A measurement method for improving the measurement stability of a color film column inspection machine

Abstract

This invention provides a measurement method to improve the measurement stability of a color filter columnar inspection machine. The method includes: writing the 1 / 3 pixel substrate size parameters into the inspection machine's system configuration file to form a standardized template; obtaining the length and width of the pixel in the mask design; using the 1 / 3 point of the pixel's length and width as the measurement substrate; using the inspection machine to measure and analyze the graphic position height; and finally outputting the measurement results. By setting the substrate at 1 / 3 of the pixel size, this invention effectively avoids the problems of excessively large reference points being affected by torsion angles or excessively small reference points being affected by light obstruction flow, significantly improving measurement stability and accuracy, while also possessing good cross-machine compatibility and mass production applicability.

Description

Technical Field

[0001] This invention relates to the field of measurement using color Doppler columnar imaging equipment, and more specifically to a measurement method for improving the stability of measurement using color Doppler columnar imaging equipment. Background Technology

[0002] A photocell height measuring machine (PSH) is a device that measures the height of a PS (photocell panel) using white light interference. It mainly consists of a CCD sensor, PZT (piezoelectric ceramic), an interferometric lens, and a spectrometer. Its working principle is as follows: after white light interference, the lens converts the waveform signal into a 3D image, which is then analyzed to determine the position and height of the measured image.

[0003] In the existing technology, the substrate (reference point) design of the color filter columnar inspection machine mostly adopts full-size pixel or random size setting, which has many defects: when the substrate (reference point) is designed to be too large, it is easily affected by the pixel twist angle during the measurement process, resulting in a large deviation in the PS height measurement data; when the substrate (reference point) is designed to be too small, measurement error will be generated due to the light obstruction flow effect, and the error fluctuation range is large, which cannot guarantee the measurement stability.

[0004] Meanwhile, different models of color filter columnar inspection machines differ in parameters such as lens focal length, light source intensity, and platform accuracy. Existing benchmark setting methods lack cross-machine compatibility, resulting in poor consistency of measurement data for the same color filter product across different machines, causing significant challenges to production quality control. Furthermore, existing measurement methods have not undergone systematic screening and verification for different substrate sizes, nor have they been fully validated on mass production lines or confirmed through high-precision comparisons. Remaining only at the laboratory testing stage, they cannot guarantee stability and accuracy in actual mass production environments, potentially leading to abnormal fluctuations in measurement data and significant deviations from actual dimensions, failing to meet the stringent requirements of mass production quality control. Therefore, there is an urgent need for a method that optimizes benchmark design, undergoes comprehensive verification, improves measurement stability and accuracy, and possesses cross-machine compatibility to address the shortcomings of existing technologies. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a measurement method that can improve the measurement stability of color filter columnar inspection machine and is applicable to multiple machine types.

[0006] This invention is achieved as follows: a measurement method for improving the measurement stability of a color Doppler columnar imaging machine, specifically including the following steps: S1. Write the 1 / 3 Pixel substrate size parameter into the system configuration file of the color filter columnar inspection machine to form a standardized substrate setting template; S2. Obtain the length H and width W of the pixel in the mask design information; S3. Base position determination: The base is determined at 1 / 3 of the length H and width W of the pixel. S4. Measurement and Analysis: Use a color filter columnar inspection machine to perform measurements and analyze the position and height of the measured image; S5, Output measurement results.

