Self-cleaning device

By designing a self-cleaning cleaning device, which uses a conical water tank and agitation backwash water pipe structure, the problem of iron filings being difficult to clean from the water tank of traditional cleaning machines is solved, achieving automated cleaning and ensuring stable equipment operation.

CN121870525APending Publication Date: 2026-04-17DALIAN ZHUANGHE CONTEMPORARY AUXILIARY MASCH MFG CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
DALIAN ZHUANGHE CONTEMPORARY AUXILIARY MASCH MFG CO LTD
Filing Date
2026-03-18
Publication Date
2026-04-17

AI Technical Summary

Technical Problem

Iron filings are difficult to remove from the water tank of traditional cleaning machines, leading to unstable equipment operation and cleaning difficulties.

Method used

Design a self-cleaning cleaning device that uses a conical water tank structure, combined with agitation backwash pipe and backwash nozzle, to achieve automated cleaning and automatically remove chips from the water tank.

Benefits of technology

It achieves a self-cleaning function for the water tank, requiring no manual intervention, ensuring stable equipment operation, and meeting cleaning process requirements.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The bottom of a water tank is of a conical structure, the conical bottom of the water tank is connected with a filter pump water inlet pipe of a filter water pump, and a cleaning station support is installed on the inner side of the water tank and located above the liquid level of the water tank; a flow-stirring back-flushing water pipe is arranged below the liquid level of the water tank in the water tank along the circumferential direction; and back-flushing nozzles are arranged on the flow-stirring back-flushing water pipe along the same direction. According to the self-cleaning device, the water tank is of the conical bottom structure, the stirring back-flushing water pipe and the back-flushing nozzle are arranged in the water tank, self-cleaning of the water tank can be achieved, the automation degree is high, manual intervention is not needed, and the process requirement that no scraps exist in the water tank during cleaning can be met.
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Description

Technical Field

[0001] This invention relates to the field of mechanical parts processing technology. Background Technology

[0002] In the production of engine parts and other components, the processed parts need to be cleaned, and cleaning the debris stored in the cleaning fluid tanks on the production line has always been a challenging problem. Given the demands for flexible engine production equipment, high equipment uptime, and simple maintenance, effectively removing the cleaned debris from the cleaning fluid tanks to ensure stable and normal equipment operation is crucial.

[0003] Currently, conventional cleaning machines have two main water tank layouts: one separates the cleaning and drying stations from the water tank, with a separate wastewater storage tank and a backflushing pipe at the cleaning station. However, even with a backflushing pipe, cast iron filings cannot be automatically cleaned. The other layout integrates the cleaning and drying stations with the water tank, featuring a sloping bottom plate and a backflushing pipe. This results in high water resistance and a very short backflushing distance for the chips, leading to poor overall chip removal. Both designs suffer from chip accumulation in the water tank, requiring manual cleaning, which is difficult or impossible, thus affecting equipment functionality and the normal operation of the production line. Summary of the Invention

[0004] To address the problem of iron filings being difficult to remove from traditional cleaning tanks, this invention provides a self-cleaning cleaning device.

[0005] The technical solution adopted by the present invention to achieve the above objectives is as follows: a self-cleaning cleaning device, wherein the bottom of the water tank 8 is a conical structure, the conical bottom of the water tank 8 is connected to the filter pump inlet pipe 4 of the filter water pump 2, a cleaning station support 6 is installed inside the water tank 8, the cleaning station support 6 is located above the liquid surface 19 of the water tank; a stirring backwash water pipe 3 is provided circumferentially below the liquid surface 19 of the water tank 8, and backwash nozzles are installed in the same direction on the stirring backwash water pipe 3.

[0006] The agitation backwash water pipe 3 is symmetrically equipped with a first backwash nozzle 5, a second backwash nozzle 7, a third backwash nozzle 10, and a fourth backwash nozzle 13 in four directions.

[0007] The water tank 8 and the filter water pump 2 are installed on the frame 17. The drying chamber 20 is installed on the frame 17 on one side of the water tank 8. The bottom plate 11 of the drying chamber 20 is inclined. The drying chamber 20 is provided with a drying station support 12. The side wall of the water tank 8 is provided with a drying chamber return water inlet 18. The bottom of the drying chamber 20 is connected to the drying chamber return water inlet 18 through a pipeline.

