A multi-parameter coordinated closed-loop control method and system for an electroplating process

Abstract

The application relates to the technical field of electroplating management, and particularly discloses a multi-parameter cooperative closed-loop control method and system for an electroplating process, which comprises the following steps: analyzing historical data of organic additive concentration acquired by a monitoring module through a trend analysis module, outputting a trend value of the organic additive concentration in the next sampling interval of the current processing time, acquiring a judgment coefficient in the sampling interval based on historical data of electroplating parameters through a cooperative judgment module, and controlling the supply state of the real-time added organic additive concentration through a closed-loop control module. If the judgment result is to adopt the trend value, the trend value is used as the actual value of the current sampling interval, so that the problem of repeated starting of the closed-loop control caused by data drift of the sensor is avoided.

Description

Technical Field

[0001] This invention relates to the field of electroplating management technology, specifically to a multi-parameter collaborative closed-loop control method and system for the electroplating process. Background Technology

[0002] Some electroplating processes require the use of organic additives to improve coating performance. Some organic additives are in liquid form, such as chromium plating catalysts and tin plating brighteners. These products can be directly added to the plating solution for use. There are two ways to add them: pre-addition and real-time addition. Real-time addition aims to dynamically replenish the consumption and is carried out continuously during the production process. The concentration of the liquid added in real-time is also critical to the coating quality. Therefore, monitoring the concentration of additives is an extremely important part of the electroplating process.

[0003] Since electroplating environments are often characterized by strong acids / alkalis, high temperatures, organic vapors, and electromagnetic interference, they pose a severe challenge to common linear sensors. Directly using sensors for detection is often not accurate enough. Therefore, this invention provides a multi-parameter collaborative closed-loop control method and system for the electroplating process, which uses parameters generated during the electroplating process to perform collaborative closed-loop control of the electroplating process. Summary of the Invention

[0004] The purpose of this invention is to provide a multi-parameter collaborative closed-loop control method and system for electroplating processes, solving the following technical problems: How to achieve coordinated closed-loop control of the electroplating process by utilizing parameters generated during the electroplating process.

[0005] One of the objectives of this invention can be achieved through the following technical solutions: A multi-parameter collaborative closed-loop control system for an electroplating process includes: The monitoring module acquires the concentration of organic additives added to the electroplating solution in real time and the electroplating parameters based on the sampling interval. The electroplating parameters include the current output ampere-hours, the electroplating point temperature, and the electrode dissolution efficiency. The trend analysis module analyzes the historical data of organic additive concentration obtained by the monitoring module and outputs the trend value of organic additive concentration for the next sampling interval of the current processing time. The collaborative judgment module obtains the judgment coefficient within the sampling interval based on historical data of electroplating parameters, then judges the trend value based on the judgment coefficient and outputs the judgment result, which includes whether to adopt the trend value or not. The closed-loop control module controls the supply status of the concentration of organic additives added in real time when the judgment result of the collaborative judgment module is that a trend value is not adopted.

[0006] The above technical solution provides a process for correcting sensor monitoring results. If the judgment result is to use the trend value, then the trend value is used as the actual value of the current sampling interval to avoid the problem of repeated restarts of closed-loop control caused by sensor data drift. If the judgment result is not to use the trend value, it means that the deviation of the current actual value is consistent with the actual processing state and cannot be replaced by the trend value. At the same time, as a feedback parameter for closed-loop control, it can timely affect the closed-loop control.

[0007] As a further technical solution of the present invention: the trend value output process includes: During a continuous electroplating process, the actual values ​​of additive concentrations are obtained at several sampling intervals. Through formula Obtain the trend value of organic additive concentration for the next sampling interval from the current processing time. ,in It is the actual value of the current processing time in the given time unit. The mean of actual values ​​in historical data. It is a smoothing factor with a value between 0.1 and 0.3.

[0008] The above technical solution provides a method for obtaining trend values. Generally, the same electroplating process is relatively stable. Therefore, the trend value is obtained by linear prediction sampling, which reduces the amount of computation.

