Machining platform compensation device and compensation method

Abstract

The invention belongs to the technical field of machining platforms, and particularly relates to a machining platform compensation device and method. The machining platform compensation device comprises a galvanometer, a base, a first platform, a second platform, a first driving piece and a second driving piece. The first platform is slidably connected to the second platform, the second platform is slidably connected to the base, the first driving part can drive the first platform to move along the X axis, and the second driving part can drive the second platform to move along the Y axis; the galvanometer is arranged above the base and can rotate so as to adjust the scanning range of the galvanometer on the machined part placed on the first platform, when the machining platform deflects, the galvanometer can rotate by a corresponding angle in the scanning area of the machined part by rotating the galvanometer, and the rotating angle of the galvanometer is consistent with the deflection angle of the machining platform. Therefore, the position error of the machining platform can be correspondingly compensated.

Description

Technical Field

[0001] This invention belongs to the field of machining platform technology, and in particular relates to a machining platform compensation device and compensation method. Background Technology

[0002] In the field of precision machining, the runout value of the machining platform is quite important, as it affects the actual machining position of the machining tool and thus the machining accuracy.

[0003] A linear encoder is a commonly used measuring device that can measure the displacement of an object with high precision. Existing machining platforms are equipped with a linear encoder to measure the platform's position during movement, and then the machining tool's position is adjusted based on the measurement results.

[0004] However, grating rulers can usually only measure the runout value in one direction, and cannot measure the runout value in two directions at the same time. They cannot perform two-dimensional compensation for the machining platform in two directions. Therefore, there are certain limitations when measuring the runout value of the machining platform, which will affect the machining accuracy of the machining platform. Summary of the Invention

[0005] The technical problem to be solved by the present invention is: to address the problem that existing grating rulers cannot simultaneously measure the runout values ​​in two directions, which affects the processing accuracy of the processing platform, and to provide a processing platform compensation device and compensation method.

[0006] To solve the above-mentioned technical problems, on the one hand, embodiments of the present invention provide a processing platform compensation device, including a galvanometer, a base, a first platform, a second platform, a first driving member, and a second driving member; The first platform is slidably connected to the second platform, the second platform is slidably connected to the base, the first driving member is mounted on the second platform, the first driving member can drive the first platform to move along the X-axis, the second driving member is mounted on the base, and the second driving member can drive the second platform to move along the Y-axis; The galvanometer is positioned above the base and is rotatable to adjust the scanning range of the galvanometer placed on the workpiece on the first platform.

[0007] Optionally, it also includes a first main grating ruler and a first auxiliary grating ruler, which are arranged on opposite sides of the first platform along the Y-axis; The first main grating ruler includes a first main scale and a first main reading head, the first main reading head being used to read the value of the first main scale; The first set of grating rulers includes a first set of scales and a first set of reading heads, the first set of reading heads being used to read the value of the first set of scales; The first main reading head and the first auxiliary reading head are mounted on the first platform, and the first main scale and the first auxiliary scale are mounted on the second platform and extend along the X-axis.

[0008] Optionally, it also includes a second main grating ruler and a second auxiliary grating ruler, the second main grating ruler and the second auxiliary grating ruler being arranged on opposite sides of the second platform along the X-axis; The second main grating ruler includes a second main scale and a second main reading head, the second main reading head being used to read the value of the second main scale; The second set of grating rulers includes a second set of scales and a second set of reading heads, the second set of reading heads being used to read the values ​​of the second set of scales; The second main reading head and the second auxiliary reading head are mounted on the second platform, and the second main scale and the second auxiliary scale are mounted on the base and extend along the Y-axis.

[0009] Optionally, it also includes a first linear guide, a second linear guide, a third linear guide, and a fourth linear guide. The first linear guide and the second linear guide are disposed on the second platform and extend along the X-axis. The first driving member can drive the first platform to move along the first linear guide and the second linear guide. The third linear guide and the fourth linear guide are disposed on the base and extend along the Y-axis, and the second driving member can drive the second platform to move along the third linear guide and the fourth linear guide.

