A dielectrically driven adjustable nanoimprint template, a manufacturing method thereof, and a nanoimprint method

Abstract

This invention belongs to the field of nanoimprint lithography technology. It provides a dielectric-driven tunable nanoimprint template, its manufacturing method, and a nanoimprinting method. The tunable nanoimprint template integrates a dielectric active driving layer and an electrode layer on one side of a flexible substrate, and a nanostructure layer on the other side. By applying a voltage to the dielectric active driving layer, the Maxwell strain generated by the dielectric effect causes the thickness of the dielectric active driving layer to compress and the area to expand, inducing in-plane stretching, which in turn changes the geometric parameters of the nanostructure in the front nanostructure layer. This nanoimprint template can achieve a large-scale adjustment of the nanostructure geometric parameters with a change rate of 5% to 20%, with an adjustment accuracy of less than 5 nm. It can withstand typical nanoimprinting pressure and is particularly suitable for hot and soft imprinting. Dynamic adjustment significantly reduces the cost of template remanufacturing and improves R&D iteration efficiency.

Description

Technical Field

[0001] This invention belongs to the field of nanoimprint lithography technology, and relates to an adjustable nanoimprint template, particularly a dielectric-driven adjustable nanoimprint template, its manufacturing method, and a nanoimprint method. Background Technology

[0002] Nanoimprint lithography (NIL) has become an important method for fabricating micro and nanostructures due to its advantages of high resolution, high throughput, and low cost. Traditional adjustable nanoimprint templates are usually prepared using electron beam lithography combined with etching processes. Once formed, their key structural parameters (such as period, linewidth, and duty cycle) are permanently fixed. If the pattern needs to be fine-tuned due to design changes, process optimization, or product specification adjustments, the entire template must be remade, resulting in high R&D costs, with a single template costing tens to hundreds of thousands of yuan. Moreover, the development cycle is lengthy, often taking weeks or even months from design to delivery, which severely restricts the needs of rapid iterative development and multi-variety, small-batch production.

[0003] To address these limitations, existing technologies attempt to develop tunable template solutions. For example, mechanically driven tunable gratings based on microelectromechanical systems (MEMS) rely on suspended thin films or beam structures, making them unsuitable for withstanding typical imprinting pressures (usually greater than 1 MPa) in practical nanoimprint applications, prone to deformation or breakage, and lacking reliability. Another approach uses Invar alloy-polymer composite structures, utilizing differences in thermal expansion coefficients to achieve size adjustment with temperature changes; however, their response speed is slow (on the order of seconds), and frequent thermal cycling accelerates material fatigue and interface degradation, significantly shortening the template's lifespan. Furthermore, these dynamic adjustment mechanisms are mostly limited to single-parameter control, making it difficult to achieve real-time pattern reconstruction with multiple degrees of freedom and a wide range of adjustability.

[0004] Therefore, existing adjustable template technology has significant shortcomings in terms of mechanical strength, response speed, durability, and controllability, and cannot yet meet the actual needs of large adjustment range, high efficiency, and high stability nanoimprint manufacturing. There is an urgent need to develop a new type of adjustable template technology. Summary of the Invention

[0005] In view of the problems existing in the prior art, the purpose of this invention is to provide a dielectric-driven adjustable nanoimprint template, its manufacturing method, and a nanoimprint method, comprising a first electrode layer, a dielectric active driving layer, a second electrode layer, a flexible substrate layer, and a nanostructure layer stacked together; the dielectric active driving layer is in a biaxial pre-stretched state in a plane perpendicular to the thickness direction and is configured to change the geometric parameters of the nanostructures in the nanostructure layer by applying a voltage. This template can withstand typical nanoimprint pressure, has a large adjustable range of geometric parameters with a change rate of 5% to 20%, adjustment accuracy down to the nanometer level, and a millisecond-level fast response. It is suitable as an adjustable nanoimprint template for use in both hot and soft imprinting, which helps to significantly reduce template remanufacturing costs and improve R&D iteration efficiency.

[0006] To achieve this objective, the present invention adopts the following technical solution: In a first aspect, the present invention provides a dielectric-driven tunable nanoimprint template, comprising a first electrode layer, a dielectric active driving layer, a second electrode layer, a flexible substrate layer, and a nanostructure layer stacked together; the dielectric active driving layer is in a biaxial pre-stretched state in a plane perpendicular to the thickness direction, and is configured to change the geometric parameters of the nanostructure in the nanostructure layer by applying a voltage.

[0007] This invention comprises a first electrode layer, a biaxially pre-stretched dielectric active driving layer, and a second electrode layer stacked on one side of a flexible substrate to form an electroactive driving structure. Simultaneously, a nanostructure layer is disposed on the opposite side. This combines rigid dielectric materials with flexible imprinting technology, while simultaneously endowing the flexible substrate with effective active control over the nanostructure layer. Specifically, a voltage is applied to the dielectric active driving layer through the first and second electrode layers, utilizing its dielectric effect to generate Maxwell strain, i.e., based on p=ε₀ε₀. r E 2 Where p is the generated stress, ε0 is the vacuum permittivity, and ε rLet E be the relative permittivity of the dielectric active driving layer and E be the applied electric field strength. This strain causes the thickness of the dielectric active driving layer to compress and the area to expand, thereby achieving a large-scale in-plane stretching. This, in turn, alters the geometric parameters of the nanostructure in the front nanostructure layer while maintaining structural integrity. Simultaneously, based on the voltage response characteristics of the dielectric effect, rapid, flexible, large-scale, and stable dynamic adjustment of the nanostructure and its geometric parameters can be achieved. This is beneficial for real-time adjustment or maintenance of target geometric parameters before or during imprinting. This dynamic adjustment can achieve a change rate of 5% to 20% for geometric parameters such as feature size and period, with an adjustment accuracy of <5nm. Furthermore, this adjustable nanoimprint template exhibits excellent imprinting compatibility, withstanding typical nanoimprinting pressures (0.1MPa to 10MPa), making it suitable for hot or soft imprinting processes.

