A metallographic examination feature organization position positioning device and method

Abstract

The application provides a metallographic examination characteristic tissue position positioning device and method, and relates to the technical field of assay detection. The device comprises a carrier platform, a first photoelectric sensor, a second photoelectric sensor and a data recorder. The device and method for positioning the position of the characteristic tissue can be used without damaging the examination surface of the metallographic sample, and can facilitate the repeated observation, analysis and research of the characteristic position by the examination personnel, thereby saving the time for observation, analysis and research of the examination personnel.

Description

Technical Field

[0001] This invention relates to the technical field of laboratory testing, and more particularly to a device and method for locating the position of characteristic tissues in metallographic testing. Background Technology

[0002] Metallographic examination, also known as microstructural examination of metallic materials, is an experimental technique that observes, analyzes, and studies the internal structure of metals and alloys under a microscope. It serves as a crucial bridge connecting the four key elements of a material: composition, processing, microstructure, and properties. Although originating in the 19th century, through continuous integration with modern technology, it remains an indispensable fundamental analytical method and quality assurance tool in fields such as materials science, mechanical manufacturing, metallurgy, and aerospace. Its core value lies in allowing us to "see" the microscopic world of materials, thereby understanding and controlling their macroscopic behavior.

[0003] The metallographic specimen inspection surface is a flat, smooth, scratch-free, and plastically deformed mirror surface. It may contain one or more representative feature structures essential for studying their nature. However, inspectors cannot mark these feature structures because they cannot damage the inspection surface. This requires inspectors to spend a significant amount of time repeatedly searching for them. Therefore, it is necessary to develop a device that can locate and mark feature structures without damaging the inspection surface, thus saving inspectors time in observation, analysis, and research. Summary of the Invention

[0004] In response to the technical problems mentioned in the background section, this invention provides a device and method for locating the position of characteristic microstructures in metallographic examination. This invention provides a device and method for locating the position of characteristic microstructures without damaging the inspection surface of the metallographic sample, facilitating repeated observation, analysis, and research by inspection personnel, and saving them time in observation, analysis, and research.

[0005] The technical means employed in this invention are as follows:

[0006] A metallographic examination feature tissue location positioning device includes: a platform, a first photoelectric sensor, a second photoelectric sensor, and a data logger; The platform is used to support metallographic specimens; the first photoelectric sensor is disposed on the first side of the platform; the first photoelectric sensor is used to measure the moving distance of the platform in a first direction; the second photoelectric sensor is disposed on the second side of the platform; the second side is adjacent to the first side; the second photoelectric sensor is used to measure the moving distance of the platform in a second direction. The data logger is connected to the first photoelectric sensor via data line I and to the second photoelectric sensor via data line II. The data logger receives and records the distance data acquired by the first and second photoelectric sensors, and determines the coordinate positions of the characteristic structures on the metallographic sample based on the distance data fed back by the first and second photoelectric sensors.

[0007] Furthermore, both the first and second photoelectric sensors are movable sensors. Before inspection, they are fixedly placed on adjacent sides of the loading platform and aligned with a preset reference point. During inspection, the positions of the first and second photoelectric sensors remain unchanged.

[0008] Furthermore, the first photoelectric sensor is disposed on the ab side of the loading platform and aligned with point a, for measuring the left and right movement distance of the loading platform; the second photoelectric sensor is disposed on the bc side of the loading platform and aligned with point b, for measuring the up and down movement distance of the loading platform.

[0009] Furthermore, the data logger displays the distance values ​​fed back by the first photoelectric sensor and the second photoelectric sensor in real time, and records the location of the feature tissue in the form of coordinate points.

[0010] This invention also includes a method for locating the position of metallographic feature structures, comprising the following steps: Step 1: Place the stage on the metallurgical microscope stage; Step 2: Place the metallographic sample on the platform, aligning the reference point of the metallographic sample with the corresponding reference point of the platform. Step 3: Set and fix the first photoelectric sensor and the second photoelectric sensor on the adjacent two sides of the loading platform respectively; make the first photoelectric sensor and the second photoelectric sensor align with the preset reference point of the loading platform respectively; Step 4: Connect the first photoelectric sensor to the data logger via data cable I, and simultaneously connect the second photoelectric sensor to the data logger via data cable II. Step 5: Move the metallographic microscope platform to observe the metallographic sample. When a characteristic structure is found, record the distance values ​​fed back by the first photoelectric sensor and the second photoelectric sensor at this time through the data recorder, and record the location of the characteristic structure in the form of coordinate points.

