicating pipe is provided with a first pipe end and a second pipe end which are opposite, and the first pipe end is located in the first cavity. The cooling mechanism is arranged in the first chamber; the washing mechanism is arranged in the second cavity. Wherein the shell is provided with an air outlet pipe communicated with the first cavity and an air inlet pipe communicated with the second cavity, the first pipe end is located above the air outlet pipe, and the cooling mechanism is arranged between the first pipe end and the air outlet pipe. According to the technical scheme provided by the embodiment of the invention, gas-liquid entrainment of output gas is reduced, the quality of the output gas is improved, and the working efficiency and reliability of the gas treatment device are improved.

Description

Technical Field

[0001] The embodiments in this application relate to the field of gas preparation technology, and in particular to a gas processing device and a hydrogen production system. Background Technology

[0002] In related technologies, hydrogen production systems typically require gas processing devices to perform gas-liquid separation, gas washing, and gas cooling on the produced gas to achieve a certain degree of purification and output of the produced gas.

[0003] However, the gas output from the gas processing device is prone to contain a certain amount of alkaline solution, which leads to gas-liquid entrainment, affecting the gas purification effect and reducing the practicality and reliability of the gas processing device. Summary of the Invention

[0004] This application provides several embodiments of a gas processing device and a hydrogen production system, aiming to achieve a gas-liquid co-flow condensation method in the gas processing device, effectively reducing gas-liquid entrainment in the output gas and improving the practicality and reliability of the gas processing device.

[0005] A gas processing device according to one embodiment of this application is characterized by comprising a housing and a cooling mechanism. The housing has a partition that divides its interior into a first chamber and a second chamber. The first chamber is located above the second chamber. The partition has a connecting pipe linking the first and second chambers. The connecting pipe has a first end and a second end opposite to each other, with the first end located within the first chamber. The cooling mechanism is disposed within the first chamber. The housing also has an outlet pipe linking the first chamber and an inlet pipe linking the second chamber. The first end of the inlet pipe is located above the outlet pipe, and the cooling mechanism is disposed between the first end of the inlet pipe and the outlet pipe.

[0006] In one embodiment, the connecting pipe is provided with a distribution pipe head and a wire mesh. The distribution pipe head is connected to the first pipe end, and a plurality of diversion ports are provided at intervals on the outer periphery of the distribution pipe head. The wire mesh is surrounded on the inner or outer wall of the distribution pipe head.

[0007] In one embodiment, the cooling mechanism includes an upper tube sheet, a lower tube sheet, and heat exchange tubes. The upper tube sheet is connected to the inner wall of the first chamber; the lower tube sheet is connected to the inner wall of the first chamber and spaced apart from the upper tube sheet. The lower tube sheet, the upper tube sheet, and the inner wall of the first chamber enclose a heat exchange space; the heat exchange tubes are disposed between the upper tube sheet and the lower tube sheet, with both ends of the heat exchange tubes passing through the upper tube sheet and the lower tube sheet, respectively.

[0008] In one embodiment, the housing is provided with a coolant inlet pipe and a coolant outlet pipe, which are respectively connected to the heat exchange space. And / or, the inner wall of the heat exchange tube is provided with a hydrophilic coating.

[0009] In one embodiment, the processing chamber is further provided with a baffle plate, which is located in the second chamber and divides the second chamber into a separation space and a washing space. The air inlet pipe is connected to the separation space. The gas processing device further includes a washing mechanism, which is located in the washing space. The baffle plate is provided with a gas riser pipe that connects the separation space and the washing space.

[0010] In one embodiment, the gas processing device further includes a swirl plate disposed within the separation space and forming a spiral flow channel with the inner wall of the separation space, and the air inlet pipe is connected to the spiral flow channel.

[0011] In one embodiment, a portion of the gas riser is disposed within the separation space, and the swirl plate is connected to the outer wall of the gas riser. And / or, the surface of the swirl plate is provided with a hydrophilic coating.

[0012] In one embodiment, a portion of the gas riser is disposed within the washing space. The gas riser is equipped with a flow guide end cap and a connecting rod. The flow guide end cap is disposed within the washing space and has a diffusion groove. One end of the gas riser is disposed within the diffusion groove, and the connecting rod connects the inner wall of the diffusion groove and the outer wall of the gas riser.

[0013] In one embodiment, the washing mechanism includes a sprayer and a packing structure, the sprayer being located above the packing structure and used to spray water toward the packing structure.

[0014] In one embodiment, the housing is provided with a first drain pipe communicating with the washing space, the washing mechanism is provided with a washing circulation pipe, the washing circulation pipe is connected to the first drain pipe and the sprayer, and the washing circulation pipe is provided with a switch valve and a circulation pump.

[0015] In one embodiment, the washing circulation pipeline is provided with a replenishment branch pipe, which connects the switch valve and the circulation pump and is used to connect a water replenishment device. And / or, the washing circulation pipeline is provided with a pH meter, which is located near the first drain pipe. And / or, the washing circulation pipeline is provided with a condenser.

[0016] In one embodiment, the gas processing device further includes a system separator, which has a first recovery pipe connected to the washing circulation pipeline.

[0017] In one embodiment, the housing is further provided with a second drain pipe communicating with the separation area, and the system separator is further provided with a second recovery pipe, which is connected to the second drain pipe.

[0018] In one embodiment, the system separator is further provided with an exhaust pipe connected to the intake pipe.

[0019] In one embodiment, the housing is further provided with an air outlet baffle, which is connected to the inner wall of the first chamber and disposed between the cooling mechanism and the air outlet pipe.

[0020] An embodiment of this application also proposes a hydrogen production system, which includes a hydrogen production device, a gas processing device, and a collection device. The gas processing device is the gas processing device described above, and the hydrogen production device and the collection device are respectively connected to the gas processing device via pipelines.

