System and method for monitoring resistance welding

CN122071076APending Publication Date: 2026-05-22SAMSUNG SDI CO LTD
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Patent Information

Application Number
CN202511658741.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-11-20
Filing Date
2025-11-13
Publication Date
2026-05-22

AI Technical Summary

Technical Problem

In the existing technology, due to hardware and software compatibility issues, it is difficult to guarantee the consistency of measured values ​​and the speed of signal reception in the monitoring resistance welding system, resulting in inaccurate monitoring results and limited improvement functions.

Method used

A data acquisition (DAQ) system is adopted to convert analog signals into digital signals and construct an independent analysis area. By utilizing virtual circuits and high-speed sampling technology, hardware and software compatibility is achieved, sensor noise is removed and waveform feature values ​​are extracted, and two-way communication is performed to set specifications and enhance monitoring.

Benefits of technology

This ensured the reliability and consistency of monitoring results, simplified functional improvements, enabled effective communication with welding machine and facility control systems, and avoided a complete overhaul of hardware and software.

✦ Generated by Eureka AI based on patent content.

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Abstract

A system and method for monitoring resistance welding is disclosed. A method of monitoring resistance welding includes the steps of: (a) converting a signal obtained in a resistance welding process; (b) measuring waveform data of the welding machine; (c) performing analysis setting and automatic waveform data analysis; (d) extracting a feature value of each waveform based on a result of the waveform data analysis; (e) setting specifications by performing data communication with the welding machine; and (f) performing specification augmentation based on the waveform data analysis.
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Description

[0001] This application claims priority and benefit to Korean Patent Application No. 10-2024-0166572, filed on November 20, 2024, with the Korean Intellectual Property Office, the entire disclosure of which is incorporated herein by reference. Technical Field

[0002] This disclosure relates to a system and method for monitoring resistance welding, and more specifically, to a system and method for monitoring resistance welding based on data acquisition (DAQ). Background Technology

[0003] Resistance welding is a process used to weld the negative electrode terminals and the canister of circular battery cells for secondary batteries. Systems used to monitor resistance welding analyze signals generated during the welding process to assess the quality of the weld. Summary of the Invention

[0004] The embodiments of this disclosure aim to provide a system and method for monitoring resistance welding, which provides an independent analysis area for heterogeneous analog signals by using data acquisition (DAQ), without being limited by the receiving speed of digital signals, can easily ensure hardware and software compatibility, and can ensure the reliability of monitoring results.

[0005] A method for monitoring resistance welding according to an embodiment of the present disclosure includes the following steps: (a) converting signals obtained in the resistance welding process; (b) measuring waveform data of the welding machine; (c) performing analysis settings and automatic waveform data analysis; (d) extracting feature values ​​of each waveform based on the results of the waveform data analysis; (e) setting specifications by performing data communication with the welding machine; and (f) performing specification enhancement based on the waveform data analysis.

[0006] Step (a) includes removing sensor noise during the process of converting the obtained analog signal into a digital signal.

[0007] Step (b) includes: measuring the waveform data of the welding machine according to a preset sampling rate.

[0008] Step (c) includes: performing analysis settings including the analysis area and analysis time.

[0009] Step (d) includes: extracting at least one of the following feature values ​​for each waveform: maximum value, minimum value, mean, standard deviation, and waveform trend, as a continuous result of waveform data analysis.

[0010] Step (e) includes: setting specifications related to the reinforcement of the monitoring system by performing two-way communication with the welding machine, and performing two-way communication with the facility control system using the welding machine.

[0011] Step (f) includes: designing additional functional modules that match user needs based on the enhanced results of the waveform data analysis-based specifications.

[0012] A system for monitoring resistance welding according to an embodiment of the present disclosure includes: an input interface device configured to receive welding condition setting information and measured values; a memory having stored a program for monitoring resistance welding; and a processor configured to execute the program. The processor receives the measured values ​​and executes analysis settings, the measured values ​​including the execution results of performing test welding based on the welding condition setting information.

[0013] The input interface device receives digital signals at a rate exceeding a predetermined number per second. The processor digitally and visually represents the digital signals by converting them into quantitative data.

[0014] The processor performs waveform characteristic analysis by omitting the correction of the converted data and the synchronization processing used to analyze the analog signal.

[0015] The processor measures the waveform data of the welding machine based on a preset sampling rate and analyzes the waveform data.

[0016] The processor performs analysis settings on waveform characteristics, including the analysis region and analysis time.

[0017] The processor extracts waveform characteristics including at least one of the following: maximum value, minimum value, mean, standard deviation, and waveform trend.

[0018] According to this disclosure, correction and reprocessing are not necessary when converting digital signals, and independent analysis regions for two or more analog signals can be constructed because the analog signals are reconstructed without being limited by the receiving speed of the digital signals.

[0019] According to this disclosure, when improvements to a monitoring system are needed, a virtual circuit installed on the monitoring system can be implemented solely through program and software operations, or it can be easily implemented by adding modules with additional functions compatible with the hardware. Therefore, the following problem according to conventional technology can be solved: ensuring compatibility between hardware and software essentially requires a complete overhaul.

[0020] According to this disclosure, in terms of technological advancement, since the reliability of the monitoring system itself can be ensured, no restrictions are imposed on the implementation of additional functions.

[0021] However, the effects achievable through this disclosure are not limited to those described herein, and those skilled in the art will clearly understand from the description of this disclosure that other technical effects are not mentioned. Attached Figure Description

[0022] The following figures illustrate exemplary embodiments of the present disclosure, and exemplary aspects of the present disclosure are further described together with the detailed description thereof. Therefore, the present disclosure should not be construed as limited to the figures.

[0023] Figure 1 The electrode assembly of a secondary battery is shown schematically.

[0024] Figure 2 The structure of a pouch-type secondary battery is illustrated schematically.

