Vapor deposition apparatus

Abstract

This invention provides a vapor deposition apparatus, belonging to the field of vacuum coating technology. The vapor deposition apparatus includes a vapor deposition chamber and an evaporation source assembly. The evaporation source assembly is partially disposed within the vapor deposition chamber and includes an evaporation source cavity, an evaporation source, a gate valve, and a vacuum pump. The evaporation source cavity is located within the vapor deposition chamber, and the evaporation source is located within the evaporation source cavity. The evaporation source cavity is connected to both the gate valve and the vacuum pump. The gate valve controls the connection and isolation between the vapor deposition chamber and the evaporation source cavity, and the vacuum pump is used to evacuate the evaporation source cavity. The vapor deposition apparatus provided by this invention features an independent evaporation source cavity. The gate valve can be closed to completely isolate the evaporation source cavity from the vapor deposition chamber, confining active lithium vapor within the independent evaporation source cavity. This prevents leaked lithium vapor from contacting the vapor deposition chamber and causing safety accidents, ensuring the stability and safety of the lithium vapor deposition process.

Description

Technical Field

[0001] This invention belongs to the field of vacuum coating technology, and more specifically, relates to a vapor deposition equipment. Background Technology

[0002] With the development of new energy vehicles, the demand for improving the safety and lifespan of lithium batteries is increasing, leading to higher requirements for the preparation of high-performance electrode sheets. Traditional coating processes can no longer support the need to prepare higher-performance electrode sheets, resulting in the development of coating and evaporation coating processes. To meet the manufacturing needs of this new process, it is particularly important to manufacture an efficient, stable, and safe evaporation lithium plating line source to support the evaporation coating.

[0003] In related technologies, a vacuum pump is used to evacuate the interior of the coating chamber and the evaporation source assembly. However, due to the extremely high reactivity of lithium during evaporation coating, lithium plating is highly dangerous, posing significant safety hazards to the coating chamber during operation. Summary of the Invention

[0004] The purpose of this invention is to provide a vapor deposition device to solve the problem in the prior art where a vacuum pump is used to evacuate the inside of the coating chamber and the evaporation source assembly, which is highly dangerous for lithium plating and poses a significant safety hazard to the coating chamber during operation.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is: to provide a vapor deposition apparatus, comprising:

[0006] Evaporation chamber;

[0007] An evaporation source assembly is partially disposed within the vapor deposition chamber. The evaporation source assembly includes an evaporation source cavity, an evaporation source, a gate valve, and a vacuum pump. The evaporation source cavity is disposed within the vapor deposition chamber, and the evaporation source is disposed within the evaporation source cavity. The evaporation source cavity is connected to both the gate valve and the vacuum pump. The gate valve is used to control the communication and isolation between the vapor deposition chamber and the evaporation source cavity, and the vacuum pump is used to evacuate the evaporation source cavity.

[0008] Furthermore, the vapor deposition equipment also includes a baffle plate disposed in the evaporation source cavity. One end of the evaporation source has an opening, and the baffle plate is disposed at the opening. The baffle plate can move relative to the opening to open or close the opening.

[0009] The baffle has a first cooling channel inside.

[0010] Furthermore, the vapor deposition equipment includes a first driving member disposed within the evaporation source cavity, the first driving member being connected to the baffle, and the first driving member being used to drive the baffle to move relative to the opening.

[0011] Furthermore, the vapor deposition equipment includes a first pulley, a second pulley, and a slide rail. The first pulley, the second pulley, and the slide rail are all disposed within the evaporation source cavity. The first pulley and the second pulley are both connected to the baffle. The first pulley and the second pulley are rotatably disposed on the slide rail.

[0012] Furthermore, the vapor deposition equipment includes a lifting mechanism, which is disposed in the evaporation source cavity and connected to the evaporation source. The lifting mechanism is used to drive the evaporation source to move up and down in the vertical direction.

[0013] Furthermore, the lifting mechanism includes a second driving member, a transmission member, and a lead screw. The drive shaft of the second driving member is connected to the transmission member. The transmission member is connected to one end of the lead screw. The end of the lead screw away from the transmission member is connected to the evaporation source. The lead screw is arranged in a vertical direction.

[0014] Furthermore, the evaporation source includes a crucible, and an inner partition is provided inside the crucible to divide the crucible into multiple evaporation zones.