[0021] In the various embodiments provided in this application, a connecting pipe on a partition connects the first chamber and the second chamber, and the first end of the connecting pipe is positioned above the outlet pipe. This allows the gas, after being washed in the second chamber, to flow into the first chamber through the connecting pipe and then flow back down to the outlet pipe for output. At this time, by setting a cooling device between the first end and the outlet pipe, the flow direction of the condensate in the cooling device can be made to be the same as the flow direction of the gas, realizing a gas-liquid co-flow condensation method. This helps to better prevent the gas from contacting and blowing away the condensate during its flow towards the outlet pipe, effectively reducing the moisture carried in the gas. This allows the gas processing device to stably output purer gas, further improving the practicality and reliability of the gas processing device. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments or prior art of this application, the drawings used in the description of the embodiments or prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0023] Figure 1 A schematic diagram of the structure of an embodiment of the gas processing apparatus provided in this application;

[0024] Figure 2 This is a schematic diagram of another embodiment of the gas processing apparatus provided in this application;

[0025] Figure 3 for Figure 2 A gas flow diagram of an embodiment of a gas processing device;

[0026] Figure 4 A partial structural schematic diagram of an embodiment of the gas processing apparatus provided in this application;

[0027] Figure 5 A partial structural schematic diagram of another embodiment of the gas processing apparatus provided in this application;

[0028] Figure 6 A top view of an embodiment of the sprayer of the gas treatment apparatus provided in this application;

[0029] Figure 7 This is a schematic diagram of the structure of a swirl plate of a gas processing device provided in this application.

[0030] Explanation of icon numbers:

[0031] 100. Gas processing device; 10. Shell; 10a. Outlet pipe; 10b. Inlet pipe; 10c. Coolant inlet pipe; 10d. Coolant outlet pipe; 10e. First drain pipe; 10f. Second drain pipe; 10g. Condensate outlet pipe; 111. First chamber; 113. Second chamber; 1131. Separation space; 1133. Washing space; 13. Partition; 131. Connecting pipe; 1311. Distribution pipe head; 1313. First pipe end; 1315. Second pipe end; 15. Baffle; 151. Gas riser pipe; 1511. Flow guide end; 1513. Connecting rod; 17. Outlet baffle; 19a. Fixed lug; 19b, bracket; 30, cooling mechanism; 31, upper tube sheet; 311, heat exchange space; 33, lower tube sheet; 35, heat exchange tube; 50, washing mechanism; 51, sprayer; 511, water supply pipe; 513, spray ring pipe; 515, connecting branch pipe; 53, packing structure; 531, support plate; 533, pressure plate; 535, packing body; 55, washing circulation pipe; 551, switch valve; 553, circulation pump; 555, replenishment branch pipe; 557, acid-base meter; 559, condenser; 70, swirl plate; 90, system separator; 91, first recovery pipe; 93, second recovery pipe; 95, exhaust pipe. Detailed Implementation

[0032] The technical solutions of this application will be clearly and completely described below with reference to the accompanying drawings of several embodiments. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0033] It should be noted that if directional indications (such as up, down, left, right, front, back, etc.) are involved in multiple embodiments of this application, the directional indications are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0034] Furthermore, if multiple embodiments of this application involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the use of "and / or" or "and / or" throughout the text implies three parallel solutions. For example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed in this application.

[0035] In gas processing devices, after washing, most of the gas flows directly upwards to the condenser for cooling. The condensate produced in the condenser flows downwards under gravity, causing the cooled gas to easily disperse the descending condensate droplets during its upward movement. This results in gas-liquid entrainment in the output gas of the gas processing device, affecting the purification effect and reducing the practicality and reliability of the device. To address these issues, this application proposes a gas processing device 100.

[0036] Please see Figures 1 to 5 In one embodiment of this application, the gas processing device 100 includes a housing 10 and a cooling mechanism 30. The housing 10 has a processing chamber 11, and the processing chamber 11 has a partition 13 that divides the processing chamber 11 into a first chamber 111 and a second chamber 113. The partition 13 has a connecting pipe 131 that connects the first chamber 111 and the second chamber 113. The connecting pipe 131 has a first pipe end 1313 and a second pipe end 1315, with the first pipe end 1313 located within the first chamber 111. The cooling mechanism 30 is located within the first chamber 111. The housing 10 has an outlet pipe 10a connecting the first chamber 111 and an inlet pipe 10b connecting the second chamber 113. The first pipe end 1313 is located above the outlet pipe 10a, and the cooling mechanism 30 is located between the first pipe end 1313 and the outlet pipe 10a.

[0037] Understandably, the hydrogen production system can connect the output of the hydrogen production device to the inlet pipe 10b of the gas processing device 100, and connect the outlet pipe 10a of the gas processing device 100 to the collection device. The collection device can be a hydrogen storage tank or a high-pressure storage bottle, etc. After generating a gas-liquid mixture containing a certain amount of hydrogen using the gas preparation structure such as the electrolysis cell of the hydrogen production device, the gas-liquid mixture is transported through the pipeline to the gas processing device 100 for certain gas-liquid separation, washing, and cooling treatments. The gas processing device 100 can separate alkaline solutions, water, or other impurities from the hydrogen in the gas-liquid mixture, so that the gas processing device 100 can stably deliver hydrogen of a certain purity to the collection device for collection and storage or to the next-stage hydrogen processing equipment for further processing, ensuring the stable and reliable operation of the hydrogen production system.

[0038] In this application, by using a partition 13 to divide the inner cavity of the housing 10 into a first chamber 111 and a second chamber 113, an inlet pipe 10b can be provided on the outer wall of the housing 10 to connect to the second chamber 113, and an outlet pipe 10a can be provided to connect to the first chamber 111. By providing a cooling mechanism 30 in the first chamber 111 and by providing a connecting pipe 131 on the partition 13 to connect the first chamber 111 and the second chamber 113, the output end of the hydrogen production device can be connected to the inlet pipe 10b through a pipe, thereby allowing the gas-liquid mixture produced by the hydrogen production device to pass through the inlet pipe 10b. 0b enters the second chamber 113. At this time, some of the alkaline solution mixed in the gas-liquid mixture can fall to the bottom of the second chamber 113 under the action of gravity. A washing mechanism 50 can be set in the second chamber to wash the gas-liquid mixture. This allows the alkaline solution and other impurities mixed in the gas-liquid mixture to be better washed away and left in the second chamber 113. After the hydrogen has undergone certain gas-liquid separation treatment in the second chamber 113, it can flow upward to the connecting pipe 131 and then flow through the connecting pipe 131 to the first chamber 111 for further processing.

