A method for preparing a highly ductile DLC film

Abstract

This invention discloses a method for preparing a highly ductile DLC film, comprising: preparing a raw DLC film; depositing metal nanoparticles on the surface of the raw DLC film; and forming a surface-protruding nanostructure on the metal nanoparticles using an electrochemical degradation method to obtain a highly ductile DLC film. By forming a surface nanostructure on the surface of the DLC film, the technical solution of this invention can effectively improve the ductility of the DLC film surface, thereby improving its failure problem under high load and high strain rate conditions, greatly enhancing its application effect and service life, without affecting the performance and cost of the DLC film.

Description

Technical Field

[0001] This invention relates to the field of thin film preparation technology, and in particular to a method for preparing a highly ductile DLC film. Background Technology

[0002] With the rapid development of technology, DLC (Diamond-like Carbon) films are widely used in various fields such as lubrication, wear prevention, corrosion prevention, and biomedicine. However, due to the inherent brittleness and lack of ductility of DLC films, they are prone to cracking and peeling under high load and high strain rate conditions, thereby reducing their application effectiveness and service life.

[0003] To reduce the cracking and peeling of DLC films, many research efforts typically follow strategies such as doping, alloying, and multilayer thin film structures. However, these strategies require increasing the thickness of the DLC film, changing its chemical composition, or increasing the complexity of the preparation process, thereby affecting the performance and cost of the DLC film. Summary of the Invention

[0004] The purpose of this invention is to provide a method for preparing a highly ductile DLC film. By forming a surface nanostructure on the surface of the DLC film, the ductility of the DLC film surface can be effectively improved, thereby improving its failure problem under high load and high strain rate conditions, greatly improving its application effect and service life, and without affecting the performance and cost of the DLC film.

[0005] To achieve the above objectives, embodiments of the present invention provide a method for preparing a highly ductile DLC film, comprising:

[0006] Preparation of original DLC membranes;

[0007] Metal nanoparticles are deposited on the surface of the original DLC film;

[0008] A highly ductile DLC film was obtained by forming a surface-protruding nanostructure on the metal nanoparticles using an electrochemical degradation method.

[0009] Furthermore, the preparation of the original DLC membrane specifically involves:

[0010] A mixed gas was introduced into a vacuum environment, and the original DLC film was prepared by plasma-assisted chemical vapor deposition.

[0011] Furthermore, the mixed gas includes CF4 and C2H2.

[0012] Furthermore, the thickness of the original DLC film is 75–80 nm.

[0013] Furthermore, the diameter of the metal nanoparticles is 6–10 nm.

[0014] Furthermore, the diameter of the metal nanoparticles is 8 nm.

[0015] Furthermore, the process parameters of the electrochemical degradation method include: an electrode potential of -0.25 to 0.25 V.

[0016] Furthermore, the process parameters of the electrochemical degradation method also include: a time of 5 to 30 minutes.

[0017] Furthermore, the process parameters of the electrochemical degradation method also include: a time of 15 minutes.

[0018] Compared with existing technologies, this invention provides a method for preparing a highly ductile DLC film. First, a raw DLC film is prepared; then, metal nanoparticles are deposited on the surface of the raw DLC film; finally, an electrochemical degradation method is used to form a surface-protruding nanostructure on the metal nanoparticles, thereby obtaining a highly ductile DLC film. This invention, by forming a surface nanostructure on the surface of the DLC film, effectively improves the ductility of the DLC film surface, thereby mitigating its failure under high load and high strain rate conditions, significantly improving its application effect and service life, without affecting the performance and cost of the DLC film. Attached Figure Description

[0019] Figure 1 This is a flowchart of a preferred embodiment of a method for preparing a highly ductile DLC film provided by the present invention. Detailed Implementation

[0020] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0021] This invention provides a method for preparing a highly ductile DLC film, see [link to relevant documentation]. Figure 1 The diagram shown is a flowchart of a preferred embodiment of a method for preparing a highly ductile DLC film provided by the present invention, the method comprising steps S11 to S13:

[0022] Step S11: Prepare the original DLC membrane;

[0023] Step S12: Deposit metal nanoparticles on the surface of the original DLC film;

[0024] Step S13: Using an electrochemical degradation method, a nanostructure with surface protrusions is formed on the metal nanoparticles to obtain a highly ductile DLC film.