[0025] Figure 3 A schematic representation of the appearance of a prismatic secondary battery is shown.

[0026] Figure 4 This is a cross-sectional view of a cylindrical secondary battery.

[0027] Figure 5 and Figure 6 The problems of a system for monitoring resistance welding based on conventional techniques are illustrated.

[0028] Figure 7 The process of a method for monitoring resistance welding according to an embodiment of the present disclosure is shown.

[0029] Figures 8 to 10 Improvements to embodiments according to this disclosure are shown.

[0030] Figure 11 and Figure 12 An example of a system for monitoring resistance welding according to embodiments of the present disclosure is shown.

[0031] Figure 13 Specifications and processes for a system for monitoring resistance welding according to embodiments of the present disclosure are shown.

[0032] Figure 14 This is a block diagram illustrating a computer system for implementing a method according to an embodiment of the present disclosure.

[0033] Figure 15 This is an example view of a secondary battery module in which a secondary battery manufactured according to an example of the present disclosure is arranged.

[0034] Figure 16 It includes Figure 15 An example view of the secondary battery pack shown in the diagram.

[0035] Figure 17 It includes Figure 16 The image shows a concept drawing of a vehicle with a secondary battery pack. Detailed Implementation

[0036] In the following, exemplary embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. The terms or words used in this specification and claims should not be construed restrictively based on their general or common meaning, but rather should be interpreted as being consistent with the technical concept of the present disclosure, based on the principle that the inventor, as their own lexicographer, can appropriately define the concepts of the terms to best describe his / her disclosure.

[0037] The exemplary embodiments described in this specification and the constructions shown in the accompanying drawings are merely some exemplary embodiments of this disclosure and do not represent all aspects of this disclosure. Therefore, it should be understood that various equivalents and modifications may exist to replace or modify one or more embodiments described herein at the time of filing this application.

[0038] It will be understood that if an element or layer is referred to as being "on," "connected to," or "bonded to" another element or layer, then it can be directly on, directly connected to, or directly bonded to said other element or layer, or one or more intermediary elements or layers may be present. When an element or layer is referred to as being "directly on," "directly connected to," or "directly bonded to" another element or layer, no intermediary element or layer is present. For example, if a first element is described as being "bonded" or "connected" to a second element, then the first element can be directly bonded to or directly connected to the second element, or the first element can be indirectly bonded to or indirectly connected to the second element via one or more intermediary elements.

[0039] In the figures, the dimensions of various elements, layers, etc., may be exaggerated for clarity. The same reference numerals denote the same elements. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. Furthermore, the use of "may" refers to "one or more embodiments of this disclosure" when describing embodiments of the present disclosure. Expressions such as "at least one of..." and "any one of..." modify the entire column of elements when following a list of elements, without modifying individual elements within the column. If phrases such as "at least one of A, B, and C", "at least one of A, B, or C", "at least one selected from the group of A, B, and C", or "at least one selected from A, B, and C" are used to specify a column of elements A, B, and C, then the phrase may refer to any suitable combination (subset) and all suitable combinations (or subsets) of A, B, and C, such as A, B, C, A and B, A and C, B and C, or A and B and C. As used herein, the term “use” and its variations may be considered synonymous with the term “utilize” and its variations, respectively. As used herein, the terms “basic,” “about,” and similar terms are used as approximate terms rather than as terms of degree, and are intended to account for inherent biases in measurements or calculations that will be recognized by one of ordinary skill in the art.

[0040] It will be understood that although the terms first, second, third, etc., may be used herein to describe various elements, components, regions, layers, and / or portions, these elements, components, regions, layers, and / or portions should not be limited by these terms. These terms are used to distinguish one element, component, region, layer, or portion from another element, component, region, layer, or portion. Therefore, without departing from the teachings of the exemplary embodiments, the first element, component, region, layer, or portion discussed herein may be referred to as the second element, component, region, layer, or portion.

[0041] For ease of description, spatial relative terms such as “below,” “under,” “down,” “above,” “above,” etc., may be used herein to describe the relationship between one element or feature as shown in the figure and another element(s). It will be understood that, in addition to the orientation depicted in the figure, the spatial relative terms are intended to also cover different orientations of the device in use or operation. For example, if the device in the figure is flipped, an element described as “below” or “under” other elements or features will subsequently be oriented “above” or “above” said other elements or features. Thus, the term “below” can cover both above and below orientations. The device may be otherwise oriented (rotated 90 degrees or in other orientations), and the spatial relative descriptive terms used herein should be interpreted accordingly.

[0042] The terminology used herein is for the purpose of describing embodiments of this disclosure and is not intended to be limiting of this disclosure. As used herein, unless the context clearly indicates otherwise, the singular forms “a” and “an” are also intended to include the plural forms. It will be understood that if the terms “comprising,” “including,” and / or variations thereof are used in this specification, it indicates the presence of the stated features, integers, steps, operations, elements, and / or components, but does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0043] Furthermore, any numerical range described herein is intended to include all subranges with the same numerical precision contained within the described range. For example, the range “1.0 to 10.0” is intended to include all subranges between the described minimum value of 1.0 and the described maximum value of 10.0 (and includes both the described minimum value of 1.0 and the described maximum value of 10.0), i.e., having a minimum value equal to or greater than 1.0 and a maximum value equal to or less than 10.0, such as 2.4 to 7.6. Any maximum numerical limit described herein is intended to include all lower numerical limits contained therein, while any minimum numerical limit described in this specification is intended to include all higher numerical limits contained therein. Therefore, the applicant reserves the right to modify this specification and the claims to expressly describe any subranges contained within the range expressly described herein. All such ranges are intended to be fixed in their description in this specification such that modifications to expressly describe any such subranges are within the scope of this disclosure.

[0044] Referring to two compared elements, features, etc., as “identical” can mean that they are “substantially identical.” Therefore, the phrase “substantially identical” can include cases with deviations considered low in the art (e.g., 5% or less). Furthermore, stating that a parameter is uniform in a given region can mean that it is uniform in terms of average value.