[0008] The angles a and b between the conical bottom of the water tank 8 and the horizontal plane are not less than 18 degrees.

[0009] A liquid level detection device 16 is installed on the protruding part 14 of the water tank 8, and an oil discharge suction port 15 is provided on the protruding part 14 of the water tank.

[0010] The bottom of the water tank 8 is equipped with a workstation support leg 9, and the cleaning workstation support 6 is installed on the top of the workstation support leg 9.

[0011] The self-cleaning cleaning device of the present invention has a conical bottom structure for the water tank, and the water tank is equipped with a stirring backwash pipe and a backwash nozzle to achieve self-cleaning of the water tank. It has a high degree of automation and does not require manual intervention, and can meet the process requirements of cleaning the water tank without the accumulation of debris. Attached Figure Description

[0012] Figure 1 This is a front view (AA) sectional view of the self-cleaning device of the present invention.

[0013] Figure 2 This is a left-side BB cross-sectional view of the self-cleaning cleaning device of the present invention.

[0014] Figure 3 This is a top view of the self-cleaning cleaning device of the present invention.

[0015] In the diagram: 1. Filter pump outlet pipe; 2. Water pump; 3. Agitator backwash pipe; 4. Filter pump inlet pipe; 5. First backwash nozzle; 6. Cleaning station support; 7. Second backwash nozzle; 8. Water tank; 9. Station support leg; 10. Third backwash nozzle; 11. Drying chamber bottom plate; 12. Drying station support; 13. Fourth backwash nozzle; 14. Protruding part of water tank; 15. Oil discharge suction port; 16. Liquid level detection device; 17. Frame; 18. Drying chamber return water port; 19. Water tank liquid level; 20. Drying chamber. Detailed Implementation

[0016] The self-cleaning cleaning device of the present invention, such as Figures 1-3 As shown, it includes the following components: filter pump outlet pipe 1, water pump 2, agitation backwash water pipe 3, filter pump inlet pipe 4, first backwash nozzle 5, cleaning station support 6, second backwash nozzle 7, water tank 8, station support leg 9, third backwash nozzle 10, drying chamber bottom plate 11, drying station support 12, fourth backwash nozzle 13, water tank protrusion 14, floating oil removal suction port 15, liquid level detection device 16, frame 17, drying chamber return water port 18, drying chamber 20, etc.

[0017] The machine body 17 is the frame of the machine tool, housing the water tank 8, the drying station support 12, etc. The water tank 8 (including the conical bottom water tank protrusion 14) is fixed on the frame 17, located below the cleaning station 6. The angle α or β between the conical bottom of the water tank 8 and the horizontal plane is not less than 18 degrees. The station support leg 9 is arranged inside the water tank 8, and the cleaning station support 6 is installed on the top of the station support leg 9. The water tank protrusion 14 is provided on one side of the water tank. The first backflushing nozzle 5, the second backflushing nozzle 7, the third backflushing nozzle 10, and the fourth backflushing nozzle 13 are symmetrically installed in four directions on the agitation backflushing water pipe 3. They are arranged below the water tank liquid surface in the conical bottom water tank 8. The agitation backflushing water pipe 3 is arranged circumferentially below the water tank liquid surface 19 in the water tank 8. The liquid in the agitation backflushing pipe 3 comes from the liquid after primary filtration in the cleaning filtration system or the liquid transported by a separate circulation pump. The first backflush nozzle 5, the second backflush nozzle 7, the third backflush nozzle 10, and the fourth backflush nozzle 13 have large flow rates, and the backflush nozzles are approximately parallel to the side wall of the water tank. When the backflush nozzles are working, they generate water flow around the water tank. The filter water pump 2 is fixed on the frame 17, and its front end filter pump inlet pipe 4 is connected to the conical bottom opening of the conical bottom water tank 8. The filter pump outlet pipe 1 leads to the machine tool filtration system, that is, this water pipe transports the dirty liquid (cleaning liquid containing chips and other impurities) to the filtration system. A drying chamber 20 is installed on the frame 17 on one side of the water tank 8. The drying chamber bottom plate 11 of the drying chamber 20 has an inclined structure, and a drying station support 12 is provided on the drying chamber 20. A drying chamber return port 18 is provided on the side wall of the water tank 8, and the bottom of the drying chamber 20 is connected to the drying chamber return port 18 through a pipeline. The drying station support 12 is a station for cleaning and drying workpieces. When this station is working, chips and other impurities are generated. A liquid level detection device 16 is installed on the protruding part 14 of the water tank 8, and an oil discharge suction port 15 is provided on the protruding part 14 of the water tank.

