Light-sensitive film-forming composition with bionic pearl layer structure and application of light-sensitive film-forming composition
By using a photosensitive film-forming composition with a biomimetic pearl layer structure, the synergistic effect of film-forming agents, mica sheets, and cross-linked polymers is utilized to simulate the pearl layer structure, solving the problems of uneven film layer and unintegrated gloss modification in base makeup products, and achieving a dual effect of strength, toughness, and gloss.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 佩莱未来生物科技(江苏)有限公司
- Filing Date
- 2026-02-12
- Publication Date
- 2026-05-12
AI Technical Summary
Existing base makeup products have uneven film layers, are easily broken, and have poor pressure resistance. Furthermore, they fail to systematically integrate gloss enhancement and makeup film formation, and thus cannot achieve excellent strength, toughness, and natural radiance.
The photosensitive film-forming composition employing a biomimetic nacre structure includes a film-forming agent, mica flakes, long-chain quaternary ammonium salt modified lithium montmorillonite, and sodium hyaluronate cross-linked polymer. By mimicking the 'brick-and-mortar' microstructure of nacre, it forms a three-dimensional gel network and layered arrangement, enhancing mechanical strength and luster.
It significantly enhances the mechanical strength, toughness, and impact resistance of base makeup products, while achieving a natural, three-dimensional pearlescent finish, providing excellent resistance to friction, deformation, and long-lasting makeup.
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Figure CN122005356A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of skin care technology, and in particular to a photosensitive film-forming composition with a biomimetic pearl layer structure and its application. Background Technology
[0002] Currently, most base makeup products use single or simply compounded film-forming agents to protect the makeup surface. However, due to the limitations of the molecular structure and properties of film-forming agents, the film layer of base makeup products suffers from problems such as unevenness, susceptibility to breakage, and poor pressure resistance. In addition, existing technologies often treat "gloss enhancement" and "film-forming with staying power" as two independent functional modules, using simple physical mixing and matching, failing to achieve a systematic integration of optical effects and film structure, and thus failing to achieve the dual effect of natural glow and film-forming performance. Summary of the Invention
[0003] Therefore, it is necessary to address the above-mentioned problems by providing a photosensitive film-forming composition with a biomimetic pearl layer structure and its application. When this photosensitive film-forming composition is applied to a base makeup product, the base makeup product has excellent strength, toughness, and luster, achieving the dual effect of film-forming performance and natural luster through the biomimetic structure.
[0004] This application discloses a photosensitive film-forming composition with a biomimetic nacre structure, comprising at least a film-forming agent, mica sheets, long-chain quaternary ammonium salt modified lithium montmorillonite, and sodium hyaluronate crosslinked polymer, wherein the ratio of the total mass of the long-chain quaternary ammonium salt modified lithium montmorillonite and the sodium hyaluronate crosslinked polymer to the mass of the mica sheets is (0.4-5.5):1, and the molecular weight of the sodium hyaluronate crosslinked polymer is greater than or equal to 3,000,000 Da.
[0005] In one embodiment, the average particle size of the mica sheets is 12 μm-16 μm;
[0006] And / or, the mass ratio of the film-forming agent to the mica sheet is (2.4-120):1.
[0007] In one embodiment, the mica sheet is selected from at least one of the following: mica sheet treated with lauroyl lysine, organofluorine phlogopite, and mica sheet treated with triethoxyoctylsilane.
[0008] In one embodiment, the mass ratio of the long-chain quaternary ammonium salt modified lithium montmorillonite to the sodium hyaluronate crosslinked polymer is (2-50):1.
[0009] In one embodiment, the long-chain quaternary ammonium salt modified lithium montmorillonite is selected from distearate dimethylammonium lithium montmorillonite;
[0010] And / or, the density of the long-chain quaternary ammonium salt modified lithium montmorillonite is 1.5 g / cm³.3 -1.7g / cm 3 .
[0011] In one embodiment, the film-forming agent includes a first film-forming agent and / or a second film-forming agent. When the film-forming agent includes the first film-forming agent, the first film-forming agent is an MQ type silicone resin. When the film-forming agent includes the second film-forming agent, the second film-forming agent is at least one of pure T type silicone resin, MT type silicone resin, or silicone acrylic resin.