[0039] Since the gas-liquid mixture produced by the hydrogen production device is at a high temperature, a cooling device is installed in the first chamber 111. This cooling device can be a condenser 559, a heat exchanger, a phase change cooler, etc. The hydrogen gas after washing is cooled by passing through the cooling device, and then the cooled hydrogen gas is transported from the outlet pipe 10a to the collection device, ensuring that the gas processing device 100 can output hydrogen gas with relatively stable performance.

[0040] When the cooling device cools down the high-temperature hydrogen, a certain amount of condensate is usually generated inside the cooling device. By placing the first pipe end 1313 of the connecting pipe 131 inside the first chamber 111 above the outlet pipe 10a, and placing the cooling device between the first pipe end 1313 and the outlet pipe 10a, the hydrogen flowing into the first chamber 111 from the connecting pipe 131 can flow from top to bottom through the cooling device toward the outlet pipe 10a. At this time, the flow direction of the hydrogen in the cooling device is the same as the flow direction of the condensate due to gravity. This effectively avoids the hydrogen coming into contact with the condensate and blowing away the condensate during its flow toward the outlet pipe 10a. This helps to better reduce the impurities such as moisture and alkali in the hydrogen output by the gas processing device 100, and better improve the purity and gas quality of the hydrogen processed and output by the gas processing device 100. This enables the hydrogen production system to operate more stably and reliably, effectively reduces the subsequent gas purification process, and further improves the working efficiency and reliability of the gas processing device 100.

[0041] In one embodiment of this application, the first chamber 111 and the second chamber 113 are connected by a connecting pipe 131 on the partition 13, and the first pipe end 1313 of the connecting pipe 131 is positioned above the outlet pipe 10a. This allows the gas that has been washed in the second chamber 113 to flow from the connecting pipe 131 into the first chamber 111 and then flow back down to the outlet pipe 10a for output. At this time, by setting a cooling device between the first pipe end 1313 and the outlet pipe 10a, the flow direction of the condensate in the cooling device can be the same as the flow direction of the gas, realizing a gas-liquid co-flow condensation method. This helps to better avoid the gas from contacting and blowing away the condensate during its flow towards the outlet pipe 10a, effectively reducing the moisture carried in the gas, so that the gas processing device 100 can stably output purer gas, further improving the practicality and reliability of the gas processing device 100.

[0042] See Figure 2 and Figure 4 In one embodiment of this application, the connecting pipe 131 is provided with a distribution pipe head 1311 and a wire mesh. The distribution pipe head 1311 is connected to the first pipe end 1313. Multiple diversion ports are provided at intervals on the outer periphery of the distribution pipe head 1311. The wire mesh is surrounded on the inner or outer wall of the distribution pipe head 1311.

[0043] In this embodiment, by providing a distribution head 1311 at the first pipe end 1313 of the connecting pipe 131, the gas can be obstructed when flowing upward in the connecting pipe 131. This allows the gas to flow out into the first chamber 111 from multiple branch ports on the outer periphery of the distribution head 1311. By spaced out multiple branch ports on the outer periphery of the distribution head 1311, the gas can be distributed more evenly into the first chamber 111. This facilitates a more uniform flow of gas to the cooling device, enabling the cooling device to quickly and fully cool the gas, and further improving the practicality and reliability of the gas processing device 100.

[0044] By surrounding the inner or outer wall of the distribution pipe head 1311 with a wire mesh, multiple diversion ports can be encircled by the wire mesh. This forces the gas flowing into the first chamber 111 from the diversion ports to pass through the wire mesh, thereby isolating and removing liquid droplets carried in the gas, achieving a certain degree of gas-liquid separation. This helps to better reduce the moisture carried by the gas entering the first chamber 111, thus improving the purification effect of the gas treatment device 100. Preferably, the wire mesh is disposed on the inner wall of the distribution pipe head 1311. In this case, the gas flowing from the connecting pipe 131 to the first chamber 111 can first pass through the wire mesh to remove moisture before passing through the diversion ports into the first chamber 111. This facilitates the condensation of the isolated moisture by the wire mesh, causing it to drip into the second chamber 113, achieving unified recovery of gas washing waste liquid, and further improving the practicality and reliability of the gas treatment device 100.

[0045] See Figure 2 and Figure 4 In one embodiment of this application, the cooling mechanism 30 includes an upper tube sheet 31, a lower tube sheet 33, and a heat exchange tube 35. The upper tube sheet 31 is connected to the inner wall of the first chamber 111; the lower tube sheet 33 is connected to the inner wall of the first chamber 111 and is spaced apart from the upper tube sheet 31. The lower tube sheet 33, the upper tube sheet 31, and the inner wall of the first chamber 111 enclose a heat exchange space 311; the heat exchange tube 35 is disposed between the upper tube sheet 31 and the lower tube sheet 33, and both ends of the heat exchange tube 35 pass through the upper tube sheet 31 and the lower tube sheet 33, respectively.

[0046] In this embodiment, the cooling mechanism 30 can be connected to the inner wall of the first chamber 111 at intervals using an upper tube sheet 31 and a lower tube sheet 33, forming a heat exchange space 311. Multiple heat exchange tubes 35 extending downwards are spaced at intervals within the heat exchange space 311, with both ends of the heat exchange tubes 35 passing through the upper tube sheet 31 and the lower tube sheet 33 respectively. This allows the gas entering the first chamber 111 to flow through the heat exchange tubes 35 towards the outlet pipe 10a. Cooling liquid or phase change material can be added to the heat exchange space 311, and the cooling material can surround the outer wall of the heat exchange tubes 35. As the gas flows downwards through the heat exchange tubes 35, the low-temperature environment created within the heat exchange tubes 35 can be used to cool and exchange heat with the high-temperature gas flow, effectively reducing the temperature of the gas flow after passing through the cooling mechanism 30 and achieving stable hydrogen output.