[0009] As a further technical solution of the present invention: the process of obtaining the judgment coefficient within the sampling interval based on historical data of electroplating parameters includes: Through the formula: Obtain the judgment coefficient ,in This is the cathode consumption coefficient. This is the anode consumption coefficient. It is the cumulative number of ampere-hours. It is the anode current efficiency. It is the thermal decomposition coefficient, which is directly proportional to the temperature value. It is the cumulative temperature index.

[0010] The above technical solution provides a process for obtaining the judgment coefficient. The judgment coefficient of this invention is obtained through multiple parameters of the electroplating process and can represent the material consumption state of the electroplating process. When the sensor detects a data offset, it is easy to determine whether the sensor has made a monitoring error by checking whether the judgment coefficient has changed significantly.

[0011] As a further technical solution of the present invention: the cathode consumption coefficient is expressed by the formula: Obtaining the cathode consumption coefficient ,in It is the cathode consumption rate; The anode consumption coefficient is determined by the formula: Obtaining the cathode consumption coefficient ,in It is the anode consumption rate.

[0012] As a further technical solution of the present invention: the cumulative ampere-hours Through the formula: Obtain, among which It is the starting point of a continuous electroplating process. Is with The current point in time within the same electroplating process. It is a curve showing the change of current over time.

[0013] As a further technical solution of the present invention: the cumulative temperature index is expressed by the formula: Obtain, among which It is the starting point of a continuous electroplating process. Is with The current point in time within the same electroplating process. It is a curve showing the real-time temperature change over time. It is a curve showing the change of reference temperature over time, with the reference temperature typically being 25℃.

[0014] As a further technical solution of the present invention: the process of judging the trend value based on the judgment coefficient includes: Get trend value Actual value corresponding to the sampling interval ,like If so, the output judgment result is that the trend value is not used; like Then obtain The value and the preset security value Comparison, among which It is the judgment coefficient for the current sampling interval. It is the judgment coefficient of the previous sampling interval; like If the trend value is used, the output judgment result is "using the trend value". Using the trend value means replacing the actual value with the trend value as the monitoring result in the current sampling interval. like If the trend value is not used, the output judgment result will be "not using the trend value". Not using the trend value means using the actual value as the monitoring result in the current sampling interval.

[0015] As a further technical solution of the present invention: the process of controlling the supply state of the concentration of the organic additive added in real time includes: The judgment result is used as feedforward control to quickly respond to changes in electroplating. The online analyzer is set to perform feedback correction every few hours. The feedback correction updates the cathode consumption coefficient and anode consumption coefficient, which can be performed every 2 hours to maintain the accuracy of the judgment coefficient.

[0016] Another objective of this invention is to provide a multi-parameter collaborative closed-loop control method for an electroplating process, comprising the following steps: The concentration of organic additives added to the electroplating solution and the electroplating parameters are obtained in real time based on the sampling interval. Analyze the historical data of organic additive concentration acquired by the monitoring module and output the trend value of organic additive concentration for the next sampling interval of the current processing time; The judgment coefficients within the sampling interval are obtained based on historical data of electroplating parameters. Then, the trend value is judged based on the judgment coefficients and the judgment result is output. The judgment result includes whether the trend value is adopted or not. When the judgment result is that the trend value is not adopted, the supply status of the concentration of organic additives added in real time is controlled.

[0017] The beneficial effects of this invention are: (1) This invention provides a process for correcting the sensor monitoring results. If the judgment result is to use the trend value, the trend value is used as the actual value of the current sampling interval to avoid the problem of repeated start-up of closed-loop control caused by sensor data drift. If the judgment result is not to use the trend value, it means that the deviation of the current actual value is in line with the actual processing state and cannot be replaced by the trend value. At the same time, as a feedback parameter of closed-loop control, it can affect the closed-loop control in a timely manner.

[0018] (2) The judgment coefficient of the present invention is obtained through multiple parameters of the electroplating process, which can represent the material consumption state of the electroplating process. When the sensor detects a data deviation, it can be easily determined whether the sensor has made a monitoring error by checking whether the judgment coefficient has changed significantly. Attached Figure Description

[0019] The invention will now be further described with reference to the accompanying drawings.