[0015] Furthermore, the evaporation source assembly includes a top cover, which is disposed within the evaporation source cavity and covers the top of the evaporation source, and the top cover has an arc-shaped structure.

[0016] Furthermore, the evaporation source includes an insulation plate, a heater, and a second cooling channel, wherein the heater is disposed on the inner side of the insulation plate, and the second cooling channel is disposed on the outer side of the insulation plate;

[0017] The insulation board has multiple layers, which are staggered.

[0018] Furthermore, the vapor deposition equipment includes a pull-out assembly, on which the evaporation source assembly is disposed, and the pull-out assembly is used to drive the evaporation source assembly to move toward or away from the vapor deposition chamber.

[0019] Compared with the prior art, the beneficial effects of the vapor deposition equipment provided by the present invention are as follows: The vapor deposition equipment of the present invention includes a vapor deposition chamber and an evaporation source assembly. The evaporation source assembly is partially disposed in the vapor deposition chamber, and the evaporation source assembly includes an evaporation source cavity, an evaporation source, a gate valve, and a vacuum pump. The evaporation source cavity is disposed in the vapor deposition chamber, and the evaporation source is disposed in the evaporation source cavity. The evaporation source cavity is connected to the gate valve and the vacuum pump respectively. The gate valve is used to control the communication and isolation between the vapor deposition chamber and the evaporation source cavity, and the vacuum pump is used to evacuate the evaporation source cavity.

[0020] This vapor deposition equipment features an independent evaporation source chamber. A gate valve controls the connection and isolation of the evaporation source components. When the lithium liquid in the evaporation source chamber is in an unstable evaporation stage, such as during heating or cooling, the gate valve can be closed to completely isolate the evaporation source chamber from the vapor deposition chamber, confining the active lithium vapor within the independent evaporation source chamber and preventing leaked lithium vapor from contacting the vapor deposition chamber and causing safety accidents. A separate vacuum pump is installed in the evaporation source chamber to maintain a stable vacuum environment suitable for lithium vapor deposition, avoiding problems such as uneven lithium vapor evaporation and splashing caused by external environmental interference, thus ensuring the stability and safety of the lithium vapor deposition process. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the vapor deposition equipment provided in a preferred embodiment of the present invention.

[0023] Figure 2 This is a schematic diagram of the structure of the evaporation source assembly provided in a preferred embodiment of the present invention.

[0024] Figure 3 This is an internal structural diagram of an evaporation source assembly provided in a preferred embodiment of the present invention.

[0025] Figure 4 This is a schematic diagram of the vapor deposition equipment provided in a preferred embodiment of the present invention.

[0026] Figure 5 This is a structural schematic diagram of the vapor deposition equipment provided in a preferred embodiment of the present invention from another angle.

[0027] Figure 6 This is a front view of an evaporation source assembly provided in a preferred embodiment of the present invention.

[0028] Figure 7 for Figure 6 A cross-sectional view along the AA direction.

[0029] Figure 8 for Figure 6 Cross-sectional view along the BB direction.

[0030] Figure 9 This is a magnified view of point C in the diagram.

[0031] Figure 10 This is a schematic diagram of the heater provided in a preferred embodiment of the present invention.

[0032] Figure 11 This is a partial structural schematic diagram of the vapor deposition equipment provided in a preferred embodiment of the present invention.

[0033] The main markings in the attached figures are as follows:

[0034] 100. Evaporation chamber;

[0035] 200. Evaporation source assembly; 210. Evaporation source chamber; 220. Gate valve; 230. Vacuum pump; 240. Door; 250. Molecular pump gate valve; 260. Evaporation source; 261. Crucible;

[0036] 300. Pull-out component;

[0037] 400, baffle; 410, first cooling channel; 420, first driving component;

[0038] 510. First pulley; 520. Second pulley; 530. Slide rail;

[0039] 600. Lifting mechanism; 610. Second driving component; 620. Transmission component; 630. Lead screw;

[0040] 640. Guide components;

[0041] 710. Inner partition; 720. Top cover;

[0042] 810. Insulation board; 820. Second cooling channel; 831. First heater; 832. Second heater; 833. Third heater; 834. Fourth heater; 835. Fifth heater; 836. Sixth heater; 837. Seventh heater;

[0043] 900. Coated drum. Detailed Implementation

[0044] To make the technical problems to be solved, the technical solutions, and the beneficial effects of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and are not intended to limit the present invention.