[0008] The following are preferred technical solutions of the present invention, but are not intended to limit the technical solutions provided by the present invention. The technical objectives and beneficial effects of the present invention can be better achieved and realized through the following technical solutions.

[0009] As a preferred embodiment of the present invention, the stretch ratio of the biaxial pre-stretched state is 1.01 to 3, for example, it can be 1.01, 1.1, 1.3, 1.5, 1.8, 2.0, 2.2, 2.3, 2.5, 2.8, or 3.0. The stretch ratio refers to the ratio of the length of the dielectric active driving layer after stretching to its initial length before stretching, preferably 1.2 to 1.8. For biaxial pre-stretching, this means that the stretch ratio in each direction along the biaxial axis satisfies 1.01 to 3. Biaxial pre-stretching is performed to reserve stretching amount, thereby increasing the stretch deformation of the dielectric active driving layer under dielectric response. If only uniaxial stretching is performed, due to the Poisson effect, the dielectric material will shrink in the plane perpendicular to the thickness and perpendicular to the stretching direction. Therefore, controlling the dielectric active driving layer to have a suitable biaxial pre-stretched state can improve the deformation effect of the nanostructure.

[0010] As a preferred embodiment of the present invention, the dielectric active driving layer includes a dielectric elastomer.

[0011] Preferably, the dielectric elastomer comprises an acrylic elastomer and / or silicone rubber.

[0012] Preferably, the thickness of the dielectric active driving layer is 20μm to 500μm, for example, it can be 20μm, 50μm, 80μm, 100μm, 130μm, 150μm, 200μm, 240μm, 260μm, 300μm, 350μm, 400μm, 430μm, 450μm or 500μm, etc., and is preferably 20μm to 100μm.

[0013] In this invention, the first electrode layer and the second electrode layer are disposed on opposite sides of the dielectric active driving layer in the thickness direction, thus Maxwell stress generates compression in the thickness direction. Where V is the applied voltage, t DE The thickness is the dielectric active driving layer.

[0014] For an incompressible elastomer, Poisson's ratio ν≈0.5, representing that the overall volume remains constant during stretching, then the in-plane strain λ of the dielectric active driving layer is... area With thickness strain λ thickness relation: Among them, s z =p / Y represents the strain in the thickness direction, and Y represents the Young's modulus of the dielectric active driving layer.

[0015] Therefore, for the same nanostructure and its geometric parameters, the modulation effect can be influenced by changing the voltage and the thickness of the dielectric active driving layer. This means that the geometric parameters can be continuously adjusted by controlling the voltage amplitude. For example, depending on the thickness, the voltage range can be selected between 500V and 3000V while maintaining a field strength <100V / μm. Simultaneously, with reasonable material selection, thickness, layer structure design, and pre-stretching, it is beneficial to adjust the rate of change of geometric parameters over a wide range between 5% and 20%, with an intrinsic response time of 10ms to 100ms (limited by viscoelastic relaxation) and a deformation displacement resolution (rate of change) <5nm, which is conducive to obtaining a large and rapid modulation effect. However, it should be noted that, according to... Since p and E have a square relationship, although dielectric drive can continuously change according to the voltage amplitude, the resulting strain is nonlinear. If further linear control is required, a feedback control circuit needs to be added to compensate for the creep effect.

[0016] Preferably, the dielectric active driving layer further includes a core-shell structured nanofiller, which comprises alumina coated with carbon nanotubes. Therefore, by adding the core-shell structured nanofiller, it is beneficial to further reduce the driving voltage of the dielectric active driving layer and improve the response speed.

[0017] Preferably, the dielectric constant ε of the dielectric active driving layer r The relative permittivity is 4 to 10, for example, it can be 4, 5, 6, 7, 8, 9, or 10. Therefore, the dielectric active driving layer has a suitable relative permittivity to facilitate better dielectric matching.

[0018] Preferably, the driving voltage of the dielectric active driving layer is <100V / μm, for example, it can be 98V / μm, 90V / μm, 80V / μm, 60V / μm, 50V / μm or 20V / μm, etc.; the breakdown field strength is ≥100V / μm, for example, it can be 100V / μm, 120V / μm, 150V / μm, 180V / μm or 200V / μm, etc.

[0019] As a preferred embodiment of the present invention, the nanostructures in the nanostructure layer form non-periodic or periodic micro-nano patterns.

[0020] Preferably, the micro / nano pattern includes gratings and / or an array of holes.

[0021] Preferably, the feature size of the micro / nano pattern is 10 nm to 10 μm, for example, it can be 10 nm, 50 nm, 100 nm, 500 nm, 800 nm, 1 μm, 3 μm, 5 μm, 8 μm, or 10 μm. The feature size mentioned in this invention is the physical size of the nanostructure, and may optionally include linewidth, slot width, diameter, side length, height, or depth.

[0022] Preferably, the geometric parameters include at least one of the characteristic size, period value, or curvature of the micro / nano pattern.

[0023] Preferably, the nanostructure layer comprises a hot-pressing adhesive.

[0024] Preferably, the thickness of the nanostructure layer is 100 nm to 2 μm. For example, it can be 100 nm, 300 nm, 500 nm, 800 nm, 1 μm, 1.3 μm, 1.5 μm, 1.8 μm, or 2 μm, and is more preferably 50 nm to 1 μm. In this invention, the Young's modulus of the nanostructure layer is preferably >1 GPa to ensure the fidelity of the nanostructure.