[0020] Figure 1 This is a schematic diagram of the control system module composition of the present invention; Figure 2 This is a schematic diagram of the control method steps of the present invention. Detailed Implementation

[0021] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0022] Please see Figure 1 As shown, in one embodiment, a multi-parameter collaborative closed-loop control system for an electroplating process is provided, comprising: The monitoring module acquires the concentration of organic additives added to the electroplating solution and electroplating parameters in real time based on the sampling interval. The electroplating parameters include the current output ampere-hours, the temperature of the electroplating point, and the electrode dissolution efficiency. The sampling interval length is not limited and can be 5 seconds, 10 seconds, one minute, etc. The trend analysis module analyzes the historical data of organic additive concentration acquired by the monitoring module and outputs the trend value of organic additive concentration for the next sampling interval of the current processing time. The collaborative judgment module obtains the judgment coefficient within the sampling interval based on the historical data of electroplating parameters, then judges the trend value based on the judgment coefficient and outputs the judgment result, which includes whether to adopt the trend value or not. The closed-loop control module controls the supply status of the real-time added organic additive concentration when the judgment result of the collaborative judgment module is that the trend value is not adopted.

[0023] This embodiment provides a process for correcting the sensor monitoring results. If the judgment result is to use the trend value, then the trend value is used as the actual value of the current sampling interval to avoid the problem of repeated start-up of closed-loop control caused by sensor data drift. If the judgment result is not to use the trend value, it means that the deviation of the current actual value is consistent with the actual processing state and cannot be replaced by the trend value. At the same time, as a feedback parameter for closed-loop control, it can affect the closed-loop control in a timely manner.

[0024] It should be noted that if the judgment result is to adopt the trend value, the system marks this trend value as the "correction value" and replaces the original sensor reading of the current sampling interval for use as the calculation input for closed-loop control. Simultaneously, the control logic maintains the current actuator output state unchanged to avoid erroneous adjustments triggered by instantaneous drift. The system synchronously records this correction event and strengthens the confidence assessment of the sensor in the subsequent three consecutive sampling intervals. If the trend value continues to deviate from the measured value, a sensor maintenance alarm is automatically triggered. If the judgment result is not to adopt the trend value, it indicates that the deviation of the current actual value reflects real process fluctuations—such as normal parameter deviations caused by changes in workpiece batch size, sudden changes in anode state, or temperature gradient drift. In this case, the system directly uses the actual value as feedback input to the controller, allowing normal closed-loop adjustment response, and synchronously verifies the consistency of other related parameters through a multi-parameter coupling model, ensuring that the adjustment action is executed within the globally optimal solution. This hierarchical judgment mechanism not only shields against false disturbances caused by sensor drift but also retains the system's agile response capability to real process changes, significantly improving the robustness and reliability of closed-loop control.

[0025] The process of outputting trend values ​​includes: During a continuous electroplating process, the actual values ​​of additive concentrations are obtained at several sampling intervals. Through formula Obtain the trend value of organic additive concentration for the next sampling interval from the current processing time. ,in It is the actual value of the current processing time in the given time unit. The mean of actual values ​​in historical data. It is a smoothing factor with a value between 0.1 and 0.3.

[0026] This embodiment presents a method for obtaining trend values. Generally, the same electroplating process is relatively stable. Therefore, the trend value is obtained through linear prediction sampling, reducing computational load. The linear prediction constructs a first-order linear model based on historical sampling sequences, thereby calculating the expected value at the current sampling moment. Since the electroplating process exhibits gradual variability and short-term stability under normal operating conditions, this prediction method can reliably estimate the actual process state with extremely low computational overhead, avoiding the real-time performance degradation and parameter overfitting risks caused by introducing complex nonlinear models. Simultaneously, the system dynamically updates the historical data window after each correction, enabling the prediction model to adaptively track long-term drift trends such as plating solution aging and anode passivation. When the deviation between the measured value and the predicted value exceeds a dynamic threshold, an anomaly detection process is further triggered, thus achieving a balance between lightweight design and robustness.

[0027] The process of obtaining the judgment coefficient within the sampling interval based on historical data of electroplating parameters includes: Through the formula: Obtain the judgment coefficient ,in This is the cathode consumption coefficient. This is the anode consumption coefficient. It is the cumulative number of ampere-hours. It is the anode current efficiency. This refers to the thermal decomposition coefficient. The thermal decomposition coefficient is calculated by measuring the change in the concentration of a certain additive over a specific time period under conditions without electricity, thus determining the thermal decomposition rate. It is directly proportional to temperature and ranges from 0.5 to 2. It is the cumulative temperature index.