[0045] like Figures 1 to 3 As shown, in some embodiments, a vapor deposition apparatus includes a vapor deposition chamber 100 and an evaporation source assembly 200. The evaporation source assembly 200 is partially disposed within the vapor deposition chamber 100. The evaporation source assembly 200 includes an evaporation source chamber 210, an evaporation source 260, a gate valve 220, and a vacuum pump 230. The evaporation source chamber 210 is disposed within the vapor deposition chamber 100, and the evaporation source is disposed within the evaporation source chamber 210. The evaporation source chamber 210 is connected to both the gate valve 220 and the vacuum pump 230. The gate valve 220 is located at the top of the evaporation source chamber 210 and is used to control the communication and isolation between the vapor deposition chamber 100 and the evaporation source chamber 210. The vacuum pump 230 is used to evacuate the evaporation source chamber 210. Specifically, the evaporation source can be a lithium plating wire source. Specifically, the vacuum pump 230 can be a molecular pump.

[0046] The vapor deposition equipment is equipped with an independent evaporation source chamber 210. A gate valve 220 controls the connection and isolation status of the evaporation source assembly 200. When the lithium liquid in the evaporation source chamber 210 is in an unstable evaporation stage, such as during heating or cooling, the gate valve 220 can be closed to completely isolate the evaporation source chamber 210 from the vapor deposition chamber 100, confining the active lithium vapor within the independent evaporation source chamber 210 and preventing leaked lithium vapor from contacting the vapor deposition chamber 100 and causing a safety accident. A separate vacuum pump 230 is installed in the evaporation source chamber 210 to maintain a stable vacuum environment suitable for lithium vapor deposition, avoiding problems such as uneven lithium vapor evaporation or splashing caused by external environmental interference, thus ensuring the stability and safety of the lithium vapor deposition process.

[0047] During operation, vacuum pump 230 is started to evacuate the evaporation source chamber 210, achieving the vacuum level required for the lithium plating process. Once the vacuum level is reached, the gate valve 220 is opened, connecting the evaporation source chamber 210 to the deposition chamber 100, forming a complete deposition operation space. Lithium deposition can then commence. When lithium plating is complete or during an unstable phase such as heating or cooling, the gate valve 220 is immediately closed to isolate the evaporation source chamber 210 from the deposition chamber 100. If maintenance of the deposition chamber 100 is required, vacuum pump 230 is kept running to maintain a stable vacuum environment in the evaporation source chamber 210. After maintenance, vacuum pump 230 is restarted to check the vacuum level in the evaporation source chamber 210. Once the vacuum level is within the acceptable range, the gate valve 220 is opened to resume deposition operations.

[0048] Please refer to the following: Figure 2 and Figure 3 Specifically, the evaporation source assembly 200 also includes a door 240. The door 240 is disposed on the side of the evaporation source cavity 210.

[0049] Specifically, the evaporation source assembly 200 also includes a molecular pump gate valve 250. The molecular pump gate valve 250 is a control component for the on / off connection between the evaporation source chamber 210 and the vacuum pump 230. One side of the vacuum pump 230 is sealed and fixedly connected to the evaporation source chamber 210, and its valve port is connected to the evaporation source chamber 210. The other side of the molecular pump gate valve 250 is sealed and fixedly connected to the vacuum pump 230. The molecular pump gate valve 250 can be opened and closed according to process requirements. When the molecular pump gate valve 250 is open, the evaporation source chamber 210 is connected to the vacuum pump 230, enabling the vacuum pump 230 to perform vacuuming operations on the evaporation source chamber 210, quickly achieving the vacuum level required for the lithium plating process. When the molecular pump gate valve 250 is closed, it can isolate the evaporation source chamber 210 from the vacuum pump 230, preventing external gas from flowing back into the evaporation source chamber 210 through the vacuum pump 230 pipeline after the vacuum pump 230 stops. It can also prevent lithium vapor in the evaporation source chamber 210 from entering the vacuum pump 230 and causing component contamination or damage, thereby ensuring the stability and controllability of the vacuum environment in the evaporation source chamber 210.

[0050] Specifically, the evaporation source assembly 200 also includes a vacuum transmitting device and a detection device. The vacuum transmitting device and the detection device are located inside the evaporation source cavity 210. The detection device can detect and control the environment inside the evaporation source cavity 210 in real time.