[0045] Throughout this specification, unless otherwise stated, each element may be singular or plural.

[0046] Arranging any element "above (or below)" or "on (below)" another element can mean that the arbitrary element can contact the upper (or lower) surface of the element, and that the other element can be placed between the element and the arbitrary element located above (or below) the element.

[0047] Furthermore, it will be understood that if a component is referred to as “linked,” “combined,” or “connected” to another component, then these components can be directly “combined,” “linked,” or “connected” to each other, or another component can be “placed” between these components.

[0048] Throughout this specification, unless otherwise stated, if "A and / or B" is stated, it means A, B, or A and B. That is, "and / or" includes any or all combinations of the listed items. When "C to D" is stated, unless otherwise stated, it means C or greater and D or less.

[0049] When the terms “about” or “substantially” are used in conjunction with numerical values ​​in this specification, the numerical values ​​intended to be associated include a tolerance of ±10% around said value. When a range is specified, the range includes all values ​​in increments such as 0.1%.

[0050] The terminology used herein is for the purpose of describing exemplary embodiments of this disclosure and is not intended to limit the disclosure.

[0051] Traditional monitoring systems, composed of custom-designed, internal board-based hardware, suffer from limited signal reception speeds and difficulty in ensuring measurement consistency. The problems with these systems include the need for data calibration to guarantee measurement consistency, the requirement for synchronized data analysis areas, and the necessity of a complete overhaul to ensure hardware and software compatibility when improving the system.

[0052] According to traditional techniques, appropriateness is determined by applying criteria based on statistical foundations of the measured values, obtained by converting analog signals into digital signals. The problem lies in the difficulty of guaranteeing the accuracy of these criteria, as the consistency of the measured values ​​cannot be guaranteed, as described herein.

[0053] Therefore, in systems used for monitoring resistance welding based on conventional techniques, the accuracy of the criteria is difficult to guarantee, and the implementation of additional functions required for technological advancements in the monitoring system is also limited.

[0054] Figure 1 The electrode assembly is schematically shown within the casing of the secondary battery.

[0055] Electrode assembly 10 can be formed by winding or stacking a first electrode plate 11, a diaphragm 12, and a second electrode plate 13, which are formed as a sheet or film. When electrode assembly 10 is wound, the winding axis can be parallel to the longitudinal direction (e.g., the y-direction) of housing 59. In other example embodiments, electrode assembly 10 can be stacked instead of wound, and the shape of electrode assembly 10 is not limited in the examples of this disclosure. Furthermore, electrode assembly 10 can be or include Z-stacked electrode assemblies, wherein positive and negative electrode plates are inserted into both sides of a diaphragm, and then the diaphragm is bent into a Z-stack. Additionally, one or more electrode assemblies can be stacked such that the long sides of the electrode assemblies are adjacent to each other and housed in a housing, and the number of electrode assemblies in the housing is not limited in the examples of this disclosure. The first electrode plate 11 of the electrode assembly can serve as a negative electrode, and the second electrode plate 13 can serve as a positive electrode. In the examples, the reverse is also possible.

[0056] The first electrode plate 11 can be formed by depositing a first electrode active material (such as graphite or carbon) onto a first electrode current collector formed of a metal foil (such as copper, copper alloy, nickel, or nickel alloy). The first electrode tab 14 can be connected to an external first terminal (not shown). In some example embodiments, when manufacturing the first electrode plate 11, the first electrode tab 14 can be formed by pre-cutting it to protrude to one side of the electrode assembly 10, or the first electrode tab 14 can protrude to one side of the electrode assembly 10 beyond the diaphragm 12 without being separately cut, for example, protruding further than or beyond the diaphragm 12.

[0057] The second electrode plate 13 can be formed by depositing a second electrode active material (such as a transition metal oxide) onto a second electrode current collector formed of or comprising a metal foil (such as aluminum or an aluminum alloy). The second electrode plate 13 may include a second electrode tab 15 (e.g., a second uncoated portion), which is or includes an area where the second electrode active material is not deposited. The second electrode tab 15 may be connected to an external second terminal (not shown). In some example embodiments, the second electrode tab 15 may be formed by pre-cutting it during the manufacture of the second electrode plate 13 to protrude to the other side (e.g., the opposite side) of the electrode assembly 10, or the second electrode plate 13 may protrude beyond the diaphragm 12 to the other side of the electrode assembly without being separately cut, for example, protruding further than or beyond the diaphragm 12.

[0058] In some example embodiments, the first electrode tab 14 may be located on the left side of the electrode assembly 10, and the second electrode tab 15 may be located on the right side of the electrode assembly 10. In other example embodiments, the first electrode tab 14 and the second electrode tab 15 may be located on one side of the electrode assembly 10 in the same direction.

[0059] Here, for ease of description, according to... Figure 1 The oriented electrode assembly 10 defines the left and right sides, and its position can change when the secondary battery is rotated left and right or up and down.

[0060] The diaphragm 12 impedes or substantially prevents a short circuit between the first electrode plate 11 and the second electrode plate 13, while allowing lithium ions to move therebetween. The diaphragm 12 may be made of, for example, a polyethylene membrane, a polypropylene membrane, a polyethylene-polypropylene membrane, etc., or may include, for example, a polyethylene membrane, a polypropylene membrane, a polyethylene-polypropylene membrane, etc.

[0061] In some example embodiments, the electrode assembly 10 may be housed together with the electrolyte in a housing (not shown). In the case of a pouch-type secondary battery, the electrode assembly 10 may be... Figure 1 The form shown is housed in a bag made of or comprising a flexible material. In the case of a prismatic secondary battery, the electrode assembly 10 can be... Figure 1 The form shown is housed in a prismatic metal shell.

[0062] Figure 2 A pouch-type secondary battery is shown schematically.

