Tubular reactor cleaning system and cleaning method

Abstract

The invention relates to the technical field of tubular reactors, in particular to a tubular reactor cleaning system and method.The tubular reactor cleaning system comprises a water supply assembly, a cleaning pipe, a first valve, a second valve, a resistivity measuring part, a gas pressure monitoring part, a gas supply assembly and a hydrogen measuring part; the output end of the water supply assembly is connected with an outlet of the cleaning pipe, the outlet of the cleaning pipe is connected with one end of the first valve, the other end of the first valve is connected with an outlet of the reaction pipe, the second valve is connected with an inlet of the reaction pipe, the resistivity measuring component is connected with the second valve, and the gas supply assembly is connected with the inlet of the reaction pipe. The hydrogen measuring part is connected with the second valve, and the gas pressure monitoring part is connected with the reaction tube. According to the tubular reactor cleaning system, the tubular reactor can be conveniently cleaned, the harm caused by manual contact with chemical reagents is reduced, and the cleaning quality is improved.

Description

Technical Field

[0001] This invention relates to the field of tubular reactor technology, and in particular to a tubular reactor cleaning system and cleaning method. Background Technology

[0002] In petrochemical laboratories, tubular reactors are commonly used to pack catalysts and other particulate matter. At the end of each reaction cycle, the reactor needs to be cleaned, the particulate matter removed, and fresh particulate matter added for the next cycle. Tubular reactors are typically long and slender, with most reaction tubes approximately 1.8 meters long, a main body outer diameter of about 25 mm, and a weight of about 20 kg. The common cleaning method is manual cleaning, which exposes the cleaning reagents and resulting solid particles directly to the laboratory environment, adversely affecting laboratory air quality and human health, and the cleaning quality is often unsatisfactory.

[0003] Due to space and equipment limitations in laboratories, most tubular reactor cleaning processes pose a risk of excessive direct contact with operators. This means that residual oil fumes or fine catalyst particles inside the reactor can harm human health and contaminate the laboratory environment. Summary of the Invention

[0004] The present invention aims to at least partially solve one of the technical problems in the related art.

[0005] Therefore, embodiments of the present invention provide a tubular reactor cleaning system that facilitates the cleaning of tubular reactors, reduces the hazards of human contact with chemical reagents, and improves cleaning quality. Embodiments of the present invention also provide a cleaning method for the tubular reactor cleaning system.

[0006] The tubular reactor cleaning system of this invention is connected to a tubular reactor, which includes a reaction tube, and is characterized by comprising: The system includes a water supply assembly, a cleaning pipe, and a first valve. The output end of the water supply assembly is connected to the outlet of the cleaning pipe, the outlet of the cleaning pipe is connected to one end of the first valve, and the other end of the first valve is connected to the outlet of the reaction pipe. A second valve and a resistivity measuring component, wherein the second valve is connected to the inlet of the reaction tube, and the resistivity measuring component is connected to the second valve; A gas supply assembly and a hydrogen measuring component are provided, wherein the gas supply assembly is connected to the inlet of the reaction tube, and the hydrogen measuring component is connected to the second valve. A gas pressure monitoring component is connected to the reaction tube.

[0007] The tubular reactor cleaning system of the present invention facilitates the cleaning of tubular reactors, reduces the harm of human contact with chemical reagents, and improves the cleaning quality.

[0008] In some embodiments, the tubular reactor cleaning system further includes a drain valve connected to the inlet of the reaction tube.

[0009] In some embodiments, the water supply assembly includes a water supply component and a first flow regulator. One end of the water supply component is connected to a water source, and the other end of the water supply component is connected to the inlet of the first flow regulator. One end of the first flow regulator is connected to the cleaning pipe.

[0010] In some embodiments, the tubular reactor cleaning system further includes a water pressure monitoring component disposed on the first flow regulator.