[0010] On the other hand, embodiments of the present invention provide a machining platform compensation method, applied to the machining platform compensation device as described above, comprising: Measure the first runout difference of the first platform on the X-axis; The first yaw angle of the first platform is calculated based on the first yaw difference value; Measure the second runout value of the second platform on the Y-axis; Calculate the second yaw angle of the second platform based on the second yaw difference; The deflection angle of the processing platform is obtained based on the first deflection angle and the second deflection angle; The scanning area of ​​the galvanometer is adjusted by rotating it based on the deflection angle.

[0011] Optionally, measuring the first yaw difference value of the first platform on the X-axis includes: Obtain the readings of the first main grating ruler and the first auxiliary grating ruler set along the X-axis; Calculate the absolute value of the difference between the reading of the first main grating ruler and the reading of the first auxiliary grating ruler to obtain the first yaw difference value.

[0012] Optionally, calculating the first yaw angle of the first platform based on the first yaw difference includes: Obtain the distance L between the first main grating ruler and the first auxiliary grating ruler on the X-axis. X ; The first yaw angle α is calculated using the following formula (1): α=arctan(ΔX / L X (1); Where X1 is the reading of the first main grating ruler, X2 is the reading of the first auxiliary grating ruler, and ΔX=|X1-X2|.

[0013] Optionally, measuring the second yaw difference value of the second platform on the Y-axis includes: Obtain the readings of the second main grating ruler and the second auxiliary grating ruler set along the Y-axis; Calculate the absolute value of the difference between the reading of the second main grating ruler and the reading of the second auxiliary grating ruler to obtain the second yaw difference value.

[0014] Optionally, calculating the second yaw angle of the second platform based on the second yaw difference includes: Obtain the distance L between the second main grating ruler and the second auxiliary grating ruler on the Y-axis. Y ; The second yaw angle β is calculated using the following formula (2). β=arctan(ΔY / L Y (2); Where Y1 is the reading of the second main grating ruler, Y2 is the reading of the second auxiliary grating ruler, and ΔY=|Y1-Y2|.

[0015] Optionally, obtaining the deflection angle of the processing platform based on the first deflection angle and the second deflection angle includes: When the deflection directions of the first platform and the second platform are the same, the sum of the first deflection angle and the second deflection angle is set as the deflection angle of the processing platform. When the deflection directions of the first platform and the second platform are different, the difference between the first deflection angle and the second deflection angle is set as the deflection angle of the processing platform.

[0016] The machining platform compensation device of this invention allows the galvanometer to adjust the scanning range of the laser beam as the machining platform moves along the X and Y axes, ensuring that the laser beam accurately illuminates the target position of the workpiece. When the machining platform deflects in the X and Y axes, rotating the galvanometer rotates its scanning area on the workpiece by a corresponding angle, with the rotation angle matching the deflection angle of the machining platform. This compensates for the positional error of the machining platform, ensuring the beam always accurately illuminates the target position of the workpiece. Furthermore, the galvanometer's rotation angle needs to be continuously adjusted based on the real-time changes in the deflection angle during the platform's movement, achieving high-precision and high-efficiency machining positioning and meeting the high-precision machining requirements of the machining platform. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of a processing platform compensation device provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of the deflection of a first platform provided in an embodiment of the present invention; Figure 3 This is a schematic diagram of the deflection of the second platform provided in an embodiment of the present invention.

[0018] The reference numerals in the accompanying drawings are as follows: 1. Base; 2. First platform; 21. First main grating ruler; 22. First auxiliary grating ruler; 23. First linear guide rail; 24. Second linear guide rail; 3. Second platform; 31. Second main grating ruler; 32. Second auxiliary grating ruler; 33. Third linear guide rail; 34. Fourth linear guide rail; 4. First driving component; 5. Second driving component. Detailed Implementation

[0019] To make the technical problems solved, the technical solutions, and the beneficial effects of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

[0020] like Figures 1 to 3 As shown, an embodiment of the present invention provides a machining platform compensation device, including a galvanometer, a base 1, a first platform 2, a second platform 3, a first driving member 4, and a second driving member 5. The first platform 2 is slidably connected to the second platform 3, and the second platform 3 is slidably connected to the base 1. The first driving member 4 is mounted on the second platform 3 and can drive the first platform 2 to move along the X-axis. The second driving member 5 is mounted on the base 1 and can drive the second platform 3 to move along the Y-axis.