[0063] The pouch-type secondary battery includes an electrode assembly 10 and a pouch 20, wherein the pouch 20 houses or contains the electrode assembly 10.

[0064] Electrode assembly 10 can be with Figure 1 The electrode assembly 10 shown is identical. The first electrode tab 14 and the second electrode tab 15 of the electrode assembly 10 can be electrically connected to the corresponding external first terminal lead 16 and second terminal lead 17 by means of attachment, such as welding or other methods that maintain conductivity therebetween. At least a portion of each of the first terminal lead 16 and the second terminal lead 17 can be attached to or covered with a tab film 18 to insulate it from the bag 20.

[0065] The bag 20 can be sealed by bringing its sealing portions 21 at its edges into contact with each other while accommodating or housing the electrode assembly 10. In this case, the seal can be achieved by inserting a thin bonding film 18 between the sealing portions 21. The sealing portions 21 of the bag 20 can be made of or comprise a thermoforming material that typically has weak adhesion to metals. Therefore, it can be fused to the bag 20 by inserting a thin bonding film 18 between the sealing portions 21.

[0066] Figure 3 The schematic appearance of a prismatic secondary battery is shown.

[0067] The prismatic housing 59 defines the overall appearance of the prismatic secondary battery and may be made of or include a conductive metal, such as aluminum, aluminum alloy, or nickel-plated steel. Furthermore, the housing 59 provides space for accommodating or housing the electrode assembly 10 therein.

[0068] The cover assembly 60 may include a cover plate 61 that covers an opening in the housing 59, and the housing 59 and the cover plate 61 may be made of or comprise a conductive material. A first terminal 63 and a second terminal 62 may be electrically connected inside the housing 59. Figure 1 and Figure 2 The electrode assembly 10 shown has a first electrode connector 14 and a second electrode connector 15, and can be mounted to protrude outward through the cover plate 61.

[0069] The cover 61 may be equipped with or include an electrolyte injection port 64, which is configured to house a sealing plug therein, and may also include a vent 66 formed to include a recess 65. The vent 66 is configured to vent any gases generated inside the secondary battery.

[0070] Figure 4 This is a cross-sectional view of a cylindrical secondary battery.

[0071] The cylindrical secondary battery includes an electrode assembly 30, a housing containing the electrode assembly 30 and an electrolyte therein, a cover assembly 50 connected to an opening in the housing to seal the housing, and an insulating plate 37 located inside the housing between the electrode assembly 30 and the cover assembly 50.

[0072] The electrode assembly 30 may include a diaphragm 32 between the first electrode 33 and the second electrode 31, and the electrode assembly 30 may be wound into an electrode core form.

[0073] The first electrode 33 may include a first substrate and a first active material layer located on the first substrate. A first lead tab 35 may extend outward from a first uncoated portion of the unpositioned first active material layer on the first substrate and may be electrically connected to the cover assembly 50.

[0074] The second electrode 31 may include a second substrate and a second active material layer located on the second substrate. A second lead tab 34 may extend outward from a second uncoated portion of the unpositioned second active material layer on the second substrate and may be electrically connected to the housing. The first lead tab 35 and the second lead tab 34 may extend in opposite directions relative to each other.

[0075] The first electrode 33 can be a positive electrode. In this case, the first substrate can be made of, for example, aluminum foil or include, for example, aluminum foil, and the first active material layer can include, for example, a transition metal oxide. The second electrode 31 can be a negative electrode. In this case, the second substrate can be made of, for example, copper foil or nickel foil or include, for example, copper foil or nickel foil, and the second active material layer can include, for example, graphite.

[0076] The separator 32 can reduce or prevent short circuits between the first electrode 33 and the second electrode 31, while allowing lithium ions to move between them. The separator 32 can be made of or include at least one of, for example, a polyethylene membrane, a polypropylene membrane, a polyethylene-polypropylene membrane, etc.

[0077] The housing houses or contains the electrode assembly 30 and the electrolyte, and together with the cover assembly 50, substantially forms the appearance of a secondary battery. The housing may have a substantially cylindrical body portion 42 and a bottom 41 connected to one side of the body portion 42. An inwardly deformed rolled edge portion 43 may be formed in the body portion 42, and an inwardly bent crimp portion 45 may be formed at the open end of the body portion 42.

[0078] The rolled edge 43 can reduce or prevent movement of the electrode assembly 30 within the housing and facilitates the placement of the pad 44 and the cover assembly 50. The crimping portion 45 can securely fix the cover assembly 50 by pressing the edge of the cover assembly 50 against the pad 44. For example, the housing can be formed of or comprise nickel-plated iron.

[0079] The cover assembly 50 can be secured to the inside of the crimp portion 45 via the gasket 44 to seal the housing. The cover assembly 50 may include an upper cover, a safety vent, a lower cover, an insulating member, and a base plate, but is not limited to this example and can be modified in various ways.

[0080] The top cover may be located at the very top of the cover assembly 50. The top cover may include a terminal portion that protrudes upward and connects to an external circuit, and an outlet for venting gas may be located around the terminal portion.

[0081] The safety vent may be located below the top cover. The safety vent may include a protrusion that extends downward and connects to the bottom plate, and at least one recess located around the protrusion.

[0082] When gas is generated due to overcharging or abnormal operation of the secondary battery, the protrusion may deform upward under pressure and separate from the base plate while the safety vent is cut off along the notch. Cutting off the safety vent can prevent or deter a secondary battery explosion by releasing the gas to the outside.

[0083] The lower cover may be located below the safety vent. The lower cover may have a first opening for exposing the protrusion of the safety vent and a second opening for venting gas. An insulating member may be located between the safety vent and the lower cover to insulate the safety vent from the lower cover.