[0028] This embodiment describes the process of obtaining the judgment coefficient. The judgment coefficient of this invention is obtained through multiple parameters of the electroplating process and can represent the material consumption state of the electroplating process. When the sensor detects a data deviation, the presence or absence of a significant change in the judgment coefficient can easily determine whether the sensor has malfunctioned. The judgment coefficient is generated by integrating multiple key parameters of the electroplating process—including cumulative ampere-hours, temperature integral, and anolyte dissolution efficiency—and can quantitatively characterize the material consumption dynamics and electrochemical activity state of the current plating solution system. When the sensor reading deviates, the system first compares the change in the judgment coefficient: if the change remains stable, it indicates that the plating solution itself has not undergone substantial fluctuations, and the current sensor deviation is most likely due to abnormalities in the measurement process such as probe contamination, signal drift, or poor contact; a trend value should be used instead. If the judgment coefficient changes significantly, it indicates that the process state has indeed shifted, and the deviation captured by the sensor is a true physical response; in this case, the measured value should be accepted and closed-loop regulation should be triggered. This mechanism utilizes multi-parameter redundancy verification to effectively distinguish between sensor faults and actual process fluctuations with extremely simple logic, significantly reducing the misadjustment rate while ensuring control response.

[0029] The cathode consumption factor is expressed by the formula: Obtaining the cathode consumption coefficient ,in The cathode consumption rate is monitored using a CVS (Conductivity, Static, and Microscopy). The CVS works by using a rotating platinum disk electrode to apply a specific voltage waveform to the plating bath, simulating the electroplating process and its reverse process, and thus performing calculations. The anode consumption factor is expressed by the formula: Obtaining the cathode consumption coefficient ,in It is the anode consumption rate. Obviously, the anode consumption = total consumption - cathode consumption. That is, first estimate the total theoretical consumption through the ampere-hour meter integral model, and then use online CVS to measure the real-time residual concentration of additives in the plating solution. The difference between the two is the total actual consumption, including anodizing.

[0030] Cumulative ampere-hours Through the formula: Obtain, among which It is the starting point of a continuous electroplating process. Is with The current point in time within the same electroplating process. It is a curve showing the change of current over time.

[0031] The cumulative temperature index is expressed by the formula: Obtain, among which It is the starting point of a continuous electroplating process. Is with The current point in time within the same electroplating process. It is a curve showing the real-time temperature change over time. It is a curve showing the change of reference temperature over time, with the reference temperature typically being 25℃.

[0032] The process of judging trend values ​​based on judgment coefficients includes: Get trend value Actual value corresponding to the sampling interval ,like If so, the output judgment result is that the trend value is not used; like Then obtain The value and the preset security value Comparison, among which It is the judgment coefficient for the current sampling interval. It is the judgment coefficient of the previous sampling interval; like If the trend value is used, the output judgment result is "using the trend value". Using the trend value means replacing the actual value with the trend value as the monitoring result in the current sampling interval. like If the trend value is not used, the output judgment result will be "not using the trend value". Not using the trend value means using the actual value as the monitoring result in the current sampling interval.

[0033] The process of controlling the supply status of the concentration of organic additives added in real time includes: The judgment result is used as feedforward control to quickly respond to changes in electroplating. The online analyzer is set to perform feedback correction every few hours. The feedback correction updates the cathode consumption coefficient and anode consumption coefficient, which can be performed every 2 hours to maintain the accuracy of the judgment coefficient.

[0034] Please see Figure 2 As shown, in one embodiment, a multi-parameter collaborative closed-loop control method for an electroplating process is provided, comprising the following steps: S1. Obtain the concentration of organic additives and electroplating parameters added to the electroplating solution in real time based on the sampling interval; S2. Analyze the historical data of organic additive concentration obtained by the monitoring module and output the trend value of organic additive concentration for the next sampling interval of the current processing time. S3. Based on historical data of electroplating parameters, obtain the judgment coefficient within the sampling interval, then judge the trend value based on the judgment coefficient and output the judgment result. The judgment result includes whether to adopt the trend value or not. S4. When the judgment result is that the trend value is not adopted, control the supply status of the concentration of organic additives added in real time.

