Mask design method and device thereof, and storage medium

Abstract

A mask design method, apparatus, and storage medium are disclosed. The mask design method includes: obtaining a mask design to be subdivided, the mask design including: an adjacent array pattern group and an epitaxial pattern group, wherein the patterns in the array pattern group are arranged in a periodic array; subdividing the array pattern group to obtain a repeating pattern set and a subdivision scheme for the repeating pattern set; obtaining a subdivision scheme for the epitaxial pattern group based on the repeating pattern set and the subdivision scheme for the repeating pattern set; and subdividing the mask design to be subdivided based on the subdivision scheme for the repeating pattern set and the subdivision scheme for the epitaxial pattern group to obtain multiple sub-mask designs. Obtaining the subdivision scheme for the epitaxial pattern group based on the repeating pattern set and the subdivision scheme for the repeating pattern set obtained by subdividing the array pattern group can effectively improve the periodicity in the subdivision scheme of the array pattern group, and can create a periodic environment where the patterns at the edge positions of the array pattern group are the same as or similar to the patterns at the center positions, which is beneficial for expanding the process window and improving exposure quality.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing, and in particular to a mask design method and apparatus, and a storage medium. Background Technology

[0002] Immersion lithography machines can provide resolution within a preset range. For example, a 193nm immersion lithography machine with a resolution of 1.35nm can provide half-pitch resolution in the range of 36nm to 40nm. As the critical dimensions of semiconductor devices continue to shrink, the density of patterns on masks is becoming increasingly larger, far exceeding the limits that can be handled by a single exposure. To adapt to technological advancements, multi-patterning (MP) technology has been introduced. This involves splitting the original pattern originally set on a single mask into multiple sub-masks, ensuring that the critical dimension (CD) and pitch of the pattern on each sub-mask meet the process manufacturing capabilities.

[0003] Regular periodic patterns mainly refer to structures in a real chip composed of repeated regular periodic unit cells. Typical examples include Static Random-Access Memory (SRAM), some standard cells, EMAtestkeys, and test patterns for most important diffractive optical elements (DOEs).

[0004] These types of patterns are crucial indicators for evaluating production line process capabilities and are also important parameters for assessing whether products meet shipment standards, directly impacting yield. Therefore, in production and R&D processes, these patterns often have higher requirements for process precision, more stringent mean-to-target (MTT) tolerance ranges, and higher requirements for critical dimension uniformity (CDU). Continuous optimization of these patterns has always been a key issue for improving yield.

[0005] However, in actual manufacturing processes, the regular periodic pattern formed by multi-pattern exposure technology often fails to meet technical requirements and has a small process window. Summary of the Invention

[0006] The problem addressed by this invention is how to improve the quality of regular periodic patterns formed by multi-pattern exposure technology and expand the process window.

[0007] To address the above problems, this invention provides a mask design method, comprising:

[0008] A mask design to be split is obtained, comprising: an adjacent array pattern group and an extension pattern group, wherein the patterns in the array pattern group are arranged in a periodic array; the array pattern group is split to obtain a repeating pattern set and a splitting scheme for the repeating pattern set; a splitting scheme for the extension pattern group is obtained based on the repeating pattern set and the splitting scheme for the repeating pattern set; the mask design to be split is split according to the splitting scheme for the repeating pattern set and the splitting scheme for the extension pattern group to obtain multiple sub-mask designs.

[0009] Optionally, the step of obtaining the splitting scheme of the extended graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set includes: performing an edge graphic splitting operation at least once; wherein the edge graphic splitting operation includes: obtaining a graphic group to be split; obtaining an extended edge graphic subgroup and an edge unit graphic set based on the graphic group to be split and the repeating graphic set, wherein the extended edge graphic subgroup is located at the edge position closest to the array graphic group in the graphic group to be split, and the extended edge graphic subgroup includes: at least one edge unit graphic set, the distribution range of the graphics in the edge unit graphic set is consistent with the distribution range of the graphics in the repeating graphic set; obtaining the splitting scheme of the edge unit graphic set based on the repeating graphic set and the splitting scheme of the repeating graphic set; obtaining the splitting scheme of the extended edge graphic subgroup based on the splitting scheme of all the edge unit graphic sets; the step of obtaining the splitting scheme of the extended graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: obtaining the splitting scheme of the extended graphic group based on the splitting scheme of all the extended edge graphic subgroups.

[0010] Optionally, in the step of obtaining the mask design to be split, the direction of the line connecting the array pattern group and the extension pattern group is the row direction; in the step of obtaining the extension edge pattern subgroup and the edge unit pattern set according to the pattern group to be split and the repeating pattern set, the extension edge pattern subgroup includes: multiple edge unit pattern sets, the multiple edge unit pattern sets are arranged along the column direction, and the column direction is perpendicular to the row direction.

[0011] Optionally, in the step of obtaining the splitting scheme of the extended graphic group based on the repeated graphic set and the splitting scheme of the repeated graphic set, the edge graphic splitting operation is performed at least twice; in the step of obtaining the graphic group to be split during the second execution of the edge graphic splitting operation, the graphics in the extended graphic group other than the extended edge graphic subgroup are taken as the graphic group to be split during the previous execution of the edge graphic splitting operation.

[0012] Optionally, in the step of obtaining the graphic group to be split during the first edge graphic splitting operation, the extended graphic group is used as the graphic group to be split.

[0013] Optionally, the step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: after performing the edge graphic splitting operation at least once, obtaining the remaining graphic subgroup, wherein the graphics in the remaining graphic subgroup are the graphics in the extensional graphic group other than the graphics in all the extensional edge graphic subgroups; obtaining the splitting scheme of the remaining graphic subgroup; and in the step of obtaining the splitting scheme of the extensional graphic group based on the splitting scheme of all edge unit graphic sets, the splitting scheme of the extensional graphic group is obtained based on the splitting scheme of all edge unit graphic sets and the splitting scheme of the remaining graphic subgroup.

[0014] Optionally, in the step of obtaining the splitting scheme of the remaining graphic subgroup, the graphics in the remaining graphic subgroup are randomly split to obtain the splitting scheme of the remaining graphic subgroup.

[0015] Optionally, the step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: dividing the extensional graphic group into arrays based on the repeating graphic set to obtain a unit graphic set; in the edge graphic splitting operation, in the step of obtaining the extensional edge graphic subgroup based on the graphic group to be split and the repeating graphic set, the unit graphic set closest to the arrayed graphic group is taken as the edge unit graphic set.

[0016] Optionally, the step of obtaining the splitting scheme of the edge unit graphic set based on the repeating graphic set and the splitting scheme of the repeating graphic set includes: dividing the graphics in the edge unit graphic set according to the repeating graphic set to obtain divided graphics, wherein the divided graphics correspond to a graphic position in the repeating graphic set, and the divided graphics are the same as the corresponding graphic; obtaining the splitting scheme of the divided graphics according to the splitting scheme of the corresponding graphics; and obtaining the splitting scheme of the edge unit graphic set according to the splitting scheme of all the divided graphics.

[0017] Optionally, in the step of obtaining the divided graphics, the divided graphics and the corresponding graphics overlap at least in the row direction.

[0018] Optionally, the step of dividing the graphics in the edge unit graphics set according to the repeating graphics set includes: aligning the repeating graphics set and the edge unit graphics set to obtain a first divided graphics, wherein the first divided graphics completely overlap with the position of the corresponding graphics.

[0019] Optionally, in the step of obtaining the first divided graphic, a remaining graphic is also obtained, wherein the remaining graphic is a set of edge unit graphics other than the first divided graphic; the step of dividing the graphics in the set of edge unit graphics according to the set of repeated graphics further includes: offset comparison between the set of repeated graphics and the remaining graphic to obtain a second divided graphic, wherein the second divided graphic overlaps with the corresponding graphic in the row direction but does not overlap in the column direction.