[0011] Furthermore, it also includes the step of repeatedly moving the carrier platform to find characteristic structures and recording the coordinate points, so as to obtain the positional information of multiple characteristic structures on the metallographic sample.

[0012] Furthermore, it also includes: moving the platform to the corresponding position based on the recorded feature organization coordinates, and repeatedly observing the feature organization.

[0013] Compared with the prior art, the present invention has the following advantages: The device and method of this invention can locate and mark the position of characteristic structures without damaging the inspection surface of the metallographic sample, which facilitates repeated observation, analysis and study of the characteristic positions by the inspectors and saves the inspectors' observation, analysis and study time. Attached Figure Description

[0014] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0015] Figure 1 This is a schematic diagram of a feature tissue location positioning device according to an embodiment of the present invention.

[0016] Figure 2 This is a schematic diagram of the cargo platform of the present invention.

[0017] Figure 3 This is a schematic diagram of the metallographic sample of the present invention.

[0018] In the figure: 1. Metallographic sample; 2. Platform; 3. First photoelectric sensor; 4. Second photoelectric sensor; 5. Data logger; 6. Data line I; 7. Data line II. Detailed Implementation

[0019] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0020] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0021] like Figures 1-3 As shown, the present invention provides a metallographic inspection feature tissue location positioning device, including: a loading platform 2, a first photoelectric sensor 3, a second photoelectric sensor 4, and a data recorder 5.

[0022] In a preferred embodiment, the platform 2 is used to support the metallographic sample 1. The platform 2 is a rectangular flat plate structure made of aluminum alloy with an anodized surface, exhibiting good wear resistance and corrosion resistance. The dimensions of the platform 2 are designed to fit a conventional metallographic microscope stage, and the upper surface of the platform 2 is provided with a sample fixing groove for placing the metallographic sample 1.

[0023] The four sides of the platform 2 are marked as ab side, bc side, cd side, and da side, respectively, where ab side is opposite cd side, and bc side is opposite da side. Reference points are located at the corners of the platform 2, where point a is located at the boundary between ab side and da side, point b is located at the boundary between ab side and bc side, point c is located at the boundary between bc side and cd side, and point d is located at the boundary between cd side and da side. These reference points are used for the initial alignment of the metallographic specimen 1.

[0024] The first photoelectric sensor 3 is disposed on the first side of the platform 2; the first photoelectric sensor 3 is used to measure the moving distance of the platform 2 in a first direction. The first photoelectric sensor 3 is disposed on the ab side of the platform 2 and aligned with point a, and is used to measure the left and right moving distance of the platform 2; the second photoelectric sensor 4 is disposed on the bc side of the platform 2 and aligned with point b, and is used to measure the up and down moving distance of the platform 2. The first photoelectric sensor 3 is a high-precision laser displacement sensor. The first photoelectric sensor 3 is fixed to the ab side of the platform 2 by an adjustable bracket, which adopts a magnetic base design and can be adsorbed onto the metal stage of the metallurgical microscope. The optical axis of the sensor is aligned with the reference position at point a of the platform 2, which serves as the coordinate origin. Before inspection, the bracket is adjusted to accurately project the light spot of the sensor onto point a, and then the bracket position is locked to ensure that the sensor position remains unchanged during inspection.

[0025] The second photoelectric sensor 4 is disposed on the second side of the loading platform 2; the second side is adjacent to the first side; the second photoelectric sensor 4 is used to measure the moving distance of the loading platform 2 in the second direction. The second photoelectric sensor 4 is fixed to the bc side of the loading platform 2 by another set of adjustable brackets, and the optical axis of the sensor is aligned with the reference position of point b of the loading platform 2. Since point b is adjacent to point a and located at the same corner, with point a as the origin of the coordinate system (0,0), point b naturally forms the reference in the Y-axis direction. The first photoelectric sensor 3 and the second photoelectric sensor 4 are both movable sensors. Before inspection, they are fixedly placed according to the specific position of the loading platform 2 and aligned with the preset reference points (points a and b). During the inspection, their positions remain unchanged to ensure the stability of the coordinate system.

