A vacuum processing apparatus
By using vacuum processing equipment to prepare ultra-low refractive index thin films on the surface of lenses, the limitations of material scarcity and chemical preparation methods have been overcome, enabling the high-reliability manufacturing of optical lenses and producing thin films that meet optical performance requirements.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- OPTORUN SHANGHAI CO LTD
- Filing Date
- 2026-02-06
- Publication Date
- 2026-06-05
AI Technical Summary
There is a lack of ultra-low refractive index solid materials in the existing material system. Chemical preparation methods are complex, have weak adhesion and poor compatibility, making it difficult to meet the requirements of mass production and high reliability of optical lenses.
By employing vacuum processing equipment and designing vacuum chambers, loading racks, evaporation source hoods, and vacuum pumping devices, different pressure zones are established to achieve precise control of the vacuum chambers and evaporation source hoods, ensuring the normal operation of the evaporation source device and preparing ultra-low refractive index thin films that meet optical performance requirements.
The method of stably and reliably preparing ultra-low refractive index films on lens surfaces solves the problems of material scarcity and the shortcomings of chemical preparation methods, improves the reliability of the process and the adhesion of the film, and meets the performance requirements of optical lenses.
Smart Images
Figure CN122147244A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of vacuum processing technology, and more particularly to a vacuum processing device. Background Technology
[0002] With the surge in demand for miniaturized, high-quality optical lenses from smart devices, traditional multi-element lenses often face technical problems such as ghosting and glare. Preparing ultra-low refractive index thin films on the lens surface through vacuum processing, and then preparing ultra-low reflectivity anti-reflection films, has become an important way to solve the aforementioned problems.
[0003] However, in the existing material system, there is a lack of ultra-low refractive index (e.g., refractive index of around 1.2) solid materials suitable for the visible and near-infrared bands, which greatly limits the freedom of thin film design and fabrication. In addition, although porous or nanostructured materials can be synthesized by chemical methods to reduce the refractive index to some extent, these methods often face problems such as complex processes, weak adhesion, and low process compatibility, making it difficult to meet the requirements of mass production and high reliability of optical lenses. Summary of the Invention
[0004] The purpose of this invention is to provide a vacuum processing device to solve the problems of the scarcity of ultra-low refractive index solid materials in existing material systems and the complex processes, weak adhesion, and poor compatibility of existing chemical preparation methods. This device enables the preparation of ultra-low refractive index films that meet optical performance requirements on the surface of lenses through a stable and reliable vacuum process.
[0005] To achieve this objective, the present invention adopts the following technical solution: This invention provides a vacuum processing device, comprising: A vacuum chamber, wherein the vacuum chamber is provided with a first exhaust port; A loading rack, rotatably mounted within the vacuum chamber, is used to load the parts to be processed; An evaporation source hood is disposed within the vacuum chamber and located below the loading frame; the interior of the evaporation source hood is connected to the vacuum chamber through a first opening, and the evaporation source hood is provided with a second exhaust port; An evaporation source device, at least a portion of which is disposed within the evaporation source shroud; A vacuum pumping device, at least part of which is located outside the vacuum chamber and connected to the first exhaust port and the second exhaust port; the vacuum pumping device is used to evacuate the vacuum chamber and the evaporation source hood.
[0006] As an alternative to the aforementioned vacuum processing equipment, the first exhaust port is located on the side of the vacuum chamber near the loading frame and is spaced apart from the evaporation source hood in the vertical direction.
[0007] As an alternative to the aforementioned vacuum processing equipment, the vacuum pumping device includes a molecular pump and a regulating valve and a switching valve connected to the molecular pump. The regulating valve is connected to the first exhaust port, and the switching valve is connected to the second exhaust port.
[0008] As an alternative to the aforementioned vacuum processing equipment, the regulating valve is an angle regulating valve.