[0020] Optionally, in the step of obtaining the second scribed graphic, the distance between the second scribed graphic and the corresponding graphic in the column direction is minimized.

[0021] Optionally, in the step of dividing the graphics in the edge unit graphic set, residual graphics are also obtained, wherein the residual graphics are graphics in the edge unit graphic set other than the divided graphics; the step of obtaining a splitting scheme for the edge unit graphic set based on the set of repeated graphics and the splitting scheme of the set of repeated graphics further includes: randomly splitting the residual graphics to obtain a splitting scheme for the residual graphics; in the step of obtaining a splitting scheme for the edge unit graphic set based on the splitting schemes of all the divided graphics, the splitting scheme for the edge unit graphic set is obtained based on the splitting schemes of all the divided graphics and the splitting scheme of the residual graphics.

[0022] Optionally, in the step of obtaining the mask design to be split, the array pattern group includes: a central pattern subgroup and an array edge pattern subgroup, wherein the array edge pattern subgroup is located between the central pattern subgroup and the outer pattern group; the mask design method further includes: splitting the array edge pattern subgroup to obtain a splitting scheme for the array edge pattern subgroup; in the step of splitting the mask design to be split to obtain multiple sub-mask designs, the mask design to be split is split according to the splitting scheme of the repeating pattern set, the splitting scheme of the array edge pattern subgroup, and the splitting scheme of the outer pattern group to obtain multiple sub-mask designs.

[0023] Optionally, in the step of obtaining the mask design to be split, the extended graphic group includes at least one of: connecting graphics and virtual graphics.

[0024] Accordingly, the present invention also provides a mask design apparatus, comprising:

[0025] The module includes an acquisition module adapted to acquire a mask design to be split, the mask design comprising: an adjacent array of patterns and an extensional pattern group, wherein the patterns in the array of patterns are arranged in a periodic array; a scheme module comprising: a first scheme unit adapted to split the array of patterns to acquire a set of repeating patterns and a splitting scheme for the repeating patterns; a second scheme unit adapted to acquire a splitting scheme for the extensional pattern group based on the set of repeating patterns and the splitting scheme for the repeating patterns; and a splitting module adapted to split the mask design to be split based on the splitting scheme for the set of repeating patterns and the splitting scheme for the extensional pattern group to acquire multiple sub-mask designs.

[0026] Optionally, the array pattern group includes: a central pattern subgroup and an array edge pattern subgroup, wherein the array edge pattern subgroup is located between the central pattern subgroup and the outer pattern group; the scheme module further includes: a third scheme unit, wherein the third scheme unit is adapted to obtain a splitting scheme for the array edge pattern subgroup; the splitting module splits the mask design to be split according to the splitting scheme of the repeating pattern set, the splitting scheme of the array edge pattern subgroup and the splitting scheme of the outer pattern group, to obtain multiple sub-mask designs.

[0027] In addition, the present invention also provides a storage medium, which is a computer storage medium storing a computer program thereon, the computer program being executed by a processor to implement the steps of the mask design method of the present invention.

[0028] Compared with the prior art, the technical solution of the present invention has the following advantages:

[0029] In the technical solution of the present invention, the repetitive pattern set and the repetitive pattern set splitting scheme obtained by splitting the array pattern group are used to obtain the splitting scheme of the epitaxial pattern group. This can effectively improve the periodicity in the splitting scheme of the array pattern group, and can create a periodic environment where the pattern at the edge position of the array pattern group is the same as or similar to the pattern at the center position. This is beneficial to the expansion of the process window and the improvement of exposure quality. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of a mask design.

[0031] Figure 2 yes Figure 1 A schematic diagram of the breakdown scheme for the mask design shown;

[0032] Figure 3 This is a flowchart illustrating an embodiment of the mask design method of the present invention;

[0033] Figure 4 This is a schematic diagram of the structure of the mask design to be disassembled obtained in one embodiment of the mask design method of the present invention;

[0034] Figure 5 This is a schematic diagram of the decomposition scheme of the central graphic subgroup and the array edge graphic subgroup obtained in one embodiment of the mask design method of the present invention;

[0035] Figure 6 This is a flowchart illustrating the steps of obtaining the decomposition scheme of the epitaxial pattern group in one embodiment of the mask design method of the present invention;

[0036] Figure 7 This is a flowchart illustrating the edge splitting operation in one embodiment of the mask design method of the present invention;

[0037] Figure 8 This is a schematic diagram of the structure of obtaining the extended edge graphic subgroup and the edge unit graphic set in one embodiment of the mask design method of the present invention;

[0038] Figure 9 This is a flowchart illustrating the steps of obtaining the splitting scheme of the edge unit graphic set in one embodiment of the mask design method of the present invention;

[0039] Figure 10 This is a schematic diagram of the splitting scheme of the first divided pattern obtained in one embodiment of the mask design method of the present invention;

[0040] Figure 11 and Figure 12 This is a schematic diagram of each step in obtaining the splitting scheme of the second divided pattern in one embodiment of the mask design method of the present invention;

[0041] Figure 13 This is a schematic diagram of a splitting scheme for obtaining the epitaxial pattern group in one embodiment of the mask design method of the present invention;

[0042] Figure 14 This is a functional block diagram of an embodiment of the mask design device of the present invention. Detailed Implementation

[0043] As can be seen from the background technology, the regular periodic patterns formed by the existing multi-pattern exposure technology often have the problem of an excessively small process window.

[0044] The following principles should be considered when decomposing regular periodic patterns: 1. Maintain a balanced density of critical patterns to reduce etch loading and planarization loading; 2. Maintain a single periodic environment for critical patterns as much as possible to obtain controllable convergent critical dimension error (CD error).

[0045] However, in the actual map, such as Figure 1 and Figure 2 As shown, the array center of a periodic pattern can be divided into a dense periodic environment, but the array edge of a periodic pattern can only be divided into a non-periodic environment with one side being dense and the other side being iso. This poses a significant challenge to etching load, planarization load, and critical dimensional errors. In actual processes, the probability of process problems occurring at the array edge of a regular periodic pattern is far greater than at the array center.

[0046] To improve the process issues at the edges and center of the array of periodic patterns, there are two existing methods: one is to optimize the etching and planarization processes to minimize the load difference between uniform and isolated patterns, but theoretically, this load difference cannot be completely eliminated; the other method is to perform critical dimension compensation, which involves measuring the semiconductor structure formed by the split mask to collect data. Through a large amount of measurement data, patterns whose critical dimensions do not meet the technical requirements are identified and compensated one by one. This method is time-consuming and labor-intensive, and requires the fabrication of masks and the consumption of wafers, so the cost is also very high.

[0047] Figure 1 This is a mask design for an SRAM device array. The mask design includes: an array pattern group 11 and an epitaxial pattern group 12 that are adjacent to each other. The patterns in the array pattern group 11 are arranged in a periodic array, and the patterns in the epitaxial pattern group 12 are isolated patterns.

[0048] The patterns in the array pattern group 11 are suitable for forming the memory array of an SRAM device, and the patterns in the epitaxial pattern group 12 are suitable for forming the pick-up structure or dummy structure in an SRAM device.

[0049] The patterns in the array pattern group 11 have very high process requirements for critical dimensions. If a pattern has a problem, the entire memory cell or even multiple memory cells connected to the problematic pattern will fail. In contrast, the patterns of the connecting structure and the virtual structure in the epitaxial pattern group 12 have a more relaxed design and a larger process window, making them less prone to pattern problems.

[0050] Figure 2 It shows Figure 1 The mask design shown is a splitting scheme in which graphics with the same border color are set in the same sub-mask design, and graphics with different border colors are set in different sub-mask designs.

