Ellipsometry depolarization error correction method, system, device and storage medium

By pre-calibrating the ellipsometric measurement data and modeling the optical model, calculating the effective ellipsometric Mueller matrix, and iteratively correcting the error, the problem of de-biasing error in ellipsometric measurement was solved, achieving high-precision and efficient measurement results.

CN122108966APending Publication Date: 2026-05-29PRESYS (SUZHOU) INTELLIGENT TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-02-11
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

Existing ellipsometry measurement techniques suffer from systematic depolarization errors under non-zero numerical aperture beams, resulting in inaccurate measurement results that cannot meet the high-precision and rapid metrology requirements of semiconductor manufacturing.

Method used

By acquiring raw measurement data for pre-calibration, establishing an optical model, calculating the effective ellipsometry Mueller matrix, and using iterative correction methods to reduce de-biasing errors, measurement accuracy and efficiency are improved.

Benefits of technology

It effectively eliminates depolarization error in ellipsometric measurement, improves the accuracy and repeatability of micro-area thin film thickness and optical constant measurement, and meets the rapid metrology requirements of semiconductor chips and micro/nano devices.

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Abstract

The application discloses an ellipsometry depolarization error correction method, system, device and storage medium, and the method comprises the following steps: obtaining original measurement data obtained by an ellipsometer in measuring a sample to be measured; pre-correcting the original measurement data to obtain pre-corrected data; modeling the pre-corrected data to obtain an optical model corresponding to the sample to be measured; selecting an incident light ray in the optical model, and calculating an effective ellipsometric Mueller matrix representing the NA depolarization effect in the sample to be measured based on the selected incident light ray and the system NA value of the ellipsometer; and iteratively correcting the pre-corrected data by using the effective ellipsometric Mueller matrix to obtain target correction data of the sample to be measured. The application can establish an analytical model of the effective Mueller matrix caused by the NA effect by using only one light ray in the optical model, can effectively eliminate the depolarization effect caused by the focusing of the light beam in the micro-light spot mode of the ellipsometry, and can greatly reduce the calculation amount and significantly improve the correction efficiency.
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