[0009] As an alternative to the aforementioned vacuum processing equipment, the vacuum processing equipment further includes a heating device located inside the vacuum chamber for heating the interior of the vacuum chamber.
[0010] As an alternative to the aforementioned vacuum processing equipment, the vacuum processing equipment further includes a cooling device located inside the vacuum chamber for cooling the interior of the vacuum chamber.
[0011] As an alternative to the aforementioned vacuum processing equipment, the cooling device includes cooling plates, which are spaced apart above the loading frame.
[0012] As an alternative to the aforementioned vacuum processing equipment, the vacuum processing equipment further includes a louver assembly, which is disposed at the first exhaust port inside the vacuum chamber.
[0013] As an alternative to the aforementioned vacuum processing equipment, the vacuum processing equipment further includes a cold trap device, which is disposed within the vacuum chamber and located between the evaporation source hood and the loading rack.
[0014] As an optional embodiment of the aforementioned vacuum processing equipment, the vacuum processing equipment further includes an ion source shroud and an ion source device at least partially disposed within the ion source shroud. The ion source shroud is disposed within the vacuum chamber and located below the loading frame. The interior of the ion source shroud is connected to the vacuum chamber through a second opening, and the ion source shroud has a third exhaust port. The vacuum pumping device is connected to the third exhaust port and is used to evacuate the interior of the ion source shroud.
[0015] The beneficial effects of this invention are: The vacuum processing equipment includes a vacuum chamber, a loading rack, an evaporation source hood, an evaporation source device, and a vacuum pumping device. The loading rack is rotatably mounted inside the vacuum chamber for loading the workpiece to be processed. The evaporation source hood is located inside the vacuum chamber, below the loading rack, and its interior is connected to the vacuum chamber through a first opening. At least a portion of the evaporation source device is located inside the evaporation source hood, allowing the film material generated by the evaporation source device to move through the first opening to the surface of the workpiece to be processed on the loading rack, thereby performing vacuum coating. The evaporation source hood provides the necessary vacuum environment for the normal operation of the evaporation source device, preventing malfunctions such as abnormal discharges due to excessively low vacuum. The system includes a vacuum chamber with a first exhaust port and an evaporation source hood with a second exhaust port. At least part of the vacuum pumping device is located outside the vacuum chamber, connected to both the first and second exhaust ports. This vacuum pumping device is used to evacuate the interiors of both the vacuum chamber and the evaporation source hood, creating different pressure zones to facilitate the preparation of low-refractive-index thin films. Specifically, a lower vacuum is applied to the vacuum chamber, while a higher vacuum is applied to the evaporation source hood. With the separation provided by the evaporation source hood, the vacuum levels within both the vacuum chamber and the evaporation source hood can be precisely controlled with relatively low difficulty. This effectively maintains a high vacuum near the evaporation source device and a low vacuum near the loading rack, ensuring long-term stability and facilitating the preparation of low-refractive-index thin films on the workpiece. Simultaneously, it ensures the normal operation of the evaporation source device. This vacuum processing equipment can prepare ultra-low refractive-index thin films that meet optical performance requirements on the surface of the workpiece through a stable and reliable vacuum process. This solves the problems of the scarcity of ultra-low refractive-index solid materials in existing material systems and the complexity, weak adhesion, and poor compatibility of existing chemical preparation methods. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the structure of the vacuum processing equipment provided in an embodiment of the present invention; Figure 2 This is a partial structural schematic diagram of the vacuum processing equipment provided in an embodiment of the present invention.
[0017] In the picture: 1. Vacuum chamber; 11. First exhaust port; 2. Loading rack; 31. Evaporation source hood; 311. Second exhaust port; 312. First opening; 32. Evaporation source device; 4. Vacuum pump; 41. Molecular pump; 42. Regulating valve; 43. Switching valve; 5. Heating device; 6. Cooling device; 61. Cooling plate; 7. Louver assembly; 8. Cold trap device; 91. Ion source hood; 911. Third exhaust port; 912. Second opening; 92. Ion source device. Detailed Implementation
[0018] The technical solution of the present invention will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0019] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. The terms "first position" and "second position" refer to two different positions. Furthermore, "above," "on top of," and "over" the first feature in relation to the second feature includes the first feature directly above and diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "under," and "below" the first feature in relation to the second feature includes the first feature directly below and diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.