[0025] In practice, firstly, a raw DLC film is prepared; then, metal nanoparticles are evaporated and deposited on the surface of the raw DLC film; finally, an electrochemical degradation method is used to form a nanostructure with a large number of surface protrusions on the metal nanoparticles, thereby obtaining a highly ductile DLC film.

[0026] It should be noted that the original DLC film itself has natural crystalline texture. By designing and forming nanostructures on its surface, its surface extensibility has been significantly improved. After repeated bending tests, its surface remains intact and does not exhibit failure phenomena such as cracks or peeling. Furthermore, its surface can also exhibit good extensibility under high strain rate conditions, which greatly improves its application effect and service life.

[0027] In one optional embodiment, the preparation of the original DLC film specifically involves:

[0028] A mixed gas was introduced into a vacuum environment, and the original DLC film was prepared by plasma-assisted chemical vapor deposition.

[0029] Specifically, in conjunction with the above embodiments, in preparing the original DLC film, the present invention can introduce a mixed gas into a vacuum environment and use plasma-assisted chemical vapor deposition to prepare the original DLC film.

[0030] In one alternative embodiment, the mixed gas comprises CF4 and C2H2.

[0031] Specifically, in conjunction with the above embodiments, the mixed gas used in the preparation of the original DLC film in this embodiment of the invention includes CF4 and C2H2. That is, in a vacuum environment, a mixed gas of CF4 and C2H2 is introduced into the vacuum environment, and the original DLC film is prepared by plasma-assisted chemical vapor deposition.

[0032] In one alternative embodiment, the thickness of the original DLC film is 75–80 nm.

[0033] Specifically, in conjunction with the above embodiments, the original DLC film prepared by introducing a mixed gas of CF4 and C2H2 into a vacuum environment and using plasma-assisted chemical vapor deposition has a thickness of 75nm to 80nm.

[0034] For example, the thickness of the original DLC film can be 75nm, 76nm, 77nm, 78nm, 79nm or 80nm, and can also be set according to actual needs. This embodiment of the invention does not make specific limitations.

[0035] In one alternative embodiment, the diameter of the metal nanoparticles is 6 to 10 nm.

[0036] In one alternative embodiment, the metal nanoparticles have a diameter of 8 nm.

[0037] Specifically, in conjunction with the above embodiments, the diameter of the metal nanoparticles evaporated and deposited on the surface of the original DLC film in this embodiment of the invention can be selected in the range of 6nm to 10nm, preferably around 8nm.

[0038] For example, the diameter of the metal nanoparticles can be 6nm, 7nm, 8nm, 9nm or 10nm, and can also be set according to actual needs. This embodiment of the invention does not make specific limitations.

[0039] In one optional embodiment, the process parameters of the electrochemical degradation method include an electrode potential of -0.25 to 0.25 V.

[0040] Specifically, in conjunction with the above embodiments, when forming a nanostructure with surface protrusions on metal nanoparticles using an electrochemical degradation method, the electrode potential can be selected within the range of -0.25V to 0.25V.

[0041] For example, the electrode potential can be -0.25V, -0.20V, -0.15V, -0.10V, -0.05V, 0V, 0.05V, 0.10V, 0.15V, 0.20V or 0.25V, or can be set according to actual needs. This embodiment of the invention does not impose specific limitations.

[0042] In one optional embodiment, the process parameters of the electrochemical degradation method further include a time of 5 to 30 minutes.

[0043] In one optional embodiment, the process parameters of the electrochemical degradation method further include a time of 15 minutes.

[0044] Specifically, in conjunction with the above embodiments, when forming surface protrusion nanostructures on metal nanoparticles using the electrochemical degradation method, the processing time can be selected within the range of 5 min to 30 min, preferably 15 min.

[0045] For example, the time for the electrochemical degradation method can be 5 minutes, 6 minutes, 7 minutes, 8 minutes, 9 minutes, 10 minutes, 11 minutes, 12 minutes, 13 minutes, 14 minutes, 15 minutes, 16 minutes, 17 minutes, 18 minutes, 19 minutes, 20 minutes, 21 minutes, 22 minutes, 23 minutes, 24 minutes, 25 minutes, 26 minutes, 27 minutes, 28 minutes, 29 minutes, or 30 minutes, and can also be set according to actual needs. This embodiment of the invention does not impose specific limitations.