[0026] In this application, the first photoelectric sensor 3 and the second photoelectric sensor 4 are both movable sensors. Before inspection, they are fixedly placed on the adjacent sides of the loading platform 2 and aligned with the preset reference point. During the inspection, the positions of the first photoelectric sensor 3 and the second photoelectric sensor 4 remain unchanged.

[0027] The data logger 5 is connected to the first photoelectric sensor 3 via data line I6, and to the second photoelectric sensor 4 via data line II7. The data logger 5 receives and records the distance data acquired by the first photoelectric sensor 3 and the second photoelectric sensor 4, and determines the coordinate positions of the characteristic structures on the metallographic sample 1 based on the distance data fed back by the first photoelectric sensor 3 and the second photoelectric sensor 4.

[0028] As a preferred embodiment, this application includes a method for locating the position of metallographic feature structures, comprising the following steps: Step 1: Place the stage 2 on the metallurgical microscope stage. First, clean the existing stage of the metallurgical microscope to ensure the surface is free of dust and oil. Then, place the stage 2 stably on the existing stage. If necessary, use clamps or magnetic devices to secure it and prevent relative sliding during movement.

[0029] Step 2: Place the metallographic sample 1 to be tested on the platform 2, ensuring that the reference point of the metallographic sample 1 (usually a marked point on the edge or corner of the sample) coincides with the corresponding reference point (point a) on the platform 2. For circular samples, align the edge of the sample with point a; for rectangular samples, align the two adjacent sides of the sample with sides ab and da, respectively. Ensure the sample is placed stably without tilting or shaking.

[0030] Step 3: Set and fix the first photoelectric sensor 3 and the second photoelectric sensor 4 on the adjacent two sides (ab side and bc side) of the platform 2 respectively. First, attach the bracket of the first photoelectric sensor 3 to the metallurgical microscope stage, adjust the height and angle of the bracket so that the sensor spot is accurately projected on point a of the platform 2, and then lock the bracket; next, attach the bracket of the second photoelectric sensor 4 to the stage, adjust it so that its spot is accurately projected on point b of the platform 2, and then lock the bracket; further, turn on the data logger 5, enter the calibration mode, and confirm that the readings of the two sensors at the initial position are both zero (or record the initial offset as the zero point).

[0031] Step 4: Connect the first photoelectric sensor 3 to the data logger 5 via data cable I6, and simultaneously connect the second photoelectric sensor 4 to the data logger 5 via data cable II7. After verifying that the connections are secure, turn on the data logger 5 and enter measurement mode. At this time, the display screen of the data logger 5 should show the current position coordinates (0,0) in real time.

[0032] Step 5: Move the metallographic microscope's stage 2 to observe the metallographic sample 1. When a characteristic structure is found, record the distance values ​​fed back by the first photoelectric sensor 3 and the second photoelectric sensor 4 using the data logger 5. Record the location of the characteristic structure as a coordinate point; this coordinate point is the location of the characteristic structure. Move the stage 2 using the metallographic microscope's stage adjustment knob (or electric control device) to move the metallographic sample 1 within the microscope's field of view for observation of the metallographic structure. When a characteristic structure that needs to be recorded (such as large inclusions, abnormal phase transformation regions, crack initiation sites, etc.) is found in the field of view, stop moving the stage 2.

[0033] At this time, the distance values ​​fed back by the first photoelectric sensor 3 and the second photoelectric sensor 4 are recorded using the recording button (physical button or touch screen operation) of the data logger 5. The data logger 5 automatically saves the coordinate point as a feature organization location, for example, recorded as P1(X1,Y1).