[0051] Generally speaking, when splitting a mask design with regular periodic patterns, the splitting of the array pattern group 11 and the splitting of the peripheral pattern group 12 are independent of each other: the splitting of the array pattern group 11 will try to ensure its periodicity and uniformity, so that in each sub-mask design obtained by splitting, the patterns in the central pattern sub-group 11c have a periodic environment with uniform distribution as much as possible.

[0052] Specifically, such as Figure 1 As shown, the array pattern group 11 includes a central pattern subgroup 11c and an edge pattern subgroup 11e. The central pattern subgroup 11c is located at the array center of the array pattern group 11, and the edge pattern subgroup 11e is located at the array edge of the array pattern group 11. The edge pattern subgroup 11e is located between the central pattern subgroup 11c and the extended pattern group 12, and is adjacent to both the central pattern subgroup 11c and the extended pattern group 12.

[0053] like Figure 2 As shown, in the mask design splitting scheme, the central graphic subgroup 11c is divided into a periodically distributed set of repeating graphics 11ca. The central graphic subgroup 11c is split according to the splitting scheme of the repeating graphics set 11ca. Therefore, in each sub-mask design obtained by splitting, the graphics in the central graphic subgroup 11c still have a uniformly distributed periodic environment. However, the peripheral graphic group 12 is split according to a random principle. In each sub-mask design obtained by splitting, the graphics and their distribution in the peripheral graphic group 12 have considerable randomness.

[0054] In the process of splitting the mask design, for the graphics in the array graphic group 11, the splitting starts from the center. That is, according to the splitting scheme of the repeating graphic set 11ca, the graphics in the central graphic subgroup 11c and the edge graphic subgroup 11e are split one after another.

[0055] When splitting to the edge pattern subgroup 11e, the pattern of the edge pattern subgroup 11e may only have part of the pattern of the repeating pattern set 11ca. However, the edge pattern subgroup 11e will still be split according to the splitting scheme of the repeating pattern set 11ca. Therefore, in each sub-mask design obtained by splitting, the pattern in the edge pattern subgroup 11e can maintain a relatively uniform periodic environment on the side of the pattern close to the center pattern subgroup 11c. However, the periodicity of the pattern far from the center pattern subgroup 11c will be broken, forming an isolated environment with uneven pattern density and non-periodicity. This poses a great challenge to etching load, planarization load and critical dimension error.

[0056] To solve the aforementioned technical problem, the present invention provides a mask design method, comprising:

[0057] A mask design to be split is obtained, comprising: an adjacent array pattern group and an extension pattern group, wherein the patterns in the array pattern group are arranged in a periodic array; the array pattern group is split to obtain a repeating pattern set and a splitting scheme for the repeating pattern set; a splitting scheme for the extension pattern group is obtained based on the repeating pattern set and the splitting scheme for the repeating pattern set; the mask design to be split is split according to the splitting scheme for the repeating pattern set and the splitting scheme for the extension pattern group to obtain multiple sub-mask designs.

[0058] The technical solution of this invention obtains a splitting scheme for the epitaxial pattern group by splitting the array pattern group into repeating pattern sets and a splitting scheme for the repeating pattern sets. This can effectively improve the periodicity in the splitting scheme of the array pattern group, and can create a periodic environment where the pattern at the edge position of the array pattern group is the same as or similar to the pattern at the center position. This is beneficial for expanding the process window and improving the exposure quality.

[0059] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0060] refer to Figure 3 The diagram shows a flowchart of an embodiment of the mask design method of the present invention.

[0061] The mask design method includes:

[0062] Step S110: Obtain the mask design to be split, which includes: an array pattern group and an extension pattern group that are adjacent to each other, wherein the patterns in the array pattern group are arranged in a periodic array.

[0063] Step S120: Split the array of graphics to obtain a set of repeating graphics and a splitting scheme for the set of repeating graphics.

[0064] Step S130: Obtain the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set.

[0065] Step S140: According to the splitting scheme of the repeating pattern set and the splitting scheme of the extension pattern group, split the mask design to be split to obtain multiple sub-mask designs.

[0066] The technical solution of the mask design method embodiment described below is explained in detail with reference to the accompanying drawings.

[0067] Reference Figure 4 The mask design method includes: step S110, obtaining the mask design to be split 200.

[0068] Specifically, step S110, the step of obtaining the mask design 200 to be split, includes: obtaining the GDS (Geometry Summary Data) file of the mask design 200 to be split. The GDS file is used to define the three-dimensional structure and electrical characteristics of the chip, and the GDS file contains geometric data about the chip structure, shape, and hierarchy.

[0069] like Figure 4 As shown, the mask design 200 to be split includes: an array pattern group 210 and an extension pattern group 220 that are adjacent to each other, wherein the patterns in the array pattern group 220 are arranged in a periodic array. Specifically, the array pattern group 210 is suitable for forming an array-distributed structure; the extension pattern group 220 is suitable for forming a structure surrounding the array-distributed structure.

[0070] In some embodiments, in the step of obtaining the mask design to be split, the direction of the line connecting the array pattern group 210 and the extension pattern group 220 is the row direction x. For example... Figure 4 As shown, the array pattern group 210 and the extension pattern group 220 are arranged adjacent to each other along the row direction x.

[0071] In some examples, in step S110, the step of obtaining the mask design 200 to be split, the array pattern group 210 includes: storage patterns; the epitaxial pattern group includes at least one of: pick-up patterns and dummy patterns. The storage patterns are used to form a storage array in a storage device (e.g., SRAM), the pick-up patterns are suitable for forming connection structures, and the dummy patterns are suitable for forming virtual structures that do not have electrical effects and only function during the manufacturing process.

[0072] In some embodiments of the present invention, in the step of obtaining the mask design to be split, the array pattern group includes: a central pattern subgroup and an array edge pattern subgroup, wherein the array edge pattern subgroup is located between the central pattern subgroup and the peripheral pattern group. Therefore, the central pattern subgroup is located at the center of the array pattern group, and the array edge pattern subgroup is located at the edge of the array pattern group.

[0073] Continue to refer to Figure 3 Combined with reference Figure 5 After obtaining the mask design to be split, the mask design method further includes: step S120, splitting the array pattern group 210 to obtain the repeating pattern set 213 and the splitting scheme of the repeating pattern set 213.

[0074] The repeating graphic set 213 is the repeating unit of the array graphic group 210. The graphics of multiple repeating graphic sets 213 are repeatedly arranged along the row direction x and the column direction y to form the array graphic group 210. The array graphic group 210 is a regular periodic graphic.

[0075] In some embodiments, the step of splitting the array of graphics 210 includes obtaining the repeating graphic set 213 based on the graphics and their distribution in the array of graphics 210. For example, in the step of obtaining the repeating graphic set 213, the repeating graphic set 213 is obtained based on the graphics and their distribution in the array of graphics, combined with design rules.

[0076] In some embodiments, the step of splitting the array pattern group 210 begins from the array center position of the array pattern group 210. Specifically, based on the pattern and its distribution at the array center position of the array pattern group 210, the repeating pattern set 213 is obtained; the array pattern group 210 is divided according to the repeating pattern set 213 to obtain the central pattern subgroup 211 and the array edge pattern subgroup 212, wherein the pattern of the central pattern subgroup 211 is the pattern that can be divided into a complete repeating pattern set 213; the array edge pattern subgroup 212 includes the patterns in the array pattern group 210 other than the central pattern subgroup 211. Therefore, the pattern of the array edge pattern subgroup 212 is the pattern that cannot be divided into a complete repeating pattern set 213.

[0077] After obtaining the repeating graphic set 213, the step of obtaining the repeating graphic set 213 and the splitting scheme of the repeating graphic set 213 further includes: obtaining the splitting scheme of the repeating graphic set 213 based on the repeating graphic set 213.