[0047] By utilizing the upper tube sheet 31 and the lower tube sheet 33 to form a heat exchange space 311 in the first chamber 111, the airflow can be better directed to flow through the heat exchange tube 35 toward the outlet pipe 10a, ensuring stable cooling and heat exchange of the high-temperature airflow by the cooling mechanism 30. Furthermore, the cooling material filled in the heat exchange space 311 can quickly create a low-temperature environment inside the heat exchange tube 35, which is beneficial for the cooling device to quickly exchange and cool the airflow passing through the heat exchange tube 35, further improving the structural stability and reliability of the gas processing device 100.

[0048] Furthermore, with the distribution tube head 1311 and wire mesh installed at the first tube end 1313, the gas in the connecting tube 131 can diffuse more evenly into the first chamber 111 under the action of the wire mesh and the distribution tube head 1311. This allows the gas to be evenly distributed in the first chamber 111 and flow towards the upper tube sheet 31, which is beneficial for the gas to be cooled better by passing through multiple heat exchange tubes 15 at the same time. This achieves a faster cooling effect for the gas processing device 100 and avoids the possibility of excessive gas volume in some heat exchange tubes 15 affecting the cooling effect. This further improves the working efficiency and practicality of the gas processing device 100.

[0049] See Figure 2 and Figure 4 In one embodiment of this application, the housing 10 is provided with a coolant inlet pipe 10c and a coolant outlet pipe 10d, the coolant inlet pipe 10c and the coolant outlet pipe 10d respectively connecting to the heat exchange space 311. And / or, the inner wall of the heat exchange tube 35 is provided with a hydrophilic coating.

[0050] In this embodiment, by providing a coolant inlet pipe 10c and a coolant outlet pipe 10d connecting the heat exchange space 311 on the outer wall of the housing 10, relatively low-temperature coolant can be continuously supplied into the heat exchange space 311 from the coolant inlet pipe 10c, and the coolant that has undergone heat exchange in the heat exchange space 311 can be continuously discharged from the coolant outlet pipe 10d. This allows the heat exchange space 311 to be filled with a certain degree of fluidity of coolant, which helps to better maintain the low-temperature environment formed in the heat exchange tube 35, achieving a rapid and efficient cooling effect of the airflow by the cooling mechanism 30, and further improving the practicality and reliability of the gas heat exchange device. The coolant inlet pipe 10c can be located below the coolant outlet pipe 10d, allowing the coolant to better fill the entire heat exchange space 311 before being discharged from the coolant outlet pipe 10d, achieving sufficient cooling of the airflow by the cooling mechanism 30 and reducing the temperature difference within the cooling mechanism 30.

[0051] In addition, in some embodiments, the cooling mechanism 30 may also attach a hydrophilic coating to the inner wall of the heat exchange tube 35. Utilizing the hydrophilic coating's ability to collect water droplets and reduce water droplet adhesion, it can better prevent condensate from adhering to the inner wall of the heat exchange tube 35. Furthermore, the condensate is allowed to quickly collect and settle downwards under the influence of gravity and airflow, effectively reducing the amount of condensate on the inner wall of the heat exchange tube 35. This better prevents the airflow from contacting the condensate inside the heat exchange tube 35, reducing the moisture carried by the cooled airflow, achieving a better gas-liquid separation effect for the gas processing device 100, and further improving the practicality and reliability of the gas processing device 100.

[0052] See Figure 2 and Figure 5 In one embodiment of this application, a baffle plate 15 is also provided in the processing chamber 11. The baffle plate 15 is located in the second chamber 113 and divides the second chamber 113 into a separation space 1131 and a washing space 1133. The air inlet pipe 10b is connected to the separation space 1131. The gas processing device 100 also includes a washing mechanism 50, which is located in the washing space 1133. The baffle plate 15 is provided with a gas riser pipe 151 that connects the separation space 1131 and the washing space 1133.

[0053] In this embodiment, by setting a baffle 15 in the second chamber 113, the second chamber 113 is divided into a separation space 1131 and a washing space 1133. The gas-liquid mixture produced by the hydrogen production device can first enter the separation space 1131 through the inlet pipe 10b and diffuse in the separation space 1131. This allows some impurities such as alkali mixed in the gas-liquid mixture to settle to the bottom of the separation space 1131 under gravity. Then, the gas after a certain degree of gas-liquid separation enters the washing space 1133 through the gas riser pipe 151. The washing mechanism 50 further washes the gas, which is beneficial to more fully separating the gas and impurities such as alkali in the second chamber 113. This allows the gas processing device 100 to output purer gas more stably, further improving the practicality and reliability of the gas processing device 100.

[0054] See Figure 2 , Figure 5 and Figure 7 In one embodiment of this application, the gas processing device 100 further includes a swirl plate 70, which is disposed in the separation space 1131 and forms a spiral flow channel with the inner wall of the separation space 1131. The air inlet pipe 10b is connected to the spiral flow channel.

[0055] In this embodiment, by setting a swirl plate 70 within the separation space 1131, a spiral flow channel can be formed by the swirl plate 70 and the inner wall of the separation space 1131. By connecting the inlet pipe 10b to the spiral flow channel, the gas-liquid mixture can flow along the spiral flow channel into the separation space 1131 and then enter the washing space 1133 from the gas riser pipe 151. This facilitates better utilization of the spiral flow channel to extend the path of the gas-liquid mixture into the separation space 1131, allowing impurities such as alkali mixed in the gas-liquid mixture to fall more effectively into the spiral flow channel, achieving a better gas-liquid separation effect. At this time, the inlet end of the gas riser pipe 151 can be located below the outlet of the spiral flow channel, so that the gas can flow stably through the spiral flow channel before entering the gas riser pipe 151, further reducing the impurities carried in the gas entering the gas riser pipe 151 and improving the practicality and reliability of the gas treatment device 100.

[0056] See Figure 2 , Figure 5 and Figure 7 In one embodiment of this application, a portion of the gas riser pipe 151 is disposed within the separation space 1131, and the swirl plate 70 is connected to the outer wall of the gas riser pipe 151. And / or, the surface of the swirl plate 70 is provided with a hydrophilic coating.