[0012] In one embodiment, the film-forming agent satisfies at least one of the following conditions:
[0013] (1) The first film-forming agent is selected from trimethylsiloxysilicate;
[0014] (2) The second film-forming agent is selected from at least one of polymethylsilsesquioxane and acrylate / polydimethylsiloxane copolymer;
[0015] (3) The mass ratio of the first film-forming agent to the second film-forming agent is 1:(0.3-120).
[0016] This application also provides a base makeup product comprising the light-reflecting film-forming composition as described above.
[0017] In one embodiment, the photosensitive film-forming composition has a mass fraction of less than or equal to 20% in the base makeup product.
[0018] In one embodiment, the base makeup product is a liquid foundation, a cream foundation, or a cushion foundation.
[0019] When the biomimetic pearl layer structure photosensitive film-forming composition provided by this invention is applied to base makeup products, the components work together to simulate the "brick-and-mortar" microstructure of the pearl layer. Specifically, the edge of the long-chain quaternary ammonium salt modified lithium montmorillonite has hydroxyl groups, which form a three-dimensional gel network with water molecules and sodium hyaluronate cross-linked polymer through hydrogen bonds, locking in skin moisture, reducing the tightness of the film and the brittleness of the film layer. As a buffer layer supporting the film-forming agent of the film-forming system, it together with the film-forming agent constitutes a flexible "mud" phase matrix. Meanwhile, when the ratio of the total mass of the long-chain quaternary ammonium salt modified lithium montmorillonite and sodium hyaluronate cross-linked polymer to the mass of mica flakes is (0.4-5.5):1, the "mud" phase matrix not only effectively supports and uniformly disperses the mica flakes, but also makes the mica flakes present a layered arrangement in the "mud" phase matrix, simulating the "brick-mud" structure of pearl layers. This structure significantly improves the mechanical strength, toughness and impact resistance of the film formed by the base makeup product by improving stress transmission efficiency and mechanical energy dissipation, thereby giving the base makeup product excellent anti-friction, anti-deformation and long-lasting makeup ability. At the same time, the layered mica flakes can reflect, refract and diffract light in an orderly manner, forming a natural, three-dimensional and layered pearl luster on the skin surface, so that the base makeup product has both excellent strength, toughness and luster, achieving the dual effect of film-forming performance and natural luster. Attached Figure Description
[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 This is the apparatus used in the anti-friction test in Test Example 1. Detailed Implementation
[0022] To facilitate understanding of the present invention, it will be described in more detail below. However, it should be understood that the present invention can be implemented in many different forms and is not limited to the embodiments or examples described herein. Rather, these embodiments or examples are provided to make the disclosure of the present invention more thorough and complete.
[0023] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the specification of this invention is for the purpose of describing particular embodiments or examples only and is not intended to limit the invention. The optional scope of the term "and / or" as used herein includes any one of two or more of the related listed items, as well as any and all combinations of the related listed items, including any two related listed items, any more related listed items, or a combination of all related listed items.
[0024] In this invention, numerical ranges are involved. Unless otherwise specified, the numerical ranges are considered continuous and include the minimum and maximum values of the range, as well as every value between the minimum and maximum values. Furthermore, when the range refers to integers, it includes every integer between the minimum and maximum values of the range. Additionally, when multiple ranges are provided to describe features or characteristics, the ranges may be merged. In other words, unless otherwise specified, all ranges disclosed herein should be understood to include any and all subranges to which they are included.
[0025] This invention provides a photosensitive film-forming composition with a biomimetic nacre structure, comprising at least a film-forming agent, mica sheets, long-chain quaternary ammonium salt modified lithium montmorillonite, and sodium hyaluronate crosslinked polymer, wherein the ratio of the total mass of the long-chain quaternary ammonium salt modified lithium montmorillonite and the sodium hyaluronate crosslinked polymer to the mass of the mica sheets is (0.4-5.5):1, and the molecular weight of the sodium hyaluronate crosslinked polymer is greater than or equal to 3,000,000 Da.
[0026] When the biomimetic pearl layer structure photosensitive film-forming composition provided by this invention is applied to base makeup products, the components work together to simulate the "brick-and-mortar" microstructure of the pearl layer. Specifically, the edge of the long-chain quaternary ammonium salt modified lithium montmorillonite has hydroxyl groups, which form a three-dimensional gel network with water molecules and sodium hyaluronate cross-linked polymer through hydrogen bonds, locking in skin moisture, reducing the tightness of the film and the brittleness of the film layer. As a buffer layer supporting the film-forming agent of the film-forming system, it together with the film-forming agent constitutes a flexible "mud" phase matrix.