[0011] In some embodiments, the gas supply assembly includes a nitrogen storage component, a second flow regulator, and a third valve. The output end of the nitrogen storage component is connected to one end of the second flow regulator, the other end of the second flow regulator is connected to the third valve, and the third valve is connected to the outlet of the reaction tube.

[0012] In some embodiments, the tubular reactor cleaning system further includes a safety valve and a fourth valve, the fourth valve being connected to the reaction tube and the other end of the fourth valve being connected to the safety valve.

[0013] The cleaning method of the tubular reactor cleaning system according to an embodiment of the present invention includes: The reaction tube is first washed with water. After washing, the resistivity is monitored to see if it is within the preset range. If not, the washing process continues. To remove water from the reaction tube, turn on the gas supply unit to introduce nitrogen into the reaction tube. After the preset purging time, analyze the hydrogen content. If it is below 5 ppm, the water removal is considered qualified; otherwise, continue purging. Perform a pressure holding test on the reaction tube.

[0014] The tubular reactor cleaning system of the present invention facilitates the cleaning of tubular reactors, reduces the harm of human contact with chemical reagents, and improves the cleaning quality.

[0015] In some embodiments, when washing the reaction tube with water, the water supply pressure is set to a first pressure and a second pressure, with the first pressure being greater than the second pressure. The first pressure is used for cleaning first, and the cleaning time is 30 to 45 minutes. Then, the second pressure is used for cleaning, and the cleaning time is 10 to 20 minutes.

[0016] In some embodiments, after washing with water, the resistivity is preset to be greater than 18 MΩ·cm.

[0017] In some embodiments, during pressure holding, pressurize to 0.2 MPa. If the pressure is stable for 5 minutes, continue pressurizing; otherwise, perform leak testing. Continue pressurizing to 1 MPa: a leakage rate of ≤0.5% within 24 hours is acceptable; otherwise, perform leak testing. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of a tubular reactor cleaning system according to an embodiment of the present invention.

[0019] Figure label: Tubular reactor 1, reaction tube 101, Water supply component 2, water supply element 21, first flow regulating element 22, Cleaning tube 3, first valve 4, second valve 5, resistivity measuring component 6. Gas supply assembly 7, nitrogen storage component 71, second flow regulating component 72, third valve 73 Hydrogen gas measuring component 8, gas pressure monitoring component 9, drain valve 10, water pressure monitoring component 11. Detailed Implementation

[0020] Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0021] The tubular reactor 1 cleaning system of this embodiment is connected to the tubular reactor 1. The tubular reactor 1 includes a reaction tube 101, including: a water supply component 2, a cleaning tube 3 and a first valve 4. The output end of the water supply component 2 is connected to the outlet of the cleaning tube 3. The outlet of the cleaning tube 3 is connected to one end of the first valve 4, and the other end of the first valve 4 is connected to the outlet of the reaction tube 101. A second valve 5 and a resistivity measuring component 6 are included, with the second valve 5 connected to the inlet of the reaction tube 101 and the resistivity measuring component 6 connected to the second valve 5; a gas supply assembly 7 and a hydrogen measuring component 8 are included, with the gas supply assembly 7 connected to the inlet of the reaction tube 101 and the hydrogen measuring component 8 connected to the second valve 5; and a gas pressure monitoring component 9 is connected to the reaction tube 101. The gas pressure monitoring component 9 can be an existing gas sensor.

[0022] The tubular reactor 1 cleaning system of the present invention facilitates the cleaning of the tubular reactor 1, reduces the harm of human contact with chemical reagents, and improves the cleaning quality.