[0078] During the design and manufacturing process, regular periodic patterns are rarely changed, so they are often the same across different products. In some embodiments, a database can be established by accumulating and summarizing the splitting schemes of regular periodic patterns. In the step of obtaining the splitting scheme of the repeating pattern set 213, the splitting scheme of the repeating pattern set 213 is obtained by querying the database, thereby improving the mask design speed and reducing the computational load.

[0079] In some embodiments of the present invention, the array pattern group 210 includes: a central pattern subgroup 211 and an array edge pattern subgroup 212; the mask design method further includes: step S150, splitting the array edge pattern subgroup 212 to obtain a splitting scheme for the array edge pattern subgroup 212.

[0080] In order to maintain the periodicity and uniformity of the graphics in the sub-mask design after splitting, in some embodiments, the splitting scheme of the repeating graphics set 213 is obtained based on the splitting scheme of the array edge graphics subgroup 212 in the step of obtaining the splitting scheme of the repeating graphics set 213.

[0081] For example, in the step of obtaining the splitting scheme of the repeating pattern set 213 based on the splitting scheme of the array edge pattern subgroup 212, the splitting scheme of the pattern on the side of the array edge pattern subgroup 212 away from the central pattern subgroup 211 is kept as consistent as possible with the splitting scheme of the pattern on the same side in the repeating pattern set 213.

[0082] For example, in the step of obtaining the splitting scheme of the repeating pattern set 213, the pattern 212a on the side of the array edge pattern subgroup 212 away from the center pattern subgroup 211 and the pattern 213a on the same side of the repeating pattern set 213 are split into the same submask design (e.g., Figure 5 (All are indicated by red borders).

[0083] Continue to refer to Figure 3 After obtaining the repeating pattern set and the splitting scheme of the repeating pattern set, the mask design method further includes: step S130, obtaining the splitting scheme of the extension pattern group 220 according to the repeating pattern set 213 and the splitting scheme of the repeating pattern set 213.

[0084] The array pattern group 210 is composed of the repeating pattern set 213 arranged in an array. Therefore, splitting the array pattern group 210 based on the splitting scheme of the repeating pattern set 213 can effectively ensure the periodicity and uniformity of the patterns in each sub-mask design after splitting, and can effectively guarantee the process window. According to the repeating pattern set and the splitting scheme of the repeating pattern set obtained by splitting the array pattern group, the epitaxial pattern group is targeted to be cut and split, artificially constructing a pattern environment with higher periodicity and uniformity. This can effectively improve the periodicity in the splitting scheme of the array pattern group, and can construct a periodic environment for the patterns at the edge positions of the array pattern group that is the same as or similar to the patterns at the center positions. This is beneficial to expanding the process window and improving the exposure quality.

[0085] like Figure 6 As shown, in some embodiments of the present invention, step S130, which is to obtain the splitting scheme of the extensional graphic group 220 according to the repeating graphic set and the splitting scheme of the repeating graphic set, includes: performing step S131, the edge graphic splitting operation, at least once.

[0086] like Figure 7 As shown, step S131, the edge graphic splitting operation includes: step S131a, obtaining a graphic group to be split; step S131b, obtaining an extended edge graphic subgroup and an edge unit graphic set based on the graphic group to be split and the repeating graphic set, wherein the extended edge graphic subgroup is located at the edge position closest to the array graphic group in the graphic group to be split, and the extended edge graphic subgroup includes: at least one edge unit graphic set, the distribution range of the graphics in the edge unit graphic set is consistent with the distribution range of the graphics in the repeating graphic set; step S131c, obtaining a splitting scheme for the edge unit graphic set based on the repeating graphic set and the splitting scheme of the repeating graphic set; step S131d, obtaining a splitting scheme for the extended edge graphic subgroup based on the splitting scheme of all the edge unit graphic sets.

[0087] The edge graphic splitting operation is suitable for obtaining a splitting scheme for the portion of graphics closest to the array graphic group 210 in the graphic group to be split. In the edge graphic splitting operation, based on the repeating graphic set, the graphics of the portion of the outer graphic group 220 closest to the array graphic group 210 are artificially and specifically cut, and the splitting scheme of the edge unit graphic set is obtained according to the splitting scheme of the repeating graphic set. This makes the graphics and distribution of the portion of the outer graphic group 220 closest to the array graphic group as similar as possible to the graphics and distribution of the repeating graphic set, and makes the splitting scheme of the portion of the outer graphic group 220 closest to the array graphic group as similar as possible to the splitting scheme of the graphics in the repeating graphic set. In this way, a more periodic and uniform environment is artificially constructed for the graphics at the edge position of the array graphic group 210, thereby expanding the process window of the graphics at the edge position of the array graphic group 210.

[0088] Reference Figure 8 In some embodiments, during the first execution of step S131, step S131a in the edge graphic splitting operation, in the step of obtaining the graphic group 221 to be split, the extended graphic group 220 is used as the graphic group 221 to be split.

[0089] In some embodiments, in step S110, the step of obtaining the mask design to be split, the direction of the line connecting the array pattern group 210 and the extension pattern group 220 is the row direction x; referring to reference Figure 8 In step S131b, the step of obtaining the outer edge graphic subgroup 222 and the edge unit graphic set 223 based on the graphic group to be split 221 and the repeating graphic set 213a, the outer edge graphic subgroup 222 includes: a plurality of edge unit graphic sets 223, the plurality of edge unit graphic sets 223 are arranged along the column direction y, and the column direction y is perpendicular to the row direction x.

[0090] like Figure 8 As shown, step S131b, which involves obtaining the outer edge graphic subgroup 222 and the edge unit graphic set 223 based on the graphic group to be split 221 and the repeating graphic set 213a, includes: cutting out the outer edge graphic subgroup 222 from the graphic group to be split 221 based on the repeating graphic set 213; and dividing the outer edge graphic subgroup 222 based on the repeating graphic set 213 to obtain multiple edge unit graphic sets 223 arranged along the column direction y.

[0091] Specifically, in the step of cutting out the outer edge graphic subgroup 222 from the graphic group 221 to be split according to the repeating graphic set 213, the outer edge graphic subgroup 222 is cut out from the graphic group 221 to be split according to the first size L1 of the repeating graphic set 213; therefore, the first size L2 of the outer edge graphic subgroup 222 is equal to the first size L1 of the repeating graphic set 213, where the first size refers to the size along the row direction x.

[0092] It should be noted that in the step of cutting out the outer edge graphic subgroup 222 from the graphic group to be split 221, the graphic of the outer edge graphic subgroup 222 is a graphic or part of a graphic in the region where the edge of the graphic group to be split 221 near the array graphic group 210 is taken as one side edge, and the size along the row direction x is equal to the first size L1 of the repeating graphic set 213.

[0093] like Figure 8 As shown, in the step of cutting out the outer edge graphic subgroup 222 from the graphic group 221 to be split according to the repeating graphic set 213, the outer edge graphic subgroup 222 is cut from the graphic group 221 to be split according to the first size L1 of the repeating graphic set 213. The graphics in the outer edge graphic subgroup 222 are the parts of the graphics in the graphic group 221 to be split located in the region of the outer edge graphic subgroup 222. Figure 8 The middle section is filled with a diagonal line pointing downwards to the left.

[0094] After cutting out the extended edge graphic subgroup 222, the extended edge graphic subgroup 222 is divided to obtain multiple edge unit graphic sets 223 arranged along the column direction y. In this step, the extended edge graphic subgroup 222 is divided into multiple edge unit graphic sets 223 according to the second size W1 of the repeating graphic set 213. Therefore, the second size W2 of the multiple edge unit graphic sets 223 are all equal and are all equal to the second size W1 of the repeating graphic set 213, where the second size refers to the size along the column direction y.

