Plasma jet device and control system

Abstract

The application discloses a kind of plasma jet device and control system, it is related to plasma technical field.The plasma jet device includes shell, first chamber and second chamber are arranged in its inside, first chamber is communicated with second chamber, first chamber is used to pass into first gas, second chamber is used to pass into second gas;Discharge electrode is arranged in second chamber, and discharge electrode is used to ionize first gas and second gas in second chamber;Bottom plate is fixedly connected with shell and encloses containing space, a plurality of first through holes are arranged on bottom plate, first through hole is communicated with second chamber, and first through hole is used for plasma to be emitted in second chamber.Such arrangement, the device is optimized by mixing process of gas, the uniformity of gas flow is improved, and uniform plasma jet is realized by array small hole design, which expands its application scenario.

Description

Technical Field

[0001] This invention relates to the field of plasma technology, and in particular to a plasma jet device and control system. Background Technology

[0002] Plasma is the fourth state of matter, typically described as an ionized gas composed of charged particles (ions, electrons) and neutral particles (atoms, molecules, free radicals, etc.). Unlike the three states of matter—solid, liquid, and gas—plasma possesses higher energy. Atmospheric pressure cryogenic plasma jets are cryogenic plasma streams generated under normal atmospheric pressure. They ionize the gas using an electric field, forming active particles, which are then accelerated to form a jet. Currently, atmospheric pressure cryogenic plasma jets are widely used in materials surface treatment, environmental remediation, and disinfection.

[0003] Chinese patent application CN116367403A discloses a plasma jet industrial application device, which has two air inlets on the regulating chamber to achieve gas mixing in the regulating chamber. The mixed gas flows along the jet tube and is ionized in it, and finally is ejected through two exhaust ports. However, in this design, the two gases directly contact each other in a single chamber and continue to flow along a single pipeline. This gas flow mode will result in insufficient gas mixing, leading to inconsistent gas composition and concentration in the discharge area, thereby affecting the quality and stability of the plasma. At the same time, its jet outlet is ejected from a single opening, and its jet is uneven, which cannot meet the needs of some application scenarios that require precise control.

[0004] Chinese patent application CN113490322A discloses a portable large-area plasma jet device and system, which is equipped with multiple jet nozzles, each connected to a gas pipeline, and needle electrodes are installed in the gas pipelines to achieve a large-area, uniform plasma jet. However, in its design, when a mixed gas is introduced from a single gas inlet, the mixed gas cannot be uniformly mixed, resulting in different gas compositions and concentrations when entering independent gas pipelines. After ionization by the electrodes, the intensity of the plasma jet ejected from each jet nozzle is different, resulting in poor overall uniformity and stability. This also fails to meet the requirements of certain application scenarios that require precise control.

[0005] Therefore, the industry urgently needs to develop a plasma jet device and control system to solve the above-mentioned defects and shortcomings. Summary of the Invention

[0006] The main objective of this invention is to provide a plasma jet device and control system, in order to at least partially solve the above-mentioned technical problems.

[0007] To achieve the above objectives, in one aspect, the present invention provides a plasma jet device, comprising:

[0008] The housing has a first chamber and a second chamber that are separated from each other. The first chamber is connected to the second chamber. The first chamber is used to introduce a first gas, and the second chamber is used to introduce a second gas.

[0009] A discharge electrode is disposed in the second chamber, and the discharge electrode is used to ionize the first gas and the second gas in the second chamber.

[0010] A base plate is fixedly connected to the housing and forms a receiving space. A plurality of first through holes are provided on the base plate. The first through holes communicate with the second chamber and are used for plasma ejection from the second chamber.

[0011] Preferably, a flow guide column is provided in the second chamber, the flow guide column has a hollow structure inside, one end of the flow guide column is connected to the first chamber, and the other end is connected to a plurality of first through holes;

[0012] A plurality of second through holes are provided on the side wall of the flow guide column, and the second through holes connect the second chamber with the internal space of the flow guide column;

[0013] The first gas flow rate is greater than the second gas flow rate, so that the first gas enters the second chamber.