[0021] The workpiece is placed on the first platform 2. By moving the first platform 2 relative to the second platform 3 on the X-axis and the second platform 3 relative to the base 1 on the Y-axis, the workpiece on the first platform 2 can be precisely positioned in a two-dimensional plane.

[0022] The galvanometer is positioned above the base 1 and can rotate to adjust the scanning range of the galvanometer on the workpiece placed on the first platform 2.

[0023] As the machining platform moves along the X and Y axes, the galvanometer can adjust its laser scanning range as needed to ensure the laser beam accurately illuminates the target position on the workpiece. When the machining platform deflects in the X and Y axes, rotating the galvanometer allows it to rotate at a corresponding angle within the workpiece's scanning area. This rotation angle matches the platform's deflection angle, compensating for any positional errors and ensuring the beam always accurately illuminates the target position. Furthermore, the galvanometer's rotation angle needs continuous adjustment based on the real-time changes in the platform's deflection angle during movement, enabling high-precision, high-efficiency machining positioning and meeting the high-precision machining requirements of the machining platform.

[0024] In one embodiment, the first drive unit 4 is a rotary servo motor or a linear motor, and the second drive unit 5 is a rotary servo motor or a linear motor.

[0025] In one embodiment, such as Figure 1 As shown, the processing platform compensation device also includes a first main grating ruler 21 and a first auxiliary grating ruler 22, which are arranged on opposite sides of the first platform 2 along the Y-axis. The resolution of the first main grating ruler 21 and the first auxiliary grating ruler 22 is 0.1 μm, and the maximum measurement length is 1200 mm. The sampling frequency of the first main grating ruler 21 and the first auxiliary grating ruler 22 is set to 100 kHz to ensure the real-time performance and accuracy of the position feedback.

[0026] The first main grating ruler 21 and the first auxiliary grating ruler 22 use closed-loop control position feedback. During the movement of the first platform 2 along the X-axis, the first main grating ruler 21 measures and records the position value during the movement. The first main grating ruler 21 is used for closed-loop control position feedback during the movement, and the first auxiliary grating ruler 22 measures and records the position value during the movement.

[0027] The first primary grating ruler 21 includes a primary scale and a primary reading head, the primary reading head being used to read the value of the primary scale. The first secondary grating ruler 22 includes a secondary scale and a secondary reading head, the secondary reading head being used to read the value of the secondary scale. The primary and secondary reading heads are mounted on the first platform 2, and the primary and secondary scales are mounted on the second platform 3 and extend along the X-axis. In this embodiment, by comparing the value of the primary scale with the value of the secondary scale, it can be determined whether the first platform 2 has deflected during movement. Then, based on the distance between the primary and secondary scales, the deflection angle of the first platform 2 can be calculated. Based on this deflection angle, the galvanometer can be rotated to compensate for the deviation of the first platform 2.

[0028] Specifically, when the first platform 2 moves along the X-axis, the first main reading head and the first auxiliary reading head move along with the first platform 2. The first main reading head, in conjunction with the first main scale, can measure the distance moved on one side of the first platform 2, and the first auxiliary reading head, in conjunction with the first auxiliary scale, can measure the distance moved on the other side of the first platform 2.

[0029] Compare the values ​​of the first main scale with the values ​​of the first secondary scale. If the values ​​of the first main scale and the first secondary scale are consistent or within a very small error range, it indicates that the first platform 2 has no obvious runout on the X-axis.

[0030] If there is a significant difference between the value on the first main scale and the value on the first secondary scale, it indicates that the first platform 2 has wobbled during movement. If the value on the first main scale is much larger than the value on the first secondary scale, it indicates that the first platform 2 has tilted or wobbled towards the side where the first main grating scale is located. If the value on the first main scale is much smaller than the value on the first secondary scale, it indicates that the first platform 2 has tilted or wobbled towards the side where the first secondary grating scale is located.

[0031] When it is determined that the first platform 2 is skewed, the degree of skew is determined by calculating the difference between the value of the first main scale and the value of the first secondary scale. This difference reflects the difference in positional change of the first platform 2 at two relative positions, that is, the magnitude of the skew value.