[0084] The base plate can be located below the lower cover. The base plate can be fixed to the lower surface of the lower cover to block the first opening of the lower cover, and the protrusion of the safety vent can be fixed to the base plate. The first lead connector 35 extending from the electrode assembly 30 can be fixed to the base plate. Therefore, the upper cover, safety vent, lower cover, and base plate can be electrically connected to the first electrode 33 of the electrode assembly 30.

[0085] The insulating plate 37 can be located below the rolled edge 43 to contact the electrode assembly 30, and can be provided with a tab opening for leading out the first lead tab 35. The cover assembly 50, which is electrically connected to the first electrode 33 via the first lead tab 35, can face the electrode assembly 30. The insulating plate 37 is located between the cover assembly 50 and the electrode assembly 30, and the cover assembly 50 can be kept insulated from the electrode assembly 30 by the insulating plate 37. Alternatively, another insulating plate 36 can be included for insulation between the electrode assembly 30 and the bottom 41 of the housing.

[0086] The background of this disclosure is described below to assist those skilled in the art in understanding it, and references are made to... Figures 5 to 12 Systems and methods for monitoring resistance welding according to embodiments of the present disclosure are described.

[0087] Traditional systems for monitoring resistance welding suffer from limitations in signal reception speed because they involve monitoring systems with custom-designed internal board-based hardware, and there are difficulties in ensuring measurement consistency and improving additional functionality. The problem with traditional techniques is that because they monitor the welding process based on limited measurement signal data, and because there are inconsistencies such as loss of measurement area, the measurement results must be corrected.

[0088] The problem with traditional techniques is that, because the reception speed of digital signals is partially limited as described herein, and because conversion value correction and reprocessing are required in the process of converting actual analog signals into digital signals, it is difficult to reconstruct actual analog signals. Furthermore, because all regions used to analyze two or more analog signals are synchronized, it is difficult to guarantee matching in the analysis and measurement of quantitative data.

[0089] Figure 5 and Figure 6 The problems of a system for monitoring resistance welding based on conventional techniques are illustrated.

[0090] When functional improvements are required, conventional systems for monitoring resistance welding necessitate PCB rotation and electronic redesign processes, as well as machine language-based software redesign, and verification of design changes and batch production rates. Furthermore, conventional technologies struggle to meet functional requirements such as removing calibration values, deleting ROIs (regions of interest), analyzing waveform data, and communicating with the welding machine due to the difficulty in modifying existing instrument hardware and software.

[0091] Reference Figure 5 Assuming the scaling factor for the welding current is 0.96 to 1.05, the offset is 100 amperes, the scaling factor for the transformer voltage is 0.87, and the scaling factor for the welding voltage is 0.98, the problem with conventional techniques is that measurement peaks and deviations occur, resulting in insufficient consistency due to forced synchronization between the correction value and the ROI, and only representative values ​​are obtained.

[0092] Reference Figure 6 In existing technologies, because point data is obtained as discrete data, there is a problem that waveform analysis cannot be performed.

[0093] Furthermore, traditional technologies ensure connectivity between facility control systems such as welding machines and PLCs, as well as between monitoring systems and facility control systems. In contrast, there is a problem with the inability to communicate with the welding machine.

[0094] Embodiments of this disclosure present a system and method for monitoring resistance welding based on data acquisition (DAQ), which receives electrical signals from sensors and a computer.

[0095] According to embodiments of this disclosure, a hardware architecture is applied, comprising a module that receives analog signals generated during welding as digital signals, and a computer mounted thereon with virtual circuitry for reconstructing the received digital signals. The digital signals are designed to have a reception rate with preset specifications (e.g., 5000 or more per second). The received digital signals are converted into quantitative data, such that the digital signals are represented digitally / visually by hardware.

[0096] The converted data is then reprocessed into digital / visual data and measured and monitored according to algorithms installed in virtual circuits and computer hardware. Monitoring is performed on resistance welding.

[0097] According to embodiments of this disclosure, because analog signals are reconstructed without being limited by the receiving speed of digital signals, correction and reprocessing are not necessary when digital signals are converted. Independent analysis regions for two or more analog signals can be constructed. Virtual circuitry installed on the monitoring system can be implemented solely through program and software when improvements to the monitoring system are needed, or it can be easily implemented by adding modules with hardware-compatible additional functions. According to conventional techniques, a complete overhaul may be necessary to ensure hardware-software compatibility. According to embodiments of this disclosure, the reliability of the monitoring system itself can be ensured, and technological advancements do not impose limitations on the implementation of additional functions.

[0098] Figure 7 The process of a method for monitoring resistance welding according to an embodiment of the present disclosure is shown.

[0099] According to traditional techniques, sensor noise is included, data communication with the welding machine is impossible, different calibration values ​​and reverse matching of ROI are applied for each welding machine, the original point is damaged, specification enhancement is impossible, and problems related to resistance welding continue to occur.

[0100] In contrast, according to embodiments of this disclosure, since the waveform data is constructed by high-speed sampling of data obtained by converting data (i.e., analog data) measured during the resistance welding process of the negative terminal of the circular battery cell for secondary batteries into digital signals, the consistency of the measurement data can be guaranteed and the reliability of monitoring can be improved.

[0101] The method for monitoring resistance welding according to embodiments of the present disclosure may include steps S710 of converting signals and removing sensor noise, step S720 of measuring waveform data of the welding machine, step S730 of performing analysis settings and automatic waveform analysis, step S740 of extracting feature values ​​of each waveform, step S750 of performing welding machine data communication and setting specifications, and step S760 of performing enhancement based on waveform specifications.

[0102] In step S710, the welding process and monitoring can begin. Sensor noise can be removed during the conversion of the acquired analog signal into a digital signal.

[0103] In step S720, hardware and software optimizations can be performed through high-speed sampling. The sampling rate can be a preset frequency (e.g., 50 kHz), and waveform data from the welding machine can be measured.

[0104] In step S730, analysis settings including the analysis area and analysis time can be executed.