[0051] It should be noted that the detection device can be equipped with detection sensors adapted to the lithium plating process, such as those for vacuum pressure and gas composition. The sensor probe is in direct contact with the space inside the evaporation source cavity 210, and can capture key environmental parameters such as vacuum degree, gas concentration, and ambient pressure inside the evaporation source cavity 210 in real time. The collected parameter signals are converted into electrical signals and transmitted to the control system of the evaporation equipment in real time, realizing accurate real-time detection of the environmental state inside the evaporation source cavity 210.

[0052] The vacuum transmitting device can be electrically connected to the detection device, vacuum pump 230, and molecular pump gate valve 250, respectively. The vacuum transmitting device receives control commands from the detection device based on feedback parameters. By adjusting its own vacuum generating power and gas delivery status, and coordinating with the evaporation operation of vacuum pump 230 and the on / off control of molecular pump gate valve 250, the vacuum environment within the evaporation source chamber 210 is dynamically adjusted. Simultaneously, the detection device also has a direct control function. Based on preset process parameter thresholds, when the environment within the chamber deviates from the set value, it directly triggers the action commands of components such as the vacuum transmitting device and vacuum pump 230, completing environmental correction without manual intervention and ensuring that the evaporation source chamber 210 always maintains a stable environmental state compatible with the lithium plating process.

[0053] Please refer to the following: Figure 1In some embodiments, the vapor deposition apparatus includes a pull-out assembly 300. An evaporation source assembly 200 is mounted on the pull-out assembly 300, which is used to move the evaporation source assembly 200 towards or away from the vapor deposition chamber 100. During vapor deposition, the evaporation source assembly 200 is closed and pulled into the vapor deposition chamber 100 by the pull-out assembly 300, with the entire evaporation source chamber 210 of the evaporation source assembly 200 in a vacuum environment. When maintenance of the evaporation source assembly 200 is required, the pull-out mechanism pulls the evaporation source assembly 200 out of the vapor deposition chamber 100, allowing maintenance of the entire evaporation source assembly 200 to be performed in an atmospheric environment.

[0054] It should be noted that the pull-out component 300, driven by controllable linear displacement, allows the evaporation source component 200 to quickly and precisely switch between the process station inside the evaporation chamber 100 and the maintenance station outside the evaporation chamber 100. During coating, the component is placed in a vacuum process environment to meet the core process conditions for lithium evaporation. During maintenance, the component is pulled out to the atmospheric environment, eliminating the need for operations within the confined space of the vacuum chamber.

[0055] Specifically, the pull-out assembly 300 can be mounted on an evaporation source trolley.

[0056] Please refer to the following: Figure 4 and Figure 5 In some embodiments, the vapor deposition apparatus further includes a baffle 400. The baffle 400 is disposed within the evaporation source cavity 210. One end of the evaporation source 260 has an opening, and the baffle 400 is positioned at the opening. The baffle 400 is movable relative to the opening to open or close it. A first cooling channel 410 is disposed inside the baffle 400. This first cooling channel 410 is a closed flow channel structure, through which a cooling medium can flow and form a circulating flow. When the cooling medium flows within the channel, it rapidly absorbs the heat from the baffle 400 itself through heat exchange, achieving efficient and continuous cooling of the baffle 400, keeping it at a low temperature. When the baffle 400 closes to block the opening, the low-temperature surface of the baffle 400 creates a temperature difference with the lithium vapor escaping from the evaporation source 260, allowing the lithium vapor to quickly adhere to and deposit on the surface of the baffle 400, achieving effective blocking and collection of the lithium vapor.

[0057] Specifically, the baffle 400 can be a square structure.

[0058] In some embodiments, the vapor deposition equipment includes a first driving component 420 connected to a baffle 400. The first driving component 420 is disposed within the evaporation source cavity 210 and is used to drive the baffle 400 to move relative to the opening. When the lithium liquid is in a stable evaporation stage, the control system issues an opening command, and the first driving component 420 drives the baffle 400 to move away from the opening, fully opening the opening to allow lithium vapor to escape smoothly and complete the vapor deposition. When the lithium liquid is in an unstable stage such as heating or cooling, or when the equipment needs maintenance, the control system issues a closing command, and the first driving component 420 drives the baffle 400 to move closer to the opening until the baffle 400 completely fits against the opening to achieve a seal and block the lithium vapor diffusion path.

