Method and system for dynamic adjustment of temperature in a silica gel baking channel
CN122261284APending Publication Date: 2026-06-23WEISHI COUNTY BAIMAO SILICONE TECH CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- WEISHI COUNTY BAIMAO SILICONE TECH CO LTD
- Filing Date
- 2026-03-31
- Publication Date
- 2026-06-23
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Figure CN122261284A_ABST
Abstract
The present application belongs to the technical field of rubber product production control, and particularly relates to a silicone oven temperature dynamic adjustment method and system, comprising the following steps: S1, collecting multi-dimensional state data in the oven production process, the multi-dimensional state data including the real-time sag value of the silicone strip in the oven, the real-time tension applied by the traction machine, the traction speed and the real-time environmental temperature in the oven; S2, calculating the rheological impedance index representing the current curing state of the silicone according to the change rates of the real-time tension, the traction speed, the real-time sag value and the real-time environmental temperature, the rheological impedance index being positively correlated with the real-time tension and negatively correlated with the real-time sag value. The present application can not only monitor the physical form of the product in real time, but also solve the problem of traditional PID control lag through a nonlinear aggressive compensation strategy, and can significantly improve the size accuracy of soft rubber products such as silicone tubes and sealing strips, and eliminate the waste caused by gravity deformation.
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