Laser coupling system and laser processing equipment

Abstract

The invention discloses a laser coupling system and laser processing equipment. The laser coupling system comprises a first laser source, a second laser source and a third laser source which are used for providing three beams of laser; the polarization preprocessing module is used for adjusting the polarization states of lasers emitted by the first laser source and the second laser source to be in a preset relation and combining the lasers into first combined light, and the first combined light comprises laser components of the first polarization state and the second polarization state; the electric control polarization switching module is arranged on a light path of the first combined light beam and used for receiving signals and modulating the overall polarization state of the first combined light beam; the polarization beam splitting and combining module is provided with a main input end, an auxiliary input end and an output end, the main input end receives the modulated light beam, the auxiliary input end receives the laser emitted by the third laser source, and second combined beam light is formed through selective coupling. According to the technical scheme, coupling of the main laser and the auxiliary laser can be flexibly switched, under the condition that the total energy is lower than the energy needed by the single-beam main laser to reach the threshold value, nonlinear absorption and modification of the material can be efficiently triggered, and precise machining threshold value breakthrough under lower energy input is achieved.

Description

Technical Field

[0001] This application relates to the field of laser processing technology for semiconductor materials, and in particular to a laser coupling system and laser processing equipment. Background Technology

[0002] Silicon carbide, as a third-generation semiconductor material, is widely used in high-temperature, high-frequency, and high-power devices. However, its high hardness and brittleness cause traditional mechanical cutting methods to suffer from large cuts and severe surface damage. Laser ablation technology, as a non-contact processing solution, offers a new approach to address this issue.

[0003] Currently, mainstream silicon carbide laser lift-off processes typically employ a "modification-crack propagation" scheme using a combination of short-pulse and long-pulse lasers. The short-pulse laser forms a modified layer inside the ingot, while the long-pulse laser extends the crack to achieve separation. However, this scheme has significant drawbacks in practical industrial applications: low transmittance limits processing capability and quality. Conductive silicon carbide has low transmittance to commonly used infrared lasers; to reach the modification threshold internally, the incident laser power must be significantly increased. This easily leads to overheating damage to the material surface, resulting in a rough lift-off surface, an expanded heat-affected zone, and limiting its effective processing capability for thick ingots under low-power conditions.

[0004] Therefore, there is an urgent need for a laser processing solution that can effectively improve laser utilization, reduce thermal damage to material surfaces, and simultaneously achieve high-precision modification and controllable crack propagation. Summary of the Invention

[0005] This application provides a laser coupling system and laser processing equipment, aiming to solve the problem of limited laser processing capability in the existing silicon carbide laser lift-off process.

[0006] To achieve the above objectives, this application proposes a laser coupling system. The laser coupling system includes: The laser source includes a first laser source, a second laser source, and a third laser source, used to provide three laser beams; A polarization preprocessing module is used to adjust the polarization states of the lasers emitted from the first laser source and the second laser source to a predetermined relationship and combine them into a first combined beam. The first combined beam includes a first laser component with a first polarization state and a second laser component with a second polarization state, wherein the first polarization state and the second polarization state are different. An electronically controlled polarization switching module is disposed in the optical path of the first beam combiner, and is used to receive control signals and responsively modulate the overall polarization state of the first beam combiner. A polarization beam splitter and combiner module has a main input terminal, a secondary input terminal, and an output terminal. The main input terminal receives a beam modulated by the electronically controlled polarization switching module, and the secondary input terminal receives laser light from the third laser source. The polarization beam splitter and combiner module is used to selectively couple the first laser component or the second laser component with the laser light incident from the secondary input terminal to the output terminal according to the polarization state of the beam incident from the main input terminal, thereby forming a second combined beam.

[0007] In some embodiments, the first polarization state and the second polarization state are orthogonal linear polarization states; the polarization beam splitter includes a polarization beam splitter that reflects a laser beam in one of the orthogonal linear polarization states and transmits a laser beam to the other.

[0008] In some embodiments, the polarization preprocessing module includes: a first polarization adjustment unit disposed on the output optical path of the first laser source, used to adjust the polarization state of the laser emitted from the first laser source to the first polarization state; a second polarization adjustment unit disposed on the output optical path of the first laser source, used to adjust the polarization state of the laser emitted from the second laser source to the second polarization state; and a beam combiner disposed at the intersection of the output optical path of the first laser source and the output optical path of the second laser source, used to spatially combine two laser beams having the first polarization state and the second polarization state respectively.

