Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus (100) includes a nozzle (136), a supply unit (135), a liquid return unit (160), a near-infrared light source (140), a near-infrared imaging unit (150), and a control unit (102). The nozzle (136) supplies the processing liquid (L) to the substrate (W). The supply unit (135) supplies the processing liquid (L) to the nozzle (136). The near-infrared light source (140) irradiates a region including the tip (136a) of the nozzle (136) with near-infrared light. The control unit (102) stops the supply of the processing liquid (L) by the supply unit (135), and returns the processing liquid (L) in the nozzle (136) to the upstream side by the liquid return unit (160). The control unit (102) captures an image of the processing liquid (L) moving upstream in the nozzle (136) by means of the near-infrared imaging unit (150). The control unit (102) determines the position of the outer edge of the processing liquid (L) in the nozzle (136) on the basis of the captured image.

Description

Technical Field

[0001] This disclosure relates to a substrate processing apparatus and a substrate processing method. Background Technology

[0002] Substrate processing apparatuses are known to process substrates by supplying processing liquid to the substrate (for example, see Patent Document 1). Patent Document 1 describes a substrate processing apparatus comprising: a supply nozzle for supplying processing liquid to the substrate; a piping for supplying the processing liquid to the supply nozzle; and a supply valve disposed on the piping. The supply valve functions as a backflow valve. The supply valve has the following function: when processing liquid is not supplied from the supply nozzle, it creates a negative pressure in the suction chamber, drawing the leading edge of the processing liquid from the leading edge of the supply nozzle.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2020-126886 Summary of the Invention

[0006] The problem that the invention aims to solve

[0007] In the substrate processing apparatus described in Patent Document 1, when the processing liquid is not supplied from the supply nozzle, the back suction valve suppresses the dripping of the processing liquid from the supply nozzle by drawing the front end of the processing liquid from the front end of the supply nozzle.

[0008] However, when switching the backflow valve, it is difficult to confirm whether the processing fluid in the supply nozzle is being properly drawn back. Specifically, since the processing fluid used for substrate processing is usually transparent, a typical CCD (Charge Coupled Device) camera cannot detect it. Therefore, it is sometimes impossible to accurately determine the processing fluid in the supply nozzle. Hereinafter, the situation where the processing fluid in the nozzle is sometimes drawn back upstream is described as backflow.

[0009] The present invention was made in view of the above-mentioned problems, and its object is to provide a substrate processing apparatus and a substrate processing method capable of accurately determining the processing liquid in the processing liquid nozzle during the back suction process.

[0010] Technical means to solve the problem

[0011] According to one aspect of the present invention, a substrate processing apparatus includes: a substrate holding section, a processing liquid nozzle, a supply section, a liquid recirculation section, a near-infrared light source, a near-infrared imaging section, and a control section. The substrate holding section holds a substrate and rotates the substrate. The processing liquid nozzle supplies processing liquid to the upper surface of the substrate. The supply section supplies the processing liquid to the processing liquid nozzle. The liquid recirculation section draws the processing liquid within the processing liquid nozzle upstream. The near-infrared light source irradiates an area including the tip of the processing liquid nozzle with near-infrared light. The near-infrared imaging section generates an image of the processing liquid irradiated by the near-infrared light from the near-infrared light source. The control section controls the supply section, the liquid recirculation section, and the near-infrared imaging section. The control section stops supplying the processing liquid using the supply section and draws the processing liquid within the processing liquid nozzle upstream using the liquid recirculation section. The control section uses the near-infrared imaging section to image the processing liquid moving upstream within the processing liquid nozzle. The control unit determines the position of the outer edge of the treatment liquid inside the treatment liquid nozzle based on the captured image.

[0012] In one embodiment, the control unit determines the position of the downstream edge of the processing liquid within the processing liquid nozzle based on the captured image.

[0013] In one embodiment, the control unit calculates the speed at which the treatment fluid moves upstream within the treatment fluid nozzle based on the determined position of the downstream edge of the treatment fluid.

[0014] In one embodiment, after a predetermined time has elapsed since the liquid reflux unit began to reflux the processing liquid upstream within the processing liquid nozzle, the control unit uses the near-infrared imaging unit to capture an image of the processing liquid moving upstream within the nozzle. The control unit calculates the speed based on the determined position of the downstream edge of the processing liquid and the predetermined time.

[0015] In one embodiment, the control unit calculates the distance from the tip of the processing fluid nozzle to the downstream edge of the processing fluid based on the captured image. The control unit then calculates the speed based on the calculated distance and the predetermined time.

[0016] In one embodiment, the control unit uses the near-infrared imaging unit to take multiple images of the treatment liquid moving upstream within the treatment liquid nozzle at predetermined time intervals. The control unit calculates the speed based on the position of the downstream edge of the treatment liquid in the multiple captured images and the predetermined time.

[0017] In one embodiment, the treatment fluid nozzle has a liquid flow path through which the treatment fluid passes. The control unit determines the centerline of the liquid flow path based on the captured image. The control unit calculates the speed based on the length by which the downstream edge of the treatment fluid moves along the centerline of the liquid flow path and the predetermined time.

[0018] In one embodiment, the control unit determines whether an abnormality has occurred based on the determined position of the outer edge of the processing liquid. If the control unit determines that an abnormality has occurred, it changes at least one of the timing of starting to draw the processing liquid upstream and the timing of stopping to draw the processing liquid upstream, based on the determined position of the outer edge of the processing liquid.

[0019] In one embodiment, the control unit determines the type of the treatment liquid based on the captured image.

[0020] In one embodiment, the near-infrared light source includes a plurality of near-infrared light sources emitting near-infrared rays with different peak wavelengths. The control unit acquires type information indicating the type of the treatment liquid. Based on the acquired type information, the control unit changes the near-infrared light source irradiating the area including the tip of the treatment liquid nozzle.

[0021] According to another aspect of the present invention, a substrate processing method includes the following steps: holding a substrate and rotating the substrate; supplying a processing liquid to a processing liquid nozzle and supplying the processing liquid from the processing liquid nozzle to an upper surface of the substrate; after stopping the supply of the processing liquid, guiding the processing liquid in the processing liquid nozzle upstream; irradiating an area including the tip of the processing liquid nozzle with near-infrared light; generating an image of the processing liquid irradiated by the near-infrared light and moving upstream within the processing liquid nozzle; and determining the position of the outer edge of the processing liquid within the processing liquid nozzle based on the image.

[0022] In one embodiment, during the defined process, the position of the downstream edge of the treatment fluid within the treatment fluid nozzle is determined based on the captured image.

[0023] In one embodiment, the substrate processing method includes the step of calculating the speed at which the processing liquid moves upstream within the processing liquid nozzle based on the determined position of the downstream edge of the processing liquid.

[0024] In one embodiment, during the process of generating the captured image, after a predetermined time has elapsed since the processing liquid in the processing liquid nozzle began to flow back upstream, the processing liquid moving upstream in the processing liquid nozzle is captured on a photograph. In the calculation process, the speed is calculated based on the determined position of the downstream edge of the processing liquid and the predetermined time.

[0025] In one embodiment, during the calculation process, the distance from the tip of the treatment fluid nozzle to the downstream edge of the treatment fluid is calculated based on the captured image, and the speed is calculated based on the calculated distance and the predetermined time.

[0026] In one embodiment, during the process of generating the captured images, the processing fluid moving upstream within the nozzle is captured multiple times at predetermined time intervals. During the calculation process, the speed is calculated based on the position of the downstream edge of the processing fluid in the multiple captured images and the predetermined time.

[0027] In one embodiment, in the determined step, the centerline of the liquid flow path through which the treatment fluid passes by the treatment fluid nozzle is determined based on the captured image, and in the calculated step, the speed is calculated based on the length by which the downstream edge of the treatment fluid moves along the centerline of the liquid flow path and the predetermined time.

[0028] In one embodiment, the substrate processing method includes the following steps: determining whether an abnormality has occurred based on the determined position of the outer edge of the processing liquid; and if the abnormality is determined to have occurred, changing at least one of the timing of starting to draw the processing liquid back upstream and the timing of stopping to draw the processing liquid back upstream based on the determined position of the outer edge of the processing liquid.

[0029] In one embodiment, during the determination process, the type of the treatment liquid is determined based on the captured image.

[0030] In one embodiment, the near-infrared light source includes a plurality of near-infrared light sources emitting near-infrared rays having different peak wavelengths. The substrate processing method includes the steps of: acquiring type information indicating the type of the processing liquid; and changing the near-infrared light source irradiating the area including the tip of the processing liquid nozzle based on the acquired type information.

[0031] Invention Effects

[0032] According to the present invention, a substrate processing apparatus and a substrate processing method are provided that can accurately determine the processing liquid in the processing liquid nozzle during the back suction process. Attached Figure Description

[0033] Figure 1 This is a schematic top view of the substrate processing apparatus of this embodiment.

[0034] Figure 2 This is a schematic diagram of a substrate processing unit in a substrate processing apparatus.

[0035] Figure 3 This is a block diagram of a substrate processing apparatus.

[0036] Figure 4 This is a flowchart of the substrate processing method of this embodiment.

[0037] Figure 5 This is a schematic diagram showing the configuration of the liquid reflux section surrounding the substrate processing apparatus of this embodiment.

[0038] Figure 6 This is a schematic diagram showing the front end of the nozzle during the back suction process.

[0039] Figure 7 This is a schematic diagram showing the front end of the nozzle during the back suction process.

[0040] Figure 8 This is a schematic diagram showing the front end of the nozzle during the back suction process.

[0041] Figure 9 This is a schematic diagram showing the front end of the nozzle during the back suction process.

[0042] Figure 10 This is a schematic diagram showing the front end of the nozzle during the back suction process.