[0032] Let the value of the first primary scale be X1, and the value of the first secondary scale be X2. The difference in runout of the first platform 2 on the X-axis is represented as |X1-X2|. The larger this difference is, the greater the degree of runout of the first platform 2.

[0033] like Figure 2 As shown, after the first main scale and the first auxiliary scale are installed on the second platform 3, the distance between the first main scale and the first auxiliary scale is measured to be L. XSubstituting the above values ​​into the inverse trigonometric function formula α=arctan(ΔX / L) X In the formula, ΔX = |X1 - X2|, the yaw angle α of the first platform 2 can be calculated. The angle of deflection of the galvanometer is also α, thus compensating for the deviation of the first platform 2.

[0034] In one embodiment, such as Figure 1 As shown, the processing platform compensation device also includes a second main grating ruler 31 and a second auxiliary grating ruler 32, which are arranged along the X-axis on opposite sides of the second platform 3. The resolution of the second main grating ruler 31 and the second auxiliary grating ruler 32 is 0.1 μm, and the maximum measurement length is 1200 mm. The sampling frequency of the second main grating ruler 31 and the second auxiliary grating ruler 32 is set to 100 kHz to ensure the real-time performance and accuracy of the position feedback.

[0035] The second main grating ruler 31 and the second auxiliary grating ruler 32 use closed-loop control position feedback. During the movement of the second platform 3 along the Y-axis, the second main grating ruler 31 measures and records the position value during the movement. The second main grating ruler 31 is used for closed-loop control position feedback during the movement, and the second auxiliary grating ruler 32 measures and records the position value during the movement.

[0036] The second primary grating ruler 31 includes a second primary scale and a second primary reading head, the latter used to read the value of the primary scale. The second secondary grating ruler 32 includes a second secondary scale and a second secondary reading head, the latter used to read the value of the secondary scale. The second primary and secondary reading heads are mounted on the second platform 3, and the second primary and secondary scales are mounted on the base 1 and extend along the Y-axis. In this embodiment, by comparing the value of the second primary scale with the value of the second secondary scale, it can be determined whether the second platform 3 has deflected during movement. Then, based on the distance between the second primary scale and the second secondary scale, the deflection angle of the second platform 3 can be calculated. Based on this deflection angle, the galvanometer can be rotated to compensate for the deviation of the second platform 3.

[0037] Specifically, when the second platform 3 moves along the Y-axis, the second main reading head and the second auxiliary reading head move along with the second platform 3. The second main reading head, in conjunction with the second main scale, can measure the distance moved on one side of the second platform 3, and the second auxiliary reading head, in conjunction with the second auxiliary scale, can measure the distance moved on the other side of the second platform 3.

[0038] Compare the values ​​of the second main scale with those of the second secondary scale. If the values ​​of the second main scale and the second secondary scale are consistent or within a very small error range, it indicates that the second platform 3 does not have obvious sway on the Y-axis.

[0039] If there is a significant difference between the values ​​on the second main scale and the second auxiliary scale, it indicates that the second platform 3 has wobbled during movement. If the value on the second main scale is much larger than the value on the second auxiliary scale, it indicates that the second platform 3 is tilted or wobbled towards the side where the second auxiliary grating scale 32 is located. If the value on the second main scale is much smaller than the value on the second auxiliary scale, it indicates that the second platform 3 is tilted or wobbled towards the side where the second main grating scale 31 is located.

[0040] When it is determined that the second platform 3 is skewed, the degree of skew is determined by calculating the difference between the value on the second main scale and the value on the second secondary scale. This difference reflects the difference in positional change of the second platform 3 at two relative positions, i.e., the magnitude of the skew value.

[0041] Let the value of the second primary scale be Y1 and the value of the second secondary scale be Y2. The difference in yaw of the second platform 3 on the Y-axis is represented as |Y1-Y2|. The larger this difference is, the greater the degree of yaw of the second platform 3.

[0042] like Figure 3 As shown, after the second main scale and the second auxiliary scale are installed on the base 1, the distance between the second main scale and the second auxiliary scale is measured to be L. Y Substituting the above values ​​into the inverse trigonometric function formula β=arctan(ΔY / L) Y In the equation, ΔY = |Y1 - Y2|, the yaw angle β of the second platform 3 can be calculated. The angle of deflection of the galvanometer is also β, thus compensating for the deviation of the second platform 3.