[0009] In some embodiments, the beam combining device includes a first polarization beam splitter, wherein the transmission axis and the reflection axis of the first polarization beam splitter correspond to the directions of the first polarization state and the second polarization state, respectively.

[0010] In some embodiments, the electrically controlled polarization switching module includes a dynamically adjustable waveplate, which is configured to switch between a first position and a second position. When in the first position, the first polarization state and the second polarization state in the first beam combiner remain unchanged; when in the second position, the first polarization state and the second polarization state in the first beam combiner are swapped.

[0011] In some embodiments, the dynamically adjustable waveplate is an electrically rotating half-waveplate; The first position corresponds to the direction of the fast axis of the electrically rotating half-wave plate being parallel to the direction of the first polarization state; The second position corresponds to the fast axis direction of the electrically rotating half-wave plate forming a 45° angle with the direction of the first polarization state.

[0012] In some embodiments, the polarization beam splitter and combiner module directs the reflected light path of the beam modulated by the electronically controlled polarization switching module to the output end, and the transmitted light path is directed out of the path; and the polarization state of the laser emitted from the third laser source is preset to the second polarization state, which can pass through the polarization beam splitter and combiner module to reach the output end.

[0013] In some embodiments, a third polarization adjustment unit is further included, which is disposed in the optical path of the third laser source and is used to adjust the polarization state of its emitted laser to the second polarization state.

[0014] In some embodiments, the first laser source is a nanosecond pulse laser, the second laser source is a picosecond pulse laser, and the third laser source is a continuous or pulsed laser, wherein the wavelengths of the lasers emitted by the first laser source, the second laser source, and the third laser source are all in the infrared band.

[0015] This application also provides a laser processing device that integrates the laser coupling system described above, and the laser processing device further includes a processing optical component disposed on the second beam combining optical path.

[0016] This application proposes a laser coupling system and a laser processing apparatus. The laser coupling system includes a laser source, a polarization processing module, an electrically controlled polarization switching module, and a polarization beam splitting and combining module. The laser source includes a first, second, and third laser source to provide three laser beams. The polarization preprocessing module modulates the polarization states of the lasers emitted from the first and second laser sources to a predetermined relationship and combines them into a first combined beam, which includes laser components of the first and second polarization states. The electrically controlled polarization switching module is located in the optical path of the first combined beam and receives signals to modulate its overall polarization state. The polarization beam splitting and combining module has a main input terminal, a secondary input terminal, and an output terminal. The main input terminal receives the modulated beam, and the secondary input terminal receives the laser emitted from the third laser source, selectively coupling to form a second combined beam.

[0017] This application presents a composite laser system employing dual master laser time-division multiplexing and auxiliary laser synchronous enhancement. It can selectively couple the laser emitted from a first laser source, or the laser emitted from a second laser source and a third laser source, into a second combined beam. The lasers emitted from the first and second laser sources are both master lasers, while the laser emitted from the third laser source is the auxiliary laser. When two infrared lasers of similar wavelengths are synchronously collinearly irradiated, the electric field vectors of the two beams superimpose at the focal point, instantaneously generating a peak electric field intensity higher than any single beam. This extremely high peak electric field intensity significantly reduces the order requirement for multiphoton absorption or more effectively induces avalanche ionization. Even when the total energy (master + auxiliary) is lower than the energy required for a single master laser to reach the threshold, it can efficiently trigger nonlinear absorption and modification within the material. This achieves a breakthrough in precision machining thresholds with lower energy input, improving processing efficiency and quality. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein: Figure 1 This is a schematic diagram of the modules of a laser coupling system according to an embodiment of this application; Wherein: 10-laser source; 110-first laser source; 120-second laser source; 130-third laser source; 20-polarization preprocessing module; 210-first polarization adjustment unit; 220-second polarization adjustment unit; 230-beam combiner; 30-electrically controlled polarization switching module; 40-polarization beam splitting and combining module; 50-third polarization adjustment unit. Detailed Implementation

[0019] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0020] It should be noted that, unless otherwise stated or limited, all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of this application are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0021] It should also be noted that, unless otherwise stated or limited, when an element is referred to as "fixed to" or "set on" another element, it may be directly on the other element or there may be an intervening element present. When an element is referred to as "connected to" another element, it may be directly connected to the other element or there may be an intervening element present.