[0025] As a preferred embodiment of the present invention, the flexible substrate layer comprises at least one of polydimethylsiloxane (PDMS), polyimide (PI), or polyethylene terephthalate (PET); Preferably, the thickness of the flexible substrate is 50μm to 500μm, for example, it can be 50μm, 80μm, 100μm, 150μm, 200μm, 250μm, 300μm, 350μm, 400μm, 450μm or 500μm, etc., preferably 200μm to 500μm; the Young's modulus is 0.1MPa to 15MPa, for example, it can be 0.1MPa, 0.5MPa, 0.8MPa, 1MPa, 3MPa, 5MPa, 8MPa, 10MPa, 11MPa, 12MPa, 14MPa or 15MPa, etc. In this invention, the flexible substrate needs to support the nanostructure layer and adapt to the large strain generated by the dielectric active driving layer. On the other hand, it also needs to withstand the imprinting pressure and achieve conformal contact in subsequent imprinting applications. Therefore, it needs to have suitable mechanical properties, and thus its Young's modulus is preferably 3MPa to 15MPa.

[0026] As a preferred embodiment of the present invention, both the first electrode layer and the second electrode layer comprise at least one of a metal or a carbon-based material; the metal comprises silver nanowires; and the carbon-based material comprises carbon paste.

[0027] Preferably, the thickness of the first electrode layer and the second electrode layer is 1μm to 5μm, for example, it can be 1μm, 1.5μm, 2μm, 2.5μm, 3.5μm, 4μm, 4.5μm or 5μm, and more preferably 2μm to 3μm. In order to better accommodate the large strain generated by the dielectric active driving layer, the first electrode layer and the second electrode layer preferably have both high conductivity and stretchability.

[0028] Preferably, the area resistivity of the first electrode layer and the second electrode layer is <1kΩ / sq, for example, it can be 0.9kΩ / sq, 0.75kΩ / sq, 0.5kΩ / sq, 0.25kΩ / sq or 0.1kΩ / sq, etc.

[0029] In a second aspect, the present invention provides a method for manufacturing the dielectric-driven tunable nanoimprint template described in the first aspect, comprising: Prepare or provide an initial dielectric active driving layer; The initial dielectric active driving layer is subjected to biaxial pre-stretching to form a pre-stretched dielectric active driving layer. A second electrode layer is formed on one of two opposing surfaces in the thickness direction of the pre-stretched dielectric active driving layer; A flexible substrate layer is formed on the side of the second electrode layer away from the pre-stretched dielectric active driving layer; A nanostructured raw material layer is formed on the side of the flexible substrate away from the second electrode layer, and the nanostructured raw material layer is imprinted to form a nanostructured layer. A first electrode layer is formed on the surface opposite to the second electrode layer in the pre-stretched dielectric active driving layer; Perform pre-stretch release treatment.

[0030] The pre-stretch release process described in this invention is to release the stretch. After release, the dielectric active driving layer will return to its original state. However, since biaxial pre-stretching was performed before release, the dielectric material can undergo tensile deformation when an electric field is subsequently applied. Pre-stretching makes it easier to respond to the deformation of the dielectric material.

[0031] As a preferred technical solution of the present invention, the method for biaxial pre-stretching includes: providing a frame with a central window, wherein a clamping area is provided on the frame body, and the initial dielectric active driving layer is biaxially stretched and clamped and fixed on the frame to form a pre-stretched dielectric active driving layer.

[0032] As a preferred technical solution of the present invention, the imprinting method includes: providing a silicon substrate with a nanostructure, using the silicon substrate to perform hot imprinting and curing on the nanostructured raw material layer, and peeling off the silicon substrate to form the nanostructured layer.

[0033] Preferably, the nanostructured raw material layer includes a hot-pressing adhesive.

[0034] Preferably, the glass transition temperature of the hot-press printing adhesive is 30°C to 50°C, for example, it can be 30°C, 35°C, 40°C, 45°C or 50°C.

[0035] Preferably, the temperature of the hot stamping is 50℃~70℃, for example, 50℃, 55℃, 60℃, 65℃ or 70℃; the pressure is 0.1MPa~5MPa, for example, 0.1MPa, 0.5MPa, 1MPa, 2MPa, 3MPa, 4MPa or 5MPa; and the time is 1min~10min, for example, 1min, 3min, 5min, 8min or 10min.

[0036] Preferably, the curing method includes cooling to room temperature.

[0037] Thirdly, the present invention provides a nanoimprinting method, the method comprising: using the dielectric-driven tunable nanoimprinting template described in the first aspect, applying a voltage to the dielectric active driving layer before or during imprinting, so that the nanostructure achieves the target geometric parameters, and performing imprinting.

[0038] Furthermore, the imprinting using an adjustable nanoimprint template can be performed on a substrate coated with a hot imprinting adhesive, such that one side of the nanostructure layer of the adjustable nanoimprint template comes into contact with the heated hot imprinting adhesive and pressure is applied (0.1 MPa to 10 MPa, preferably 3 MPa to 10 MPa). The voltage remains constant during the imprinting process to ensure that the geometric parameters of the nanostructure are stable during the imprinting. Then, the adhesive layer can be cured and shaped by cooling. After separating the adjustable nanoimprint template from the substrate, a nanostructure with the target geometric parameters can be obtained on the substrate.

[0039] The dielectric-driven tunable nanoimprint template and the nanoimprint method using it provided by the present invention can be further applied to the processing and manufacturing of optical metasurfaces, electrode patterns for flexible electronic devices, etc.

[0040] It should be noted that, due to space limitations and to avoid redundancy, this invention does not exhaustively list all point values ​​within the above numerical range, but it is not limited to the listed values ​​either; other unlisted values ​​within the above numerical range are also applicable.

[0041] Compared with existing technical solutions, the present invention has at least the following beneficial effects: The Maxwell strain based on the dielectric effect provided by this invention compresses the thickness and expands the area of ​​the dielectric active driving layer, thereby achieving significant in-plane stretching. This, in turn, alters the geometric parameters of the nanostructure in the front nanostructure layer while maintaining structural integrity, achieving compatibility between the driving mechanism and the imprinting process. This nanoimprint template allows for wide-range, rapid dynamic adjustment of the nanostructure's geometric parameters. The rate of change of the characteristic size or periodic value of the nanostructure can reach 5% to 20%, with an adjustment precision of less than 5 nm. It can withstand typical nanoimprinting pressures of 0.1 MPa to 10 MPa, exhibiting good stability. It is particularly suitable for hot and soft imprinting applications. Dynamic adjustment significantly reduces the cost of template remanufacturing and improves R&D iteration efficiency. Attached Figure Description

[0042] Figure 1 This is a schematic diagram of the layer structure provided in Example 1. In the figure: 1-first electrode layer, 2-dielectrically active driving layer, 3-second electrode layer, 4-flexible substrate layer, 5-nanostructure layer. Detailed Implementation

[0043] The technical solution of the present invention will be further illustrated below through specific embodiments. Those skilled in the art should understand that the embodiments described are merely illustrative of the present invention and should not be construed as limiting the invention in any way.