[0043] In one embodiment, such as Figure 1 As shown, the processing platform compensation device also includes a first linear guide 23, a second linear guide 24, a third linear guide 33, and a fourth linear guide 34. The first linear guide 23 and the second linear guide 24 are disposed on the second platform 3 and extend along the X-axis. The first driving member 4 can drive the first platform 2 to move along the first linear guide 23 and the second linear guide 24, and the first linear guide 23 and the second linear guide 24 provide precise guidance for the movement of the first platform 2 on the X-axis.

[0044] The third linear guide rail 33 and the fourth linear guide rail 34 are mounted on the base 1 and extend along the Y-axis. The second drive unit 5 can drive the second platform 3 to move along the third linear guide rail 33 and the fourth linear guide rail 34. The third linear guide rail 33 and the fourth linear guide rail 34 provide precise guidance for the movement of the second platform 3 on the Y-axis.

[0045] On the other hand, embodiments of the present invention provide a processing platform compensation method, applied to the processing platform compensation device of the above embodiments, comprising the following steps: S1. Measure the first runout difference of the first platform 2 of the machining platform on the X-axis. The first platform 2 can move along the X-axis.

[0046] S2. Calculate the first yaw angle of the first platform 2 based on the first yaw difference measured in real time. The first yaw angle is calculated using the inverse trigonometric function formula.

[0047] S3. Measure the second runout difference of the second platform 3 of the machining platform on the Y-axis. The second platform 3 can move along the Y-axis. The workpiece is placed on the first platform 2. The first platform 2 is slidably connected to the second platform 3. The movement of the workpiece on the XY plane can be realized through the first platform 2 and the second platform 3.

[0048] S4. Calculate the second swing angle of the second platform 3 based on the second swing difference measured in real time. The second swing angle is calculated using the inverse trigonometric function formula.

[0049] S5. Obtain the deflection angle of the processing platform based on the first deflection angle and the second deflection angle; wherein, when both the first platform 2 and the second platform 3 deflect, the overall deflection angle of the processing platform can be determined by the superposition of the first deflection angle and the second deflection angle.

[0050] S6. Based on the deflection angle, the scanning area of ​​the galvanometer above the machining platform is rotated and adjusted. The scanning area is rotated by the corresponding angle to ensure that the beam can always accurately illuminate the target position of the workpiece and to compensate for the position error of the machining platform.

[0051] In this embodiment, when the machining platform deflects in the X and Y axes, the deflection angle of the machining platform is obtained based on the first and second deflection angles. By rotating the galvanometer, the galvanometer can rotate at a corresponding angle within the scanning area of ​​the workpiece, and the rotation angle of the galvanometer is consistent with the deflection angle of the machining platform. This allows for compensation for the positional error of the machining platform, ensuring that the light beam always accurately illuminates the target position of the workpiece. Furthermore, the rotation angle of the galvanometer needs to be continuously adjusted according to the real-time changes in the deflection angle during the movement of the machining platform, enabling high-precision and high-efficiency machining positioning and meeting the high-precision machining requirements of the machining platform.

[0052] In one embodiment, in step S1, a first main grating ruler 21 and a first auxiliary grating ruler 22 are arranged on opposite sides of the Y-axis of the first platform 2. Measuring the first runout difference value of the first platform 2 of the processing platform on the X-axis includes: After the first platform 2 moves along the X-axis to the target position, it acquires the readings of the first main grating ruler 21 and the first auxiliary grating ruler 22 set along the X-axis. The absolute value of the difference between the reading of the first main grating ruler 21 and the reading of the first auxiliary grating ruler 22 is calculated to obtain the first sway difference value.

[0053] The first platform 2 can be moved in real time by the first main grating ruler 21 and the first auxiliary grating ruler 22. The first yaw difference can be calculated based on the real-time measured position value, and then the first yaw angle can be calculated based on the first yaw difference. This allows the galvanometer to be continuously adjusted according to the change of angle, ensuring that the scanning area of ​​the galvanometer is kept illuminating the target position of the workpiece.