[0014] Preferably, a plurality of the second through holes are arranged in a circumferential array along the side wall of the flow guide column.

[0015] Preferably, at least two flow guide columns are provided, and multiple flow guide columns are arranged side by side and spaced apart in the second chamber.

[0016] Preferably, a third through hole is also provided on the base plate, and a plurality of first through holes are arranged circumferentially along the third through hole;

[0017] The diameter of the third through hole is larger than the diameter of the first through hole.

[0018] Preferably, the discharge electrode is mounted on the base plate, and the guide column passes through the discharge electrode and communicates with the first through hole and the third through hole.

[0019] Preferably, the discharge electrodes are uniformly disposed on the surface of the base plate covering the area enclosed by the housing;

[0020] The first through-holes arranged in multiple arrays are centrally symmetrical.

[0021] Preferably, the first chamber is connected to the first gas storage tank through a first pipeline, and a first gas flow control valve is provided on the first pipeline to control the first gas flow.

[0022] The second chamber is connected to the second gas storage tank through a second pipeline. A second gas flow control valve is installed on the second pipeline to control the flow rate of the second gas.

[0023] Preferably, a high-voltage electrode and a ground electrode are provided on the base plate, the high-voltage electrode and the ground electrode being used to generate an electric field in the discharge electrode; and / or

[0024] The discharge electrode includes an array of electrodes.

[0025] On the other hand, the present invention also provides a uniform plasma jet control system, which includes any of the above-mentioned plasma jet devices and further includes a controller;

[0026] The controller is connected to the plasma jet device and is used to control the flow rates of the first gas and the second gas, as well as the voltage of the discharge electrode.

[0027] Based on this, the present invention has at least one of the following beneficial effects compared to the prior art:

[0028] 1. The solution of the present invention has two independent air inlets on the shell, which can control the flow rate and type of each gas respectively, and can adjust different types of plasma jets to meet the needs of different application scenarios. At the same time, the bottom plate is provided with a first through hole and multiple second through holes. The multiple second through holes are evenly arranged around the first through hole, and the diameter of the second through hole is smaller than the diameter of the first through hole, so that the ejected plasma jet is more uniform and can optimize the spatial distribution and stability of the plasma.

[0029] 2. In the solution of the present invention, the first chamber and the second chamber are connected by a flow guide column. Multiple third through holes are provided on the side wall of the flow guide column, so that the first gas enters the second chamber through the multiple third through holes, achieving uniform mixing with the second gas, which helps to promote uniform discharge, thereby optimizing the plasma generation process, making it more stable and efficient in the discharge process, and improving the overall performance of the device. Attached Figure Description

[0030] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0031] Figure 1 A schematic diagram illustrating the structure of a plasma jet device according to one embodiment of the present invention;

[0032] Figure 2 A schematic diagram illustrating the structure of a base plate according to one embodiment of the present invention;

[0033] Figure 3 A schematic side view of a plasma jet apparatus according to one embodiment of the present invention is shown.

[0034] Figure 4 This schematic diagram illustrates the structure of a plasma jet control system according to one embodiment of the present invention.

[0035] Explanation of reference numerals in the attached figures:

[0036] 10-Shell, 101-First chamber, 102-Second chamber, 20-Discharge electrode, 30-Base plate, 301-First through hole, 302-Third through hole, 303-High voltage electrode, 304-Ground electrode, 40-Guide column, 401-Second through hole, 501-First pipeline, 502-First gas storage tank, 503-First gas flow control valve, 601-Second pipeline, 602-Second gas storage tank, 603-Second gas flow control valve, 70-Controller. Detailed Implementation

[0037] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0038] The terminology used in the embodiments of this invention is for the purpose of describing particular embodiments only and is not intended to limit the invention. The singular forms “a,” “the,” and “the” as used in the embodiments of this invention and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise.

