Signal data acquisition method, film layer thickness measurement method and system

By performing equal-time sampling and interpolation in the white light interferometry method, the problem of interference signal distortion caused by uneven moving speed of the scanning mirror was solved, thus improving the accuracy of film thickness measurement.

CN122149337APending Publication Date: 2026-06-05WUHAN EOPTICS TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
WUHAN EOPTICS TECH CO LTD
Filing Date
2024-12-04
Publication Date
2026-06-05

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Abstract

The present disclosure relates to a signal data acquisition method, a film layer thickness measurement method and system. The signal data acquisition method comprises: measuring a film layer structure to be measured based on an interference measurement device, the interference measurement device comprising a scanning mirror, during movement of the scanning mirror, performing equal time interval sampling to obtain original measurement data corresponding to a plurality of optical path sampling points; obtaining a moving speed of the scanning mirror between each two adjacent optical path sampling points; determining an interpolation interval based on the moving speed; and interpolating the original measurement data based on the interpolation interval, so that the optical path between each two adjacent optical path sampling points after interpolation is equal, to obtain target signal data. Through the present disclosure, target signal data with equal optical path sampling can be obtained, and the accuracy of signal data acquisition is improved.
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