[0057] In this embodiment, the swirl plate 70 can be spirally arranged around the outer wall of the gas riser pipe 151. In this case, the inlet pipe 10b can be positioned above the end of the pipe section of the gas riser pipe 151 within the separation space 1131. This allows the gas-liquid mixture to flow stably through the spiral channel before converging at the outlet of the spiral channel into the gas riser pipe 151, ensuring stable gas-liquid separation within the swirl plate 70. By arranging the swirl plate 70 around the gas riser pipe 151, the gas processing device 100 can achieve a more compact structural configuration. Simultaneously, the gas flowing out from the outlet of the spiral channel can better converge at the middle of the swirl plate 70 before entering the gas riser pipe 151, further extending the gas flow path within the separation space 1131, achieving a more thorough gas-liquid separation effect, and further improving the practicality and reliability of the gas processing device 100.

[0058] In some embodiments, by providing a hydrophilic coating on the surface of the cyclone plate 70, the hydrophilic coating can be used to gather water droplets and reduce water droplet adhesion. This allows impurities such as alkali that fall onto the cyclone plate 70 to be better gathered and slide down the spiral channel from the cyclone plate 70 to the bottom of the separation space 1131. This effectively prevents impurities such as alkali from adhering to the surface of the cyclone plate 70, enabling the gas processing device 100 to better recover and utilize the separated impurities, and further improving the practicality and reliability of the gas processing device 100.

[0059] See Figure 2 and Figure 5 In one embodiment of this application, a portion of the gas riser pipe 151 is disposed within the washing space 1133. The gas riser pipe 151 is provided with a flow guide end cap 1511 and a connecting rod 1513. The flow guide end cap 1511 is disposed within the washing space 1133 and has a diffusion groove. One end of the gas riser pipe 151 is disposed within the diffusion groove, and the connecting rod 1513 connects the inner wall of the diffusion groove and the outer wall of the gas riser pipe 151.

[0060] It is understandable that in the washing space 1133, the washing mechanism 50 can be set above the gas outlet of the gas riser pipe 151 so that the washing mechanism 50 can spray and wash more stably towards the rising gas flow after gas-liquid separation, and further wash the impurities such as alkali mixed in the gas to the bottom of the washing space 1133, so that the gas enters the connecting pipe 131 with higher hydrogen purity, and ensure the purification effect of the gas treatment device 100. At this time, by setting a flow guide end cap 1511 at the end of the gas riser pipe 151 located in the washing space 1133, the flow guide end cap 1511 can have a diffusion groove with a width larger than the diameter of the gas riser pipe 151 on the side facing the gas riser pipe 151. By connecting the inner wall of the diffusion groove and the outer wall of the gas riser pipe 151 with a connecting rod 1513 in the diffusion groove, the flow guide end cap 1511 can be stably installed and fixed at the end of the gas riser pipe 151. Thus, the flow guide end cap 1511 can be used to block the washing liquid sprayed by the washing mechanism 50 from passing through the flow channel separation space 1131 of the gas riser pipe 151. The gas flowing out of the gas riser pipe 151 can be obstructed by the guide end cap 1511 and diffuse along the inner wall of the diffuser groove into the washing space 1133. This facilitates better dispersion and flow of the gas in the washing space 1133, fully utilizes the washing mechanism 50, and reduces the washing blind zone in the washing space 1133. Furthermore, the guide end cap 1511 can reduce the gas flow rate to a certain extent, allowing the gas to flow more smoothly in the washing space 1133 to the separation pipe, achieving better gas washing and treatment effect, and further improving the practicality and reliability of the gas treatment device 100.

[0061] See Figure 2 and Figure 5 In one embodiment of this application, the washing mechanism 50 includes a sprayer 51 and a packing structure 53, wherein the sprayer 51 is located above the packing structure 53 and is used to spray water toward the packing structure 53.

[0062] In this embodiment, the washing mechanism 50 may include a sprayer 51 and a packing structure 53. By placing the sprayer 51 above the packing structure 53, the gas can enter the washing space 1133 and pass through the packing structure 53 and the sprayer 51 in sequence before entering the separation tube. The packing structure 53 can thus slow down the flow of the gas, prolonging the time and path of the gas flow in the washing space 1133. This allows the sprayer 51 to spray water towards the packing structure 53, which can more thoroughly wash away impurities such as alkali carried in the gas, achieving better purification of the gas and ensuring the purity of the gas output by the gas treatment device 100, thereby further improving the practicality and reliability of the gas treatment device 100.

[0063] See Figure 6In one embodiment of this application, the sprayer 51 includes a water supply pipe 511, at least two spray ring pipes 513, and a connecting branch pipe 515. A portion of the water supply pipe 511 passes through the inner wall of the washing space 1133 and the outer wall of the housing 10. At least two spray ring pipes 513 are arranged sequentially and spaced around each other, and each spray ring pipe 513 is provided with a plurality of spray nozzles. The connecting branch pipe 515 connects the water supply pipe 511 and the spray ring pipes 513.

[0064] In this embodiment, the sprayer 51 can arrange part of the water supply pipe 511 in the washing space 1133, and allow another part of the water supply pipe 511 to pass through the inner wall of the washing space 1133 and the outer wall of the housing 10, so that the washing liquid can be stably supplied to the washing space 1133 for washing treatment through the water supply pipe 511. At this time, by setting at least two spray ring pipes 513 arranged in a spaced manner in the washing space 1133, and connecting the water supply pipe 511 and the spray ring pipes 513 with connecting branch pipes 515, the connecting branch pipes 515 can be connected to the spray ring pipes 513 in the middle, and the adjacent spray ring pipes 513 can be connected with connecting branch pipes 515. The washing liquid can be stably delivered to at least two spray ring pipes 513 by the water supply pipes 511, so that the sprayer 51 can spray the washing liquid through the spray nozzles on the spray ring pipes 513, so as to achieve stable washing treatment of the gas by the sprayer 51. The uniform spraying of the washing liquid by using spray ring pipes 513 can make the washed gas flow better through the gap between adjacent spray ring pipes 513 to the connecting pipe 131, ensuring the stable operation of the gas treatment device 100 and further improving the practicality and reliability of the gas treatment device 100. The spray nozzle can be set on the side of the spray ring pipe 513 facing the packing structure 53, so that the sprayer 51 can stably spray the washing liquid towards the packing using gravity, thereby achieving stable and reliable operation of the washing mechanism 50.