[0027] In one embodiment, the carbon chain length in the long-chain quaternary ammonium salt modified lithium montmorillonite is 15-22, including but not limited to 15, 16, 17, 18, 19, 20, 21 or 22. The long-chain quaternary ammonium salt modified lithium montmorillonite is selected from distearate dimethylammonium lithium montmorillonite. Considering that the long-chain quaternary ammonium salt modified lithium montmorillonite has the advantages of strong stability and water resistance, it is preferred that the long-chain quaternary ammonium salt modified lithium montmorillonite is selected from distearate dimethylammonium lithium montmorillonite. Distearate dimethylammonium lithium montmorillonite has the layered crystal structure of lithium montmorillonite, and the interlayer region is occupied by the organic modifier distearate dimethylamine, forming an organic-inorganic composite structure.
[0028] In one embodiment, the density of the long-chain quaternary ammonium salt modified lithium montmorillonite is 1.5 g / cm³. 3 -1.7g / cm 3 Including but not limited to 1.5g / cm 3 1.6g / cm 3 Or 1.7g / cm 3 Controlling the density of long-chain quaternary ammonium salt modified lithium montmorillonite within the above range can make the long-chain quaternary ammonium salt modified lithium montmorillonite more uniformly dispersed, while improving the stability of the three-dimensional gel network.
[0029] In one embodiment, the mass ratio of long-chain quaternary ammonium salt modified lithium montmorillonite to sodium hyaluronate crosslinked polymer is (2-50):1, including but not limited to 2:1, 5:1, 10:1, 15:1, 20:1, 25:1, 30:1, 35:1, 40:1, 45:1 or 50:1, thereby achieving a rigid-flexible balance in the three-dimensional gel network.
[0030] Meanwhile, when the ratio of the total mass of the long-chain quaternary ammonium salt-modified lithium montmorillonite crosslinked polymer with sodium hyaluronate to the mass of the mica flakes is (0.4-5.5):1, including but not limited to 0.4:1, 1:1, 1.5:1, 2:1, 2.5:1, 3:1, 3.5:1, 4:1, 4.5:1, 5:1, or 5.5:1, the "mud" phase matrix not only effectively supports and uniformly disperses the mica flakes, but also causes the mica flakes to exhibit a layered arrangement within the "mud" phase matrix, simulating nacre. The "brick-and-mortar" structure significantly enhances the mechanical strength, toughness, and impact resistance of the film formed by the base makeup product by improving stress transmission efficiency and mechanical energy dissipation, thereby giving the base makeup product an excellent makeup-holding effect. At the same time, the layered mica sheets can reflect, refract, and diffract light in an orderly manner, forming a natural, three-dimensional, and layered pearl luster on the skin surface. This allows the base makeup product to have both excellent strength, toughness, and luster, achieving the dual effect of film-forming performance and natural luster.
[0031] Organically modified mica sheets not only retain the gloss and smoothness of mica sheets, but also exhibit good compatibility with other components in the photosensitive film-forming composition. Therefore, organically modified mica sheets are preferred. In one embodiment, the mica sheet is selected from at least one of lauroyl lysine-treated mica sheets, organofluorine phlogopite mica sheets, and triethoxyoctylsilane-treated mica sheets. In lauroyl lysine-treated mica sheets, lauroyl lysine is coated on the outer surface of the mica sheet. Lauroyl lysine-treated mica sheets have high adhesion, dispersibility, and hydrophobicity, and can be more uniformly distributed in layers in the film-forming system and the "mud" phase matrix. Therefore, it is preferred that the mica sheet is selected from lauroyl lysine-treated mica sheets.
[0032] In one embodiment, the aspect ratio of the mica sheet is greater than 1. It should be noted that the aspect ratio of the mica sheet refers to the ratio of the lateral dimension to the thickness of the mica sheet. It can be understood that a higher aspect ratio usually means that the material is thinner and has a larger area.
