Purification method of pgmea and pgmea product

By combining heavy removal, light removal, and further heavy removal purification methods with toluene solvent and molecular sieve pretreatment, the problem of acid value and β-PGMEA control in existing PGMEA purification has been solved, realizing high-purity, low-moisture PGMEA products that meet the needs of high-end semiconductors, simplifying the process and reducing costs.

CN122102908APending Publication Date: 2026-05-29CHINA PETROLEUM & CHEMICAL CORP +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHINA PETROLEUM & CHEMICAL CORP
Filing Date
2024-11-28
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

Existing PGMEA purification methods cannot effectively control acid value and the content of the isomer β-PGMEA, resulting in product purity and moisture content failing to meet the requirements of high-end semiconductor products. The process is cumbersome and requires high investment.

Method used

The purification method employs heavy removal, light removal, and further heavy removal, using toluene as a solvent, and involves multiple separations through a distillation column. The reflux ratio and operating pressure are controlled, the moisture content is strictly controlled, and molecular sieves are used for pretreatment.

Benefits of technology

It achieves high purity (≥99.99wt%), low moisture (≤50ppm) and low β-PGMEA content (≤20ppm) in PGMEA products, meeting the solvent requirements of high-end semiconductor products, simplifying the process and saving investment.

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Abstract

The present application relates to the field of purification of chemicals, in particular to a PGMEA purification method and PGMEA product, and discloses a PGMEA purification method and PGMEA product. Crude PGMEA is purified, and the purification method comprises sequentially performing heavy component removal, light component removal and heavy component removal again. The content of beta-PGMEA in the PGMEA product is less than or equal to 20 ppm. The purification method has the characteristics of high purity of the PGMEA product, low acid value and low content of beta-PGMEA, and meets the demand of high-end products.
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