[0023] Specifically, such as Figure 1As shown, the outlet of the water supply component 2 is connected to the outlet of the cleaning pipe 3. The other end of the outlet of the cleaning pipe 3 is connected to one end of the first valve 4. The other end of the first valve 4 is connected to the outlet of the reaction tube 101, so that the water from the water supply component 2 enters the reaction tube 101 after passing through the cleaning pipe 3. The outlet of the reaction tube 101 is connected to the cleaning water, and the cleaning water can be deionized water or pure water. The water supply component 2 performs backwashing on the reaction tube 101. Sampling is carried out on the reaction tube 101. When the resistivity is greater than 18 MΩ·cm, it is considered that the cleaning is qualified; otherwise, continue cleaning. For example, the second valve 5 and the resistivity measurement component 6 are opened for sampling, and the resistivity measurement component 6 measures the resistivity of the water flowing out of the inlet of the reaction tube 101.

[0024] After the cleaning is qualified, the reactor is dehydrated. High-purity nitrogen is used for dehydration, with a purity of 99.99% and a hydrogen content not exceeding 5 ppm. The high-purity nitrogen is purged for 30 minutes, and the hydrogen content is analyzed. When it is lower than 5 ppm, it is considered that the dehydration is qualified. For example, the gas supply component 7 is connected to the outlet of the reaction tube 101 to introduce pure nitrogen. However, during the production and manufacturing of nitrogen, hydrogen is inevitably present. After using nitrogen for dehydration, the presence of hydrogen may cause explosion or other safety accidents. By analyzing the hydrogen content, it can be ensured that there is no hydrogen residue during the dehydration process, thus improving the safety of the system. For example, when the hydrogen content needs to be measured, the hydrogen measurement component 8 and the second valve 5 are both opened for the determination of the hydrogen content.

[0025] After the dehydration is completed, a pressure holding operation is carried out: pressurize to 0.2 MPa, check the deformation of the pipeline, whether there are obvious leakage points, and the change of the pressure gauge data. If it is normal, keep the pressure stable for 5 minutes and then continue to pressurize. If it is unqualified, perform corresponding leak elimination treatment; continue to pressurize to 1 MPa: check the deformation of the pipeline and the change of the pressure gauge data. If it is qualified, carry out an airtightness test. If it is unqualified, perform corresponding leak elimination treatment; calculate that the leakage rate within 24 hours ≤ 0.5% is qualified. If it is unqualified, perform leak elimination on it until the pressure holding is qualified, and install a blind flange for sealing and wait for the next reaction. For example, the gas supply component 7 supplies gas, closes the second valve 5, then conducts a maintenance test, and monitors the pressure through the gas pressure monitoring component 9. It can be understood that the resistivity measurement component 6 is an existing resistivity meter, or an existing resistivity measurement device or resistivity measurement unit, etc.

[0026] This implementation achieves automated cleaning of the tubular reactor 1 through the water supply component 2, cleaning pipe 3, and first valve 4. Cleaning water (such as deionized water or pure water) enters the reaction tube 101 through the cleaning pipe 3 for backwashing, ensuring that deposits and impurities on the inner wall of the reaction tube 101 are thoroughly removed. The resistivity of the cleaned water is tested by the resistivity measuring component 6 to ensure that the cleaning is qualified. For example, a resistivity greater than 18 MΩ·cm is considered qualified; otherwise, cleaning continues, thus ensuring cleaning quality. The cleaning process is completed automatically by the system, reducing the opportunity for direct human contact with chemical reagents and lowering the health risks associated with such contact. After the water removal operation, the hydrogen content is analyzed by the hydrogen measuring component 8 to ensure that the hydrogen content is below 5 ppm. This prevents hydrogen residue and avoids explosions or other safety accidents caused by hydrogen. Through pressure holding operations, the deformation of the pipeline, leaks, and changes in pressure gauge data are checked to ensure the stability and safety of the system under high pressure. A 24-hour leakage rate ≤0.5% is considered qualified, further ensuring the airtightness of the system.

[0027] Furthermore, the tubular reactor 1 cleaning system also includes a drain valve 10, which is connected to the inlet of the reaction pipe 101 to facilitate the discharge of wastewater or gas generated during the cleaning process.