[0065] See Figure 5 In one embodiment of this application, the packing structure 53 includes a support plate 531, a pressure plate 533, and a packing body 535. The support plate 531 is connected to the inner wall of the second chamber 113 and has a first flow port. The pressure plate 533 is connected to the inner wall of the second chamber 113 and forms a packing space with the support plate 531 and the inner wall of the second chamber 113. The second pressure plate 533 has a second flow port, and the projection of the second flow port on the support plate 531 is staggered with the first flow port. The packing body 535 fills the packing space.

[0066] In this embodiment, the packing structure 53 can be connected to the inner wall of the second chamber 113 via a support plate 531 and a pressure plate 533 to form a packing space, and a packing body 535 is filled in the packing space. The packing body 535 can be a Pall ring, Raschig ring, arc saddle-shaped or rectangular saddle-shaped packing, etc., so that the packing body 535 can be stably assembled and installed in the washing space 1133, ensuring that the washing mechanism 50 can fully and stably wash the gas. In particular, by providing a first flow port on the support plate 531 and a second flow port on the pressure plate 533, the gas entering the washing space 1133 can stably flow into the packing body 535 from the first flow port, and the gas flow is slowed down by the action of the packing body 535, ensuring that the gas can be more fully washed when passing through the packing body 535, and the washed gas can stably flow out from the second flow port, ensuring the stable operation of the gas treatment device 100 and further improving the structural stability and reliability of the gas treatment device 100.

[0067] By staggering the projection of the second flow port on the support plate 531 along the top-to-bottom direction with the first flow port, the first flow port on the support plate 531 and the second flow port on the pressure plate 533 are not on the same straight line in the vertical direction. The staggered first and second flow ports can prevent the gas from passing through the packing structure 53 quickly in the vertical direction. This allows the packing structure 53 to achieve a better effect of delaying the flow of gas, better separating impurities such as alkali in the gas, and further improving the practicality and reliability of the gas treatment device 100.

[0068] See Figure 1 and Figure 5 In one embodiment of this application, the housing 10 is provided with a first drain pipe 10e that communicates with the washing space 1133, the washing mechanism 50 is provided with a washing circulation pipe 55, the washing circulation pipe 55 is connected to the first drain pipe 10e and the sprayer 51, and the washing circulation pipe 55 is provided with a switch valve 551 and a circulation pump 553.

[0069] In this embodiment, when the washing mechanism 50 sprays washing liquid onto the rising airflow, the washing liquid can wash away impurities such as alkali carried in the airflow, which fall to the bottom of the washing space 1133. At this time, the washing liquid after a certain washing operation may contain fewer impurities. Therefore, by connecting the first drain pipe 10e and the sprayer 51 through the washing circulation pipe 55, and by setting a circulation pump 553 on the washing circulation pipe 55, the relatively pure washing liquid at the bottom of the washing space 1133 can be re-extracted and returned to the scrubber for continued gas washing. This is beneficial for realizing the repeated recycling of water resources, reducing water waste, and further improving the practicality and reliability of the gas treatment device 100.

[0070] When the gas treatment device 100 needs to continuously use clean washing liquid to wash the gas to ensure that the output gas meets the requirement of higher purity, the connection between the first drain pipe 10e and the sprayer 51 can be disconnected by the switch valve 551, and the spray pipe can be stably connected to the washing liquid supply device to ensure a stable supply of clean washing liquid, so that the gas treatment device 100 can better meet the user's needs. When a detection mechanism is installed in the washing space 1133 or on the washing circulation pipe 55, the detection mechanism can also be used to detect the washing liquid falling at the bottom of the washing space 1133. When the detected washing liquid does not meet the washing requirements, the switch valve 551 can be controlled to disconnect the connection between the first drain pipe 10e and the sprayer 51, and the first drain pipe 10e can be connected to the waste liquid collection device to ensure the stable discharge of waste liquid mixed with more impurities, thus achieving a more stable and reliable operation of the gas treatment device 100.

[0071] See Figure 1 In one embodiment of this application, a replenishment branch pipe 555 is provided on the washing circulation pipe 55, which is connected between the switch valve 551 and the circulation pump 553 and is used to connect a water replenishment device. And / or, a pH meter 557 is provided on the washing circulation pipe 55, and the pH meter 557 is located near the first drain pipe 10e. And / or, a condenser 559 is provided on the washing circulation pipe 55.

[0072] In this embodiment, by providing a replenishment branch pipe 555 between the switching valve 551 and the circulating pump 553, when the switching valve 551 disconnects the connection between the first drain pipe 10e and the sprayer 51, the circulating pump 553 draws washing liquid from the external water replenishment device through the replenishment branch pipe 555. This ensures a stable supply of washing liquid to the gas treatment device 100, achieving a more stable and reliable separation and impurity removal effect on the airflow, and further improving the practicality and reliability of the gas treatment device 100. A valve can be installed on the replenishment branch pipe 555 to control its opening and closing, allowing the user to adjust the valves on the replenishment branch pipe 555 and the switching valve 551 according to washing needs, ensuring a sufficient supply of washing liquid and further improving the purification effect of the gas treatment device 100.

[0073] In some embodiments, by installing a pH meter 557 on the washing circulation pipe 55, the pH of the liquid discharged from the first drain pipe 10e can be detected by the pH meter 557. Then, based on the detection result, it can be determined whether the washing liquid at the bottom of the washing space 1133 meets the requirements for continued washing, thereby realizing the on / off control of the switch valve 551, ensuring the stable washing of the gas by the washing mechanism 50, and further improving the practicality and reliability of the gas treatment device 100.

[0074] Furthermore, in some embodiments, since the airflow temperature entering the washing space 1133 is relatively high, the washing liquid falling into the washing space 1133 is typically also at a high temperature. By installing a condenser 559 on the washing circulation pipe 55, the condenser 559 can cool and exchange heat with the washing liquid flowing from the first drain pipe 10e to the sprayer 51. This allows the sprayer 51 to use the lower-temperature washing liquid to wash the airflow, which is beneficial for the washing mechanism 50 to cool the airflow and further improves the practicality and reliability of the gas treatment device 100. The condenser 559 and the circulation pump 553 can be sequentially arranged along the liquid flow direction on the washing circulation pipe 55, allowing the washing liquid to pass through the condenser 559 first and then through the circulation pump 553. This helps reduce the impact of high temperatures on the circulation pump 553, ensuring stable operation and extending its service life.