[0033] In one embodiment, the average particle size of the mica flakes is 12μm-16μm, including but not limited to 12μm, 13μm, 14μm, 15μm or 16μm. The average particle size of the mica flakes within the above range can enable the base makeup product to have a better skin feel and gloss. It should be noted that the particle size of the mica flakes refers to its diameter or side length in the planar direction. For irregularly shaped mica flakes, the particle size refers to its equivalent diameter, that is, the diameter of a circle with the same area as the mica flake.
[0034] In one embodiment, the mass ratio of the film-forming agent to the mica flakes is (2.4-120):1, including but not limited to 2.4:1, 10:1, 15:1, 20:1, 25:1, 30:1, 35:1, 40:1, 45:1, 50:1, 55:1, 60:1, 65:1, 70:1, 75:1, 80:1, 85:1, 90:1, 95:1, 100:1, 105:1, 110:1, 115:1 or 120:1, thereby giving the base makeup product excellent gloss, smudge resistance and impact resistance.
[0035] In one embodiment, the film-forming agent includes a first film-forming agent and / or a second film-forming agent, wherein the first film-forming agent is an MQ type silicone resin and the second film-forming agent is at least one of a pure T type silicone resin, an MT type silicone resin, or a silicone acrylic resin; it is understood that the film-forming agent may be selected solely from the first film-forming agent, or solely from the second film-forming agent, or may include both the first film-forming agent and the second film-forming agent simultaneously.
[0036] It should be noted that MQ type organosilicon resin refers to organosilicon resin composed of monofunctional siloxane units (M units) and tetrafunctional siloxane units (Q units) linked by siloxane bonds. Since trimethylsiloxysilicate has a double-layer cage-like structure composed of methyl-terminated multi-branched oligomeric siloxanes, this configuration has high spatial stability, restricting the free rotation and bending of molecular chains, thus having a certain rigidity. Therefore, preferably, the first film-forming agent is selected from trimethylsiloxysilicate.
[0037] It should be noted that pure T-type silicone resin refers to silicone resin composed of trifunctional T-units (CH3SiO2). 3 / 2 The second film-forming agent is a silicone polymer with a highly cross-linked three-dimensional network structure, which is polymerized from monofunctional M units and trifunctional T units. MT-type silicone resin refers to silicone resin copolymerized from monofunctional M units and trifunctional T units. Since polymethylsilsesquioxane and acrylate / polydimethylsiloxane copolymers have highly rotatable silicon-oxygen backbones in their molecular structures, and the methyl side chains can rotate freely and have low interaction forces, the film can exhibit more flexible macroscopic properties. Therefore, preferably, the second film-forming agent is selected from at least one of polymethylsilsesquioxane or acrylate / polydimethylsiloxane copolymers.
[0038] In one embodiment, the mass ratio of the first film-forming agent to the second film-forming agent is 1:(0.3-120), including but not limited to 1:0.3, 1:0.31, 1:0.32, 1:0.33, 1:0.34, 1:0.35, 1:0.36, 1:0.37, 1:0.38, 1:0.39, 1:0.4, 1:0.5, 1:0.6, 1:0.7, 1:0.8, 1:0.9, 1:1, 1:10, 1:20, 1:30, 1:40, 1:50, 1:60, 1:70, 1:80, 1:90, 1:100, 1:110, or 1:120, thereby achieving precise control of the mechanical properties of the base makeup product film layer and obtaining a film layer with both excellent strength and flexibility.
[0039] The present invention also discloses a base makeup product comprising the light-sensitive film-forming composition as described above.
[0040] In one embodiment, the photosensitive film-forming composition has a mass fraction of less than or equal to 20% in the base makeup product, including but not limited to 20%, 18%, 16%, 14%, 12%, 10%, 8%, 6%, 4%, 2%, 1%, 0.9%, 0.8%, 0.7%, 0.6%, 0.5%, 0.4%, 0.3%, 0.2%, or 0.1%.
[0041] In one embodiment, the base makeup product is a liquid foundation, a cream foundation, or a cushion foundation.
[0042] The following specific examples will further illustrate a photosensitive film-forming composition with a biomimetic nacre structure and its application.
[0043] Referring to Table 1, the film-forming agent, long-chain quaternary ammonium salt modified lithium montmorillonite, mica sheets, and sodium hyaluronate crosslinked polymer were mixed to obtain the photosensitive film-forming compositions of Comparative Examples 1-5 and Examples 1-11.