[0020] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.
[0021] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.
[0022] The technical solution of the present invention will be further described below with reference to the accompanying drawings and specific embodiments.
[0023] like Figure 1 and Figure 2 As shown, the present invention provides a vacuum processing device for coating a workpiece.
[0024] The vacuum processing equipment includes a vacuum chamber 1, a loading rack 2, an evaporation source hood 31, an evaporation source device 32, and a vacuum pumping device 4. The loading rack 2 is rotatably mounted within the vacuum chamber 1 for loading the workpiece to be processed. The evaporation source hood 31 is located within the vacuum chamber 1, below the loading rack 2, and its interior is connected to the vacuum chamber 1 through a first opening 312. At least a portion of the evaporation source device 32 is located within the evaporation source hood 31, allowing the film material generated by the evaporation source device 32 to move through the first opening 312 to the surface of the workpiece to be processed on the loading rack 2 for vacuum coating. The evaporation source hood 31 provides the necessary vacuum environment for the normal operation of the evaporation source device 32, preventing malfunctions such as abnormal discharge due to excessively low vacuum. Optionally, the evaporation source device 32 is an electron gun coating source, and at least a portion of the evaporation source device 32 serves as the electron beam channel for the electron gun coating source.
[0025] The vacuum chamber 1 has a first exhaust port 11, and the evaporation source hood 31 has a second exhaust port 311. At least part of the vacuum pumping device 4 is located outside the vacuum chamber 1 and connected to the first exhaust port 11 and the second exhaust port 311. The vacuum pumping device 4 is used to evacuate the interior of the vacuum chamber 1 and the evaporation source hood 31, thereby establishing different pressure zones to achieve the preparation of low refractive index films. That is, the vacuum chamber 1 is evacuated to a lower vacuum level, and the evaporation source hood 31 is evacuated to a higher vacuum level. With the separation of the evaporation source hood 31, the vacuum levels in the vacuum chamber 1 and the evaporation source hood 31 can be precisely controlled with low control difficulty. It can effectively maintain the long-term stability of the higher vacuum level near the evaporation source device 32 and the lower vacuum level near the loading rack 2, thereby facilitating the preparation of low refractive index films on the workpiece and ensuring the normal operation of the evaporation source device 32. Optionally, at least part of the vacuum pumping device 4 is a vacuum pump body. Compared to the existing technology that sets a partition in the vacuum chamber 1, this embodiment uses an evaporation source cover 31 with a smaller internal space to separate the coating space and the evaporation source space, which helps to reduce the exhaust difficulty of the evaporation source space and improve the exhaust efficiency and exhaust effect.
[0026] This vacuum processing equipment can prepare ultra-low refractive index films that meet optical performance requirements on the surface of the workpiece through a stable and reliable vacuum process. This solves the problems of the scarcity of ultra-low refractive index solid materials in the existing material system, as well as the problems of complex processes, weak adhesion, and poor compatibility of existing chemical preparation methods.
[0027] In some embodiments, the separate vacuum design of the coating space and the evaporation source space in this application maintains a higher working vacuum level in the electron beam channel of the electron gun coating source than in the main body of the vacuum chamber 1. Specifically, the gas pressure in the electron beam channel is maintained at a lower level (e.g., ≤7×10⁻⁶). -2Pa, typical value ~10 -3 The pressure is on the order of Pa, while the pressure in the main chamber containing the part to be processed is at a relatively high level (e.g., ~10 Pa). -1 (On the order of Pa). This pressure gradient is crucial for ensuring stable operation of the electron gun deposition source and preventing abnormal discharges while obtaining low-refractive-index thin films.