[0044] The scope of this invention can be defined by lower and upper limits. The selected lower and upper limits define the boundaries of a specific range. The range defined in this way can be defined by the inclusion or exclusion of endpoints. Any endpoint can be independently selected for inclusion or exclusion, and all lower and upper limits can be arbitrarily combined to form new ranges. That is, any lower limit can be combined with any upper limit to form an effective range. For example, if the ranges of 60~120 and 80~110 are listed for specific parameters, it should be understood that the ranges of 60~110 and 80~120 also fall within the scope of this invention. In addition, if the minimum range values ​​1 and 2 are listed, and the maximum range values ​​3, 4 and 5 are also listed, then all ranges of 1~3, 1~4, 1~5, 2~3, 2~4 and 2~5 fall within the scope of this invention. In this invention, the numerical range "a~b" represents a shortened representation of any combination of real numbers between a and b, where a and b are both real numbers. For example, the numerical range "0~5" means that all real numbers between 0 and 5 have been fully listed in this document, and "0~5" is only a shortened representation of this set of numerical combinations. When a parameter is expressed as an integer ≥2, it is equivalent to listing positive integers that meet the requirements, such as 2, 3, 4, 5, 6, 7, 8, 9, 10, etc. When a parameter is expressed as an integer selected from "2~10", it is equivalent to listing any integer among 2, 3, 4, 5, 6, 7, 8, 9, and 10.

[0045] In this invention, "a combination of at least two" refers to a quantity greater than or equal to 2 unless otherwise specified. For example, "any one or a combination of at least two" means that any one of the listed items can be selected, or a combination of at least two of the listed items formed in a manner that does not conflict and enables the implementation of this invention. In this invention, unless otherwise specified, the features or solutions corresponding to "and / or" cover any one of two or more related listed items, as well as any and all combinations of the related listed items. The arbitrary and all combinations include any two related listed items, any more related listed items, or a combination of all related listed items. For example, "A and / or B" means a set consisting of A, B, and combinations of A and B, where "containing A and / or B" can be understood, depending on the context of the statement, as containing A, containing B, or simultaneously containing both A and B. In this invention, "optional" means that the corresponding feature, component, step or solution is not necessary, that is, it is selected from either "with" or "without". If there are multiple "optional" limitations in a technical solution, unless otherwise specified and there is no technical conflict or mutual constraint, each "optional" limitation is independent and does not affect the others.

[0046] In this invention, technical features or solutions described using open-ended terms such as "comprising" or "including" do not exclude additional non-conflicting elements beyond the listed elements unless otherwise specified. They are considered to disclose both closed-ended features or solutions consisting solely of the listed elements and open-ended features or solutions that may include additional non-conflicting elements beyond the listed elements. For example, if A includes a1, a2, and a3, unless otherwise specified, this means that A can consist only of a1, a2, and a3, or it can include other non-conflicting elements based on a1, a2, and a3. This corresponds to the disclosure of technical solutions such as "A consists of a1, a2, and a3," "A is selected from a1, a2, and a3," and "A not only includes a1, a2, and a3, but may also include other non-conflicting elements." All embodiments and optional embodiments of this invention, unless otherwise specified and without technical conflict, can be combined to form new technical solutions, and such combinations fall within the scope of this invention. The term "embodiment" as used in this invention means that a specific feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment or implementation of the invention. The appearance of this phrase in various locations throughout the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment mutually exclusive with other embodiments. Those skilled in the art will understand, explicitly and implicitly, that the embodiments described in this invention can be combined with other embodiments that do not conflict with the technology. The ordinal numbers "first," "second," "third," and "fourth," etc., used in the expressions "first aspect," "second aspect," "third aspect," and "fourth aspect" in this invention are for descriptive purposes only and should not be construed as indicating or implying relative importance or quantity, nor should they be construed as implicitly specifying the importance or quantity of the indicated technical features. They serve only as a non-exhaustive enumeration and do not constitute a closed limitation on quantity.

[0047] In this invention, the order in which the steps are written in the methods described in the various embodiments does not imply a strict execution order. The actual execution order of each step should be determined based on its function and possible internal logic. Unless otherwise specified, all steps of this invention can be executed in the order they are written, or in any order without technical conflict. For example, if the method includes steps (a) and (b), it means that the method may include steps (a) and (b) executed sequentially, or it may include steps (b) and (a) executed sequentially. If the method also includes step (c), then step (c) can be added to the method in any conflict-free order, including but not limited to the execution order of steps (a), (b), and (c), steps (a), (c), and (b), steps (c), (a), and (b), etc.