[0044] Table 1
[0045]
[0046] Phase A, Phase B, and Phase C are provided respectively. Phase A consists of 6.00 parts by weight of cetyl PEG / PPG-10 / 1 polydimethylsiloxane, pentaerythritol tetra(bis-tert-butylhydroxyhydrogenated cinnamic acid) ester, 0.45 parts by weight of sanjiro yum, 28.80 parts by weight of polydimethylsiloxane, 0.80 parts by weight of diisostearyl malate, and 2.00 parts by weight of PEG-10 polydimethylsiloxane. Phase B consists of the photosensitive film-forming composition shown in Table 1. Phase C consists of the components shown in Table 2.
[0047] First, weigh phase A and phase B into a beaker, mix them evenly at 75°C, and then homogenize to ensure complete dispersion of all components. Set aside. Next, weigh phase C into a beaker, stir evenly at 75°C, and set aside. Add phase C to the mixture of phases A and B, and then homogenize and emulsify for 5 minutes to ensure complete dispersion of the materials, thus obtaining the emulsions of Examples 1-11 and Comparative Examples 1-5.
[0048] Table 2
[0049]
[0050] Application examples
[0051] Phases A, B, C, and D are provided respectively. Phase A comprises 6.00 parts by weight of cetyl PEG / PPG-10 / 1 polydimethylsiloxane, pentaerythritol tetra(bis-tert-butylhydroxyhydrocinnamic acid) ester, 0.50 parts by weight of sanjiro syringin, 14.96 parts by weight of polydimethylsiloxane, and 0.80 parts by weight of diisostearyl malate. Phase B comprises the photosensitive film-forming composition shown in Table 1, 1.00 parts by weight of polyglycerol-3 polydimethylsiloxyethyl polydimethylsiloxane, and 5.30 parts by weight of polydimethylsiloxane. Phase C comprises 7.50 parts by weight of CI 77891 triethoxyoctylsilane-treated titanium dioxide, 0.90 parts by weight of CI 77492 iron oxide yellow, and 0.17 parts by weight of CI... The D phase comprises 77491 iron oxide red, 0.07 parts by weight of CI77499 iron oxide black, and 2.00 parts by weight of cyclopentamethoxysiloxane; the D phase includes the components shown in Table 3.
[0052] First, weigh phase A and phase B materials into a beaker, mix them evenly at 75°C, and then homogenize to ensure complete dispersion of all components. Set aside. Second, weigh phase C materials into a beaker, mix them evenly, and then pass them through a three-roll mill. Set aside. Third, weigh phase D materials into a beaker, stir them evenly at 75°C, and set aside. Finally, add phase C to the mixture of phases A and B, mix evenly, and then add the mixture of phase D to phases A, B, and C. Then homogenize and emulsify for 5 minutes to ensure complete dispersion of the materials, thus obtaining the foundation liquid. This yields the foundation liquids used in Application Examples 1-11 and Comparative Examples 1-5.
[0053] Table 3
[0054]
[0055] Test Example 1
[0056] The water resistance, sweat resistance, and friction resistance of the foundation provided in Examples 1-11 were compared with those in Comparative Examples 1-5. The specific tests are shown below, and the test results are shown in Table 4.
[0057] Water resistance and perspiration resistance: based on 2mg / cm 2 Precisely measure the amount of foundation liquid and apply it evenly to the PMPM plate. After drying, take 2 mL of artificial sweat and water to interfere with the film layer. After standing for 2 hours, use a Colorimeter CL440 to test the color difference ΔE before and after molding. The smaller the ΔE, the better the water or sweat resistance.
[0058] Anti-friction performance: based on 2mg / cm 2 Precisely measure the amount of foundation and apply it evenly to the PMPM board. After drying for 2 hours, place it on the PMPM board. Figure 1 On the device, a constant force of 1N was applied to the PMPM board 20 times to maintain the tension gauge reading. The change in brightness L value before and after modeling was measured using a Colorimeter CL440. The smaller ΔL is, the better the anti-friction effect.
[0059] Table 4
[0060]
[0061] As shown in Table 4, Application Examples 1-11 have stronger waterproof and sweatproof effects compared to Application Comparative Examples 1-5. This proves that simple compounding of film-forming agents and the use of the "brick-mud" structure alone cannot significantly improve the overall water and sweat resistance of the system. This demonstrates that the components of the photosensitive film-forming composition provided by the present invention work synergistically to improve the anti-interference performance of the foundation and enable the foundation to achieve excellent makeup-holding effect.