[0035] The foregoing has provided a detailed description of one embodiment of the present invention, but this description is merely a preferred embodiment and should not be construed as limiting the scope of the invention. All equivalent variations and modifications made within the scope of the claims of this invention should still fall within the patent coverage of this invention.

Claims

1. A multi-parameter collaborative closed-loop control system for an electroplating process, characterized in that, include: The monitoring module acquires the concentration of organic additives added to the electroplating solution in real time and the electroplating parameters based on the sampling interval. The electroplating parameters include the current output ampere-hours, the electroplating point temperature, and the electrode dissolution efficiency. The trend analysis module analyzes the historical data of organic additive concentration obtained by the monitoring module and outputs the trend value of organic additive concentration for the next sampling interval of the current processing time. The collaborative judgment module obtains the judgment coefficient within the sampling interval based on historical data of electroplating parameters, then judges the trend value based on the judgment coefficient and outputs the judgment result, which includes whether to adopt the trend value or not. The closed-loop control module controls the supply status of the concentration of organic additives added in real time when the judgment result of the collaborative judgment module is that a trend value is not adopted.

2. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 1, characterized in that, The process of outputting trend values ​​includes: During a continuous electroplating process, the actual values ​​of additive concentrations are obtained at several sampling intervals. Through formula Obtain the trend value of organic additive concentration for the next sampling interval from the current processing time. ,in It is the actual value of the current processing time in the given time unit. The mean of actual values ​​in historical data. It is a smoothing factor with a value between 0.1 and 0.

3.

3. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 1, characterized in that, The process of obtaining the judgment coefficient within the sampling interval based on historical data of electroplating parameters includes: Through the formula: Obtain the judgment coefficient ,in This is the cathode consumption coefficient. This is the anode consumption coefficient. It is the cumulative number of ampere-hours. It is the anode current efficiency. It is the thermal decomposition coefficient. It is the cumulative temperature index.

4. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 3, characterized in that, The cathode consumption coefficient is determined by the formula: Obtaining the cathode consumption coefficient ,in It is the cathode consumption rate; The anode consumption coefficient is determined by the formula: Obtaining the cathode consumption coefficient ,in It is the anode consumption rate.

5. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 3, characterized in that, The cumulative ampere-hours Through the formula: Obtain, among which It is the starting point of a continuous electroplating process. Is with The current point in time within the same electroplating process. It is a curve showing the change of current over time.

6. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 3, characterized in that, The cumulative temperature index is expressed by the formula: Obtain, among which It is the starting point of a continuous electroplating process. Is with The current point in time within the same electroplating process. It is a curve showing the real-time temperature change over time. It is a curve showing the change of reference temperature over time.

7. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 1, characterized in that, The process of judging trend values ​​based on judgment coefficients includes: Get trend value Actual value corresponding to the sampling interval ,like If so, the output judgment result is that the trend value is not used; like Then obtain The value and the preset security value Comparison, among which It is the judgment coefficient for the current sampling interval. It is the judgment coefficient of the previous sampling interval; like If so, the output judgment result will be the trend value; like If so, the output judgment result will be "not using trend value".

8. The multi-parameter collaborative closed-loop control system for an electroplating process according to claim 1, characterized in that, The process of controlling the supply status of the concentration of organic additives added in real time includes: The judgment result is used as feedforward control, and the online analyzer is set to perform feedback correction every few hours.

9. A multi-parameter collaborative closed-loop control method for an electroplating process, applied to a multi-parameter collaborative closed-loop control system for an electroplating process as described in any one of claims 1-8, characterized in that, Includes the following steps: The concentration of organic additives added to the electroplating solution and the electroplating parameters are obtained in real time based on the sampling interval. Analyze the historical data of organic additive concentration acquired by the monitoring module and output the trend value of organic additive concentration for the next sampling interval of the current processing time; The judgment coefficients within the sampling interval are obtained based on historical data of electroplating parameters. Then, the trend value is judged based on the judgment coefficients and the judgment result is output. The judgment result includes whether the trend value is adopted or not. When the judgment result is that the trend value is not adopted, the supply status of the concentration of organic additives added in real time is controlled.

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