[0022] Furthermore, unless otherwise stated or limited, the descriptions involving "first," "second," etc., in this application are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed in this application.

[0023] See Figure 1 As shown, this application proposes a laser coupling system. The laser coupling system includes a laser source 10, a polarization preprocessing module 20, an electrically controlled polarization switching module 30, and a polarization beam splitting and combining module 40.

[0024] The laser source 10 includes a first laser source 110, a second laser source 120, and a third laser source 130, used to provide three laser beams. The first laser source 110 emits nanosecond pulsed infrared laser (e.g., 1064nm), designated as the first laser (A). Utilizing its high single-pulse energy and certain thermal effect, the first laser performs efficient and deep bulk modification, generating a continuous or discrete modified layer (defects, microcracks, etc.) within the material. The second laser source 120 emits picosecond pulsed infrared laser (e.g., 1064nm or 532nm), designated as the second laser (B). Utilizing its ultrashort pulse and extremely small heat-affected zone, the second laser performs precision finishing, surface cleaning, or induces precise crack propagation. Both the first laser source 110 and the second laser source 120 emit the main laser beams. The third laser source 130 emits continuous or high-repetition-rate pulsed infrared laser (such as 1064nm or another similar wavelength), which is the third laser, denoted as C. The third laser works in conjunction with the main laser as an auxiliary laser to promote laser operation.

[0025] The polarization preprocessing module 20 is used to adjust the polarization states of the lasers emitted from the first laser source 110 and the second laser source 120 to a predetermined relationship, such as a first polarization state and a second polarization state. The first polarization state is denoted as S1, and the second polarization state is denoted as S2, and S1 ≠ S2. The two laser beams with different polarization states are introduced into a beam combiner 230. This device guides the two beams from spatially different paths to the same output path according to the difference in polarization states, forming a first beam combiner. That is, the first beam combiner contains a first laser component with a first polarization state and a second laser component with a second polarization state (the first laser component and the second laser component are descriptions of the first beam combiner; in reality, the first laser component = the first laser, and the second laser component = the second laser). At this time, although the physical paths of the two beams overlap, their polarization states are like two different optical keys, remaining independent.

[0026] An electrically controlled polarization switching module 30 is disposed in the optical path of the first combined beam and is used to receive control signals and responsively modulate the overall polarization state of the first combined beam. Specifically, the electrically controlled polarization switching module 30 receives control signals to generate a fixed polarization rotation effect on the first combined beam passing through it. This process simultaneously and equally changes the polarization direction of the two polarization components contained in the first combined beam.

[0027] The polarization beam splitter and combiner module 40 has a main input terminal, a secondary input terminal, and an output terminal. The main input terminal receives the beam modulated by the electronically controlled polarization switching module 30, and the secondary input terminal receives laser light from the third laser source 130. The polarization beam splitter and combiner module 40 is used to selectively couple a first laser component or a second laser component with the laser light incident from the secondary input terminal to the output terminal, forming a second combined beam, based on the polarization state of the beam incident from the main input terminal. That is, the electronically controlled polarization switching module 30 and the polarization beam splitter and combiner module 40 work together so that by changing the control signal, the first laser component or the second laser component can be selectively coupled into the second combined beam. The second combined beam acts as a processing laser on the material surface to achieve flexible multi-mode processing.

[0028] In summary, the technical solution of this application essentially constructs a composite laser system with dual master lasers (nanosecond / picosecond) time-division multiplexing and auxiliary laser synchronous enhancement. Specifically, the first laser emitted from the first laser source 110 and the second laser emitted from the second laser source 120 are both master lasers, while the third laser emitted from the third laser source 130 is an auxiliary laser. The auxiliary laser can flexibly switch the working mode of the master lasers according to different processing requirements, achieving a synergistic effect of nanosecond pulses for efficient quality modification and picosecond pulses for precision finishing. Simultaneously, the auxiliary laser modulates the thermal effect, improving processing accuracy and surface quality.