[0043] Figure 11 This is a schematic diagram illustrating the separation of the treatment liquid within the nozzle during the back suction process.

[0044] Figure 12 This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment.

[0045] Figure 13 This is a schematic diagram of a substrate processing unit in a substrate processing apparatus equipped with a plurality of near-infrared light sources.

[0046] Figure 14 This is a flowchart of a substrate processing procedure in an example of near-infrared light sources, including a plurality of near-infrared light sources. Detailed Implementation

[0047] Hereinafter, embodiments of the substrate processing apparatus and substrate processing method of the present invention will be described with reference to the accompanying drawings. Furthermore, the same or equivalent parts are labeled with the same reference numerals in the drawings, and will not be described repeatedly. In addition, in this specification, for ease of understanding of the invention, mutually orthogonal X-axis, Y-axis, and Z-axis are sometimes described. Typically, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0048] First, refer to Figure 1 The substrate processing apparatus 100 of this embodiment will be described. Figure 1 This is a schematic top view of the substrate processing apparatus 100.

[0049] like Figure 1 As shown, the substrate processing apparatus 100 processes the substrate W. The substrate processing apparatus 100 processes the substrate W by means of at least one of etching, surface treatment, property imparting, processing film formation, removal of at least a portion of the film, and cleaning.

[0050] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W is generally circular. Here, the substrate processing apparatus 100 processes the substrate W one by one.

[0051] like Figure 1 As shown, the substrate processing apparatus 100 includes: a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid tank 10B, a plurality of loading ports LP, a transfer robot IR, a central robot CR, and a control device 101. The control device 101 controls the loading ports LP, the transfer robot IR, the central robot CR, and the substrate processing units 110.

[0052] Each loading port LP stacks and accommodates multiple substrates W. A transfer robot IR transports the substrates W between the loading port LP and the central robot CR. Alternatively, the device can be configured such that a temporary mounting platform (path) for the substrates W is provided between the transfer robot IR and the central robot CR, and the substrates W are indirectly transferred between the transfer robot IR and the central robot CR via the mounting platform. The central robot CR transports the substrates W between the transfer robot IR and the substrate processing unit 110. Each substrate processing unit 110 sprays processing liquid onto the substrates W to process them. A fluid tank 10A contains the processing liquid. Alternatively, the fluid tank 10A can also contain gas.

[0053] A plurality of substrate processing units 110 are formed to form a plurality of towers TW (TWs) arranged in a manner that surrounds the central robot CR when viewed from above. Figure 1 There are 4 towers (TW). Each tower (TW) includes upper and lower stacked substrate processing units 110 ( Figure 1There are three substrate processing units 110 in the middle. Fluid tanks 10B correspond to a plurality of towers TW. The processing liquid in the fluid tank 10A is supplied to all substrate processing units 110 in the tower TW corresponding to any fluid tank 10B via any fluid tank 10B. In addition, the gas in the fluid tank 10A is supplied to all substrate processing units 110 in the tower TW corresponding to any fluid tank 10B via any fluid tank 10B.

[0054] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 may, for example, have a central processing unit (CPU). Alternatively, the control unit 102 may also have a general-purpose computer.

[0055] The storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may also include a removable medium. The control unit 102 executes the computer program stored in the storage unit 104 to perform board processing operations.

[0056] Storage unit 104 stores data. This data includes process recipe data. The process recipe data includes information representing a plurality of process recipes. Each of the plurality of process recipes specifies the processing content and sequence for substrate W.

[0057] Alternatively, the storage unit 104 may also store the luminance value or brightness of the reference processing fluid. Or, the storage unit 104 may also store the reference image obtained by capturing the reference processing fluid.

[0058] Next, refer to Figure 2 The substrate processing unit 110 in the substrate processing apparatus 100 of this embodiment will be described. Figure 2 This is a schematic diagram of the substrate processing unit 110 in the substrate processing apparatus 100.

[0059] The substrate processing unit 110 includes a chamber 112, a substrate holding section 120, a processing liquid supply section 130, a near-infrared light source 140, and a near-infrared imaging section 150. The chamber 112 accommodates at least a portion of the substrate holding section 120, the processing liquid supply section 130, the near-infrared light source 140, and the near-infrared imaging section 150.

[0060] The chamber 112 is generally box-shaped with an internal space. The chamber 112 accommodates the substrate W. Here, the substrate processing unit 110 is a monolithic type that processes the substrate W one by one, accommodating the substrate W one by one in the chamber 112. The substrate W is accommodated in the chamber 112 and processed within the chamber 112.

[0061] The substrate holding portion 120 holds the substrate W. The substrate holding portion 120 holds the substrate W horizontally such that the upper surface (front side) Wa of the substrate W faces upward and the lower surface (back side) Wb of the substrate W faces vertically downward. Furthermore, the substrate holding portion 120 rotates the substrate W while holding it. The upper surface Wa of the substrate W may also be planarized. Alternatively, a device surface or a columnar laminate with recesses may be provided on the upper surface Wa of the substrate W. The substrate holding portion 120 rotates the substrate W while holding it.

[0062] For example, the substrate holding portion 120 may be a clamping type that clamps the end of the substrate W. Alternatively, the substrate holding portion 120 may have any mechanism for holding the substrate W from the lower surface Wb. For example, the substrate holding portion 120 may also be a vacuum type. In this case, the substrate holding portion 120 holds the substrate W horizontally by adsorbing the central portion of the lower surface Wb of the substrate W (the non-device forming surface) onto the upper surface. Alternatively, the substrate holding portion 120 may combine a clamping type that contacts a plurality of clamping pins with the peripheral end face of the substrate W and a vacuum type.

[0063] For example, the substrate holding portion 120 includes a rotating base 121, a clamping member 122, a shaft 123, an electric motor 124, and a housing 125. The clamping member 122 is disposed on the rotating base 121. The clamping member 122 clamps the substrate W. Typically, a plurality of clamping members 122 are disposed on the rotating base 121.

[0064] Shaft 123 is a hollow shaft. Shaft 123 extends vertically along the rotation axis Ax. A rotating base 121 is attached to the upper end of shaft 123. The substrate W is placed above the rotating base 121.

[0065] The rotating base 121 is circular. A clamping member 122 horizontally supports the substrate W. A shaft 123 extends downward from the center of the rotating base 121. An electric motor 124 imparts rotational force to the shaft 123. The electric motor 124 rotates the substrate W and the rotating base 121 about the rotation axis Ax by rotating the shaft 123 in the rotational direction. A housing 125 surrounds the shaft 123 and the electric motor 124.

[0066] The processing liquid supply unit 130 supplies processing liquid to the substrate W. Typically, the processing liquid supply unit 130 supplies processing liquid to the upper surface Wa of the substrate W held by the substrate holding unit 120. In addition, the processing liquid supply unit 130 may also supply a plurality of processing liquids to the substrate W.

[0067] The processing solution can be an etching solution used to etch the substrate W. Examples of etching solutions include fluoronitric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of etching solution is not particularly limited; it can be acidic or alkaline.

[0068] Alternatively, the treatment fluid can also be a rinsing fluid. Examples of rinsing fluids include: deionized water (DIW), carbonated water, electrolyzed ionized water, ozone water, ammonia water, diluted hydrochloric acid water, and reduced water (hydrogen water).

[0069] Alternatively, the treatment solution can also be an organic solvent. Typically, organic solvents are more volatile than rinsing solutions. Examples of organic solvents include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoro ether (HFE), propylene glycol ethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0070] The processing fluid supply unit 130 includes a piping 132, a valve 134, a nozzle 136, and a moving mechanism 138. Furthermore, the nozzle 136 is an example of the "processing fluid nozzle" of the present invention. Processing fluid from a supply source flows through the piping 132. The valve 134 opens and closes the flow path within the piping 132. The nozzle 136 is connected to the piping 132. In this embodiment, the piping 132 and the valve 134 constitute a supply unit 135 for supplying processing fluid to the nozzle 136. Furthermore, the supply unit 135 may also include, for example, a pump (not shown) for conveying processing fluid from a supply source. By allowing the processing fluid to flow through the nozzle 136, the nozzle 136 sprays the processing fluid onto the upper surface Wa of the substrate W. The nozzle 136 is preferably configured to be movable relative to the substrate W.

[0071] Pipe 132 and nozzle 136 comprise resin. Nozzle 136 allows near-infrared light emitted from near-infrared light source 140 to pass through. In this embodiment, pipe 132 and nozzle 136 allow near-infrared light emitted from near-infrared light source 140 to pass through. Pipe 132 and nozzle 136 are not particularly limited and may be formed of, for example, PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0072] The moving mechanism 138 moves the nozzle 136 in both the horizontal and vertical directions. Specifically, the moving mechanism 138 moves the nozzle 136 circumferentially about a rotation axis extending in the vertical direction. Additionally, the moving mechanism 138 causes the nozzle 136 to move up and down in the vertical direction.

[0073] The moving mechanism 138 has an arm 138a, a shaft portion 138b, and a drive portion 138c. The arm 138a extends horizontally. A nozzle 136 is disposed at the front end of the arm 138a. The nozzle 136 is disposed at the front end of the arm 138a in an orientation that allows it to supply processing liquid toward the upper surface Wa of the substrate W held by the clamping member 122. Specifically, the nozzle 136 is attached to the front end of the arm 138a and protrudes downward from the arm 138a. The base end of the arm 138a is attached to the shaft portion 138b. The shaft portion 138b extends vertically.