[0059] Specifically, the first driving component 420 includes a motor and a rocker arm structure. The motor is connected to the rocker arm structure, and a sliding groove is provided on the rocker arm structure. The motor drives the rocker arm structure to move the baffle 400 to open or close the opening.

[0060] Specifically, the vapor deposition equipment includes a first pulley 510, a second pulley 520, and a slide rail 530. The first pulley 510, the second pulley 520, and the slide rail 530 are all disposed within the evaporation source cavity 210. The slide rail 530 is disposed on the side of the evaporation source assembly 200. The first pulley 510 and the second pulley 520 are both connected to a baffle 400, and the first pulley 510 and the second pulley 520 are rotatably disposed on the slide rail 530. Specifically, the first pulley 510 and the second pulley 520 are located on both sides of the slide rail 530.

[0061] It should be noted that the slide rail 530, the first pulley 510, and the second pulley 520 provide precise trajectory constraints and stable rolling support for the reciprocating movement of the baffle 400. Specifically, the slide rail 530 is a linear structure fixed to the side of the evaporation source assembly 200, and its extension direction is completely consistent with the preset movement direction of the baffle 400 relative to the opening of the evaporation source cavity 210, serving as a dedicated motion guide for the baffle 400. Specifically, the slide rail 530 can be set horizontally. The first pulley 510 and the second pulley 520 are rolling mating parts. The first pulley 510 and the second pulley 520 are respectively attached to the two end faces of the slide rail 530 in a clamping rail layout to achieve rolling mating with the slide rail 530. When the first driving member 420 drives the baffle 400 to reciprocate, the baffle 400 forms rolling friction with the slide rail 530 through the first pulley 510 and the second pulley 520. The first pulley 510 and the second pulley 520 roll synchronously along the extension direction of the slide rail 530. The linear structure of the slide rail 530 constrains the movement trajectory of the baffle 400, so that the baffle 400 always moves smoothly in the preset direction. At the same time, the rolling friction between the pulley and the slide rail 530 replaces the sliding friction, which greatly reduces the resistance during the movement of the baffle 400.

[0062] The first pulley 510 and the second pulley 520 are positioned on both sides of the slide rail 530 in a clamping design, which can form a bidirectional limit on the baffle 400 from both sides of the slide rail 530, preventing the baffle 400 from shifting during movement, ensuring the straightness and stability of the movement of the baffle 400, and ultimately enabling the baffle 400 to accurately and smoothly open or seal the opening of the evaporation source cavity 210.

[0063] Specifically, the slide rail 530, the first pulley 510, and the second pulley 520 together constitute the guide support mechanism of the baffle 400. Two such guide support mechanisms can be provided. The two guide support mechanisms are respectively located on both sides of the baffle 400.

[0064] It should be noted that the two slide rails 530 are arranged in parallel. The extension direction and installation height of the two slide rails 530 are exactly the same. The preset movement direction of the slide rails 530 relative to the opening of the baffle 400 relative to the evaporation source cavity 210 is precisely matched. The two sets of first pulleys 510 and second pulleys 520 are respectively connected to both sides of the baffle 400, so that both sides of the baffle 400 are constrained by the linear trajectory of the slide rails 530 and supported by the rolling of the first pulleys 510 and second pulleys 520.

[0065] When the first driving component 420 drives the baffle 400 to reciprocate, the first pulley 510 and the second pulley 520 on both sides of the baffle 400 roll synchronously along the corresponding slide rail 530 with the driving force. The two sets of first pulleys 510 and second pulleys 520 move at the same rhythm, providing synchronous trajectory constraint, rolling support, and bidirectional limitation on the baffle 400 from both sides. The baffle 400 remains horizontal throughout the movement, achieving straight reciprocating motion without deviation or jamming, and ultimately accurately completing the opening and sealing of the evaporation source cavity 210. During this process, the motion load and weight of the baffle 400 are evenly distributed to the guide support mechanisms on both sides, making the force on the baffle 400 symmetrical and balanced. This eliminates the movement deviation caused by unilateral force from a structural perspective, thereby enhancing the movement stability of the baffle 400.