[0062] As shown in Table 4, Application Examples 1-11 have a stronger anti-friction effect compared with Application Comparative Examples 1-5. The photosensitive film-forming composition provided by the present invention can effectively improve the anti-friction effect of the film-forming system.
[0063] Test Example 2
[0064] The application of foundation in Examples 1-11 was compared with that in Comparative Examples 1-5. The test method is shown below, and the test results are shown in Table 5.
[0065] According to 2mg / cm 2 The sample was precisely pipetted and evenly coated onto a PMPM plate. Images before and after sample application were captured using a PC35 camera. Image Pro Plus software was used to analyze the deviation of linear light intensity before and after sample application. The diagonal of the AOI box was selected, and the grayscale value of each pixel on this line was recorded and calculated. The rate of change of the linear light intensity deviation before and after sample application was used as a parameter to represent the fit; the smaller the rate of change, the better the fit.
[0066] Table 5
[0067]
[0068] As shown in Table 5, the application examples 1-11 have a higher degree of conformity compared to the comparative examples 1-5, proving that the photosensitive film-forming composition provided by the present invention can effectively improve the conformity of the film-forming system.
[0069] Test Example 3
[0070] The film-forming toughness of the foundation liquid prepared in Examples 1-11 compared with that in Comparative Examples 1-5 was tested. The test method is shown below, and the test results are shown in Table 6.
[0071] A precise amount of sample was evenly coated onto the film-stretching cardboard. After drying for one day, the cardboard was folded repeatedly 10 times. Images were acquired using a PC35 camera, and Image-Pro Plus software was used to analyze and quantify the size of the crack area in the film layer of the film-stretching cardboard to evaluate the toughness of different samples. The larger the crack area, the worse the toughness.
[0072] Table 6
[0073]
[0074] As shown in Table 6, the foundation liquids used in Examples 1-11 have stronger toughness compared to Comparative Example 1. Simple compounding of film-forming agents alone cannot make the film-forming system have both strength and toughness. The components in the photosensitive film-forming composition provided by this invention work together to form a "brick-and-mortar" structure. By transferring the mechanical energy brought by the exhaustion impact and the buffer support of the polymer three-dimensional network, the strength and toughness of the film layer are effectively improved, better avoiding film layer rupture caused by large facial expressions and improving the makeup holding effect.
[0075] Test Example 4
[0076] The gloss of the emulsions provided in Comparative Examples 3, 4, 6 and 7 were tested. The test methods are shown below, and the test results are shown in Table 7.
[0077] According to 2mg / cm -2 The emulsion is precisely drawn and evenly applied to the artificial skin. A multi-angle spectrophotometer (BYK, 7030) emits light at 45° onto the sample area and receives optical information from 6 different angles (-15°, 15°, 25°, 45°, 75°, 110°). The higher the L value and the lower the deviation, the bright and uniform luster of shell or pearl.
[0078] Table 7
[0079]
[0080] As shown in Table 7, compared with the emulsions of Comparative Example 3 and Example 7, which have the same concentration of mica flakes treated with lauroyl lysine, Example 7 has a more uniform and glossy pearlescent appearance, resembling a shell or pearl. In addition, Example 4 and Example 6 have a lower concentration of mica flakes treated with lauroyl lysine than Comparative Example 3, yet they still exhibit a superior pearlescent appearance. This proves that the photosensitive film-forming composition provided by the present invention improves the uniform gloss of the film-forming system and exhibits a unique pearlescent appearance through the synergistic interaction of its components.
[0081] Test Example 5
[0082] The test application of the foundation liquid provided in Comparative Example 3 and Application Example 7 was used to test the human body gloss. The test method is shown below, and the test results are shown in Table 8.
[0083] Thirty women (aged 18-40, skin type not limited) were selected. After normal skin care, the foundation of Application Example 3 and Application Example 7 were applied to both cheeks (the amount used was the same, about 0.5g / time). The technician used the GL200 skin gloss test probe to measure the relevant baseline values of the test area (face) of the subjects.
[0084] Table 8
[0085]
[0086] As shown in Table 8, the foundation liquid of Example 7 has a better effect on improving gloss than the foundation liquid of Comparative Example 3, and the gloss of the skin decreases to a certain extent after using Comparative Example 3.