[0105] In step S740, feature values ​​for each waveform can be extracted using the continuous automatic analysis results of the waveform, with respect to at least one of the maximum, minimum, mean, standard deviation, and waveform trend.

[0106] In step S750, welding machine data communication and specifications can be set, and monitoring system enhancements can be implemented.

[0107] In step S760, additional functional modules that match user requirements can be designed based on the enhanced results of the specifications based on waveform analysis via bidirectional communication.

[0108] According to embodiments of this disclosure, when a functional improvement is required, specific functional modules (or additional functional modules) can be added, and graphics-based software sectors can be added. Therefore, the advantage is that because no design change points occur, problems related to redesign based on conventional technologies are avoided.

[0109] According to embodiments of this disclosure, by introducing DAQ-based hardware and software using graphics-based programming tools, the technical requirements for standard measurement, modular measurement, flexible response software, and additional functions (add-ons) can be met.

[0110] Figures 8 to 10 Improvements to embodiments according to this disclosure are shown.

[0111] Reference Figure 8 Assuming the welding current scaling factor is 0.96 to 1.05, the offset is 100 amperes, the transformer voltage scaling factor is 0.87, and the welding voltage scaling factor is 0.98, the actual peak value can be analyzed in the current waveform. Analysis regions for the voltage waveform can be constructed separately. Because the synchronization process of correction values ​​and ROI is eliminated, consistency and reliability of the monitored values ​​can be ensured.

[0112] Reference Figure 9 and Figure 10 It has the following effects: it can analyze the maximum value, minimum value, rise time, fall time, mean, standard deviation and waveform trend through the analysis area design, and can easily detect changes.

[0113] According to embodiments of this disclosure, bidirectional communication is possible between a facility control system such as a welding machine and a PLC, between the welding machine and a system for monitoring resistance welding, and between the facility control system and the system for monitoring resistance welding. New determination criteria can be presented using maximum current value, current variation trend, current rise time, current fall time, voltage waveform trend, voltage waveform variation, current standard deviation, voltage mean, and current mean, rather than relying on a determination criterion based on the maximum current value.

[0114] Figure 11 and Figure 12 An example of a system for monitoring resistance welding according to embodiments of the present disclosure is shown.

[0115] The system 300 for monitoring resistance welding can input welding conditions according to the system on the welding machine 100.

[0116] The welding voltage, transformer voltage, and applied voltage can be monitored using the system 300 for monitoring resistance welding. The welding current can be obtained using the current sensor 200, and the corresponding data can be transmitted to the system 300 for monitoring resistance welding.

[0117] The system for monitoring resistance welding according to embodiments of this disclosure can receive commands from a worker terminal 400. The welding machine setting unit 310 and the monitoring unit 320 can be driven by a program installed in the system 300 for monitoring resistance welding. No visual correction or inspection by a manager is required. The monitoring results can be transmitted to the mass production unit 500.

[0118] Figure 13 Specifications and processes for a system for monitoring resistance welding according to embodiments of the present disclosure are shown.

[0119] It can check the welding machine settings, perform welding tests, and perform the process of checking the measured values ​​(S1310).

[0120] The input voltage can be changed based on the inspection results of the measured values, the welding test can be performed again, and the process of re-checking the measured values ​​can be performed again (S1320).

[0121] The settings for the analysis area and analysis time can be executed and completed according to the above process (S1330).

[0122] Figure 14 This is a block diagram illustrating a computer system for implementing a method according to an embodiment of the present disclosure.

[0123] Reference Figure 14The computer system 1300 may include at least one of a processor 1310, a memory 1330, an input interface device 1350, an output interface device 1360, and a storage device 1340, which communicate with each other via a bus 1370. The computer system 1300 may also include a communication device 1320 connected to a network. The processor 1310 may be or include a central processing unit (CPU) or semiconductor device that executes instructions stored in the memory 1330 or the storage device 1340. The memory 1330 and the storage device 1340 may include various types of volatile or non-volatile storage media. For example, the memory may include read-only memory (ROM) and random access memory (RAM). In exemplary embodiments of this disclosure, the memory may be located internally or externally to the processor and may be connected to the processor by various known means. The memory is or includes various types of volatile or non-volatile storage media, and may include, for example, read-only memory (ROM) or random access memory (RAM).

[0124] Therefore, the exemplary embodiments of this disclosure can be implemented as methods in a computer or a non-transitory computer-readable medium storing computer-executable instructions. In embodiments, when executed by a processor, the computer-readable instructions can perform a method according to at least one aspect of this disclosure.

[0125] The communication device 1320 can send or receive wired or wireless signals.

[0126] Furthermore, the methods according to embodiments of this disclosure can be implemented in the form of program instructions that can be executed by various computer devices and recorded on a computer-readable medium.

[0127] Computer-readable media may include program instructions, data files, data structures, etc., individually or in combination. Program instructions recorded on a computer-readable medium may be specifically designed and configured for the exemplary embodiments of this disclosure, or may be known and available to those skilled in the art of computer software. A computer-readable recording medium may include hardware devices configured to store and execute program instructions. For example, a computer-readable recording medium may be or include magnetic media such as hard disks, floppy disks, and magnetic tapes; optical media such as CD-ROMs and DVDs; and magneto-optical media such as optical-floppy disks, ROMs, RAMs, flash memory, etc. Program instructions may include not only machine language code generated by a compiler, but also high-level language code that can be executed by a computer through an interpreter, etc.

[0128] A system for monitoring resistance welding according to embodiments of the present disclosure may include an input interface device 1350 for receiving welding condition setting information and measurement values, a memory 1330 containing a program for monitoring resistance welding, and a processor 1310 for executing the program. The processor 1310 may receive measurement values, i.e., the execution results of test welding based on the welding condition setting information, and may perform analysis settings.

[0129] The input interface device 1350 can receive digital signals at a rate exceeding a predetermined number of times per second. The processor 1310 can digitally and visually represent digital signals by converting them into quantitative data.