[0039] It should be noted that the directional terms such as "upper," "lower," "left," and "right" used in the embodiments of the present invention are used to describe the angles shown in the accompanying drawings and should not be construed as limiting the embodiments of the present invention. Furthermore, in the context, it should be understood that when it is mentioned that an element is formed "upper" or "lower" of another element, it can not only be formed directly "upper" or "lower" of the other element, but also indirectly "upper" or "lower" of the other element through an intermediate element.

[0040] Figure 1 This schematic diagram illustrates the structure of a plasma jet device according to one embodiment of the present invention. Figure 2 This schematic diagram illustrates the structure of a base plate according to one embodiment of the present invention, as shown below. Figure 1 , 2 As shown, a plasma jet device of the present invention includes:

[0041] The housing 10 has a first chamber 101 and a second chamber 102 that are separated from each other. The first chamber 101 and the second chamber 102 are connected. The first chamber 101 is used to introduce a first gas, and the second chamber 102 is used to introduce a second gas.

[0042] A discharge electrode 20 is disposed in the second chamber 102, and the discharge electrode 20 is used to ionize the first gas and the second gas in the second chamber 102.

[0043] The base plate 30 is fixedly connected to the housing 10 and forms a receiving space. Multiple first through holes 301 are provided on the base plate 30. The first through holes 301 communicate with the second chamber 102 and are used for plasma ejection in the second chamber 102.

[0044] Specifically, in traditional technologies, atmospheric pressure low-temperature jet plasma has been widely used in fields such as material surface treatment, environmental remediation, and disinfection. It typically involves pouring gas into the reaction chamber through an inlet, using a simple single needle electrode, and inducing gas release through a high-frequency electric field to form plasma.

[0045] Traditional atmospheric pressure cryogenic jet plasma devices often rely on a single inlet or a simplified gas delivery system for gas flow. This can lead to insufficient gas mixing, especially in the case of multiple gases. Uneven gas distribution can result in inconsistent gas composition and concentration in the discharge region, thus affecting the quality and stability of the plasma. Furthermore, the design of the gas outlet orifice is often insufficient to precisely adjust the flow direction and intensity of the plasma jet, resulting in an uneven distribution of the plasma jet, which cannot meet the needs of some applications requiring fine control.

[0046] According to the solution of the present invention, the housing 10 has a first chamber 101 and a second chamber 102. The first chamber 101 can be introduced with a first gas, which is a working gas, while the second chamber 102 can be introduced with a second gas, which is a protective gas. At the same time, the first chamber 101 and the second chamber 102 are connected to achieve the mixing of the first gas and the second gas, and realize the discharge operation of the mixed gas.

[0047] Meanwhile, a plurality of arrayed first through holes 301 are provided on the base plate 30, and the arrayed first through holes 301 are centrally symmetrically distributed. The array shape is not limited and can be square, circular or other shapes.

[0048] The first through-holes 301 arranged in an array enable uniform ejection of plasma, resulting in a uniform distribution of the plasma jet and optimizing the spatial distribution and stability of the plasma jet. Furthermore, the size and position of the first through-holes 301 can be adjusted during manufacturing to achieve precise control over the formation of the plasma jet, allowing the device to meet the needs of certain applications requiring fine control.

[0049] Furthermore, such as Figure 1 As shown, a flow guide column 40 is provided in the second chamber 102. The flow guide column 40 has a hollow structure inside. One end of the flow guide column 40 is connected to the first chamber 101, and the other end is connected to multiple first through holes 301.

[0050] Multiple second through holes 401 are provided on the side wall of the guide column 40, and the second through holes 401 connect the second chamber 102 with the internal space of the guide column 40.

[0051] The first gas flow rate is greater than the second gas flow rate.