[0087] Test Example 6
[0088] The foundation provided in Comparative Example 3, Application Example 4, Application Example 6 and Application Example 7 were tested to prevent rubbing on the human body. The test methods are shown below, and the test results are shown in Table 9.
[0089] Thirty women (aged 18-40, skin type not limited) were selected. Foundation was applied to a suitable area on the inside of their arms (the amount used was consistent, approximately 0.5g per application). After the film formed, the technician used a Colormeter CL440 to measure the relevant basic values of the test skin area. Then, the test area was rubbed repeatedly with a tissue 10 times. The Colormeter CL440 was used again to measure the ΔE before and after the model was formed. The smaller the ΔE, the better the anti-scratching effect.
[0090] Table 9
[0091]
[0092] As shown in Table 9, Comparative Example 1 has the largest ΔE value, proving that the simple compounding of film-forming agents has poor anti-smudging effect. Comparative Example 3, with the addition of mica flakes treated with lauroyl lysine, shows a certain improvement in anti-smudging effect. However, the foundation containing the light-reflecting film-forming composition provided by this invention, even with a lower amount of mica flakes treated with lauroyl lysine than Comparative Example 3, exhibits superior anti-smudging effect compared to Comparative Example 1 and Comparative Example 3, demonstrating that the light-reflecting film-forming composition provided by this invention can effectively improve the staying power of base makeup.
[0093] The manufacturers and brands of each component in the embodiments of the present invention are shown in Table 10.
[0094] Table 10
[0095]
[0096] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0097] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.
Claims
1. A photosensitive film-forming composition with a biomimetic nacre structure, characterized in that, The material comprises at least a film-forming agent, mica flakes, long-chain quaternary ammonium salt modified lithium montmorillonite, and sodium hyaluronate cross-linked polymer, wherein the ratio of the total mass of the long-chain quaternary ammonium salt modified lithium montmorillonite and the sodium hyaluronate cross-linked polymer to the mass of the mica flakes is (0.4-5.5):1, and the molecular weight of the sodium hyaluronate cross-linked polymer is greater than or equal to 3,000,000 Da.
2. The photosensitive film-forming composition according to claim 1, characterized in that, The average particle size of the mica sheets is 12μm-16μm; And / or, the mass ratio of the film-forming agent to the mica sheet is (2.4-120):
1.
3. The photosensitive film-forming composition according to claim 1, characterized in that, The mica sheet is selected from at least one of the following: mica sheet treated with lauroyl lysine, organofluorine phlogopite, and mica sheet treated with triethoxyoctylsilane.
4. The photosensitive film-forming composition according to any one of claims 1-3, characterized in that, The mass ratio of the long-chain quaternary ammonium salt modified lithium montmorillonite to the sodium hyaluronate crosslinked polymer is (2-50):
1.
5. The photosensitive film-forming composition according to any one of claims 1-3, characterized in that, The long-chain quaternary ammonium salt modified lithium montmorillonite is selected from distearate dimethylammonium lithium montmorillonite; And / or, the density of the long-chain quaternary ammonium salt modified lithium montmorillonite is 1.5 g / cm³. 3 -1.7g / cm 3 .
6. The photosensitive film-forming composition according to any one of claims 1-3, characterized in that, The film-forming agent includes a first film-forming agent and / or a second film-forming agent. When the film-forming agent includes the first film-forming agent, the first film-forming agent is an MQ type silicone resin. When the film-forming agent includes the second film-forming agent, the second film-forming agent is at least one of pure T type silicone resin, MT type silicone resin, or silicone acrylic resin.
7. The photosensitive film-forming composition according to claim 6, characterized in that, The film-forming agent satisfies at least one of the following conditions: (1) The first film-forming agent is selected from trimethylsiloxysilicate; (2) The second film-forming agent is selected from at least one of polymethylsilsesquioxane and acrylate / polydimethylsiloxane copolymer; (3) The mass ratio of the first film-forming agent to the second film-forming agent is 1:(0.3-120).
8. A base makeup product comprising the light-reflecting film-forming composition as described in any one of claims 1-7.
9. The base makeup product according to claim 8, characterized in that, The photosensitive film-forming composition has a mass fraction of less than or equal to 20% in the base makeup product.
10. The base makeup product according to claim 8, characterized in that, The base makeup product is a liquid foundation, cream foundation, or cushion foundation.