[0066] In some embodiments, the vapor deposition apparatus includes a lifting mechanism 600. The lifting mechanism 600 is disposed within the evaporation source cavity 210. The lifting mechanism 600 is connected to the evaporation source 260 and is used to drive the evaporation source 260 to move up and down in the vertical direction.

[0067] Throughout the evaporation lithium plating process, the lifting mechanism 600 adjusts the distance between the liquid surface and the substrate based on the consumption of lithium liquid in the evaporation source 260 and the decrease in liquid level. The lifting mechanism 600 compensates for the liquid level, ensuring that the distance between the evaporation liquid surface and the base film remains constant throughout the evaporation plating process, thus guaranteeing the uniformity of the plating. The vertical height of the evaporation source 260 is adjusted in real time to keep the distance between the lithium liquid surface and the substrate within the evaporation source cavity 210 within the optimal range preset by the process. Simultaneously, the height of the evaporation source 260 can be preset and adjusted according to the lithium plating process requirements of different electrode sheet specifications.

[0068] Specifically, the lifting mechanism 600 includes a second driving member 610, a transmission member 620, and a lead screw 630. The drive shaft of the second driving member 610 is connected to the transmission member 620, the transmission member 620 is connected to one end of the lead screw 630, and the end of the lead screw 630 away from the transmission member 620 is connected to the evaporation source 260, and the lead screw 630 is arranged vertically. The second driving member 610 drives the transmission member 620 to rotate, so that the transmission member 620 drives the lead screw 630 to move vertically, thereby causing the lead screw 630 to lift the evaporation source 260 vertically.

[0069] It should be noted that when the evaporation process requires adjusting the height of the evaporation source 260, the second drive component 610 receives a command from the control system and outputs rotational power. This rotational power is transmitted to the lead screw 630 via the transmission component 620, causing the lead screw 630 to rotate synchronously around its own vertical axis. When the lead screw 630 rotates, its external thread meshes with the internal thread of the transmission component 620, converting the rotational motion of the lead screw 630 into linear motion in the vertical direction through the threaded engagement. This linear driving force is then transmitted to the evaporation source 260 through the connection between the lead screw 630 and the evaporation source 260, causing the evaporation source 260 to move smoothly upwards or downwards synchronously with the lead screw 630 in the vertical direction. Throughout the transmission process, the rotation angle and speed of the second drive component 610 can be precisely controlled digitally by the control system. With the help of the fixed transmission ratio of the lead screw 630 nut pair, the rotational stroke is converted into precise vertical linear displacement, achieving precise control of the lifting height of the evaporation source 260. Meanwhile, the threaded engagement structure of the lead screw 630 has a self-locking characteristic, which can prevent the lead screw 630 from rotating in reverse when there is no power input, so that the evaporation source 260 is stably maintained at the preset height.

[0070] Specifically, the second drive component 610 can be a motor.

[0071] Specifically, the first driving component 420 and the second driving component 610 are arranged in parallel.

[0072] In some embodiments, the lifting mechanism 600 includes a guide member 640. The guide member 640 is connected to the evaporation source 260, is arranged vertically, and is capable of telescoping in the vertical direction.

[0073] The guide member 640 can extend and retract vertically, and its extension and retraction stroke matches the preset lifting and lowering stroke of the evaporation source 260. The extension and retraction motion has no radial offset and is a linear vertical reciprocating motion. When the second drive member 610 drives the lead screw 630 to rotate via the transmission member 620, converting this into a vertical linear driving force to push the evaporation source 260 up and down, the evaporation source 260 synchronously drives the connected guide member 640 to perform synchronous extension and retraction motion in the vertical direction. The guide member 640, through its own extension and retraction structure, provides a vertical linear trajectory for the lifting and lowering motion of the evaporation source 260, counteracting the slight radial torque that may be generated during the transmission of the lead screw 630, and preventing the evaporation source 260 from rotating circumferentially with the rotation of the lead screw 630. Simultaneously, it provides additional vertical support force to the evaporation source 260, ensuring that the evaporation source 260 always rises and falls smoothly along the preset vertical direction. Throughout the process, the extension and retraction of the guide 640 follows the lifting and lowering of the evaporation source 260. Through the trajectory constraint and extension and retraction characteristics of the mechanical structure, the stability of the lifting and lowering of the evaporation source 260 is improved in conjunction with the lead screw 630. Furthermore, the extension and retraction limit characteristics of the guide 640 can prevent component collisions or structural damage caused by the overtravel lifting and lowering of the evaporation source assembly 200.