[0054] Specifically, the first main grating ruler 21 includes a first main scale and a first main reading head, the first auxiliary grating ruler 22 includes a first auxiliary scale and a first auxiliary reading head, the first main reading head and the first auxiliary reading head are mounted on the first platform 2 and can move with the first platform 2, the first main scale and the first auxiliary scale are mounted on the second platform 3 and extend along the X-axis.

[0055] The first main reading head is used to read the value of the first main scale, which is the distance moved by one side of the first platform 2. The first auxiliary reading head is used to read the value of the first auxiliary scale, which is the distance moved by the other side of the first platform 2.

[0056] During the movement of the first platform 2 along the first linear guide rail 23 and the second linear guide rail 24, when the first platform 2 sways, the moving distances of the two sides of the first platform 2 are different. At this time, the value of the first main scale and the value of the first secondary scale will have a large difference. The first sway difference can be obtained by calculating the difference between the value of the first main scale and the value of the first secondary scale.

[0057] Let the value of the first primary scale be X1, and the value of the first secondary scale be X2. The first yaw difference of the first platform 2 on the X-axis is represented as |X1-X2|. The larger this difference is, the greater the degree of yaw of the first platform 2.

[0058] In one embodiment, such as Figure 2 As shown, in step S2, calculating the first yaw angle of the first platform 2 based on the first yaw difference includes: Obtain the distance L on the X-axis between the first main grating ruler 21 and the first auxiliary grating ruler 22. X .

[0059] L X Substituting into the inverse trigonometric function formula, the first yaw angle α is calculated using the following formula (1); α=arctan(ΔX / L X (1); Wherein, X1 is the reading of the first main grating ruler 21, X2 is the reading of the first auxiliary grating ruler 22, ΔX is the first yaw difference of the first platform 2 on the X-axis, ΔX=|X1-X2|, and the calculation accuracy of the first yaw angle α can reach 0.01°.

[0060] With the X-axis as the reference, when the value X1 of the first main scale is larger than the value X2 of the first secondary scale, it indicates that the first platform 2 is tilted or wobbled towards the side where the first main grating scale is located. In this case, the first platform 2 deflects clockwise in the XY plane. Figure 2 As shown, if the value X1 of the first main scale is smaller than the value X2 of the first secondary scale, it means that the first platform 2 is tilted or swayed to the side where the first secondary grating scale is located. At this time, the first platform 2 is deflected in the counterclockwise direction in the XY plane.

[0061] In one embodiment, in step S3, a second main grating ruler 31 and a second auxiliary grating ruler 32 are arranged on opposite sides of the X-axis of the second platform 3. Measuring the second runout difference value of the second platform 3 of the processing platform on the Y-axis includes: After the second platform 3 moves along the Y-axis to the target position, it acquires the readings of the second main grating ruler 31 and the second auxiliary grating ruler 32 set along the Y-axis. Calculate the absolute value of the difference between the reading of the second main grating ruler 31 and the reading of the second auxiliary grating ruler 32 to obtain the second sway difference value.

[0062] The second platform 3 can be moved in real time by the second main grating ruler 31 and the second auxiliary grating ruler 32. The second yaw difference can be calculated based on the real-time measured position value, and then the second yaw angle can be calculated based on the second yaw difference. This allows the galvanometer to be continuously adjusted according to the change of angle, ensuring that the scanning area of ​​the galvanometer is kept illuminating the target position of the workpiece.

[0063] Specifically, the second main grating ruler 31 includes a second main scale and a second main reading head, and the second auxiliary grating ruler 32 includes a second auxiliary scale and a second auxiliary reading head. The second main reading head and the second auxiliary reading head are mounted on the second platform 3, and the second main scale and the second auxiliary scale are mounted on the base 1 and extend along the Y-axis.

[0064] The second main reading head is used to read the value of the second main scale, which represents the distance moved by one side of the second platform 3. The second auxiliary reading head is used to read the value of the second auxiliary scale, which represents the distance moved by the other side of the second platform 3.