[0095] It should be noted that in the step of dividing the extended edge graphic subgroup 222, the obtained edge unit graphic set 223 corresponds to the row or column of the repeating graphic set 213 in the array graphic group 210.

[0096] like Figure 8As shown, the repeating graphic set 213 in the array graphic group 210 is arranged in an array; the extended graphic group 220 is located on one side of the array graphic group 210 along the row direction x; in the step of dividing the extended edge graphic subgroup 222, the obtained edge unit graphic set 223 corresponds to the repeating graphic set 213 in the array graphic group 210 in the row direction x, that is, any obtained edge unit graphic set 223 is in the same row as a row of repeating graphic set 213 in the array graphic group 210.

[0097] In other embodiments, the extended graphic group is located on one side of the array graphic group along the column direction; in the step of dividing the extended edge graphic subgroup, the obtained edge unit graphic set corresponds to the repeating graphic set in the array graphic group in the column direction, that is, any obtained edge unit graphic set is in the same column as a repeating graphic set in the array graphic group.

[0098] It should also be noted that the graphic group 221 to be split is obtained from the extended graphic group 220. The graphics and their distribution in the extended graphic group 220 do not have obvious periodicity. Therefore, in step S131b, which obtains the extended edge graphic subgroup 222 and the edge unit graphic set 223 based on the graphic group 221 to be split and the repeating graphic set 213a, the different edge unit graphic sets 223 obtained only have the same graphic distribution range. The graphics and their distribution in the different edge unit graphic sets 223 are not necessarily the same. That is, the distribution range of the graphics in the different edge unit graphic sets 223 is equal along the first dimension and the second dimension. The graphics and their distribution in the different edge unit graphic sets 223 can be the same or different.

[0099] Continue to refer to Figure 7 After obtaining the edge unit graphic set, step S131, the edge graphic splitting operation further includes: step S131c, obtaining the splitting scheme of the edge unit graphic set according to the repeating graphic set and the splitting scheme of the repeating graphic set.

[0100] Based on the repeating graphic set and its splitting scheme, the graphics in the edge unit graphic set are cut and divided, and then split, so that the obtained graphics and their distribution and splitting scheme in the edge unit graphic set are closer to the graphics and their distribution and splitting scheme in the repeating graphic set. In the edge unit graphic set, it is believed that an environment similar to the repeating graphic set is constructed.

[0101] like Figure 9As shown, in some embodiments of the present invention, step S131c, obtaining the splitting scheme of the edge unit graphic set according to the repeating graphic set and the splitting scheme of the repeating graphic set, includes: step S1311, dividing the graphics in the edge unit graphic set according to the repeating graphic set to obtain the divided graphics, wherein the divided graphics correspond to a graphic position in the repeating graphic set, and the divided graphics are the same as the corresponding graphic; step S1312, obtaining the splitting scheme of the divided graphics according to the splitting scheme of the corresponding graphics; step S1315, obtaining the splitting scheme of the edge unit graphic set according to the splitting scheme of all the divided graphics.

[0102] In step S1311, the graphics in the edge unit graphic set are divided to obtain divided graphics. This involves further segmenting the graphics in the edge unit graphic set so that the divided graphics are identical to the graphics corresponding to the positions in the repeating graphic set. Specifically, "identical to the graphics corresponding to the positions in the repeating graphic set" means that the divided graphics and the graphics corresponding to the positions in the repeating graphic set have the same shape and equal area.

[0103] Specifically, the correspondence between the divided graphic and a graphic in the set of repeating graphics means that the divided graphic and a graphic in the set of repeating graphics overlap at least in the row direction x. That is, in some embodiments, in the step of obtaining the divided graphic, the divided graphic and the corresponding graphic overlap at least in the row direction x. Wherein, position overlap means that the relative position of the divided graphic in the edge unit graphic set is the same as the relative position of the corresponding graphic in the set of repeating graphics.

[0104] For example, the division of the graphic and its correspondence with the graphic in the set of repeating graphics can be obtained through graphic alignment and graphic comparison.

[0105] In some embodiments, such as Figure 9 As shown, step S1311, the step of dividing the graphics in the edge unit graphics set according to the repeating graphics set, includes: as follows Figure 10 As shown, in step S11a, the repeating graphic set 213 and the edge unit graphic set 223 are aligned to obtain the first divided graphic 224. Figure 10 (As shown in the sparse point filling), the first divided graphic 224 completely overlaps with the position of the corresponding graphic.

[0106] Specifically, in the step of aligning the repeating graphic set 213 and the edge unit graphic set 223, at least one first divided graphic 224 is obtained. The first divided graphic 224 is the portion of the graphic in the edge unit graphic set 223 that is aligned with the graphic in the repeating graphic set 213. Therefore, the first divided graphic 224 and the corresponding graphic in the repeating graphic set 213 not only have the same shape and area, but also completely overlap in position. That is, the first divided graphic 224 overlaps in both the row direction (x) and column direction (y).

[0107] In some embodiments, step S11a, aligning the repeating graphic set 213 and the edge unit graphic set 223, cannot completely divide the graphics in the edge unit graphic set 223, i.e., as... Figure 9 and Figure 10 As shown, in step S11a, after obtaining the first divided shape 224, step S11c is also executed to obtain the remaining shape 225 (e.g., ...). Figure 10 (As shown by the diagonal line filling from the middle to the lower left), the remaining graphic 225 is the graphic of the edge unit graphic set 223 other than the first divided graphic 224.

[0108] like Figure 9 As shown, in some embodiments, step S1311, the step of dividing the graphics in the edge unit graphics set 223 according to the repeating graphics set 213, further includes: as Figure 11 and Figure 12 As shown, in step S11b, the repeated graphic set 213 and the remaining graphic 225 are offset and compared to obtain the second divided graphic 226. The second divided graphic 226 overlaps with the corresponding graphic in the row direction x, but does not overlap in the column direction y.

[0109] Specifically, in the step of offset comparison between the repeated graphic set 213 and the remaining graphic 225, at least one second divided graphic 224 is obtained. The second divided graphic 224 is the part of the graphic that overlaps with the corresponding graphic in the row direction x, but does not overlap in the column direction y. For example, in step S11b, in the step of obtaining the second divided graphic 226, the distance between the second divided graphic 226 and the corresponding graphic in the column direction y is the smallest.

[0110] For example, the step of offsetting and comparing the repeated graphic set 213 and the remaining graphic set 225 includes: aligning the repeated graphic set 213 and the edge unit graphic set 223, and then offsetting the repeated graphic set 213 and the edge unit graphic set 223 relative to each other along the column direction y; for example Figure 11As shown, after aligning the repeating graphic set 213 and the edge unit graphic set 223, the repeating graphic set 213 is offset upward along the column direction y relative to the edge unit graphic set 223 until the remaining graphic 225 and the repeating graphic set 213 are aligned; the part of the remaining graphic 225 that is aligned with the offset repeating graphic set 213 is the second divided graphic 226.

[0111] For example, the step of offsetting and comparing the repeated graphic set 213 and the remaining graphic set 225 further includes: aligning the repeated graphic set 213 and the edge unit graphic set 223, and then offsetting the repeated graphic set 213 and the edge unit graphic set 223 relative to each other along the column direction y to the other side; for example Figure 12 As shown, after aligning the repeating graphic set 213 and the edge unit graphic set 223, the repeating graphic set 213 is offset downwards relative to the edge unit graphic set 223 along the column direction y until the remaining graphic 225 and the repeating graphic set 213 are aligned; the part of the remaining graphic 225 that is aligned with the offset repeating graphic set 213 is the second divided graphic 226.