[0075] See Figure 1 In one embodiment of this application, the gas processing device 100 is further provided with a system separator 90, the system separator 90 is provided with a first recovery pipe 91, and the first recovery pipe 91 is connected to the washing circulation pipe 55.

[0076] In this embodiment, the gas treatment device 100 may also be equipped with a system separator 90. The system separator 90 may be a storage tank, collection bottle or waste liquid treatment equipment with a certain storage capacity. The system separator 90 can be used to recover the liquid mixed with impurities such as alkali generated during the operation of the gas treatment device 100, realize the collection and discharge of waste liquid of the gas treatment device 100, prevent the random discharge of waste liquid of the gas treatment device 100 which may have a certain probability of affecting the environment, and further improve the practicality and reliability of the gas treatment device 100.

[0077] By connecting the first recovery pipe 91 to the washing circulation pipe 55 on the system separator 90, when the washing liquid at the bottom of the washing space 1133 fails to meet the washing requirements, the waste liquid can be recovered back to the system separator 90 through the washing circulation pipe 55 and the first recovery pipe 91, ensuring stable waste liquid recovery and utilization of the gas treatment device 100. At this time, a valve can be installed on the first recovery pipe 91 to control its opening and closing. This allows the gas treatment device 100 to stably disconnect the first recovery pipe 91 when utilizing the washing circulation pipe 55 for washing liquid recycling, and stably open the valve on the first recovery pipe 91 when the switching valve 551 disconnects the washing circulation pipe 55, ensuring stable waste liquid return to the system separator 90, further improving the structural stability and reliability of the gas treatment device 100.

[0078] Furthermore, it is understood that in some embodiments, the system separator 90 may have a gas-liquid inlet and an alkali return port connected to the electrolyzer of the hydrogen production unit. This allows the gas-liquid mixture generated by the electrolyzer to first flow into the system separator, where it undergoes preliminary gas-liquid separation and purification. The gas from the system separator 90 is then fed into the gas treatment device 100 via the gas outlet pipe 95 and the inlet pipe 10b for further processing. The alkali return port allows a portion of the alkali generated in the hydrogen production system to return to the system separator 90, facilitating more thorough purification of the gas generated by the hydrogen production system and further improving the practicality and reliability of the system separator 90.

[0079] See Figure 1 In one embodiment of this application, the housing 10 is further provided with a second drain pipe 10f that connects to the separation area, and the system separator 90 is further provided with a second recovery pipe 93, which is connected to the second drain pipe 10f.

[0080] In this embodiment, by providing a second drain pipe 10f at the bottom of the housing 10 to connect the separation area, the impurities and waste liquid that fall to the bottom of the separation space 1131 under gravity can be collected back into the system separator 90 through the second drain pipe 10f and the second recovery pipe 93, ensuring stable and convenient discharge of waste liquid in the separation space 1131, and further improving the structural stability and reliability of the gas treatment device 100. The first recovery pipe 91 and the second recovery pipe 93 can collect waste liquid into two independent chambers of the system separator 90, achieving better classification and collection of waste liquid. When the washing mechanism 50 uses clean water for washing, the waste liquid collected by the first recovery pipe 91 and the waste liquid collected by the second recovery pipe 93 can be stored in one chamber, achieving overall waste liquid collection and discharge of the system separator 90, which helps to simplify the overall structure of the system separator 90.

[0081] See Figure 1 In one embodiment of this application, the system separator 90 is further provided with an exhaust pipe 95, which is connected to the intake pipe 10b.

[0082] It is understandable that the waste liquid collected and recovered into the system separator 90 may still contain a certain amount of gas to be separated. Therefore, by setting an outlet pipe 95 connected to the inlet pipe 10b on the system separator 90, the gas generated by static separation in the system separator 90 can be input into the housing 10 for processing through the outlet pipe 95, so as to achieve full purification of the gas generated by the hydrogen production device, reduce the waste of the produced gas, and further improve the practicality and reliability of the gas treatment device 100.

[0083] See Figure 2 and Figure 4In one embodiment of this application, the housing 10 is further provided with an air outlet baffle 17, which is connected to the inner wall of the first chamber 111 and is located between the cooling mechanism 30 and the air outlet pipe 10a.

[0084] In this embodiment, by setting an outlet baffle 17 between the cooling mechanism 30 and the outlet pipe 10a, the outlet baffle 17 can prevent condensate dripping from the cooling mechanism 30 near the outlet pipe 10a from being carried by the airflow into the outlet pipe 10a. This better avoids moisture entrainment in the gas output by the gas treatment device 100, allowing the gas treatment device 100 to output purer gas more stably, further improving the practicality and reliability of the gas treatment device 100. The outlet baffle 17 can be made of an L-shaped bent plate or an arc-shaped plate, which helps to better prevent water droplets from flowing obliquely into the outlet pipe 10a. Simultaneously, the cooled airflow can bypass the outlet baffle 17 before entering the outlet pipe 10a, allowing the airflow to remove entrained moisture during the bypass process. This further reduces the moisture carried in the gas output by the gas treatment device 100, achieving a better separation and purification effect.

[0085] See Figure 2 and Figure 4 In one embodiment of this application, the housing 10 is further provided with a condensate drain pipe 10g, which is connected to the first chamber 111.

[0086] In this embodiment, by providing a condensate drain pipe 10g on the housing 10 that connects to the first chamber 111, the condensate dripping from the cooling device onto the bottom of the first chamber 111 can be drained more stably and quickly through the condensate drain pipe 10g. This prevents excessive condensate accumulation in the first chamber 111 from flowing back into the gas outlet pipe 10a or the cooling mechanism 30, ensuring the stable and reliable operation of the gas treatment device 100. At the same time, the condensate drain pipe 10g allows for condensate drainage without removing the housing 10, enabling a more convenient operation of the gas treatment device 100 and further improving its practicality and reliability.

