Two-stage series organic silicon slurry and residue drying system and process thereof
By using a two-stage series drying system for organosilicon slurry residue, combined with horizontal and vertical evaporators and a negative pressure distillation tower, the problems of uneven drying, high energy consumption, and low automation in organosilicon slurry residue treatment have been solved, achieving efficient, low-energy continuous drying and resource utilization.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- JIANGXI BLUESTAR XINGHUO SILICONE CO LTD
- Filing Date
- 2026-04-30
- Publication Date
- 2026-07-17
AI Technical Summary
Existing organosilicon slurry residue treatment processes suffer from uneven drying, high energy consumption, dispersed emissions of volatiles and harmful gases, low automation levels, and limited applicability, making it difficult to achieve efficient, low-energy continuous drying and resource utilization.
A two-stage series drying system for organosilicon slurry residue is adopted, including horizontal and vertical evaporators, a negative pressure distillation column, and a gas phase product circulation system. Through heating, stirring, and gas phase separation, continuous drying and deep removal of volatiles from the slurry residue are achieved.
It significantly improves drying efficiency, reduces energy consumption, and decreases residual volatiles, enabling continuous, automated, and high-quality treatment of organosilicon slurry residue. It is suitable for the efficient treatment and resource utilization of slurry residue waste in organosilicon production processes.
Smart Images
Figure CN122408412A_ABST