[0034] This method also includes the step of repeatedly moving the platform to locate and record coordinate points to obtain the location information of multiple feature structures on metallographic specimen 1. If it is necessary to locate and record the location of multiple feature structures, step 5 is repeated. For each feature structure found, the platform 2 is moved to the center of the field of view, and then the current coordinate point is recorded. By repeatedly moving the platform 2 to locate and record coordinate points, the location information of multiple feature structures on metallographic specimen 1 can be obtained, and a complete feature structure distribution map can be established.

[0035] When it is necessary to re-observe the recorded feature tissue, the platform 2 is moved to the corresponding position according to the coordinate points stored in the data logger 5. The coordinate record of the target feature tissue (e.g., P1) is selected on the data logger 5; the data logger 5 displays the deviation (ΔX, ΔY) between the coordinates of that point (X1, Y1) and the current position; the platform 2 is moved according to the deviation value. When the data logger 5 displays that the current coordinates match the target coordinates (the deviation is less than a set threshold, e.g., ...), ... Stop moving the microscope; at this point, the center of the microscope's field of view should be aligned with the characteristic tissue, and repeated observation, photography, or further analysis can be performed.

[0036] Example 1 Taking a metallographic sample 1 with dimensions of 10 (a'b') mm × 20 (b'c') mm and a platform 2 with dimensions of 50 (ab) mm × 60 (bc) mm as an example, the distance between the first photoelectric sensor 3 and point a on the platform 2 is 300 mm, and the distance between the second photoelectric sensor 4 and point b on the platform 2 is 300 mm, and a feature structure exists on the metallographic sample 1 located at the center point f, as an example. The dimensions of the metallographic sample 1 and the platform 2 are not limited to the dimensions listed above, but the dimensions of the metallographic sample 1 must be smaller than the dimensions of the platform 2; the distances between the first photoelectric sensor 3 and the second photoelectric sensor 4 and the platform 2 are not limited to the values ​​listed above, and the distances should be such that they do not affect the inspection operation of the inspector; the location and number of feature structures on the metallographic sample 1 are not limited to those shown in the example above, and the actual situation shall prevail.

[0037] The method for locating the characteristic tissue position is as follows: Before inspection, the photoelectric sensor should be correctly positioned, and the photoelectric sensor should not be moved during the inspection. Platform 2 is placed on the stage of the metallographic microscope; metallographic sample 1 is placed on platform 2, with point a' of metallographic sample 1 coinciding with point a of platform 2; the first photoelectric sensor 3 is placed on side ab of platform 2 and aligned with point a of platform 2, with a distance of 300 mm between the first photoelectric sensor 3 and point a of platform 2; the second photoelectric sensor 4 is placed on side bc of platform 2 and aligned with point b of platform 2, with a distance of 300 mm between the second photoelectric sensor 4 and point b of platform 2; the first photoelectric sensor 3 and data recorder 5 are connected by data cable I6; the second photoelectric sensor 4 and data recorder 5 are connected by data cable II7; the platform of the metallographic microscope is moved to observe the inspection surface of metallographic sample 1 and search for characteristic structures of metallographic sample 1; the data recorder 5 displays the distance values ​​fed back by the first photoelectric sensor 3 and the second photoelectric sensor 4 in real time, with the value fed back by the first photoelectric sensor 3 being 290 mm and the value fed back by the second photoelectric sensor 4 being 305 mm. When characteristic structures of metallographic sample 1 are found ( Figure 1 (Point f is the location of the characteristic structure). The data logger 5 displays a value of 290 mm from the first photoelectric sensor 3 and a value of 305 mm from the second photoelectric sensor 4. The distance values ​​fed back by the first photoelectric sensor 3 and the second photoelectric sensor 4 are recorded. The coordinates of this point (the feedback value of the first photoelectric sensor 3 and the feedback value of the second photoelectric sensor 4) are the location of the characteristic structure of the metallographic sample 1. If the characteristic structure of point f is to be studied repeatedly, it is only necessary to return to the recorded coordinates (290, 305).

[0038] The sequence numbers of the above embodiments of the present invention are for descriptive purposes only and do not represent the superiority or inferiority of the embodiments.

[0039] In the above embodiments of the present invention, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions of other embodiments.