[0028] The vacuum processing equipment also includes a louver assembly 7, which is located at the first exhaust port 11 inside the vacuum chamber 1. By adjusting the opening and closing degree of the louver assembly 7, the airflow speed and direction at the first exhaust port 11 can be adjusted, thereby controlling the vacuum level inside the vacuum chamber 1. Simultaneously, the vacuum processing equipment also includes a cold trap device 8, located inside the vacuum chamber 1 between the evaporation source hood 31 and the loading rack 2. The cold trap device 8 actively captures and removes harmful gas molecules and vapors from the vacuum chamber 1 through low-temperature condensation, thereby obtaining a cleaner and more stable high-vacuum environment and ultimately ensuring the coating quality of the workpiece.
[0029] Furthermore, the first exhaust port 11 is located on the side of the vacuum chamber 1 near the loading frame 2 and is arranged vertically at intervals from the evaporation source hood 31. Thus, when the vacuum pumping device 4 evacuates the vacuum chamber 1, it can improve the precise control of the vacuum level in the area near the loading frame 2, so that the area near the loading frame 2 maintains a low vacuum level for a long time, while reducing the impact on the high vacuum level inside the evaporation source hood 31.
[0030] Furthermore, the vacuum pumping device 4 includes a molecular pump 41 and a regulating valve 42 and a switching valve 43 connected to the molecular pump 41. The regulating valve 42 is connected to the first exhaust port 11, and the switching valve 43 is connected to the second exhaust port 311. Thus, the regulating valve 42 and the switching valve 43 can respectively control the vacuuming of the first exhaust port 11 and the second exhaust port 311. That is, when the switching valve 43 is closed and the regulating valve 42 is open, the molecular pump 41 is isolated from the evaporation source hood 31, and the molecular pump 41 evacuates the entire vacuum chamber 1 to a low vacuum level, achieving the required vacuum level in the loading rack 2 area. When the regulating valve 42 is closed and the switching valve 43 is open, the molecular pump 41 is connected to the evaporation source hood 31, allowing the molecular pump 41 to evacuate the evaporation source hood 31 to a high vacuum level, achieving the required vacuum level in the evaporation source device 32. Optionally, the regulating valve 42 is an angle regulating valve 42 gate. The angle regulating valve 42 gate uses a door-type rotary opening and closing mechanism, which has the function of fast pumping speed, facilitating and effectively achieving vacuuming of the vacuum chamber 1. The angle adjustment valve 42 can be set so that the pump port of the molecular pump 41 is as close as possible to the first exhaust port 11, thereby improving the exhaust efficiency.
[0031] Furthermore, the vacuum processing equipment also includes an ion source cover 91 and an ion source device 92 at least partially disposed within the ion source cover 91. The ion source cover 91 is located within the vacuum chamber 1, below the loading frame 2. The interior of the ion source cover 91 is connected to the vacuum chamber 1 through a second opening 912, and the ion source cover 91 has a third exhaust port 911. A vacuum pumping device 4 is connected to the third exhaust port 911 to evacuate the interior of the ion source cover 91, i.e., to achieve a high vacuum level inside the ion source cover 91. This allows the ion source device 92 to perform auxiliary coating or ion cleaning on the workpiece. Simultaneously, the vacuum level within the vacuum chamber 1 and the ion source cover 91 can be precisely controlled due to the separation provided by the ion source cover 91, with relatively low control difficulty. This effectively maintains a high vacuum level near the ion source device 92, ensuring the vacuum level necessary for the normal operation of the ion source device 92. Optionally, the ion source device 92, at least partially disposed within the ion source cover 91, is the ion source body.