[0018] Working Principle: When the machine tool is working, the cleaning fluid containing chips, oil, and other impurities generated by the cleaning station support 6 and the drying station support 12 is collected directly or through the drying chamber bottom plate 11 into the conical bottom water tank 8. The backwash nozzle in the conical bottom water tank 8 is below the water level in the tank, and the large flow of liquid it sprays rotates the dirty liquid (containing chips and other impurities) in the conical bottom water tank 8. The conical angle at the bottom of the water tank 8 causes the liquid to have different speeds at different heights, forming small vortices, which carry the denser chips and other impurities in the liquid to the inlet of the water pump inlet pipe 4 at the lowest point of the conical bottom (when the water flows in rotation, the denser chips have a lower speed and move downwards). The filter pump 2 continuously draws away the cleaning fluid mixed with chips and other impurities through the filter pump inlet pipe 4 and delivers it to the filtration device through the filter pump outlet pipe 1. This prevents chip buildup in water tank 8, eliminating the need for manual cleaning of the conical-bottom water tank 8. The water tank is automatically cleaned, ensuring its continued usability. This completely solves the chip accumulation problem in the wastewater tank.

[0019] This invention has been described through embodiments. Those skilled in the art will understand that various changes or equivalent substitutions can be made to these features and embodiments without departing from the spirit and scope of the invention. Furthermore, under the teachings of this invention, these features and embodiments can be modified to adapt to specific situations and materials without departing from the spirit and scope of the invention. Therefore, this invention is not limited to the specific embodiments disclosed herein, and all embodiments falling within the scope of the claims of this application are within the protection scope of this invention.

Claims

1. A self-cleaning cleaning device, characterized in that: The bottom of the water tank (8) is a conical structure. The conical bottom of the water tank (8) is connected to the filter pump inlet pipe (4) of the filter water pump (2). A cleaning station support (6) is installed inside the water tank (8). The cleaning station support (6) is located above the liquid surface (19) of the water tank. A stirring backwash water pipe (3) is provided circumferentially below the liquid surface (19) of the water tank (8). Backwash nozzles are installed in the same direction along the upper edge of the stirring backwash water pipe (3).

2. The self-cleaning water tank according to claim 1, characterized in that: The first backflush nozzle (5), the second backflush nozzle (7), the third backflush nozzle (10) and the fourth backflush nozzle (13) are symmetrically installed in four directions on the agitation backflush water pipe (3).

3. The self-cleaning water tank according to claim 1, characterized in that: The water tank (8) and the filter water pump (2) are installed on the frame (17). The drying chamber (20) is installed on the side of the water tank (8) on the frame (17). The bottom plate (11) of the drying chamber (20) is inclined. The drying chamber (20) is provided with a drying station support (12). The side wall of the water tank (8) is provided with a drying chamber return water port (18). The bottom of the drying chamber (20) is connected to the drying chamber return water port (18) through a pipeline.

4. A self-cleaning water tank according to claim 1, characterized in that: The angles a and b between the conical bottom of the water tank (8) and the horizontal plane are not less than 18 degrees.

5. A self-cleaning water tank according to claim 1, characterized in that: A liquid level detection device (16) is installed on the protruding part (14) of the water tank (8), and an oil discharge suction port (15) is provided on the protruding part (14).

6. A self-cleaning water tank according to claim 1, characterized in that: The bottom of the water tank (8) is equipped with a workstation support leg (9), and the cleaning workstation support (6) is installed on the top of the workstation support leg (9).