[0048] In the description of this invention, the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0049] In the description of this invention, unless otherwise explicitly specified and limited, the terms "set up," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art will understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0050] Example 1 This embodiment provides a dielectric-driven tunable nanoimprint template, such as... Figure 1 As shown, the structure includes a first electrode layer 1, a dielectric active driving layer 2, a second electrode layer 3, a flexible substrate layer 4, and a nanostructure layer 5, all stacked together. The dielectric active driving layer 2 is in a biaxially pre-stretched state in a plane perpendicular to the thickness direction and is configured to change the geometric parameters of the nanostructures in the nanostructure layer by applying a voltage. Specifically: The dielectric active driving layer 2 includes a dielectric elastomer acrylic elastomer, specifically VHB 4910, with a stretch ratio of 1.4 in the biaxial pre-stretched state and an effective area size of 50×50mm. 2 The thickness is 60μm; Both the first electrode layer 1 and the second electrode layer 3 are carbon pastes with a thickness of 3 μm and an area resistivity of 500 Ω / sq. The flexible substrate 4 is a high-modulus PMDS formulation with a Young's modulus of 10 MPa and a thickness of 350 μm; The nanostructure layer 5 is a hot-press printing adhesive, specifically using MR-I 8020, with a thickness of 500 nm and a glass transition temperature (Tg) of 40 °C. The nanostructure layer 5 contains a periodic grating formed by nanostructures, with an initial period λ0 = 1 μm and a duty cycle of 1:1.

[0051] This embodiment also provides a method for manufacturing the dielectrically driven tunable nanoimprint template, including: S1. Provide the initial dielectric active driving layer, namely VHB4910 tape; Customized aluminum frames are available, with a central window opening (corresponding to the effective area size), and the frame is equipped with clamping areas, adjustable four-corner bolts, and tension uniformity >95%; The initial dielectric active driving layer was clamped and fixed on a custom aluminum frame and subjected to biaxial pre-stretching treatment, so that the biaxial stretching ratio was 1.4, forming a pre-stretched dielectric active driving layer. S2. While maintaining the pre-stretched state, carbon paste is applied to two opposite surfaces in the thickness direction of the pre-stretched dielectric active driving layer to form a second electrode layer and a first electrode layer, respectively. S3. On the side of the second electrode layer away from the pre-stretched dielectric active driving layer, spin-coat PDMS and cure at 80°C for 2 hours to form a flexible substrate layer. S4. On the side of the flexible substrate layer away from the second electrode layer, spin-coat hot-press printing adhesive mr-I 8020 to form a nanostructured raw material layer. Take a silicon substrate and define the target nanostructure pattern, i.e., a grating with a period of 1 μm, on it using electron beam lithography; use the silicon substrate to perform hot imprinting on the nanostructure raw material layer at a temperature of 60°C, a pressure of 2 MPa, and a time of 5 min; cool to room temperature and demold (peel off the silicon substrate) to form a nanostructure layer, thus obtaining a dielectric-driven tunable nanoimprint template. S5. Remove the aluminum frame and release the pre-stretched state. At this time, the dielectric-driven adjustable nanoimprint template is in the initial state with an initial period λ0 = 1 μm and a duty cycle of 1:1.

[0052] In order to apply voltage and be used in nanoimprinting, the first electrode layer is photolithographically patterned to define the electrode lead pattern. After wet etching, an external driving circuit (such as a function generator or high voltage amplifier) ​​is connected through silver paste so that a voltage can be applied to the dielectric active driving layer through the first electrode layer and the second electrode layer.

[0053] Characterization and testing: The obtained dielectric-driven adjustable nanoimprint template was subjected to voltage applied through an external driving circuit. The voltage range was 1000V~2500V. It was found that the period value could be adjusted from the initial 1μm to 1.15μm, with a change rate of up to 15%. The response time was 50ms for the rise time and 80ms for the fall time (with viscoelastic hysteresis).

[0054] This embodiment also provides a nanoimprinting method, which uses the obtained dielectric-driven tunable nanoimprint template to perform the following steps: T1. Template Adjustment: Apply the target voltage and monitor the diffraction angle in real time (or in-situ AFM) to confirm that the period value reaches the set value λ from the initial value λ0. set Maintain voltage; T2. Coating: Spin coat hot stamping adhesive (such as mr-I 8020) onto the substrate to be imprinted (silicon, glass or flexible PET), while heating to 60°C, which is higher than the glass transition temperature of the hot stamping adhesive, to form a hot stamping adhesive layer. T3. Contact: Align one side of the nanostructure layer of the nanoimprint template with the substrate, attach it to the hot imprint adhesive layer, apply a pressure of 2MPa~5MPa, maintain for 5min~10min, perform hot imprinting, and keep the voltage constant during the imprinting process to ensure that the geometric parameters of the nanostructure are stable during the imprinting. T4. Cooling and curing: After cooling to room temperature, the adhesive layer vitrifies; T5. Demolding: Release the pressure and slowly separate the nanoimprint template, controlling the demolding speed to <1mm / s to avoid adhesion that could cause structural damage. A curing adhesive that retains the nanopattern is formed on the substrate to be imprinted, thus completing the imprinting process and obtaining the imprinted product. T6. Reset: The voltage is reduced to zero, allowing the nanoimprint template to return to its initial state (i.e., the initial periodic value λ0 is restored), preparing for the next imprint.

[0055] Tests showed that at 50×50mm 2 Within the effective area, the periodic value difference is <±2%, indicating good imprint uniformity.

[0056] Example 2 This embodiment provides a dielectric-driven tunable nanoimprint template, comprising a first electrode layer, a dielectric active driving layer, a second electrode layer, a flexible substrate layer, and a nanostructure layer stacked together; the dielectric active driving layer is in a biaxial pre-stretched state in a plane perpendicular to the thickness direction, and is configured to allow the geometric parameters of the nanostructures in the nanostructure layer to be changed by applying a voltage, specifically: The dielectric active driving layer comprises silicone rubber with a stretch ratio of 1.2 in a biaxial pre-stretched state and an effective area size of 30×30mm. 2 The thickness is 20μm; Both the first and second electrode layers are made of silver nanowires with a thickness of 1 μm and an area resistivity of 300 Ω / sq. The flexible substrate is a high-modulus PMDS formulation with a Young's modulus of 8 MPa and a thickness of 200 μm; The nanostructure layer is a hot-press printing adhesive, specifically MR-I 8020, with a thickness of 200 nm and a glass transition temperature (Tg) of 40 °C. The nanostructure layer contains a periodic array of pores formed by nanostructures, with a diameter of 500 nm and a spacing of 300 nm.