[0074] The drive unit 138c includes a rotary drive mechanism and a lifting drive mechanism. The rotary drive mechanism of the drive unit 138c rotates the shaft 138b about its rotation axis and causes the arm 138a to rotate horizontally about the shaft 138b. As a result, the nozzle 136 moves horizontally. Specifically, the nozzle 136 moves circumferentially about the shaft 138b. The rotary drive mechanism of the drive unit 138c includes, for example, a motor capable of both forward and reverse rotation.

[0075] The lifting drive mechanism of the drive unit 138c causes the shaft 138b to move up and down in the vertical direction. By raising and lowering the shaft 138b via the lifting drive mechanism of the drive unit 138c, the nozzle 136 also moves up and down in the vertical direction. The lifting drive mechanism of the drive unit 138c includes a drive source such as a motor and a lifting mechanism. The drive source drives the lifting mechanism, causing the shaft 138b to rise or fall. The lifting mechanism may include, for example, a rack / pinion mechanism or a ball screw.

[0076] The near-infrared light source 140 emits at least near-infrared rays. The near-infrared light source 140 irradiates an area including the tip 136a of the nozzle 136 using near-infrared rays. The near-infrared light source 140 may also irradiate the nozzle 136 and a portion of the piping 132 using near-infrared rays. Additionally, the near-infrared light source 140 may also irradiate at least a portion of the nozzle 136 and the substrate W using near-infrared rays. The near-infrared light source 140 irradiates an area including the portion of the nozzle 136 extending from the tip 136a to the upstream side (piping 132 side), for example, 10 mm or more and 200 mm or less.

[0077] For example, the near-infrared light source 140 emits near-infrared light with wavelengths ranging from 800 nm to 2.5 μm. Typically, the near-infrared light source 140 emits near-infrared light with wavelengths ranging from 800 nm to 1.5 μm. Furthermore, the near-infrared light source 140 may also emit near-infrared light and visible light.

[0078] For example, the near-infrared light emitted from the near-infrared light source 140 travels in a straight line along the optical axis. Alternatively, the near-infrared light emitted from the near-infrared light source 140 travels while spreading out around the optical axis. Preferably, the near-infrared light source 140 is arranged such that its optical axis passes through the nozzle 136.

[0079] The near-infrared imaging unit 150 has a plurality of pixels. The near-infrared imaging unit 150 is sensitive to at least near-infrared light. The near-infrared imaging unit 150 generates an image by receiving components of near-infrared light emitted from the near-infrared light source 140 that are transmitted through the nozzle 136, piping 132, and substrate W, and / or reflected. Therefore, the near-infrared imaging unit 150 is capable of generating an image by photographing the processing liquid irradiated by near-infrared light emitted from the near-infrared light source 140.

[0080] The near-infrared imaging unit 150 images the area including the tip 136a of the nozzle 136. The near-infrared imaging unit 150 can also image the nozzle 136 and a portion of the piping 132. Additionally, the near-infrared imaging unit 150 can also image the nozzle 136 and at least a portion of the substrate W. Furthermore, the near-infrared imaging unit 150 can also image the entire chamber 112. The area imaged by the near-infrared imaging unit 150 may not be the same as the area illuminated by the near-infrared light source 140.

[0081] In the near-infrared imaging unit 150, the frame rate can be 30fps or 60fps. Alternatively, the frame rate can be 120fps.

[0082] The near-infrared imaging unit 150 may also include a SWIR (Short Wavelength Infrared) image sensor. In this case, the near-infrared imaging unit 150 may detect near-infrared light with wavelengths ranging from 800 nm to 2.5 μm.

[0083] Furthermore, the near-infrared imaging unit 150 may be sensitive not only to near-infrared light but also to visible light. Alternatively, the near-infrared imaging unit 150 may switch between receiving near-infrared and visible light.

[0084] The near-infrared imaging unit 150 captures images around a central imaging optical axis. Typically, the imaging optical axis is located at the center of the captured image. For example, the center of the captured image by the near-infrared imaging unit 150 may be located at the nozzle 136. In this case, the imaging optical axis of the near-infrared imaging unit 150 is located at the nozzle 136. Alternatively, the center of the captured image by the near-infrared imaging unit 150 may also be located at the piping 132 or the substrate W.

[0085] The near-infrared imaging unit 150 generates an image of the front end portion of the nozzle 136, including the front end 136a. Preferably, the processing liquid within the nozzle 136 can be determined based on the image. For example, it is preferable to be able to determine the position of the outer edge of the processing liquid moving within the nozzle 136 based on the image. Alternatively, it is preferable to be able to determine the position of the downstream edge of the processing liquid moving within the nozzle 136 based on the image. Or, it is preferable to be able to determine the outer edge of the processing liquid dripping from the nozzle 136 onto the substrate W based on the image. Furthermore, it is preferable to be able to determine the position of the outer edge of the processing liquid moving within the piping 132 based on the image.

[0086] When viewed from above the substrate processing unit 110, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 pass through the nozzle 136. Alternatively, when viewed from above the substrate processing unit 110, the near-infrared light source 140 and the near-infrared imaging unit 150 may be positioned on opposite sides, separated by the nozzle 136. Furthermore, when viewed from above the substrate processing unit 110, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may be aligned or parallel. Additionally, when viewed from above the substrate processing unit 110, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may not be parallel.

[0087] Here, the near-infrared light source 140 and the near-infrared imaging unit 150 are disposed inside the chamber 112. The near-infrared light source 140 and the near-infrared imaging unit 150 may also be fixed to each other.

[0088] The near-infrared light source 140 and the near-infrared imaging unit 150 can also be movable relative to the substrate W. For example, the near-infrared light source 140 and the near-infrared imaging unit 150 are preferably movable in the horizontal and / or vertical directions following a moving mechanism controlled by the control unit 102. When the near-infrared light source 140 and the near-infrared imaging unit 150 move, they can also move independently of each other. Alternatively, the near-infrared light source 140 and the near-infrared imaging unit 150 can also move as a single unit.

[0089] The processing solution may also contain organic matter. For example, in organic matter, bonds such as CH, CO, CN, and CF absorb specific wavelengths in the near-infrared spectrum. Since the amount of absorption at a specific wavelength of near-infrared radiation is proportional to the amount of the component having a specific bonded group, the amount of a specific component of the substrate W can be measured based on the near-infrared radiation reflected from the substrate W.

[0090] In this embodiment, the substrate processing apparatus 100 further includes a liquid return section 160. The liquid return section 160 is connected to the piping 132. The liquid return section 160 is capable of drawing back (re-suctioning) the processing liquid in the nozzle 136 upstream (to the piping 132 side) when the supply of processing liquid to the nozzle 136 by the supply section 135 is stopped. The structure of the liquid return section 160 will be described below.

[0091] The substrate processing apparatus 100 also includes a cup 180. The cup 180 collects processing liquid that spills from the substrate W. The cup 180 moves up and down. For example, during the entire period when the processing liquid supply unit 130 supplies processing liquid to the substrate W, the cup 180 rises vertically upward until it is to the side of the substrate W. In this case, the cup 180 collects processing liquid that spills from the substrate W due to the rotation of the substrate W. In addition, when the period during which the processing liquid supply unit 130 supplies processing liquid to the substrate W ends, the cup 180 descends vertically downward from the side of the substrate W.

[0092] As described above, the control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 controls the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the liquid return unit 160, and / or the cup 180. In one example, the control unit 102 controls the electric motor 124, the valve 134, the moving mechanism 138, the near-infrared light source 140, the near-infrared imaging unit 150, the liquid return unit 160, and / or the cup 180.

[0093] According to the substrate processing apparatus 100 of this embodiment, a near-infrared imaging unit 150 is used to photograph a processing liquid irradiated by near-infrared light from a near-infrared light source 140. Specifically, the near-infrared imaging unit 150 photographs the processing liquid within a nozzle 136. Typically, the nozzle 136 is transparent, allowing visible light and near-infrared light to pass through. The processing liquid is transparent, allowing visible light to pass through. On the other hand, the processing liquid often exhibits relatively strong absorption in the near-infrared region. Therefore, the outer edge of the processing liquid can be identified in the photographed image obtained by photographing an area including the tip 136a of the nozzle 136 using the near-infrared imaging unit 150. Specifically, the portion representing the nozzle 136, piping 132, and substrate W in the photographed image has higher brightness or luminance. On the other hand, the portion representing the processing liquid in the photographed image has lower brightness or luminance. Therefore, the outer edge of the processing liquid can be identified in the photographed image.

[0094] Furthermore, different types of processing liquids often exhibit unique absorption characteristics in the near-infrared region. Therefore, in the images obtained by capturing images of the processing liquid within the nozzle 136 using the near-infrared imaging unit 150, the luminance or brightness of the processing liquid varies depending on the type of processing liquid. Thus, the type of processing liquid can be determined based on the luminance or brightness of the processing liquid in the captured images.

[0095] Alternatively, the wavelength exhibiting strong absorption varies depending on the processing liquid; therefore, the near-infrared light source 140 can also change the wavelength of the emitted near-infrared light. This allows for easy determination of the outer edge of the processing liquid and the type of liquid.

[0096] The substrate processing apparatus 100 of this embodiment can preferably be used to manufacture semiconductor devices having semiconductors disposed thereon. Typically, in a semiconductor device, a conductive layer and an insulating layer are stacked on a substrate. The substrate processing apparatus 100 can preferably be used for cleaning and / or processing (e.g., etching, property modification, etc.) of the conductive layer and / or insulating layer during the manufacture of semiconductor devices.

[0097] Next, refer to Figures 1-3 The substrate processing apparatus 100 of this embodiment will be described. Figure 3 This is a block diagram of the substrate processing apparatus 100.

