Method and system for dynamic adjustment of temperature in a silica gel baking channel

CN122261284APending Publication Date: 2026-06-23WEISHI COUNTY BAIMAO SILICONE TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
WEISHI COUNTY BAIMAO SILICONE TECH CO LTD
Filing Date
2026-03-31
Publication Date
2026-06-23

Smart Images

  • Figure CN122261284A_ABST
    Figure CN122261284A_ABST
Patent Text Reader

Abstract

The present application belongs to the technical field of rubber product production control, and particularly relates to a silicone oven temperature dynamic adjustment method and system, comprising the following steps: S1, collecting multi-dimensional state data in the oven production process, the multi-dimensional state data including the real-time sag value of the silicone strip in the oven, the real-time tension applied by the traction machine, the traction speed and the real-time environmental temperature in the oven; S2, calculating the rheological impedance index representing the current curing state of the silicone according to the change rates of the real-time tension, the traction speed, the real-time sag value and the real-time environmental temperature, the rheological impedance index being positively correlated with the real-time tension and negatively correlated with the real-time sag value. The present application can not only monitor the physical form of the product in real time, but also solve the problem of traditional PID control lag through a nonlinear aggressive compensation strategy, and can significantly improve the size accuracy of soft rubber products such as silicone tubes and sealing strips, and eliminate the waste caused by gravity deformation.
Need to check novelty before this filing date? Find Prior Art