[0130] The processor 1310 can perform waveform characteristic analysis by omitting the correction of the converted data and the synchronization process used to analyze the analog signal.

[0131] The processor 1310 can measure the waveform data of the welding machine based on a preset sampling rate and can perform analysis on the measured waveform data of the welding machine.

[0132] The processor 1310 can perform analysis settings on waveform characteristics, including the analysis area and analysis time.

[0133] Processor 1310 can extract waveform characteristics including at least one of maximum value, minimum value, mean, standard deviation and waveform trend.

[0134] In the following sections, any materials that may be used in secondary batteries according to examples of this disclosure will be described.

[0135] As the positive electrode active material, compounds capable of reversibly inserting / deintercalating lithium (e.g., lithiated intercalation compounds) can be used. For example, at least one of the composite oxides of lithium and at least one of the metals such as cobalt, manganese, nickel, and combinations thereof can be used.

[0136] The composite oxide can be or includes lithium transition metal composite oxides, and examples of such composite oxides can include at least one of lithium nickel oxides, lithium cobalt oxides, lithium manganese oxides, lithium iron phosphate compounds, cobalt-free lithium nickel manganese oxides, and combinations thereof.

[0137] As an example, a compound represented by at least one of the following formulas can be used: Li a A 1-b X b O 2-c D c (0.90≤a≤1.8, 0≤b≤0.5, 0≤c≤0.05); Li a Mn 2-b X b O 4-c Dc (0.90≤a≤1.8, 0≤b≤0.5, 0≤c≤0.05); Li a Ni 1-b-c Co b X c O 2-α D α (0.90≤a≤1.8, 0≤b≤0.5, 0≤c≤0.5, 0<α<2); Li a Ni 1-b-c Mn b X c O 2-α D α (0.90≤a≤1.8, 0≤b≤0.5, 0≤c≤0.5, 0<α<2); Li a Ni b Co c L 1 d G e O2 (0.90≤a≤1.8, 0≤b≤0.9, 0≤c≤0.5, 0≤d≤0.5, 0≤e≤0.1); Li a NiG b O2 (0.90≤a≤1.8, 0.001≤b≤0.1); Li a CoG b O2 (0.90≤a≤1.8, 0.001≤b≤0.1); Li a Mn 1-b G b O2 (0.90≤a≤1.8, 0.001≤b≤0.1); Li a Mn2G b O4 (0.90≤a≤1.8, 0.001≤b≤0.1); Li a Mn 1-g G g PO4 (0.90≤a≤1.8, 0≤g≤0.5); Li (3-f) Fe2(PO4)3 (0≤f≤2); and Li a FePO4 (0.90≤a≤1.8).

[0138] In the above formula: A is or includes at least Ni, Co, Mn or a combination thereof; X is or includes at least Al, Ni, Co, Mn, Cr, Fe, Mg, Sr, V, rare earth elements or a combination thereof; D is or includes at least O, F, S, P or a combination thereof; G is or includes at least Al, Cr, Mn, Fe, Mg, La, Ce, Sr, V or a combination thereof; and L 1 It includes at least Mn, Al, or combinations thereof.

[0139] The positive electrode for a lithium secondary battery may include a current collector and a positive electrode active material layer formed on the current collector. The positive electrode active material layer may include a positive electrode active material, and may further include a binder and / or a conductive material.

[0140] Based on 100 wt% of the positive electrode active material layer, the content of the positive electrode active material is in the range of about 90 wt% to about 99.5 wt%, and based on 100 wt% of the positive electrode active material layer, the contents of the binder and the conductive material are respectively in the range of about 0.5 wt% to about 5 wt%.

[0141] The current collector may be or include aluminum (Al), but is not limited thereto.

[0142] The negative electrode active material may include at least one of a material capable of reversibly intercalating / deintercalating lithium ions, lithium metal, an alloy of lithium metal, a material capable of doping and dedoping lithium, and a transition metal oxide.

[0143] The material capable of reversibly intercalating / deintercalating lithium ions may be or include a carbon-based negative electrode active material, which may at least include, for example, crystalline carbon, amorphous carbon, or a combination thereof. Examples of crystalline carbon may include graphite, such as natural graphite or artificial graphite, and examples of amorphous carbon may at least include at least one of soft carbon, hard carbon, pitch carbide, mesophase pitch carbide, sintered coke, etc.

[0144] A Si-based negative electrode active material or a Sn-based negative electrode active material may be used as a material capable of doping and dedoping lithium. The Si-based negative electrode active material may at least be or include silicon, a silicon-carbon composite, SiO x (0 < x ≤ 2), a Si-based alloy, or a combination thereof.

[0145] The silicon-carbon composite may be or include a composite of silicon and amorphous carbon. According to an exemplary embodiment, the silicon-carbon composite may be in the form of silicon particles and amorphous carbon coated on the surface of the silicon particles.

[0146] The silicon-carbon composite may further include crystalline carbon. For example, the silicon-carbon composite may include a core and an amorphous carbon coating on the surface of the core, and the core includes crystalline carbon and silicon particles.

[0147] The negative electrode for a lithium secondary battery may include a current collector and a negative electrode active material layer provided on the current collector. The negative electrode active material layer may include a negative electrode active material, and may further include a binder and / or a conductive material.

[0148] For example, the negative electrode active material layer may include about 90 wt% to about 99 wt% of the negative electrode active material, about 0.5 wt% to about 5 wt% of the binder, and about 0 wt% to about 5 wt% of the conductive material.

[0149] Non-aqueous adhesives, aqueous adhesives, dry adhesives, or combinations thereof can be used as adhesives. When using aqueous adhesives as negative electrode adhesives, cellulose compounds capable of imparting viscosity may also be included.