[0098] like Figure 3As shown, the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the transfer robot IR, the central robot CR, the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the liquid reflux unit 160, and the cup 180. Specifically, the control device 101 controls the transfer robot IR, the central robot CR, the substrate holding unit 120, the processing liquid supply unit 130, the near-infrared light source 140, the near-infrared imaging unit 150, the liquid reflux unit 160, and the cup 180 by sending control signals to them.

[0099] In addition, the storage unit 104 stores computer programs and data. The data includes process recipe data. The process recipe data includes information representing a plurality of process recipes. Each of the plurality of process recipes specifies the processing content, processing order, and substrate processing conditions for the substrate W. The control unit 102 executes the computer program stored in the storage unit 104 to perform substrate processing operations.

[0100] In addition, the process formulation data includes type information indicating the type of processing liquid supplied from nozzle 136 to substrate W. Furthermore, the storage unit 104 pre-stores data that correlates the type of processing liquid with the luminance or brightness of the processing liquid in a reference image.

[0101] The control unit 102 controls the transfer robot IR to transfer the substrate W.

[0102] The control unit 102 controls the central robot CR, which is used to transfer the substrate W. For example, the central robot CR receives the unprocessed substrate W and moves it into any one of the plurality of chambers 112. In addition, the central robot CR receives the processed substrate W from the chamber 112 and moves it out.

[0103] The control unit 102 controls the substrate holding unit 120 to control the start of rotation of the substrate W, the change of rotation speed, and the stop of rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0104] The control unit 102 can control the valve 134 of the processing fluid supply unit 130 to switch the state of the valve 134 between an open state and a closed state. Specifically, the control unit 102 can control the valve 134 of the processing fluid supply unit 130 to be in the open state, thereby allowing the processing fluid flowing toward the nozzle 136 in the piping 132 to pass through. Alternatively, the control unit 102 can control the valve 134 of the processing fluid supply unit 130 to be in the closed state, thereby stopping the supply of processing fluid flowing toward the nozzle 136 in the piping 132.

[0105] The control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136. Specifically, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136 above the upper surface Wa of the substrate W. In addition, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 130 to move the nozzle 136 to a retracted position away from the upper surface Wa of the substrate W.

[0106] The control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 to capture an image of the area including the tip 136a of the nozzle 136. The control unit 102 controls the near-infrared light source 140 to illuminate the area including the tip 136a of the nozzle 136 with near-infrared light. The control unit 102 also controls the near-infrared imaging unit 150 to capture an image of the area including the tip 136a of the nozzle 136.

[0107] For example, the control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 in a manner that emits near-infrared rays from the near-infrared light source 140 toward an area including the front end 136a of the nozzle 136, receives the near-infrared rays transmitted through each component or reflected in the near-infrared imaging unit 150, and measures the luminance value or brightness. Furthermore, the control unit 102 can also control the near-infrared light source 140 and the near-infrared imaging unit 150 to move them relative to the nozzle 136.

[0108] The control unit 102 determines the outer edge of the processing liquid in the captured image. For example, the control unit 102 determines the outer edge of the processing liquid in the captured image based on the luminance value or brightness within the captured image. In one example, the control unit 102 determines the outer edge of the processing liquid in the captured image based on the luminance value or brightness within the captured image and the luminance value or brightness of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the outer edge of the processing liquid in the captured image based on the captured image and the reference image.

[0109] Furthermore, the control unit 102 determines the type of processing liquid in the captured image based on the luminance value or brightness within the captured image. Alternatively, the control unit 102 determines the type of processing liquid in the captured image based on the luminance value or brightness within the captured image and the luminance value or brightness of a reference processing liquid stored in the storage unit 104.

[0110] The control unit 102 controls the liquid return section 160 to draw the treatment liquid in the nozzle 136 back upstream (to the piping 132 side). Specifically, the control unit 102 controls the liquid return section 160 to perform back suction. In other words, while the control unit 102 controls the valve 134 to stop supplying treatment liquid to the nozzle 136, it controls the liquid return section 160 to draw the treatment liquid in the nozzle 136 back upstream (to the piping 132 side).

[0111] In this embodiment, while the treatment liquid moves upstream within the nozzle 136, the control unit 102 captures images of the area including the tip 136a of the nozzle 136 using the near-infrared imaging unit 150. In other words, the control unit 102 captures images of the treatment liquid moving upstream within the nozzle 136 using the near-infrared imaging unit 150.

[0112] The control unit 102 can also control the cup 180 to move relative to the substrate W. Specifically, during the entire period when the processing liquid supply unit 130 supplies processing liquid to the substrate W, the control unit 102 raises the cup 180 vertically upward to the side of the substrate W. Furthermore, when the period when the processing liquid supply unit 130 supplies processing liquid to the substrate W ends, the control unit 102 lowers the cup 180 vertically downward from the side of the substrate W.

[0113] The substrate processing apparatus 100 of this embodiment can preferably be used to form semiconductor elements. For example, the substrate processing apparatus 100 can preferably be used to process a substrate W that is used as a semiconductor element in a stacked structure. The semiconductor element is a so-called 3D (three-dimensional) memory (storage device). As an example, the substrate W can preferably be used as a NAND (Not AND) type flash memory.

[0114] Next, refer to Figures 1-4 The substrate processing method of this embodiment will be described. Figure 4 This is a flowchart of the substrate processing method according to this embodiment. Furthermore, step SC is an example of the "rotation process" and "supply process" of the present invention. Step SD is an example of the "retraction process" of the present invention. Step SE is an example of the "irradiation process" and "image generation process" of the present invention. Step SF is an example of the "determination process" of the present invention.

[0115] like Figure 4 As shown, in step SA, the substrate W is moved into the substrate processing apparatus 100. Specifically, the substrate W is moved into the chamber 112 of the substrate processing unit 110 via the transfer robot IR and the central robot CR.

[0116] In step SB, the substrate holding part 120 holds the substrate W. Specifically, the substrate W is held by the substrate holding part 120 when it is moved into the chamber 112.

[0117] In step SC, the control unit 102 processes the substrate W. The substrate W is processed in the substrate processing unit 110. Typically, the substrate holding unit 120 rotates the substrate W while holding it, and the processing liquid supply unit 130 supplies processing liquid to the substrate W. The control unit 102 stops supplying processing liquid to the substrate W after a predetermined time has elapsed since the start of supplying processing liquid to the substrate W.

[0118] In step SD, the control unit 102 controls the liquid return unit 160 to draw the processing liquid in the nozzle 136 back upstream (to the piping 132 side). This prevents the processing liquid from dripping from the nozzle 136 onto the substrate W.

[0119] In step SE, the control unit 102 controls the near-infrared imaging unit 150 to generate an image of the area including the tip 136a of the nozzle 136. In this embodiment, the control unit 102 uses the near-infrared imaging unit 150 to image the area including the tip 136a of the nozzle 136 while the processing liquid in the nozzle 136 moves upstream. In other words, the control unit 102 uses the near-infrared imaging unit 150 to image the processing liquid moving upstream in the nozzle 136. Specifically, the control unit 102 controls the near-infrared light source 140 to emit near-infrared rays. The area including the tip 136a of the nozzle 136 is irradiated by the near-infrared rays emitted from the near-infrared light source 140. In addition, the control unit 102 controls the near-infrared imaging unit 150 to image at least a portion of the area irradiated by the near-infrared rays. Specifically, the control unit 102 images the area including the tip 136a of the nozzle 136. By capturing images of the area irradiated with near-infrared light, including the front end 136a of the nozzle 136, from the near-infrared imaging unit 150, the processing liquid inside the nozzle 136 can be captured with high precision, even if the processing liquid is substantially transparent.

[0120] In step SF, the control unit 102 determines the position of the outer edge of the treatment liquid inside the nozzle 136 based on the captured image.

[0121] In step SG, the control unit 102 stops the rotation of the substrate W by the substrate holding unit 120 and releases the substrate holding unit 120 from holding the substrate W. Furthermore, stopping the rotation of the substrate W by the substrate holding unit 120 can also be performed in steps SD, SE, or SF.

[0122] In step SH, the substrate W is removed from the substrate processing apparatus 100. Specifically, the substrate W is removed from the chamber 112 of the substrate processing unit 110 via a central robot CR and a transfer robot IR.

[0123] According to this embodiment, the control unit 102 controls the near-infrared imaging unit 150 to image the area including the tip 136a of the nozzle 136. In other words, the near-infrared imaging unit 150 images the processing liquid irradiated by near-infrared light from the near-infrared light source 140. Since the processing liquid absorbs near-infrared light relatively strongly, the outer edge of the processing liquid can be determined with high accuracy.

[0124] In addition, the control unit 102 uses the near-infrared imaging unit 150 to image the processing liquid moving upstream within the nozzle 136. Therefore, the processing liquid within the nozzle 136 during the back-suction process can be determined with high precision.

[0125] Next, refer to Figure 5 The liquid reflux section 160 of the substrate processing apparatus 100 of this embodiment will be further described. Figure 5 This is a schematic diagram showing the configuration around the liquid return section 160 of the substrate processing apparatus 100 in this embodiment.

[0126] like Figure 5 As shown, the liquid return section 160 includes a pipe 161 and a valve 162. The pipe 161 is connected to the pipe 132. In this embodiment, the pipe 161 is connected to the portion of the pipe 132 between the valve 134 and the nozzle 136. In other words, the pipe 161 is connected to the pipe 132 upstream of the valve 134 and downstream of the nozzle 136. Processing fluid flows through the pipe 161 from the downstream side (nozzle 136 side) of the connection portion of the pipe 132 to which the pipe 161 is connected. Furthermore, in this embodiment, the end of the pipe 161 not connected to the pipe 132 (lower end) is positioned lower than the tip 136a of the nozzle 136.