[0052] Specifically, the guide column 40 can be configured as a cuboid structure, with multiple second through holes 401 arranged in a circumferential array along the side wall of the guide column 40. At least two second through holes 401 can be provided on each side of the guide column 40. The top of the guide column 40 is connected to the first chamber 101, allowing the first gas to enter the interior of the guide column 40 through the first chamber 101. Since the flow rate of the first gas is greater than that of the second gas, according to Bernoulli's principle, the first gas can be ejected through the second through holes 401 and mixed with the second gas in the second chamber 102. At this time, the discharge operation of the discharge electrode 20 ionizes the mixed gas to form plasma, which then returns to the interior of the guide column 40 through the second through holes 401 and is ejected from the first through hole 301 on the bottom plate 30 at its bottom, thus realizing the ejection of a uniform plasma jet.

[0053] Furthermore, a third through hole 302 is provided on the base plate 30, and multiple first through holes 301 are arranged axially along the third through hole 302;

[0054] The diameter of the third through hole 302 is larger than the diameter of the first through hole 301.

[0055] With this configuration, the larger diameter third through hole 302 can also achieve plasma ejection. At the same time, if the mixed gas is not completely ionized, the larger gas molecules will not be blocked at the smaller diameter first through hole 301 and can be ejected from the third through hole 302.

[0056] Furthermore, at least two flow guide columns 40 are provided, and multiple flow guide columns 40 are arranged side by side and spaced apart in the second chamber 102; multiple second through holes 401 on multiple flow guide columns 40 can achieve more mixing of the first gas and the second gas, accelerate the mixing efficiency, and also increase the flow rate of the plasma jet.

[0057] Furthermore, the discharge electrode 20 is mounted on the base plate 30, and the guide column 40 passes through the discharge electrode 20 and communicates with the first through hole 301 and the third through hole 302.

[0058] Furthermore, Figure 3 The schematic diagram shows a side view of a plasma jet device according to an embodiment of the present invention. The first chamber 101 is connected to the first gas storage tank 502 through the first pipeline 501. A first gas flow control valve 503 is provided on the first pipeline 501. The first gas flow control valve 503 is used to control the first gas flow.

[0059] The second chamber 102 is connected to the second gas storage tank 602 through the second pipeline 601. A second gas flow control valve 603 is provided on the second pipeline 601 to control the second gas flow.

[0060] With this configuration, by replacing the first gas storage tank 502 and the second gas storage tank 602 with different types, the mixing of different types of first gas and second gas can be achieved. At the same time, through the first gas flow control valve 503 and the second gas flow control valve 603, the flow rates of the first gas and the second gas can be freely controlled, achieving more precise operation and enabling the device to meet more application requirements that require fine control.

[0061] Furthermore, the discharge electrodes 20 are uniformly disposed on the surface of the base plate 30 within the area enclosed by the housing 10, which enables uniform and comprehensive ionization of the mixed gas in the second chamber 102.

[0062] Furthermore, a high-voltage electrode 303 and a ground electrode 304 are provided on the base plate 30. The high-voltage electrode 303 and the ground electrode 304 are used to generate an electric field in the discharge electrode 20 to realize the discharge operation of the discharge electrode 20.

[0063] Furthermore, the discharge electrode 20 includes an array of electrodes, which can generate a more uniform voltage compared to a needle electrode.

[0064] To achieve the above objectives, Figure 4 This schematic diagram illustrates the structure of a plasma jet control system according to one embodiment of the present invention, as shown below. Figure 4 As shown, the present invention also provides a plasma jet control system, which includes the above-mentioned plasma jet device and a controller 70.

[0065] The controller 70 is connected to the plasma jet device and is used to control the flow rate of the first gas and the second gas, as well as the voltage of the discharge electrode 20.

[0066] Specifically, the controller 70 is connected to the first gas flow control valve 503 and the second gas flow control valve 603 respectively, so as to realize the free control of the flow of the first gas and the second gas. At the same time, the controller 70 is also connected to the electrical box, which can supply power to the high-voltage electrode 303, thereby realizing the regulation of the discharge voltage of the discharge electrode 20.