[0087] See Figure 1 and Figure 2 In one embodiment of this application, the housing 10 is provided with fixing ears 19a, which are installed on opposite sides of the housing 10. Alternatively, the housing 10 is provided with a bracket 19b, which is installed on the bottom of the housing 10.

[0088] In some embodiments, the gas processing device 100 may be provided with fixing lugs 19a on opposite sides of the housing 10. The fixing lugs 19a can be used to connect and install the gas processing device 100 on the frame of the hydrogen production system, thereby achieving stable installation of the gas processing device 100, ensuring stable operation of the gas processing device 100, and further improving the practicality and reliability of the gas processing device 100.

[0089] In other embodiments, the gas processing device 100 can be mounted on a bracket 19b at the bottom of the housing 10. The bracket 19b can provide some support for the housing 10 and can be used to fix the gas processing device 100 to the frame of the hydrogen production system to achieve stable installation and ensure stable operation of the gas processing device 100, thereby further improving the practicality and reliability of the gas processing device 100.

[0090] This application also proposes a hydrogen production system, which includes a hydrogen production device, a gas processing device 100, and a collection device. The specific structure of the gas processing device 100 is as described in the above embodiments. Since this hydrogen production system adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0091] The above description is merely an exemplary embodiment of this application and does not limit the patent scope of this application. Any equivalent structural transformations made based on the technical concept of this application and the contents of the specification and drawings of this application, or direct / indirect applications in other related technical fields, are included within the patent protection scope of this application.

Claims

1. A gas processing device, characterized in that, include: The housing has a partition that divides the inner cavity of the housing into a first chamber and a second chamber. The first chamber is located above the second chamber. The partition has a connecting pipe that connects the first chamber and the second chamber. The connecting pipe has a first pipe end and a second pipe end that are opposite each other. The first pipe end is located inside the first chamber. A cooling mechanism is disposed within the first chamber; The housing is provided with an air outlet pipe communicating with the first chamber and an air inlet pipe communicating with the second chamber. The first pipe end is located above the air outlet pipe, and the cooling mechanism is located between the first pipe end and the air outlet pipe.

2. The gas processing apparatus as described in claim 1, characterized in that, The connecting pipe is provided with a distribution pipe head and a wire mesh. The distribution pipe head is connected to the first pipe end. Multiple flow outlets are provided at intervals on the outer periphery of the distribution pipe head. The wire mesh is surrounded on the inner or outer wall of the distribution pipe head.

3. The gas processing apparatus as described in claim 2, characterized in that, The cooling mechanism includes: Upper tube sheet, the upper tube sheet being connected to the inner wall of the first chamber; The lower tube sheet is connected to the inner wall of the first chamber and is spaced apart from the upper tube sheet. The lower tube sheet, the upper tube sheet and the inner wall of the first chamber enclose a heat exchange space. A heat exchange tube is disposed between the upper tube sheet and the lower tube sheet, with both ends of the heat exchange tube passing through the upper tube sheet and the lower tube sheet respectively.

4. The gas processing apparatus as described in claim 3, characterized in that, The housing is provided with a coolant inlet pipe and a coolant outlet pipe, which are respectively connected to the heat exchange space; And / or, the inner wall of the heat exchange tube is provided with a hydrophilic coating.

5. The gas processing apparatus as described in claim 1, characterized in that, The housing is also provided with a baffle plate, which is located in the second chamber and divides the second chamber into a separation space and a washing space. The air inlet pipe is connected to the separation space. The gas treatment device further includes a washing mechanism located in the washing space, and the baffle plate is provided with a gas riser pipe connecting the separation space and the washing space.

6. The gas processing apparatus as described in claim 5, characterized in that, The gas processing device further includes a swirl plate, which is disposed within the separation space and forms a spiral flow channel with the inner wall of the separation space. The air inlet pipe is connected to the spiral flow channel.

7. The gas processing apparatus as described in claim 6, characterized in that, A section of the gas riser is located within the separation space, and the swirl plate is connected to the outer wall of the gas riser. And / or, the surface of the swirl plate is provided with a hydrophilic coating.

8. The gas processing apparatus as described in claim 5, characterized in that, A section of the gas riser is located within the washing space. The gas riser is equipped with a flow guide end cap and a connecting rod. The flow guide end cap is located within the washing space and is equipped with a diffusion groove. One end of the gas riser is located inside the diffusion groove, and the connecting rod connects the inner wall of the diffusion groove and the outer wall of the gas riser.

9. The gas processing apparatus as described in claim 5, characterized in that, The washing mechanism includes a sprayer and a packing structure, wherein the sprayer is located above the packing structure and is used to spray water toward the packing structure.

10. The gas processing apparatus as described in claim 9, characterized in that, The housing is provided with a first drain pipe that connects to the washing space, and the washing mechanism is provided with a washing circulation pipe that connects the first drain pipe and the sprayer. The washing circulation pipe is provided with a switch valve and a circulation pump.

11. The gas processing apparatus as described in claim 10, characterized in that, The washing circulation pipeline is provided with a replenishment branch pipe, which is connected between the switch valve and the circulation pump and is used to connect the water replenishment device. And / or, the washing circulation pipe is equipped with an acid-base meter, which is located near the first drain pipe; And / or, a condenser is provided on the washing circulation pipeline.

12. The gas processing apparatus as described in claim 10, characterized in that, The gas processing device is further provided with a system separator, which has a first recovery pipe connected to the washing circulation pipeline.

13. The gas processing apparatus as described in claim 12, characterized in that, The housing is also provided with a second drain pipe that communicates with the separation space, and the system separator is also provided with a second recovery pipe that is connected to the second drain pipe.

14. The gas processing apparatus as described in claim 12, characterized in that, The system separator is also provided with an exhaust pipe, which is connected to the intake pipe.

15. The gas processing apparatus according to any one of claims 1 to 14, characterized in that, The housing is also provided with an air outlet baffle, which is connected to the inner wall of the first chamber and located between the cooling mechanism and the air outlet pipe.

16. A hydrogen production system, characterized in that, The hydrogen production system includes a hydrogen production device, a gas processing device, and a collection device. The gas processing device is the gas processing device according to any one of claims 1 to 15. The hydrogen production device and the collection device are respectively connected to the gas processing device via pipelines.

Images