[0127] Valve 162 opens and closes the flow path within piping 161. Nozzle 136 is connected to piping 161. Valve 162 is not particularly limited and may be, for example, an air valve. Valve 162 may have, for example, a needle valve capable of changing the flow rate and / or a speed controller capable of changing the opening and closing speed.

[0128] Control unit 102 controls valve 162 to open and close the flow path within piping 161. Specifically, when supplying the processing fluid to nozzle 136 by supply unit 135, control unit 102 closes the flow path within piping 161 using valve 162. Conversely, after stopping the supply of processing fluid from supply unit 135 to nozzle 136, control unit 102 controls valve 162 to open the flow path within piping 161 for a predetermined time. In this case, control unit 102 changes valve 162 from a closed state to an open state, thereby causing backflow according to the siphon principle. That is, the processing fluid in nozzle 136 moves upstream (towards piping 132). Conversely, control unit 102 changes valve 162 from an open state to a closed state, thereby stopping backflow. That is, the movement of the processing fluid in nozzle 136 stops.

[0129] In this embodiment, the control unit 102 determines the position of the downstream edge (lower surface) of the processing liquid within the nozzle 136 based on the captured image. Furthermore, based on the determined position of the downstream edge of the processing liquid, the control unit 102 calculates the speed at which the processing liquid moves upstream within the nozzle 136.

[0130] For example, when a first predetermined time has elapsed since the liquid reflux unit 160 began drawing the processing liquid upstream from the nozzle 136, the control unit 102 captures an image of the processing liquid moving upstream within the nozzle 136 using the near-infrared imaging unit 150. Furthermore, the control unit 102 calculates the speed at which the processing liquid moves upstream within the nozzle 136 based on the first predetermined time (the time from the start of upstream reflux of the processing liquid to the capture of the image) and the position of the downstream edge of the processing liquid in the captured image. In the following description, the speed at which the processing liquid moves upstream within the nozzle 136 is sometimes referred to as the speed of the processing liquid.

[0131] Alternatively, for example, the control unit 102 uses the near-infrared imaging unit 150 to take multiple images of the processing liquid moving upstream within the nozzle 136 at second predetermined time intervals. Furthermore, the control unit 102 calculates the speed of the processing liquid based on the position of the downstream edge of the processing liquid in the multiple captured images and the second predetermined time interval.

[0132] The control unit 102 determines whether the calculated speed of the processing fluid is within a preset speed range. For example, if the control unit 102 determines that the calculated speed of the processing fluid is not within the preset speed range, it performs a prescribed process. The prescribed process will be explained below. Furthermore, the preset speed range is stored in the storage unit 104.

[0133] Next, refer to Figures 6-10The method for calculating the speed of the processing liquid L in the substrate processing apparatus 100 of this embodiment will be described. Figures 6-10 And the following Figure 11 This is a schematic diagram showing the front end of nozzle 136 during the back suction process. Furthermore, Figures 6-10 And the following Figure 11 This corresponds to the image captured by the near-infrared imaging unit 150. Additionally, in Figures 6-10 And the following Figure 11 In the image, for ease of understanding, a shadow is applied to the treatment liquid L.

[0134] First, refer to Figure 6 The method for determining the centerline M136 of the liquid flow path 136b of the nozzle 136 is explained.

[0135] like Figure 6 As shown, nozzle 136 has a liquid flow path 136b through which the treatment liquid L passes. Control unit 102 determines the centerline M136 of liquid flow path 136b based on the captured image. Control unit 102 determines the centerline M136 of liquid flow path 136b, for example, based on the position of the outer periphery of nozzle 136 and / or the position of the inner periphery of liquid flow path 136b in the captured image. Alternatively, control unit 102 may also determine the centerline M136 of liquid flow path 136b based on... Figure 6 The position of the outer periphery of the treatment liquid L is used to determine the centerline M136 of the liquid flow path 136b.

[0136] Next, refer to Figures 6-10 The method for calculating the velocity of the treatment fluid L is explained. First, refer to... Figures 6-8 The following method is described: after a first predetermined time has elapsed since the treatment fluid L in the nozzle 136 was first drawn back upstream, the treatment fluid L in the nozzle 136 is photographed, and the velocity of the treatment fluid L is calculated based on the obtained photographed image.

[0137] like Figure 6 As shown, when the control unit 102 stops the supply of the processing fluid L from the supply unit 135 to the nozzle 136, the downstream edge (lower surface) La of the processing fluid L becomes approximately flush with the front end 136a of the nozzle 136. From this state, the control unit 102 sets the valve 162 to the open state. As a result, the processing fluid L in the nozzle 136 is drawn back upstream. That is, the drawing back (reverse suction) of the processing fluid L begins.

[0138] Furthermore, after a first predetermined time has elapsed since the liquid return unit 160 began drawing the processing liquid L from the nozzle 136 upstream, the control unit 102 uses the near-infrared imaging unit 150 to image the area including the tip 136a of the nozzle 136. Thus, the near-infrared imaging unit 150 generates, for example, images of... Figure 7The image shown is a captured image. Then, the control unit 102 determines the position of the downstream edge La of the treatment liquid L, measured from the tip 136a of the nozzle 136, based on the captured image. Further, as... Figure 7 As shown, the control unit 102 calculates the distance L1 from the tip 136a of the nozzle 136 to the determined end edge La. At this time, the control unit 102 calculates the vertical distance L1 from the tip 136a of the nozzle 136 to the determined end edge La. Alternatively, the control unit 102 calculates the distance L1 in a direction orthogonal to the tip 136a of the nozzle 136 to the determined end edge La. Then, the control unit 102 calculates the velocity of the processing fluid L based on the calculated distance L1 and a first predetermined time.

[0139] Or, such as Figure 8 As shown, the control unit 102 calculates the length L2 by which the edge (lower surface) La of the processing liquid L moves along the center line M136 of the liquid flow path 136b based on the captured image. Furthermore, the control unit 102 calculates the velocity of the processing liquid L based on the length L2 and a first predetermined time.

[0140] Next, refer to Figure 6 , Figure 9 as well as Figure 10 A method is described for taking multiple images of the treatment fluid L moving upstream within the nozzle 136 at a second predetermined time interval, and for calculating the velocity of the treatment fluid L based on the acquired images.

[0141] like Figure 6 As shown, when the control unit 102 stops the supply of the processing fluid L from the supply unit 135 to the nozzle 136, the downstream edge (lower surface) La of the processing fluid L becomes approximately flush with the front end 136a of the nozzle 136. From this state, the control unit 102 sets the valve 162 to the open state. As a result, the processing fluid L in the nozzle 136 is drawn back upstream. That is, the drawing back (reverse suction) of the processing fluid L begins.

[0142] Furthermore, the control unit 102 takes multiple (here, twice) images of the processing liquid L moving upstream within the nozzle 136 at a second predetermined time interval. Specifically, the second predetermined time interval can be the reciprocal of the frame rate or an integer multiple of the reciprocal of the frame rate. The control unit 102 uses the near-infrared imaging unit 150 to take images of the area including the tip 136a of the nozzle 136 at the second predetermined time interval. Thus, the near-infrared imaging unit 150 generates, for example, images of... Figure 9 as well as Figure 10The image shown is an image captured. Then, the control unit 102 determines the position of the downstream edge La of the treatment fluid L within the nozzle 136 based on the captured image. The position of the edge La is determined for each captured image. Further, the control unit 102 calculates the velocity of the treatment fluid L based on the position of the downstream edge La of the treatment fluid L in a plurality of captured images and a second predetermined time.

[0143] Specifically, such as Figure 9 as well as Figure 10 As shown, calculate the distance between the positions of the edge La in the two captured images. And, as... Figure 10 As shown, the control unit 102 calculates the vertical distance L3 between the edge edges La in the two captured images. Alternatively, the control unit 102 calculates the distance L3 between the edge edges La in the two captured images in a direction orthogonal to the front end 136a. Further, the control unit 102 calculates the speed of the processing liquid L based on the calculated distance L3 and a second predetermined time.

[0144] Alternatively, the control unit 102 calculates the length L4 by which the edge La of the processing liquid L moves along the centerline M136 of the liquid flow path 136b based on two captured images. Further, the control unit 102 calculates the velocity of the processing liquid L based on the length L4 and a second predetermined time.

[0145] Next, refer to Figure 11 An example of the separation of the treatment liquid L within nozzle 136 during the back suction process is explained. Figure 11 This is a schematic diagram showing the separation of the treatment liquid L within the nozzle 136 during the back suction process.

[0146] like Figure 11 As shown, during the recirculation of the processing liquid L, the processing liquid L sometimes separates within the nozzle 136. In this case, a cavity C is formed between the processing liquids L. Since the cavity C absorbs almost no near-infrared light, the brightness or luminance of the captured image changes significantly at the interface between the cavity C and the processing liquid L. Therefore, the control unit 102 can determine whether the processing liquid L has separated based on the captured image. The separation of the processing liquid L occurs when the recirculation speed of the processing liquid L is high. Therefore, when the control unit 102 determines that separation of the processing liquid L has occurred, it performs a predetermined process. The predetermined process will be explained below.

[0147] Next, refer to Figures 1-12 The substrate processing steps in the substrate processing method of this embodiment will be described. Figure 12This is a flowchart of the substrate processing steps in the substrate processing method of this embodiment. Furthermore, step S110 is an example of the "rotation process" of the present invention. Specifically, the process from step S110 to stopping the rotation of the substrate W in step S200 is an example of the "rotation process" of the present invention. Step S120 is an example of the "supply process" of the present invention. Step S130 is an example of the "retraction process" of the present invention. Specifically, the process from step S130 to stopping the retraction of the processing liquid L in step S190 is an example of the "retraction process" of the present invention. Step S140 is an example of the "irradiation process" and the "image generation process" of the present invention. Step S150 is an example of the "determination process" of the present invention. Step S160 is an example of the "calculation process" of the present invention. Step S170 is an example of the "determination process" of the present invention. Step S180 is an example of the "process of changing at least one of the start time of retraction and the stop time of retraction" of the present invention.

