Multilayer foil with embossed diffractive structures, method for its production and its use for optically protecting documents
By employing a multi-layer foil structure and specific processing techniques, the adhesion problem of multi-layer foil on porous and rough surfaces was solved, ensuring the integrity and high resolution of the holographic pattern and enabling economical and simple holographic pattern transfer.
CN122422155APending Publication Date: 2026-07-17DEMAX HOLOGRAMS PLC
Patent Information
- Application Number
- CN202480079923.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-12-19
- Filing Date
- 2024-12-17
- Publication Date
- 2026-07-17
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Figure CN122422155A_ABST
Abstract
本发明涉及一种多层箔(18),其包含作为载体的基底(1)和彼此不同的至少层(3)至(8)以及任选地层(2),尤其是至少一个压花层(3),其可由至少一种热塑性材料获得并且包含至少一个压花衍射结构(4),其承载至少一个反射层(5)、至少一个增强层(6)、至少部分存在于所述至少一个增强层(6)上的至少一个整平层(7)和至少部分存在于所述至少一个整平层(7)上的至少一个胶粘剂层(8),涉及其制备方法、所述多层箔作为衍射器件(38)的来源的用途、利用来源于所述多层箔的衍射器件光学保护文件(9)的方法和借助所述衍射器件光学保护的文件。
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Citation Information
Patent Citations
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