[0057] This embodiment also provides a method for manufacturing the dielectrically driven tunable nanoimprint template, including: S1 provides the initial dielectric active driving layer, i.e., silicone rubber; Customized aluminum frames are available, with a central window opening (corresponding to the effective area size), and the frame is equipped with clamping areas, adjustable four-corner bolts, and tension uniformity >95%; The initial dielectric active driving layer is clamped and fixed on a custom aluminum frame and subjected to biaxial pre-stretching treatment, so that the biaxial stretching ratio is 1.2, forming a pre-stretched dielectric active driving layer. S2. While maintaining the pre-stretched state, carbon paste is applied to two opposite surfaces in the thickness direction of the pre-stretched dielectric active driving layer to form a second electrode layer and a first electrode layer, respectively. S3. On the side of the second electrode layer away from the pre-stretched dielectric active driving layer, spin-coat PDMS and cure at 80°C for 2 hours to form a flexible substrate layer. S4. On the side of the flexible substrate layer away from the second electrode layer, spin-coat hot-press printing adhesive mr-I 8020 to form a nanostructured raw material layer. Take a silicon substrate and define the target nanostructure pattern, i.e., the hole array, on it using electron beam lithography; use the silicon substrate to perform hot imprinting on the nanostructure raw material layer. The hot imprinting temperature is 60℃, the pressure is 2MPa, and the time is 5min. After cooling to room temperature, demold (peel off the silicon substrate) to form the nanostructure layer and obtain a dielectric-driven tunable nanoimprint template. S5. Remove the aluminum frame and release the pre-stretched state. At this time, the dielectric-driven adjustable nanoimprint template is in its initial state, with a hole array diameter of 500nm and a spacing of 300nm.

[0058] In order to apply voltage and be used in nanoimprinting, the first electrode layer is photolithographically patterned to define the electrode lead pattern. After wet etching, an external driving circuit (such as a function generator or high voltage amplifier) ​​is connected through silver paste so that a voltage can be applied to the dielectric active driving layer through the first electrode layer and the second electrode layer.

[0059] Characterization and testing: The obtained dielectric-driven adjustable nanoimprint template was subjected to voltage applied through an external driving circuit. The voltage ranged from 1000V to 2500V, and it was found that the diameter could be adjusted from the initial 500nm to 525nm, with a change rate of up to 5%. The response time was 50ms for the rise time and 80ms for the fall time (with viscoelastic hysteresis).

[0060] This embodiment also provides a nanoimprinting method, which uses the obtained dielectric-driven tunable nanoimprint template to perform the following steps: T1, Template Shaping: Apply the target voltage, monitor the diffraction angle in real time (or in-situ AFM), confirm that the diameter has reached the set value from the initial value, and maintain the voltage; T2. Coating: Spin coat hot stamping adhesive (such as mr-I 8020) onto the substrate to be imprinted (silicon, glass or flexible PET), while heating to 60°C, which is higher than the glass transition temperature of the hot stamping adhesive, to form a hot stamping adhesive layer. T3. Contact: Align one side of the nanostructure layer of the nanoimprint template with the substrate, attach it to the hot imprint adhesive layer, apply a pressure of 0.8MPa~3MPa, maintain for 5min~10min, and perform hot imprinting. The voltage is kept constant during the imprinting process to ensure that the geometric parameters of the nanostructure are stable during the imprinting. T4. Cooling and curing: After cooling to room temperature, the adhesive layer vitrifies; T5. Demolding: Release the pressure and slowly separate the nanoimprint template, controlling the demolding speed to <1mm / s to avoid adhesion that could cause structural damage. A curing adhesive that retains the nanopattern is formed on the substrate to be imprinted, thus completing the imprinting process and obtaining the imprinted product. T6. Reset: The voltage is reduced to zero, restoring the nanoimprint template to its initial state (i.e., restoring the initial size of the hole array) and preparing for the next imprinting.

[0061] Tests showed that within 30×30mm... 2 Within the effective area, the diameter difference is <±2%, indicating good imprint uniformity.

[0062] Example 3 This embodiment provides a dielectric-driven tunable nanoimprint template, comprising a first electrode layer, a dielectric active driving layer, a second electrode layer, a flexible substrate layer, and a nanostructure layer stacked together; the dielectric active driving layer is in a biaxial pre-stretched state in a plane perpendicular to the thickness direction, and is configured to allow the geometric parameters of the nanostructures in the nanostructure layer to be changed by applying a voltage, specifically: The dielectric active driving layer comprises an acrylic elastomer with a stretch ratio of 1.6 in a biaxial pre-stretched state and an effective area size of 80×80mm. 2 The thickness is 100μm; Both the first and second electrode layers are made of carbon paste, with a thickness of 5 μm and an area resistivity of 600 Ω / sq. The flexible substrate is a high-modulus PMDS formulation with a Young's modulus of 10 MPa and a thickness of 500 μm. The nanostructure layer is a hot-press printing adhesive, specifically MR-I 8020, with a thickness of 900 nm and a glass transition temperature (Tg) of 40 °C. The nanostructure layer contains a periodic grating formed by nanostructures, with an initial period λ0 = 500 nm and a duty cycle of 1:1.