[0148] like Figure 12 As shown, in step S110, the substrate W is rotated while being held. Specifically, the substrate holding part 120 rotates the substrate W while holding it. For example, the rotational speed of the substrate W is 10 rpm to 1500 rpm.

[0149] Further, in step S120, processing liquid L is supplied to substrate W. Specifically, control unit 102 controls processing liquid supply unit 130 to supply processing liquid L to substrate W. When a predetermined time has elapsed since the start of supplying processing liquid L to substrate W, control unit 102 controls processing liquid supply unit 130 to stop supplying processing liquid L to substrate W.

[0150] Further, in step S130, the control unit 102 begins the retraction of the processing liquid L. Specifically, the control unit 102 sets the valve 162 of the liquid return unit 160 to the open state, retracting the processing liquid L in the nozzle 136 upstream. As a result, the processing liquid L in the nozzle 136 begins to move upstream.

[0151] Further, in step S140, the near-infrared light source 140 irradiates the area including the tip 136a of the nozzle 136 with near-infrared light, and the near-infrared imaging unit 150 captures an image of the area irradiated by near-infrared light, including the tip 136a of the nozzle 136. At this time, the near-infrared imaging unit 150 captures an image of the processing liquid L moving upstream within the nozzle 136. The near-infrared light source 140 irradiates the area including the tip 136a with near-infrared light, and the near-infrared imaging unit 150 captures an image of the area irradiated by near-infrared light, including the tip 136a. The control unit 102 controls the near-infrared light source 140 to emit near-infrared light toward the area including the tip 136a, and the near-infrared imaging unit 150 to capture an image of the area including the tip 136a. Furthermore, the timing at which the near-infrared light source 140 begins emitting near-infrared rays can be the same as or different from the timing at which the near-infrared imaging unit 150 begins capturing images. Additionally, the timing of the near-infrared light source 140 beginning to emit near-infrared rays can be earlier or later than the timing of the near-infrared imaging unit 150 beginning to capture images. Furthermore, the timing of the near-infrared light source 140 beginning to emit near-infrared rays can be the same as or different from the timing of the return of the processing liquid L in step S130. Additionally, the timing of the near-infrared light source 140 beginning to emit near-infrared rays can be earlier or later than the timing of the return of the processing liquid L in step S130.

[0152] Further, in step S150, the position of the outer edge of the processing liquid L in the captured image is determined based on the captured image generated by the near-infrared imaging unit 150. Specifically, for example, the control unit 102 determines the position of the downstream edge La of the processing liquid L based on the captured image. Additionally, for example, the control unit 102 determines the boundary position between the processing liquid L and the cavity C based on the captured image. Furthermore, the control unit 102 may also further determine the type of processing liquid L in the captured image based on the captured image. Moreover, the control unit 102 may also determine the position of the centerline M136 of the liquid flow path 136b based on the captured image. However, the determination of the centerline M136 can also be performed between steps S150.

[0153] For example, the control unit 102 determines the position of the outer edge of the processing liquid L in the captured image based on the luminance value or brightness within the captured image. For example, the control unit 102 determines the position of the outer edge of the processing liquid L in the captured image based on the luminance value or brightness within the captured image and the luminance value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the position of the outer edge of the processing liquid L in the captured image based on the captured image and the reference image. Alternatively, for example, the control unit 102 may also determine the area in the captured image where the luminance value or brightness is within a specified range as the processing liquid L, and determine the outer edge of the area where the luminance value or brightness is within the specified range as the outer edge of the processing liquid L.

[0154] Furthermore, the control unit 102 determines the type of processing liquid L in the captured image based on the luminance value or brightness within the captured image. Alternatively, the control unit 102 determines the type of processing liquid L in the captured image based on the luminance value or brightness within the captured image and the luminance value or brightness of a reference processing liquid stored in the storage unit 104.

[0155] Further, in step S160, based on the determined position of the downstream edge La of the treated liquid L, the velocity of the treated liquid L moving upstream within the nozzle 136 is calculated. Specifically, by utilizing... Figures 6-10 The method described above involves the control unit 102 calculating the speed of the processing liquid L.

[0156] Further, in step S170, it is determined whether an abnormality has occurred. The control unit 102 determines whether an abnormality has occurred based on the position of the outer edge of the processing liquid L.

[0157] For example, the control unit 102 determines whether an abnormality has occurred based on the speed of the processing fluid L calculated in step S160. In this case, the control unit 102 determines whether the speed of the processing fluid L is within a specified range. If the speed of the processing fluid L is within the specified range, the control unit 102 determines that no abnormality has occurred. On the other hand, if the speed of the processing fluid L is outside the specified range, the control unit 102 determines that an abnormality has occurred. For example, if the speed of the processing fluid L is higher than the specified range, the processing fluid L will be excessively drawn back to the piping 132 side. On the other hand, if the speed of the processing fluid L is lower than the specified range, the processing fluid L will not be sufficiently drawn back to the piping 132 side.

[0158] Alternatively, for example, the control unit 102 determines whether the processing liquid L has separated based on the position of its outer edge. Furthermore, if the control unit 102 determines whether the processing liquid L has separated without calculating its velocity, step S160 may not be executed. For example, the control unit 102 determines whether a cavity C has formed based on the position of the outer edge of the processing liquid L. If no cavity C has formed, the control unit 102 determines that no abnormality has occurred. On the other hand, if a cavity C has formed, the control unit 102 determines that an abnormality has occurred.

[0159] In addition, the control unit 102 can also compare the type of processing liquid L calculated based on the captured image with the type of processing liquid L present in the process formula data to determine whether the type of processing liquid L used is correct.

[0160] If the control unit 102 determines that no abnormality has occurred in step S170, the process proceeds to step S190.

[0161] On the other hand, if the control unit 102 determines that an abnormality has occurred in step S170, the process proceeds to step S180.

[0162] Furthermore, in step S180, the control unit 102 performs a prescribed process. The prescribed process will be explained below.

[0163] Specifically, when the speed of the processing fluid L is higher than a specified range, the control unit 102 changes at least one of the following based on the determined position of the outer edge of the processing fluid L: the time when the processing fluid L is started to be drawn back upstream (the time when the valve 162 is set to the open state) and the time when the processing fluid L is stopped to be drawn back upstream (the time when the valve 162 is set to the closed state).

[0164] For example, if the speed of the processing fluid L is higher than a specified range, the control unit 102 can also rewrite the process formula by delaying the start time of drawing the processing fluid L upstream. Alternatively, if the speed of the processing fluid L is higher than a specified range, the control unit 102 can also rewrite the process formula by advancing the stop time of drawing the processing fluid L upstream.

[0165] Additionally, if the flow rate of the processing fluid L exceeds a specified range, for example, the control unit 102 can control the speed controller and / or needle valve of valve 162 to slow down the opening and closing speed of valve 162 and / or reduce the flow rate of the processing fluid L flowing in pipe 161. Furthermore, the control unit 102 can also notify the user that the flow rate of the processing fluid L exceeds a specified range. In this case, the user can also manually adjust the speed controller and / or needle valve of valve 162 to slow down the opening and closing speed of valve 162 and / or reduce the flow rate of the processing fluid L flowing in pipe 161. The method of notifying the user is not particularly limited; for example, it can be displayed on the display panel of the substrate processing apparatus 100, an error indicator light can be illuminated, or an audible notification can be given.

[0166] Additionally, for example, if the flow rate of the processing fluid L is below a specified range, the control unit 102 can rewrite the process formula to advance the time at which the processing fluid L is started being drawn back upstream. Alternatively, for example, if the flow rate of the processing fluid L is below a specified range, the control unit 102 can also rewrite the process formula to delay the time at which the flow rate of the processing fluid L is stopped being drawn back upstream.

[0167] Additionally, if the flow rate of the processed fluid L is below a specified range, for example, the control unit 102 can control the speed controller and / or needle valve of valve 162 to accelerate the opening and closing speed of valve 162 and / or increase the flow rate of the processed fluid L flowing in pipe 161. Furthermore, the control unit 102 can also notify the user that the flow rate of the processed fluid L is below a specified range. In this case, the user can also manually adjust the speed controller and / or needle valve of valve 162 to accelerate the opening and closing speed of valve 162 and / or increase the flow rate of the processed fluid L flowing in pipe 161.

[0168] Additionally, for example, in the event of separation of the processed fluid L, the control unit 102 can control the speed controller and / or needle valve of valve 162 to slow down the opening and closing speed of valve 162 and / or reduce the flow rate of the processed fluid L flowing in pipe 161. Furthermore, the control unit 102 can also notify the user that the flow rate of the processed fluid L is higher than a predetermined range. In this case, the user can also manually adjust the speed controller and / or needle valve of valve 162 to slow down the opening and closing speed of valve 162 and / or reduce the flow rate of the processed fluid L flowing in pipe 161.

[0169] In addition, if the type of processing fluid L (the determined processing fluid L) used is incorrect, for example, the control unit 102 can notify the user of a notification message indicating that the processing fluid L used is incorrect.

[0170] Further, in step S190, the control unit 102 stops the return of the processing liquid L. Specifically, when a predetermined time has elapsed since the return of the processing liquid L began in step S130, the control unit 102 closes the valve 162 of the liquid return unit 160, thereby stopping the return of the processing liquid L. Furthermore, the timing of stopping the return of the processing liquid L may not be after the execution of the predetermined process in step S180. For example, the timing of stopping the return of the processing liquid L may be between steps S140 and S180.