[0112] It should be noted that different edge unit graphic sets 223 only have the same graphic distribution range. The graphics and their distribution in different edge unit graphic sets 223 are not necessarily the same. However, in step S1311, the step of dividing the graphics in the edge unit graphic set is based on the repeating graphic set. Therefore, in step S1311, the step of dividing the graphics in the edge unit graphic set according to the repeating graphic set to obtain the divided graphics, the graphics and distribution of the divided graphics obtained by different edge unit graphic sets 223 are the same, but the number of divided graphics obtained by different edge unit graphic sets 223 is not necessarily the same.

[0113] Continue to refer to Figure 9 After obtaining the divided graphics, step S131c, the step of dividing the repeated graphics set and the division scheme of the repeated graphics set, further includes: step S1312, obtaining the division scheme of the divided graphics according to the division scheme of the corresponding graphics.

[0114] In step S1312, the step of obtaining the splitting scheme of the divided graphics, the splitting scheme of the corresponding divided graphics is obtained by using the splitting scheme of the graphics in the repeating graphics set 213.

[0115] For example, in step S1312, the step of obtaining the splitting scheme of the divided graphics, the splitting scheme of each of the first divided graphics 224 is obtained by taking the splitting scheme of the portion aligned with the graphics of the repeating graphics set 213; as Figure 10 As shown, the border color of each first divided graphic 224 is the same as the border color of the graphic aligned portion of the repeated graphic set 213.

[0116] For example, in step S1312, the step of obtaining the splitting scheme of the divided graphics, the splitting scheme of each of the second divided graphics 224 is obtained by using the splitting scheme of the portion aligned with the graphics of the offset repeating graphics set 213; as Figure 11 As shown, the border color of a portion of the second divided graphic 226 is consistent with the border color of the graphic aligned portion of the repeated graphic set 213 after being offset upwards, such as... Figure 12 As shown, the border color of part of the second divided graphic 226 is the same as the border color of the graphic aligned part of the repeated graphic set 213 after being offset downwards.

[0117] Continue to refer to Figure 9 After obtaining all the partitioning schemes of the divided graphics, step S131c, the step of obtaining the partitioning scheme of the edge unit graphics set according to the repeated graphics set and the partitioning scheme of the repeated graphics set, further includes: step S1315, obtaining the partitioning scheme of the edge unit graphics set according to all the partitioning schemes of the divided graphics.

[0118] like Figures 10 to 12 In some embodiments shown, the graphics in the edge unit graphics set are completely divided into the first divided graphics 224 and the second divided graphics 226, that is, the first divided graphics 224 and the second divided graphics 226 can completely constitute the graphics in the edge unit graphics set.

[0119] Specifically, in step S1315, the step of obtaining the splitting scheme of the edge unit graphic set, all the splitting schemes of the divided graphics are integrated to obtain the splitting scheme of the edge unit graphic set. For example, in step S1315, the step of obtaining the splitting scheme of the edge unit graphic set, all the first divided graphics 224 (such as...) are integrated... Figure 10 The splitting scheme shown) and all second-divided figures 226 (as shown) Figure 11 and Figure 12 The splitting scheme of the edge unit graphics set is obtained by using the splitting scheme shown in the figure.

[0120] In other embodiments of the present invention, the division of the graphics in the edge unit graphics set according to the repeating graphics set is not complete. That is, the graphics in the edge unit graphics set cannot be completely divided into the first divided graphics and the second divided graphics, i.e., the first divided graphics and the second divided graphics cannot completely constitute the graphics in the edge unit graphics set.

[0121] like Figure 9 As shown, in some embodiments, in or after step S1311, which involves dividing the graphics in the edge unit graphic set, step S1313 is further performed to obtain residual graphics, wherein the residual graphics are graphics in the edge unit graphic set other than the divided graphics; step S131c, which involves obtaining a splitting scheme for the edge unit graphic set based on the set of repeated graphics and the splitting scheme of the set of repeated graphics, further includes: step S1314, which involves randomly splitting the residual graphics to obtain a splitting scheme for the residual graphics; and step S1315, which involves obtaining a splitting scheme for the edge unit graphic set based on the splitting schemes of all the divided graphics, wherein the splitting scheme for the edge unit graphic set is obtained based on the splitting schemes of all the divided graphics and the splitting scheme of the residual graphics.

[0122] Continue to refer to Figure 7 Step S131, the edge graphics splitting operation further includes: after obtaining the splitting scheme of the edge unit graphics set, executing step S131d, obtaining the splitting scheme of the extended edge graphics subgroup according to the splitting scheme of all the edge unit graphics sets.

[0123] like Figure 8 In some embodiments shown, in step S131b, the step of obtaining the extended edge graphic subgroup and the edge unit graphic set, the extended edge graphic subgroup 222 includes: a plurality of the edge unit graphic sets 223; therefore, in step S131d, the step of obtaining the splitting scheme of the extended edge graphic subgroup 222, the splitting schemes of all the edge unit graphic sets 223 are integrated to obtain the splitting scheme of the extended edge graphic subgroup 222.

[0124] As mentioned above, the graphics of the extended edge graphic subgroup 222 are only graphics or parts of graphics within a region whose dimensions along the row direction x are equal to the first size L1 of the repeating graphic set 213, with the edge of the graphic group 221 to be split near the array graphic group 210 as one side edge. That is, after each execution of step S131 and the edge graphic splitting operation, the splitting scheme of the extended edge graphic subgroup 222 obtained is only a splitting scheme of graphics or parts of graphics within a region whose dimensions along the row direction x are equal to the first size L1 of the repeating graphic set 213, with the edge of the graphic group 221 to be split near the array graphic group 210 as one side edge.

[0125] In some embodiments of the present invention, the first dimension L3 of the extensional pattern group 220 (e.g., Figure 8 The size L1 of the repeating graphic set 213 is greater than the first size L1 of the repeating graphic set 213. Therefore, in step S130, the step of obtaining the splitting scheme of the extension graphic group according to the repeating graphic set and the splitting scheme of the repeating graphic set, step S131, the edge graphic splitting operation is executed at least twice. In the process of the second execution of step S131, the edge graphic splitting operation, in step S131a, the step of obtaining the graphic group to be split, the graphics in the extension graphic group other than the extension edge graphic subgroup 222 in the previous execution of the edge graphic splitting operation are taken as the graphic group to be split.

[0126] Specifically, in step S130, which involves obtaining the splitting scheme of the extended graphic group 210 based on the repeated graphic set and its splitting scheme, each execution of step S131, the edge graphic splitting operation, yields a splitting scheme for an extended edge graphic subgroup 222, wherein the first size L2 of the extended edge graphic subgroup 222 is equal to the first size L1 of the repeated graphic set 213; step S131, the edge graphic splitting operation, is executed at least twice until the entire graphic distribution range of the extended graphic group 210 is traversed by the edge graphic splitting operation, and the sum of the first sizes L1 of all extended edge graphic subgroups 222 equals the first size of the extended graphic group 210.

[0127] It should be noted that, since the distribution of graphics in the extended graphic group 220 is not periodic, at least two execution steps S131 are performed. During the edge graphic splitting operation, the extended edge graphic subgroups 222 obtained in different edge graphic splitting operations are only equal in their first size L1, and are all equal in their first size L1 to the repeated graphic set 213; the graphics and their distributions of the extended edge graphic subgroups 222 obtained in different edge graphic splitting operations can be the same or different (e.g., Figure 13As shown); the splitting schemes of the extended edge graphic subgroups 222 obtained in different edge graphic splitting operations can be the same or different (e.g. Figure 13 (As shown).

[0128] It should also be noted that in some embodiments, the edge graphic splitting operation is performed at least twice by executing step S131 until the entire graphic distribution range of the extended graphic group 210 is traversed by the edge graphic splitting operation; the graphics within the range of the extended graphic group 210 are split one by one, and the extended edge graphic subgroup and the edge unit graphic set are obtained each time step S131 is executed.