[0029] Specifically, by strictly synchronizing and collinearly combining the auxiliary laser with the first or second laser and applying it to the material, a nonlinear optical synergistic effect (such as enhanced multiphoton absorption) can be generated. This allows for efficient initiation of material modification within the material even when the total pulse energy is lower than the energy required for a single main laser to reach the modification threshold. Because the effective total pulse energy used for modification is reduced, and the energy deposition mechanism is more biased towards internal nonlinear absorption rather than linear heating of the surface, the redundant energy absorbed by the material surface that could lead to thermal damage is greatly reduced. This effectively prevents overheating damage to the material surface, which can cause roughness on the peeling surface and expansion of the heat-affected zone.

[0030] Optionally, the first polarization state and the second polarization state are orthogonal linear polarization states. Orthogonal linear polarization states are the most classic, easiest to achieve and controllable relationship in the field of optics. They refer to the vibration directions of two linearly polarized beams being 90 degrees apart, such as 0° and 90°, 45° and 135°, etc., which makes the initial optical path calibration very simple and intuitive.

[0031] To achieve polarization state adjustment and beam combining of the first laser emitted from the first laser source 110 and the second laser emitted from the second laser source 120, the polarization preprocessing module 20 includes a first polarization adjustment unit 210, a second polarization adjustment unit 220, and a beam combining device 230.

[0032] See Figure 1 As shown, the first polarization adjustment unit 210 is disposed on the output optical path of the first laser source 110, and the second polarization adjustment unit 220 is disposed on the output optical path of the second laser source 120. The first polarization adjustment unit 210 and the second polarization adjustment unit 220 are polarization state source generators of the system. They can independently and without interference precisely shape or correct the raw laser light output from the first laser source 110 and the second laser source 120, which may have uncertain or non-ideal polarization states, to the specific first and second polarization states required by the system. The most commonly used and preferred polarization adjustment unit is a half-wave plate. By manually or by precisely rotating the angle of the wave plate, the incident linearly polarized light can be continuously and accurately adjusted to any desired linear polarization direction.

[0033] The beam combiner 230 is the spatial merging hub of the system, located at the intersection of the output optical paths of the first laser source 110 and the second laser source 120. Based on the specific polarization states (S1 and S2) of the two incident beams, the first and second lasers are guided and merged from two independent spatial paths into the same output path using the principle of polarization-sensitive optics, forming the first combined beam.

[0034] Optionally, the beam combiner 230 includes a first polarization beam splitter. The polarization beam splitter is a mature, standard optical component with stable and reliable performance, significantly reducing system debugging difficulty and maintenance costs. It has transmission and reflection axes perfectly matched to orthogonally linearly polarized light, enabling efficient reflection or transmission of linearly polarized light in a specific direction. Transmittance and emissivity are typically >99%, with extremely low scattering loss. This ensures that energy loss of the two main laser beams is minimized during the initial beam combining stage, with almost all energy entering the first combined beam, providing maximum usable power for subsequent processing. Simultaneously, since the first polarization beam splitter is based on polarization splitting, when the incident light polarization state perfectly matches the axis, an extremely high extinction ratio is achieved. This ensures that the polarization states of the two beams remain highly pure and independent in the first combined beam, without mutual contamination.

[0035] The most commonly used and preferred component in polarization beam splitters is the polarizing beam splitter (PBS). Its working principle is: it highly reflects laser light of the first polarization state and highly transmits it of the second polarization state. When the two beams are incident at a specific geometric angle (usually 90 degrees), the transmitted and reflected light converge and output in the same direction.

[0036] Furthermore, the polarization beam splitting and combining module 40 also includes a polarization beam splitter, namely a second polarization beam splitter. Thus, in the first-stage beam combining and the second-stage final beam combining, laser energy loss is extremely low, with almost all of it used for processing, improving the overall system's energy utilization efficiency and processing capability. Moreover, since the polarization beam splitter is based on polarization interface splitting, its reflection and transmission processes do not alter the beam's wavefront distribution and propagation characteristics. Therefore, regardless of which main laser beam is output, perfect spatial overlap (collinearity) and excellent beam quality can be maintained after the main and auxiliary lasers are combined.

[0037] Among them, the polarization beam splitting and combining module 40 connects the reflected light path of the beam modulated by the electronically controlled polarization switching module 30 to the output end, and the transmitted light path connects to an external path; thus defining the reflected light path as the main output channel of the system, all effective lasers used for processing must pass through this path, and the external path usually refers to being guided to a beam trap, absorber or safe area, which means that the light path is actively shielded or aligned and does not participate in the final processing.