[0032] like Figure 2 As shown, the vacuum processing equipment also includes a heating device 5, which is located inside the vacuum chamber 1 and is used to heat the interior of the vacuum chamber 1, thereby maintaining a specific and uniform high-temperature environment in the entire vacuum chamber 1 to facilitate the coating process of the workpiece. Optionally, the heating device 5 is located on the inner wall of the vacuum chamber 1.
[0033] Furthermore, the vacuum processing equipment also includes a cooling device 6, which is located inside the vacuum chamber 1 and is used to cool the interior of the vacuum chamber 1. This allows for the rapid removal of heat generated during the process, controlling and reducing the temperature of the workpiece to be processed, thus meeting the coating process requirements. Specifically, the cooling device 6 includes cooling plates 61, which are spaced apart above the loading rack 2. This provides a good cooling effect on the workpiece on the loading rack 2, improves cooling uniformity, facilitates loose film formation at low temperatures, and rapidly cools the workpiece to improve production efficiency and meet the coating requirements of low refractive index layers.
[0034] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the claims of the present invention.
Claims
1. A vacuum processing device, characterized in that, include: A vacuum chamber (1) is provided with a first exhaust port (11); Loading rack (2), which is rotatably disposed in the vacuum chamber (1) for loading the parts to be processed; An evaporation source cover (31) is disposed inside the vacuum chamber (1) and located below the loading frame (2); the interior of the evaporation source cover (31) is connected to the vacuum chamber (1) through a first opening (312), and the evaporation source cover (31) is provided with a second exhaust port (311); An evaporation source device (32) is at least partially disposed within the evaporation source shroud (31); A vacuum pumping device (4) is provided outside the vacuum chamber (1) and connected to the first exhaust port (11) and the second exhaust port (311); the vacuum pumping device (4) is used to evacuate the interior of the vacuum chamber (1) and the evaporation source cover (31).
2. The vacuum processing equipment according to claim 1, characterized in that, The first exhaust port (11) is located on the side of the vacuum chamber (1) near the loading frame (2) and is spaced apart from the evaporation source hood (31) in the vertical direction.
3. The vacuum processing equipment according to claim 1, characterized in that, The vacuum pumping device (4) includes a molecular pump (41) and a regulating valve (42) and a switching valve (43) connected to the molecular pump (41). The regulating valve (42) is connected to the first exhaust port (11), and the switching valve (43) is connected to the second exhaust port (311).
4. The vacuum processing equipment according to claim 3, characterized in that, The regulating valve (42) is an angle regulating valve (42).
5. The vacuum processing equipment according to claim 1, characterized in that, The vacuum processing equipment also includes a heating device (5), which is located inside the vacuum chamber (1) and is used to heat the inside of the vacuum chamber (1).
6. The vacuum processing equipment according to claim 1, characterized in that, The vacuum processing equipment also includes a cooling device (6), which is located inside the vacuum chamber (1) and is used to cool the inside of the vacuum chamber (1).
7. The vacuum processing equipment according to claim 6, characterized in that, The cooling device (6) includes cooling plates (61) which are spaced apart above the loading frame (2).
8. The vacuum processing equipment according to claim 1, characterized in that, The vacuum processing equipment also includes a louver assembly (7), which is located at the first exhaust port (11) inside the vacuum chamber (1).
9. The vacuum processing equipment according to claim 1, characterized in that, The vacuum processing equipment also includes a cold trap device (8), which is located inside the vacuum chamber (1) between the evaporation source cover (31) and the loading rack (2).
10. The vacuum processing apparatus according to any one of claims 1 to 9, characterized in that, The vacuum processing equipment further includes an ion source cover (91) and an ion source device (92) at least partially disposed within the ion source cover (91). The ion source cover (91) is disposed within the vacuum chamber (1) and located below the loading frame (2). The interior of the ion source cover (91) is connected to the vacuum chamber (1) through a second opening (912), and the ion source cover (91) is provided with a third exhaust port (911). The vacuum pumping device (4) is connected to the third exhaust port (911) and is used to evacuate the interior of the ion source cover (91).