[0065] During the movement of the second platform 3 along the third linear guide rail 33 and the fourth linear guide rail 34, when the second platform 3 sways, the movement distances of the two sides of the second platform 3 are different. At this time, the value of the second main scale and the value of the second auxiliary scale will have a large difference. The second sway difference can be obtained by calculating the difference between the value of the second main scale and the value of the second auxiliary scale.

[0066] Let the value of the second primary scale be Y1, and the value of the second secondary scale be Y2. The difference in y-axis yaw of the second platform 3 is represented as |Y1-Y2|. The larger this difference, the greater the degree of yaw of the second platform 3. In one embodiment, in step S4, as Figure 3 As shown, the calculation of the second yaw angle of the second platform 3 based on the second yaw difference includes: Obtain the distance L on the Y-axis between the second main grating ruler 31 and the second auxiliary grating ruler 32. Y .

[0067] L Y Substituting into the inverse trigonometric function formula, the second yaw angle β is calculated using the following formula (2); β=arctan(ΔY / L Y (2); Wherein, Y1 is the reading of the second main grating ruler 31, Y2 is the reading of the second auxiliary grating ruler 32, ΔY is the second yaw difference of the second platform 3 on the Y-axis, ΔY=|Y1-Y2|, and the calculation accuracy of the second yaw angle β can reach 0.01°.

[0068] With the Y-axis as the reference, when the value Y1 of the second main scale is larger than the value Y2 of the second auxiliary scale, it indicates that the second platform 3 is tilted or wobbled towards the side where the second auxiliary grating scale 32 is located. In this case, the second platform 3 deflects clockwise in the XY plane. Figure 3 As shown, the value Y1 of the second main scale is smaller than the value Y2 of the first auxiliary scale, indicating that the second platform 3 is tilted or wobbled to the side where the second main grating scale 31 is located. At this time, the second platform 3 deflects counterclockwise in the XY plane.

[0069] In one embodiment, step S5, obtaining the deflection angle of the processing platform based on the first deflection angle and the second deflection angle, includes: When the deflection directions of the first platform 2 and the second platform 3 are the same, the deflection angles of the first platform 2 and the second platform 3 will reinforce each other, thereby increasing the overall deflection angle of the processing platform. The sum of the first deflection angle and the second deflection angle is set as the deflection angle of the processing platform.

[0070] When the deflection directions of the first platform 2 and the second platform 3 are different, the deflection angles of the first platform 2 and the second platform 3 will partially cancel each other out, thereby reducing the overall deflection angle of the processing platform. The difference between the first deflection angle and the second deflection angle is set as the deflection angle of the processing platform.

[0071] By distinguishing whether the deflection directions of the first platform 2 and the second platform 3 are the same, all possible deflection situations can be fully considered, the total degree of deflection of the processing platform can be accurately reflected, and the positional deviation of the processing platform can be compensated.

[0072] Specifically, when the first platform 2 deflects counterclockwise in the XY plane and the second platform 3 deflects counterclockwise in the XY plane, or when the first platform 2 deflects clockwise in the XY plane and the second platform 3 deflects clockwise in the XY plane, the deflection directions of the first platform 2 and the second platform 3 are the same. At this time, the deflection angle of the processing platform is the sum of the first deflection angle and the second deflection angle.

[0073] When the first platform 2 deflects counterclockwise in the XY plane and the second platform 3 deflects clockwise in the XY plane, or when the first platform 2 deflects clockwise in the XY plane and the second platform 3 deflects counterclockwise in the XY plane, the deflection directions of the first platform 2 and the second platform 3 are different. In this case, the deflection angle of the processing platform is the difference between the first deflection angle and the second deflection angle.

[0074] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A processing platform compensation device, characterized in that, Includes a galvanometer, a base, a first platform, a second platform, a first drive component, and a second drive component; The first platform is slidably connected to the second platform, the second platform is slidably connected to the base, the first driving member is mounted on the second platform, the first driving member can drive the first platform to move along the X-axis, the second driving member is mounted on the base, and the second driving member can drive the second platform to move along the Y-axis; The galvanometer is positioned above the base and is rotatable to adjust the scanning range of the galvanometer placed on the workpiece on the first platform.