[0150] As the negative electrode current collector, at least one of copper foil, nickel foil, stainless steel foil, titanium foil, nickel foam, copper foam, a polymer substrate coated with conductive metal, and combinations thereof can be used.

[0151] Electrolytes used in lithium secondary batteries may include non-aqueous organic solvents and lithium salts.

[0152] Non-aqueous organic solvents can serve as a medium through which ions participating in the electrochemical reactions of a battery can move.

[0153] Non-aqueous organic solvents may be or at least include carbonate solvents, ester solvents, ether solvents, ketone solvents, alcohol solvents, and aprotic solvents, and these may be used alone or in combination of two or more.

[0154] Depending on the type of lithium secondary battery, a separator may be present between the first electrode plate (e.g., the negative electrode) and the second electrode plate (e.g., the positive electrode). As the separator, at least polyethylene, polypropylene, polyvinylidene fluoride, or multilayer films of two or more layers thereof can be used.

[0155] The membrane may include a porous substrate and a coating layer on one or both surfaces of the porous substrate, the coating layer comprising an organic material, an inorganic material, or a combination thereof.

[0156] Organic materials may include polyvinylidene fluoride polymers or (meth)acrylic acid polymers.

[0157] Inorganic materials may include, but are not limited to, inorganic particles such as at least one of Al2O3, SiO2, TiO2, SnO2, CeO2, MgO, NiO, CaO, GaO, ZnO, ZrO2, Y2O3, SrTiO3, BaTiO3, Mg(OH)2, boehmite, and combinations thereof.

[0158] Organic and inorganic materials can be mixed in a single coating layer or can be layered together with coating layers containing organic materials and coating layers containing inorganic materials.

[0159] Figure 15This is an illustration of a secondary battery module in which secondary batteries manufactured according to an example of this disclosure are arranged. As the capacity of secondary batteries used to power electric vehicles and the like increases, secondary battery modules can be manufactured by arranging and connecting multiple secondary battery cells laterally and / or longitudinally. Multiple secondary batteries can be arranged in a space defined by a pair of facing end plates 68a and 68b and a pair of facing side plates 69a and 69b. The secondary batteries can be appropriately designed in terms of arrangement (orientation) and quantity to obtain desired voltage and current specifications.

[0160] Figure 16 This is a schematic illustration of the construction of a battery pack 70 according to an exemplary embodiment of the present disclosure. (Refer to...) Figure 16 The battery pack 70 may include components to which each battery is electrically connected, and a battery pack housing that houses the components. In the accompanying drawings, for ease of illustration, components including busbars, cooling units, external terminals for electrically connecting the batteries, etc., are not shown.

[0161] The battery pack 70 can be installed on (or inside) a vehicle. The vehicle can be, for example, an electric vehicle, a hybrid vehicle, a plug-in hybrid vehicle, etc. The vehicle can be a four-wheeled vehicle or a two-wheeled vehicle, but is not limited to these. Figure 17 Vehicle V is shown, which includes on its lower body Figure 16 The battery pack 70 is shown. The vehicle V can operate by receiving power from the battery pack 70 (e.g., it can be powered by receiving power from the battery pack 70).

[0162] Although this disclosure has been described herein with reference to exemplary embodiments shown, it is not limited thereto. Various modifications and variations can be made by those skilled in the art within the spirit of this disclosure and the equivalents of the appended claims.

Claims

1. A method for monitoring resistance welding, the method being performed by a system for monitoring resistance welding, the method comprising the following steps: (a) Converting signals obtained during the resistance welding process; (b) Measure the waveform data of the welding machine; (c) Perform analysis settings and automatic waveform data analysis; (d) Extract the feature values ​​of each waveform based on the results of the waveform data analysis; (e) Specifications are set by performing data communication with the welding machine; as well as (f) Execute enhancements to the specification based on the waveform data analysis.

2. The method as described in claim 1, wherein, Step (a) includes removing sensor noise during the process of converting the obtained analog signal into a digital signal.

3. The method as described in claim 1, wherein, Step (b) includes: measuring the waveform data of the welding machine according to a preset sampling rate.

4. The method of claim 1, wherein, Step (c) includes: performing analysis settings including the analysis area and analysis time.

5. The method of claim 1, wherein, Step (d) includes: extracting the feature value of each waveform, including at least one of the maximum value, minimum value, mean value, standard deviation and waveform trend, as a continuous result of the waveform data analysis of the welding machine.

6. The method of claim 1, wherein, Step (e) includes: setting the specifications related to the enhancement of the monitoring system by performing bidirectional communication with the welding machine, and performing bidirectional communication with the facility control system using the welding machine.

7. The method of claim 1, wherein, Step (f) includes: designing additional functional modules that match user needs based on the enhanced results of the specifications based on the waveform data analysis.

8. A system for monitoring resistance welding, comprising: The input interface device is configured to receive welding condition setting information and measurement values; The memory contains the program for monitoring the resistance welding process; as well as The processor is configured to execute the program. The processor receives the measured values ​​and performs analysis settings, the measured values ​​including the results of performing test welding based on the welding condition setting information.

9. The system of claim 8, wherein: The input interface device receives digital signals at a rate exceeding a predetermined number per second, and The processor digitally and visually represents the digital signal by converting it into quantitative data.

10. The system of claim 8, wherein, The processor performs waveform characteristic analysis by omitting the correction of converted data and the synchronous processing used for analyzing analog signals.

11. The system of claim 10, wherein, The processor measures the waveform data of the welding machine based on a preset sampling rate and analyzes the waveform data.

12. The system of claim 10, wherein, The processor performs analysis settings on the waveform characteristics, including the analysis region and analysis time.

13. The system of claim 10, wherein, The processor extracts the waveform characteristics including at least one of the following: maximum value, minimum value, mean, standard deviation, and waveform trend.

Citation Information

Patent Citations

  • Methods, architectures, devices, and systems for measuring and reporting channel state information in wireless communications.

    KR1020240166572A