[0067] In summary, the device of the present invention has two independent air inlets, which can control the flow rate and type of each gas separately, and can adjust different types of plasma jets to meet the needs of different application scenarios. The base plate 30 is provided with multiple arrayed first through holes 301, which can better achieve uniform plasma outflow, optimize plasma spatial distribution and stability, and the size and position of the first through holes 301 can be adjusted to facilitate precise control of plasma jet formation. At the same time, the setting of the flow guide column 40 helps to ensure uniform gas mixing, thereby promoting uniform discharge and optimizing the plasma generation process.

[0068] The above description is merely a preferred embodiment of this application and an explanation of the technical principles employed. Those skilled in the art should understand that the scope of the invention involved in this application is not limited to technical solutions formed by specific combinations of the above-described technical features, but should also cover other technical solutions formed by arbitrary combinations of the above-described technical features or their equivalents without departing from the inventive concept. For example, technical solutions formed by substituting the above features with (but not limited to) technical features with similar functions disclosed in this application.

Claims

1. A plasma jet device, characterized in that, include: The housing has a first chamber and a second chamber that are separated from each other. The first chamber is connected to the second chamber. The first chamber is used to introduce a first gas, and the second chamber is used to introduce a second gas. A discharge electrode is disposed in the second chamber, and the discharge electrode is used to ionize the first gas and the second gas in the second chamber. A base plate is fixedly connected to the housing and forms a receiving space. A plurality of first through holes are provided on the base plate. The first through holes communicate with the second chamber and are used for plasma ejection from the second chamber.

2. The plasma jet device according to claim 1, characterized in that, A flow guide column is provided in the second chamber. The flow guide column has a hollow structure inside. One end of the flow guide column is connected to the first chamber, and the other end is connected to multiple first through holes. A plurality of second through holes are provided on the side wall of the flow guide column, and the second through holes connect the second chamber with the internal space of the flow guide column; The first gas flow rate is greater than the second gas flow rate, so that the first gas enters the second chamber.

3. The plasma jet device according to claim 2, characterized in that, Multiple second through holes are arranged in a circumferential array along the side wall of the flow guide column.

4. The plasma jet device according to claim 2, characterized in that, At least two flow guide columns are provided, and multiple flow guide columns are arranged side by side and spaced apart in the second chamber.

5. The plasma jet device according to claim 2, characterized in that, A third through hole is also provided on the base plate, and a plurality of first through holes are arranged circumferentially along the third through hole; The diameter of the third through hole is larger than the diameter of the first through hole.

6. The plasma jet device according to claim 5, characterized in that, The discharge electrode is mounted on the base plate, and the flow guide column passes through the discharge electrode and communicates with the first through hole and the third through hole.

7. The plasma jet device according to claim 6, characterized in that, The discharge electrodes are uniformly disposed on the surface of the bottom plate within the area enclosed by the housing; The first through-holes arranged in multiple arrays are centrally symmetrical.

8. The plasma jet device according to claim 1, characterized in that, The first chamber is connected to the first gas storage tank through a first pipeline, and a first gas flow control valve is provided on the first pipeline to control the first gas flow. The second chamber is connected to the second gas storage tank through a second pipeline. A second gas flow control valve is installed on the second pipeline to control the flow rate of the second gas.

9. The plasma jet device according to claim 1, characterized in that, A high-voltage electrode and a ground electrode are disposed on the base plate, the high-voltage electrode and the ground electrode being used to generate an electric field in the discharge electrode; and / or The discharge electrode includes an array of electrodes.

10. A plasma jet control system, characterized in that, The plasma jet apparatus as described in any one of claims 1-9 further includes a controller; The controller is connected to the plasma jet device and is used to control the flow rates of the first gas and the second gas, as well as the voltage of the discharge electrode.

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