[0038] Furthermore, the polarization state of the laser emitted from the third laser source 130 is preset to the second polarization state, which is intended to be closely consistent with the setting of the overall polarization system in the preceding optical path (S1 and S2 are orthogonal, and the second polarization beam splitter reflects S1 and transmits to S2). This clarifies that the beam combining method of the third laser is to enter through transmission. The addition of the third laser does not depend on any switching and is constant, thus ensuring the continuity of the auxiliary laser.

[0039] Optionally, the laser coupling system also includes a third polarization adjustment unit 50, which is disposed in the optical path of the third laser source 130 to adjust the polarization state of its emitted laser to a second polarization state. The third polarization adjustment unit 50 provides a master-controlled and controllable technical means to preset the polarization state of the third laser to the second polarization state. The purchasing department no longer needs to painstakingly search for a specific model of auxiliary laser with a perfectly matched polarization state; any laser with suitable performance and wavelength can be connected to the system and adjusted via the third polarization unit. The third polarization adjustment unit 50 can also be implemented using a half-wave plate.

[0040] Of course, the overall polarization system can also be set so that S1 and S2 are orthogonal, and the second polarization beam splitter reflects S2 and transmits to S1. In this case, the polarization state of the laser emitted from the third laser source 130 needs to be preset to the first polarization state to satisfy the self-consistent design, so as to ensure that it still enters the beam combining path through transmission.

[0041] It is also understandable that when the electronically controlled polarization switching module 30 switches, the selected main laser is efficiently reflected to the working optical path, and the shielded main laser is efficiently transmitted and deflected, with minimal crosstalk, ensuring the purity and stability of the output beam.

[0042] In some embodiments, the electrically controlled polarization switching module 30 includes a dynamically adjustable waveplate configured to switch between a first position and a second position; when in the first position, the first polarization state and the second polarization state in the first combined beam remain unchanged; when in the second position, the first polarization state and the second polarization state in the first combined beam are swapped.

[0043] In this embodiment, the dynamically adjustable waveplate includes all waveplates whose phase delay or fast axis direction can be dynamically changed through external control, such as electricity, magnetism, sound, light, etc., for example: electro-controlled liquid crystal waveplate, magneto-optical waveplate, acousto-optic tunable waveplate or thermo-optical waveplate, etc.

[0044] This embodiment uses only a single dynamically adjustable waveplate to achieve coordinated control of a composite beam containing two beams, eliminating the need for separate modulators for each beam and complex synchronization circuits. Holding and switching are two completely deterministic, either-or states. The binary logic output perfectly matches the digital control signal, making system control exceptionally simple and reliable. The controller only needs to send a "0" or "1" command to deterministically select to output either the first or second laser component.

[0045] As the preferred option, the dynamically adjustable waveplate is an electrically rotating half-wave plate, achieving the best balance between performance, cost, and reliability. Specifically, the first position corresponds to the direction of the fast axis of the electrically rotating half-wave plate being parallel to the direction of the first polarization state; the second position corresponds to the direction of the fast axis of the electrically rotating half-wave plate forming a 45° angle with the direction of the first polarization state.

[0046] Specifically, when the fast axis of the half-wave plate is parallel to the direction of linearly polarized light, the resulting phase delay does not change the polarization direction. This ensures that, in the first position, the polarization state of the first combined beam is perfectly preserved without any distortion or loss. When the fast axis of the half-wave plate is at 45° to the direction of linearly polarized light, the polarization direction of the outgoing light will rotate by 90°. For a pair of orthogonally polarized beams (S1 and S2), the direct result of rotating 90° simultaneously is that their polarization states are interchanged. This is a deterministic, thorough, and efficient transformation without intermediate states, providing the purest 2-to-1 signal for the downstream second polarization beam splitter.

[0047] In summary, the preferred laser coupling process and principle of this application are as follows: 1. Two half-wave plates adjust the polarization states of the first laser emitted from the first laser source 110 and the second laser emitted from the second laser source 120 to orthogonal first polarization state (0°) and second polarization state (90°), respectively, and combine them with the first polarization beam splitter to form the first combined beam.

