An automatic calibration method for photolithography models and computer equipment
By automatically adjusting the weights and correction terms of the measurement pattern and dynamically optimizing the parameters of the lithography model, the problem of poor model accuracy and stability caused by reliance on human experience in the existing technology is solved, and efficient lithography model calibration is achieved, improving model accuracy and generalization ability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHENZHEN JINGYUAN INFORMATION TECH CO LTD
- Filing Date
- 2026-04-03
- Publication Date
- 2026-06-02
AI Technical Summary
Existing AI-to-RI calibration technology for lithography models relies on human experience, resulting in poor model accuracy and stability. This makes it difficult to meet the challenges of model complexity and accuracy requirements in advanced processes, and the calibration process is inefficient.
An automated lithography model calibration method is adopted. By iteratively adjusting the weights and correction terms of the measurement pattern, the model parameters are dynamically optimized, achieving automated adjustment of weights and correction terms, eliminating manual dependence, and improving the consistency and reproducibility of the model.
It improved the accuracy and generalization ability of the model, shortened the calibration time and manpower input, ensured the consistency and reproducibility of model development, and improved calibration efficiency and R&D progress.
Smart Images

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