[0046] Based on all the above embodiments, the implementation process of this solution is described below through the first specific embodiment, including: (1) In a vacuum environment, a mixed gas of CF4 and C2H2 is introduced into the vacuum environment, and a raw DLC film with a thickness of 75nm is prepared by plasma-assisted chemical vapor deposition; (2) Metal nanoparticles are evaporated and deposited on the surface of the raw DLC film, and the diameter of the metal nanoparticles is 6nm; (3) Using an electrochemical degradation method, under the process parameters of electrode potential of -0.25V and time of 5min, a nanostructure with a large number of surface protrusions is formed on the metal nanoparticles, and a highly ductile DLC film is obtained accordingly.

[0047] Based on all the above embodiments, the implementation process of this solution is described below through a second specific embodiment, including: (1) In a vacuum environment, a mixed gas of CF4 and C2H2 is introduced into the vacuum environment, and a raw DLC film with a thickness of 78nm is prepared by plasma-assisted chemical vapor deposition; (2) Metal nanoparticles are evaporated and deposited on the surface of the raw DLC film, and the diameter of the metal nanoparticles is 8nm; (3) Using an electrochemical degradation method, under the process parameters of electrode potential of 0.05V and time of 15min, a nanostructure with a large number of surface protrusions is formed on the metal nanoparticles, and a highly ductile DLC film is obtained accordingly.

[0048] Based on all the above embodiments, the implementation process of this solution is described below through a third specific embodiment, including: (1) In a vacuum environment, a mixed gas of CF4 and C2H2 is introduced into the vacuum environment, and a raw DLC film with a thickness of 80nm is prepared by plasma-assisted chemical vapor deposition; (2) Metal nanoparticles with a diameter of 10nm are evaporated and deposited on the surface of the raw DLC film; (3) Using an electrochemical degradation method, under the process parameters of electrode potential of 0.25V and time of 30min, a nanostructure with a large number of surface protrusions is formed on the metal nanoparticles, and a highly ductile DLC film is obtained accordingly.

[0049] In summary, the method for preparing a highly ductile DLC film provided by this invention involves: first, preparing a raw DLC film; then, depositing metal nanoparticles on the surface of the raw DLC film; and finally, forming a surface-protruding nanostructure on the metal nanoparticles using an electrochemical degradation method to obtain a highly ductile DLC film. This invention effectively improves the ductility of the DLC film surface by forming a surface nanostructure, thereby mitigating its failure under high load and high strain rate conditions, significantly improving its application performance and service life, without affecting the performance or cost of the DLC film.

[0050] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A method for preparing a highly ductile DLC film, characterized in that, include: Preparation of original DLC membranes; Metal nanoparticles are deposited on the surface of the original DLC film; A highly ductile DLC film was obtained by forming a surface-protruding nanostructure on the metal nanoparticles using an electrochemical degradation method.

2. The method for preparing a highly ductile DLC film as described in claim 1, characterized in that, The preparation of the original DLC film specifically involves: A mixed gas was introduced into a vacuum environment, and the original DLC film was prepared by plasma-assisted chemical vapor deposition.

3. The method for preparing a highly ductile DLC film as described in claim 2, characterized in that, The mixed gas includes CF4 and C2H2.

4. The method for preparing a highly ductile DLC film as described in claim 1, characterized in that, The original DLC film has a thickness of 75–80 nm.

5. The method for preparing a highly ductile DLC film as described in claim 1, characterized in that, The diameter of the metal nanoparticles is 6–10 nm.

6. The method for preparing a highly ductile DLC film as described in claim 5, characterized in that, The diameter of the metal nanoparticles is 8 nm.

7. The method for preparing a highly ductile DLC film as described in claim 1, characterized in that, The process parameters for the electrochemical degradation method include: an electrode potential of -0.25 to 0.25 V.

8. The method for preparing a highly ductile DLC film as described in claim 7, characterized in that, The process parameters for the electrochemical degradation method also include a time of 5 to 30 minutes.

9. The method for preparing a highly ductile DLC film as described in claim 8, characterized in that, The process parameters for the electrochemical degradation method also include: a time of 15 minutes.

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