[0040] In the several embodiments provided in this application, it should be understood that the disclosed technical content can be implemented in other ways. The device embodiments described above are merely illustrative; for example, the division of units can be a logical functional division, and in actual implementation, there may be other division methods. For instance, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Furthermore, the displayed or discussed mutual coupling, direct coupling, or communication connection may be through some interfaces; the indirect coupling or communication connection between units or modules may be electrical or other forms.

[0041] The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0042] Furthermore, the functional units in the various embodiments of the present invention can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or as a software functional unit.

[0043] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, read-only memory (ROM), random access memory (RAM), portable hard drives, magnetic disks, or optical disks.

[0044] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A device for locating the position of characteristic microstructures in metallographic examination, characterized in that, include: The cargo platform (2), the first photoelectric sensor (3), the second photoelectric sensor (4), and the data logger (5); The platform (2) is used to carry the metallographic sample (1); the first photoelectric sensor (3) is disposed on the first side of the platform (2); the first photoelectric sensor (3) is used to measure the moving distance of the platform (2) in the first direction; the second photoelectric sensor (4) is disposed on the second side of the platform (2); the second side is adjacent to the first side; the second photoelectric sensor (4) is used to measure the moving distance of the platform (2) in the second direction; The data logger (5) is connected to the first photoelectric sensor (3) via data line I (6) and to the second photoelectric sensor (4) via data line II (7). The data logger (5) receives and records the distance data acquired by the first photoelectric sensor (3) and the second photoelectric sensor (4), and determines the coordinate position of the characteristic structure on the metallographic sample (1) based on the distance data fed back by the first photoelectric sensor (3) and the second photoelectric sensor (4).

2. The metallographic examination feature tissue location positioning device according to claim 1, characterized in that, The first photoelectric sensor (3) and the second photoelectric sensor (4) are both movable sensors. Before inspection, they are fixedly placed on the adjacent sides of the loading platform (2) and aligned with the preset reference point. During the inspection, the positions of the first photoelectric sensor (3) and the second photoelectric sensor (4) remain unchanged.

3. The metallographic examination feature tissue location positioning device according to claim 1, characterized in that, The first photoelectric sensor (3) is set on the ab side of the loading platform (2) and aligned with point a, for measuring the left and right movement distance of the loading platform (2); the second photoelectric sensor (4) is set on the bc side of the loading platform (2) and aligned with point b, for measuring the up and down movement distance of the loading platform (2).

4. The metallographic examination feature tissue location positioning device according to claim 1, characterized in that, The data logger (5) displays the distance values ​​fed back by the first photoelectric sensor (3) and the second photoelectric sensor (4) in real time, and records the location of the feature organization in the form of coordinate points.

5. A method for locating characteristic microstructures in metallographic examination, using the apparatus described in any one of claims 1-4, characterized in that, Includes the following steps: Step 1: Place the stage (2) on the metallurgical microscope stage; Step 2: Place the metallographic sample (1) on the platform (2) so that the reference point of the metallographic sample (1) coincides with the corresponding reference point of the platform (2); Step 3: Set and fix the first photoelectric sensor (3) and the second photoelectric sensor (4) on the adjacent two sides of the loading platform (2); make the first photoelectric sensor (3) and the second photoelectric sensor (4) aligned with the preset reference point of the loading platform (2); Step 4: Connect the first photoelectric sensor (3) to the data logger (5) via data cable I (6), and connect the second photoelectric sensor (4) to the data logger (5) via data cable II (7); Step 5: Move the metallographic microscope platform (2) to observe the metallographic sample (1). When a characteristic structure is found, record the distance value fed back by the first photoelectric sensor (3) and the second photoelectric sensor (4) at this time through the data recorder (5) and record the location of the characteristic structure in the form of coordinate points.

6. The method for locating the position of metallographic feature structures according to claim 5, characterized in that, Also includes: Repeat the steps of moving the platform (2) to find the feature structures and record the coordinate points to obtain the position information of multiple feature structures on the metallographic sample (1).

7. A method for locating the position of metallographic feature structures according to claim 5 or 6, characterized in that, Also includes: Based on the recorded features, coordinate points are organized, and the cargo platform (2) is moved to the corresponding position. Repeated observations of the characteristic tissues.

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