[0171] Furthermore, in step S200, the rotation of the substrate W is stopped. Specifically, the control unit 102 controls the substrate holding unit 120 to stop the rotation of the substrate W by means of the substrate holding unit 120.

[0172] In this embodiment, as described above, the control unit 102 determines the position of the downstream edge La of the treatment liquid L within the nozzle 136 based on the captured image. Therefore, it is possible to easily calculate the velocity of the treatment liquid L and / or determine whether the treatment liquid L has separated.

[0173] Furthermore, as described above, the control unit 102 calculates the velocity of the processing liquid L based on the position of the edge La of the processing liquid L. Therefore, the velocity of the processing liquid L during the back-suction process can be easily calculated.

[0174] Furthermore, as described above, when a first predetermined time has elapsed since the start of the upstream flow of the processing liquid L, the control unit 102 uses the near-infrared imaging unit 150 to capture images of the processing liquid L moving upstream within the nozzle 136, and calculates the velocity of the processing liquid L based on the position of the edge La of the processing liquid L and the first predetermined time. Therefore, it is easier to calculate the velocity of the processing liquid L during the backflow process.

[0175] Furthermore, as described above, the control unit 102 takes multiple images of the processing liquid L moving upstream within the nozzle 136 at second predetermined time intervals using the near-infrared imaging unit 150, and calculates the velocity of the processing liquid L based on the position of the edge La of the processing liquid L in the multiple images and the second predetermined time. In this case, it is also easier to calculate the velocity of the processing liquid L during the backflow process.

[0176] Furthermore, as described above, the control unit 102 calculates the velocity of the processing liquid L based on the distance L1 from the tip 136a of the nozzle 136 to the edge La of the processing liquid L. Therefore, it is easier to calculate the velocity of the processing liquid L. Alternatively, the control unit 102 can also calculate the velocity of the processing liquid L based on the distance L3. In this case, it is also easier to calculate the velocity of the processing liquid L.

[0177] Alternatively, as described above, the control unit 102 calculates the speed of the processing liquid L based on the length L2 or L4 by which the edge La of the processing liquid L moves along the centerline M136 of the liquid flow path 136b, and a first predetermined time or a second predetermined time. Therefore, the speed of the processing liquid L can be calculated more accurately.

[0178] Furthermore, as described above, when the control unit 102 determines that an abnormality has occurred, it changes at least one of the timing of starting to draw the processing fluid L upstream and the timing of stopping to draw the processing fluid L upstream, based on the position of the outer edge of the processing fluid L. Therefore, it is easy to keep the speed of the processing fluid L within a specified range.

[0179] Furthermore, as described above, the control unit 102 determines the type of processing liquid L based on the captured image. Therefore, by comparing the type of processing liquid L determined based on the captured image with the type of processing liquid L present in the process formulation data, it is possible to confirm whether the type of processing liquid L used is correct.

[0180] Next, refer to Figure 13 as well as Figure 14 An example of a near-infrared light source 140 including a plurality of near-infrared light sources 140a and near-infrared light sources 140b will be described. Figure 13 This is a schematic diagram of a substrate processing unit 110 in a substrate processing apparatus 100 equipped with a plurality of near-infrared light sources 140a and near-infrared light sources 140b.

[0181] like Figure 13 As shown, the near-infrared light source 140 includes a plurality of (two in this case) near-infrared light sources 140a and 140b. The near-infrared light sources 140a and 140b emit near-infrared rays with different peak wavelengths.

[0182] The processing liquid supply unit 130 supplies multiple types (two types in this case) of processing liquid L to the substrate W.

[0183] The processing fluid supply unit 130 also includes a piping 232 and a valve 234. Processing fluid L from a supply source flows through the piping 232. The valve 234 opens and closes the flow path within the piping 232. The piping 232 is connected to the piping 132. In this embodiment, the piping 232 is connected to a position upstream of the liquid return section 160 within the piping 132. In this embodiment, the piping 232 and the valve 234 constitute a supply unit 235 that supplies processing fluid L to the nozzle 136. Furthermore, the supply unit 235 may also include a pump (not shown) that delivers processing fluid L from the supply source. The other configurations of the supply unit 235 (piping 232 and valve 234) are the same as those of the supply unit 135 (piping 132 and valve 134).

[0184] The control unit 102 acquires type information indicating the type of processing fluid L. For example, the control unit 102 acquires the type of processing fluid L supplied by the supply unit 135 and the type of processing fluid L supplied by the supply unit 235 from the process recipe data. Alternatively, the process recipe data may also include information indicating the type of near-infrared light source 140 corresponding to the type of processing fluid L. Furthermore, the control unit 102 may also acquire the type of processing fluid L supplied by the supply unit 135 and the type of processing fluid L supplied by the supply unit 235 from user input information.

[0185] The control unit 102 adjusts the near-infrared light source 140 that illuminates the area including the tip 136a of the nozzle 136 based on the acquired type information. For example, when the processing liquid L is supplied from the supply unit 135, the control unit 102 uses the near-infrared light source 140a for irradiation. On the other hand, when the processing liquid L is supplied from the supply unit 235, the control unit 102 uses the near-infrared light source 140b for irradiation.

[0186] Specifically, for example, the processing liquid L supplied by the supply unit 135 is DIW, and the processing liquid L supplied by the supply unit 235 is ethanol. Furthermore, for example, the near-infrared light source 140a emits near-infrared light with a peak wavelength of approximately 1.4 μm, and the near-infrared light source 140b emits near-infrared light with peak wavelengths of approximately 1.6 μm or approximately 1.7 μm. DIW has high absorbance (also called light absorption rate) for light with a wavelength of approximately 1.4 μm. On the other hand, ethanol has high absorbance for light with wavelengths of approximately 1.6 μm and approximately 1.7 μm. Therefore, when the supply unit 135 supplies processing liquid L (DIW), by irradiating it with the near-infrared light source 140a, the contrast of the luminance value or brightness between the area representing processing liquid L and the area representing other parts of the image can be improved. Therefore, the position of the edge of the processing liquid L can be determined more accurately based on the image. Furthermore, when the processing liquid L (ethanol) is supplied by the supply unit 235, irradiation with the near-infrared light source 140b can improve the contrast of luminance or brightness between the area representing the processing liquid L and the area representing other parts of the image. Therefore, the position of the edge of the processing liquid L can be determined more accurately based on the image.

[0187] Figure 14 This is a flowchart of the substrate processing steps in an example where the near-infrared light source 140 includes a plurality of near-infrared light sources 140a and 140b. Furthermore, in... Figure 14In the substrate processing flow shown, step S110 is an example of the "rotation process" and "acquisition process" of the present invention. Step S220 is an example of the "supply process" of the present invention. Step S230 is an example of the "retraction process" of the present invention. Specifically, the process from step S230 to stopping the retraction of the processing liquid L in step S290 is an example of the "retraction process" of the present invention. Step S240 is an example of the "irradiation process", "image generation process", and "near-infrared light source change process" of the present invention. Step S250 is an example of the "determination process" of the present invention. Step S260 is an example of the "calculation process" of the present invention. Step S270 is an example of the "determination process" of the present invention. Step S280 is an example of the "change of at least one of the start time of retraction and the stop time of retraction" of the present invention.

[0188] like Figure 14 As shown, steps S110 to S190 are... Figure 12 The process shown is the same. However, here, for example, the control unit 102 acquires process formula data in step S110. At this time, the control unit 102 acquires type information indicating the type of the processing liquid L. In addition, in step S140, near-infrared light source 140a irradiates the sample.

[0189] Further, in step S220, processing liquid L is supplied from the supply unit 235 to the substrate W. Specifically, the control unit 102 controls the supply unit 235 to supply processing liquid L to the substrate W. When a predetermined time has elapsed since the start of supplying processing liquid L to the substrate W, the control unit 102 controls the supply unit 235 to stop supplying processing liquid L to the substrate W.

[0190] Further, in step S230, the control unit 102 begins the retraction of the processing liquid L. Specifically, the control unit 102 opens the valve 162 of the liquid return unit 160 to retract the processing liquid L in the nozzle 136 upstream. As a result, the processing liquid L in the nozzle 136 begins to move upstream.

[0191] Further, in step S240, the control unit 102 changes the near-infrared light source 140 that illuminates the area including the tip 136a of the nozzle 136 from near-infrared light source 140a to near-infrared light source 140b. Thus, the near-infrared light source 140b illuminates the area including the tip 136a of the nozzle 136 with near-infrared light, and the near-infrared imaging unit 150 images the area illuminated by near-infrared light, including the tip 136a of the nozzle 136. The other controls in step S240 are the same as in step S140.

[0192] The subsequent steps S250 to S290 are the same as steps S150 to S190. Additionally, step S200 is... Figure 12 The process shown is the same.

[0193] However, in step S280, the control unit 102 may also change at least one of the times when to start drawing the treatment fluid L upstream and when to stop drawing the treatment fluid L upstream, based on the type of treatment fluid L determined in step S250. Additionally, the control unit 102 may also control the speed controller and / or needle valve of valve 162 based on the type of treatment fluid L determined in step S250.

[0194] In this embodiment, as described above, the control unit 102 acquires type information indicating the type of the processing liquid L, and changes the near-infrared light source 140 irradiating the area including the tip 136a of the nozzle 136 based on the acquired type information. Therefore, since the irradiated near-infrared light can be changed according to the absorbance of the processing liquid L, the position of the edge of the processing liquid L can be accurately determined even if the type of the processing liquid L changes.

[0195] Figure 14 Other controls and effects of the substrate processing flow shown Figure 12 The control and effect of the substrate processing flow shown are the same.