[0007] Furthermore, the 1 / 3 pixel substrate size is determined through a systematic screening and verification process, which includes: S10, Size Gradient Setting: Based on the pixel design parameters of the target product, set five different levels of base size gradients: full size, 1 / 2, 1 / 3, 1 / 4, and 1 / 5 pixel base size; S20. Single-size stability test: For each size, multiple continuous automatic measurements are performed using the same color filter columnar inspection machine, and candidate sizes are selected based on the statistical dispersion of the measurement data. S30, Multi-substrate stability verification: Perform multi-substrate measurement stability verification on the candidate size; S40. Cross-model compatibility verification and determination of the optimal cross-model size: Select at least 3 different models of color filter columnar inspection machines, use each color filter columnar inspection machine to continuously run the film on the set substrate size according to the preset number of times, and record the PS height measurement data in real time each time; until all set substrate sizes are measured; based on the statistical dispersion of the measurement data, candidate sizes are selected; compare the stability data of the candidate sizes of each model and combine with the verification results obtained from S30 to select the optimal cross-model size as 1 / 3 Pixel substrate size; S50. Mass production line trial run verification: Conduct a mass production line trial run of the optimal dimensions and verify the stability of the measurement data of the optimal dimensions in the mass production line. S60. Accuracy Confirmation: Compare the measurement data of the optimal size of the color filter columnar inspection machine, which has been verified through mass production line trial runs, with the measurement data of the scanning electron microscope (SEM) to confirm whether the deviation is within the allowable range; if yes, proceed to the next step; otherwise, return to S10 to re-screen and verify. S70, Reference point solidification: The 1 / 3 pixel base size confirmed in step S60 is taken as the optimal base size, and its parameters are written into the machine system configuration file to form a standardized reference point setting template.

[0008] Furthermore, step S20 specifically includes the following steps: S21. Perform lens focal length, light source intensity and platform level calibration on the color filter columnar inspection machine to ensure that the initial measurement conditions are consistent. S22. For each substrate size, fix the same standard substrate to the machine, switch to automatic substrate running mode, perform continuous substrate running according to the preset number of times, and record the PS height measurement data in real time each time; until all set substrate size measurements are completed; S23. Calculate the coefficient of variation of the dataset corresponding to each size, and select the size with a coefficient of variation ≤ 0.5% as the candidate size.

[0009] Furthermore, step S30 specifically includes: using three standard substrates from different batches for the same candidate size to perform continuous wafer runs for a preset number of times, observing the stability of different substrates, and verifying the consistency of data stability.

[0010] Furthermore, step S50 specifically includes: performing a mass production line trial run on the optimal size according to a preset time limit, recording measurement data daily, and verifying the stability of the measurement data of the optimal size on the mass production line.

[0011] Further, step S60 specifically includes: measuring and recording the determined optimal size using a scanning electron microscope (SEM), and comparing it with the measurement data from a color filter columnar inspection machine to confirm that the deviation is ≤0.002µm and the coefficient of variation is ≤0.3%.

[0012] The present invention has the following advantages: 1. Scientific and comprehensive verification process: This invention sets up a multi-dimensional and full-process verification system, including single-size wafer testing, multi-substrate cross-verification, multi-machine compatibility verification, mass production line trial testing, and SEM accuracy comparison confirmation. It comprehensively investigates the impact of factors such as substrate size, substrate batch, machine model, and mass production environment on measurement stability and accuracy, ensuring the reliability, applicability, and high accuracy of the optimal substrate size.

[0013] 2. Dual improvement in measurement stability and accuracy: By designing the substrate to a 1 / 3 pixel size, this invention fundamentally solves the problems of excessively large reference points being affected by torsion angles and excessively small reference points being affected by light obstruction flow. Combined with mass production line trial runs and high-precision SEM comparison, the measurement variation coefficient is further controlled within 0.3%, and the deviation from SEM data is ≤0.002μm, achieving a dual breakthrough in measurement stability and accuracy.

[0014] 3. Strong cross-machine compatibility: Through multi-machine compatibility verification and cross-machine parameter adaptation, the optimal substrate size determined by this invention can be applied to different models of color filter columnar inspection machines, realizing the consistency of measurement data across machines and reducing the difficulty of production quality control.

[0015] 4. Guaranteed mass production applicability: This invention adds a mass production line trial run verification step, which fully considers the complex working conditions of the actual mass production environment, ensuring that the optimal substrate size has continuous and stable measurement performance in the mass production scenario, avoiding the problem of disconnect between laboratory testing and mass production application, and improving the practical application value of the method. Attached Figure Description

[0016] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0017] Figure 1 This is a flowchart of the measurement method of the present invention.

[0018] Figure 2 This is a flowchart of the 1 / 3 pixel size screening and verification process of the present invention.

[0019] Figure 3 This is a schematic diagram of the full-size measurement results of the present invention.

[0020] Figure 4 This is a schematic diagram of the measurement results of the 1 / 2 Pixel substrate size of the present invention.

[0021] Figure 5 This is a schematic diagram of the measurement results of the 1 / 3 Pixel substrate size of the present invention.