[0063] This embodiment also provides a method for manufacturing the dielectrically driven tunable nanoimprint template, including: S1 provides the initial dielectric activity driving layer, namely acrylic elastomer; Customized aluminum frames are available, with a central window opening (corresponding to the effective area size), and the frame is equipped with clamping areas, adjustable four-corner bolts, and tension uniformity >95%; The initial dielectric active driving layer was clamped and fixed on a custom aluminum frame and subjected to biaxial pre-stretching treatment, so that the biaxial stretching ratio was 1.6, forming a pre-stretched dielectric active driving layer. S2. While maintaining the pre-stretched state, carbon paste is applied to two opposite surfaces in the thickness direction of the pre-stretched dielectric active driving layer to form a second electrode layer and a first electrode layer, respectively. S3. On the side of the second electrode layer away from the pre-stretched dielectric active driving layer, spin-coat PDMS and cure at 80°C for 2 hours to form a flexible substrate layer. S4. On the side of the flexible substrate layer away from the second electrode layer, spin-coat hot-press printing adhesive mr-I 8020 to form a nanostructured raw material layer. Take a silicon substrate and define the target nanostructure pattern, i.e., the hole array, on it using electron beam lithography; use the silicon substrate to perform hot imprinting on the nanostructure raw material layer. The hot imprinting temperature is 60℃, the pressure is 2MPa, and the time is 5min. After cooling to room temperature, demold (peel off the silicon substrate) to form the nanostructure layer and obtain a dielectric-driven tunable nanoimprint template. S5. Remove the aluminum frame and release the pre-stretched state. At this time, the dielectric-driven adjustable nanoimprint template is in its initial state, the initial period of the grating is λ0=500nm, and the duty cycle is 1:1.

[0064] In order to apply voltage and be used in nanoimprinting, the first electrode layer is photolithographically patterned to define the electrode lead pattern. After wet etching, an external driving circuit (such as a function generator or high voltage amplifier) ​​is connected through silver paste so that a voltage can be applied to the dielectric active driving layer through the first electrode layer and the second electrode layer.

[0065] Characterization and testing: The obtained dielectric-driven adjustable nanoimprint template was subjected to voltage applied through an external driving circuit. The voltage range of 1000V to 2500V was varied, and it was found that the period value could be adjusted from the initial 500nm to 600nm, with a change rate of up to 20%. The response time was 50ms for the rise time and 80ms for the fall time (with viscoelastic hysteresis).

[0066] This embodiment also provides a nanoimprinting method, which uses the obtained dielectric-driven tunable nanoimprint template to perform the following steps: T1, Template Shaping: Apply the target voltage, monitor the diffraction angle in real time (or in-situ AFM), confirm that the diameter has reached the set value from the initial value, and maintain the voltage; T2. Coating: Spin coat hot stamping adhesive (such as mr-I 8020) onto the substrate to be imprinted (silicon, glass or flexible PET), while heating to 60°C, which is higher than the glass transition temperature of the hot stamping adhesive, to form a hot stamping adhesive layer. T3. Contact: Align one side of the nanostructure layer of the nanoimprint template with the substrate, attach it to the hot imprint adhesive layer, apply a pressure of 5MPa~10MPa, maintain for 5min~10min, perform hot imprinting, and keep the voltage constant during the imprinting process to ensure that the geometric parameters of the nanostructure are stable during the imprinting. T4. Cooling and curing: After cooling to room temperature, the adhesive layer vitrifies; T5. Demolding: Release the pressure and slowly separate the nanoimprint template, controlling the demolding speed to <1mm / s to avoid adhesion that could cause structural damage. A curing adhesive that retains the nanopattern is formed on the substrate to be imprinted, thus completing the imprinting process and obtaining the imprinted product. T6. Reset: The voltage is reduced to zero, restoring the nanoimprint template to its initial state (i.e., restoring the initial period value of the grating), in preparation for the next imprint.

[0067] Tests showed that at 80×80mm 2 Within the effective area, the periodic value difference is <±2%, indicating good imprint uniformity.

[0068] Example 4 The difference from Example 1 is that the stretch ratio of the dielectric active driving layer under biaxial pre-stretched state is changed from 1.4 to 2, while maintaining an effective thickness of 60 μm. Apart from the above, the other conditions are exactly the same as those in Example 1.

[0069] After testing, it was found that by applying voltage through an external driving circuit, the dielectric-driven adjustable nanoimprint template could be varied within the voltage range of 1000V~2500V. The period value was found to be adjustable from the initial 1μm to 1.18μm, with a change rate of up to 18%; the response time was 40ms for the rise time and 70ms for the fall time.

[0070] After embossing, in 50×50mm 2 Within the effective area, the difference in periodic values ​​in the embossed products is <±2.2%.

[0071] Example 5 The difference from Example 1 is that the stretch ratio of the dielectric active driving layer under biaxial pre-stretched state is changed from 1.4 to 3, while maintaining an effective thickness of 60 μm. Apart from the above, the other conditions are exactly the same as those in Example 1.

[0072] After testing, it was found that by applying voltage through an external driving circuit, the dielectric-driven adjustable nanoimprint template could be varied within the voltage range of 600V to 1800V. The period value was found to be adjustable from the initial 1μm to 1.2μm, with a change rate of up to 20%; the response time was 30ms for the rise time and 55ms for the fall time.

[0073] After embossing application, the periodicity difference in embossed products is <±2.8%.

[0074] Example 6 The difference from Embodiment 1 is that both the first electrode layer 1 and the second electrode layer 2 are patterned to divide the electrode layer into 4 independent quadrants, and 4 external driving power supplies are connected to each quadrant. This allows the geometric parameters of each quadrant to be independently adjusted, so that the dielectric-driven adjustable nanoimprint template and the transfer method using it can be used to manufacture achromatic metasurface lenses to compensate for dispersion, multifocal microlens arrays, variable angle grating couplers, and other fields.

[0075] Comparative Example 1 The difference from Example 1 is that the dielectric active driving layer is not pre-stretched biaxially, and only the initial dielectric active driving layer is used. Apart from the above, the other conditions are exactly the same as those in Example 1.

[0076] Testing revealed that, by applying voltage through an external driving circuit, the dielectrically driven tunable nanoimprint template exhibited a period value adjustable from an initial 1 μm to 1.03 μm within the voltage range of 1500V to 3500V, with a change rate reaching 3%. Furthermore, when the voltage increased to above 2500V, localized out-of-plane wrinkles appeared at the template edge. The response time had a rise time of 150ms and a fall time of 250ms.

[0077] After embossing, in 50×50mm 2 Within the effective area, the periodicity difference in the embossed product is <±5%, indicating a significant deterioration in uniformity. This suggests that without pre-stretching, the dielectric elastomer is prone to buckling instability, making it impossible to achieve large-area strain control, and limiting both the range and efficiency of field stress regulation.