[0129] In some other embodiments of the present invention, step S130, obtaining the splitting scheme of the extensional graphic group according to the repeating graphic set and the splitting scheme of the repeating graphic set, further includes: step S135, dividing the extensional graphic group into arrays according to the repeating graphic set to obtain a unit graphic set; in the edge graphic splitting operation, in the step of obtaining the extensional edge graphic subgroup according to the graphic group to be split and the repeating graphic set, the unit graphic set closest to the arrayed graphic group is taken as the edge unit graphic set.

[0130] Specifically, in step S135, the step of dividing the extended graphic group into arrays according to the repeating graphic set to obtain a unit graphic set involves dividing the extended graphic group into arrays according to the first and second dimensions of the repeating graphic set to obtain the unit graphic set. The first and second dimensions of any obtained unit graphic set are equal to the first and second dimensions of the repeating graphic set, respectively.

[0131] Continue to refer to Figure 6 In some embodiments, step S130, obtaining the splitting scheme of the extensional graphic group 220 based on the repeating graphic set 213 and the splitting scheme of the repeating graphic set 213, further includes step S134, obtaining the splitting scheme of the extensional graphic group 220 based on the splitting scheme of all the extensional edge graphic subgroups 222.

[0132] Specifically, in step S134, the step of obtaining the splitting scheme of the extensional graphic group 220 based on the splitting scheme of all the extensional edge graphic subgroups 222, integrates the splitting schemes of all the extensional edge graphic subgroups 222 to obtain the splitting scheme of the extensional graphic group 220.

[0133] like Figure 6As shown, in some embodiments, step S130, obtaining the splitting scheme of the extensional graphic group 210 based on the repeating graphic set 213 and the splitting scheme of the repeating graphic set 213, further includes: after performing the edge graphic splitting operation at least once, performing step S132 to obtain the remaining graphic subgroup, wherein the graphics in the remaining graphic subgroup are the graphics in the extensional graphic group other than the graphics in all the extensional edge graphic subgroups; step S133, obtaining the splitting scheme of the remaining graphic subgroup; and step S134, obtaining the splitting scheme of the extensional graphic group based on the splitting scheme of all edge unit graphic sets, wherein the splitting scheme of the extensional graphic group is obtained based on the splitting scheme of all edge unit graphic sets and the splitting scheme of the remaining graphic subgroup.

[0134] In some embodiments, step S131 is executed at least once, and the edge graphic splitting operation does not completely split the extended graphic group 220. That is, some graphics in the extended graphic group 220 do not belong to any of the extended edge graphic subgroups 222. In step S132, the remaining graphic subgroups include some graphics in the extended graphic group 220 that do not belong to any of the extended edge graphic subgroups 222.

[0135] After obtaining the remaining graphic subgroups, step S133 is executed to obtain the splitting scheme of the remaining graphic subgroups. For example, in step S133, the graphics in the remaining graphic subgroups are randomly split to obtain the splitting scheme of the remaining graphic subgroups.

[0136] It should be noted that, in some embodiments of the present invention, in the step of executing step S132 to obtain the remaining graphic subgroup, the remaining graphic subgroup includes the part of the graphics in the extension graphic group 220 that does not belong to any of the extension edge graphic subgroups 222.

[0137] In other embodiments of the present invention, step S130, obtaining the splitting scheme of the extended graphic group according to the repeated graphic set and the splitting scheme of the repeated graphic set, includes: performing an edge graphic splitting operation once; performing an edge graphic splitting operation once to obtain an extended edge graphic subgroup and its splitting scheme; in step S132, obtaining the remaining graphic subgroup, the remaining graphic subgroup includes some graphics in the extended graphic group that do not belong to the extended edge graphic subgroup, that is, the remaining graphic subgroup also includes graphics in the extended graphic group other than the graphics in the edge graphic group.

[0138] Continue to refer to Figure 3After obtaining the splitting scheme of the extended pattern group, the mask design method further includes: step S140, splitting the mask design to be split according to the splitting scheme of the repeating pattern set and the splitting scheme of the extended pattern group to obtain multiple sub-mask designs.

[0139] In some embodiments, such as Figure 4 As shown, the array pattern group 210 includes: a central pattern subgroup 211 and an array edge pattern subgroup 212; in step S140, the mask design to be split to obtain multiple sub-mask designs is split according to the splitting scheme of the repeating pattern set 213, the splitting scheme of the array edge pattern subgroup 212 and the splitting scheme of the extension pattern group 220 to obtain multiple sub-mask designs.

[0140] Specifically, in step S140, the step of splitting the mask design to be split to obtain multiple sub-mask designs, the center graphic subgroup 211, the array edge graphic subgroup 212, and the outer graphic group 220 are split according to the splitting scheme of the repeating graphic set 213, the splitting scheme of the array edge graphic subgroup 212, and the splitting scheme of the outer graphic group 220, respectively, to obtain multiple sub-mask designs.

[0141] Accordingly, the present invention also provides a mask design device.

[0142] refer to Figure 14 The diagram shows a functional block diagram of an embodiment of the mask design apparatus of the present invention.

[0143] The mask design device includes:

[0144] The acquisition module 310 is adapted to acquire a mask design to be split, the mask design to be split including: an array of adjacent pattern groups and an extension pattern group, wherein the patterns in the array pattern group are arranged in a periodic array; the scheme module 320 includes: a first scheme unit 321, the first scheme unit 321 being adapted to split the array pattern group to obtain a set of repeating patterns and a splitting scheme for the repeating pattern set; a second scheme unit 322, the second scheme unit 322 being adapted to obtain a splitting scheme for the extension pattern group based on the set of repeating patterns and the splitting scheme for the repeating pattern set; and a splitting module 330, the splitting module 330 being adapted to split the mask design to be split according to the splitting scheme for the set of repeating patterns and the splitting scheme for the extension pattern group to obtain multiple sub-mask designs.

[0145] In some embodiments of the present invention, the mask design apparatus is suitable for performing the mask design method of the present invention. Therefore, the specific technical solution of the mask design apparatus can be referred to the aforementioned embodiments of the mask design method, and will not be repeated here.

[0146] In some embodiments of the present invention, the array pattern group includes: a central pattern subgroup and an array edge pattern subgroup, wherein the array edge pattern subgroup is located between the central pattern subgroup and the extended pattern group; the scheme module 320 further includes: a third scheme unit 323, wherein the third scheme unit 323 is adapted to obtain a splitting scheme for the array edge pattern subgroup; the splitting module 330 splits the mask design to be split according to the splitting scheme of the repeating pattern set, the splitting scheme of the array edge pattern subgroup and the splitting scheme of the extended pattern group, to obtain multiple sub-mask designs.

[0147] Furthermore, the present invention also provides a storage medium. The storage medium is a computer storage medium storing a computer program thereon, which is executed by a processor to implement the steps of the mask design method of the present invention.

[0148] In summary, the repetitive pattern set and the repetitive pattern set splitting scheme obtained by splitting the array pattern group can effectively improve the periodicity in the splitting scheme of the array pattern group. It can create a periodic environment where the pattern at the edge position of the array pattern group is the same as or similar to the pattern at the center position, which is beneficial to the expansion of the process window and the improvement of exposure quality.

[0149] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A mask design method, characterized in that, include: Obtain a mask design to be split, the mask design to be split includes: an array pattern group and an extension pattern group that are adjacent to each other, wherein the patterns in the array pattern group are arranged in a periodic array. The array of graphics is split to obtain a set of repeating graphics and a splitting scheme for the set of repeating graphics; Based on the repeating graphic set and the splitting scheme of the repeating graphic set, the splitting scheme of the extension graphic group is obtained; Based on the splitting scheme of the repeating pattern set and the splitting scheme of the extension pattern group, the mask design to be split is split to obtain multiple sub-mask designs.

