X-ray source based on gas plasma discharge
CN122067954BActive Publication Date: 2026-07-03ANHUI ABSORPTION SPECTROMETER EQUIP CO LTD
Patent Information
- Application Number
- CN202610521771.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-20
- Publication Date
- 2026-07-03
- Estimated Expiration
- 2046-04-20
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Figure CN122067954B_ABST
Abstract
The application relates to the technical field of X-ray sources, and discloses an X-ray source based on gas plasma discharge, which comprises a vacuum containing cavity formed in a gas containing structure; a discharge cathode structure comprises a cathode target, the cathode target is used for discharging to a working gas in the vacuum containing cavity, so that cations formed by the working gas bombard the cathode target to generate an electron beam; a driving structure is connected with the vacuum containing cavity and an anode target structure, the anode target structure comprises an anode target, the driving structure is used for driving the electron beam to flow into the anode target structure through the driving structure and bombard the anode target, so that the anode target structure emits X-rays. By arranging the cathode target, the problem of filament overheating and ablation can be avoided, the service life of the X-ray source is prolonged, the stable output of the electron beam is realized, the photon flux of the X-rays is improved, and the X-ray source can meet the use requirements of high-precision detection and analysis instruments.
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Citation Information
Patent Citations
X-ray source and X-ray generating method
CN103219211A
Cryogenic x-ray source device
US20050025285A1