[0022] Figure 6 This is a schematic diagram of the measurement results of the 1 / 4 Pixel substrate size of the present invention.

[0023] Figure 7 This is a schematic diagram of the measurement results of the 1 / 5 Pixel substrate size of the present invention. Detailed Implementation

[0024] refer to Figures 1 to 7 As shown, this embodiment provides a measurement method to improve the measurement stability of a color Doppler columnar imaging machine, specifically including the following steps: S1. Write the 1 / 3 Pixel substrate size parameter into the system configuration file of the color filter columnar inspection machine to form a standardized substrate setting template; S2. Obtain the length H and width W of the pixel in the mask design information; S3. Base position determination: The base is determined at 1 / 3 of the pixel length H and width W. S4. Measurement and Analysis: Use a color filter columnar inspection machine to perform measurements and analyze the position and height of the measured image; S5, Output measurement results.

[0025] The 1 / 3 pixel substrate size was determined through the following systematic screening and verification process, specifically including: S10, Size Gradient Setting: Based on the pixel design parameters of the target product (such as opening size and corner characteristics), set five different levels of base size gradients for full-size, 1 / 2, 1 / 3, 1 / 4, and 1 / 5 pixel base sizes; S20. Single-size stability test: For each size, multiple continuous automatic measurements are performed using the same color filter columnar inspection machine. Candidate sizes are selected based on the statistical dispersion of the measurement data. The specific operation is as follows: S21. Perform lens focal length, light source intensity and platform level calibration on the color filter columnar inspection machine to ensure that the initial measurement conditions are consistent. S22. For each substrate size, fix the same standard substrate to the machine, switch to automatic substrate running mode, perform 1000 consecutive substrate running cycles, and record the PS height measurement data in real time for each cycle; until all set substrate size measurements are completed. S23. Calculate the coefficient of variation of the dataset corresponding to each size, and select the size with a coefficient of variation ≤ 0.5% as the candidate size.

[0026] S30. Multi-substrate stability verification: For the same candidate size, three standard substrates from different batches are used to perform 1000 consecutive runs to observe the stability of different substrates and verify the consistency of data stability.

[0027] S40. Cross-model compatibility verification and determination of the optimal cross-model size: Select at least three different models of color filter columnar inspection machines, and use each machine to perform 1000 consecutive runs on the set substrate size, recording the PS height measurement data in real time for each run; continue until all set substrate sizes have been measured; candidate sizes are selected based on the statistical dispersion of the measurement data; compare the stability data of the candidate sizes for each model with the verification results obtained from S30, and select the optimal cross-model size as a 1 / 3 pixel substrate size; measurement results are as follows. Figures 3 to 7 As shown, after testing on multiple models, it was found that when the base size is full size, the deviation value is mostly affected by the torsion angle. Figure 3 Occasional jitter occurs when the base size is 1 / 2 pixel. Figure 4 When the base size is 1 / 4 pixel, the data fluctuations are affected by fluidity. Figure 6 When the substrate size is 1 / 5 pixel, the substrate is too small to recognize many zero values. Figure 7 ); however, measurements are more accurate at a 1 / 3 pixel substrate size. Figure 5 This can effectively avoid the problems of measuring too much torsion angle with too many reference points, and having large errors due to light obstruction flow when the reference point is too small.

[0028] S50, Mass Production Line Trial Run Verification: A 7-day mass production line trial run was conducted on the optimal size, with 500 sets of measurement data recorded daily to verify the stability of the measurement data for the optimal size on the mass production line. The 1 / 3 Pixel base size was verified.

[0029] S60. Accuracy Confirmation: Measure the determined optimal size using a scanning electron microscope (SEM) and record 150-200 sets of data. Compare this data with the measurement data from a color Doppler columnar sectioning machine. The measurement data from the color Doppler columnar sectioning machine is 2.528 μm, while the SEM measurement data is 2.530 μm. The confirmed deviation is ≤0.002 μm, and the coefficient of variation is ≤0.3%. S70, Reference point solidification: The 1 / 3 pixel base size confirmed in step S60 is taken as the optimal base size, and its parameters are written into the machine system configuration file to form a standardized reference point setting template.