[0028] In some embodiments, the water supply assembly 2 includes a water supply component 21 and a first flow regulator 22. One end of the water supply component 21 is connected to a water source, and the other end of the water supply component 21 is connected to the inlet of the first flow regulator 22. One end of the first flow regulator is connected to the cleaning pipe 3.

[0029] Specifically, such as Figure 1 As shown, the water supply component 21 is connected to a water source and to a first flow regulator 22 to regulate the pressure and flow rate of the output water. For example, the pressure and flow rate of the output water can be adjusted by adjusting the power of the water supply component 21 and the opening angle of the first flow regulator 22. The backwashing process employs a multi-stage pressure control mode. Initially, a lower pressure is used to loosen deposits, followed by a gradual increase in pressure to thoroughly remove stubborn impurities, ensuring the reaction channel remains unobstructed at all times. Simultaneously, the backwash fluid is discharged through a separate recovery pipeline, and the resistivity of the ultrapure water used after cleaning is measured.

[0030] This implementation, through the combination of the water supply component 2 and the first flow regulator 22, enables the tubular reactor 1 cleaning system to control the pressure and flow rate of the cleaning water. The water flow characteristics are adjusted according to different cleaning stages to ensure cleaning effectiveness. Simultaneously, resistivity detection and multi-stage pressure control modes further improve cleaning efficiency.

[0031] Furthermore, the tubular reactor 1 cleaning system also includes a water pressure monitoring component 11, which is installed on the first flow regulator 22 to monitor the water pressure output by the first flow regulator 22.

[0032] In some embodiments, the gas supply assembly 7 includes a nitrogen storage component 71, a second flow regulating component 72, and a third valve 73. The output end of the nitrogen storage component is connected to one end of the second flow regulating component 72, and the other end of the second flow regulating component 72 is connected to the third valve 73. The third valve 73 is connected to the outlet of the reaction tube 101.

[0033] Specifically, such as Figure 1 As shown, the second flow regulator 72 is adapted to regulate the flow rate and pressure of the gas output from the nitrogen storage component 71, or. The second flow regulator 72 adjusts the opening degree and cooperates with the nitrogen storage component 71 to adjust the output gas pressure for nitrogen purging and gas pressure holding tests.

[0034] Furthermore, the nitrogen storage component 71 includes a storage element and a gas supply pump. The storage element stores nitrogen, the input end of the gas supply pump is connected to the storage element, and the output end of the gas supply pump is connected to a second flow regulator. The gas supply pump can be an existing gas pump, a gas supply device, or a gas supply system.

[0035] In some embodiments, the tubular reactor 1 cleaning system further includes a safety valve and a fourth valve. The fourth valve is connected to the reaction tube 101, and its other end is connected to the safety valve. The fourth valve opens during the airtightness pressure test to ensure the safety valve functions properly. The fourth valve closes during the pressure test to isolate the safety valve and prevent it from accidentally opening outside of testing conditions.

[0036] The cleaning method of the tubular reactor 1 cleaning system according to an embodiment of the present invention includes: The reaction tube 101 is first washed with water. After washing, the resistivity is monitored to see if it is within the preset range. If not, the washing continues. To remove water from reaction tube 101, turn on the gas supply component 7 to introduce nitrogen into reaction tube 101. After the preset purging time, analyze the hydrogen content. If it is below 5 ppm, the water removal is considered qualified. If not, continue purging. Perform a pressure holding test on reaction tube 101.

[0037] The tubular reactor 1 cleaning system of the present invention facilitates the cleaning of the tubular reactor 1, reduces the harm of human contact with chemical reagents, and improves the cleaning quality.