2. The processing platform compensation device as described in claim 1, characterized in that, It also includes a first main grating ruler and a first auxiliary grating ruler, which are arranged on opposite sides of the first platform along the Y-axis; The first main grating ruler includes a first main scale and a first main reading head, the first main reading head being used to read the value of the first main scale; The first set of grating rulers includes a first set of scales and a first set of reading heads, the first set of reading heads being used to read the value of the first set of scales; The first main reading head and the first auxiliary reading head are mounted on the first platform, and the first main scale and the first auxiliary scale are mounted on the second platform and extend along the X-axis.

3. The processing platform compensation device as described in claim 2, characterized in that, It also includes a second main grating ruler and a second auxiliary grating ruler, which are arranged on opposite sides of the second platform along the X-axis; The second main grating ruler includes a second main scale and a second main reading head, the second main reading head being used to read the value of the second main scale; The second set of grating rulers includes a second set of scales and a second set of reading heads, the second set of reading heads being used to read the values ​​of the second set of scales; The second main reading head and the second auxiliary reading head are mounted on the second platform, and the second main scale and the second auxiliary scale are mounted on the base and extend along the Y-axis.

4. The processing platform compensation device as described in claim 1, characterized in that, It also includes a first linear guide rail, a second linear guide rail, a third linear guide rail and a fourth linear guide rail. The first linear guide rail and the second linear guide rail are disposed on the second platform and extend along the X-axis. The first driving member can drive the first platform to move along the first linear guide rail and the second linear guide rail. The third linear guide and the fourth linear guide are disposed on the base and extend along the Y-axis, and the second driving member can drive the second platform to move along the third linear guide and the fourth linear guide.

5. A method for compensating a processing platform, characterized in that, The processing platform compensation device according to any one of claims 1-4 comprises: Measure the first runout difference of the first platform on the X-axis; The first yaw angle of the first platform is calculated based on the first yaw difference value; Measure the second runout value of the second platform on the Y-axis; Calculate the second yaw angle of the second platform based on the second yaw difference; The deflection angle of the processing platform is obtained based on the first deflection angle and the second deflection angle; The scanning area of ​​the galvanometer is adjusted by rotating it based on the deflection angle.

6. The processing platform compensation method as described in claim 5, characterized in that, The measurement of the first yaw difference value of the first platform on the X-axis includes: Obtain the readings of the first main grating ruler and the first auxiliary grating ruler set along the X-axis; Calculate the absolute value of the difference between the reading of the first main grating ruler and the reading of the first auxiliary grating ruler to obtain the first yaw difference value.

7. The processing platform compensation method as described in claim 6, characterized in that, The calculation of the first yaw angle of the first platform based on the first yaw difference includes: Obtain the distance L between the first main grating ruler and the first auxiliary grating ruler on the X-axis. X ; The first yaw angle α is calculated using the following formula (1): α=arctan(ΔX / L X ) (1); Where X1 is the reading of the first main grating ruler, X2 is the reading of the first auxiliary grating ruler, and ΔX=|X1-X2|.

8. The processing platform compensation method as described in claim 5, characterized in that, The measurement of the second yaw difference value of the second platform on the Y-axis includes: Obtain the readings of the second main grating ruler and the second auxiliary grating ruler set along the Y-axis; Calculate the absolute value of the difference between the reading of the second main grating ruler and the reading of the second auxiliary grating ruler to obtain the second yaw difference value.

9. The processing platform compensation method as described in claim 8, characterized in that, The calculation of the second yaw angle of the second platform based on the second yaw difference includes: Obtain the distance L between the second main grating ruler and the second auxiliary grating ruler on the Y-axis. Y ; The second yaw angle β is calculated using the following formula (2). β=arctan(ΔY / L Y ) (2); Where Y1 is the reading of the second main grating ruler, Y2 is the reading of the second auxiliary grating ruler, and ΔY=|Y1-Y2|.

10. The processing platform compensation method as described in claim 5, characterized in that, The process of obtaining the deflection angle of the processing platform based on the first deflection angle and the second deflection angle includes: When the deflection directions of the first platform and the second platform are the same, the sum of the first deflection angle and the second deflection angle is set as the deflection angle of the processing platform. When the deflection directions of the first platform and the second platform are different, the difference between the first deflection angle and the second deflection angle is set as the deflection angle of the processing platform.

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