[0074] Specifically, multiple guide members 640 can be provided. Multiple guide members 640 are distributed around the bottom outer periphery of the evaporation source 260.

[0075] Specifically, the lead screw 630 is located at the bottom of the evaporation source 260 and at the middle position in the width direction of the evaporation source 260.

[0076] Specifically, the guide member 640 can be a rod-shaped structure.

[0077] Please refer to the following: Figure 6 and Figure 7 In some embodiments, the evaporation source 260 includes a crucible 261. An inner partition 710 is provided inside the crucible 261. The inner partition 710 is used to divide the crucible 261 into multiple evaporation zones.

[0078] It should be noted that the lithium liquid is contained in various evaporation zones separated by the inner partition 710. When the heating system heats the crucible 261, the lithium liquid in each evaporation zone can independently complete the processes of heating, boiling, and evaporation. The inner partition 710, through physical isolation, limits the convective disturbances and droplet splashing generated by the boiling of lithium liquid in a single zone from spreading to other areas, preventing the formation of large boiling zones and the resulting lithium solution splashing that could affect the stability of the power source. At the same time, it allows each evaporation zone to form an independent local temperature field and evaporation field. Combined with multi-temperature zone heating control, the evaporation rate and vapor concentration of the lithium liquid in each zone can be precisely controlled.

[0079] Specifically, multiple inner partitions 710 can be provided.

[0080] More specifically, the inner partitions 710 can be configured as three. The three inner partitions 710 divide the crucible 261 into four evaporation zones.

[0081] Please refer to the following: Figure 6 , Figure 8 and Figure 11 In some embodiments, the evaporation source assembly 200 includes a top cover 720. The top cover 720 is disposed within the evaporation source cavity 210. The top cover 720 covers the top of the evaporation source 260 and has an arc-shaped structure. The curvature of the arc-shaped top cover 720 matches the curvature of the coating drum, ensuring that the distance between the evaporation port and the substrate on the coating drum is consistent, resulting in a consistent thickness of the evaporated film.

[0082] It should be noted that the evaporation port of the arc-shaped top cover 720 and the substrate on the surface of the coating drum are equidistant from each other along the circumference of the coating drum, and this gap distance is the optimal evaporation distance for the lithium plating process. When the lithium vapor in the evaporation source cavity 210 converges through each evaporation area and escapes from the evaporation port of the arc-shaped top cover 720, the lithium vapor is uniformly directed toward the substrate in a direction perpendicular to the substrate surface within the equidistant gap, and the lithium vapor transport path length at each location is completely consistent. This eliminates the problem of uneven vapor concentration and deposition rate caused by differences in evaporation distance at the spatial structure level, ultimately achieving uniformity of the lithium plating film thickness on the substrate surface.

[0083] Specifically, the radius of curvature of the top cover 720 is equal to the radius of curvature of the coated drum.

[0084] Please refer to the following: Figure 9 In some embodiments, the evaporation source 260 includes an insulation plate 810, a heater, and a second cooling channel 820. The heater is disposed on the inner side of the insulation plate 810, and the second cooling channel 820 is disposed on the outer side of the insulation plate 810. The insulation plate 810 has multiple layers, which are staggered.

[0085] The multi-layered insulation panels 810 are staggered to ensure efficient heating of the power source. A second cooling channel 820 is located within the water-cooled frame. This second cooling channel 820 controls the temperature of the power source casing by regulating the cooling flow rate, preventing overheating and excessive thermal deformation.

[0086] Specifically, insulation board 810 can be a radiant heat insulation board.

[0087] Specifically, the insulation board 810 can be configured as three layers.

[0088] Please refer to the following: Figure 10Specifically, multiple heaters can be configured. These multiple heaters include a first heater 831, a second heater 832, a third heater 833, a fourth heater 834, a fifth heater 835, a sixth heater 836, and a seventh heater 837. The first heater 831 and the second heater 832 primarily melt the lithium adhering to the inner wall of the evaporation source and allow it to flow back into the evaporation source. The evaporated lithium vapor passes uniformly through the top cover 720. The fifth heater 835, located at the bottom of the evaporation source, is the main heat source for heating the evaporation source. The third heater 833, fourth heater 834, fifth heater 835, sixth heater 836, and seventh heater 837 primarily maintain the uniformity of the internal temperature field of the evaporation source, ensuring a uniform internal temperature of the lithium solution during evaporation.