[0048] 2. The first combined beam is manipulated based on an electric half-wave plate. When the fast axis is at 0°, the polarization state remains unchanged (the polarization state of the first laser component is 0°, and the polarization state of the second laser component is 90°); when the fast axis is at 45°, the polarization states are interchanged (the polarization state of the first laser component becomes 90°, and the polarization state of the second laser component becomes 0°).

[0049] 3. The laser component with the first polarization state is reflected by the second polarization beam splitter and the laser component with the second polarization state is transmitted, and finally the first laser or the second laser and the auxiliary laser emitted from the third laser source 130 are combined to form the second combined beam output.

[0050] It is worth noting that the above-mentioned scheme in this application is based on the precise control and stable beam splitting of orthogonal polarization states. The half-wave plate can be replaced with other optical elements with equivalent phase modulation capabilities, such as electro-optic crystals or magneto-optical devices. The polarization beam splitter can be replaced with other optical elements with polarization selection capabilities, such as Wollaston prisms or thin-film polarizers, as long as they can achieve efficient separation and low-loss transmission of orthogonal polarization states. The overall system design focuses on deterministic control of the optical path, ensuring no energy loss or mode crosstalk during laser component switching, thereby guaranteeing stable and reliable output beam quality.

[0051] Furthermore, in other embodiments of this application, the first polarization state and the second polarization state can also adopt any non-orthogonal but distinguishable polarization configuration, such as two linear polarization states with an included angle of 60°, or one linearly polarized and the other elliptical polarized. By introducing corresponding compensation algorithms and dynamic calibration mechanisms to achieve an approximate two-to-one output, the system still possesses feasibility and practicality. Moreover, after adopting a non-orthogonal state, the settings of other components must be changed accordingly. For example, the electrically controlled polarization switching module 30 can no longer use a simple half-wave plate to switch between "0° and 45°" to achieve "hold" and "exchange". A more complex, programmable polarization controller is needed, such as one composed of two adjustable waveplates, to accurately implement two specific polarization transformation matrices: one that makes the output polarization state the same as the input; and another that makes the output change to a certain, distinguishable state. Ordinary PBS (designed for orthogonal states) will no longer be applicable. Customized polarization beam splitters are required, which have high contrast reflection / transmission characteristics for specific non-orthogonal polarization states. This typically means more complex designs, higher costs, and lower performance (extinction ratio). Regardless of the changes made, the basic logic of the laser coupling system is to combine two beams with different polarization states, then modulate their overall polarization state, and finally use polarization-sensitive elements for selective output.

[0052] The laser coupling system proposed in this application can achieve high-quality internal modification of materials with lower overall laser energy and less heat input, and has broad application prospects in many fields. For example, in the field of materials processing, it can be used for high-precision cutting (such as silicon carbide cutting), welding, drilling and other processes to improve processing quality and efficiency; in the biomedical field, it can be used for laser surgery, photodynamic therapy and other processes to achieve precise manipulation and effective treatment of biological tissues; in the scientific research field, it can be used to explore new mechanisms and phenomena of laser-matter interaction, and promote the development of related disciplines.

[0053] This application also provides a laser processing apparatus that integrates the laser coupling system described above, and further includes a processing optical component disposed on the optical path of the second beam combiner. The processing optical component is used to focus the second beam combiner onto the workpiece surface to achieve high-precision micro-nano processing of the material. This laser processing apparatus adopts all the technical solutions of all embodiments of the above-described laser coupling system, and therefore possesses at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be elaborated further here.

[0054] It is also understandable that laser coupling systems achieve a high degree of integration of single-machine multi-functionality in laser processing equipment. Nanosecond, picosecond (or two different functions) lasers and auxiliary lasers are integrated into a single optical path system through purely optical means. All lasers ultimately pass through the same set of processing optical components (scanning galvanometer, focusing lens, and processing head output), ensuring absolute consistency at different laser processing positions, eliminating alignment and synchronization errors, and allowing for flexible and rapid switching of laser functions in a single clamping and programming path (such as using nanosecond for roughing and instantly switching to picosecond for finishing or induced splitting), completely eliminating secondary clamping errors and process connection fluctuations caused by multiple devices, and significantly improving production yield and stability.