[0038] The backwashing medium is selected as ultrapure water. The backwashing process adopts a multi-stage pressure control mode. In the initial stage, the sediment is loosened with a lower pressure, and then the pressure is gradually increased to completely remove stubborn impurities, ensuring that the reaction channels are always kept unobstructed. At the same time, the backwashing liquid is discharged through an independent recovery pipeline. Before cleaning, the resistivity of the used ultrapure water is measured. Only when the resistivity is higher than 18 MΩ·cm can it be used. After 30 minutes of low-pressure cleaning and 15 minutes of high-pressure cleaning, a sample is taken from the recovery pipeline or the second valve 5 and the resistivity measurement component 6 are opened. When the resistivity is greater than 18 MΩ·cm, it is considered that the cleaning is qualified; otherwise, continue cleaning.

[0039] After the cleaning is qualified, the reaction tube 101 is dehydrated. High-purity nitrogen is used for dehydration, with a purity of 99.99% and a hydrogen content not exceeding 5 ppm. The high-purity nitrogen is purged for 30 minutes. The hydrogen measurement component 8 and the second valve 5 are opened to analyze the hydrogen content. When it is lower than 5 ppm, it is considered that the dehydration is qualified. After the dehydration is completed, a pressure holding operation is carried out: pressurize to 0.2 MPa, check the deformation of the pipeline, whether there are obvious leakage points, and the change of the pressure gauge data. If it is normal, stabilize the pressure for 5 minutes and then continue to pressurize. If it is unqualified, carry out corresponding leak elimination treatment; continue to pressurize to 1 MPa: check the deformation of the pipeline and the change of the pressure gauge data. If it is qualified, the cleaning is completed.

[0040] The cleaning system and cleaning method of the tubular reactor 1 in the embodiment of the present invention adopt a multi-stage pressure control mode for water washing, and gradually remove the sediment and impurities in the reaction tube 101 through the low-pressure and high-pressure stages to ensure the cleaning effect. The cleaned water is discharged through an independent recovery pipeline, and the resistivity measurement component 6 is used to monitor the cleaning effect in real time. Only when the resistivity is greater than 18 MΩ·cm is it considered that the cleaning is qualified, ensuring the cleaning quality and improving the stability of the cleaning effect. In the dehydration stage, the system uses high-purity nitrogen for purging, with a nitrogen purity reaching 99.99% and a hydrogen content not exceeding 5 ppm. After 30 minutes of purging, the hydrogen measurement component 8 is used to analyze the hydrogen content, and only when the hydrogen content is lower than 5 ppm is it considered that the dehydration is qualified. This process effectively avoids safety accidents that may be caused by hydrogen residue and improves the safety of the system. In addition, the opportunity for direct human contact with chemical reagents is reduced through automated operation, reducing the health risks of operators. In the pressure holding test stage, the system gradually pressurizes to 0.2 MPa and 1 MPa, and checks the deformation of the pipeline, leakage points and the change of the pressure gauge data respectively. Through a strict airtightness test, it is ensured that the leakage rate does not exceed 0.5% in 24 hours, thus ensuring the stability and reliability of the system under high-pressure operation.

[0041] Furthermore, when washing the reaction tube 101 with water, the water supply pressure is set to a first pressure and a second pressure, with the first pressure being greater than the second pressure. First, the first pressure is used for cleaning for 30-45 minutes, followed by cleaning with the second pressure for 10-20 minutes. By gradually removing deposits and impurities from the reaction tube 101 through low-pressure and high-pressure stages, the cleaning effect is ensured.

[0042] Furthermore, after washing, the resistivity is preset to be greater than 18 MΩ·cm, ensuring cleaning quality and improving the stability of the cleaning effect.

[0043] In some embodiments, during the pressure holding test, the pressure is increased to 0.2 MPa. If the pressure is stable for 5 minutes, the pressure is increased further; otherwise, a leak test is performed. The pressure is increased to 1 MPa. If the leakage rate is ≤0.5% after 24 hours, it is considered qualified; otherwise, a leak test is performed.