[0030] While specific embodiments of the present invention have been described above, those skilled in the art should understand that the specific embodiments described are merely illustrative and not intended to limit the scope of the invention. Equivalent modifications and variations made by those skilled in the art in accordance with the spirit of the invention should be covered within the scope of protection of the claims of the present invention.

Claims

1. A measurement method for improving the measurement stability of a color Doppler columnar imaging system, characterized in that: Specifically, the following steps are included: S1. Write the 1 / 3 Pixel substrate size parameter into the system configuration file of the color filter columnar inspection machine to form a standardized substrate setting template; S2. Obtain the length H and width W of the pixel in the mask design information; S3. Base position determination: The base is determined at 1 / 3 of the length H and width W of the pixel. S4. Measurement and Analysis: Use a color filter columnar inspection machine to perform measurements and analyze the position and height of the measured image; S5, Output measurement results.

2. The measurement method for improving the measurement stability of a color Doppler columnar imaging machine according to claim 1, characterized in that: The 1 / 3 pixel substrate size was determined through a systematic screening and verification process, which included: S10, Size Gradient Setting: Based on the pixel design parameters of the target product, set five different levels of base size gradients: full size, 1 / 2, 1 / 3, 1 / 4, and 1 / 5 pixel base size; S20. Single-size stability test: For each size, multiple continuous automatic measurements are performed using the same color filter columnar inspection machine, and candidate sizes are selected based on the statistical dispersion of the measurement data. S30, Multi-substrate stability verification: Perform multi-substrate measurement stability verification on the candidate size; S40. Cross-model compatibility verification and determination of the optimal cross-model size: Select at least 3 different models of color filter columnar inspection machines, use each color filter columnar inspection machine to continuously run the film on the set substrate size according to the preset number of times, and record the PS height measurement data in real time each time; until all set substrate sizes are measured; based on the statistical dispersion of the measurement data, candidate sizes are selected; compare the stability data of the candidate sizes of each model and combine with the verification results obtained from S30 to select the optimal cross-model size as 1 / 3 Pixel substrate size; S50. Mass production line trial run verification: Conduct a mass production line trial run of the optimal dimensions and verify the stability of the measurement data of the optimal dimensions in the mass production line. S60. Accuracy Confirmation: Compare the measurement data of the optimal size of the color filter columnar inspection machine, which has been verified through mass production line trial runs, with the measurement data of the scanning electron microscope (SEM) to confirm whether the deviation is within the allowable range; if yes, proceed to the next step; otherwise, return to S10 to re-screen and verify. S70, Reference point solidification: The 1 / 3 pixel base size confirmed in step S60 is taken as the optimal base size, and its parameters are written into the machine system configuration file to form a standardized reference point setting template.

3. The measurement method for improving the measurement stability of a color Doppler columnar imaging machine according to claim 2, characterized in that: Step S20 specifically includes the following steps: S21. Perform lens focal length, light source intensity and platform level calibration on the color filter columnar inspection machine to ensure that the initial measurement conditions are consistent. S22. For each substrate size, fix the same standard substrate to the machine, switch to automatic substrate running mode, perform continuous substrate running according to the preset number of times, and record the PS height measurement data in real time each time; until all set substrate size measurements are completed; S23. Calculate the coefficient of variation of the dataset corresponding to each size, and select the size with a coefficient of variation ≤ 0.5% as the candidate size.

4. The measurement method for improving the measurement stability of a color Doppler columnar imaging machine according to claim 2, characterized in that: Step S30 specifically includes: using three standard substrates from different batches for the same candidate size, performing continuous wafer runs for a preset number of times, observing the stability of different substrates, and verifying the consistency of data stability.

5. The measurement method for improving the measurement stability of a color Doppler columnar imaging machine according to claim 2, characterized in that: Step S50 specifically includes: performing a mass production line trial run on the optimal size according to a preset time limit, recording measurement data daily, and verifying the stability of the measurement data of the optimal size on the mass production line.

6. The measurement method for improving the measurement stability of a color Doppler columnar imaging machine according to claim 2, characterized in that: Step S60 specifically includes: measuring and recording the determined optimal size using a scanning electron microscope (SEM), and comparing it with the measurement data from a color filter columnar inspection machine to confirm that the deviation is ≤0.002µm and the coefficient of variation is ≤0.3%.

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