A method for fabricating a growth substrate, the growth substrate, and a mass transfer method.
By etching grooves on the second surface of the growth substrate, the chip damage caused by nitrogen release during mass transfer was solved, the product yield was improved, and a highly efficient mass transfer method was realized.
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHONGQING KONKA PHOTOELECTRIC TECH RES INST CO LTD
- Filing Date
- 2024-11-26
- Publication Date
- 2026-05-26
AI Technical Summary
During the mass transfer process, the amount of nitrogen released from the Micro LED chip increases, which causes the film layer to be damaged by nitrogen impact during the laser peeling process of the AR chip, affecting the product yield.
Multiple grooves of predetermined depth are etched on the second surface of the growth substrate. The groove depth is less than or equal to the substrate thickness and the lateral dimension is less than the chip size. Nitrogen gas escapes from the grooves during laser stripping to avoid damaging the chip.
It effectively releases nitrogen gas generated during laser stripping, improves product yield, and avoids damage to the chip epitaxial layer and the impact on bonding effect.
Smart Images

Figure CN122094271A_ABST