Electroplated copper leveler for surface repair and method of making same

By designing a copper plating leveling agent that replaces polyacrylate compounds with pyridine derivatives, the problems of poor adhesion and through-hole filling defects in remanufacturing surface repair were solved, achieving efficient through-hole filling and plating solution stability, which is suitable for the remanufacturing of electronic components.

CN122404599APending Publication Date: 2026-07-17NANTONG SIKETE ELECTRONICS CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
NANTONG SIKETE ELECTRONICS CO LTD
Filing Date
2026-06-17
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing copper plating leveling agents have problems such as poor adhesion of the repair layer, many defects in through-hole filling, weak resistance to impurities in the plating solution, and short service life in the surface repair of electronic components remanufacturing, which cannot meet the electroplating requirements of high-precision packaging substrates.

Method used

By using pyridine derivatives with general formula (I) to replace polyacrylate compounds as leveling agents, and by designing positively charged adsorption sites of pyridine ring quaternary ammonium salts and carboxyl complexation sites, a stable coating bonding layer is formed. Combined with the water solubility of the polyacrylate backbone and the stability of the plating solution, efficient through-hole filling and extended plating solution life are achieved.

Benefits of technology

It achieves void-free filling of high aspect ratio through holes, strong coating adhesion, strong resistance to impurity contamination of the plating solution, long cycle life, adapts to the remanufacturing production requirements of different specifications of waste electronic components, and has the potential for industrial mass production.

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Abstract

本申请涉及表面修复技术领域,具体涉及一种用于表面修复的电镀铜整平剂及其制备方法,本发明提供一种用于表面修复的电镀铜整平剂,为具有通式(Ⅰ)所示结构的吡啶衍生物取代聚丙烯酸酯化合物,本发明的整平剂以聚丙烯酸酯为主链,侧链通过氨基甲酸酯键连接3‑羧酸‑1‑(2‑羟乙基)吡啶鎓阳离子单元,形成了独特的双功能结构:吡啶环季铵盐正电荷为核心吸附位点,可精准、定向吸附在通孔孔口的高电流密度区,抑制铜的过度沉积,从根本上解决通孔填充的空洞、凹陷问题;吡啶环3位的羧基为铜表面络合位点,可在旧铜层表面形成稳定的络合吸附层,大幅提升修复镀层与旧铜基体的结合力,完美适配再制造表面修复场景。
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