Charged-particle optical apparatus, charged-particle optical module, method of projecting multiple charged-particle beams onto a sample
By using a combination of lens arrays and correctors in charged particle beam inspection tools, the potential difference and beam current can be independently controlled, thus solving aberration problems and improving the yield and inspection efficiency of semiconductor chips.
CN122422971APending Publication Date: 2026-07-17ASML NETHERLANDS BV
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ASML NETHERLANDS BV
- Filing Date
- 2024-11-14
- Publication Date
- 2026-07-17
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Figure CN122422971A_ABST
Abstract
本公开涉及用于将多个带电粒子束朝向样品投射的装置和方法，并且特别地用于涉及以减少的像差投射束。在一种布置中，带电粒子光学设备包括透镜阵列，该透镜阵列被配置为将束栅格中的多个束朝向样品位置聚焦。校正器包括具有孔径图案的至少两个孔径阵列，该至少两个孔径阵列包括一对或多对面对的孔径表面。每对面对的孔径表面对应于针对束栅格的相应的像差的一个种类的校正。电压源被配置为在该对或每对面对的孔径表面之间施加电位差，以使相应种类的校正被施加，所施加的电位差基本上能够独立于束栅格在样品位置处的聚焦而选择以限定该相应种类的校正的幅度。
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