[0089] It should be noted that the terminology used above is for describing specific embodiments only and is not intended to limit the exemplary embodiments of the present invention. When the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof. The order of execution of actions, steps, etc., in the apparatus and methods shown in the specification and drawings can be implemented in any order unless a specific order is expressly specified, and as long as the output of a previous process is not used in a subsequent process. Similar sequential terms used for ease of description do not imply that such an order must be followed.

[0090] Techniques, methods, and apparatus known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and apparatus should be considered part of the specification. In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters in the following figures denote similar items; therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0091] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A vapor deposition apparatus, characterized in that, include: Evaporation chamber (100); An evaporation source assembly (200) is partially disposed within the vapor deposition chamber (100). The evaporation source assembly (200) includes an evaporation source cavity (210), an evaporation source (260), a gate valve (220), and a vacuum pump (230). The evaporation source cavity (210) is disposed within the vapor deposition chamber (100), and the evaporation source (260) is disposed within the evaporation source cavity (210). The evaporation source cavity (210) is connected to the gate valve (220) and the vacuum pump (230) respectively. The gate valve (220) is used to control the communication and isolation between the vapor deposition chamber (100) and the evaporation source cavity (210). The vacuum pump (230) is used to evacuate the evaporation source cavity (210).

2. The vapor deposition equipment as described in claim 1, characterized in that, The vapor deposition equipment also includes a baffle (400), which is disposed in the evaporation source cavity (210). One end of the evaporation source (260) has an opening, and the baffle (400) is disposed at the opening. The baffle (400) can move relative to the opening to open or close the opening. The baffle (400) has a first cooling channel (410) inside.

3. The vapor deposition equipment as described in claim 2, characterized in that, The vapor deposition equipment includes a first driving member (420), which is disposed in the evaporation source cavity (210). The first driving member (420) is connected to the baffle (400) and is used to drive the baffle (400) to move relative to the opening.

4. The vapor deposition equipment as described in claim 2, characterized in that, The vapor deposition equipment includes a first pulley (510), a second pulley (520), and a slide rail (530). The first pulley (510), the second pulley (520), and the slide rail (530) are all disposed in the evaporation source cavity (210). The first pulley (510) and the second pulley (520) are both connected to the baffle (400). The first pulley (510) and the second pulley (520) are rotatably disposed on the slide rail (530).

5. The vapor deposition equipment as described in claim 1, characterized in that, The vapor deposition equipment includes a lifting mechanism (600), which is disposed inside the evaporation source cavity (210). The lifting mechanism (600) is connected to the evaporation source (260) and is used to drive the evaporation source (260) to move up and down in the vertical direction.

6. The vapor deposition equipment as described in claim 5, characterized in that, The lifting mechanism (600) includes a second driving member (610), a transmission member (620), and a lead screw (630). The drive shaft of the second driving member (610) is connected to the transmission member (620). The transmission member (620) is connected to one end of the lead screw (630). The end of the lead screw (630) away from the transmission member (620) is connected to the evaporation source (260). The lead screw (630) is arranged in a vertical direction.

7. The vapor deposition equipment as described in claim 1, characterized in that, The evaporation source (260) includes a crucible (261), and an inner partition (710) is provided inside the crucible (261) to divide the crucible (261) into multiple evaporation zones.

8. The vapor deposition equipment as described in claim 1, characterized in that, The evaporation source assembly (200) includes a top cover (720), which is disposed inside the evaporation source cavity (210). The top cover (720) covers the top of the evaporation source (260), and the top cover (720) has an arc-shaped structure.

9. The vapor deposition equipment as described in claim 7, characterized in that, The evaporation source (260) includes an insulation plate (810), a heater, and a second cooling channel (820). The heater is located on the inner side of the insulation plate (810), and the second cooling channel (820) is located on the outer side of the insulation plate (810). The insulation board (810) is provided with multiple layers, and the multiple layers of insulation board (810) are staggered.

10. The vapor deposition equipment as described in claim 1, characterized in that, The vapor deposition equipment includes a pull-out assembly (300), on which the evaporation source assembly (200) is disposed. The pull-out assembly (300) is used to drive the evaporation source assembly (200) to move toward or away from the vapor deposition chamber (100).

Images