2. The mask design method as described in claim 1, characterized in that, The step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set includes: performing the edge graphic splitting operation at least once; The edge graphic splitting operation includes: Obtain the group of graphics to be split; Based on the group of graphics to be split and the set of repeating graphics, an outer edge graphic subgroup and an edge unit graphic set are obtained, wherein the outer edge graphic subgroup is located at the edge position closest to the array graphic group in the group of graphics to be split, and the outer edge graphic subgroup includes: at least one set of edge unit graphics, and the distribution range of the graphics in the edge unit graphic set is consistent with the distribution range of the graphics in the set of repeating graphics. Based on the repeating pattern set and the splitting scheme of the repeating pattern set, the splitting scheme of the edge unit pattern set is obtained; Based on the splitting scheme of all the edge unit graphics sets, the splitting scheme of the extended edge graphics subgroup is obtained; The step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: obtaining the splitting scheme of the extensional graphic group based on the splitting scheme of all the extensional edge graphic subgroups.

3. The mask design method as described in claim 2, characterized in that, In the step of obtaining the mask design to be split, the direction of the line connecting the array pattern group and the extension pattern group is the row direction; In the step of obtaining the extended edge graphic subgroup and the edge unit graphic set based on the graphic group to be split and the repeating graphic set, the extended edge graphic subgroup includes: multiple edge unit graphic sets, the multiple edge unit graphic sets are arranged along the column direction, and the column direction is perpendicular to the row direction.

4. The mask design method as described in claim 2, characterized in that, In the step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set, the edge graphic splitting operation is performed at least twice. In the next step of obtaining the graphic group to be split during the edge graphic splitting operation, the graphics in the extended graphic group other than the extended edge graphic subgroup in the previous edge graphic splitting operation are taken as the graphic group to be split.

5. The mask design method as described in claim 2, characterized in that, In the first step of performing edge graphic splitting operation, the outer graphic group is used as the graphic group to be split during the step of obtaining the graphic group to be split.

6. The mask design method as described in claim 2, characterized in that, The step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: After performing the edge graphic splitting operation at least once, a remaining graphic subgroup is obtained. The graphics in the remaining graphic subgroup are the graphics in the extended graphic group other than the graphics in all the extended edge graphic subgroups. Obtain the splitting scheme for the remaining graphic subgroups; In the step of obtaining the splitting scheme of the extensional graphic group based on the splitting scheme of all edge unit graphic sets, the splitting scheme of the extensional graphic group is obtained based on the splitting scheme of all edge unit graphic sets and the splitting scheme of the remaining graphic subgroups.

7. The mask design method as described in claim 6, characterized in that, In the step of obtaining the splitting scheme of the remaining graphic subgroup, the graphics in the remaining graphic subgroup are randomly split to obtain the splitting scheme of the remaining graphic subgroup.

8. The mask design method as described in claim 2, characterized in that, The step of obtaining the splitting scheme of the extensional graphic group based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: Based on the repeating pattern set, the extensional pattern group is divided into arrays to obtain a unit pattern set; In the edge graphic splitting operation, in the step of obtaining the extended edge graphic subgroup based on the graphic group to be split and the repeating graphic set, the unit graphic set closest to the array graphic group is used as the edge unit graphic set.

9. The mask design method as described in claim 2, characterized in that, The step of obtaining the splitting scheme of the edge unit graphic set based on the repeating graphic set and the splitting scheme of the repeating graphic set includes: Based on the set of repeating graphics, the graphics in the set of edge unit graphics are divided to obtain divided graphics. The divided graphics correspond to a graphic position in the set of repeating graphics, and the divided graphics are the same as the corresponding graphic. Based on the corresponding graphic's partitioning scheme, obtain the partitioning scheme of the partitioned graphic; Based on the splitting schemes of all the described partitioned graphics, the splitting scheme of the edge unit graphics set is obtained.

10. The mask design method as described in claim 9, characterized in that, In the step of obtaining the divided graphic, the divided graphic and the corresponding graphic overlap at least in the row direction.

11. The mask design method as described in claim 10, characterized in that, The step of dividing the graphics in the edge unit graphics set according to the repeating graphics set includes: Align the repeating graphic set and the edge unit graphic set to obtain a first divided graphic, wherein the first divided graphic completely overlaps with the position of the corresponding graphic.

12. The mask design method as described in claim 11, characterized in that, In the step of obtaining the first partitioned graphic, a remaining graphic is also obtained, wherein the remaining graphic is a set of edge unit graphics other than the first partitioned graphic; The step of dividing the graphics in the edge unit graphics set according to the repeating graphics set further includes: The set of repeated graphics and the remaining graphics are offset and compared to obtain a second divided graphics. The second divided graphics overlap with the corresponding graphics in the row direction, but do not overlap in the column direction.

13. The mask design method as described in claim 12, characterized in that, In the step of obtaining the second warp-divided graphic, the distance between the second warp-divided graphic and its corresponding graphic in the column direction is minimized.

14. The mask design method as described in claim 9, characterized in that, In the step of dividing the graphics in the edge unit graphics set, residual graphics are also obtained. The residual graphics are the graphics in the edge unit graphics set other than the divided graphics. The step of obtaining the splitting scheme of the edge unit graphic set based on the repeating graphic set and the splitting scheme of the repeating graphic set further includes: The residual graphic is randomly split to obtain a splitting scheme for the residual graphic; In the step of obtaining the splitting scheme of the edge unit graphic set based on all the splitting schemes of the divided graphics, the splitting scheme of the edge unit graphic set is obtained based on all the splitting schemes of the divided graphics and the splitting scheme of the residual graphics.

15. The mask design method as described in claim 1, characterized in that, In the step of obtaining the mask design to be split, the array pattern group includes: a central pattern subgroup and an array edge pattern subgroup, wherein the array edge pattern subgroup is located between the central pattern subgroup and the outer pattern group; The mask design method further includes: splitting the array edge pattern subgroup to obtain a splitting scheme for the array edge pattern subgroup; In the step of splitting the mask design to be split to obtain multiple sub-mask designs, the mask design to be split is split according to the splitting scheme of the repeating pattern set, the splitting scheme of the array edge pattern subgroup, and the splitting scheme of the extension pattern group to obtain multiple sub-mask designs.

16. The mask design method as described in claim 1, characterized in that, In the step of obtaining the mask design to be split, the extended graphic group includes at least one of: connecting graphics and virtual graphics.

17. A mask design apparatus, characterized in that, include: The acquisition module is suitable for obtaining a mask design to be split, the mask design to be split including: an array pattern group and an extension pattern group that are adjacent to each other, wherein the patterns in the array pattern group are arranged in a periodic array. The scheme module includes: a first scheme unit, which is adapted to split the array pattern group to obtain a set of repeating patterns and a splitting scheme for the repeating pattern set; and a second scheme unit, which is adapted to obtain a splitting scheme for the extension pattern group based on the set of repeating patterns and the splitting scheme for the repeating pattern set. A splitting module is adapted to split the mask design to be split according to the splitting scheme of the repeating pattern set and the splitting scheme of the extension pattern group to obtain multiple sub-mask designs.

18. The mask design apparatus as claimed in claim 17, characterized in that, The array pattern group includes: a central pattern subgroup and an array edge pattern subgroup, wherein the array edge pattern subgroup is located between the central pattern subgroup and the outer pattern group; The scheme module further includes: a third scheme unit, which is suitable for obtaining a splitting scheme for array edge graphic subgroups; The splitting module splits the mask design to be split according to the splitting scheme of the repeating pattern set, the splitting scheme of the array edge pattern subgroup, and the splitting scheme of the extension pattern group, to obtain multiple sub-mask designs.

19. A storage medium, said storage medium being a computer storage medium, wherein a computer program is stored thereon, characterized in that, The computer program is executed by a processor to implement the steps of the mask design method according to any one of claims 1 to 18.

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