[0196] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the described embodiments and can be implemented in various ways without departing from its spirit. Furthermore, various inventions can be formed by appropriately combining the plurality of constituent elements disclosed in the above embodiments. For example, several constituent elements may be deleted from all the constituent elements shown in the embodiments. Furthermore, constituent elements from different embodiments may be appropriately combined. For ease of understanding, the accompanying drawings mainly schematically show each constituent element, and the thickness, length, number, spacing, etc., of each constituent element shown may differ from the actual dimensions for ease of drawing preparation. In addition, the material, shape, size, etc., of each constituent element shown in the above embodiments are examples and are not particularly limited; various modifications can be made without substantially departing from the effects of the present invention.

[0197] For example, in the above embodiment, an example of photographing the processing liquid L only during the back suction process has been described, but the present invention is not limited thereto. For example, the processing liquid L may be photographed not only during the back suction process, but also when the processing liquid L is supplied to the substrate W.

[0198] Furthermore, while the above embodiment described an example of determining the type of processing liquid L based on captured images, the present invention is not limited thereto. For example, the luminance value or brightness of the processing liquid L in the captured image varies depending on the concentration of the processing liquid L. Additionally, the type of processing liquid L can be obtained from process formulation data. Therefore, the concentration of processing liquid L can also be determined based on information related to the type and concentration of processing liquid L, as well as captured images.

[0199] In addition, Figure 13 The example described herein is that two types of processing liquid L are supplied to the substrate W from the same nozzle 136, but the present invention is not limited thereto. For example, the two types of processing liquid L may be supplied to the substrate W from different nozzles. In this case, the near-infrared light source 140 used for irradiation may also be changed depending on the type of processing liquid L.

[0200] [Industry availability]

[0201] The present invention can be preferably used in a substrate processing apparatus and a substrate processing method.

[0202] Explanation of reference numerals in the attached figures: 100: Substrate processing apparatus 102: Control Department 120: Substrate holding section 135: Supply Department 136: Nozzle (treatment fluid nozzle) 136a: Frontend 136b: Liquid flow path 140, 140a, 140b: Near-infrared light sources 150: Near-infrared imaging section 160: Liquid reflux section 235: Supply Department L: Treatment fluid L1: Distance L2, L4: Length La: End Edge M136: Centerline S110: Steps (rotation process, acquisition process) S120, S220: Steps (processes for supplying materials) S130, S230: Steps (processes to be retrieved) S140: Steps (the process of irradiation, the process of generating the captured image) S150, S250: Steps (determined processes) S160, S260: Steps (calculated processes) S170, S270: Steps (processes for making judgments) S180, S280: Steps (processes that change at least one of the start and stop times of the return pull) S240: Steps (the process of irradiation, the process of generating the captured image, and the process of changing the near-infrared light source) SC: Steps (rotation process, feeding process) SD: Steps (processes to be retrieved) SE: Steps (the process of irradiation, the process of generating the captured image) SF: Steps (determined procedures) W: substrate Wa: upper surface

Claims

1. A substrate processing apparatus, wherein, The substrate processing apparatus has: a substrate holding portion that holds a substrate and rotates the substrate; a processing liquid nozzle that supplies a processing liquid to an upper surface of the substrate; a supply portion that supplies the processing liquid to the processing liquid nozzle; a liquid return portion that returns the processing liquid in the processing liquid nozzle to an upstream side; a near-infrared light source that irradiates a region including a tip of the processing liquid nozzle with near-infrared light; a near-infrared imaging portion that generates an imaging image of the processing liquid irradiated with the near-infrared light from the near-infrared light source; a control portion that controls the supply portion, the liquid return portion, and the near-infrared imaging portion; the control portion stops the supply of the processing liquid by the supply portion and returns the processing liquid in the processing liquid nozzle to the upstream side by the liquid return portion; the control portion images the processing liquid moving in the processing liquid nozzle to the upstream side by the near-infrared imaging portion; the control portion determines a position of an outer edge of the processing liquid in the processing liquid nozzle on the basis of the imaging image.

2. The substrate processing apparatus according to claim 1, wherein the control portion determines a position of an end edge on a downstream side of the processing liquid in the processing liquid nozzle on the basis of the imaging image.

3. The substrate processing apparatus according to claim 2, wherein the control portion calculates a speed at which the processing liquid moves in the processing liquid nozzle to the upstream side on the basis of the determined position of the end edge on the downstream side of the processing liquid.

4. The substrate processing apparatus according to claim 3, wherein the control portion images the processing liquid moving in the processing liquid nozzle to the upstream side by the near-infrared imaging portion when a predetermined time elapses from the start of the return of the processing liquid in the processing liquid nozzle to the upstream side by the liquid return portion; the control portion calculates the speed on the basis of the determined position of the end edge on the downstream side of the processing liquid and the predetermined time.

5. The substrate processing apparatus according to claim 4, wherein the control portion calculates a distance from a tip of the processing liquid nozzle to the end edge on the downstream side of the processing liquid on the basis of the imaging image; the control portion calculates the speed on the basis of the calculated distance and the predetermined time.

6. The substrate processing apparatus according to claim 3, wherein the control portion images the processing liquid moving in the processing liquid nozzle to the upstream side by the near-infrared imaging portion a plurality of times at predetermined time intervals; the control portion calculates the speed on the basis of the positions of the end edge on the downstream side of the processing liquid in the plurality of imaging images and the predetermined time.

7. The substrate processing apparatus according to any one of claims 4 to 6, wherein the processing liquid nozzle has a liquid flow path through which the processing liquid passes; the control portion determines a center line of the liquid flow path on the basis of the imaging image; the control portion calculates the speed on the basis of a length of movement of the end edge on the downstream side of the processing liquid along the center line of the liquid flow path and the predetermined time.

8. The substrate processing apparatus according to any one of claims 1 to 7, wherein ​ The control unit determines whether an abnormality has occurred based on the determined position of the outer edge of the treatment liquid; When the control unit determines that the abnormality has occurred, it changes at least one of the times when it starts drawing the treatment liquid upstream and when it stops drawing the treatment liquid upstream, based on the determined position of the outer edge of the treatment liquid.

9. The substrate processing apparatus according to any one of claims 1 to 8, wherein, The control unit determines the type of the treatment liquid based on the captured image.

10. The substrate processing apparatus according to any one of claims 1 to 9, wherein, The near-infrared light source includes a plurality of near-infrared light sources that emit near-infrared rays with different peak wavelengths. The control unit acquires type information indicating the type of the treatment liquid; The control unit adjusts the near-infrared light source that illuminates the area including the tip of the treatment fluid nozzle based on the acquired type information.

11. A substrate processing method, wherein, The substrate processing method includes: The process of holding the substrate and rotating the substrate; The process of supplying processing liquid to a processing liquid nozzle and supplying the processing liquid from the processing liquid nozzle to the upper surface of the substrate; The process of drawing the treatment fluid back upstream after stopping the supply of the treatment fluid; A process of irradiating an area including the tip of the treatment fluid nozzle with near-infrared light. The process of generating an image of the processing liquid that is irradiated by the near-infrared light and moves upstream within the nozzle of the processing liquid; and The process of determining the position of the outer edge of the treatment liquid inside the treatment liquid nozzle based on the captured image.

12. The substrate processing method according to claim 11, wherein, In the defined process, the position of the downstream edge of the treatment liquid inside the treatment liquid nozzle is determined based on the captured image.

13. The substrate processing method according to claim 12, wherein, The substrate processing method includes a step of calculating the speed at which the processing liquid moves upstream within the processing liquid nozzle based on the determined position of the downstream edge of the processing liquid.

14. The substrate processing method according to claim 13, wherein, In the process of generating the captured image, after a predetermined time has elapsed since the processing liquid in the processing liquid nozzle began to flow back upstream, the processing liquid moving upstream in the processing liquid nozzle is captured. In the calculation process, the speed is calculated based on the determined position of the downstream edge of the treatment liquid and the specified time.

15. The substrate processing method according to claim 14, wherein, In the calculation process, Calculate the distance from the tip of the treatment fluid nozzle to the downstream edge of the treatment fluid based on the captured image. The speed is calculated based on the calculated distance and the specified time.

16. The substrate processing method according to claim 13, wherein, In the process of generating the captured image, the processing liquid moving upstream inside the processing liquid nozzle is captured multiple times at specified time intervals. In the calculation process, the speed is calculated based on the position of the downstream edge of the processing liquid in a plurality of the captured images and the predetermined time.

17. The substrate processing method according to any one of claims 14 to 16, wherein, In the defined process, the centerline of the liquid flow path through which the treatment liquid passes by the treatment liquid nozzle is determined based on the captured image; In the calculation process, the speed is calculated based on the length of the downstream edge of the processed liquid moving along the centerline of the liquid flow path and the specified time.

18. The substrate processing method according to any one of claims 11-17, wherein, The substrate processing method includes: The determination of whether an abnormal process has occurred is based on the determined position of the outer edge of the processing liquid; and If the abnormality is determined to have occurred, the process of changing at least one of the following steps, based on the determined position of the outer edge of the treatment liquid, is to change the time point at which the treatment liquid is started to be drawn back upstream and the time point at which the treatment liquid is stopped to be drawn back upstream.

19. The substrate processing method according to any one of claims 11 to 18, wherein, In the defined process, the type of the treatment liquid is determined based on the captured images.

20. The substrate processing method according to any one of claims 11 to 19, wherein, The near-infrared light source includes a plurality of near-infrared light sources that emit near-infrared rays with different peak wavelengths. The substrate processing method includes: The process of obtaining type information indicating the type of the treatment liquid; and The process of modifying the near-infrared light source irradiating the area including the tip of the treatment liquid nozzle is based on the acquired type information.

Images