[0044] Furthermore, the gas supply assembly 7 also includes a helium supply component, a third flow regulator, a fourth valve, and a helium leak detection component. The output end of the nitrogen storage component is connected to one end of the third flow regulator, and the other end of the third flow regulator is connected to the fourth valve. The fourth valve is connected to the outlet of the reaction tube 101. The helium leak detection component is suitable for detecting helium leaks in the reaction tube 101. The helium leak detection component can be an existing helium leak detector, etc. During leak detection, the helium supply component injects gas into the reaction tube 101, and the monitoring end of the helium leak detection component can be a flexible hose, allowing the operator to place the hose inlet at different positions on the reaction tube 101 for leak detection. After locating the leak, welding or appropriate sealing treatment is performed. In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0045] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0046] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0047] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0048] In this invention, the terms "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0049] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A tubular reactor cleaning system, connected to a tubular reactor, the tubular reactor including a reaction tube, characterized in that, include: The system includes a water supply assembly, a cleaning pipe, and a first valve. The output end of the water supply assembly is connected to the outlet of the cleaning pipe, the outlet of the cleaning pipe is connected to one end of the first valve, and the other end of the first valve is connected to the outlet of the reaction pipe. A second valve and a resistivity measuring component, wherein the second valve is connected to the inlet of the reaction tube, and the resistivity measuring component is connected to the second valve; A gas supply assembly and a hydrogen measuring component are provided, wherein the gas supply assembly is connected to the inlet of the reaction tube, and the hydrogen measuring component is connected to the second valve. A gas pressure monitoring component is connected to the reaction tube.

2. The tubular reactor cleaning system according to claim 1, characterized in that, It also includes a drain valve, which is connected to the inlet of the reaction tube.

3. The tubular reactor cleaning system according to claim 2, characterized in that, The water supply assembly includes a water supply component and a first flow regulator. One end of the water supply component is connected to a water source, and the other end of the water supply component is connected to the inlet of the first flow regulator. One end of the first flow regulator is connected to the cleaning pipe.

4. The tubular reactor cleaning system according to claim 3, characterized in that, It also includes a water pressure monitoring component, which is mounted on the first flow regulating component.

5. The tubular reactor cleaning system according to claim 2, characterized in that, The gas supply assembly includes a nitrogen storage component, a second flow regulator, and a third valve. The output end of the nitrogen storage component is connected to one end of the second flow regulator, the other end of the second flow regulator is connected to the third valve, and the third valve is connected to the outlet of the reaction tube.

6. The tubular reactor cleaning system according to claim 2, characterized in that, It also includes a safety valve and a fourth valve, the fourth valve being connected to the reaction tube, and the other end of the fourth valve being connected to the safety valve.

7. A cleaning method for a tubular reactor cleaning system, characterized in that, include: The reaction tube is first washed with water. After washing, the resistivity is monitored to see if it is within the preset range. If not, the washing process continues. To remove water from the reaction tube, turn on the gas supply unit to introduce nitrogen into the reaction tube. After the preset purging time, analyze the hydrogen content. If it is below 5 ppm, the water removal is considered qualified; otherwise, continue purging. Perform a pressure holding test on the reaction tube.

8. The cleaning method for the tubular reactor cleaning system according to claim 7, characterized in that, When washing the reaction tube with water, the water supply pressure is set to a first pressure and a second pressure, with the first pressure being greater than the second pressure. The first pressure is used for cleaning for 30 to 45 minutes, and then the second pressure is used for cleaning for 10 to 20 minutes.

9. The tubular reactor cleaning system according to claim 8, characterized in that, include: After washing, the resistivity is preset to be greater than 18 MΩ·cm.

10. The cleaning method for the tubular reactor cleaning system according to claim 9, characterized in that, include: During the pressure holding process, pressurize to 0.2 MPa. If the pressure stabilizes normally for 5 minutes, continue pressurizing. Otherwise, perform a leak test. Continue pressurizing to 1 MPa: a leakage rate of ≤0.5% within 24 hours is acceptable. Otherwise, perform a leak test.

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