[0078] Comparative Example 2 Comparative Example 2 compares the conventional rigid nanoimprint template and the MEMS suspended film nanoimprint template with the dielectric-driven tunable nanoimprint templates of Examples 1-3. The results are shown in Table 1 below: Table 1 As can be seen from the above, the Maxwell strain based on the dielectric effect provided by this invention compresses the thickness and expands the area of ​​the dielectric active driving layer, thereby achieving significant in-plane stretching. This, in turn, alters the geometric parameters of the nanostructure in the front nanostructure layer while maintaining structural integrity, achieving compatibility between the driving mechanism and the imprinting process. This nanoimprint template can achieve dynamic adjustment of the nanostructure geometric parameters over a wide range and with rapid response. The rate of change of the characteristic size or period value of the nanostructure can reach 5% to 20%, with an adjustment accuracy of less than 5 nm. It can withstand typical nanoimprinting pressures of 0.1 MPa to 10 MPa, exhibiting good stability. It is particularly suitable for hot imprinting and soft imprinting. By implementing dynamic adjustment, it is beneficial to significantly reduce the cost of template remanufacturing and improve the efficiency of R&D iteration.

[0079] The preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the specific details of the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0080] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0081] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A dielectrically driven tunable nanoimprint template, characterized by, It includes a first electrode layer, a dielectric active driving layer, a second electrode layer, a flexible substrate layer, and a nanostructure layer stacked together; the dielectric active driving layer is in a biaxial pre-stretched state in a plane perpendicular to the thickness direction and is configured to change the geometric parameters of the nanostructure in the nanostructure layer by applying a voltage.

2. The dielectrically-driven adjustable nanoimprint template according to claim 1, wherein, The stretch ratio in the biaxial pre-stretch state is 1.01~3.

3. The dielectrically-driven adjustable nanoimprint template according to claim 1, wherein, The dielectric active driving layer includes a dielectric elastomer and satisfies at least one of the following conditions: (A1) The dielectric elastomer includes acrylic elastomer and / or silicone rubber; (A2) The thickness of the dielectric active driving layer is 20 μm to 500 μm; (A3) The dielectric active driving layer further includes a core-shell structured nanofiller, which includes alumina coated with carbon nanotubes; (A4) the dielectric constant ε of the dielectric active driving layer r is 4 to 10; (A5) The driving voltage of the dielectric active driving layer is <100V / μm, and the breakdown field strength is ≥100V / μm.

4. The dielectric-driven tunable nanoimprint template according to claim 1, characterized in that, The dielectrically driven tunable nanoimprint template satisfies at least one of the following characteristics: (B1) The nanostructures in the nanostructure layer form non-periodic or periodic micro / nano patterns; (B2) The micro / nano pattern includes gratings and / or arrays of holes; (B3) The feature size of the micro-nano pattern is 10 nm to 10 μm; (B4) The geometric parameters include at least one of the characteristic size, period value, or curvature of the micro / nano pattern; (B5) The nanostructure layer includes a hot-pressing adhesive; (B6) The thickness of the nanostructure layer is 100 nm to 2 μm.

5. The dielectric-driven tunable nanoimprint template according to claim 1, characterized in that, The flexible substrate layer includes at least one of polydimethylsiloxane (PDMS), polyimide (PI), or polyethylene terephthalate (PET); And / or, the thickness of the flexible substrate layer is 50μm~500μm; the Young's modulus is 0.1MPa~15MPa.

6. The dielectric-driven tunable nanoimprint template according to claim 1, characterized in that, Both the first electrode layer and the second electrode layer comprise at least one of a metal or a carbon-based material; the metal comprises silver nanowires; the carbon-based material comprises carbon paste. And / or, the thickness of the first electrode layer and the second electrode layer is 1μm~5μm; And / or, the area resistivity of the first electrode layer and the second electrode layer is <1kΩ / sq.

7. A method for manufacturing a dielectrically driven tunable nanoimprint template according to any one of claims 1-6, characterized in that, include: Prepare or provide an initial dielectric active driving layer; The initial dielectric active driving layer is subjected to biaxial pre-stretching to form a pre-stretched dielectric active driving layer. A second electrode layer is formed on one of two opposing surfaces in the thickness direction of the pre-stretched dielectric active driving layer; A flexible substrate layer is formed on the side of the second electrode layer away from the pre-stretched dielectric active driving layer; A nanostructured raw material layer is formed on the side of the flexible substrate away from the second electrode layer, and the nanostructured raw material layer is imprinted to form a nanostructured layer. A first electrode layer is formed on the surface opposite to the second electrode layer in the pre-stretched dielectric active driving layer. Perform pre-stretch release treatment.

8. The method for manufacturing a dielectrically driven tunable nanoimprint template according to claim 7, characterized in that, The method for biaxial pre-stretching includes: providing a frame with a central window, wherein a clamping area is provided on the frame body, and the initial dielectric active driving layer is biaxially stretched and clamped and fixed on the frame to form a pre-stretched dielectric active driving layer.

9. The method for manufacturing a dielectrically driven tunable nanoimprint template according to claim 7, characterized in that, The imprinting method includes: providing a silicon substrate with a nanostructure, using the silicon substrate to perform hot imprinting and curing on the nanostructured raw material layer, and peeling off the silicon substrate to form the nanostructured layer; and satisfying at least one of the following conditions: (C1) The nanostructured raw material layer includes a hot-pressing adhesive; (C2) The temperature of the hot stamping is 50℃~70℃, the pressure is 0.1MPa~5MPa, and the time is 1min~10min; (C3) The curing method includes cooling to room temperature.

10. A nanoimprinting method, characterized in that, The method includes: Using the dielectric-driven tunable nanoimprint template according to any one of claims 1-6, a voltage is applied to the dielectric active driving layer before or during imprinting to make the nanostructure achieve the target geometric parameters and perform imprinting.

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