[0055] The above description is only a part or preferred embodiment of this application. Neither the text nor the drawings should limit the scope of protection of this application. All equivalent structural transformations made using the content of this application's specification and drawings under the overall concept of this application, or direct / indirect applications in other related technical fields, are included within the scope of protection of this application.

Claims

1. A laser coupling system, characterized in that, include: The laser source (10) includes a first laser source (110), a second laser source (120) and a third laser source (130) for providing three laser beams; The polarization preprocessing module (20) is used to adjust the polarization state of the laser emitted from the first laser source (110) and the second laser source (120) to a predetermined relationship and combine them into a first combined beam. The first combined beam includes a first laser component with a first polarization state and a second laser component with a second polarization state, wherein the first polarization state and the second polarization state are different. An electronically controlled polarization switching module (30) is disposed on the optical path of the first beam combiner and is used to receive control signals and responsively modulate the overall polarization state of the first beam combiner. The polarization beam splitter and combiner module (40) has a main input terminal, a secondary input terminal and an output terminal. The main input terminal receives the beam modulated by the electronically controlled polarization switching module (30), and the secondary input terminal receives the laser from the third laser source (130). The polarization beam splitter and combiner module (40) is used to selectively couple the first laser component or the second laser component with the laser incident from the secondary input terminal to the output terminal according to the polarization state of the beam incident from the main input terminal, so as to form a second combined beam.

2. The laser coupling system according to claim 1, characterized in that, The first polarization state and the second polarization state are orthogonal linear polarization states; the polarization beam splitter (40) includes a polarization beam splitter that reflects one of the lasers in the orthogonal linear polarization states and transmits the other laser.

3. The laser coupling system according to claim 2, characterized in that, The polarization preprocessing module (20) includes: a first polarization adjustment unit (210), disposed on the output optical path of the first laser source (110), for adjusting the polarization state of the laser emitted from the first laser source (110) to the first polarization state; a second polarization adjustment unit (220), disposed on the output optical path of the first laser source (110), for adjusting the polarization state of the laser emitted from the second laser source (120) to the second polarization state; and a beam combiner (230), disposed at the intersection of the output optical path of the first laser source (110) and the output optical path of the second laser source (120), for spatially combining two laser beams having the first polarization state and the second polarization state respectively.

4. The laser coupling system according to claim 3, characterized in that, The beam combining device (230) includes a first polarization beam splitter, wherein the transmission axis and the reflection axis of the first polarization beam splitter correspond to the directions of the first polarization state and the second polarization state, respectively.

5. The laser coupling system according to claim 2, characterized in that, The electrically controlled polarization switching module (30) includes a dynamically adjustable waveplate, which is configured to switch between a first position and a second position. When in the first position, the first polarization state and the second polarization state in the first beam combiner remain unchanged; when in the second position, the first polarization state and the second polarization state in the first beam combiner are swapped.

6. The laser coupling system according to claim 5, characterized in that, The dynamically adjustable waveplate is an electrically rotating half-waveplate; The first position corresponds to the direction of the fast axis of the electrically rotating half-wave plate being parallel to the direction of the first polarization state; The second position corresponds to the fast axis direction of the electrically rotating half-wave plate forming a 45° angle with the direction of the first polarization state.

7. The laser coupling system according to claim 2, characterized in that, The polarization beam splitter and combiner module (40) directs the reflected light path of the beam modulated by the electronically controlled polarization switching module (30) to the output end, and the transmitted light path is directed to an external path; and the polarization state of the laser emitted from the third laser source (130) is preset to the second polarization state, which can reach the output end through the polarization beam splitter and combiner module (40).

8. The laser coupling system according to claim 7, characterized in that, It also includes a third polarization adjustment unit (50), which is disposed in the optical path of the third laser source (130) and is used to adjust the polarization state of its emitted laser to the second polarization state.

9. The laser coupling system according to claim 1, characterized in that, The first laser source (110) is a nanosecond pulse laser, the second laser source (120) is a picosecond pulse laser, and the third laser source (130) is a continuous or pulsed laser. The wavelengths of the lasers emitted by the first laser source (110), the second laser source (120) and the third laser source (130) are all in the infrared band.

10. A laser processing device, characterized in that, The laser processing equipment integrates a laser coupling system as described in any one of claims 1 to 9, and further includes a processing optical component disposed on the second beam combining optical path.

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