An optimization design method of a polygon-based multi-plane device
By combining a polygon topology-modal coupling model with a genetic optimization algorithm, a phase mask for a polygonal multiplane device is designed, which solves the problems of high loss and difficulty in balancing the shaping effect of reflective multiplane multiplexers, and achieves low-loss and high-efficiency mode conversion.
CN122021342BActive Publication Date: 2026-06-23SUN YAT SEN UNIV
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Patent Information
- Application Number
- CN202610442707.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-07
- Publication Date
- 2026-06-23
- Estimated Expiration
- 2046-04-07
AI Technical Summary
Technical Problem
Among existing multiplane optical conversion technologies, reflective multiplane multiplexers suffer from high losses, difficulty in balancing shaping effects, complex manufacturing and maintenance, and are prone to introducing crosstalk.
Method used
A polygon-based multi-plane device optimization design method is adopted. By combining the topology-modal coupling model with the genetic optimization algorithm, the phase mask parameters are determined. Combined with topological partitioning and modal-specific etching methods, the phase surface is designed to reduce losses and improve the shaping effect.
Benefits of technology
It enables precise design of different polygonal devices, reduces losses, improves shaping effect, and ensures modal conversion efficiency and stability.
✦ Generated by Eureka AI based on patent content.
Abstract
The application relates to an optimization design method of a polygon-based multi-plane device, comprising the following steps: S1. determining parameters of a polygon-based MPLC device; S2. constructing a topological-mode coupling model to determine a phase compensation amount; S3. generating an initial phase mask according to the phase compensation amount calculated in step S2 and in combination with phase distribution characteristics of a target mode; S4. outputting optimized phase mask parameters based on a genetic optimization algorithm; and S5. simulation verification: building simulation models of different topological structures, inputting the optimized phase mask parameters, simulating a mode evolution process, and analyzing whether a performance threshold value meets a demand. The application solves the problems that a traditional algorithm ignores the influence of a topological structure and the generality of a phase mask is poor, realizes accurate design of different polygon devices, and thus effectively reduces loss and improves shaping effect.
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